TW202039891A - Rolled copper foil for flexible printed substrate, flexible copper-clad laminate and flexible printed circuit substrate stably obtaining excellent flexibility and particularly excellent suture foldability regardless of heating conditions - Google Patents

Rolled copper foil for flexible printed substrate, flexible copper-clad laminate and flexible printed circuit substrate stably obtaining excellent flexibility and particularly excellent suture foldability regardless of heating conditions Download PDF

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TW202039891A
TW202039891A TW109104461A TW109104461A TW202039891A TW 202039891 A TW202039891 A TW 202039891A TW 109104461 A TW109104461 A TW 109104461A TW 109104461 A TW109104461 A TW 109104461A TW 202039891 A TW202039891 A TW 202039891A
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copper foil
flexible printed
flexible
copper
printed circuit
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TWI717998B (en
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工藤雄大
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日商Jx金屬股份有限公司
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    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/02Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/022Processes for manufacturing precursors of printed circuits, i.e. copper-clad substrates
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22FCHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
    • C22F1/00Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
    • C22F1/08Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working of copper or alloys based thereon
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B15/00Layered products comprising a layer of metal
    • B32B15/04Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B32B15/08Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C9/00Alloys based on copper
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/0277Bendability or stretchability details
    • H05K1/028Bending or folding regions of flexible printed circuits
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/09Use of materials for the conductive, e.g. metallic pattern

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Metallurgy (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Parts Printed On Printed Circuit Boards (AREA)
  • Laminated Bodies (AREA)
  • Metal Rolling (AREA)

Abstract

This invention provides a rolled copper foil for a flexible printed substrate, a flexible copper-clad laminate, and a flexible printed circuit substrate, which stably obtains excellent flexibility and particularly excellent seam foldability regardless of heating conditions at the time of manufacturing a flexible copper-clad laminate. A rolled copper foil for a flexible printed substrate contains 99.0 mass% or more of Cu with the remaining residual being composed of unavoidable impurities. After atmospheric heating with the heating pattern A by heating over 5 seconds or more until reaching from 25 DEG C to 350 DEG C and holding at 350 DEG C for 30 minutes, or with the heating pattern B reaching from 25 DEG C to 350 DEG C in 1 second, the intensity ratio I/I0 is greater than or equal to 45, wherein (I) is the intensity of the (200) plane determined by X-ray diffraction of the rolled surface, and (I0) is the intensity of the (200) plane determined by X-ray diffraction of the fine powder copper.

Description

可撓性印刷基板用壓延銅箔、可撓性覆銅積層板及可撓性印刷電路基板 Rolled copper foil for flexible printed circuit boards, flexible copper clad laminates, and flexible printed circuit boards

本發明係關於一種要求撓曲性之可撓性印刷基板用壓延銅箔、可撓性覆銅積層板及可撓性印刷電路基板。 The present invention relates to a rolled copper foil for a flexible printed circuit board, a flexible copper-clad laminate and a flexible printed circuit board that require flexibility.

可撓性印刷電路基板(FPC:Flexible Printed Circuit)係於可撓性覆銅積層板(FCCL:Flexible Cupper Clad Laminate)形成電路而成者。並且,FCCL係於銅箔之單面或兩面積層樹脂而成,於該樹脂中使用聚醯亞胺之情形較多。作為FCCL,根據其構造有三層FCCL及雙層FCCL。 The flexible printed circuit board (FPC: Flexible Printed Circuit) is formed by forming a circuit on a flexible copper clad laminate (FCCL: Flexible Cupper Clad Laminate). In addition, FCCL is formed by layering resin on one side or two areas of copper foil, and polyimide is often used in this resin. As FCCL, there are three-layer FCCL and two-layer FCCL according to its structure.

三層FCCL呈利用環氧樹脂或丙烯酸樹脂等接著劑貼合聚醯亞胺等樹脂膜與成為導電材料之銅箔而成之構造。另一方面,雙層FCCL呈聚醯亞胺等樹脂與成為導電材料之銅箔直接接合而成之構造。雙層FCCL與三層FCCL相比,其耐熱性、尺寸穩定性、耐撓曲性等優異(非專利文獻1)。 The three-layer FCCL has a structure in which a resin film such as polyimide and a copper foil used as a conductive material are bonded with an adhesive such as epoxy resin or acrylic resin. On the other hand, the double-layer FCCL has a structure in which a resin such as polyimide is directly joined to a copper foil as a conductive material. Compared with the three-layer FCCL, the two-layer FCCL is superior in heat resistance, dimensional stability, flexural resistance, etc. (Non-Patent Document 1).

對使用於FPC之銅箔要求高撓曲性。作為用以對銅箔賦予撓曲性之方法,已知有提高銅箔之(200)面之結晶方位之配向度的技術(專利文獻1)、使於銅箔之板厚方向上貫通之晶粒之比率變大的技術(專利文獻2)、將相當於銅箔之止 溝槽之深度之表面粗糙度Ry(最大高度)減小至2.0μm以下的技術(專利文獻3)。 High flexibility is required for copper foil used in FPC. As a method for imparting flexibility to copper foil, a technique for increasing the alignment of the crystal orientation of the (200) plane of the copper foil (Patent Document 1), and making the crystal penetrating in the thickness direction of the copper foil is known. The technology of increasing the ratio of particles (Patent Document 2) will be equivalent to that of copper foil A technology in which the surface roughness Ry (maximum height) of the groove depth is reduced to 2.0 μm or less (Patent Document 3).

使用於撓曲部分之FPC係使用藉由如下方法製造之雙層FCCL:於銅箔塗佈聚醯亞胺之清漆,進行加熱而使其乾燥、硬化來製成積層板之稱為澆鑄法之方法;或重疊預先塗佈有具有接著力之熱塑性聚醯亞胺之聚醯亞胺膜與銅箔而藉由加熱輥等進行壓接之稱為層壓法的方法。 The FPC used in the flexible part uses a double-layer FCCL manufactured by the following method: Coating polyimide varnish on copper foil, heating it to dry and harden it to make a laminated board called the casting method Method; or a method called laminating method in which a polyimide film and copper foil coated with a thermoplastic polyimide with adhesive in advance are superimposed and pressed by a heating roller or the like.

例如,已知有藉由澆鑄法獲得高撓曲性之可撓性覆銅積層板(專利文獻4)。藉由該FCCL製造步驟中之熱處理而銅箔再結晶。 For example, a flexible copper-clad laminated board that obtains high flexibility by a casting method is known (Patent Document 4). The copper foil is recrystallized by the heat treatment in the FCCL manufacturing step.

另外,為了將FPC收納至行動電話或智慧型手機、平板PC等之殼體之狹窄空間,有於接縫壓折後彎折、或以如硬碟驅動器之讀寫纜線之較小之曲率半徑連續地反覆撓曲的情形,要求更嚴格之撓曲性。 In addition, in order to store the FPC in the narrow space of the housing of mobile phones, smart phones, tablet PCs, etc., the seams are bent after being crimped, or with a smaller curvature such as the read-write cable of a hard disk drive When the radius continuously flexes repeatedly, stricter flexibility is required.

此處,所謂接縫壓折係指如為了收納至較薄之殼體而賦予折縫來彎折之態樣,將以FPC之上表面側反轉180度而成為下表面側之方式彎折之情形稱為「接縫壓折」。 Here, the so-called seam crimping refers to a state in which a crease is provided for storage in a thinner casing, and the FPC is bent so that the upper surface side of the FPC is reversed 180 degrees to become the lower surface side. The situation is called "Seam Folding".

並且,為了應對接縫壓折等嚴格之彎曲,上述專利文獻1中記載之技術係藉由在銅箔中添加微量之Ag或Sn等而於FCCL製造之加熱處理時推進藉由退火實現之銅箔軟化,並且使結晶方位於特定之方向(200面)上對齊之立方集合組織發達。 In addition, in order to cope with severe bending such as seam crimping, the technique described in Patent Document 1 mentioned above is to add a small amount of Ag or Sn to copper foil to promote copper realized by annealing during the heat treatment of FCCL production. The foil is softened, and the crystalline cube is located in a specific direction (200 planes) and the cubic assembly structure is developed.

藉此,於對銅箔附加撓曲時之應力之情形時,在結晶內發生之轉移及其移動不累積於晶粒界,藉由向表面方向移動而抑制於晶粒界發生龜裂及因進展引起之破損,從而表現出優異之撓曲特性。 As a result, when the stress at the time of bending is applied to the copper foil, the transfer and movement occurring in the crystal will not accumulate in the grain boundary, and by moving to the surface, the occurrence of cracks and the cause of the grain boundary are suppressed. The damage caused by the progress shows excellent flexural characteristics.

用以實現高撓曲性之FPC之重要之一方面係於製造FCCL時之加熱處理時,使銅箔之金屬組織再結晶成於撓曲性方面較佳之狀態。撓曲性最佳之金屬組織 係立方體方位非常發達且晶粒界較少、換言之晶粒較大之組織。此處,立方體方位之發達程度能夠以200面之X射線繞射強度比I/I0(I:銅箔之200面之繞射強度,I0:銅粉末之200面之繞射強度)之大小表示,該值越大則表示立方體方位越發達。 One of the important aspects of FPC to achieve high flexibility is to recrystallize the metal structure of the copper foil into a state with better flexibility during the heat treatment in the manufacture of FCCL. The metal structure with the best flexibility is a structure with a well-developed cube orientation and fewer grain boundaries, in other words, a larger grain structure. Here, the degree of development of the cube orientation can be the ratio of the X-ray diffraction intensity of 200 planes to I/I 0 (I: the diffraction intensity of the 200 planes of copper foil, I 0 : the diffraction intensity of the 200 planes of copper powder) The size indicates that the larger the value, the more developed the cube orientation.

於藉由澆鑄法製造雙層FCCL之情形時,藉由在積層時(對銅箔塗佈樹脂材料時)階段性地提高溫度之過程而於銅箔中發生再結晶之核生成及再結晶晶粒之生長。並且,於藉由澆鑄法花費4秒以上將銅箔加熱至達到200℃、進而於200℃保持30分鐘後冷卻至室溫時,只要於室溫下測定之200面之X射線繞射強度比I/I0為40以上,則可獲得高撓曲性。 In the case of double-layer FCCL produced by the casting method, the nucleation of recrystallization and recrystallized crystals are generated in the copper foil through the process of increasing the temperature step by step during the lamination (when the resin material is applied to the copper foil) The growth of grains. In addition, when the copper foil is heated to 200°C for more than 4 seconds by the casting method, and then kept at 200°C for 30 minutes, and then cooled to room temperature, the ratio of the X-ray diffraction intensity of the 200 faces measured at room temperature If I/I 0 is 40 or more, high flexibility can be obtained.

另一方面,於藉由層壓法製造雙層FCCL之情形時,藉由加熱輥壓接已塗佈接著劑並乾燥之聚醯亞胺膜與銅箔,但無需使溶劑等蒸發,故而可瞬間升溫至聚醯亞胺發生硬化反應之溫度。然而,若以較快之速度升溫,則生成多方向之方位之核而生長,立方體方位之發達得到抑制。因此,與於積層時相對緩慢地進行加熱之澆鑄法相比,於層壓法之情形時存在撓曲性下降之傾向(專利文獻5)。 On the other hand, when the double-layer FCCL is produced by the lamination method, the polyimide film and the copper foil that have been coated and dried are pressed by a heating roller, but there is no need to evaporate the solvent, so it can be Instantly heat up to the temperature at which polyimide hardening reaction occurs. However, if the temperature rises at a faster rate, a multi-directional azimuth nucleus is generated and grown, and the development of the cubic azimuth is suppressed. Therefore, compared with the casting method in which heating is performed relatively slowly during the lamination, the flexibility tends to decrease in the case of the lamination method (Patent Document 5).

[先前技術文獻] [Prior Technical Literature]

[專利文獻] [Patent Literature]

[專利文獻1]日本專利第3009383號公報 [Patent Document 1] Japanese Patent No. 3009383

[專利文獻2]日本特開2006-117977號公報 [Patent Document 2] JP 2006-117977 A

[專利文獻3]日本特開2001-058203號公報 [Patent Document 3] Japanese Patent Application Publication No. 2001-058203

[專利文獻4]日本特開2006-237048號公報 [Patent Document 4] Japanese Patent Application Publication No. 2006-237048

[專利文獻5]日本特開2009-292090號公報 [Patent Document 5] JP 2009-292090 A

[非專利文獻] [Non-Patent Literature]

[非專利文獻1]Fujikura技報,Fujikura股份有限公司,No.109 pp. 31-35 (2005年) [Non-Patent Document 1] Fujikura Technical Report, Fujikura Co., Ltd., No. 109 pp. 31-35 (2005)

如上所述,作為雙層FCCL之製造方法,有加熱條件分別不同之澆鑄法及層壓法,但要求一種可不依據加熱條件而穩定地獲得撓曲性之FPC用銅箔。 As described above, as the manufacturing method of the double-layer FCCL, there are casting methods and lamination methods with different heating conditions, but a copper foil for FPC that can stably obtain flexibility regardless of heating conditions is required.

特別是,需求一種更嚴格之撓曲性之接縫壓折性優異之FPC用銅箔。 In particular, there is a demand for a copper foil for FPC with stricter flexibility and excellent seam crimpability.

因此,本發明之目的在於提供一種可不依據製造可撓性覆銅積層板時之加熱條件而穩定地獲得撓曲性,特別是接縫壓折性優異之可撓性印刷基板用壓延銅箔、可撓性覆銅積層板及可撓性印刷電路基板。 Therefore, the object of the present invention is to provide a rolled copper foil for a flexible printed circuit board that can stably obtain flexibility regardless of the heating conditions when manufacturing a flexible copper-clad laminate, and particularly has excellent seam crimpability. Flexible copper clad laminates and flexible printed circuit boards.

本發明者等人進行了各種研究,結果發現如下情形:只要為藉由模擬雙層FCCL之製造時之加熱處理而(200)面之強度成為I/I0

Figure 109104461-A0202-12-0004-9
45的銅箔,則可不依據製造雙層FCCL時之加熱條件而穩定地獲得撓曲性。 The present inventors have made various studies and found the following situation: as long as the heating is by an analog processing of the FCCL manufacturing a double layer (200) plane become intensity I / I 0
Figure 109104461-A0202-12-0004-9
The 45 copper foil can stably obtain flexibility regardless of the heating conditions when manufacturing the double-layer FCCL.

為了達成上述目的,本發明之可撓性印刷基板用壓延銅箔包含99.0質量%以上之Cu,剩餘部分由不可避免之雜質組成,於藉由花費5秒鐘以上自25℃加熱至達到350℃、進而於350℃保持30分鐘之加熱模式A、或於1秒鐘自25℃達到350℃之加熱模式B進行大氣加熱後,壓延面之藉由X射線繞射求出之(200)面之強 度(I)相對於微粉末銅的藉由X射線繞射求出之(200)面之強度(I0)為I/I0

Figure 109104461-A0202-12-0005-15
45。 In order to achieve the above object, the rolled copper foil for flexible printed circuit boards of the present invention contains 99.0% by mass or more of Cu, and the remainder is composed of inevitable impurities. It takes more than 5 seconds to heat from 25°C to 350°C , After heating mode A at 350℃ for 30 minutes, or heating mode B at 350℃ from 25℃ to 350℃ in 1 second, the calendered surface is calculated by X-ray diffraction. The intensity (I) relative to the intensity (I 0 ) of the (200) plane obtained by X-ray diffraction of the fine powder copper is I/I 0
Figure 109104461-A0202-12-0005-15
45.

本發明之可撓性印刷基板用壓延銅箔亦可相對於JIS-H0500(C1011)所規定之無氧銅含有280~360質量ppm之Ag。 The rolled copper foil for flexible printed circuit boards of the present invention may contain 280 to 360 mass ppm of Ag relative to the oxygen-free copper specified in JIS-H0500 (C1011).

本發明之可撓性覆銅積層板係積層上述可撓性印刷基板用壓延銅箔與樹脂而成。 The flexible copper-clad laminated board of the present invention is formed by laminating the above-mentioned rolled copper foil for flexible printed circuit boards and resin.

本發明之可撓性印刷電路基板具有上述可撓性覆銅積層板。 The flexible printed circuit board of this invention has the said flexible copper clad laminated board.

根據本發明,可獲得可不依據製造可撓性覆銅積層板時之加熱條件而穩定地獲得撓曲性,特別是接縫壓折性優異之可撓性印刷基板用壓延銅箔、可撓性覆銅積層板及可撓性印刷電路基板。 According to the present invention, it is possible to obtain a rolled copper foil for a flexible printed circuit board, which can stably obtain flexibility regardless of the heating conditions when manufacturing a flexible copper-clad laminate, and especially has excellent seam crimpability. Copper clad laminates and flexible printed circuit boards.

[圖1]係示意性地表示實施例之FPC之外觀之圖。 [Fig. 1] A diagram schematically showing the appearance of the FPC of the embodiment.

[圖2]係示意性地表示接縫壓折試驗之順序之圖。 [Figure 2] is a diagram schematically showing the sequence of the seam creasing test.

[圖3]係表示實施例及比較例之Ag濃度與最終冷軋之加工度(真應變)η之關係的圖。 Fig. 3 is a graph showing the relationship between the Ag concentration of the Examples and Comparative Examples and the working degree (true strain) η of the final cold rolling.

[圖4]係表示實施例及比較例之相當於澆鑄法及相當於層壓法之退火後之銅箔的I/I0之圖。 Fig. 4 is a diagram showing the I/I 0 of copper foil after annealing corresponding to the casting method and the laminating method in the examples and comparative examples.

[圖5]係表示實施例及比較例之FPC之接縫壓折試驗之斷裂次數的圖。 [Fig. 5] A graph showing the number of breaks in the joint creasing test of FPCs of Examples and Comparative Examples.

以下,對本發明之實施形態之可撓性印刷基板用壓延銅箔進行說明。再者,於本發明中,所謂%係若未特別斷定,則表示質量%。 Hereinafter, the rolled copper foil for a flexible printed circuit board according to an embodiment of the present invention will be described. In addition, in the present invention, the so-called% system means mass% unless otherwise specified.

(組成) (composition)

可撓性印刷基板用壓延銅箔之組成包含99.0質量%以上之Cu,剩餘部分由不可避免之雜質組成。 The composition of the rolled copper foil for flexible printed circuit boards contains 99.0% by mass or more of Cu, and the remainder is composed of unavoidable impurities.

特別是,較佳為相對於JIS-H0500(C1011)所規定之無氧銅含有280~360質量ppm之Ag而成之組成。 In particular, it is preferably a composition containing 280 to 360 mass ppm of Ag with respect to the oxygen-free copper specified in JIS-H0500 (C1011).

若Ag之含量未達280質量ppm,則存在如下情形:藉由壓延導入於材料之應變量變少,立方體集合組織之生長變得不充分而無法實現下文敍述之I/I0

Figure 109104461-A0202-12-0006-17
45。特別是,於相當於在積層時銅箔急速加熱之層壓法之情形時,立方體集合組織進一步變得難以生長。 If the content of Ag is less than 280 ppm by mass, there are situations where the amount of strain introduced into the material by rolling becomes less, and the growth of the cube assembly structure becomes insufficient to achieve the I/I described below. 0
Figure 109104461-A0202-12-0006-17
45. In particular, in the case of a lamination method equivalent to the copper foil being rapidly heated during lamination, the cubic aggregate structure becomes more difficult to grow.

若Ag之含量超過360質量ppm,則銅箔之再結晶溫度變高,即便進行製造雙層FCCL時之加熱亦不充分地發生再結晶而於銅箔中較多地殘留未再結晶之晶粒,所獲得之FPC之接縫壓折性明顯較差。 If the Ag content exceeds 360 ppm by mass, the recrystallization temperature of the copper foil becomes high, and even if heating during the production of double-layer FCCL, the recrystallization is insufficient, and many unrecrystallized crystal grains remain in the copper foil. , The seam crimpability of the obtained FPC is obviously poor.

更佳為相對於無氧銅含有290~340質量ppm之Ag。 More preferably, it contains 290~340 mass ppm of Ag with respect to oxygen-free copper.

壓延銅箔之厚度並無特別限制,只要根據要求特性適當地選擇即可,例如可設為1~100μm。特別是,為了提高接縫壓折性或微小電路形成性,厚度較薄者為宜,較佳為可設為6~35μm、更佳為9~18μm。 The thickness of the rolled copper foil is not particularly limited, as long as it is appropriately selected according to the required characteristics, for example, it can be set to 1 to 100 μm. In particular, in order to improve the seam foldability or the formation of micro-circuits, the thickness is preferably thinner, preferably 6 to 35 μm, more preferably 9 to 18 μm.

[集合組織] [Collection Organization]

於本發明之實施形態之可撓性印刷基板用壓延銅箔中,在藉由花費5秒鐘以上自常溫(25℃)加熱至達到350℃、進而於350℃保持30分鐘之加熱模式A、或花費1秒鐘自常溫(25℃)達到350℃之加熱模式B進行大氣加熱後,壓延面之藉由X射線繞射求出之(200)面之強度(I)相對於微粉末銅(325mesh,於氫氣氣流中以300℃加熱1小時後使用)的藉由X射線繞射求出之(200)面之強度(I0)為1/I0

Figure 109104461-A0202-12-0007-18
45。 In the rolled copper foil for a flexible printed circuit board according to the embodiment of the present invention, it takes 5 seconds or more to heat from room temperature (25°C) to 350°C, and then hold at 350°C for 30 minutes in heating mode A, Or it takes 1 second to heat from normal temperature (25°C) to 350°C in heating mode B. After heating in the atmosphere, the intensity (I) of the (200) surface obtained by X-ray diffraction of the rolled surface is relative to the fine powder copper ( 325mesh, heated at 300°C for 1 hour in a hydrogen gas stream. The intensity (I 0 ) of the (200) plane obtained by X-ray diffraction is 1/I 0
Figure 109104461-A0202-12-0007-18
45.

於350℃加熱30分鐘係模擬藉由澆鑄法製造雙層FCCL時之加熱條件者,表示銅箔自常溫(25℃)緩慢地加熱至350℃。 Heating at 350°C for 30 minutes simulates the heating conditions when the double-layer FCCL is manufactured by the casting method, which means that the copper foil is slowly heated from room temperature (25°C) to 350°C.

又,於350℃加熱1秒鐘係模擬藉由層壓法製造雙層FCCL時之加熱條件者,表示藉由層壓法進行之至最高溫度(350℃)之急加熱(1秒鐘自常溫(25℃)達到350℃)。 In addition, heating at 350°C for 1 second simulates the heating conditions when the double-layer FCCL is produced by the lamination method, which means the rapid heating to the highest temperature (350°C) by the lamination method (1 second from room temperature) (25°C) up to 350°C).

再者,強度(I)、(I0)係於常溫(25℃)測定。又,藉由上述加熱模式A、B加熱至最高溫度350℃後之銅箔係藉由自然放冷而冷卻至常溫,但認為即便此時之冷卻速度無特別規定,亦對銅箔之集合組織無影響。 In addition, the intensity (I) and (I 0 ) are measured at normal temperature (25°C). In addition, the copper foil heated to the maximum temperature of 350°C by the above heating modes A and B is cooled to room temperature by natural cooling. However, even if the cooling rate at this time is not specifically defined, the structure of the copper foil no effect.

如上所述,藉由規定成I/I0

Figure 109104461-A0202-12-0007-19
45而成為如下之銅箔:撓曲性優異之立方體方位非常發達,可不依據製造可撓性覆銅積層板時之加熱條件而穩定地獲得撓曲性,特別是接縫壓折性優異。 As mentioned above, by specifying as I/I 0
Figure 109104461-A0202-12-0007-19
45 and become the copper foil as follows: the cubic orientation with excellent flexibility is very developed, and the flexibility can be stably obtained regardless of the heating conditions when manufacturing the flexible copper-clad laminated board, especially the seam crimpability.

I/I0之上限例如為100。 The upper limit of I/I 0 is 100, for example.

(製造) (manufacture)

本發明之實施形態之可撓性印刷基板用壓延銅箔通常可按照對鑄錠反覆進行熱軋、冷軋及退火之順序進行而製造。 The rolled copper foil for a flexible printed circuit board according to the embodiment of the present invention can usually be manufactured in the order of repeatedly performing hot rolling, cold rolling, and annealing on an ingot.

將最終冷軋之壓延加工度設為92.0~99.8%(真應變η為2.53~6.21)即可。 It is sufficient to set the rolling processing degree of the final cold rolling to 92.0-99.8% (the true strain η is 2.53 to 6.21).

此處,於圖3中表示下文敍述之實施例及比較例之Ag濃度與真應變η之關係。 Here, FIG. 3 shows the relationship between the Ag concentration and the true strain η of the Examples and Comparative Examples described below.

如圖3所示,呈如下傾向:壓延銅箔中之Ag濃度越高,若不使最終冷軋之壓延加工度(真應變)η變高,則越難以導入成為再結晶之驅動力之應變,變得難以實現I/I0

Figure 109104461-A0202-12-0008-10
45。另一方面,呈如下傾向:若使η變得過高,則於壓延銅箔中較多地導入阻礙立方體集合組織生長之剪切帶,同樣變得難以實現I/I0
Figure 109104461-A0202-12-0008-11
45。 As shown in Figure 3, there is a tendency that the higher the Ag concentration in rolled copper foil, the more difficult it is to introduce the strain that is the driving force for recrystallization if the rolling process (true strain) η of the final cold rolling is not increased. , It becomes difficult to achieve I/I 0
Figure 109104461-A0202-12-0008-10
45. On the other hand, there is a tendency that if η becomes too high, more shear bands that hinder the growth of the cubic aggregate structure are introduced into the rolled copper foil, and it also becomes difficult to achieve I/I 0
Figure 109104461-A0202-12-0008-11
45.

因此,於為了在用以區分圖3之實施例與比較例之實驗性地求出之2個右邊偏上的直線B-C、A-D之間之區域進行最終冷軋而將壓延銅箔中之Ag之濃度設為CAg(質量ppm)時,設為(0.04×CAg-9.3)

Figure 109104461-A0202-12-0008-12
η
Figure 109104461-A0202-12-0008-24
(0.04CAg-7.3)。 Therefore, in order to perform final cold rolling in the area between the two upper right straight lines BC and AD that were experimentally obtained to distinguish the embodiment of FIG. 3 from the comparative example, the Ag in the rolled copper foil When the concentration is set to C Ag (mass ppm), set it to (0.04×C Ag -9.3)
Figure 109104461-A0202-12-0008-12
η
Figure 109104461-A0202-12-0008-24
(0.04C Ag -7.3).

以η=(0.04×CAg-9.3)表示直線A-D,以η=(0.04×CAg-7.3)表示直線B-C。又,直線A-B表示壓延銅箔中之Ag之濃度之下限即CAg=280質量ppm,直線C-D表示壓延銅箔中之Ag之濃度之上限即CAg=360質量ppm。 The straight line AD is represented by η=(0.04×C Ag -9.3), and the straight line BC is represented by η=(0.04×C Ag -7.3). In addition, the straight line AB represents the lower limit of the Ag concentration in the rolled copper foil, namely C Ag = 280 mass ppm, and the line CD represents the upper limit of the Ag concentration in the rolled copper foil, namely C Ag = 360 mass ppm.

再者,真應變η係藉由下式定義。 Furthermore, the true strain η is defined by the following formula.

η=In{(即將進行最終冷軋之前之材料之截面面積)/剛進行最終冷軋後之材料之截面面積)} η=In{(the cross-sectional area of the material before the final cold rolling)/the cross-sectional area of the material just after the final cold rolling)}

[實施例] [Example]

以下,表示本發明之實施例,但該等實施例係為了更良好地理解本發明而提供者,並不意圖限定本發明。 Hereinafter, examples of the present invention are shown, but these examples are provided for a better understanding of the present invention, and are not intended to limit the present invention.

[壓延銅箔之製造] [Manufacture of rolled copper foil]

以表1中所記載之組成之銅合金為原料而鑄造鑄錠,以800℃以上進行熱軋 至厚度為10mm為止,對表面之氧化皮進行面削,之後反覆進行冷軋及退火,最後藉由最終冷軋精加工成厚度0.009~0.018mm。表1中所記載之無氧銅係為JIS-H0500(C1011)規格。 Cast the ingot with the copper alloy with the composition listed in Table 1 as the raw material, and perform hot rolling at 800°C or higher Until the thickness is 10mm, the scale on the surface is face-cut, followed by repeated cold rolling and annealing, and finally finished cold rolling to a thickness of 0.009~0.018mm. The oxygen-free copper system described in Table 1 is JIS-H0500 (C1011) standard.

將最終冷軋之壓延加工度設為85~99.9%(真應變η為1.9~6.6),實施例之最終冷軋之壓延加工度(真應變η)係於試樣之Ag濃度(280~360ppm)範圍內如圖3所示般調整至上述(0.04×CAg-9.3)

Figure 109104461-A0202-12-0009-7
η
Figure 109104461-A0202-12-0009-8
(0.04CAg-7.3)之範圍。 The rolling degree of final cold rolling is set to 85~99.9% (true strain η is 1.9~6.6). The rolling degree of final cold rolling (true strain η) of the embodiment is based on the Ag concentration of the sample (280~360ppm) ) Within the range as shown in Figure 3, adjusted to the above (0.04×C Ag -9.3)
Figure 109104461-A0202-12-0009-7
η
Figure 109104461-A0202-12-0009-8
(0.04C Ag -7.3) range.

對以此方式獲得之各壓延銅箔試樣進行I/I0及耐接縫壓折性之評估。 Each rolled copper foil sample obtained in this way was evaluated for I/I 0 and seam crush resistance.

(1)立方體集合組織(I/I0) (1) Cube collection organization (I/I 0 )

於分別藉由上述加熱模式A及B加熱銅箔試樣後,在25℃求出壓延面之藉由X射線繞射求出之(200)面強度之積分值(I)。將該值除以預先測定之微粉末銅(325mesh,於氫氣氣流中以300℃加熱1小時後使用)之(200)面強度之積分值(I0)而計算I/I0的值。 After heating the copper foil samples in the heating modes A and B, respectively, the integrated value (I) of the (200) surface intensity of the rolled surface obtained by X-ray diffraction was obtained at 25°C. This value is divided by the pre-measured integrated value (I 0 ) of the (200) surface strength of finely powdered copper (325 mesh, heated in a hydrogen gas stream at 300° C. for 1 hour) to calculate the I/I 0 value.

(2)耐接縫壓折性 (2) Seam crush resistance

於分別藉由上述加熱模式A及B加熱銅箔試樣而使其再結晶後,在聚醯亞胺膜之單面(與銅箔接著之面)塗敷2μm之熱塑性聚醯亞胺接著劑後進行乾燥,形成27μm厚之樹脂層。於該樹脂層之接著劑面積層銅箔而進行真空熱壓來製作FCCL。此後,藉由蝕刻形成電路而製作圖1所示之FPC。 After heating the copper foil sample by the above heating modes A and B to recrystallize it, apply a 2μm thermoplastic polyimide adhesive on one side of the polyimide film (the side to be bonded to the copper foil) It was then dried to form a resin layer with a thickness of 27 μm. A copper foil was layered on the adhesive area of the resin layer and vacuum hot pressed to produce FCCL. After that, the circuit is formed by etching to produce the FPC shown in FIG. 1.

如圖2所示,一面藉由測試器確認FPC之導通,一面藉由負載100N對FPC反覆實施接縫壓折及回彎而調查FPC之耐接縫壓折性。 As shown in Figure 2, while confirming the continuity of the FPC with a tester, the FPC was repeatedly squeezed and bent back by a load of 100N to investigate the seam crease resistance of the FPC.

具體而言,將緩和地彎曲成環狀之FPC如圖2(1)般搭載至不鏽鋼製之工作台上,使相同之不鏽鋼製之按壓件以6mm/min之速度下降而如圖2(2)般以100 N之負載對FPC進行接縫壓折。於施加100N之負載並持續5秒鐘後,如圖2(3)般使按壓件以1,000mm/min之速度上升而擴展經接縫壓折之FPC。此後,如圖2(4)般對FPC施加100N之負載5秒鐘而使FPC回彎,如圖2(5)般再次使按壓件以1,000mm/min之速度上升而將FPC緩和地彎曲成環狀。 Specifically, the FPC gently bent into a ring is mounted on a stainless steel workbench as shown in Figure 2(1), and the same stainless steel pressing member is lowered at a speed of 6mm/min, as shown in Figure 2(2) ) Is generally 100 The load of N performs seam creasing on the FPC. After applying a load of 100N for 5 seconds, the pressing member is raised at a speed of 1,000mm/min as shown in Figure 2(3) to expand the FPC folded by the seam. After that, apply a load of 100N to the FPC for 5 seconds as shown in Figure 2 (4) to make the FPC bend back, and again raise the pressing member at a speed of 1,000 mm/min as shown in Figure 2 (5) to gently bend the FPC into ring.

將圖2(1)~(5)設為1循環,調查FPC之電路於第幾循環斷裂而無法實現導通(=FPC之電路斷裂)。 Set Figure 2(1)~(5) as 1 cycle, and investigate the cycle at which the FPC circuit breaks and cannot be turned on (=FPC circuit breaks).

將至斷裂之接縫壓折次數為7次以下判斷為較差(×),將8次以上且14次以下判斷為普通(△),將15次以上判斷為良好(○)。只要評估為△或○,則於實用上無問題。 It was judged that the number of times of seam creasing to break was 7 times or less as poor (×), 8 times or more and 14 times or less was judged as normal (△), and 15 times or more was judged as good (○). As long as the evaluation is △ or ○, there is no practical problem.

將獲得之結果示於表1。綜合判斷如下。只要綜合判斷為◎、○、△,則即便藉由澆鑄法、層壓法中之任一者製造FCCL,均發現高耐接縫壓折性。 The results obtained are shown in Table 1. The comprehensive judgment is as follows. As long as it is comprehensively judged as ◎, ○, and △, even if the FCCL is manufactured by either the casting method or the lamination method, high seam crush resistance is found.

◎:相當於澆鑄法之退火後及相當於層壓法之退火後之接縫壓折試驗的判斷均為○ ◎: After annealing equivalent to casting method and after annealing equivalent to lamination method, the judgment of the joint creasing test is ○

○:於相當於澆鑄法之退火後及相當於層壓法之退火後之接縫壓折試驗的判斷中,一者為○,另一者為△ ○: In the judgment of the joint compression test after annealing equivalent to the casting method and after annealing equivalent to the lamination method, one is ○ and the other is △

△:相當於澆鑄法之退火後及相當於層壓法之退火後之接縫壓折試驗的判斷均為△ △: After annealing equivalent to casting method and after annealing equivalent to lamination method, the judgment of the joint creasing test is △

×:相當於澆鑄法之退火後及相當於層壓法之退火後之接縫壓折試驗的判斷中之至少一者為× ×: At least one of the judgments of the joint compression test after annealing equivalent to the casting method and the joint compression test after annealing equivalent to the lamination method is ×

Figure 109104461-A0202-12-0011-1
Figure 109104461-A0202-12-0011-1

根據表1可明確,於各實施例之情形時,在相當於澆鑄法、相當於層壓法中之任一者之退火後,銅箔均滿足I/I0

Figure 109104461-A0202-12-0011-20
45。因此,使用相當於澆鑄法、相當於層壓法中之任一者之退火後之銅箔製作的FPC亦表現出高耐接縫壓折性。 According to Table 1, it is clear that in the case of each embodiment, the copper foil satisfies I/I 0 after annealing corresponding to either the casting method or the laminating method.
Figure 109104461-A0202-12-0011-20
45. Therefore, the FPC produced using the copper foil after annealing which is equivalent to either the casting method or the lamination method also exhibits high seam crush resistance.

於比較例1、4、5之情形時,加工度η較圖3之直線A-D處於下側,意味著加工度相對於Ag濃度不足。因此,成為再結晶之驅動力之應變之累積量較少,銅箔之再結晶溫度變高。其結果,銅箔並未藉由相當於澆鑄法或相當於層壓法中之至少一者之退火充分地再結晶而耐接縫壓折性較差。又,認為殘留有可能成為易於蓄積應變之龜裂之起點之未再結晶晶粒。 In the case of Comparative Examples 1, 4, and 5, the processing degree η is lower than the straight line A-D in FIG. 3, which means that the processing degree is insufficient with respect to the Ag concentration. Therefore, the cumulative amount of strain that is the driving force for recrystallization is small, and the recrystallization temperature of the copper foil becomes higher. As a result, the copper foil is not sufficiently recrystallized by annealing corresponding to at least one of the casting method or the laminating method, and the seam crush resistance is poor. In addition, it is thought that unrecrystallized crystal grains that may become the starting point of cracks that tend to accumulate strain remain.

於Ag濃度未達280ppm之比較例2之情形時,藉由壓延導入於材料之應變量變少,藉由相當於層壓法之退火而立方體集合組織之生長變得不充分,從而未滿足I/I0

Figure 109104461-A0202-12-0011-21
45。因此,耐接縫壓折性較差。 In the case of Comparative Example 2 where the Ag concentration is less than 280 ppm, the amount of strain introduced into the material by rolling is reduced, and the growth of the cube assembly structure becomes insufficient by annealing equivalent to the lamination method, thus not satisfying I/ I 0
Figure 109104461-A0202-12-0011-21
45. Therefore, the seam crush resistance is poor.

再者,於比較例2中,立方體集合組織藉由相當於澆鑄法之退火充分地生長而滿足I/I0

Figure 109104461-A0202-12-0012-22
45之原因在於:澆鑄法於積層時緩慢地加熱銅箔,因此立方體集合組織易於生長。 Furthermore, in Comparative Example 2, the cubic aggregate structure is sufficiently grown by annealing equivalent to the casting method to satisfy I/I 0
Figure 109104461-A0202-12-0012-22
The reason for 45 is that the casting method slowly heats the copper foil during lamination, so the cubic aggregate structure is easy to grow.

於Ag濃度超過360ppm之比較例3之情形時,再結晶溫度變高,故而藉由相當於澆鑄法或相當於層壓法中之至少一者之退火而銅箔不充分地再結晶,耐接縫壓折性較差。又,認為殘留有可成為易於蓄積應變之龜裂之起點之未再結晶晶粒。 In the case of Comparative Example 3 where the Ag concentration exceeds 360 ppm, the recrystallization temperature becomes higher. Therefore, the copper foil is insufficiently recrystallized by annealing corresponding to at least one of the casting method or the laminating method, and resistance to bonding The seam foldability is poor. In addition, it is considered that unrecrystallized crystal grains that can become the starting point of cracks that tend to accumulate strain remain.

於比較例6、7之情形時,加工度η較圖3之直線B-C處於上側,意味著加工度η相對於Ag濃度過高。因此,藉由相當於澆鑄法或相當於層壓法中之至少一者之退火而成為I/I0<45,耐接縫壓折性較差。 In the case of Comparative Examples 6 and 7, the processing degree η is higher than the straight line BC in FIG. 3, which means that the processing degree η is too high relative to the Ag concentration. Therefore, it becomes I/I 0 <45 by annealing equivalent to at least one of the casting method or the laminating method, and the seam crush resistance is poor.

認為其原因在於:加工度η過高而於銅箔較多地導入剪切帶,結果立方體集合組織之發達受到阻礙,具有其他方位之晶粒生長。即,認為於立方體集合組織生長時,立方體集合組織之晶粒一面吞併具有其他方位之周圍之晶粒一面生長,但若存在剪切帶,則立方體集合組織之生長受到阻礙,殘留具有其他方位之晶粒而生長。 It is thought that this is because the degree of processing η is too high and many shear bands are introduced into the copper foil. As a result, the development of the cubic aggregate structure is hindered, and the crystal grains having other directions grow. That is, it is considered that when the cube aggregate structure grows, the crystal grains of the cube aggregate structure grow while merging the surrounding crystal grains with other orientations. However, if there is a shear zone, the growth of the cube aggregate structure is hindered, leaving behind the crystal grains with other orientations. The grains grow.

Claims (4)

一種可撓性印刷基板用壓延銅箔,其包含99.0質量%以上之Cu,剩餘部分由不可避免之雜質組成, A rolled copper foil for flexible printed circuit boards, which contains 99.0% by mass or more of Cu, and the remainder is composed of unavoidable impurities, 於藉由花費5秒鐘以上自25℃加熱至達到350℃、進而於350℃保持30分鐘之加熱模式A、或於1秒鐘自25℃達到350℃之加熱模式B進行大氣加熱後,壓延面之藉由X射線繞射求出之(200)面之強度(I)相對於微粉末銅的藉由X射線繞射求出之(200)面之強度(I0)為I/I0
Figure 109104461-A0202-13-0001-23
45。
After heating in the atmosphere by heating from 25°C to 350°C for more than 5 seconds, and then holding at 350°C for 30 minutes, or heating mode B from 25°C to 350°C in 1 second, rolling The intensity (I) of the (200) surface obtained by X-ray diffraction of the surface is I/I 0 relative to the intensity (I 0 ) of the (200) surface obtained by X-ray diffraction of the powdered copper
Figure 109104461-A0202-13-0001-23
45.
如請求項1之可撓性印刷基板用壓延銅箔,其相對於JIS-H0500(C1011)所規定之無氧銅含有280~360質量ppm之Ag。 The rolled copper foil for flexible printed circuit boards of claim 1 contains 280 to 360 mass ppm of Ag relative to the oxygen-free copper specified in JIS-H0500 (C1011). 一種可撓性覆銅積層板,其係積層請求項1或2之可撓性印刷基板用壓延銅箔與樹脂而成。 A flexible copper-clad laminate, which is formed by laminating the flexible printed circuit board of claim 1 or 2 with rolled copper foil and resin. 一種可撓性印刷電路基板,其具有請求項3之可撓性覆銅積層板。 A flexible printed circuit board having the flexible copper-clad laminated board of claim 3.
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