TW201940993A - 近接曝光裝置、近接曝光方法及近接曝光裝置用光照射裝置 - Google Patents

近接曝光裝置、近接曝光方法及近接曝光裝置用光照射裝置 Download PDF

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Publication number
TW201940993A
TW201940993A TW108104181A TW108104181A TW201940993A TW 201940993 A TW201940993 A TW 201940993A TW 108104181 A TW108104181 A TW 108104181A TW 108104181 A TW108104181 A TW 108104181A TW 201940993 A TW201940993 A TW 201940993A
Authority
TW
Taiwan
Prior art keywords
light
workpiece
exposure
light source
exposed
Prior art date
Application number
TW108104181A
Other languages
English (en)
Chinese (zh)
Inventor
富樫工
榎本芳幸
原田智紀
川島洋徳
Original Assignee
日商Ｖ科技股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商Ｖ科技股份有限公司 filed Critical 日商Ｖ科技股份有限公司
Publication of TW201940993A publication Critical patent/TW201940993A/zh

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7038—Alignment for proximity or contact printer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70141—Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/7035—Proximity or contact printers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
TW108104181A 2018-02-08 2019-02-01 近接曝光裝置、近接曝光方法及近接曝光裝置用光照射裝置 TW201940993A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2018-021151 2018-02-08
JP2018021151 2018-02-08

Publications (1)

Publication Number Publication Date
TW201940993A true TW201940993A (zh) 2019-10-16

Family

ID=67549027

Family Applications (1)

Application Number Title Priority Date Filing Date
TW108104181A TW201940993A (zh) 2018-02-08 2019-02-01 近接曝光裝置、近接曝光方法及近接曝光裝置用光照射裝置

Country Status (5)

Country Link
JP (1) JPWO2019155886A1 (ko)
KR (1) KR20200119235A (ko)
CN (1) CN111699440A (ko)
TW (1) TW201940993A (ko)
WO (1) WO2019155886A1 (ko)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113050394A (zh) * 2019-12-26 2021-06-29 佳能株式会社 曝光装置以及物品制造方法

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111352312B (zh) * 2020-04-29 2021-09-07 中国科学院光电技术研究所 一种多功能光刻装置
JP2021193429A (ja) * 2020-06-08 2021-12-23 株式会社ブイ・テクノロジー 露光用の光源装置、照明装置、露光装置、及び露光方法
JP2022138883A (ja) * 2021-03-11 2022-09-26 セイコーエプソン株式会社 画像生成方法、制御方法、および情報処理装置

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07201711A (ja) 1993-12-29 1995-08-04 Dainippon Screen Mfg Co Ltd 近接露光方法及びその装置
JP3246300B2 (ja) 1994-11-29 2002-01-15 ウシオ電機株式会社 マスクとワークの自動位置合わせ方法および装置
JPH08264427A (ja) * 1995-03-23 1996-10-11 Nikon Corp アライメント方法及びその装置
JP2006098649A (ja) * 2004-09-29 2006-04-13 Nsk Ltd 露光装置および露光方法
JP5311341B2 (ja) 2006-06-14 2013-10-09 Ｎｓｋテクノロジー株式会社 近接露光装置及び近接露光方法
JP2011169924A (ja) * 2010-01-22 2011-09-01 Nsk Ltd 露光装置及び露光方法
CN102193339A (zh) * 2011-06-13 2011-09-21 中国科学院光电技术研究所 一种无掩模光刻对准系统
US9297642B2 (en) * 2011-08-10 2016-03-29 V Technology Co., Ltd. Alignment device for exposure device, and alignment mark
JP6199591B2 (ja) * 2013-04-12 2017-09-20 株式会社オーク製作所 光源装置および露光装置
CN107077080B (zh) * 2015-01-15 2019-04-26 株式会社村田制作所 曝光装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113050394A (zh) * 2019-12-26 2021-06-29 佳能株式会社 曝光装置以及物品制造方法
TWI821617B (zh) * 2019-12-26 2023-11-11 日商佳能股份有限公司 曝光裝置以及物品製造方法

Also Published As

Publication number Publication date
KR20200119235A (ko) 2020-10-19
WO2019155886A1 (ja) 2019-08-15
JPWO2019155886A1 (ja) 2021-01-28
CN111699440A (zh) 2020-09-22

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