TW214014B - - Google Patents
Download PDFInfo
- Publication number
- TW214014B TW214014B TW081108461A TW81108461A TW214014B TW 214014 B TW214014 B TW 214014B TW 081108461 A TW081108461 A TW 081108461A TW 81108461 A TW81108461 A TW 81108461A TW 214014 B TW214014 B TW 214014B
- Authority
- TW
- Taiwan
- Prior art keywords
- layer
- coating
- silicon dioxide
- oxide
- static
- Prior art date
Links
- 239000010410 layer Substances 0.000 claims description 137
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 83
- 238000000576 coating method Methods 0.000 claims description 51
- 239000011248 coating agent Substances 0.000 claims description 48
- 239000000377 silicon dioxide Substances 0.000 claims description 36
- 235000012239 silicon dioxide Nutrition 0.000 claims description 35
- PAZHGORSDKKUPI-UHFFFAOYSA-N lithium metasilicate Chemical compound [Li+].[Li+].[O-][Si]([O-])=O PAZHGORSDKKUPI-UHFFFAOYSA-N 0.000 claims description 21
- 229910052912 lithium silicate Inorganic materials 0.000 claims description 21
- 238000000034 method Methods 0.000 claims description 20
- 239000000758 substrate Substances 0.000 claims description 17
- 238000004519 manufacturing process Methods 0.000 claims description 16
- 230000003667 anti-reflective effect Effects 0.000 claims description 14
- -1 alkyl silane compound Chemical class 0.000 claims description 11
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 10
- 229910044991 metal oxide Inorganic materials 0.000 claims description 9
- 150000004706 metal oxides Chemical class 0.000 claims description 9
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 8
- KZNMRPQBBZBTSW-UHFFFAOYSA-N [Au]=O Chemical compound [Au]=O KZNMRPQBBZBTSW-UHFFFAOYSA-N 0.000 claims description 8
- 229910001922 gold oxide Inorganic materials 0.000 claims description 8
- 239000000725 suspension Substances 0.000 claims description 6
- FUJCRWPEOMXPAD-UHFFFAOYSA-N lithium oxide Chemical compound [Li+].[Li+].[O-2] FUJCRWPEOMXPAD-UHFFFAOYSA-N 0.000 claims description 5
- 229910001947 lithium oxide Inorganic materials 0.000 claims description 5
- 239000000203 mixture Substances 0.000 claims description 5
- 230000000694 effects Effects 0.000 claims description 4
- MOKOTFSFGJIJQM-UHFFFAOYSA-N O=[Au]=O Chemical compound O=[Au]=O MOKOTFSFGJIJQM-UHFFFAOYSA-N 0.000 claims description 3
- 230000001476 alcoholic effect Effects 0.000 claims description 3
- 239000011241 protective layer Substances 0.000 claims description 3
- 229910002027 silica gel Inorganic materials 0.000 claims description 3
- 239000000741 silica gel Substances 0.000 claims description 3
- 230000002079 cooperative effect Effects 0.000 claims description 2
- 229910052814 silicon oxide Inorganic materials 0.000 claims 1
- 239000000463 material Substances 0.000 description 12
- 239000000975 dye Substances 0.000 description 10
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 4
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- ADCOVFLJGNWWNZ-UHFFFAOYSA-N antimony trioxide Chemical compound O=[Sb]O[Sb]=O ADCOVFLJGNWWNZ-UHFFFAOYSA-N 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 229910052744 lithium Inorganic materials 0.000 description 3
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 2
- 125000005103 alkyl silyl group Chemical group 0.000 description 2
- 238000009503 electrostatic coating Methods 0.000 description 2
- 150000002344 gold compounds Chemical class 0.000 description 2
- VTRUBDSFZJNXHI-UHFFFAOYSA-N oxoantimony Chemical compound [Sb]=O VTRUBDSFZJNXHI-UHFFFAOYSA-N 0.000 description 2
- 230000002829 reductive effect Effects 0.000 description 2
- 239000004576 sand Substances 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- 238000004528 spin coating Methods 0.000 description 2
- 239000008399 tap water Substances 0.000 description 2
- 235000020679 tap water Nutrition 0.000 description 2
- QHGNHLZPVBIIPX-UHFFFAOYSA-N tin(II) oxide Inorganic materials [Sn]=O QHGNHLZPVBIIPX-UHFFFAOYSA-N 0.000 description 2
- 239000004408 titanium dioxide Substances 0.000 description 2
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 1
- 240000005979 Hordeum vulgare Species 0.000 description 1
- 235000007340 Hordeum vulgare Nutrition 0.000 description 1
- 235000003140 Panax quinquefolius Nutrition 0.000 description 1
- 240000005373 Panax quinquefolius Species 0.000 description 1
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 150000001343 alkyl silanes Chemical class 0.000 description 1
- 239000006117 anti-reflective coating Substances 0.000 description 1
- 230000000703 anti-shock Effects 0.000 description 1
- 229910000410 antimony oxide Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical group [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000033228 biological regulation Effects 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 150000001721 carbon Chemical group 0.000 description 1
- JBTHDAVBDKKSRW-UHFFFAOYSA-N chembl1552233 Chemical compound CC1=CC(C)=CC=C1N=NC1=C(O)C=CC2=CC=CC=C12 JBTHDAVBDKKSRW-UHFFFAOYSA-N 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 239000002019 doping agent Substances 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- GLNWILHOFOBOFD-UHFFFAOYSA-N lithium sulfide Chemical compound [Li+].[Li+].[S-2] GLNWILHOFOBOFD-UHFFFAOYSA-N 0.000 description 1
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 description 1
- 229910001635 magnesium fluoride Inorganic materials 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000002736 metal compounds Chemical class 0.000 description 1
- 239000004570 mortar (masonry) Substances 0.000 description 1
- VMGAPWLDMVPYIA-HIDZBRGKSA-N n'-amino-n-iminomethanimidamide Chemical compound N\N=C\N=N VMGAPWLDMVPYIA-HIDZBRGKSA-N 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 150000002941 palladium compounds Chemical class 0.000 description 1
- 230000036961 partial effect Effects 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- BOLDJAUMGUJJKM-LSDHHAIUSA-N renifolin D Natural products CC(=C)[C@@H]1Cc2c(O)c(O)ccc2[C@H]1CC(=O)c3ccc(O)cc3O BOLDJAUMGUJJKM-LSDHHAIUSA-N 0.000 description 1
- 230000002441 reversible effect Effects 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- UHCGLDSRFKGERO-UHFFFAOYSA-N strontium peroxide Chemical compound [Sr+2].[O-][O-] UHCGLDSRFKGERO-UHFFFAOYSA-N 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 239000003760 tallow Substances 0.000 description 1
- 235000002906 tartaric acid Nutrition 0.000 description 1
- 239000011975 tartaric acid Substances 0.000 description 1
- ZCUFMDLYAMJYST-UHFFFAOYSA-N thorium dioxide Chemical compound O=[Th]=O ZCUFMDLYAMJYST-UHFFFAOYSA-N 0.000 description 1
- 229910003452 thorium oxide Inorganic materials 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
Landscapes
- Surface Treatment Of Optical Elements (AREA)
- Formation Of Various Coating Films On Cathode Ray Tubes And Lamps (AREA)
- Vessels, Lead-In Wires, Accessory Apparatuses For Cathode-Ray Tubes (AREA)
- Paints Or Removers (AREA)
- Transforming Electric Information Into Light Information (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP91202744 | 1991-10-23 |
Publications (1)
Publication Number | Publication Date |
---|---|
TW214014B true TW214014B (ja) | 1993-10-01 |
Family
ID=8207957
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW081108461A TW214014B (ja) | 1991-10-23 | 1992-10-23 |
Country Status (3)
Country | Link |
---|---|
JP (1) | JPH05234538A (ja) |
DE (1) | DE69207338T2 (ja) |
TW (1) | TW214014B (ja) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3563236B2 (ja) | 1996-09-26 | 2004-09-08 | 触媒化成工業株式会社 | 透明導電性被膜形成用塗布液、透明導電性被膜付基材およびその製造方法、表示装置 |
CN107507929B (zh) * | 2017-08-04 | 2019-04-16 | 武汉华星光电半导体显示技术有限公司 | Oled显示面板的柔性基底及其制备方法 |
-
1992
- 1992-10-15 DE DE69207338T patent/DE69207338T2/de not_active Expired - Fee Related
- 1992-10-22 JP JP4284596A patent/JPH05234538A/ja active Pending
- 1992-10-23 TW TW081108461A patent/TW214014B/zh active
Also Published As
Publication number | Publication date |
---|---|
JPH05234538A (ja) | 1993-09-10 |
DE69207338T2 (de) | 1996-07-25 |
DE69207338D1 (de) | 1996-02-15 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS6163545A (ja) | コーチングガラスおよびその製法 | |
TW214014B (ja) | ||
JP3697760B2 (ja) | 塗布液 | |
JP3219450B2 (ja) | 導電膜の製造方法、低反射導電膜とその製造方法 | |
JPH087798A (ja) | 静電気防止及び光吸収被膜を有する表示スクリーンを備えた表示装置及び被膜の製造方法 | |
JPH0859240A (ja) | 低次酸化チタン粉末 | |
JP3347467B2 (ja) | 着色薄膜形成用塗布液、着色薄膜とその製造方法、およびガラス物品 | |
EP0538937B1 (en) | Antireflective and antistatic coating for, in particular, a cathode ray tube | |
JPH0854502A (ja) | 着色低抵抗膜形成用塗布液、着色低抵抗膜及び着色低抵抗膜を形成したガラス物品 | |
JP3449123B2 (ja) | 低抵抗膜又は低屈折率膜形成用塗布液、及び、低抵抗膜又は低反射低屈折率膜の製造方法 | |
JPH07235220A (ja) | 透明導電性基板およびその作製方法 | |
JP3288417B2 (ja) | 低反射導電膜が形成されたブラウン管パネル及びその製造方法 | |
JP3544687B2 (ja) | 塗布液、着色膜およびその製造方法 | |
JPH0782527A (ja) | 着色膜形成用塗布液、着色膜およびその製造方法 | |
JPH0762323A (ja) | 着色膜形成用塗布液、着色膜およびその製造方法 | |
Oesterlein et al. | Optical dispersion in electron-beam-evaporated indium tin oxide thin films | |
JPH0789720A (ja) | 着色膜形成用塗布液、着色膜、着色帯電防止膜、および着色低反射帯電防止膜 | |
JP3651983B2 (ja) | 低抵抗膜形成用塗布液、低抵抗膜とその製造方法、多層低抵抗膜及びガラス物品 | |
JPH07281004A (ja) | 着色低抵抗膜形成用塗布液、着色低抵抗膜、及びその製造方法 | |
JP2851068B2 (ja) | 帯電防止膜及び陰極線管 | |
JPH05270864A (ja) | 低屈折率膜、低反射膜、及び低反射帯電防止膜 | |
JP2003306615A (ja) | 低抵抗膜又は低屈折率膜形成用塗布液、及び、低抵抗膜又は低反射低抵抗膜の製造方法 | |
JP2008216568A (ja) | 反射防止性・近赤外線遮蔽性積層体及びその製造方法 | |
JP3484903B2 (ja) | 低抵抗膜形成用塗布液、低抵抗膜とその製造方法、及び低反射低抵抗膜とその製造方法 | |
JPH08208274A (ja) | 着色膜形成用塗布液、着色膜及び着色膜を形成したガラス物品 |