TW201943554A - 透明氧化物層積膜、透明氧化物層積膜之製造方法、濺鍍靶及透明樹脂基板 - Google Patents

透明氧化物層積膜、透明氧化物層積膜之製造方法、濺鍍靶及透明樹脂基板 Download PDF

Info

Publication number
TW201943554A
TW201943554A TW108105269A TW108105269A TW201943554A TW 201943554 A TW201943554 A TW 201943554A TW 108105269 A TW108105269 A TW 108105269A TW 108105269 A TW108105269 A TW 108105269A TW 201943554 A TW201943554 A TW 201943554A
Authority
TW
Taiwan
Prior art keywords
film
transparent oxide
oxide
less
transparent
Prior art date
Application number
TW108105269A
Other languages
English (en)
Chinese (zh)
Inventor
桒原正和
仁藤茂生
Original Assignee
日商住友金屬鑛山股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商住友金屬鑛山股份有限公司 filed Critical 日商住友金屬鑛山股份有限公司
Publication of TW201943554A publication Critical patent/TW201943554A/zh

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B9/00—Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/086—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B5/00—Non-insulated conductors or conductive bodies characterised by their form
    • H01B5/14—Non-insulated conductors or conductive bodies characterised by their form comprising conductive layers or films on insulating-supports

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Laminated Bodies (AREA)
  • Physical Vapour Deposition (AREA)
TW108105269A 2018-04-16 2019-02-18 透明氧化物層積膜、透明氧化物層積膜之製造方法、濺鍍靶及透明樹脂基板 TW201943554A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2018-078442 2018-04-16
JP2018078442A JP2019183244A (ja) 2018-04-16 2018-04-16 透明酸化物積層膜、透明酸化物積層膜の製造方法、スパッタリングターゲット及び透明樹脂基板

Publications (1)

Publication Number Publication Date
TW201943554A true TW201943554A (zh) 2019-11-16

Family

ID=68238838

Family Applications (1)

Application Number Title Priority Date Filing Date
TW108105269A TW201943554A (zh) 2018-04-16 2019-02-18 透明氧化物層積膜、透明氧化物層積膜之製造方法、濺鍍靶及透明樹脂基板

Country Status (5)

Country Link
JP (1) JP2019183244A (ja)
KR (1) KR20200141987A (ja)
CN (1) CN111954726A (ja)
TW (1) TW201943554A (ja)
WO (1) WO2019202819A1 (ja)

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2892793B2 (ja) 1990-08-07 1999-05-17 尾池工業株式会社 ハイバリヤー性透明フイルム
JP2002100469A (ja) 2000-09-25 2002-04-05 Pioneer Electronic Corp 有機エレクトロルミネッセンス表示パネル
JP4889195B2 (ja) 2003-09-26 2012-03-07 住友金属鉱山株式会社 ガスバリア性透明樹脂基板、ガスバリア性透明樹脂基板を用いたフレキシブル表示素子、およびガスバリア性透明樹脂基板の製造方法
JP4552950B2 (ja) * 2006-03-15 2010-09-29 住友金属鉱山株式会社 ターゲット用酸化物焼結体、その製造方法、それを用いた透明導電膜の製造方法、及び得られる透明導電膜
JP5686067B2 (ja) * 2011-08-05 2015-03-18 住友金属鉱山株式会社 Ｚｎ−Ｓｎ−Ｏ系酸化物焼結体とその製造方法
JP2013047361A (ja) * 2011-08-29 2013-03-07 Mitsubishi Materials Corp スパッタリングターゲット及びその製造方法並びに該ターゲットを用いた薄膜、該薄膜を備える薄膜シート、積層シート
JP6424671B2 (ja) 2015-02-23 2018-11-21 Jnc株式会社 ガスバリアフィルム積層体とそれを用いた電子部品
JP6677095B2 (ja) * 2015-11-20 2020-04-08 住友金属鉱山株式会社 Ｓｎ−Ｚｎ−Ｏ系酸化物焼結体とその製造方法
JP6638401B2 (ja) 2016-01-06 2020-01-29 凸版印刷株式会社 ガスバリアフィルム積層体およびその製造方法
JP6859841B2 (ja) * 2017-05-12 2021-04-14 住友金属鉱山株式会社 Ｓｎ−Ｚｎ−Ｏ系酸化物焼結体とその製造方法

Also Published As

Publication number Publication date
JP2019183244A (ja) 2019-10-24
KR20200141987A (ko) 2020-12-21
WO2019202819A1 (ja) 2019-10-24
CN111954726A (zh) 2020-11-17

Similar Documents

Publication Publication Date Title
TWI402862B (zh) 氧化物燒結體、其製法、使用它之透明導電膜之製法與所得到的透明導電膜
JP4730204B2 (ja) 酸化物焼結体ターゲット、及びそれを用いた酸化物透明導電膜の製造方法
JP4759143B2 (ja) 透明導電積層体、その製造方法及びそれを用いた表示素子
TWI500590B (zh) 氧化物燒結體及其製造方法、靶及使用其所得之透明導電膜以及透明導電性基材
KR100737494B1 (ko) 산화물 소결체, 스퍼터링 타겟, 투명 도전성 박막 및 그제조방법
KR101321554B1 (ko) 산화물 소결체 및, 이를 이용하여 얻어지는 산화물막, 이를포함하는 투명기재
TW200307757A (en) Transparent conductive thin film, process for producing the same, sintered target for producing the same, and transparent, electroconductive substrate for display panel, and organic electroluminescence device
WO2011115177A1 (ja) 透明導電膜
JP3945395B2 (ja) 透明導電性薄膜、その形成方法、それを用いた表示パネル用透明導電性基材及び有機エレクトロルミネッセンス素子
JP2006188392A (ja) 酸化物焼結体、透明導電性薄膜およびその実装素子
JP2013047363A (ja) スパッタリングターゲット及びその製造方法並びに該ターゲットを用いた薄膜、該薄膜を備える薄膜シート、積層シート
JP4687374B2 (ja) 透明導電膜及びそれを含む透明導電性基材
JP6709171B2 (ja) 透明導電膜及び透明導電膜の製造方法
TW201943554A (zh) 透明氧化物層積膜、透明氧化物層積膜之製造方法、濺鍍靶及透明樹脂基板
EP1825995A1 (en) Gas barrier transparent resin substrate, method for manufacture thereof, and flexible display element using gas barrier transparent resin substrate
JP5488970B2 (ja) 透明導電膜、この透明導電膜を用いた太陽電池および透明導電膜を形成するためのスパッタリングターゲット
TW201936953A (zh) 氧化物濺鍍膜、氧化物濺鍍膜之製造方法、氧化物燒結體及透明樹脂基板
JP2013047362A (ja) スパッタリングターゲット及びその製造方法並びに該ターゲットを用いた薄膜、該薄膜を備える薄膜シート、積層シート
JP5747738B2 (ja) スパッタリングターゲット及びその製造方法並びに該ターゲットを用いた薄膜、該薄膜を備える薄膜シート、積層シート
JP5761528B2 (ja) 透明酸化物膜及びその製造方法並びに酸化物スパッタリングターゲット
KR101719520B1 (ko) 탄화불소 박막을 포함하는 다층 배리어 필름 및 이의 제조방법
TW201945319A (zh) 透明氧化物膜、透明氧化物膜之製造方法、氧化物燒結體及透明樹脂基板
TW201938372A (zh) 透明氧化物層積膜、透明氧化物層積膜之製造方法及透明樹脂基板
JP2019073747A (ja) 非晶質の透明酸化物膜、Ｓｎ−Ｚｎ−Ｏ系酸化物焼結体、非晶質の透明酸化物膜の製造方法、及びＳｎ−Ｚｎ−Ｏ系酸化物焼結体の製造方法
CN114574820A (zh) 氧化铟锌锡溅镀靶材及其导电膜