TW202120464A - 抗蝕劑底層膜形成用組成物、圖案形成方法、及電子器件的製造方法 - Google Patents
抗蝕劑底層膜形成用組成物、圖案形成方法、及電子器件的製造方法 Download PDFInfo
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- 238000009966 trimming Methods 0.000 description 1
- 239000010457 zeolite Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2019-217608 | 2019-11-29 | ||
| JP2019217608 | 2019-11-29 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW202120464A true TW202120464A (zh) | 2021-06-01 |
Family
ID=76130175
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW109140190A TW202120464A (zh) | 2019-11-29 | 2020-11-18 | 抗蝕劑底層膜形成用組成物、圖案形成方法、及電子器件的製造方法 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JPWO2021106536A1 (https=) |
| TW (1) | TW202120464A (https=) |
| WO (1) | WO2021106536A1 (https=) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI860529B (zh) * | 2021-07-06 | 2024-11-01 | 日商信越化學工業股份有限公司 | 密合膜形成材料、使用其之密合膜之形成方法、及使用了密合膜形成材料之圖案形成方法 |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN117980823A (zh) * | 2021-09-24 | 2024-05-03 | 日产化学株式会社 | 抗蚀剂下层膜形成用组合物 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3895224B2 (ja) * | 2001-12-03 | 2007-03-22 | 東京応化工業株式会社 | ポジ型レジスト組成物及びそれを用いたレジストパターン形成方法 |
| JP5481979B2 (ja) * | 2009-07-15 | 2014-04-23 | Ｊｓｒ株式会社 | 感放射線性樹脂組成物及びそれに用いられる重合体 |
| US9440899B2 (en) * | 2014-12-15 | 2016-09-13 | Rohm And Haas Electronic Materials Llc | Purification method |
| TWI699617B (zh) * | 2015-11-10 | 2020-07-21 | 日商富士軟片股份有限公司 | 著色組成物、彩色濾光片、圖案形成方法、固體攝像元件及圖像顯示裝置 |
| JP7196389B2 (ja) * | 2016-08-10 | 2022-12-27 | Jsr株式会社 | 半導体用レジスト下層膜形成組成物、レジスト下層膜、レジスト下層膜の形成方法及びパターニング基板の製造方法 |
-
2020
- 2020-11-09 JP JP2021561266A patent/JPWO2021106536A1/ja not_active Abandoned
- 2020-11-09 WO PCT/JP2020/041715 patent/WO2021106536A1/ja not_active Ceased
- 2020-11-18 TW TW109140190A patent/TW202120464A/zh unknown
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI860529B (zh) * | 2021-07-06 | 2024-11-01 | 日商信越化學工業股份有限公司 | 密合膜形成材料、使用其之密合膜之形成方法、及使用了密合膜形成材料之圖案形成方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2021106536A1 (ja) | 2021-06-03 |
| JPWO2021106536A1 (https=) | 2021-06-03 |
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