TW296394B - - Google Patents
Download PDFInfo
- Publication number
- TW296394B TW296394B TW82109289A TW82109289A TW296394B TW 296394 B TW296394 B TW 296394B TW 82109289 A TW82109289 A TW 82109289A TW 82109289 A TW82109289 A TW 82109289A TW 296394 B TW296394 B TW 296394B
- Authority
- TW
- Taiwan
- Prior art keywords
- gas
- plasma
- coating
- item
- substrate
- Prior art date
Links
- 239000007789 gas Substances 0.000 claims description 72
- 239000000758 substrate Substances 0.000 claims description 51
- 238000000034 method Methods 0.000 claims description 48
- 238000000576 coating method Methods 0.000 claims description 45
- 239000011248 coating agent Substances 0.000 claims description 42
- 238000006243 chemical reaction Methods 0.000 claims description 30
- 230000008569 process Effects 0.000 claims description 18
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 claims description 15
- 239000000203 mixture Substances 0.000 claims description 13
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 11
- 239000011159 matrix material Substances 0.000 claims description 11
- 229910052710 silicon Inorganic materials 0.000 claims description 11
- 238000006116 polymerization reaction Methods 0.000 claims description 10
- 229910021332 silicide Inorganic materials 0.000 claims description 10
- 239000010703 silicon Substances 0.000 claims description 10
- 229920000642 polymer Polymers 0.000 claims description 9
- FVBUAEGBCNSCDD-UHFFFAOYSA-N silicide(4-) Chemical compound [Si-4] FVBUAEGBCNSCDD-UHFFFAOYSA-N 0.000 claims description 8
- 239000000178 monomer Substances 0.000 claims description 7
- 238000011049 filling Methods 0.000 claims description 6
- 230000003287 optical effect Effects 0.000 claims description 5
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 4
- 239000001301 oxygen Substances 0.000 claims description 4
- 229910052760 oxygen Inorganic materials 0.000 claims description 4
- 229910008051 Si-OH Inorganic materials 0.000 claims description 3
- 229910006358 Si—OH Inorganic materials 0.000 claims description 3
- 125000000524 functional group Chemical group 0.000 claims description 3
- 230000002209 hydrophobic effect Effects 0.000 claims description 3
- HMDDXIMCDZRSNE-UHFFFAOYSA-N [C].[Si] Chemical compound [C].[Si] HMDDXIMCDZRSNE-UHFFFAOYSA-N 0.000 claims 2
- 238000004804 winding Methods 0.000 claims 1
- 239000000376 reactant Substances 0.000 description 30
- 239000010410 layer Substances 0.000 description 27
- 230000005684 electric field Effects 0.000 description 11
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 10
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 8
- 239000012159 carrier gas Substances 0.000 description 8
- 239000000463 material Substances 0.000 description 8
- 238000004458 analytical method Methods 0.000 description 7
- 238000000151 deposition Methods 0.000 description 7
- 238000005299 abrasion Methods 0.000 description 6
- 230000008021 deposition Effects 0.000 description 6
- 239000004033 plastic Substances 0.000 description 6
- 229920003023 plastic Polymers 0.000 description 6
- -1 polyethylene Polymers 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 5
- 238000005336 cracking Methods 0.000 description 5
- 238000005516 engineering process Methods 0.000 description 5
- 239000007788 liquid Substances 0.000 description 5
- GJWAPAVRQYYSTK-UHFFFAOYSA-N [(dimethyl-$l^{3}-silanyl)amino]-dimethylsilicon Chemical compound C[Si](C)N[Si](C)C GJWAPAVRQYYSTK-UHFFFAOYSA-N 0.000 description 4
- 229910052786 argon Inorganic materials 0.000 description 4
- 238000009835 boiling Methods 0.000 description 4
- 230000032798 delamination Effects 0.000 description 4
- JUWSSMXCCAMYGX-UHFFFAOYSA-N gold platinum Chemical compound [Pt].[Au] JUWSSMXCCAMYGX-UHFFFAOYSA-N 0.000 description 4
- 229920000728 polyester Polymers 0.000 description 4
- 238000005001 rutherford backscattering spectroscopy Methods 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 238000010168 coupling process Methods 0.000 description 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 3
- 239000010931 gold Substances 0.000 description 3
- 229910052737 gold Inorganic materials 0.000 description 3
- 230000001965 increasing effect Effects 0.000 description 3
- 239000011261 inert gas Substances 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 3
- VMGAPWLDMVPYIA-HIDZBRGKSA-N n'-amino-n-iminomethanimidamide Chemical compound N\N=C\N=N VMGAPWLDMVPYIA-HIDZBRGKSA-N 0.000 description 3
- 239000011253 protective coating Substances 0.000 description 3
- 150000003254 radicals Chemical class 0.000 description 3
- BOLDJAUMGUJJKM-LSDHHAIUSA-N renifolin D Natural products CC(=C)[C@@H]1Cc2c(O)c(O)ccc2[C@H]1CC(=O)c3ccc(O)cc3O BOLDJAUMGUJJKM-LSDHHAIUSA-N 0.000 description 3
- 239000000523 sample Substances 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- 229910052693 Europium Inorganic materials 0.000 description 2
- 238000004566 IR spectroscopy Methods 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 2
- 239000004743 Polypropylene Substances 0.000 description 2
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 239000003990 capacitor Substances 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 239000008367 deionised water Substances 0.000 description 2
- 229910021641 deionized water Inorganic materials 0.000 description 2
- OGPBJKLSAFTDLK-UHFFFAOYSA-N europium atom Chemical compound [Eu] OGPBJKLSAFTDLK-UHFFFAOYSA-N 0.000 description 2
- 230000008570 general process Effects 0.000 description 2
- FFUAGWLWBBFQJT-UHFFFAOYSA-N hexamethyldisilazane Chemical compound C[Si](C)(C)N[Si](C)(C)C FFUAGWLWBBFQJT-UHFFFAOYSA-N 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 230000001939 inductive effect Effects 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- 230000035699 permeability Effects 0.000 description 2
- 229920000573 polyethylene Polymers 0.000 description 2
- 229920001155 polypropylene Polymers 0.000 description 2
- 239000011241 protective layer Substances 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- 230000004044 response Effects 0.000 description 2
- 229910000077 silane Inorganic materials 0.000 description 2
- 229910052814 silicon oxide Inorganic materials 0.000 description 2
- 238000004611 spectroscopical analysis Methods 0.000 description 2
- 229920001169 thermoplastic Polymers 0.000 description 2
- 229920001187 thermosetting polymer Polymers 0.000 description 2
- 239000004416 thermosoftening plastic Substances 0.000 description 2
- NJECQESCCSENHG-UHFFFAOYSA-N 1,1,2,2,3,3,4,4-octamethyltetrasiletane Chemical compound C[Si]1(C)[Si](C)(C)[Si](C)(C)[Si]1(C)C NJECQESCCSENHG-UHFFFAOYSA-N 0.000 description 1
- ZSLUVFAKFWKJRC-IGMARMGPSA-N 232Th Chemical compound [232Th] ZSLUVFAKFWKJRC-IGMARMGPSA-N 0.000 description 1
- YGQRXLWPKFITJL-UHFFFAOYSA-N C1(=CC=CC=C1)[SiH2]C1=CC=CC=C1.C[SiH2]C Chemical compound C1(=CC=CC=C1)[SiH2]C1=CC=CC=C1.C[SiH2]C YGQRXLWPKFITJL-UHFFFAOYSA-N 0.000 description 1
- WWEDRESZMWOBFP-UHFFFAOYSA-N CN(C)[SiH2]C1=C(C=CC=C1)C Chemical compound CN(C)[SiH2]C1=C(C=CC=C1)C WWEDRESZMWOBFP-UHFFFAOYSA-N 0.000 description 1
- 235000009917 Crataegus X brevipes Nutrition 0.000 description 1
- 235000013204 Crataegus X haemacarpa Nutrition 0.000 description 1
- 235000009685 Crataegus X maligna Nutrition 0.000 description 1
- 235000009444 Crataegus X rubrocarnea Nutrition 0.000 description 1
- 235000009486 Crataegus bullatus Nutrition 0.000 description 1
- 235000017181 Crataegus chrysocarpa Nutrition 0.000 description 1
- 235000009682 Crataegus limnophila Nutrition 0.000 description 1
- 235000004423 Crataegus monogyna Nutrition 0.000 description 1
- 240000000171 Crataegus monogyna Species 0.000 description 1
- 235000002313 Crataegus paludosa Nutrition 0.000 description 1
- 235000009840 Crataegus x incaedua Nutrition 0.000 description 1
- 102000004190 Enzymes Human genes 0.000 description 1
- 108090000790 Enzymes Proteins 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 240000004808 Saccharomyces cerevisiae Species 0.000 description 1
- 229920002125 Sokalan® Polymers 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- RAHZWNYVWXNFOC-UHFFFAOYSA-N Sulphur dioxide Chemical compound O=S=O RAHZWNYVWXNFOC-UHFFFAOYSA-N 0.000 description 1
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 1
- 229910052776 Thorium Inorganic materials 0.000 description 1
- DHKHKXVYLBGOIT-UHFFFAOYSA-N acetaldehyde Diethyl Acetal Natural products CCOC(C)OCC DHKHKXVYLBGOIT-UHFFFAOYSA-N 0.000 description 1
- 125000002777 acetyl group Chemical class [H]C([H])([H])C(*)=O 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 238000004378 air conditioning Methods 0.000 description 1
- 150000001335 aliphatic alkanes Chemical class 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000033228 biological regulation Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 235000019504 cigarettes Nutrition 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000008199 coating composition Substances 0.000 description 1
- 238000009500 colour coating Methods 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000002079 cooperative effect Effects 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 229920006037 cross link polymer Polymers 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- ADTGAVILDBXARD-UHFFFAOYSA-N diethylamino(dimethyl)silicon Chemical compound CCN(CC)[Si](C)C ADTGAVILDBXARD-UHFFFAOYSA-N 0.000 description 1
- STUJOVDBMNGNTP-UHFFFAOYSA-N dimethyl-pent-2-enyl-propylsilane Chemical compound CCC[Si](C)(C)CC=CCC STUJOVDBMNGNTP-UHFFFAOYSA-N 0.000 description 1
- KZFNONVXCZVHRD-UHFFFAOYSA-N dimethylamino(dimethyl)silicon Chemical compound CN(C)[Si](C)C KZFNONVXCZVHRD-UHFFFAOYSA-N 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- UKAJDOBPPOAZSS-UHFFFAOYSA-N ethyl(trimethyl)silane Chemical compound CC[Si](C)(C)C UKAJDOBPPOAZSS-UHFFFAOYSA-N 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 239000006260 foam Substances 0.000 description 1
- 238000002309 gasification Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- 210000004209 hair Anatomy 0.000 description 1
- 230000005660 hydrophilic surface Effects 0.000 description 1
- 230000005661 hydrophobic surface Effects 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 238000011068 loading method Methods 0.000 description 1
- JDSHMPZPIAZGSV-UHFFFAOYSA-N melamine Chemical compound NC1=NC(N)=NC(N)=N1 JDSHMPZPIAZGSV-UHFFFAOYSA-N 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 210000004417 patella Anatomy 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 238000009832 plasma treatment Methods 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 229920006255 plastic film Polymers 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Substances [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 1
- 239000004584 polyacrylic acid Substances 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 229920000193 polymethacrylate Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920002689 polyvinyl acetate Polymers 0.000 description 1
- 239000011118 polyvinyl acetate Substances 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 238000004886 process control Methods 0.000 description 1
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 239000012495 reaction gas Substances 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- JXXAGAOGXRZWNF-UHFFFAOYSA-N silane 1,1,2-triethoxyethene Chemical compound [SiH4].C(C)OC=C(OCC)OCC JXXAGAOGXRZWNF-UHFFFAOYSA-N 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 241000894007 species Species 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 229910052712 strontium Inorganic materials 0.000 description 1
- CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- CZDYPVPMEAXLPK-UHFFFAOYSA-N tetramethylsilane Chemical compound C[Si](C)(C)C CZDYPVPMEAXLPK-UHFFFAOYSA-N 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- 239000012780 transparent material Substances 0.000 description 1
- CEAWWDXUKYZTJL-UHFFFAOYSA-N triethyl(phenyl)silane Chemical compound CC[Si](CC)(CC)C1=CC=CC=C1 CEAWWDXUKYZTJL-UHFFFAOYSA-N 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- KXFSUVJPEQYUGN-UHFFFAOYSA-N trimethyl(phenyl)silane Chemical compound C[Si](C)(C)C1=CC=CC=C1 KXFSUVJPEQYUGN-UHFFFAOYSA-N 0.000 description 1
- 238000009834 vaporization Methods 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
- 239000000080 wetting agent Substances 0.000 description 1
- 210000002268 wool Anatomy 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45561—Gas plumbing upstream of the reaction chamber
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/401—Oxides containing silicon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/517—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using a combination of discharges covered by two or more of groups C23C16/503 - C23C16/515
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31652—Of asbestos
- Y10T428/31663—As siloxane, silicone or silane
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Inorganic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Chemical Vapour Deposition (AREA)
- Physical Vapour Deposition (AREA)
- Optical Record Carriers And Manufacture Thereof (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Paints Or Removers (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US07/994,381 US5298587A (en) | 1992-12-21 | 1992-12-21 | Protective film for articles and method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW296394B true TW296394B (enExample) | 1997-01-21 |
Family
ID=25540605
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW82109289A TW296394B (enExample) | 1992-12-21 | 1993-11-05 | |
| TW085111463A TW375536B (en) | 1992-12-21 | 1993-11-05 | Apparatus for generating plasma |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW085111463A TW375536B (en) | 1992-12-21 | 1993-11-05 | Apparatus for generating plasma |
Country Status (9)
| Country | Link |
|---|---|
| US (2) | US5298587A (enExample) |
| EP (1) | EP0674722B1 (enExample) |
| JP (1) | JP3488458B2 (enExample) |
| KR (3) | KR100344334B1 (enExample) |
| CA (1) | CA2147486C (enExample) |
| DE (1) | DE69318424T2 (enExample) |
| MX (1) | MX9306910A (enExample) |
| TW (2) | TW296394B (enExample) |
| WO (1) | WO1994014998A1 (enExample) |
Families Citing this family (125)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5567661A (en) * | 1993-08-26 | 1996-10-22 | Fujitsu Limited | Formation of planarized insulating film by plasma-enhanced CVD of organic silicon compound |
| US5677051A (en) * | 1993-11-30 | 1997-10-14 | Tdk Corporation | Magnetic recording medium having a specified plasma polymerized hydrogen containing carbon film and lubricant |
| US6149982A (en) * | 1994-02-16 | 2000-11-21 | The Coca-Cola Company | Method of forming a coating on an inner surface |
| ZA951048B (en) | 1994-02-16 | 1995-10-12 | Coca Cola Co | Hollow containers with inert or impermeable inner surface through plasma-assisted surface reaction or on-surface polymerization |
| US5487920A (en) * | 1994-04-19 | 1996-01-30 | The Boc Group, Inc. | Process for plasma-enhanced chemical vapor deposition of anti-fog and anti-scratch coatings onto various substrates |
| CA2224856C (en) * | 1995-06-22 | 2002-04-30 | Yuri Gudimenko | Surface modification of polymers and carbon-based materials |
| EP0752483A1 (de) * | 1995-06-28 | 1997-01-08 | ANTEC Angewandte Neue Technologien GmbH | Verfahren zur Beschichtung von Gegenständen aus Metall oder Kunststoff |
| DK0854891T3 (da) * | 1995-10-13 | 2003-09-22 | Dow Global Technologies Inc | Fremgangsmåde til fremstilling af belagte plastoverflader |
| US5783452A (en) * | 1996-02-02 | 1998-07-21 | University Of Washington | Covered microchannels and the microfabrication thereof |
| AUPN820396A0 (en) * | 1996-02-21 | 1996-03-14 | Commonwealth Scientific And Industrial Research Organisation | Method for reducing crazing in a plastics material |
| US6514573B2 (en) * | 1996-02-21 | 2003-02-04 | Commonwealth Scientific And Industrial Research Organisation | Method for reducing crazing in a plastics material |
| US5993598A (en) * | 1996-07-30 | 1999-11-30 | The Dow Chemical Company | Magnetron |
| US5900284A (en) * | 1996-07-30 | 1999-05-04 | The Dow Chemical Company | Plasma generating device and method |
| US5989998A (en) | 1996-08-29 | 1999-11-23 | Matsushita Electric Industrial Co., Ltd. | Method of forming interlayer insulating film |
| FR2756292B1 (fr) * | 1996-11-26 | 1998-12-24 | Saint Gobain Vitrage | Procede de preparation d'une feuille en matiere plastique, cette feuille et vitrage la comportant |
| US6110544A (en) * | 1997-06-26 | 2000-08-29 | General Electric Company | Protective coating by high rate arc plasma deposition |
| US6045877A (en) * | 1997-07-28 | 2000-04-04 | Massachusetts Institute Of Technology | Pyrolytic chemical vapor deposition of silicone films |
| US6203898B1 (en) * | 1997-08-29 | 2001-03-20 | 3M Innovatave Properties Company | Article comprising a substrate having a silicone coating |
| US6055929A (en) * | 1997-09-24 | 2000-05-02 | The Dow Chemical Company | Magnetron |
| EP1044458B1 (en) | 1997-10-01 | 2005-09-14 | Dow Global Technologies Inc. | Dual face shower head magnetron, plasma generating apparatus and method of coating a substrate |
| US6054379A (en) * | 1998-02-11 | 2000-04-25 | Applied Materials, Inc. | Method of depositing a low k dielectric with organo silane |
| US6660656B2 (en) * | 1998-02-11 | 2003-12-09 | Applied Materials Inc. | Plasma processes for depositing low dielectric constant films |
| US6287990B1 (en) | 1998-02-11 | 2001-09-11 | Applied Materials, Inc. | CVD plasma assisted low dielectric constant films |
| US6593247B1 (en) | 1998-02-11 | 2003-07-15 | Applied Materials, Inc. | Method of depositing low k films using an oxidizing plasma |
| US6627532B1 (en) * | 1998-02-11 | 2003-09-30 | Applied Materials, Inc. | Method of decreasing the K value in SiOC layer deposited by chemical vapor deposition |
| US6303523B2 (en) * | 1998-02-11 | 2001-10-16 | Applied Materials, Inc. | Plasma processes for depositing low dielectric constant films |
| US6147009A (en) * | 1998-06-29 | 2000-11-14 | International Business Machines Corporation | Hydrogenated oxidized silicon carbon material |
| US6245690B1 (en) * | 1998-11-04 | 2001-06-12 | Applied Materials, Inc. | Method of improving moisture resistance of low dielectric constant films |
| DE19901834A1 (de) * | 1999-01-19 | 2000-07-20 | Leybold Systems Gmbh | Verfahren zum Beschichten von Substraten aus Kunststoff |
| US6520650B2 (en) | 1999-02-08 | 2003-02-18 | Valeo Sylvania L.C.C. | Lamp reflector with a barrier coating of a plasma polymer |
| US6517341B1 (en) * | 1999-02-26 | 2003-02-11 | General Electric Company | Method to prevent recession loss of silica and silicon-containing materials in combustion gas environments |
| US6365016B1 (en) | 1999-03-17 | 2002-04-02 | General Electric Company | Method and apparatus for arc plasma deposition with evaporation of reagents |
| US6517687B1 (en) | 1999-03-17 | 2003-02-11 | General Electric Company | Ultraviolet filters with enhanced weatherability and method of making |
| US6420032B1 (en) | 1999-03-17 | 2002-07-16 | General Electric Company | Adhesion layer for metal oxide UV filters |
| US6261694B1 (en) | 1999-03-17 | 2001-07-17 | General Electric Company | Infrared reflecting coatings |
| US6426125B1 (en) | 1999-03-17 | 2002-07-30 | General Electric Company | Multilayer article and method of making by ARC plasma deposition |
| US6582823B1 (en) * | 1999-04-30 | 2003-06-24 | North Carolina State University | Wear-resistant polymeric articles and methods of making the same |
| US6376064B1 (en) * | 1999-12-13 | 2002-04-23 | General Electric Company | Layered article with improved microcrack resistance and method of making |
| US6743516B2 (en) | 2000-09-29 | 2004-06-01 | Guardian Industries Corporation | Highly durable hydrophobic coatings and methods |
| US6258735B1 (en) | 2000-10-05 | 2001-07-10 | Applied Materials, Inc. | Method for using bypass lines to stabilize gas flow and maintain plasma inside a deposition chamber |
| US6531398B1 (en) | 2000-10-30 | 2003-03-11 | Applied Materials, Inc. | Method of depositing organosillicate layers |
| KR20040014449A (ko) | 2001-01-18 | 2004-02-14 | 다우 글로벌 테크놀로지스 인크. | 접착제로 결합된 밸브 커버 실린더 헤드 조립체 |
| US6709721B2 (en) | 2001-03-28 | 2004-03-23 | Applied Materials Inc. | Purge heater design and process development for the improvement of low k film properties |
| US6543404B2 (en) * | 2001-04-04 | 2003-04-08 | Dow Global Technologies, Inc. | Adhesively bonded engine intake manifold assembly |
| JP2003011661A (ja) * | 2001-06-25 | 2003-01-15 | Exatec Llc | 自動車用固定グレイジングを提供するためのパネルおよび方法 |
| US6733714B2 (en) * | 2001-08-13 | 2004-05-11 | Edwin J. Oakey | Method for forming high-impact, transparent, distortion-free polymeric material |
| WO2003016091A1 (en) | 2001-08-15 | 2003-02-27 | Dow Global Technologies Inc. | Improved seating system |
| WO2003031362A1 (en) * | 2001-10-05 | 2003-04-17 | Dow Global Technologies Inc. | Coated glass for use in displays and other electronic devices |
| US6838393B2 (en) * | 2001-12-14 | 2005-01-04 | Applied Materials, Inc. | Method for producing semiconductor including forming a layer containing at least silicon carbide and forming a second layer containing at least silicon oxygen carbide |
| US6890850B2 (en) * | 2001-12-14 | 2005-05-10 | Applied Materials, Inc. | Method of depositing dielectric materials in damascene applications |
| US6613389B2 (en) * | 2001-12-26 | 2003-09-02 | Dow Global Technologies, Inc. | Coating process and composition for same |
| US20030183245A1 (en) * | 2002-04-01 | 2003-10-02 | Min-Shyan Sheu | Surface silanization |
| US20030206337A1 (en) * | 2002-05-06 | 2003-11-06 | Eastman Kodak Company | Exposure apparatus for irradiating a sensitized substrate |
| US6860010B2 (en) | 2002-05-15 | 2005-03-01 | Dow Global Technologies, Inc. | Method of forming an automotive valve cover with integral positive crankcase ventilation |
| US7105460B2 (en) * | 2002-07-11 | 2006-09-12 | Applied Materials | Nitrogen-free dielectric anti-reflective coating and hardmask |
| US6927178B2 (en) * | 2002-07-11 | 2005-08-09 | Applied Materials, Inc. | Nitrogen-free dielectric anti-reflective coating and hardmask |
| US7128373B2 (en) * | 2002-09-27 | 2006-10-31 | Dow Global Technologies, Inc. | Seating system and method of forming same |
| US6905773B2 (en) * | 2002-10-22 | 2005-06-14 | Schlage Lock Company | Corrosion-resistant coatings and methods of manufacturing the same |
| CN1726252A (zh) * | 2002-12-13 | 2006-01-25 | 陶氏环球技术公司 | 阻燃聚合物复合材料 |
| US7250091B2 (en) * | 2003-02-13 | 2007-07-31 | Dow Global Technologies Inc | Method of forming a seating system |
| US20040253378A1 (en) * | 2003-06-12 | 2004-12-16 | Applied Materials, Inc. | Stress reduction of SIOC low k film by addition of alkylenes to OMCTS based processes |
| US7360519B2 (en) * | 2003-07-10 | 2008-04-22 | Dow Global Technologies, Inc. | Engine intake manifold assembly |
| US20050037153A1 (en) * | 2003-08-14 | 2005-02-17 | Applied Materials, Inc. | Stress reduction of sioc low k films |
| ES2308255T3 (es) * | 2003-09-19 | 2008-12-01 | Dow Global Technologies Inc. | Piezas unidas adhesivamente a motores y transmisiones. |
| ATE375860T1 (de) * | 2004-02-03 | 2007-11-15 | Ems Chemie Ag | Werkstoffverbunde aus einem formteil aus transparenten oder transluzenten, einfärbbaren kunststoffformmassen |
| US7030041B2 (en) * | 2004-03-15 | 2006-04-18 | Applied Materials Inc. | Adhesion improvement for low k dielectrics |
| CN101031626B (zh) | 2004-09-01 | 2011-10-05 | 陶氏环球技术有限责任公司 | 粘合促进剂 |
| MX2007003561A (es) * | 2004-09-27 | 2007-10-10 | Dow Global Technologies Inc | Revestimientos multicapa mediante deposicion quimica en fase vapor mejorada por plasma. |
| MX2007005123A (es) * | 2004-10-29 | 2007-06-25 | Dow Global Technologies Inc | Revestimientos resistentes a la abrasion a traves de deposicion de vapor quimica mejorada de plasma. |
| US8182884B2 (en) * | 2005-02-28 | 2012-05-22 | GM Global Technology Operations LLC | Process for application of a hydrophilic coating to fuel cell bipolar plates |
| DE102005016422A1 (de) * | 2005-04-08 | 2006-10-12 | Hugo Claus Gmbh + Co. Kg | Komponente für eine Lackiereinrichtung und Vorrichtung zu ihrer Entlackung |
| US20070020451A1 (en) * | 2005-07-20 | 2007-01-25 | 3M Innovative Properties Company | Moisture barrier coatings |
| DE502006001441D1 (de) * | 2006-01-27 | 2008-10-09 | Ems Chemie Ag | Photochrome Formmassen und daraus hergestellte Gegenstände |
| US20070212548A1 (en) * | 2006-03-10 | 2007-09-13 | Exatec Llc | Glazing system with high glass transition temperature decorative ink |
| EP2012996A2 (en) * | 2006-04-19 | 2009-01-14 | Dow Global Technologies Inc. | Method for blending materials in an extruder, the manufactured article and material pre-mix |
| US20070261224A1 (en) * | 2006-05-11 | 2007-11-15 | Dow Global Technologies Inc. | Methods and articles in having a fringed microprotrusion surface structure |
| US8251688B2 (en) | 2006-05-12 | 2012-08-28 | PH Realty, Inc. | Apparatus for a mold vacuum system and method of forming a sheet utilizing the system |
| US20080006819A1 (en) * | 2006-06-19 | 2008-01-10 | 3M Innovative Properties Company | Moisture barrier coatings for organic light emitting diode devices |
| CN101490164B (zh) * | 2006-06-29 | 2012-11-21 | 陶氏环球技术有限责任公司 | 热塑性制品和使用改进的母料制造该制品的方法 |
| US20080160298A1 (en) * | 2006-12-28 | 2008-07-03 | Chengtao Li | Polycarbonate glazing system and method for making the same |
| US8241713B2 (en) * | 2007-02-21 | 2012-08-14 | 3M Innovative Properties Company | Moisture barrier coatings for organic light emitting diode devices |
| US7878054B2 (en) * | 2007-02-28 | 2011-02-01 | The Boeing Company | Barrier coatings for polymeric substrates |
| WO2008137588A1 (en) * | 2007-05-01 | 2008-11-13 | Exatec, Llc | Edge healing and field repair of plasma coating |
| CN101772588A (zh) * | 2007-07-30 | 2010-07-07 | 陶氏环球技术公司 | 大气压等离子体增强化学气相沉积方法 |
| US20090061200A1 (en) * | 2007-08-31 | 2009-03-05 | Tristar Plastics Corporation | Hydrophobic Insulation Material |
| JP5610265B2 (ja) * | 2008-02-20 | 2014-10-22 | ダイキョーニシカワ株式会社 | 樹脂成形体 |
| ITMI20080773A1 (it) * | 2008-04-24 | 2009-10-25 | Moma S R L | Dispositivo per applicazioni termoidrauliche con migliorate proprieta anticalcare e relativo metodo di ottenimento |
| DE102008052098B4 (de) * | 2008-10-14 | 2013-04-04 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren zur Herstellung photokatalytisch aktiver Titandioxidschichten |
| US20100098885A1 (en) * | 2008-10-21 | 2010-04-22 | United Technologies Corporation | Plasma silanization support method and system |
| US20100098836A1 (en) * | 2008-10-21 | 2010-04-22 | United Technologies Corporation | Method and system for monitoring silane deposition |
| CN102300922B (zh) | 2009-01-30 | 2013-07-31 | 陶氏环球技术有限责任公司 | 聚合物组合物和具有改善美感的填充tpo制品 |
| PL2251453T3 (pl) | 2009-05-13 | 2014-05-30 | Sio2 Medical Products Inc | Uchwyt na pojemnik |
| US7985188B2 (en) * | 2009-05-13 | 2011-07-26 | Cv Holdings Llc | Vessel, coating, inspection and processing apparatus |
| DE102009030810B4 (de) * | 2009-06-26 | 2017-09-21 | Alanod Gmbh & Co. Kg | Beschichtung für einen optischen Reflektor |
| US9458536B2 (en) | 2009-07-02 | 2016-10-04 | Sio2 Medical Products, Inc. | PECVD coating methods for capped syringes, cartridges and other articles |
| US20110073251A1 (en) * | 2009-09-29 | 2011-03-31 | United Technologies Corporation | Component bonding preparation method |
| US11624115B2 (en) | 2010-05-12 | 2023-04-11 | Sio2 Medical Products, Inc. | Syringe with PECVD lubrication |
| US8802603B2 (en) | 2010-06-17 | 2014-08-12 | Becton, Dickinson And Company | Medical components having coated surfaces exhibiting low friction and low reactivity |
| US9878101B2 (en) | 2010-11-12 | 2018-01-30 | Sio2 Medical Products, Inc. | Cyclic olefin polymer vessels and vessel coating methods |
| FR2969162B1 (fr) * | 2010-12-21 | 2014-04-18 | Rhodia Operations | Article ignifuge a base de polyamide comprenant un revetement par traitement plasma |
| US9272095B2 (en) | 2011-04-01 | 2016-03-01 | Sio2 Medical Products, Inc. | Vessels, contact surfaces, and coating and inspection apparatus and methods |
| US8852693B2 (en) * | 2011-05-19 | 2014-10-07 | Liquipel Ip Llc | Coated electronic devices and associated methods |
| CN103732337B (zh) * | 2011-08-26 | 2017-03-08 | 埃克阿泰克有限责任公司 | 有机树脂层压板、制造和使用该有机树脂层压板的方法 |
| US11116695B2 (en) | 2011-11-11 | 2021-09-14 | Sio2 Medical Products, Inc. | Blood sample collection tube |
| EP2776603B1 (en) | 2011-11-11 | 2019-03-06 | SiO2 Medical Products, Inc. | PASSIVATION, pH PROTECTIVE OR LUBRICITY COATING FOR PHARMACEUTICAL PACKAGE, COATING PROCESS AND APPARATUS |
| WO2013165891A1 (en) * | 2012-05-03 | 2013-11-07 | 3M Innovative Properties Company | Durable solar mirror films |
| EP2846755A1 (en) | 2012-05-09 | 2015-03-18 | SiO2 Medical Products, Inc. | Saccharide protective coating for pharmaceutical package |
| US20150297800A1 (en) | 2012-07-03 | 2015-10-22 | Sio2 Medical Products, Inc. | SiOx BARRIER FOR PHARMACEUTICAL PACKAGE AND COATING PROCESS |
| WO2014071061A1 (en) | 2012-11-01 | 2014-05-08 | Sio2 Medical Products, Inc. | Coating inspection method |
| WO2014078666A1 (en) | 2012-11-16 | 2014-05-22 | Sio2 Medical Products, Inc. | Method and apparatus for detecting rapid barrier coating integrity characteristics |
| CN105705676B (zh) | 2012-11-30 | 2018-09-07 | Sio2医药产品公司 | 控制在医用注射器、药筒等上的pecvd沉积的均匀性 |
| US9764093B2 (en) | 2012-11-30 | 2017-09-19 | Sio2 Medical Products, Inc. | Controlling the uniformity of PECVD deposition |
| US20160015898A1 (en) | 2013-03-01 | 2016-01-21 | Sio2 Medical Products, Inc. | Plasma or cvd pre-treatment for lubricated pharmaceutical package, coating process and apparatus |
| CN110074968B (zh) | 2013-03-11 | 2021-12-21 | Sio2医药产品公司 | 涂布包装材料 |
| US9937099B2 (en) | 2013-03-11 | 2018-04-10 | Sio2 Medical Products, Inc. | Trilayer coated pharmaceutical packaging with low oxygen transmission rate |
| WO2014144926A1 (en) | 2013-03-15 | 2014-09-18 | Sio2 Medical Products, Inc. | Coating method |
| JP2015098617A (ja) * | 2013-11-18 | 2015-05-28 | 株式会社島津製作所 | 成膜装置 |
| US9435268B2 (en) * | 2014-03-24 | 2016-09-06 | General Electric Company | Methods of Si based ceramic components volatilization control in a gas turbine engine |
| US11066745B2 (en) | 2014-03-28 | 2021-07-20 | Sio2 Medical Products, Inc. | Antistatic coatings for plastic vessels |
| JP6294189B2 (ja) * | 2014-08-22 | 2018-03-14 | 本田技研工業株式会社 | 表面改質金属部材及びその製造方法 |
| EP3261605B2 (en) | 2015-02-26 | 2022-04-20 | SiO2 Medical Products, Inc. | Cycloolefin polymer container with a scratch resistant and anti-static coating |
| CA3204930A1 (en) | 2015-08-18 | 2017-02-23 | Sio2 Medical Products, Inc. | Pharmaceutical and other packaging with low oxygen transmission rate |
| CN110099877B (zh) * | 2016-12-20 | 2022-08-05 | 康宁股份有限公司 | 具有裂纹减缓的单和多层膜以保留制品强度和耐划痕性的玻璃基制品 |
| US20200171244A1 (en) * | 2017-05-24 | 2020-06-04 | Sio2 Medical Products, Inc. | Sterilizable pharmaceutical package for ophthalmic formulations |
| FR3091875B1 (fr) * | 2019-01-17 | 2021-09-24 | Innovative Systems Et Tech Isytech | Procédé et dispositif de traitement pour le dépôt d’un revêtement à effet barrière |
Family Cites Families (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CA1077787A (en) * | 1975-11-21 | 1980-05-20 | National Aeronautics And Space Administration | Abrasion resistant coatings for plastic surfaces |
| US4260647A (en) * | 1979-06-13 | 1981-04-07 | Rca Corporation | Method of depositing an abrasive layer |
| US4493855A (en) * | 1982-12-23 | 1985-01-15 | International Business Machines Corporation | Use of plasma polymerized organosilicon films in fabrication of lift-off masks |
| US4599243A (en) * | 1982-12-23 | 1986-07-08 | International Business Machines Corporation | Use of plasma polymerized organosilicon films in fabrication of lift-off masks |
| FR2540128B1 (fr) * | 1983-01-27 | 1986-02-21 | Rhone Poulenc Spec Chim | Compositions organopolysiloxaniques contenant des polyacyloxysilanes et durcissant tres rapidement en elastomeres en presence d'accelerateur du type hydroxyde metallique |
| EP0182367B1 (en) * | 1984-11-20 | 1990-04-18 | Hitachi Maxell Ltd. | Magnetic recording medium and production of the same |
| JPS61159426A (ja) * | 1984-12-28 | 1986-07-19 | Stanley Electric Co Ltd | プラズマ重合体膜の形成方法 |
| DE3521318A1 (de) * | 1985-06-14 | 1986-12-18 | Leybold-Heraeus GmbH, 5000 Köln | Verfahren und vorrichtung zum behandeln, insbesondere zum beschichten, von substraten mittels einer plasmaentladung |
| US4755426A (en) * | 1986-01-18 | 1988-07-05 | Hitachi Maxell, Ltd. | Magnetic recording medium and production of the same |
| DE3624467A1 (de) * | 1986-07-19 | 1988-01-28 | Leybold Heraeus Gmbh & Co Kg | Verfahren zum herstellen transparenter schutzschichten aus siliziumverbindungen |
| JP2560708B2 (ja) * | 1987-01-22 | 1996-12-04 | 株式会社ブリヂストン | プラスチツク表面の硬化保護膜及びその製造方法 |
| US4927704A (en) * | 1987-08-24 | 1990-05-22 | General Electric Company | Abrasion-resistant plastic articles and method for making them |
| US5041303A (en) * | 1988-03-07 | 1991-08-20 | Polyplasma Incorporated | Process for modifying large polymeric surfaces |
| US4894352A (en) * | 1988-10-26 | 1990-01-16 | Texas Instruments Inc. | Deposition of silicon-containing films using organosilicon compounds and nitrogen trifluoride |
| DE3838412A1 (de) * | 1988-11-12 | 1990-05-17 | Ara Werk Kraemer Gmbh & Co | Kaltvulkanisierbare siliconkautschukmasse, verfahren zu ihrer herstellung und verwendung |
| JP2854890B2 (ja) * | 1989-09-13 | 1999-02-10 | 東レ・ダウコーニング・シリコーン株式会社 | 気体分離膜 |
| JPH03108136A (ja) * | 1989-09-20 | 1991-05-08 | Sekisui Chem Co Ltd | 光情報記録媒体およびその製造方法 |
| JPH03126881A (ja) * | 1989-10-11 | 1991-05-30 | Ulvac Japan Ltd | マグネトロンエッチング装置 |
-
1992
- 1992-12-21 US US07/994,381 patent/US5298587A/en not_active Expired - Lifetime
-
1993
- 1993-08-27 US US08/112,723 patent/US5320875A/en not_active Expired - Lifetime
- 1993-10-05 EP EP19930923783 patent/EP0674722B1/en not_active Expired - Lifetime
- 1993-10-05 DE DE69318424T patent/DE69318424T2/de not_active Expired - Lifetime
- 1993-10-05 KR KR1020007015080A patent/KR100344334B1/ko not_active Expired - Lifetime
- 1993-10-05 JP JP51512394A patent/JP3488458B2/ja not_active Expired - Lifetime
- 1993-10-05 WO PCT/US1993/009528 patent/WO1994014998A1/en not_active Ceased
- 1993-10-05 KR KR1019950702547A patent/KR100299403B1/ko not_active Expired - Lifetime
- 1993-10-05 CA CA 2147486 patent/CA2147486C/en not_active Expired - Lifetime
- 1993-10-05 KR KR1020007015079A patent/KR100360579B1/ko not_active Expired - Lifetime
- 1993-11-05 TW TW82109289A patent/TW296394B/zh not_active IP Right Cessation
- 1993-11-05 MX MX9306910A patent/MX9306910A/es unknown
- 1993-11-05 TW TW085111463A patent/TW375536B/zh not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| TW375536B (en) | 1999-12-01 |
| DE69318424D1 (de) | 1998-06-10 |
| CA2147486C (en) | 2005-06-28 |
| CA2147486A1 (en) | 1994-07-07 |
| EP0674722B1 (en) | 1998-05-06 |
| MX9306910A (es) | 1994-06-30 |
| WO1994014998A1 (en) | 1994-07-07 |
| US5298587A (en) | 1994-03-29 |
| JPH08505186A (ja) | 1996-06-04 |
| KR100299403B1 (ko) | 2001-11-22 |
| KR100360579B1 (ko) | 2002-11-13 |
| EP0674722A1 (en) | 1995-10-04 |
| US5320875A (en) | 1994-06-14 |
| JP3488458B2 (ja) | 2004-01-19 |
| KR950704535A (ko) | 1995-11-20 |
| KR100344334B1 (ko) | 2002-07-22 |
| DE69318424T2 (de) | 1998-12-17 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| TW296394B (enExample) | ||
| US5433786A (en) | Apparatus for plasma enhanced chemical vapor deposition comprising shower head electrode with magnet disposed therein | |
| AU678681B2 (en) | Process for plasma-enhanced chemical vapor deposition of anti-fog and anti-scratch coatings onto various substrates | |
| US4842941A (en) | Method for forming abrasion-resistant polycarbonate articles, and articles of manufacture produced thereby | |
| JP2843670B2 (ja) | 低温プラズマ処理およびプライマー処理を用いる鋼基体のコーティング方法 | |
| CA2119561C (en) | Apparatus for rapid plasma treatments and method | |
| US5156882A (en) | Method of preparing UV absorbant and abrasion-resistant transparent plastic articles | |
| KR930011764B1 (ko) | 플라즈마 강화 산화 규소 필름 부착 방법 및 그를 위한 진공 시스템 | |
| KR100623540B1 (ko) | 코팅의 퇴적을 위한 제트 플라즈마 공정 및 장치 및그로부터 얻어진 코팅 | |
| US20030170605A1 (en) | Vapor deposited writing surfaces | |
| JPS62503107A (ja) | プラズマ放電による支持体の被覆法及びその装置 | |
| Kim et al. | Room-temperature deposition of a-SiC: H thin films by ion-assisted plasma-enhanced CVD | |
| JPH05504374A (ja) | 鋼防蝕のための低温プラズマ技術 | |
| JP3165143B2 (ja) | 薄膜被着方法及び装置 | |
| JPH05194770A (ja) | 表面被覆プラスチックス製品 | |
| JPH11256339A (ja) | 撥水性コーティング膜、防汚性物品、及び撥水性コーティング膜の製造方法 | |
| WO2006075490A1 (ja) | 透明ガスバリアフィルム | |
| JPS58222114A (ja) | 帯電防止処理方法 | |
| JPH061870A (ja) | 表面処理プラスチックス製品 | |
| EP4565727A1 (en) | Decoratively coated polymer substrates and process for obtaining the same | |
| JPH03223342A (ja) | 酸化ケイ素被覆合成樹脂成形体およびその製造方法 | |
| JPH04270736A (ja) | 硬化保護膜の形成方法 | |
| JPH02122070A (ja) | プラズマ処理−イオンプレーティング処理装置 | |
| Sekoguchi et al. | EVALUATION OF WATER REPELLENCY FOR SILICON OXIDE FILMS PREPARED BY RF PLASMA-ENTRANCED CVD | |
| JPH029017A (ja) | 帯電防止薄膜付き物品 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MK4A | Expiration of patent term of an invention patent |