JP2724993B2
(ja)
*
|
1995-08-31 |
1998-03-09 |
株式会社小松製作所 |
レーザ加工装置およびレーザ装置
|
JP3815578B2
(ja)
*
|
1996-07-19 |
2006-08-30 |
忠弘 大見 |
エキシマレーザー発振装置
|
US20080294152A1
(en)
*
|
1996-12-02 |
2008-11-27 |
Palomar Medical Technologies, Inc. |
Cooling System For A Photocosmetic Device
|
US6517532B1
(en)
|
1997-05-15 |
2003-02-11 |
Palomar Medical Technologies, Inc. |
Light energy delivery head
|
US8182473B2
(en)
|
1999-01-08 |
2012-05-22 |
Palomar Medical Technologies |
Cooling system for a photocosmetic device
|
EP0991372B1
(en)
|
1997-05-15 |
2004-08-04 |
Palomar Medical Technologies, Inc. |
Apparatus for dermatology treatment
|
DE19730028C2
(de)
*
|
1997-07-14 |
2002-12-12 |
Deutsche Telekom Ag |
Verfahren zum Trennen und Bearbeiten von auf einem Halbleitersubstrat im Verband hergestellten Halbleiterchips aus A III - B V- Verbindungshalbleitern unter Verwendung eines Excimer-Lasers
|
US6120725A
(en)
*
|
1997-07-25 |
2000-09-19 |
Matsushita Electric Works, Ltd. |
Method of forming a complex profile of uneven depressions in the surface of a workpiece by energy beam ablation
|
US6300594B1
(en)
|
1998-02-19 |
2001-10-09 |
Ricoh Microelectronics Company, Ltd. |
Method and apparatus for machining an electrically conductive film
|
EP1566149A1
(en)
|
1998-03-12 |
2005-08-24 |
Palomar Medical Technologies, Inc. |
System for electromagnetic radiation of the skin
|
KR100273717B1
(ko)
*
|
1998-04-09 |
2000-12-15 |
황해웅 |
레이저빔을 이용한 엔코더의 제조방법
|
EP1224999A4
(en)
*
|
1999-09-28 |
2007-05-02 |
Sumitomo Heavy Industries |
LASER BORING METHOD AND LASER DRILLING DEVICE
|
KR100355417B1
(ko)
*
|
2000-04-25 |
2002-10-11 |
안지양 |
레이저와 레이저마스크에 의한 회로기판의 회로 형성방법
|
US7636413B2
(en)
*
|
2002-04-16 |
2009-12-22 |
General Electric Company |
Method and apparatus of multi-energy imaging
|
US6987240B2
(en)
*
|
2002-04-18 |
2006-01-17 |
Applied Materials, Inc. |
Thermal flux processing by scanning
|
WO2004037287A2
(en)
|
2002-05-23 |
2004-05-06 |
Palomar Medical Technologies, Inc. |
Phototreatment device for use with coolants and topical substances
|
AU2003245573A1
(en)
|
2002-06-19 |
2004-01-06 |
Palomar Medical Technologies, Inc. |
Method and apparatus for treatment of cutaneous and subcutaneous conditions
|
JP4280509B2
(ja)
*
|
2003-01-31 |
2009-06-17 |
キヤノン株式会社 |
投影露光用マスク、投影露光用マスクの製造方法、投影露光装置および投影露光方法
|
US7065820B2
(en)
*
|
2003-06-30 |
2006-06-27 |
Nike, Inc. |
Article and method for laser-etching stratified materials
|
US7424783B2
(en)
*
|
2003-06-30 |
2008-09-16 |
Nike, Inc. |
Article of apparel incorporating a stratified material
|
JP2005144487A
(ja)
*
|
2003-11-13 |
2005-06-09 |
Seiko Epson Corp |
レーザ加工装置及びレーザ加工方法
|
JP4075893B2
(ja)
*
|
2004-05-21 |
2008-04-16 |
セイコーエプソン株式会社 |
水晶振動子の製造方法、その装置及び水晶振動子
|
JP4688525B2
(ja)
*
|
2004-09-27 |
2011-05-25 |
株式会社 日立ディスプレイズ |
パターン修正装置および表示装置の製造方法
|
AU2005314712A1
(en)
*
|
2004-12-09 |
2006-06-15 |
Palomar Medical Technologies, Inc. |
Oral appliance with heat transfer mechanism
|
US7856985B2
(en)
|
2005-04-22 |
2010-12-28 |
Cynosure, Inc. |
Method of treatment body tissue using a non-uniform laser beam
|
KR100712215B1
(ko)
*
|
2005-08-25 |
2007-04-27 |
삼성에스디아이 주식회사 |
레이저 열전사용 마스크 및 그를 이용한 레이저 열전사방법
|
US8346347B2
(en)
*
|
2005-09-15 |
2013-01-01 |
Palomar Medical Technologies, Inc. |
Skin optical characterization device
|
GB2438601B
(en)
*
|
2006-05-24 |
2008-04-09 |
Exitech Ltd |
Method and unit for micro-structuring a moving substrate
|
US7586957B2
(en)
|
2006-08-02 |
2009-09-08 |
Cynosure, Inc |
Picosecond laser apparatus and methods for its operation and use
|
JP2008073711A
(ja)
*
|
2006-09-20 |
2008-04-03 |
Disco Abrasive Syst Ltd |
ビアホールの加工方法
|
US8237085B2
(en)
*
|
2006-11-17 |
2012-08-07 |
Semiconductor Energy Laboratory Co., Ltd. |
Beam homogenizer, laser irradiation apparatus, and laser irradiation method
|
US9919168B2
(en)
|
2009-07-23 |
2018-03-20 |
Palomar Medical Technologies, Inc. |
Method for improvement of cellulite appearance
|
CN102626829A
(zh)
*
|
2011-08-16 |
2012-08-08 |
北京京东方光电科技有限公司 |
基板的激光修复装置以及激光修复方法
|
EP2839552A4
(en)
|
2012-04-18 |
2015-12-30 |
Cynosure Inc |
PICOSCOPE LASER DEVICE AND METHOD FOR THE TREATMENT OF TARGET FABRICS THEREWITH
|
WO2014145707A2
(en)
|
2013-03-15 |
2014-09-18 |
Cynosure, Inc. |
Picosecond optical radiation systems and methods of use
|
KR102081286B1
(ko)
*
|
2013-04-16 |
2020-04-16 |
삼성디스플레이 주식회사 |
레이저 열전사 장치, 레이저 열전사 방법 및 이를 이용한 유기발광 디스플레이 장치 제조방법
|
KR101531817B1
(ko)
*
|
2014-07-17 |
2015-06-25 |
주식회사 엘아이에스 |
렌즈 어레이 오차 보상장치
|
CN106425126B
(zh)
*
|
2016-11-11 |
2017-12-29 |
盐城工学院 |
一种多层印刷电路板飞秒激光打孔装置及其打孔方法
|
US11418000B2
(en)
|
2018-02-26 |
2022-08-16 |
Cynosure, Llc |
Q-switched cavity dumped sub-nanosecond laser
|
KR102280424B1
(ko)
*
|
2019-09-23 |
2021-07-22 |
(주)엔피에스 |
널링 가공 장치
|
CN111438140B
(zh)
*
|
2019-12-29 |
2021-09-07 |
武汉光谷航天三江激光产业技术研究院有限公司 |
一种适用于丝材、棒料的激光清洗方法与装置
|
CN113146042B
(zh)
*
|
2021-03-12 |
2022-10-18 |
中国工程物理研究院材料研究所 |
一种能有效减少焊接孔洞的激光焊接B4C/Al的方法
|
EP4417356A4
(en)
*
|
2021-10-15 |
2025-08-20 |
Shin Etsu Eng Co Ltd |
PROCESSING DEVICE, PROCESSING METHOD, AND SUBSTRATE MANUFACTURING METHOD
|
WO2024218894A1
(ja)
*
|
2023-04-19 |
2024-10-24 |
信越エンジニアリング株式会社 |
加工装置、加工方法及び基板の製造方法
|