TW201835387A - 鍍覆液及鍍覆製品之製造方法 - Google Patents

鍍覆液及鍍覆製品之製造方法 Download PDF

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Publication number
TW201835387A
TW201835387A TW106144032A TW106144032A TW201835387A TW 201835387 A TW201835387 A TW 201835387A TW 106144032 A TW106144032 A TW 106144032A TW 106144032 A TW106144032 A TW 106144032A TW 201835387 A TW201835387 A TW 201835387A
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TW
Taiwan
Prior art keywords
plating
mol
plating solution
concentration
less
Prior art date
Application number
TW106144032A
Other languages
English (en)
Chinese (zh)
Inventor
繩舟秀美
西脇宏
村田敏一
吉岡秀浩
龜川美幸
Original Assignee
日商太科諾滾輪股份有限公司
日商府梭股份有限公司
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Publication date
Application filed by 日商太科諾滾輪股份有限公司, 日商府梭股份有限公司 filed Critical 日商太科諾滾輪股份有限公司
Publication of TW201835387A publication Critical patent/TW201835387A/zh

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    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/04Electroplating: Baths therefor from solutions of chromium
    • C25D3/06Electroplating: Baths therefor from solutions of chromium from solutions of trivalent chromium
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/04Electroplating: Baths therefor from solutions of chromium
    • C25D3/10Electroplating: Baths therefor from solutions of chromium characterised by the organic bath constituents used

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Electroplating Methods And Accessories (AREA)
TW106144032A 2017-02-08 2017-12-14 鍍覆液及鍍覆製品之製造方法 TW201835387A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2017021006A JP6547232B2 (ja) 2017-02-08 2017-02-08 めっき液ならびにめっき製品の製造方法
JP2017-021006 2017-02-08

Publications (1)

Publication Number Publication Date
TW201835387A true TW201835387A (zh) 2018-10-01

Family

ID=63107327

Family Applications (1)

Application Number Title Priority Date Filing Date
TW106144032A TW201835387A (zh) 2017-02-08 2017-12-14 鍍覆液及鍍覆製品之製造方法

Country Status (6)

Country Link
US (1) US20200040477A1 (enExample)
EP (1) EP3388558A1 (enExample)
JP (1) JP6547232B2 (enExample)
KR (1) KR20190115481A (enExample)
TW (1) TW201835387A (enExample)
WO (1) WO2018146841A1 (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2019156245A1 (ja) * 2018-02-09 2019-08-15 日本製鉄株式会社 容器用鋼板および容器用鋼板の製造方法
JP6624400B1 (ja) * 2018-07-04 2019-12-25 株式会社大都技研 遊技台
CN117488300B (zh) * 2024-01-02 2024-03-29 仪征亚新科双环活塞环有限公司 一种具有硬质镀层的活塞环及其制备方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000249340A (ja) 1999-02-25 2000-09-12 Ngk Spark Plug Co Ltd グロープラグ及びその製造方法
JP2011099126A (ja) * 2008-01-24 2011-05-19 Okuno Chemical Industries Co Ltd 3価クロムめっき浴
JP6373185B2 (ja) * 2014-12-15 2018-08-15 株式会社Jcu 3価クロムめっき液および3価クロムめっき方法

Also Published As

Publication number Publication date
JP2018127667A (ja) 2018-08-16
JP6547232B2 (ja) 2019-07-24
US20200040477A1 (en) 2020-02-06
KR20190115481A (ko) 2019-10-14
WO2018146841A1 (ja) 2018-08-16
EP3388558A1 (en) 2018-10-17

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