TW202105416A - 結晶化銦錫複合氧化物膜、透明導電性膜及其製造方法 - Google Patents

結晶化銦錫複合氧化物膜、透明導電性膜及其製造方法 Download PDF

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Publication number
TW202105416A
TW202105416A TW109121069A TW109121069A TW202105416A TW 202105416 A TW202105416 A TW 202105416A TW 109121069 A TW109121069 A TW 109121069A TW 109121069 A TW109121069 A TW 109121069A TW 202105416 A TW202105416 A TW 202105416A
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TW
Taiwan
Prior art keywords
composite oxide
indium tin
tin composite
film
oxide film
Prior art date
Application number
TW109121069A
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English (en)
Chinese (zh)
Inventor
竹下翔也
安藤豪彥
Original Assignee
日商日東電工股份有限公司
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Application filed by 日商日東電工股份有限公司 filed Critical 日商日東電工股份有限公司
Publication of TW202105416A publication Critical patent/TW202105416A/zh

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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/04—Coating
    • C08J7/044—Forming conductive coatings; Forming coatings having anti-static properties
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B7/00—Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
    • B32B7/02—Physical, chemical or physicochemical properties
    • B32B7/025—Electric or magnetic properties
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B9/00—Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/18—Manufacture of films or sheets
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/04—Coating
    • C08J7/06—Coating with compositions not containing macromolecular substances
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/086—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58—After-treatment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B13/00—Apparatus or processes specially adapted for manufacturing conductors or cables
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B5/00—Non-insulated conductors or conductive bodies characterised by their form
    • H01B5/14—Non-insulated conductors or conductive bodies characterised by their form comprising conductive layers or films on insulating-supports

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Mechanical Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Manufacturing & Machinery (AREA)
  • Non-Insulated Conductors (AREA)
  • Laminated Bodies (AREA)
TW109121069A 2019-06-27 2020-06-22 結晶化銦錫複合氧化物膜、透明導電性膜及其製造方法 TW202105416A (zh)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2019120185 2019-06-27
JP2019-120185 2019-06-27
PCT/JP2020/023276 WO2020262047A1 (fr) 2019-06-27 2020-06-12 Film d'oxyde composite d'indium-étain cristallisé, film conducteur électrique transparent, et son procédé de production
WOPCT/JP2020/023276 2020-06-12

Publications (1)

Publication Number Publication Date
TW202105416A true TW202105416A (zh) 2021-02-01

Family

ID=74061898

Family Applications (1)

Application Number Title Priority Date Filing Date
TW109121069A TW202105416A (zh) 2019-06-27 2020-06-22 結晶化銦錫複合氧化物膜、透明導電性膜及其製造方法

Country Status (5)

Country Link
JP (1) JP7509690B2 (fr)
KR (1) KR20220029549A (fr)
CN (1) CN114040842A (fr)
TW (1) TW202105416A (fr)
WO (1) WO2020262047A1 (fr)

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5088256B2 (ja) 2008-07-16 2012-12-05 富士通株式会社 携帯型無線機および携帯型無線機のアンテナエレメント選択方法
JP4888603B2 (ja) * 2009-10-19 2012-02-29 東洋紡績株式会社 透明導電性フィルム
JP5447098B2 (ja) * 2010-03-31 2014-03-19 三菱マテリアル株式会社 Ｉｔｏ透明導電膜の形成方法
JP5244950B2 (ja) * 2011-10-06 2013-07-24 日東電工株式会社 透明導電性フィルム
JP2013152827A (ja) 2012-01-24 2013-08-08 Kaneka Corp 透明電極付き基板およびその製造方法
WO2013172055A1 (fr) 2012-05-17 2013-11-21 株式会社カネカ Substrat ayant une électrode transparente, procédé de fabrication de ce dernier et écran tactile
JP6057450B2 (ja) 2012-05-24 2017-01-11 住友化学株式会社 Ｉｔｏ透明導電膜付き基板およびその製造方法
JPWO2014115770A1 (ja) 2013-01-24 2017-01-26 住友金属鉱山株式会社 透明導電性基材ならびにその製造方法
WO2014157312A1 (fr) * 2013-03-29 2014-10-02 株式会社カネカ Film stratifié conducteur et transparent, ainsi que procédé de fabrication de celui-ci
WO2016072441A1 (fr) 2014-11-07 2016-05-12 Ｊｘ金属株式会社 Cible de pulvérisation d'ito et procédé pour la fabriquer, film électroconducteur transparent d'ito, et procédé de fabrication de film électroconducteur transparent d'ito
JP6654865B2 (ja) * 2015-11-12 2020-02-26 日東電工株式会社 非晶質透明導電性フィルム、ならびに、結晶質透明導電性フィルムおよびその製造方法
JP6953204B2 (ja) * 2017-07-04 2021-10-27 日東電工株式会社 透明導電性フィルム及びタッチパネル
CN109267009B (zh) * 2018-08-31 2020-12-15 株洲火炬安泰新材料有限公司 一种抗低温高电阻率ito导电膜制备方法

Also Published As

Publication number Publication date
CN114040842A (zh) 2022-02-11
KR20220029549A (ko) 2022-03-08
JPWO2020262047A1 (fr) 2020-12-30
WO2020262047A1 (fr) 2020-12-30
JP7509690B2 (ja) 2024-07-02

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