JPWO2021106536A1 - - Google Patents
Info
- Publication number
- JPWO2021106536A1 JPWO2021106536A1 JP2021561266A JP2021561266A JPWO2021106536A1 JP WO2021106536 A1 JPWO2021106536 A1 JP WO2021106536A1 JP 2021561266 A JP2021561266 A JP 2021561266A JP 2021561266 A JP2021561266 A JP 2021561266A JP WO2021106536 A1 JPWO2021106536 A1 JP WO2021106536A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2019217608 | 2019-11-29 | ||
| PCT/JP2020/041715 WO2021106536A1 (ja) | 2019-11-29 | 2020-11-09 | レジスト下層膜形成用組成物、パターン形成方法、及び、電子デバイスの製造方法 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPWO2021106536A1 true JPWO2021106536A1 (https=) | 2021-06-03 |
Family
ID=76130175
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2021561266A Abandoned JPWO2021106536A1 (https=) | 2019-11-29 | 2020-11-09 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JPWO2021106536A1 (https=) |
| TW (1) | TW202120464A (https=) |
| WO (1) | WO2021106536A1 (https=) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7611785B2 (ja) * | 2021-07-06 | 2025-01-10 | 信越化学工業株式会社 | 密着膜形成材料、これを用いた密着膜の形成方法、及び密着膜形成材料を用いたパターン形成方法 |
| CN117980823A (zh) * | 2021-09-24 | 2024-05-03 | 日产化学株式会社 | 抗蚀剂下层膜形成用组合物 |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003241385A (ja) * | 2001-12-03 | 2003-08-27 | Tokyo Ohka Kogyo Co Ltd | ポジ型レジスト組成物及びそれを用いたレジストパターン形成方法 |
| JP2011022348A (ja) * | 2009-07-15 | 2011-02-03 | Jsr Corp | 感放射線性樹脂組成物及びそれに用いられる重合体 |
| JP2016135756A (ja) * | 2014-12-15 | 2016-07-28 | ローム アンド ハース エレクトロニック マテリアルズ エルエルシーＲｏｈｍ ａｎｄ Ｈａａｓ Ｅｌｅｃｔｒｏｎｉｃ Ｍａｔｅｒｉａｌｓ ＬＬＣ | 精製方法 |
| JP2019020701A (ja) * | 2016-08-10 | 2019-02-07 | Jsr株式会社 | 半導体用レジスト下層膜形成組成物、レジスト下層膜、レジスト下層膜の形成方法及びパターニング基板の製造方法 |
| JP6574849B2 (ja) * | 2015-11-10 | 2019-09-11 | 富士フイルム株式会社 | 着色組成物、カラーフィルタ、パターン形成方法、固体撮像素子、および、画像表示装置 |
-
2020
- 2020-11-09 JP JP2021561266A patent/JPWO2021106536A1/ja not_active Abandoned
- 2020-11-09 WO PCT/JP2020/041715 patent/WO2021106536A1/ja not_active Ceased
- 2020-11-18 TW TW109140190A patent/TW202120464A/zh unknown
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003241385A (ja) * | 2001-12-03 | 2003-08-27 | Tokyo Ohka Kogyo Co Ltd | ポジ型レジスト組成物及びそれを用いたレジストパターン形成方法 |
| JP2011022348A (ja) * | 2009-07-15 | 2011-02-03 | Jsr Corp | 感放射線性樹脂組成物及びそれに用いられる重合体 |
| JP2016135756A (ja) * | 2014-12-15 | 2016-07-28 | ローム アンド ハース エレクトロニック マテリアルズ エルエルシーＲｏｈｍ ａｎｄ Ｈａａｓ Ｅｌｅｃｔｒｏｎｉｃ Ｍａｔｅｒｉａｌｓ ＬＬＣ | 精製方法 |
| JP6574849B2 (ja) * | 2015-11-10 | 2019-09-11 | 富士フイルム株式会社 | 着色組成物、カラーフィルタ、パターン形成方法、固体撮像素子、および、画像表示装置 |
| JP2019020701A (ja) * | 2016-08-10 | 2019-02-07 | Jsr株式会社 | 半導体用レジスト下層膜形成組成物、レジスト下層膜、レジスト下層膜の形成方法及びパターニング基板の製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2021106536A1 (ja) | 2021-06-03 |
| TW202120464A (zh) | 2021-06-01 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20220304 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20230117 |
|
| A762 | Written abandonment of application |
Free format text: JAPANESE INTERMEDIATE CODE: A762 Effective date: 20230224 |