TW201927582A - Film forming device and film forming method that reduces the distortion of a linear edge of a film by using an inkjet printing technique - Google Patents

Film forming device and film forming method that reduces the distortion of a linear edge of a film by using an inkjet printing technique Download PDF

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TW201927582A
TW201927582A TW107127211A TW107127211A TW201927582A TW 201927582 A TW201927582 A TW 201927582A TW 107127211 A TW107127211 A TW 107127211A TW 107127211 A TW107127211 A TW 107127211A TW 201927582 A TW201927582 A TW 201927582A
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ink
axis direction
parallel
discharge device
edge
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TW107127211A
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TWI673180B (en
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礒圭二
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日商住友重機械工業股份有限公司
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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/12Production of screen printing forms or similar printing forms, e.g. stencils
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/80Etching
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20Exposure; Apparatus therefor
    • G03F7/2002Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2014Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
    • G03F7/2016Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
    • G03F7/2018Masking pattern obtained by selective application of an ink or a toner, e.g. ink jet printing
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104Forming layers
    • H01L21/02107Forming insulating materials on a substrate
    • H01L21/02225Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
    • H01L21/0226Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process
    • H01L21/02282Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process liquid deposition, e.g. spin-coating, sol-gel techniques, spray coating
    • H01L21/02288Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process liquid deposition, e.g. spin-coating, sol-gel techniques, spray coating printing, e.g. ink-jet printing
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274Photolithographic processes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/6715Apparatus for applying a liquid, a resin, an ink or the like

Abstract

A film forming device that reduces the distortion of a linear edge of a film by using an inkjet printing technique is provided. According to a pattern of a subject coating area, one of a coating subject and an ink ejecting device is made to move relative to the other one in a first direction, while the ink is ejected from the ink ejecting device, so that ink is coated on an edge of the subject coating area that is parallel to the first direction. One of the coating subject and the ink ejecting device is made to move relative to the other one in a second direction, while the ink is ejected from the ink ejecting device, so that ink is coated on an edge of the subject coating area that is parallel to the second direction.

Description

膜形成裝置及膜形成方法Film forming device and film forming method

本申請主張基於2017年12月15日申請之日本專利申請第2017-240421號的優先權。該申請的所有內容藉由參閱援用於本說明書中。   本發明係有關一種膜形成裝置及膜形成方法。The present application claims priority based on Japanese Patent Application No. 2017-240421, filed on Dec. All contents of this application are incorporated herein by reference. The present invention relates to a film forming apparatus and a film forming method.

在用於將觸控面板的透明導電膜進行圖案化之阻劑圖案的形成中,使用光微影技術或網版印刷技術。在使用光微影技術之方法中,雖然能夠形成高精細的圖案,但裝置成本、廢液處理成本等增加。在使用網版印刷技術之方法中,雖然在裝置成本、廢液處理成本的觀點上比使用光微影技術之方法有利,但難以形成高精細的圖案。使用噴墨印刷技術來形成高精細的阻劑圖案之技術已被提出(專利文獻1)。 (先前技術文獻) (專利文獻)In the formation of a resist pattern for patterning a transparent conductive film of a touch panel, a photolithography technique or a screen printing technique is used. In the method using the photolithography technique, although a high-definition pattern can be formed, the device cost, the waste liquid processing cost, and the like increase. In the method using the screen printing technique, although it is advantageous in terms of device cost and waste liquid processing cost than the method using the photolithography technique, it is difficult to form a high-definition pattern. A technique of forming a high-definition resist pattern using an inkjet printing technique has been proposed (Patent Document 1). (Previous Technical Literature) (Patent Literature)

專利文獻1:日本專利第5797277號公報Patent Document 1: Japanese Patent No. 5797277

(發明所欲解決之問題)(The problem that the invention wants to solve)

要求高精細地形成在透明導電膜等的蝕刻時用於作為蝕刻遮罩之膜之技術。尤其,在使用噴墨印刷技術來形成具有直線狀邊緣之膜時,存在邊緣的直線扭曲變形之問題。本發明的目的在於提供一種能夠使用噴墨印刷技術來減少膜的直線狀邊緣的變形之膜形成裝置及膜形成方法。 (解決問題之技術手段)A technique for forming a film as an etching mask at the time of etching of a transparent conductive film or the like is required to be formed with high precision. In particular, when an ink jet printing technique is used to form a film having a linear edge, there is a problem that the edge is twisted linearly. An object of the present invention is to provide a film forming apparatus and a film forming method capable of reducing deformation of a linear edge of a film using an ink jet printing technique. (Technical means to solve the problem)

依本發明的一觀點,提供一種膜形成裝置,其具有:   儲存裝置,儲存包含與第1方向平行之邊緣和與第2方向平行之邊緣之塗佈對象區域的圖案,前述第2方向與前述第1方向交叉;   支承部,支承塗佈對象物;   油墨吐出裝置,朝向由前述支承部支承之塗佈對象物的表面吐出油墨;   移動機構,具有使由前述支承部支承之塗佈對象物和前述油墨吐出裝置中的一方相對於另一方沿固定於塗佈對象物的表面之兩個方向移動之功能;及   控制裝置,控制前述油墨吐出裝置和前述移動機構,   前述控制裝置具有根據儲存於前述儲存裝置之前述塗佈對象區域的圖案執行第1控制和第2控制之功能,   前述第1控制,是一邊使由前述支承部支承之塗佈對象物和前述油墨吐出裝置中的一方相對於另一方沿前述第1方向移動,一邊從前述油墨吐出裝置吐出油墨,藉此對前述塗佈對象區域的與前述第1方向平行之邊緣塗佈油墨,   前述第2控制,是一邊使由前述支承部支承之塗佈對象物和前述油墨吐出裝置中的一方相對於另一方沿前述第2方向移動,一邊從前述油墨吐出裝置吐出油墨,藉此對前述塗佈對象區域的與前述第2方向平行之邊緣塗佈油墨。According to one aspect of the invention, there is provided a film forming apparatus comprising: a storage device storing a pattern including an application target region having an edge parallel to the first direction and an edge parallel to the second direction, the second direction and the foregoing The first direction intersects; the support portion supports the object to be coated; the ink discharge device discharges the ink toward the surface of the object to be coated supported by the support portion; and the moving mechanism has the object to be coated supported by the support portion and a function of moving one of the ink discharge devices to the other in a direction fixed to a surface of the object to be coated; and a control device for controlling the ink discharge device and the moving mechanism, wherein the control device is stored in the foregoing The pattern of the application target region of the storage device performs the functions of the first control and the second control, and the first control is to adjust one of the application target supported by the support portion and the ink discharge device to the other. One of the ink ejection devices is moved from the ink ejection device in the first direction In the ink, the ink is applied to the edge of the application target region that is parallel to the first direction, and the second control is one of the application object supported by the support portion and the ink discharge device. The ink is ejected from the ink ejecting apparatus while being moved in the second direction with respect to the other side, thereby applying ink to the edge parallel to the second direction of the application target region.

依本發明的另一觀點,提供一種膜形成裝置,其具有:   儲存裝置,儲存包含與第1方向平行之邊緣和與第2方向平行之邊緣之塗佈對象區域的圖案,前述第2方向與前述第1方向交叉;   支承部,支承塗佈對象物;   油墨吐出裝置,具有朝向由前述支承部支承之塗佈對象物的表面吐出油墨之複數個噴嘴孔;   移動機構,具有使由前述支承部支承之塗佈對象物和前述油墨吐出裝置中的一方相對於另一方沿與塗佈對象物的表面平行之方向移動之功能;及   控制裝置,控制前述油墨吐出裝置和前述移動機構,   前述控制裝置將前述油墨吐出裝置和前述移動機構控制成,當根據儲存於前述儲存裝置之前述塗佈對象區域的圖案,一邊使由前述支承部支承之塗佈對象物和前述油墨吐出裝置中的一方相對於另一方移動,一邊從前述油墨吐出裝置吐出油墨,藉此對前述塗佈對象區域塗佈油墨時,對與前述第1方向平行之邊緣塗佈從複數個前述噴嘴孔當中同一個前述噴嘴孔吐出之油墨,並且對與前述第2方向平行之邊緣亦塗佈從複數個前述噴嘴孔當中同一個前述噴嘴吐出之油墨。According to another aspect of the present invention, a film forming apparatus includes: a storage device that stores a pattern including a coating target region having an edge parallel to the first direction and an edge parallel to the second direction, wherein the second direction is The first direction intersects; the support portion supports the object to be coated; the ink discharge device has a plurality of nozzle holes for discharging ink toward the surface of the object to be coated supported by the support portion; and the moving mechanism has the support portion a function of moving one of the object to be coated and the ink discharge device to the other in a direction parallel to the surface of the object to be coated; and a control device for controlling the ink discharge device and the moving mechanism, the control device Controlling the ink discharge device and the moving mechanism to control one of the application target supported by the support portion and the ink discharge device with respect to the pattern of the application target region stored in the storage device The other side moves while spitting out from the ink discharge device When the ink is applied to the application target region, the ink is discharged from the same nozzle hole among the plurality of nozzle holes to the edge parallel to the first direction, and is parallel to the second direction. The edge is also coated with ink ejected from the same one of the plurality of nozzle holes.

依本發明的又一觀點,提供一種膜形成方法,   係一邊使在表面上劃定有包含與第1方向平行之邊緣和與第2方向平行之邊緣的塗佈對象區域之塗佈對象物和油墨吐出裝置中的一方相對於另一方沿前述第1方向移動,一邊對前述塗佈對象區域的與前述第1方向平行之邊緣塗佈油墨,前述第2方向與前述第1方向交叉;   一邊使前述塗佈對象物和油墨吐出裝置中的一方相對於另一方沿前述第2方向移動,一邊對前述塗佈對象區域的與前述第2方向平行之邊緣塗佈油墨;   在使前述塗佈對象物和油墨吐出裝置中的一方相對於另一方沿前述第1方向移動之期間及沿前述第2方向移動之期間中的至少一個期間,對前述塗佈對象區域的內側塗佈油墨。According to still another aspect of the present invention, there is provided a method of forming a film, wherein an object to be coated having a coating target region including an edge parallel to the first direction and an edge parallel to the second direction is defined on the surface When one of the ink discharge devices moves in the first direction with respect to the other, the ink is applied to the edge of the application target region that is parallel to the first direction, and the second direction intersects with the first direction; When one of the object to be coated and the ink discharge device moves in the second direction with respect to the other, the ink is applied to the edge of the application target region that is parallel to the second direction; The ink is applied to the inner side of the application target region during at least one of a period in which one of the ink discharge devices moves in the first direction and a period in which the ink is ejected in the first direction.

依本發明的又一觀點,提供一種膜形成方法,   係一邊使在表面上劃定有包含與第1方向平行之邊緣和與第2方向平行之邊緣的塗佈對象區域之塗佈對象物和具有複數個噴嘴孔之油墨吐出裝置中的一方相對於另一方移動,一邊將從複數個前述噴嘴孔當中同一個前述噴嘴孔吐出之油墨塗佈於與前述第1方向平行之邊緣,前述第2方向與前述第1方向交叉;   一邊使前述塗佈對象物和前述油墨吐出裝置中的一方相對於另一方移動,一邊將從複數個前述噴嘴孔當中同一個前述噴嘴孔吐出之油墨塗佈於與前述第2方向平行之邊緣,   對前述塗佈對象物的內側塗佈從複數個前述噴嘴孔吐出之油墨。 (發明之效果)According to still another aspect of the present invention, there is provided a method of forming a film, wherein an object to be coated having a coating target region including an edge parallel to the first direction and an edge parallel to the second direction is defined on the surface One of the ink discharge devices having a plurality of nozzle holes is moved to the other side, and the ink discharged from the same one of the plurality of nozzle holes is applied to the edge parallel to the first direction, and the second The direction intersects with the first direction; and the ink discharged from the same one of the plurality of nozzle holes is applied to the ink while the one of the application target and the ink discharge device is moved relative to the other In the edge parallel to the second direction, the ink discharged from the plurality of nozzle holes is applied to the inside of the object to be coated. (Effect of the invention)

能夠減少由所塗佈之油墨構成之膜的與第1方向平行之邊緣及與第2方向平行之邊緣的直線扭曲變形。It is possible to reduce the linear distortion of the edge parallel to the first direction and the edge parallel to the second direction of the film made of the applied ink.

參閱圖1~圖5B對依實施例之膜形成裝置及膜形成方法進行說明。   圖1係依實施例之膜形成裝置的概略圖。在基座20上透過移動機構21支承著支承部(載台)23。在支承部23的上表面(支承面)支承作為塗佈對象物之基板50。定義將支承部23的上表面設為xy面、將其法線方向設為z軸的正方向之xyz正交坐標系。通常以xy面成為水平之方式設置基座20。A film formation apparatus and a film formation method according to the examples will be described with reference to Figs. 1 to 5B. Fig. 1 is a schematic view showing a film forming apparatus according to an embodiment. The support portion (stage) 23 is supported by the moving mechanism 21 on the susceptor 20. The substrate 50 as an application object is supported on the upper surface (support surface) of the support portion 23. The xyz orthogonal coordinate system in which the upper surface of the support portion 23 is the xy plane and the normal direction thereof is the positive direction of the z-axis is defined. The susceptor 20 is usually provided in such a manner that the xy plane is horizontal.

移動機構21包括x軸方向直動機構21A、y軸方向直動機構21B及旋轉機構21C。x軸方向直動機構21A使y軸方向直動機構21B的導軌沿x軸方向移動。y軸方向直動機構21B使旋轉機構21C沿y軸方向移動。旋轉機構21C使支承部23繞與z軸平行之旋轉軸旋轉。亦即,移動機構21具有:使由支承部23支承之基板50沿x軸方向及y軸方向這兩個方向平移移動之功能、及使基板50繞與z軸平行之旋轉軸旋轉之功能。The moving mechanism 21 includes an x-axis direction linear motion mechanism 21A, a y-axis direction linear motion mechanism 21B, and a rotation mechanism 21C. The x-axis direction linear motion mechanism 21A moves the guide rail of the y-axis direction linear motion mechanism 21B in the x-axis direction. The y-axis direction linear motion mechanism 21B moves the rotation mechanism 21C in the y-axis direction. The rotation mechanism 21C rotates the support portion 23 about a rotation axis parallel to the z-axis. In other words, the moving mechanism 21 has a function of shifting the substrate 50 supported by the support portion 23 in both the x-axis direction and the y-axis direction, and a function of rotating the substrate 50 about a rotation axis parallel to the z-axis.

在由支承部23支承之基板50的上方配置有油墨吐出裝置26。油墨吐出裝置26例如利用門型框架24而由基座20支承。油墨吐出裝置26具有朝向基板50側(下方)之複數個噴嘴孔。油墨吐出裝置26將油墨液滴化而從複數個噴嘴孔朝向基板50吐出。An ink discharge device 26 is disposed above the substrate 50 supported by the support portion 23. The ink discharge device 26 is supported by the susceptor 20 by, for example, the portal frame 24 . The ink discharge device 26 has a plurality of nozzle holes toward the substrate 50 side (downward). The ink discharge device 26 dropletizes the ink and discharges it from the plurality of nozzle holes toward the substrate 50.

作為朝向基板50吐出之油墨,例如可以使用紫外線硬化型油墨。用於向塗佈於基板50之油墨放射紫外線之光源配置於油墨吐出裝置26的側方。當使用熱硬化型油墨時,在油墨吐出裝置26的側方配置用於加熱塗佈於基板50之油墨之熱源。As the ink discharged toward the substrate 50, for example, an ultraviolet curable ink can be used. A light source for emitting ultraviolet rays to the ink applied to the substrate 50 is disposed on the side of the ink discharge device 26. When a thermosetting ink is used, a heat source for heating the ink applied to the substrate 50 is disposed on the side of the ink discharge device 26.

在儲存裝置31中儲存著定義塗佈油墨之區域(塗佈對象區域)的位置及平面形狀之圖像資料。塗佈對象區域例如由複數個像素來定義,作為圖像資料,可使用位元映像(bitmap)資料。從輸入裝置35向控制裝置30輸入各種指令或資料。輸入裝置35例如使用鍵盤、指向裝置(pointing device)、USB埠、通訊裝置等。向輸出裝置36輸出與膜形成裝置的動作有關之各種資訊。輸出裝置36例如使用顯示器、揚聲器、USB埠、通訊裝置等。In the storage device 31, image data defining the position and the planar shape of the region (application target region) where the ink is applied is stored. The application target area is defined by, for example, a plurality of pixels, and as image data, bit map data can be used. Various commands or materials are input from the input device 35 to the control device 30. The input device 35 uses, for example, a keyboard, a pointing device, a USB port, a communication device, and the like. Various information related to the operation of the film forming apparatus is output to the output device 36. The output device 36 uses, for example, a display, a speaker, a USB port, a communication device, and the like.

控制裝置30根據儲存於儲存裝置31之圖像資料控制移動機構21及油墨吐出裝置26。一邊使移動機構21動作而使基板50移動,一邊從油墨吐出裝置26吐出油墨,藉此能夠對基板50的塗佈對象區域塗佈油墨。The control device 30 controls the moving mechanism 21 and the ink discharge device 26 based on the image data stored in the storage device 31. By moving the substrate 50 while moving the substrate 50, the ink is ejected from the ink discharge device 26, whereby the application target region of the substrate 50 can be coated with ink.

圖2A係油墨吐出裝置26的仰視圖。在油墨吐出裝置26的底面沿x軸方向等間隔排列有複數個噴嘴孔27。複數個噴嘴孔27可以配置為直線狀,亦可以配置為交錯狀。噴嘴孔27的x軸方向上的間距P例如為相當於解析度300dpi之尺寸(約85μm)。從一端的噴嘴孔27至另一端的噴嘴孔27為止的距離Lx例如為50mm。在y軸方向上,在油墨吐出裝置26的兩側配置有用於使油墨硬化之光源28。2A is a bottom view of the ink discharge device 26. A plurality of nozzle holes 27 are arranged at equal intervals in the x-axis direction on the bottom surface of the ink discharge device 26. The plurality of nozzle holes 27 may be arranged in a straight line or may be arranged in a staggered shape. The pitch P of the nozzle hole 27 in the x-axis direction is, for example, a size (about 85 μm) corresponding to a resolution of 300 dpi. The distance Lx from the nozzle hole 27 at one end to the nozzle hole 27 at the other end is, for example, 50 mm. A light source 28 for hardening the ink is disposed on both sides of the ink discharge device 26 in the y-axis direction.

接著,參閱圖2B對在基板50上塗佈油墨時的基板50與油墨吐出裝置26的相對移動的狀態進行說明。   圖2B係表示油墨吐出裝置26相對於基板50之移動軌跡之俯視圖。例如,平面形狀為正方形或長方形的基板50以其邊緣與x軸方向及y軸方向平行的方式由支承部23支承(圖1)。作為一例,基板50的平面形狀為一邊的長度為500mm的正方形。實際上雖是藉由使基板50相對於油墨吐出裝置26沿x軸方向及y軸方向移動來塗佈油墨,但在以下說明中,有時將基板50的移動以油墨吐出裝置26相對於基板50之相對移動方式來表現。Next, a state in which the relative movement of the substrate 50 and the ink discharge device 26 when the ink is applied onto the substrate 50 will be described with reference to FIG. 2B. 2B is a plan view showing a movement locus of the ink discharge device 26 with respect to the substrate 50. For example, the substrate 50 having a square or rectangular planar shape is supported by the support portion 23 such that its edge is parallel to the x-axis direction and the y-axis direction (FIG. 1). As an example, the planar shape of the substrate 50 is a square having a length of one side of 500 mm. Actually, the ink is applied by moving the substrate 50 relative to the ink discharge device 26 in the x-axis direction and the y-axis direction. However, in the following description, the substrate 50 may be moved by the ink discharge device 26 with respect to the substrate. The relative movement of 50 is expressed.

若使油墨吐出裝置26相對於基板50沿y軸方向相對移動,則能夠對x軸方向上的寬度為Lx的帶狀區域(以下,稱為區段(street)51。)塗佈油墨。將油墨吐出裝置26相對於基板50從y軸方向的一端移動至另一端為止的程序稱為1次沿y軸方向之通過(pass)。藉由執行1次沿y軸方向之通過,在x軸方向上,能夠以與間距P對應之解析度塗佈油墨。在1個區段51內使油墨吐出裝置26在x軸方向以間距P的1/4移位並執行4次通過,藉此能夠將1個區段51內之x軸方向上的解析度提高至4倍。例如,當噴嘴孔27(圖2A)的間距P相當於300dpi時,藉由執行4次通過,能夠將x軸方向上的解析度提高至1200dpi。When the ink discharge device 26 is relatively moved in the y-axis direction with respect to the substrate 50, it is possible to apply ink to a strip-shaped region (hereinafter referred to as a street 51) having a width Lx in the x-axis direction. The process of moving the ink discharge device 26 from one end in the y-axis direction to the other end of the substrate 50 is referred to as a pass in the y-axis direction once. By performing the passage in the y-axis direction once, the ink can be applied in the x-axis direction with a resolution corresponding to the pitch P. In the one section 51, the ink discharge device 26 is displaced by 1/4 of the pitch P in the x-axis direction and four passes are performed, whereby the resolution in the x-axis direction in one segment 51 can be improved. Up to 4 times. For example, when the pitch P of the nozzle hole 27 (FIG. 2A) corresponds to 300 dpi, the resolution in the x-axis direction can be improved to 1200 dpi by performing four passes.

若對1個區段51之油墨的塗佈結束,則使油墨吐出裝置26相對於基板50沿x軸方向相對移動Lx(圖2A),而執行對相鄰區段51之油墨的塗佈。藉由反覆該處理,能夠對基板50的整個區域的塗佈對象區域塗佈油墨。When the application of the ink of one of the segments 51 is completed, the ink discharge device 26 is relatively moved Lx (Fig. 2A) in the x-axis direction with respect to the substrate 50, and application of the ink to the adjacent segments 51 is performed. By repeating this process, it is possible to apply ink to the application target region of the entire region of the substrate 50.

在對實施例進行說明之前,參閱圖3A~圖3C對利用參考例之方法進行油墨的塗佈之程序及塗佈結果進行說明。Before the description of the examples, the procedure for coating the ink and the coating result by the method of the reference example will be described with reference to FIGS. 3A to 3C.

圖3A係在基板50(圖2B)的表面上劃定之複數個塗佈對象區域55的俯視圖。塗佈對象區域55各個包括與x軸方向平行之邊緣及與y軸方向平行之邊緣。作為一例,塗佈對象區域55各個的平面形狀為正方形或長方形。3A is a plan view of a plurality of application target regions 55 delineated on the surface of the substrate 50 (FIG. 2B). The coating target regions 55 each include an edge parallel to the x-axis direction and an edge parallel to the y-axis direction. As an example, the planar shape of each of the application target regions 55 is a square or a rectangle.

圖3B係沿箭頭56所示之方向(y軸方向)執行4次通過之後的塗佈對象區域55的俯視圖。在塗佈有油墨之區域標註陰影線。對塗佈對象區域55各個塗佈油墨,而由油墨形成膜。FIG. 3B is a plan view of the application target region 55 after four passes in the direction indicated by the arrow 56 (y-axis direction). A hatched line is marked in the area where the ink is applied. The coating target regions 55 are each coated with ink, and the ink is formed into a film.

圖3C係由所塗佈之油墨形成之膜52之放大俯視圖。所形成之膜52的與y軸方向平行之邊緣大致呈直線狀。相對於此,與x軸方向平行之邊緣發生起伏,其直線扭曲變形。Figure 3C is an enlarged plan view of film 52 formed from the applied ink. The edge of the formed film 52 that is parallel to the y-axis direction is substantially linear. On the other hand, the edge parallel to the x-axis direction is undulated, and its straight line is twisted and deformed.

以下,對在與y軸方向平行之邊緣發生變形之原因進行說明。由於一邊使油墨吐出裝置26相對於基板50沿y軸方向相對移動一邊塗佈油墨,因此在與y軸方向平行之邊緣塗佈從同一個噴嘴孔27(圖2A)吐出之油墨。相對於此,在與x軸方向平行之邊緣塗佈從不同之複數個噴嘴孔27吐出之油墨。Hereinafter, the reason why the edge is deformed in parallel with the y-axis direction will be described. Since the ink is applied while the ink discharge device 26 is relatively moved in the y-axis direction with respect to the substrate 50, the ink discharged from the same nozzle hole 27 (Fig. 2A) is applied to the edge parallel to the y-axis direction. On the other hand, the ink ejected from the plurality of different nozzle holes 27 is applied to the edge parallel to the x-axis direction.

不同噴嘴孔27之油墨的吐出方向並不一致。從同一個噴嘴孔27吐出之油墨的液滴彈著之位置,相對於目標位置是在同一方向偏移相同距離。因此,塗佈對象區域55的與y軸方向平行之邊緣大致呈直線。相對於此,從不同之噴嘴孔27吐出之油墨的液滴彈著之位置與目標位置之間的相對位置關係並不相同。因此,由從不同之噴嘴孔27吐出之油墨形成之與x軸方向平行之邊緣由直線扭曲變形。The discharge directions of the inks of the different nozzle holes 27 do not coincide. The position at which the droplets of the ink ejected from the same nozzle hole 27 are bounced are offset by the same distance in the same direction with respect to the target position. Therefore, the edge of the application target region 55 that is parallel to the y-axis direction is substantially straight. On the other hand, the relative positional relationship between the position at which the droplets of the ink ejected from the different nozzle holes 27 are ejected and the target position are not the same. Therefore, the edge formed by the ink ejected from the different nozzle holes 27 and parallel to the x-axis direction is twisted and deformed by a straight line.

接著,參閱圖4A~圖4D、圖5A~圖5B對利用依實施例之方法進行油墨的塗佈之程序進行說明。   圖4A係在基板50(圖2B)的表面上劃定之複數個塗佈對象區域55的俯視圖,其與圖3A所示之俯視圖相同。在圖4A中示出了4個塗佈對象區域55,但實際上更多的塗佈對象區域55分佈於基板50的表面。另外,塗佈對象區域55的位置及形狀由儲存於儲存裝置31(圖1)之圖像資料來定義。在塗佈對象區域55內假想地定義與圖像資料的像素對應之複數個像素。Next, a procedure for applying the ink by the method of the embodiment will be described with reference to FIGS. 4A to 4D and FIGS. 5A to 5B. 4A is a plan view of a plurality of application target regions 55 delineated on the surface of the substrate 50 (FIG. 2B), which is the same as the plan view shown in FIG. 3A. Four coating target regions 55 are shown in FIG. 4A, but actually more coating target regions 55 are distributed on the surface of the substrate 50. Further, the position and shape of the application target region 55 are defined by image data stored in the storage device 31 (FIG. 1). A plurality of pixels corresponding to the pixels of the image data are virtually defined in the coating target region 55.

定義固定於塗佈對象區域55的表面之uv正交坐標系。xyz正交坐標系相對於基座20(圖1)是固定的。在塗佈油墨之前,u軸方向及v軸方向分別與x軸方向及y軸方向平行。複數個塗佈對象區域55各個具有與u軸方向及與v軸方向平行之邊緣。A uv orthogonal coordinate system fixed to the surface of the coating target region 55 is defined. The xyz orthogonal coordinate system is fixed relative to the base 20 (Fig. 1). Before the application of the ink, the u-axis direction and the v-axis direction are parallel to the x-axis direction and the y-axis direction, respectively. Each of the plurality of coating target regions 55 has an edge parallel to the u-axis direction and the v-axis direction.

圖4B係沿箭頭57所示之方向(v軸方向)執行4次通過之後的塗佈對象區域55的俯視圖。對塗佈有油墨之區域標註陰影線。對塗佈對象區域55的與y軸方向平行之邊緣55v及塗佈對象區域55的內部塗佈油墨,而對與x軸方向平行之邊緣55u不塗佈油墨。另外,對正方形或長方形的塗佈對象區域55的頂點的至少1個像素塗佈油墨。可以對包含頂點的像素之頂點附近的複數個像素塗佈油墨。4B is a plan view of the application target region 55 after four passes in the direction indicated by the arrow 57 (v-axis direction). Mark the area where the ink is applied. The ink is applied to the inside of the edge 55v and the application target region 55 which are parallel to the y-axis direction of the application target region 55, and the ink is not applied to the edge 55u which is parallel to the x-axis direction. Further, at least one pixel of the apex of the square or rectangular coating target region 55 is coated with ink. The plurality of pixels near the apex of the pixel containing the vertices may be coated with ink.

在執行4次通過之後,殘留包含與u軸方向平行之邊緣55u上的像素之未塗佈區域59。未塗佈區域59的v軸方向上的尺寸(寬度)為1個像素量以上。由於塗佈對象區域55的頂點的像素被塗佈油墨,因此未塗佈區域59的兩端沒有到達與v軸方向平行之邊緣55v。After performing 4 passes, an uncoated region 59 containing pixels on the edge 55u parallel to the u-axis direction remains. The size (width) of the uncoated region 59 in the v-axis direction is one pixel or more. Since the pixels of the apex of the application target region 55 are coated with ink, both ends of the uncoated region 59 do not reach the edge 55v parallel to the v-axis direction.

圖4C係表示對基板50的所有區段51(圖2B)內的塗佈對象區域55結束圖4B的油墨塗佈處理之後的程序之圖。控制裝置30(圖1)控制旋轉機構21C而使支承部23旋轉90°。旋轉後,固定於塗佈對象區域55的表面之u軸方向及v軸方向分別與y軸方向及x軸方向平行。4C is a view showing a procedure after the application target region 55 in all the segments 51 (FIG. 2B) of the substrate 50 ends the ink coating process of FIG. 4B. The control device 30 (Fig. 1) controls the rotation mechanism 21C to rotate the support portion 23 by 90°. After the rotation, the u-axis direction and the v-axis direction of the surface fixed to the application target region 55 are parallel to the y-axis direction and the x-axis direction, respectively.

圖4D係沿箭頭58所示之方向(u軸方向)執行4次通過之後的塗佈對象區域55的俯視圖。對塗佈有油墨之區域標註陰影線。藉由該4次通過,對未塗佈區域59(圖4A)塗佈油墨。藉由依圖4B及圖4D所示之處理執行之複數次通過,塗佈對象區域55內部的整個區域被塗佈油墨。4D is a plan view of the application target region 55 after four passes in the direction indicated by the arrow 58 (u-axis direction). Mark the area where the ink is applied. By the four passes, the uncoated region 59 (Fig. 4A) was coated with ink. The entire area inside the application target region 55 is coated with ink by a plurality of passes performed by the processes shown in FIGS. 4B and 4D.

圖5A係表示執行圖4B所示之4次通過之後的塗佈對象區域55的頂點附近與噴嘴孔27之間的位置關係之圖。塗佈對象區域55的位置及形狀由排列成正方格子狀之複數個像素60來定義。對藉由執行圖4B所示之4次通過而塗佈了油墨之像素60標註陰影線。FIG. 5A is a view showing a positional relationship between the vicinity of the apex of the application target region 55 and the nozzle hole 27 after the four passes shown in FIG. 4B are performed. The position and shape of the application target region 55 are defined by a plurality of pixels 60 arranged in a square lattice shape. The pixels 60 coated with ink by performing the four passes shown in Fig. 4B are hatched.

另外,在塗佈對象區域55的表面上,實際油墨的液滴覆蓋比1個像素60的大小更大的區域。例如,像素60的間距為相當於解析度1200dpi之約21μm,塗佈於塗佈對象區域55的表面之油墨的液滴的直徑為約50μm。此時,油墨的液滴的直徑相當於約2.5個量的像素60的尺寸。Further, on the surface of the application target region 55, the droplets of the actual ink cover a region larger than the size of one pixel 60. For example, the pitch of the pixel 60 is about 21 μm corresponding to a resolution of 1200 dpi, and the diameter of the droplet of the ink applied to the surface of the application target region 55 is about 50 μm. At this time, the diameter of the droplet of the ink corresponds to the size of the pixel 60 of about 2.5 amounts.

藉由執行4次通過,在與v軸方向平行之邊緣55v上的像素60塗佈油墨,並且在未塗佈區域59以外的內部的像素60亦塗佈油墨。在圖5A中,將未塗佈區域59的寬度設定為像素間距的2倍。並且,對包含塗佈對象區域55的頂點之既定個數(例如2×2個)的像素60塗佈油墨。By performing four passes, the ink is applied to the pixels 60 on the edge 55v parallel to the v-axis direction, and the pixels 60 inside the uncoated region 59 are also coated with ink. In FIG. 5A, the width of the uncoated region 59 is set to be twice the pixel pitch. Further, ink is applied to a predetermined number (for example, 2 × 2) of pixels 60 including the apexes of the application target region 55.

在圖5A中雖示出了藉由第1次通過對與v軸方向平行之邊緣55v上的像素60塗佈油墨之例子,但按照與v軸方向平行之邊緣55v的位置,有可能是藉由第2次~第4次中的任意通過,在邊緣55v上的像素60塗佈油墨。例如,當藉由第4次的通過在與v軸方向平行之邊緣55v上的像素60塗佈油墨之情況下,是藉由第1次的通過,在和與v軸方向平行之邊緣55v上的像素60相鄰之1像素量內側的像素60塗佈油墨。Although an example in which the ink is applied to the pixel 60 on the edge 55v parallel to the v-axis direction by the first pass is shown in FIG. 5A, the position of the edge 55v parallel to the v-axis direction may be borrowed. The ink is applied to the pixel 60 on the edge 55v by any of the second to fourth passes. For example, when the ink is applied by the fourth pass through the pixel 60 on the edge 55v parallel to the v-axis direction, it is by the first pass, on the edge 55v parallel to the v-axis direction. The pixel 60 on the inner side of the pixel 60 adjacent to the pixel 60 is coated with ink.

圖5B係表示即將執行圖4D所示之4次通過之前的塗佈對象區域55的頂點附近與噴嘴孔27之間的位置關係之圖。在圖5B中,基板50的表面的u軸方向與y軸方向平行。在圖5B中,由於未塗佈區域59的寬度為像素間距的2倍,因此藉由執行2次通過,能夠對未塗佈區域59內的所有的像素60塗佈油墨。FIG. 5B is a view showing a positional relationship between the vicinity of the vertex of the application target region 55 and the nozzle hole 27 immediately before the four passes shown in FIG. 4D are performed. In FIG. 5B, the u-axis direction of the surface of the substrate 50 is parallel to the y-axis direction. In FIG. 5B, since the width of the uncoated region 59 is twice the pixel pitch, it is possible to apply ink to all the pixels 60 in the uncoated region 59 by performing the second pass.

按照圖5B所示之未塗佈區域59與其他未塗佈區域之間的位置關係,有可能藉由這2次通過無法對所有的未塗佈區域塗佈油墨。在該情況下,藉由執行第3次及第4次的通過,能夠對所有的未塗佈區域塗佈油墨。According to the positional relationship between the uncoated region 59 and the other uncoated regions shown in Fig. 5B, it is possible that all of the uncoated regions cannot be coated with ink by these two passes. In this case, by performing the third and fourth passes, it is possible to apply ink to all of the uncoated regions.

接著,對藉由採用依上述實施例之膜形成裝置及膜形成方法而得到之優異之效果進行說明。Next, an excellent effect obtained by using the film forming apparatus and the film forming method of the above embodiments will be described.

在上述實施例中,一邊使油墨吐出裝置26相對於基板50沿v軸方向相對移動,一邊將油墨塗佈於塗佈對象區域55的與v軸方向平行之邊緣55v(圖4B),並且,一邊使油墨吐出裝置26相對於基板50沿u軸方向相對移動,一邊將油墨塗佈於與u軸方向平行之邊緣55u(圖4D)。因此,在與u軸方向平行之邊緣塗佈從同一個噴嘴孔27吐出之油墨,在與v軸方向平行之邊緣亦塗佈從同一個噴嘴孔27吐出之油墨。因此,能夠使由油墨形成之膜的邊緣接近直線。因此,能夠使由油墨形成之膜的外觀變好看。並且,當將所塗佈之油墨的膜作為蝕刻遮罩而蝕刻下層膜時,可得到蝕刻後的下層膜的外觀變好看之效果。In the above-described embodiment, the ink ejecting device 26 is applied to the edge 55v parallel to the v-axis direction of the application target region 55 while moving relative to the substrate 50 in the v-axis direction (FIG. 4B). While the ink discharge device 26 is relatively moved in the u-axis direction with respect to the substrate 50, the ink is applied to the edge 55u parallel to the u-axis direction (FIG. 4D). Therefore, the ink discharged from the same nozzle hole 27 is applied to the edge parallel to the u-axis direction, and the ink discharged from the same nozzle hole 27 is also applied to the edge parallel to the v-axis direction. Therefore, the edge of the film formed of the ink can be made to approach a straight line. Therefore, the appearance of the film formed of the ink can be improved. Further, when the film of the applied ink is used as an etching mask to etch the underlayer film, the appearance of the underlayer film after etching can be improved.

縱使當複數個塗佈對象區域55沿u軸方向及v軸方向靠近配置的情況,亦即塗佈對象區域55的u軸方向及v軸方向上的間隔狹窄的情況,藉由減少邊緣的變形,可抑制塗佈於相鄰之塗佈對象區域55之油墨的膜相互連續。例如,當使用所塗佈之油墨的膜作為蝕刻遮罩而蝕刻下層的導電膜時,能夠抑制蝕刻後的導電圖案彼此間的短路故障。Even when a plurality of application target regions 55 are arranged close to each other in the u-axis direction and the v-axis direction, that is, the interval between the u-axis direction and the v-axis direction of the application target region 55 is narrow, and the deformation of the edge is reduced. It is possible to suppress the films of the ink applied to the adjacent application target regions 55 from being continuous with each other. For example, when a film of the applied ink is used as an etching mask to etch the underlying conductive film, short-circuit failure between the conductive patterns after etching can be suppressed.

接著,對未塗佈區域59(圖4B)的寬度的較佳尺寸進行說明。依圖4B所示之塗佈處理,在由油墨形成之膜的與u軸方向平行之邊緣,起因於複數個噴嘴孔27的特性不一,而發生直線的扭曲變形。若未塗佈區域59的寬度過窄,則無法修正該變形。為了修正該變形,將未塗佈區域59的寬度設為可能發生之變形的最大振幅以上為較佳。例如,即使從噴嘴孔27吐出之油墨的方向存在偏差,仍不會使該偏差的寬度超過像素間距。因此,藉由將未塗佈區域59的寬度設為像素間距的2倍以上,能夠充分修正邊緣的變形。Next, a preferred size of the width of the uncoated region 59 (Fig. 4B) will be described. According to the coating treatment shown in Fig. 4B, in the edge parallel to the u-axis direction of the film formed of the ink, the characteristics of the plurality of nozzle holes 27 are different, and linear distortion occurs. If the width of the uncoated region 59 is too narrow, the deformation cannot be corrected. In order to correct this deformation, it is preferable to set the width of the uncoated region 59 to be greater than or equal to the maximum amplitude of deformation that may occur. For example, even if there is a deviation in the direction of the ink ejected from the nozzle holes 27, the width of the deviation does not exceed the pixel pitch. Therefore, by setting the width of the uncoated region 59 to twice or more the pixel pitch, the deformation of the edge can be sufficiently corrected.

另外,無需將未塗佈區域59(圖4B)的平面形狀設為沿u軸方向長的長方形,可以為任意的形狀。只要藉由圖4D所示之處理在未塗佈區域59內塗佈油墨即可。例如,將正方形或長方形的塗佈對象區域55以兩條對角線進行四等分而得到之三角形區域中,可以殘留包含與u軸方向平行之邊緣之兩個區域來作為未塗佈區域59。Further, it is not necessary to set the planar shape of the uncoated region 59 (FIG. 4B) to a rectangular shape that is long in the u-axis direction, and it may have any shape. The ink may be applied in the uncoated region 59 by the treatment shown in Fig. 4D. For example, in a triangular region obtained by dividing a square or rectangular coating target region 55 by two diagonal lines, two regions including edges parallel to the u-axis direction may remain as uncoated regions 59. .

在上述實施例中,需要使基板50旋轉之程序(圖4C),因此有節拍時間(takt time)變長的疑慮。如以下說明,與依習知方法(圖3B)為了進行高品質的油墨塗佈所需之節拍時間相比,依實施例之方法進行油墨的塗佈之節拍時間並不會大幅增加。In the above embodiment, the procedure for rotating the substrate 50 (Fig. 4C) is required, so that there is a fear that the takt time becomes long. As described below, the tact time of the application of the ink by the method of the embodiment is not greatly increased as compared with the tact time required for the high-quality ink application by the conventional method (Fig. 3B).

在以下說明的例子,將基板50的尺寸設為500mm×500mm的正方形,將設置於油墨吐出裝置26之兩端的噴嘴孔27的間隔Lx(圖2A)設為50mm,將噴嘴孔27的間距P(圖2A)設為與300dpi相當的量,將基板50的移動速度設為200mm/s。In the example described below, the size of the substrate 50 is set to a square of 500 mm × 500 mm, and the interval Lx ( FIG. 2A ) of the nozzle holes 27 provided at both ends of the ink discharge device 26 is 50 mm, and the pitch P of the nozzle holes 27 is set. (Fig. 2A) The amount corresponding to 300 dpi was set, and the moving speed of the substrate 50 was set to 200 mm/s.

判明了若使用習知之方法(圖3B)提高x軸方向上之解析度,則塗佈對象區域55的與x軸方向平行之邊緣的變形會減少一定程度。例如,若將y軸方向上的解析度設為1200dpi,將x軸方向上的解析度設為2400dpi,則與x軸方向平行之邊緣的變形減少一定程度。為了將x軸方向上的分解能設為2400dpi,1條區段51(圖2B)的塗佈處理中需要反覆8次通過。在執行1次通過時,油墨吐出裝置26通過基板50的上方之時間為2.5秒,但加減速需要約1秒,因此1次通過所需之時間為約3.5秒。It has been found that when the resolution in the x-axis direction is increased by the conventional method (Fig. 3B), the deformation of the edge of the application target region 55 parallel to the x-axis direction is reduced to some extent. For example, when the resolution in the y-axis direction is 1200 dpi and the resolution in the x-axis direction is 2400 dpi, the deformation of the edge parallel to the x-axis direction is reduced to some extent. In order to set the decomposition energy in the x-axis direction to 2400 dpi, it is necessary to repeatedly pass 8 times in the coating process of one segment 51 (Fig. 2B). When one pass is performed, the time for the ink discharge device 26 to pass above the substrate 50 is 2.5 seconds, but the acceleration and deceleration takes about 1 second, so the time required for one pass is about 3.5 seconds.

在1條區段中需要8次通過,因此1條區段的塗佈處理時間為約28秒。在1片基板50上劃定有10條區段51,因此1片基板50的塗佈處理時間成為約280秒。It takes 8 passes in one section, so the coating treatment time of one section is about 28 seconds. Since 10 segments 51 are defined on one substrate 50, the coating processing time of one substrate 50 is about 280 seconds.

在依實施例之方法中,即使將x軸方向上之解析度降低至1200dpi,亦可得到塗佈對象區域55的邊緣的充分的直線性。因此,1條區段的塗佈處理中執行4次通過即可。即使加上加減速所需之時間,1條區段51的塗佈處理時間亦為14秒。10條區段51的塗佈處理時間成為140秒。在實施例中,個別執行對與v軸方向平行之邊緣塗佈油墨之處理(圖4B)和對與u軸方向平行之邊緣塗佈油墨之處理(圖4D),因此合計需要280秒的處理時間。使基板50旋轉之處理所需之時間為10秒以下。即使旋轉所需之時間為10秒,處理1片基板50之時間亦為約290秒。According to the method of the embodiment, even if the resolution in the x-axis direction is lowered to 1200 dpi, sufficient linearity of the edge of the coating target region 55 can be obtained. Therefore, it is sufficient to perform four passes in the coating process of one section. Even if the time required for acceleration and deceleration is added, the coating processing time of one section 51 is also 14 seconds. The coating treatment time of the ten sections 51 was 140 seconds. In the embodiment, the process of applying the ink to the edge parallel to the v-axis direction (FIG. 4B) and the process of applying the ink to the edge parallel to the u-axis direction (FIG. 4D) are performed individually, so that a total of 280 seconds of processing is required. time. The time required for the process of rotating the substrate 50 is 10 seconds or less. Even if the time required for the rotation is 10 seconds, the time for processing one substrate 50 is about 290 seconds.

如上所述,相對於採用習知之方法時的節拍時間,採用依實施例之塗佈方法時的節拍時間並不會大幅增加。As described above, the takt time when the coating method according to the embodiment is employed is not greatly increased with respect to the takt time when the conventional method is employed.

接著,對上述實施例的變形例進行說明。在上述實施例中,相對於基座20(圖1)使油墨吐出裝置26靜止並使基板50移動,但使基板50及油墨吐出裝置26中的一方相對於另一方相對移動即可。例如,可以使基板50靜止並使油墨吐出裝置26移動。或者,可以在x軸方向上使基板50靜止並使油墨吐出裝置26移動,與其相反地,亦可以在y軸方向上使油墨吐出裝置26靜止並使基板50移動。Next, a modification of the above embodiment will be described. In the above embodiment, the ink discharge device 26 is moved to move the substrate 50 with respect to the susceptor 20 (FIG. 1), but one of the substrate 50 and the ink discharge device 26 may be relatively moved relative to the other. For example, the substrate 50 can be made to stand and the ink ejection device 26 can be moved. Alternatively, the substrate 50 may be stopped in the x-axis direction and the ink discharge device 26 may be moved. Conversely, the ink discharge device 26 may be stationary and the substrate 50 may be moved in the y-axis direction.

在上述實施例中,u軸方向與v軸方向正交,但兩者不一定要正交,交叉即可。例如,塗佈對象區域55各個的平面形狀可以為平行四邊形。此時,在圖4C所示之旋轉處理中,使基板50旋轉u軸方向與v軸方向所成之角度即可。In the above embodiment, the u-axis direction is orthogonal to the v-axis direction, but the two are not necessarily orthogonal to each other and may be crossed. For example, the planar shape of each of the coating target regions 55 may be a parallelogram. At this time, in the rotation processing shown in FIG. 4C, the substrate 50 may be rotated by an angle formed by the u-axis direction and the v-axis direction.

並且,在上述實施例中,由1個噴墨頭構成油墨吐出裝置26,但亦可以由複數個噴墨頭構成油墨吐出裝置26。例如,若將複數個噴墨頭沿x軸方向排列配置,則能夠藉由1次通過來進行複數個區段51(圖2B)的塗佈處理。並且,藉由將n個噴墨頭沿y軸方向排列,並且在x軸方向以噴嘴孔27的間距P(圖2A)的1/n倍移位,能夠將可藉由1次通過而塗佈之解析度提高至n倍。Further, in the above embodiment, the ink discharge device 26 is constituted by one ink jet head, but the ink discharge device 26 may be constituted by a plurality of ink jet heads. For example, when a plurality of ink jet heads are arranged side by side in the x-axis direction, the coating process of the plurality of segments 51 (FIG. 2B) can be performed by one pass. Further, by arranging the n ink-jet heads in the y-axis direction and shifting by 1/n times the pitch P (Fig. 2A) of the nozzle holes 27 in the x-axis direction, it is possible to coat them by one pass. The resolution of the cloth is increased to n times.

接著,參閱圖6A~圖7C對依另一實施例之膜形成裝置及膜形成方法進行說明。以下,對與依圖1~圖5B所示之實施例之膜形成裝置及膜形成方法共同之構成省略說明。Next, a film forming apparatus and a film forming method according to another embodiment will be described with reference to FIGS. 6A to 7C. Hereinafter, the description of the configuration common to the film forming apparatus and the film forming method according to the embodiment shown in FIGS. 1 to 5B will be omitted.

圖6A係在基板50(圖2B)的表面上劃定之複數個塗佈對象區域55的俯視圖,其與圖4A所示之俯視圖相同。Fig. 6A is a plan view of a plurality of application target regions 55 delineated on the surface of the substrate 50 (Fig. 2B), which is the same as the plan view shown in Fig. 4A.

圖6B係沿箭頭61所示之方向(y軸方向及v軸方向)執行4次通過之後的塗佈對象區域55的俯視圖。對塗佈有油墨之區域標註陰影線。執行該4次通過之後的塗佈有油墨之區域之狀態與圖4B所示者相同。在塗佈對象區域55內殘留有未塗佈區域59。FIG. 6B is a plan view of the application target region 55 after four passes in the direction indicated by the arrow 61 (the y-axis direction and the v-axis direction). Mark the area where the ink is applied. The state in which the ink-coated region after the four passes is performed is the same as that shown in Fig. 4B. An uncoated region 59 remains in the coating target region 55.

圖6C係沿箭頭62所示之方向(與x軸方向及u軸方向平行之方向)執行既定次數的通過之後的塗佈對象區域55的俯視圖。藉由該塗佈處理,在未塗佈區域59(圖6B)塗佈油墨,其結果,塗佈對象區域55的內部的整個區域被塗佈油墨。油墨吐出裝置26的噴嘴孔27(圖2A)沿x軸方向排列,因此藉由執行沿x軸方向之1次通過,只有在與x軸方向平行之1行量的像素60塗佈油墨。6C is a plan view of the application target region 55 after a predetermined number of passes are performed in the direction indicated by the arrow 62 (the direction parallel to the x-axis direction and the u-axis direction). By this coating treatment, ink is applied to the uncoated region 59 (FIG. 6B), and as a result, the entire region inside the application target region 55 is coated with ink. The nozzle holes 27 (FIG. 2A) of the ink discharge device 26 are arranged in the x-axis direction. Therefore, by performing the first pass in the x-axis direction, only the pixels 60 of one line parallel to the x-axis direction are coated with ink.

圖7A~圖7C係表示執行圖6C所示之複數次通過時塗佈油墨之像素與油墨吐出裝置26之間的位置關係之圖。Figs. 7A to 7C are views showing the positional relationship between the pixels for applying ink and the ink ejecting device 26 when the plural passes shown in Fig. 6C are performed.

如圖7A所示,使油墨吐出裝置26移動,以使噴嘴孔27的y軸方向上的位置與在未塗佈區域59的複數個像素60中沿u軸方向排列之1行量的像素60的y軸方向上的位置一致。在該狀態下,執行1次使油墨吐出裝置26相對於基板50沿x軸方向相對移動之通過。藉此,對未塗佈區域59內的1行量的像素60塗佈油墨。對1行量的複數個像素60之油墨的塗佈中能夠使用複數個噴嘴孔27中的任一個。但是,為了避免受噴嘴孔27的特性不一的影響,對1行量的複數個像素使用同一個噴嘴孔27為較佳。As shown in FIG. 7A, the ink discharge device 26 is moved so that the position of the nozzle hole 27 in the y-axis direction and the pixel 60 of one line arranged in the u-axis direction in the plurality of pixels 60 of the uncoated region 59 are moved. The position in the y-axis direction is the same. In this state, the passage of the ink discharge device 26 relative to the substrate 50 in the x-axis direction is performed once. Thereby, ink is applied to one line of pixels 60 in the uncoated region 59. Any one of the plurality of nozzle holes 27 can be used for the application of the ink of the plurality of pixels 60 of one line. However, in order to avoid the influence of the characteristics of the nozzle holes 27, it is preferable to use the same nozzle hole 27 for a plurality of pixels of one line.

如圖7B所示,使油墨吐出裝置26相對於基板50相對移動,以使噴嘴孔27的y軸方向上的位置與在未塗佈區域59的複數個像素60中未塗佈油墨之1行量的像素60的y軸方向上的位置一致。As shown in FIG. 7B, the ink ejecting device 26 is relatively moved with respect to the substrate 50 such that the position of the nozzle hole 27 in the y-axis direction and the uncoated ink in the plurality of pixels 60 of the uncoated region 59 are one line. The positions of the pixels 60 in the y-axis direction coincide.

如圖7C所示,執行1次使油墨吐出裝置26相對於基板50沿x軸方向相對移動之通過。藉此,對未塗佈區域59內的1行量的像素60塗佈油墨。As shown in FIG. 7C, the passage of the ink ejection device 26 relative to the substrate 50 in the x-axis direction is performed once. Thereby, ink is applied to one line of pixels 60 in the uncoated region 59.

藉由執行沿x軸方向之1次通過,能夠對1行量的像素60塗佈油墨。直至對所有的未塗佈區域59(圖6B)內的所有的像素60塗佈油墨為止,改變油墨吐出裝置26的y軸方向上的位置而反覆執行沿x軸方向之通過。By performing one pass in the x-axis direction, it is possible to apply ink to one line of pixels 60. Until the ink is applied to all of the pixels 60 in all of the uncoated regions 59 (FIG. 6B), the position in the y-axis direction of the ink discharge device 26 is changed and the passage in the x-axis direction is repeatedly performed.

接著,對藉由採用依圖6A~圖7C所示之實施例之膜形成裝置及膜形成方法而得到之優異之效果進行說明。Next, an excellent effect obtained by using the film forming apparatus and the film forming method according to the examples shown in FIGS. 6A to 7C will be described.

在本實施例中,亦係一邊使油墨吐出裝置26沿v軸方向相對移動,一邊對塗佈對象區域55的與v軸方向平行之邊緣55v(圖6B)塗佈油墨。而且,一邊使油墨吐出裝置26沿u軸方向相對移動,一邊對與u軸方向平行之邊緣55u(圖6C)塗佈油墨。因此,與圖1~圖5B所示之實施例同樣地,能夠減少塗佈對象區域55的邊緣之直線扭曲變形。In the present embodiment, the ink is ejected to the edge 55v (FIG. 6B) parallel to the v-axis direction of the application target region 55 while relatively moving the ink ejection device 26 in the v-axis direction. Further, while the ink discharge device 26 is relatively moved in the u-axis direction, the ink is applied to the edge 55u (FIG. 6C) parallel to the u-axis direction. Therefore, similarly to the embodiment shown in FIGS. 1 to 5B, the linear distortion of the edge of the application target region 55 can be reduced.

並且,在本實施例中,無需使基板50旋轉,因此無需使移動機構21(圖1)具有旋轉功能。Further, in the present embodiment, since it is not necessary to rotate the substrate 50, it is not necessary to have the moving mechanism 21 (Fig. 1) have a rotation function.

接著,對未塗佈區域59(圖4B)的寬度的較佳尺寸進行說明。在本實施例中,與圖1~圖5B所示之實施例同樣地,將未塗佈區域59的寬度設為像素間距的2倍以上為較佳。並且,在本實施例中,在執行沿u軸方向之通過(圖6C)時,只能對1行量的像素60塗佈油墨。為了減少圖6C所示之塗佈處理所需之通過數來謀求節拍時間的縮短,盡可能縮小未塗佈區域59的寬度為較佳。因此,將未塗佈區域59的寬度設為像素間距的2倍為較佳。Next, a preferred size of the width of the uncoated region 59 (Fig. 4B) will be described. In the present embodiment, as in the embodiment shown in Figs. 1 to 5B, it is preferable that the width of the uncoated region 59 is twice or more the pixel pitch. Further, in the present embodiment, when the passage in the u-axis direction (Fig. 6C) is performed, only one line of the pixels 60 can be coated with ink. In order to reduce the number of passes required for the coating process shown in Fig. 6C and to shorten the tact time, it is preferable to reduce the width of the uncoated region 59 as much as possible. Therefore, it is preferable to set the width of the uncoated region 59 to twice the pixel pitch.

接著,對本實施例的變形例進行說明。在本實施例中,在圖6B所示之塗佈處理及圖6C所示之塗佈處理中,沒有改變油墨吐出裝置26的姿勢。亦可以在圖6B所示之塗佈處理結束之後且圖6C所示之塗佈處理之前,使油墨吐出裝置26旋轉90°。如此一來,在進行圖6C所示之塗佈處理時,複數個噴嘴孔27(圖2A)沿v軸方向排列。因此,在圖7A及圖7C所示之處理中,藉由執行1次通過,能夠對複數行的像素60塗佈油墨。其結果,能夠減少通過的執行次數。Next, a modification of this embodiment will be described. In the present embodiment, the posture of the ink discharge device 26 is not changed in the coating process shown in Fig. 6B and the coating process shown in Fig. 6C. It is also possible to rotate the ink discharge device 26 by 90° after the end of the coating process shown in FIG. 6B and before the coating process shown in FIG. 6C. As a result, when the coating process shown in FIG. 6C is performed, a plurality of nozzle holes 27 (FIG. 2A) are arranged in the v-axis direction. Therefore, in the processing shown in FIGS. 7A and 7C, by performing one pass, it is possible to apply ink to the pixels 60 of the plurality of rows. As a result, the number of executions of the pass can be reduced.

接著,參閱圖8A及圖8B對依又一實施例之膜形成裝置及膜形成方法進行說明。以下,對與依圖1~圖5B所示之實施例之膜形成裝置及膜形成方法共同的構成省略說明。在圖1~圖5B所示之實施例中,塗佈對象物為硬式的基板50,但在本實施例中,塗佈對象物為可撓式的基板50。Next, a film formation apparatus and a film formation method according to still another embodiment will be described with reference to FIGS. 8A and 8B. Hereinafter, the description of the configuration common to the film forming apparatus and the film forming method according to the embodiment shown in FIGS. 1 to 5B will be omitted. In the embodiment shown in FIGS. 1 to 5B, the object to be coated is a hard substrate 50. However, in the present embodiment, the object to be coated is a flexible substrate 50.

圖8A係依本實施例之膜形成裝置的概略圖。作為塗佈對象物之可撓式的基板50被從進給輥71進給,並捲取於捲取輥72上。移動機構73被控制裝置30控制,藉此使進給輥71及捲取輥72旋轉。在被從進給輥71進給並捲取於捲取輥72上之期間的基板50的上方配置有油墨吐出裝置26。定義將基板50的輸送方向設為y軸方向,將基板50的寬度方向設為x軸方向,將鉛垂上方設為z軸的正方向之xyz正交坐標系。Fig. 8A is a schematic view showing a film forming apparatus according to the present embodiment. The flexible substrate 50 as an object to be coated is fed from the feed roller 71 and taken up on the take-up roller 72. The moving mechanism 73 is controlled by the control device 30, whereby the feed roller 71 and the take-up roller 72 are rotated. The ink discharge device 26 is disposed above the substrate 50 during the period of being fed from the feed roller 71 and being wound up on the take-up roller 72. The transport direction of the substrate 50 is defined as the y-axis direction, the width direction of the substrate 50 is set to the x-axis direction, and the vertical upper side is set to the xyz orthogonal coordinate system of the positive direction of the z-axis.

油墨吐出裝置26包括與基板50相對向之兩個噴墨頭26A及26B。一個噴墨頭26A具有沿x軸方向排列之複數個噴嘴孔。另一個噴墨頭26B具有沿y軸方向排列之複數個噴嘴孔。並且,噴墨頭26B由直動機構74支承,並且構成為相對於基板50能夠沿x軸方向平移移動。The ink ejection device 26 includes two inkjet heads 26A and 26B opposed to the substrate 50. An ink jet head 26A has a plurality of nozzle holes arranged in the x-axis direction. The other ink jet head 26B has a plurality of nozzle holes arranged in the y-axis direction. Further, the inkjet head 26B is supported by the linear motion mechanism 74, and is configured to be movable in translation in the x-axis direction with respect to the substrate 50.

圖8B係依本實施例之膜形成裝置的概略俯視圖。在進給輥71與捲取輥72之間,基板50沿y軸方向被輸送。一個噴墨頭26A在基板50的寬度方向(x軸方向)上從一個邊緣到達另一個邊緣,能夠對寬度方向的整個區域塗佈油墨。另一個噴墨頭26B在基板50的寬度方向(x軸方向)上能夠從一個邊緣移動至另一個邊緣。在基板50的表面上定義將寬度方向設為u軸方向,將輸送方向設為v軸方向之uv正交坐標系。Fig. 8B is a schematic plan view of the film forming apparatus according to the embodiment. Between the feed roller 71 and the take-up roller 72, the substrate 50 is conveyed in the y-axis direction. One ink jet head 26A passes from one edge to the other edge in the width direction (x-axis direction) of the substrate 50, and is capable of applying ink to the entire region in the width direction. The other inkjet head 26B is movable from one edge to the other in the width direction (x-axis direction) of the substrate 50. A uv orthogonal coordinate system in which the width direction is the u-axis direction and the transport direction is the v-axis direction is defined on the surface of the substrate 50.

在基板50的表面上劃定有複數個塗佈對象區域55。在圖8B中僅示出一部分塗佈對象區域55。塗佈對象區域55包含與u軸方向平行之邊緣55u及與v軸方向平行之邊緣55v。在塗佈對象區域55通過噴墨頭26A的下方時,從噴墨頭26A吐出油墨,對塗佈對象區域55的與v軸方向平行之邊緣55v及內部塗佈油墨。該塗佈處理與圖4B所示之處理實質上相同。在該階段會殘留沿塗佈對象區域55的與u軸方向平行之邊緣55u之未塗佈區域59。A plurality of coating target regions 55 are defined on the surface of the substrate 50. Only a part of the coating target region 55 is shown in FIG. 8B. The coating target region 55 includes an edge 55u parallel to the u-axis direction and an edge 55v parallel to the v-axis direction. When the application target region 55 passes under the inkjet head 26A, the ink is ejected from the inkjet head 26A, and the ink is applied to the edge 55v and the inside of the application target region 55 which are parallel to the v-axis direction. This coating process is substantially the same as the process shown in FIG. 4B. At this stage, an uncoated region 59 along the edge 55u of the coating target region 55 which is parallel to the u-axis direction remains.

在停止基板50的輸送之狀態下,使噴墨頭26B沿x軸方向(u軸方向)移動,藉此對未塗佈區域59塗佈油墨。該塗佈處理中之基板50與油墨吐出裝置26的相對移動與圖4D所示之處理中之相對移動實質上相同。In a state where the conveyance of the substrate 50 is stopped, the inkjet head 26B is moved in the x-axis direction (u-axis direction), whereby the uncoated region 59 is coated with ink. The relative movement of the substrate 50 and the ink discharge device 26 in the coating process is substantially the same as the relative movement in the process shown in Fig. 4D.

接著,對藉由採用依本實施例之膜形成裝置及膜形成方法而得到之優異之效果進行說明。在本實施例中,與圖1~圖5B所示之實施例同樣地,亦能夠使由塗佈於塗佈對象區域55之油墨形成之膜的邊緣接近直線。Next, an excellent effect obtained by using the film forming apparatus and the film forming method according to the present embodiment will be described. In the present embodiment, similarly to the embodiment shown in FIGS. 1 to 5B, the edge of the film formed by the ink applied to the application target region 55 can be made to approach a straight line.

接著,對上述實施例的變形例進行說明。   在上述實施例中,在塗佈對象區域55通過1次噴墨頭26A的下方時進行了油墨的塗佈。為了提高u軸方向上之解析度,可以使噴墨頭26A在u軸方向以比噴嘴孔的間距短的距離移位,並使塗佈對象區域55在噴墨頭26A的下方沿v軸方向往復,而進行基板50的輸送控制。亦即,可以執行複數次v軸方向上的通過。另外,為了提高v軸方向上之解析度,可以使基板50在v軸方向以比噴嘴孔的間距短的距離移動,並使噴墨頭26B沿u軸方向移動複數次。亦即,可以執行複數次u軸方向上的通過。Next, a modification of the above embodiment will be described. In the above embodiment, the application of the ink is performed when the application target region 55 passes under the inkjet head 26A once. In order to increase the resolution in the u-axis direction, the inkjet head 26A can be displaced in the u-axis direction by a distance shorter than the pitch of the nozzle holes, and the application target region 55 is along the v-axis direction below the inkjet head 26A. The conveyance control of the substrate 50 is performed while reciprocating. That is, the passage in the v-axis direction can be performed plural times. Further, in order to increase the resolution in the v-axis direction, the substrate 50 can be moved in the v-axis direction by a distance shorter than the pitch of the nozzle holes, and the ink-jet head 26B can be moved in the u-axis direction a plurality of times. That is, the passage in the u-axis direction can be performed plural times.

並且,在上述實施例中,在對塗佈對象區域55的與v軸方向平行之邊緣55v塗佈油墨時,雖相對於噴墨頭26A沿v方向輸送基板50,但亦可以使基板50靜止並使噴墨頭26A沿v軸方向移動。Further, in the above embodiment, when the ink is applied to the edge 55v parallel to the v-axis direction of the application target region 55, the substrate 50 is transported in the v direction with respect to the inkjet head 26A, but the substrate 50 may be made stationary. The ink jet head 26A is moved in the v-axis direction.

接著,參閱圖9A~圖9C對依又一實施例之膜形成裝置及膜形成方法進行說明。以下,對與圖8A及圖8B所示之膜形成裝置及膜形成方法共同的構成省略說明。Next, a film forming apparatus and a film forming method according to still another embodiment will be described with reference to FIGS. 9A to 9C. Hereinafter, the description of the configuration common to the film forming apparatus and the film forming method shown in FIGS. 8A and 8B will be omitted.

圖9A係依本實施例之膜形成裝置的概略圖。在圖8A及圖8B所示之實施例中,油墨吐出裝置26包括兩個噴墨頭26A、26B,但在本實施例中,油墨吐出裝置26由1個噴墨頭構成。油墨吐出裝置26利用直動機構74能夠沿x軸方向平移移動。Fig. 9A is a schematic view showing a film forming apparatus according to the present embodiment. In the embodiment shown in Figs. 8A and 8B, the ink ejecting device 26 includes two ink jet heads 26A, 26B, but in the present embodiment, the ink ejecting device 26 is constituted by one ink jet head. The ink discharge device 26 is capable of translational movement in the x-axis direction by the linear motion mechanism 74.

圖9B係表示對塗佈對象區域55的與v軸方向平行之邊緣55v塗佈油墨時的基板50及油墨吐出裝置26的移動狀態之俯視圖。藉由沿v軸方向輸送基板50來執行1次通過。使油墨吐出裝置26在u軸方向移位並執行複數次通過,藉此對塗佈對象區域55的與v軸方向平行之邊緣55v及內部塗佈油墨。該塗佈處理與圖6B所示之塗佈處理實質上相同。在該塗佈處理結束之時刻,殘留沿與u軸方向平行之邊緣55u之未塗佈區域59。FIG. 9B is a plan view showing a state of movement of the substrate 50 and the ink discharge device 26 when ink is applied to the edge 55v parallel to the v-axis direction of the application target region 55. One pass is performed by transporting the substrate 50 in the v-axis direction. The ink discharge device 26 is displaced in the u-axis direction and is subjected to a plurality of passes, whereby the ink is applied to the edge 55v parallel to the v-axis direction of the application target region 55 and the inside. This coating process is substantially the same as the coating process shown in FIG. 6B. At the end of the coating process, the uncoated region 59 along the edge 55u parallel to the u-axis direction remains.

圖9C係表示對塗佈對象區域55的與v軸方向平行之邊緣55v塗佈油墨時的基板50及油墨吐出裝置26的移動狀態之俯視圖。在將未塗佈區域59配置於油墨吐出裝置26的下方之狀態下,執行使油墨吐出裝置26沿u軸方向移動之1次通過。一邊沿v軸方向輸送基板50,一邊執行複數次通過,藉此對未塗佈區域59塗佈油墨。該處理與圖6C所示之塗佈處理實質上相同。FIG. 9C is a plan view showing a state of movement of the substrate 50 and the ink discharge device 26 when ink is applied to the edge 55v parallel to the v-axis direction of the application target region 55. In a state where the uncoated region 59 is disposed below the ink discharge device 26, one pass of moving the ink discharge device 26 in the u-axis direction is performed. The substrate 50 is conveyed in the v-axis direction while a plurality of passes are performed, thereby applying ink to the uncoated region 59. This treatment is substantially the same as the coating process shown in Fig. 6C.

接著,對藉由採用依本實施例之膜形成裝置及膜形成方法而得到之優異之效果進行說明。在本實施例中,與圖6A~圖6B所示之實施例同樣地,亦能夠使由塗佈於塗佈對象區域55之油墨形成之膜的邊緣接近直線。Next, an excellent effect obtained by using the film forming apparatus and the film forming method according to the present embodiment will be described. In the present embodiment, as in the embodiment shown in FIGS. 6A to 6B, the edge of the film formed by the ink applied to the application target region 55 can be made to approach a straight line.

接著,參閱圖10A~圖10D對依又一實施例之膜形成方法進行說明。以下,對與依圖1~圖5B所示之實施例之膜形成裝置及膜形成方法共同的構成省略說明。Next, a film forming method according to still another embodiment will be described with reference to Figs. 10A to 10D. Hereinafter, the description of the configuration common to the film forming apparatus and the film forming method according to the embodiment shown in FIGS. 1 to 5B will be omitted.

圖10A係表示在基板50(圖1、圖2B)的表面上劃定之複數個塗佈對象區域55的圖案之俯視圖。在圖1~圖5B所示之實施例中,塗佈對象區域55(圖4A)為具有與u軸方向及v軸方向這兩個方向平行之邊緣55u、55v之正方形或長方形。相對於此,在本實施例中,塗佈對象區域55具有分別與u軸方向、v軸方向及w軸方向這三個方向平行之邊緣55u、55v、55w。例如,塗佈對象區域55各個的平面形狀為等腰梯形。等腰梯形上下反轉並沿w軸方向及與w軸方向正交之方向排列。FIG. 10A is a plan view showing a pattern of a plurality of application target regions 55 delineated on the surface of the substrate 50 (FIGS. 1 and 2B). In the embodiment shown in FIGS. 1 to 5B, the application target region 55 (FIG. 4A) is a square or a rectangle having edges 55u, 55v parallel to the two directions of the u-axis direction and the v-axis direction. On the other hand, in the present embodiment, the application target region 55 has edges 55u, 55v, and 55w which are parallel to the three directions of the u-axis direction, the v-axis direction, and the w-axis direction, respectively. For example, the planar shape of each of the application target regions 55 is an isosceles trapezoid. The isosceles trapezoid is reversed up and down and arranged in the direction of the w-axis and the direction orthogonal to the w-axis direction.

在本實施例中,藉由對與w軸方向平行之邊緣55w、與u軸方向平行之邊緣55u及與v軸方向平行之邊緣55v分別執行w軸方向上的通過、u軸方向上的通過及v軸方向上的通過來塗佈油墨。在初始狀態下,w軸方向與y軸方向平行。In the present embodiment, the passage in the w-axis direction and the passage in the u-axis direction are performed by the edge 55w parallel to the w-axis direction, the edge 55u parallel to the u-axis direction, and the edge 55v parallel to the v-axis direction, respectively. The ink is applied by passing in the direction of the v-axis. In the initial state, the w-axis direction is parallel to the y-axis direction.

圖10B係執行使油墨吐出裝置26沿w軸方向(y軸方向)相對移動之w軸方向上的通過之後的塗佈對象區域55的俯視圖。對塗佈有油墨之區域標註陰影線。對塗佈對象區域55的與w軸方向平行之邊緣55w及塗佈對象區域55的內部塗佈油墨,而對與u軸方向平行之邊緣55u及與v軸方向平行之邊緣55v不塗佈油墨。藉此,殘留未塗佈油墨之未塗佈區域59。未塗佈區域59例如由沿與u軸方向平行之邊緣55u之帶狀區域及沿與v軸方向平行之邊緣55v之帶狀區域構成。FIG. 10B is a plan view of the application target region 55 after the passage of the ink ejection device 26 in the w-axis direction relative to the w-axis direction (y-axis direction). Mark the area where the ink is applied. The ink is applied to the inside of the edge 55w and the application target region 55 which are parallel to the w-axis direction of the application target region 55, and the ink is not applied to the edge 55u parallel to the u-axis direction and the edge 55v parallel to the v-axis direction. . Thereby, the uncoated region 59 of the uncoated ink remains. The uncoated region 59 is composed of, for example, a strip-shaped region along the edge 55u parallel to the u-axis direction and a strip-shaped region along the edge 55v parallel to the v-axis direction.

在執行w軸方向上的通過之後,控制裝置30(圖1)控制旋轉機構21C而使基板50旋轉,以使u軸方向與y軸方向平行。在該狀態下,藉由使油墨吐出裝置26沿y軸方向移動來執行u軸方向上的通過。After the passage in the w-axis direction is performed, the control device 30 (FIG. 1) controls the rotation mechanism 21C to rotate the substrate 50 such that the u-axis direction is parallel to the y-axis direction. In this state, the passage in the u-axis direction is performed by moving the ink discharge device 26 in the y-axis direction.

圖10C係執行u軸方向上的通過之後的塗佈對象區域55的俯視圖。藉由執行u軸方向上的通過,在沿與u軸方向平行之邊緣55u之未塗佈區域59塗佈油墨。FIG. 10C is a plan view of the application target region 55 after the passage in the u-axis direction is performed. By performing the passage in the u-axis direction, the ink is applied to the uncoated region 59 along the edge 55u parallel to the u-axis direction.

在執行u軸方向上的通過之後,控制裝置30(圖1)控制旋轉機構21C而使基板50旋轉,以使v軸方向與y軸方向平行。在該狀態下,藉由使油墨吐出裝置26沿y軸方向移動來執行v軸方向上的通過。After the passage in the u-axis direction is performed, the control device 30 (FIG. 1) controls the rotation mechanism 21C to rotate the substrate 50 such that the v-axis direction is parallel to the y-axis direction. In this state, the passage in the v-axis direction is performed by moving the ink discharge device 26 in the y-axis direction.

圖10D係執行v軸方向上的通過之後的塗佈對象區域55的俯視圖。藉由執行v軸方向上的通過,在沿與v軸方向平行之邊緣55v之未塗佈區域59塗佈油墨。FIG. 10D is a plan view of the application target region 55 after the passage in the v-axis direction is performed. By performing the passage in the v-axis direction, the ink is applied to the uncoated region 59 along the edge 55v parallel to the v-axis direction.

接著,對藉由採用依本實施例之膜形成裝置及膜形成方法而得到之優異之效果進行說明。Next, an excellent effect obtained by using the film forming apparatus and the film forming method according to the present embodiment will be described.

在本實施例中,能夠抑制由油墨形成之膜的與w軸方向平行之邊緣55w、與u軸方向平行之邊緣55u及與v軸方向平行之邊緣55v的直線扭曲變形。為了提高邊緣的直線性,可以將定義塗佈對象區域55的圖案之複數個像素排列成與u軸方向、v軸方向及w軸方向平行。In the present embodiment, it is possible to suppress linear distortion of the edge 55w parallel to the w-axis direction, the edge 55u parallel to the u-axis direction, and the edge 55v parallel to the v-axis direction of the film formed of the ink. In order to improve the linearity of the edge, a plurality of pixels defining the pattern of the application target region 55 may be arranged in parallel with the u-axis direction, the v-axis direction, and the w-axis direction.

在本實施例中,將塗佈對象區域55的平面形狀設為等腰梯形,但亦可以設為具有分別與三個方向平行之邊緣之其他形狀。例如,可以將塗佈對象區域55的平面形狀設為正六邊形並以構成蜂窩結構之方式配置。亦可以將塗佈對象區域55的平面形狀設為其他多邊形。In the present embodiment, the planar shape of the application target region 55 is an isosceles trapezoid, but other shapes having edges parallel to the three directions may be used. For example, the planar shape of the coating target region 55 may be a regular hexagon and arranged to constitute a honeycomb structure. The planar shape of the application target region 55 may be set to another polygon.

上述各實施例為例示,當然能夠進行由不同實施例所示之構成的局部置換或組合。關於由複數個實施例的相同構成發揮之相同之作用效果,將不對每一個實施例逐一說明。另外,本發明並不限於上述實施例。例如,能夠進行各種變更、改良、組合等,這對本領域具有通常知識者而言是顯而易見的。The above embodiments are illustrative, and of course, partial replacements or combinations of the configurations shown in the different embodiments can be performed. The same effects as those of the same configuration of the plural embodiments will not be described one by one for each embodiment. Further, the present invention is not limited to the above embodiment. For example, various modifications, improvements, combinations, and the like can be made, which will be apparent to those of ordinary skill in the art.

20‧‧‧基座20‧‧‧ Pedestal

21‧‧‧移動機構21‧‧‧Mobile agencies

21A‧‧‧x軸方向直動機構21A‧‧‧x-axis direct acting mechanism

21B‧‧‧y軸方向直動機構21B‧‧‧Y-axis direct acting mechanism

21C‧‧‧旋轉機構21C‧‧‧Rotating mechanism

23‧‧‧支承部23‧‧‧Support

24‧‧‧門型框架24‧‧‧Door frame

26‧‧‧油墨吐出裝置26‧‧‧Ink discharge device

26A、26B‧‧‧噴墨頭26A, 26B‧‧ ‧ inkjet head

27‧‧‧噴嘴孔27‧‧‧Nozzle hole

28‧‧‧光源28‧‧‧Light source

30‧‧‧控制裝置30‧‧‧Control device

31‧‧‧儲存裝置31‧‧‧Storage device

35‧‧‧輸入裝置35‧‧‧ Input device

36‧‧‧輸出裝置36‧‧‧Output device

50‧‧‧基板(塗佈對象物)50‧‧‧Substrate (application object)

51‧‧‧區段51‧‧‧ Section

52‧‧‧膜52‧‧‧ film

55‧‧‧塗佈對象區域55‧‧‧Coating area

55u‧‧‧與u軸方向平行之邊緣55u‧‧‧Edge parallel to the u-axis direction

55v‧‧‧與v軸方向平行之邊緣55v‧‧‧Edge parallel to the v-axis

55w‧‧‧與w軸方向平行之邊緣55w‧‧‧Edge parallel to the w-axis

56、57、58‧‧‧表示通過的方向之箭頭56, 57, 58‧‧‧ indicates the direction of the arrow

59‧‧‧未塗佈區域59‧‧‧Uncoated area

60‧‧‧像素60‧‧ ‧ pixels

61、62‧‧‧表示通過的方向之箭頭61, 62‧‧‧ indicates the direction of the arrow

71‧‧‧進給輥71‧‧‧feed rolls

72‧‧‧捲取輥72‧‧‧Winding roller

73‧‧‧移動機構73‧‧‧Mobile agencies

74‧‧‧直動機構74‧‧‧Direct motion mechanism

圖1係依實施例之膜形成裝置的概略圖。   圖2A係油墨吐出裝置的仰視圖,圖2B係表示油墨吐出裝置相對於基板之移動軌跡之俯視圖。   圖3A係在基板的表面上劃定之複數個塗佈對象區域的俯視圖,圖3B係沿箭頭所示之方向執行4次通過之後的塗佈對象區域的俯視圖,圖3C係由所塗佈之油墨形成之膜之放大俯視圖。   圖4A係在基板的表面上劃定之複數個塗佈對象區域的俯視圖,圖4B係沿箭頭所示之方向執行4次通過之後的塗佈對象區域的俯視圖,圖4C係表示對基板的所有的區段內的塗佈對象區域之圖4B的油墨塗佈處理結束之後的程序之圖,圖4D係沿箭頭所示之方向執行4次通過之後的塗佈對象區域的俯視圖。   圖5A係表示執行圖4B所示之4次通過之後的塗佈對象區域的頂點附近與噴嘴孔之間的位置關係之圖,圖5B係表示即將執行圖4D所示之4次通過之前的塗佈對象區域的頂點附近與噴嘴孔之間的位置關係之圖。   圖6A係在成為依另一實施例之膜形成方法形成膜之對象之基板的表面上劃定之複數個塗佈對象區域的俯視圖,圖6B係沿箭頭所示之方向執行4次通過之後的塗佈對象區域的俯視圖,圖6C係沿箭頭所示之方向(與x軸方向及u軸方向平行之方向)執行既定次數的通過之後的塗佈對象區域的俯視圖。   圖7A~圖7C係表示執行圖6C所示之複數次通過時塗佈油墨之像素與油墨吐出裝置之間的位置關係之圖。   圖8A係依又一實施例之膜形成裝置的概略圖,圖8B係膜形成裝置的概略俯視圖。   圖9A係依又一實施例之膜形成裝置的概略圖,圖9B係表示對塗佈對象區域的與v軸方向平行之邊緣塗佈油墨時的基板及油墨吐出裝置的移動的狀態之俯視圖,圖9C係表示對塗佈對象區域的與v軸方向平行之邊緣塗佈油墨時的基板及油墨吐出裝置的移動的狀態之俯視圖。   圖10A係表示在成為依又一實施例之膜形成方法形成膜之對象之基板的表面上劃定之塗佈對象區域的圖案之俯視圖,圖10B係執行w軸方向上的通過之後的塗佈對象區域的俯視圖,圖10C係執行u軸方向上的通過之後的塗佈對象區域的俯視圖,圖10D係執行v軸方向上的通過之後的塗佈對象區域的俯視圖。Fig. 1 is a schematic view showing a film forming apparatus according to an embodiment. 2A is a bottom view of the ink discharge device, and FIG. 2B is a plan view showing a movement trajectory of the ink discharge device with respect to the substrate. 3A is a plan view of a plurality of application target regions defined on the surface of the substrate, and FIG. 3B is a plan view of the application target region after four passes in the direction indicated by the arrow, and FIG. 3C is applied. An enlarged top view of the film formed by the ink. 4A is a plan view of a plurality of application target regions defined on the surface of the substrate, FIG. 4B is a plan view of the application target region after four passes in the direction indicated by the arrow, and FIG. 4C shows all of the substrate. FIG. 4D is a plan view of the application target region after the completion of the ink application process in FIG. 4B in the application target region in the segment, and FIG. 4D is a plan view of the application target region after four passes in the direction indicated by the arrow. Fig. 5A is a view showing the positional relationship between the vicinity of the apex of the application target region and the nozzle hole after the four passes shown in Fig. 4B, and Fig. 5B shows the application immediately before the four passes shown in Fig. 4D are performed. A diagram showing the positional relationship between the vicinity of the vertex of the cloth object area and the nozzle hole. 6A is a plan view of a plurality of application target regions defined on the surface of a substrate to be formed by a film formation method according to another embodiment, and FIG. 6B is performed after four passes in the direction indicated by the arrow. FIG. 6C is a plan view of the application target region after a predetermined number of passes in the direction indicated by the arrow (the direction parallel to the x-axis direction and the u-axis direction). Figs. 7A to 7C are views showing the positional relationship between the pixels for applying ink and the ink ejecting apparatus when the plural number of passes shown in Fig. 6C are performed. Fig. 8A is a schematic view of a film forming apparatus according to still another embodiment, and Fig. 8B is a schematic plan view of a film forming apparatus. 9A is a schematic view of a film forming apparatus according to still another embodiment, and FIG. 9B is a plan view showing a state in which the substrate and the ink discharge device are moved when ink is applied to the edge parallel to the v-axis direction of the application target region. 9C is a plan view showing a state in which the substrate and the ink discharge device are moved when ink is applied to the edge of the application target region that is parallel to the v-axis direction. 10A is a plan view showing a pattern of a coating target region defined on the surface of a substrate to be formed by a film formation method according to still another embodiment, and FIG. 10B is a coating after passing in the w-axis direction. FIG. 10C is a plan view of the application target region after passing in the u-axis direction, and FIG. 10D is a plan view of the application target region after passing in the v-axis direction.

Claims (6)

一種膜形成裝置,其具有:   儲存裝置,儲存包含與第1方向平行之邊緣和與第2方向平行之邊緣之塗佈對象區域的圖案,前述第2方向與前述第1方向交叉;   支承部,支承塗佈對象物;   油墨吐出裝置,朝向由前述支承部支承之塗佈對象物的表面吐出油墨;   移動機構,具有使由前述支承部支承之塗佈對象物和前述油墨吐出裝置中的一方相對於另一方沿固定於塗佈對象物的表面之兩個方向移動之功能;及   控制裝置,控制前述油墨吐出裝置和前述移動機構,   前述控制裝置具有根據儲存於前述儲存裝置之前述塗佈對象區域的圖案執行第1控制和第2控制之功能,   前述第1控制,是一邊使由前述支承部支承之塗佈對象物和前述油墨吐出裝置中的一方相對於另一方沿前述第1方向移動,一邊從前述油墨吐出裝置吐出油墨,藉此對前述塗佈對象區域的與前述第1方向平行之邊緣塗佈油墨,   前述第2控制,是一邊使由前述支承部支承之塗佈對象物和前述油墨吐出裝置中的一方相對於另一方沿前述第2方向移動,一邊從前述油墨吐出裝置吐出油墨,藉此對前述塗佈對象區域的與前述第2方向平行之邊緣塗佈油墨。A film forming apparatus comprising: a storage device that stores a pattern of a coating target region including an edge parallel to the first direction and an edge parallel to the second direction, wherein the second direction intersects the first direction; the support portion The ink discharge device discharges the ink toward the surface of the object to be coated supported by the support portion, and the moving mechanism has one of the object to be coated supported by the support portion and the ink discharge device. a function of moving the other side in two directions fixed to the surface of the object to be coated; and a control device for controlling the ink discharge device and the moving mechanism, the control device having the coating target region stored in the storage device The pattern is configured to perform the functions of the first control and the second control, and the first control moves one of the application target supported by the support portion and the ink discharge device in the first direction with respect to the other. Discharging ink from the ink discharge device, thereby applying the coating The ink is applied to the edge of the target region in parallel with the first direction, and the second control is performed by one of the application target supported by the support portion and the ink discharge device with respect to the other in the second direction. The ink is ejected from the ink discharge device, and the ink is applied to the edge of the application target region that is parallel to the second direction. 如申請專利範圍第1項所述之膜形成裝置,其中,   前述移動機構具有:繞與塗佈對象物的表面的法線方向平行之旋轉軸使由前述支承部支承之塗佈對象物和前述油墨吐出裝置中的一方相對於另一方旋轉之功能,   前述控制裝置具有在執行前述第1控制之後且執行前述第2控制之前執行第3控制之功能,前述第3控制,是控制前述移動機構,使由前述支承部支承之塗佈對象物和前述油墨吐出裝置中的一方相對於另一方旋轉前述第1方向與前述第2方向所成之角度。The film forming apparatus according to claim 1, wherein the moving mechanism has an object to be coated supported by the support portion around a rotation axis parallel to a normal direction of a surface of the object to be coated, and the aforementioned a function of rotating one of the ink discharge devices relative to the other, wherein the control device has a function of executing a third control after performing the first control and before performing the second control, and the third control is to control the movement mechanism. One of the application target object supported by the support portion and the ink discharge device is rotated at an angle formed by the first direction and the second direction with respect to the other. 如申請專利範圍第1項所述之膜形成裝置,其中,   前述油墨吐出裝置包括朝向由前述支承部支承之塗佈對象物的表面吐出油墨之第1噴墨頭和第2噴墨頭,   前述移動機構具有:使由前述支承部支承之塗佈對象物和前述第1噴墨頭中的一方相對於另一方沿前述第1方向移動,並使由前述支承部支承之塗佈對象物和前述第2噴墨頭中的一方相對於另一方沿前述第2方向移動之功能。The film forming apparatus according to the first aspect of the invention, wherein the ink ejecting apparatus includes a first ink jet head and a second ink jet head that eject ink toward a surface of an application object supported by the support portion, The moving mechanism includes: one of the application target object supported by the support portion and the first inkjet head moved in the first direction with respect to the other, and the object to be coated supported by the support portion and the aforementioned The function of moving one of the second ink jet heads in the second direction with respect to the other. 一種膜形成裝置,其具有:   儲存裝置,儲存包含與第1方向平行之邊緣和與第2方向平行之邊緣之塗佈對象區域的圖案,前述第2方向與前述第1方向交叉;   支承部,支承塗佈對象物;   油墨吐出裝置,具有朝向由前述支承部支承之塗佈對象物的表面吐出油墨之複數個噴嘴孔;   移動機構,具有使由前述支承部支承之塗佈對象物和前述油墨吐出裝置中的一方相對於另一方沿與塗佈對象物的表面平行之方向移動之功能;及   控制裝置,控制前述油墨吐出裝置和前述移動機構,   前述控制裝置將前述油墨吐出裝置和前述移動機構控制成,當根據儲存於前述儲存裝置之前述塗佈對象區域的圖案,一邊使由前述支承部支承之塗佈對象物和前述油墨吐出裝置中的一方相對於另一方移動,一邊從前述油墨吐出裝置吐出油墨,藉此對前述塗佈對象區域塗佈油墨時,對與前述第1方向平行之邊緣塗佈從複數個前述噴嘴孔當中同一個前述噴嘴孔吐出之油墨,並且對與前述第2方向平行之邊緣亦塗佈從複數個前述噴嘴孔當中同一個前述噴嘴孔吐出之油墨。A film forming apparatus comprising: a storage device that stores a pattern of a coating target region including an edge parallel to the first direction and an edge parallel to the second direction, wherein the second direction intersects the first direction; the support portion The ink discharge device has a plurality of nozzle holes for discharging ink toward the surface of the object to be coated supported by the support portion, and the moving mechanism has an application target and the ink supported by the support portion. a function of moving one of the discharge devices in a direction parallel to the surface of the object to be coated with respect to the other; and a control device for controlling the ink discharge device and the moving mechanism, wherein the control device sets the ink discharge device and the moving mechanism Controlling the discharge from the ink while moving one of the application object supported by the support portion and the ink discharge device relative to the other based on the pattern of the application target region stored in the storage device The device discharges ink, thereby applying the aforementioned coating object When the ink is applied to the region, the ink discharged from the same one of the plurality of nozzle holes is applied to the edge parallel to the first direction, and the edge parallel to the second direction is also coated from the plurality of The ink ejected from the same nozzle hole in the nozzle hole. 一種膜形成方法,   係一邊使在表面上劃定有包含與第1方向平行之邊緣和與第2方向平行之邊緣之塗佈對象區域之塗佈對象物和油墨吐出裝置中的一方相對於另一方沿前述第1方向移動,一邊對前述塗佈對象區域的與前述第1方向平行之邊緣塗佈油墨,前述第2方向與前述第1方向交叉;   一邊使前述塗佈對象物和油墨吐出裝置中的一方相對於另一方沿前述第2方向移動,一邊對前述塗佈對象區域的與前述第2方向平行之邊緣塗佈油墨;   在使前述塗佈對象物和油墨吐出裝置中的一方相對於另一方沿前述第1方向移動之期間及沿前述第2方向移動之期間中的至少一個期間,對前述塗佈對象區域的內側塗佈油墨。A method of forming a film by arranging one of an application target and an ink discharge device having a coating target region including an edge parallel to the first direction and an edge parallel to the second direction on the surface, with respect to the other While moving in the first direction, the ink is applied to the edge of the application target region parallel to the first direction, and the second direction intersects with the first direction; and the object to be coated and the ink discharge device are disposed. One of the coating target regions and the ink discharge device are coated with ink on one side of the application target region that is parallel to the second direction while moving in the second direction relative to the other. The ink is applied to the inner side of the application target region during at least one of the period in which the other side moves in the first direction and the period in which the second direction is moved. 一種膜形成方法,   係一邊使在表面上劃定有包含與第1方向平行之邊緣和與第2方向平行之邊緣之塗佈對象區域之塗佈對象物和具有複數個噴嘴孔之油墨吐出裝置中的一方相對於另一方沿移動,一邊將從複數個前述噴嘴孔當中同一個前述噴嘴孔吐出之油墨塗佈於與前述第1方向平行之邊緣,前述第2方向與前述第1方向交叉;   一邊使前述塗佈對象物和前述油墨吐出裝置中的一方相對於另一方移動,一邊將從複數個前述噴嘴孔當中同一個前述噴嘴孔吐出之油墨塗佈於與前述第2方向平行之邊緣;   對前述塗佈對象物的內側塗佈從複數個前述噴嘴孔吐出之油墨。A film forming method in which an application object including a coating target region including an edge parallel to the first direction and an edge parallel to the second direction is defined on the surface, and an ink discharge device having a plurality of nozzle holes One of the plurality of nozzle holes is applied to the edge parallel to the first direction, and the second direction intersects with the first direction while moving in one of the plurality of nozzle holes; While moving one of the object to be coated and one of the ink discharge devices relative to the other, the ink discharged from the same one of the plurality of nozzle holes is applied to an edge parallel to the second direction; The ink discharged from a plurality of the nozzle holes is applied to the inner side of the object to be coated.
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