TW202302528A - 化合物、酸產生劑、組合物、硬化物、硬化物之製造方法、圖案及圖案之製造方法 - Google Patents
化合物、酸產生劑、組合物、硬化物、硬化物之製造方法、圖案及圖案之製造方法 Download PDFInfo
- Publication number
- TW202302528A TW202302528A TW111113806A TW111113806A TW202302528A TW 202302528 A TW202302528 A TW 202302528A TW 111113806 A TW111113806 A TW 111113806A TW 111113806 A TW111113806 A TW 111113806A TW 202302528 A TW202302528 A TW 202302528A
- Authority
- TW
- Taiwan
- Prior art keywords
- group
- mentioned
- carbon atoms
- substituted
- unsubstituted
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C309/00—Sulfonic acids; Halides, esters, or anhydrides thereof
- C07C309/63—Esters of sulfonic acids
- C07C309/64—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to acyclic carbon atoms
- C07C309/65—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to acyclic carbon atoms of a saturated carbon skeleton
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D209/00—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
- C07D209/56—Ring systems containing three or more rings
- C07D209/80—[b, c]- or [b, d]-condensed
- C07D209/82—Carbazoles; Hydrogenated carbazoles
- C07D209/86—Carbazoles; Hydrogenated carbazoles with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to carbon atoms of the ring system
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Liquid Crystal (AREA)
- Materials For Photolithography (AREA)
- Indole Compounds (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2021-072876 | 2021-04-22 | ||
JP2021072876 | 2021-04-22 |
Publications (1)
Publication Number | Publication Date |
---|---|
TW202302528A true TW202302528A (zh) | 2023-01-16 |
Family
ID=83722924
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW111113806A TW202302528A (zh) | 2021-04-22 | 2022-04-12 | 化合物、酸產生劑、組合物、硬化物、硬化物之製造方法、圖案及圖案之製造方法 |
Country Status (3)
Country | Link |
---|---|
JP (1) | JPWO2022224835A1 (fr) |
TW (1) | TW202302528A (fr) |
WO (1) | WO2022224835A1 (fr) |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103389621B (zh) * | 2013-07-26 | 2016-03-16 | 常州强力先端电子材料有限公司 | 一种磺酸肟酯类光产酸剂 |
KR20220061910A (ko) * | 2019-09-10 | 2022-05-13 | 가부시키가이샤 아데카 | 화합물, 산 발생제, 조성물, 경화물 및 패턴, 그리고 경화물 및 패턴의 제조 방법 |
KR20220061909A (ko) * | 2019-09-10 | 2022-05-13 | 가부시키가이샤 아데카 | 화합물, 산 발생제, 조성물, 경화물 및 패턴, 그리고 경화물 및 패턴의 제조 방법 |
JPWO2021125132A1 (fr) * | 2019-12-20 | 2021-06-24 |
-
2022
- 2022-04-07 WO PCT/JP2022/017251 patent/WO2022224835A1/fr active Application Filing
- 2022-04-07 JP JP2023516436A patent/JPWO2022224835A1/ja active Pending
- 2022-04-12 TW TW111113806A patent/TW202302528A/zh unknown
Also Published As
Publication number | Publication date |
---|---|
WO2022224835A1 (fr) | 2022-10-27 |
JPWO2022224835A1 (fr) | 2022-10-27 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR102191331B1 (ko) | 신규 술폰산 유도체 화합물, 광산발생제, 양이온 중합 개시제, 레지스트 조성물 및 양이온 중합성 조성물 | |
TWI746496B (zh) | 黑柱間隔件用感光性樹脂組成物、黑柱間隔件、顯示裝置、及黑柱間隔件之形成方法 | |
US11754920B2 (en) | Thermal acid generator and resist composition using same | |
TWI723705B (zh) | 咔唑多β-肟酯衍生化合物以及包含其之光聚合起始劑及光阻組成物 | |
TW202116728A (zh) | 化合物、酸產生劑、組合物、硬化物及圖案、以及硬化物及圖案之製造方法 | |
TWI605317B (zh) | Method for producing resin structure for microstructure and method for producing microstructure | |
TW201319749A (zh) | 正型感光性樹脂組成物、硬化物的製造方法、樹脂圖案製造方法、硬化物及光學構件 | |
JP2014081625A (ja) | 化学増幅ポジ型レジスト材料及びパターン形成方法 | |
JP7525991B2 (ja) | 表面修飾金属酸化物微粒子の製造方法、改質金属酸化物微粒子の製造方法、表面修飾金属酸化物微粒子、及び金属酸化物微粒子分散液 | |
JP2015163672A (ja) | 組成物 | |
TW202116731A (zh) | 化合物、酸產生劑、組合物、硬化物及圖案、以及硬化物及圖案之製造方法 | |
JP2017066370A (ja) | 組成物 | |
TW202104185A (zh) | 胺甲醯肟化合物以及含有該化合物之聚合起始劑及聚合性組合物 | |
TW202302528A (zh) | 化合物、酸產生劑、組合物、硬化物、硬化物之製造方法、圖案及圖案之製造方法 | |
TW201542611A (zh) | 聚合物、感光性樹脂組成物及電子裝置 | |
TWI703129B (zh) | 咔唑肟酯衍生化合物以及含有其的光聚合起始劑及感光性組成物 | |
KR20220157365A (ko) | 화합물, 조성물, 경화물 및 경화물의 제조 방법 | |
WO2021220919A1 (fr) | Procédé de fabrication de microparticules d'oxyde métallique modifiées, procédé de fabrication de dispersion liquide de microparticules d'oxyde métallique modifiées, et procédé de fabrication d'article solide | |
JP2006154037A (ja) | ネガ型感光性樹脂組成物、それから形成された透明硬化膜、および硬化膜を有する素子 | |
TW202204353A (zh) | 化合物、起始劑、組合物、硬化物及硬化物之製造方法 | |
WO2024195504A1 (fr) | Composé, composition, produit durci et motif | |
TW202035360A (zh) | 化合物、酸產生劑、組合物、硬化物、硬化物之製造方法及圖案塗膜之製造方法 | |
WO2020230732A1 (fr) | Composition, produit durci, procédé de production de produit durci et additif | |
JP2023110696A (ja) | 化合物、酸発生剤、組成物、硬化物、硬化物の製造方法、パターン及びパターンの製造方法 | |
TW201833085A (zh) | 正型感光性組成物、使用此之圖型及圖型之製造方法 |