TW201614349A - Apparatus and method for irradiating polarized light for light alignment - Google Patents
Apparatus and method for irradiating polarized light for light alignmentInfo
- Publication number
- TW201614349A TW201614349A TW105101223A TW105101223A TW201614349A TW 201614349 A TW201614349 A TW 201614349A TW 105101223 A TW105101223 A TW 105101223A TW 105101223 A TW105101223 A TW 105101223A TW 201614349 A TW201614349 A TW 201614349A
- Authority
- TW
- Taiwan
- Prior art keywords
- irradiation area
- platform
- substrate
- light
- polarized light
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
- G02F1/13378—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation
- G02F1/133788—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation by light irradiation, e.g. linearly polarised light photo-polymerisation
Landscapes
- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- General Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Chemical & Material Sciences (AREA)
- Optics & Photonics (AREA)
- Mathematical Physics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Liquid Crystal (AREA)
- Geometry (AREA)
- General Engineering & Computer Science (AREA)
- High Energy & Nuclear Physics (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013047350A JP5344105B1 (ja) | 2013-03-08 | 2013-03-08 | 光配向用偏光光照射装置及び光配向用偏光光照射方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201614349A true TW201614349A (en) | 2016-04-16 |
TWI602005B TWI602005B (zh) | 2017-10-11 |
Family
ID=49764841
Family Applications (5)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW105101222A TWI602004B (zh) | 2013-03-08 | 2013-12-02 | Polarization polarized light irradiation device |
TW105101224A TWI602006B (zh) | 2013-03-08 | 2013-12-02 | Polarization polarized light irradiation device |
TW105101225A TWI602007B (zh) | 2013-03-08 | 2013-12-02 | Polarization polarized light irradiation device |
TW105101223A TWI602005B (zh) | 2013-03-08 | 2013-12-02 | Polarization polarized light irradiation device |
TW102144053A TW201435456A (zh) | 2013-03-08 | 2013-12-02 | 光定向用偏光光照射裝置及光定向用偏光光照射方法 |
Family Applications Before (3)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW105101222A TWI602004B (zh) | 2013-03-08 | 2013-12-02 | Polarization polarized light irradiation device |
TW105101224A TWI602006B (zh) | 2013-03-08 | 2013-12-02 | Polarization polarized light irradiation device |
TW105101225A TWI602007B (zh) | 2013-03-08 | 2013-12-02 | Polarization polarized light irradiation device |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW102144053A TW201435456A (zh) | 2013-03-08 | 2013-12-02 | 光定向用偏光光照射裝置及光定向用偏光光照射方法 |
Country Status (5)
Country | Link |
---|---|
US (4) | US9354472B2 (zh) |
JP (1) | JP5344105B1 (zh) |
KR (1) | KR101352243B1 (zh) |
CN (6) | CN105807499A (zh) |
TW (5) | TWI602004B (zh) |
Families Citing this family (27)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5344105B1 (ja) * | 2013-03-08 | 2013-11-20 | ウシオ電機株式会社 | 光配向用偏光光照射装置及び光配向用偏光光照射方法 |
WO2015108075A1 (ja) * | 2014-01-15 | 2015-07-23 | 大日本印刷株式会社 | 偏光子、偏光子の製造方法、光配向装置および偏光子の装着方法 |
JP5958491B2 (ja) * | 2014-03-31 | 2016-08-02 | ウシオ電機株式会社 | 偏光光照射装置 |
JP6021854B2 (ja) * | 2014-05-08 | 2016-11-09 | 岩崎電気株式会社 | 光配向装置 |
JP5734494B1 (ja) * | 2014-05-29 | 2015-06-17 | 株式会社飯沼ゲージ製作所 | 光配向処理装置 |
JP5892210B2 (ja) * | 2014-08-04 | 2016-03-23 | 岩崎電気株式会社 | 光配向装置 |
JP5773053B1 (ja) * | 2014-12-06 | 2015-09-02 | ウシオ電機株式会社 | 光配向装置及び光配向方法 |
JP6484851B2 (ja) * | 2014-12-22 | 2019-03-20 | 株式会社ブイ・テクノロジー | 偏光光照射装置 |
JP6398766B2 (ja) * | 2015-02-06 | 2018-10-03 | 東芝ライテック株式会社 | 光配向用偏光光照射装置 |
JP6459580B2 (ja) * | 2015-02-06 | 2019-01-30 | 東芝ライテック株式会社 | 光配向用偏光光照射装置 |
CN205427399U (zh) * | 2015-02-06 | 2016-08-03 | 东芝照明技术株式会社 | 光取向用偏振光照射装置 |
JP5773095B1 (ja) | 2015-02-10 | 2015-09-02 | ウシオ電機株式会社 | 光照射装置および光照射方法 |
US10469692B2 (en) | 2015-02-18 | 2019-11-05 | V Technology Co., Ltd. | Scanning exposure device |
CN104656313B (zh) * | 2015-03-10 | 2018-04-10 | 京东方科技集团股份有限公司 | 光配向装置及方法 |
JP5928629B1 (ja) * | 2015-03-23 | 2016-06-01 | ウシオ電機株式会社 | 光配向装置及び光配向方法 |
JP5983810B1 (ja) * | 2015-04-02 | 2016-09-06 | ウシオ電機株式会社 | 光照射装置 |
JP6240654B2 (ja) * | 2015-05-06 | 2017-11-29 | ウィア・コーポレーション | 光配向装置 |
JP6015810B2 (ja) * | 2015-05-14 | 2016-10-26 | ウシオ電機株式会社 | 光照射装置および光照射方法 |
JP6609998B2 (ja) * | 2015-05-26 | 2019-11-27 | ウシオ電機株式会社 | 光照射装置および光照射方法 |
CN105093691B (zh) * | 2015-08-06 | 2018-07-10 | 京东方科技集团股份有限公司 | 光取向设备及其承载装置 |
JP2017032957A (ja) | 2015-08-06 | 2017-02-09 | ウシオ電機株式会社 | 光照射装置および光照射方法 |
JP6455396B2 (ja) * | 2015-10-30 | 2019-01-23 | 東芝ライテック株式会社 | 光配向用偏光光照射装置 |
CN106773332A (zh) * | 2016-12-26 | 2017-05-31 | 深圳市华星光电技术有限公司 | 照射灯、液晶配向的方法及装置 |
JP6852498B2 (ja) * | 2017-03-24 | 2021-03-31 | 東芝ライテック株式会社 | 光配向用偏光光照射装置及び液晶パネルの製造方法 |
CN110888267B (zh) * | 2019-11-26 | 2020-12-08 | Tcl华星光电技术有限公司 | 液晶配向装置及其操作方法 |
CN117518621A (zh) * | 2023-11-07 | 2024-02-06 | 成都瑞波科材料科技有限公司 | 光配向装置 |
CN117519216B (zh) * | 2024-01-08 | 2024-03-08 | 中建八局检测科技有限公司 | 一种基于传感器联合导航检测避障的运料小车 |
Family Cites Families (35)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63118A (ja) * | 1986-01-31 | 1988-01-05 | Canon Inc | 位置合わせ方法 |
JPH09192567A (ja) * | 1996-01-18 | 1997-07-29 | Toray Ind Inc | 塗布装置および塗布方法並びにカラーフィルタの製造装置およびその製造方法 |
ATE404906T1 (de) | 1996-11-28 | 2008-08-15 | Nikon Corp | Ausrichtvorrichtung und belichtungsverfahren |
US6262796B1 (en) * | 1997-03-10 | 2001-07-17 | Asm Lithography B.V. | Positioning device having two object holders |
JP2001332490A (ja) | 2000-03-14 | 2001-11-30 | Nikon Corp | 位置合わせ方法、露光方法、露光装置、及びデバイス製造方法 |
KR101069333B1 (ko) * | 2003-02-05 | 2011-10-05 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 표시장치의 제조방법 |
US7589822B2 (en) * | 2004-02-02 | 2009-09-15 | Nikon Corporation | Stage drive method and stage unit, exposure apparatus, and device manufacturing method |
US20070030467A1 (en) * | 2004-02-19 | 2007-02-08 | Nikon Corporation | Exposure apparatus, exposure method, and device fabricating method |
CN100576418C (zh) | 2004-08-02 | 2009-12-30 | 优志旺电机株式会社 | 高压放电灯照明装置 |
JP4622409B2 (ja) | 2004-09-16 | 2011-02-02 | ウシオ電機株式会社 | 光配向方法 |
US7256867B2 (en) * | 2004-12-22 | 2007-08-14 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
JP4367347B2 (ja) * | 2005-01-21 | 2009-11-18 | セイコーエプソン株式会社 | 膜形成方法及び電気光学装置の製造方法並びに電子機器 |
JP4815995B2 (ja) * | 2005-10-24 | 2011-11-16 | ウシオ電機株式会社 | 光配向用偏光光照射装置 |
CN100561352C (zh) * | 2005-11-04 | 2009-11-18 | 株式会社Orc制作所 | 激光束、紫外线照射周边曝光装置及其方法 |
JP4925790B2 (ja) * | 2006-11-02 | 2012-05-09 | 友達光電股▲ふん▼有限公司 | 液晶パネル製造装置及び液晶パネルの製造方法 |
US20080187871A1 (en) * | 2007-02-02 | 2008-08-07 | Fujifilm Corporation | Pattern forming apparatus and method |
JP4845757B2 (ja) | 2007-02-02 | 2011-12-28 | 富士フイルム株式会社 | 描画装置及び方法 |
US20090047418A1 (en) * | 2007-08-17 | 2009-02-19 | Seiko Epson Corporation | Film-forming method, and film forming device |
US8917378B2 (en) * | 2007-12-20 | 2014-12-23 | Nikon Corporation | Exposure method, exposure apparatus, and method for producing device with plurality of projection optical systems and pattern having first partial pattern area and second partial area having overlaid area with first partial pattern area |
US7924033B2 (en) * | 2008-03-21 | 2011-04-12 | Electro Scientific Industries, Inc. | Compensation tool for calibrating an electronic component testing machine to a standardized value |
JP4968165B2 (ja) * | 2008-04-24 | 2012-07-04 | ウシオ電機株式会社 | 光配向用偏光光照射装置 |
JP2009295950A (ja) | 2008-05-09 | 2009-12-17 | Nsk Ltd | スキャン露光装置およびスキャン露光方法 |
JP5254073B2 (ja) | 2008-08-21 | 2013-08-07 | Nskテクノロジー株式会社 | スキャン露光装置およびスキャン露光装置の基板搬送方法 |
JP5164069B2 (ja) | 2008-08-28 | 2013-03-13 | Nskテクノロジー株式会社 | スキャン露光装置およびスキャン露光方法 |
RU2481607C2 (ru) * | 2008-11-21 | 2013-05-10 | Шарп Кабусики Кайся | Способ инжектирования капель выравнивающего материала и устройство для его осуществления |
JP5316317B2 (ja) | 2009-09-01 | 2013-10-16 | ウシオ電機株式会社 | 液晶パネルの製造方法 |
JP2011203291A (ja) * | 2010-03-24 | 2011-10-13 | Ushio Inc | 紫外光照射装置 |
JP2012113095A (ja) * | 2010-11-24 | 2012-06-14 | Hitachi High-Technologies Corp | 露光装置及び露光方法 |
JP2012185953A (ja) | 2011-03-04 | 2012-09-27 | Nissin Ion Equipment Co Ltd | イオンビーム照射方法とその装置 |
WO2013157114A1 (ja) * | 2012-04-19 | 2013-10-24 | 信越エンジニアリング株式会社 | 光配向照射装置 |
WO2013157113A1 (ja) | 2012-04-19 | 2013-10-24 | 信越エンジニアリング株式会社 | 光配向照射装置 |
CN109656061A (zh) * | 2012-12-07 | 2019-04-19 | 群康科技(深圳)有限公司 | 光配向光源系统及光配向工艺 |
TWI516878B (zh) * | 2012-12-07 | 2016-01-11 | 群康科技(深圳)有限公司 | 光配向光源系統及光配向製程 |
JP5344105B1 (ja) * | 2013-03-08 | 2013-11-20 | ウシオ電機株式会社 | 光配向用偏光光照射装置及び光配向用偏光光照射方法 |
KR102106414B1 (ko) * | 2013-04-26 | 2020-05-06 | 삼성디스플레이 주식회사 | 증착 챔버, 이를 포함하는 증착 시스템 및 유기 발광 표시장치 제조방법 |
-
2013
- 2013-03-08 JP JP2013047350A patent/JP5344105B1/ja active Active
- 2013-12-02 TW TW105101222A patent/TWI602004B/zh active
- 2013-12-02 TW TW105101224A patent/TWI602006B/zh active
- 2013-12-02 TW TW105101225A patent/TWI602007B/zh active
- 2013-12-02 TW TW105101223A patent/TWI602005B/zh active
- 2013-12-02 TW TW102144053A patent/TW201435456A/zh unknown
- 2013-12-05 KR KR20130150496A patent/KR101352243B1/ko active IP Right Grant
-
2014
- 2014-01-23 CN CN201610341906.9A patent/CN105807499A/zh active Pending
- 2014-01-23 CN CN201420043416.7U patent/CN203705775U/zh not_active Ceased
- 2014-01-23 CN CN201610341924.7A patent/CN105785613A/zh active Pending
- 2014-01-23 CN CN201610341961.8A patent/CN105785661A/zh active Pending
- 2014-01-23 CN CN201410032760.0A patent/CN103728784B/zh not_active Expired - Fee Related
- 2014-01-23 CN CN201610340993.6A patent/CN105785660A/zh active Pending
- 2014-03-07 US US14/201,159 patent/US9354472B2/en active Active
-
2015
- 2015-06-10 US US14/735,956 patent/US9581863B2/en active Active
-
2016
- 2016-07-27 US US15/221,124 patent/US9766503B2/en active Active
- 2016-07-27 US US15/221,053 patent/US9869903B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
CN105807499A (zh) | 2016-07-27 |
US9766503B2 (en) | 2017-09-19 |
US9581863B2 (en) | 2017-02-28 |
US20150277191A1 (en) | 2015-10-01 |
TW201614348A (en) | 2016-04-16 |
KR101352243B1 (ko) | 2014-01-17 |
US9354472B2 (en) | 2016-05-31 |
TW201614350A (en) | 2016-04-16 |
TW201435456A (zh) | 2014-09-16 |
CN203705775U (zh) | 2014-07-09 |
TWI602006B (zh) | 2017-10-11 |
TWI602005B (zh) | 2017-10-11 |
US20160334676A1 (en) | 2016-11-17 |
US9869903B2 (en) | 2018-01-16 |
JP5344105B1 (ja) | 2013-11-20 |
CN105785660A (zh) | 2016-07-20 |
CN103728784B (zh) | 2016-08-24 |
US20140332698A1 (en) | 2014-11-13 |
TWI602004B (zh) | 2017-10-11 |
CN105785613A (zh) | 2016-07-20 |
US20160334675A1 (en) | 2016-11-17 |
TW201614351A (en) | 2016-04-16 |
TWI561903B (zh) | 2016-12-11 |
JP2014174352A (ja) | 2014-09-22 |
TWI602007B (zh) | 2017-10-11 |
CN103728784A (zh) | 2014-04-16 |
CN105785661A (zh) | 2016-07-20 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
TW201614351A (en) | Apparatus and method for irradiating polarized light for light alignment | |
IL265282B1 (en) | Light source for test fixture, test fixture and test method | |
WO2013160303A3 (de) | Röntgenquelle mit modul und detektor für optische strahlung | |
IL245795B (en) | Method, device and substrates for lithographic metrology | |
IL246161B (en) | Control method, lithographic device, mask and substrate | |
CU24262B1 (es) | Un método para procesar un material de biomasa | |
IL235964A0 (en) | Photonic source, metrological device, lithographic system and method for manufacturing the device | |
WO2015026612A3 (en) | Apparatus and method for making information carrying cards through radiation curing, and resulting products | |
AR108830A1 (es) | Sistema de control de acceso de área y método | |
IN2014DN08488A (zh) | ||
MX2016012804A (es) | Dispositivo de procesamiento y metodo de procesamiento. | |
IL245915B (en) | Irradiation source, metrological device, lithographic system and method for preparing the device | |
MX2016007975A (es) | Aparato para retirar huevos de transportadores de huevos, y procedimiento asociado. | |
WO2014187860A3 (en) | Device and method for the decontamination of hollow objects such as container caps using uv radiations | |
EP2980048A4 (en) | DEVICE AND METHOD FOR PRODUCING A COATING FOR METAL OR CERAMIC PLATES AND DEVICE AND METHOD FOR PRODUCING A SUBSTRATE FOR POWER MODULES | |
EP2806451A4 (en) | CONTROL METHOD FOR SPATIAL LIGHT MODULATOR, PATTERN GENERATION METHOD FOR EXPOSURE, AND EXPOSURE METHOD AND DEVICE | |
TW201613740A (en) | Imprint apparatus, imprint method and article manufacturing method | |
IL263774B (en) | Illumination source for an inspection apparatus, inspection apparatus and inspection method | |
AR095926A1 (es) | Método para procesar arsénico | |
WO2016088721A8 (ja) | 基板監視装置、および、基板監視方法 | |
EP3150989A4 (en) | Optical plate, light irradiation device, light measurement device, light irradiation method, and light measurement method | |
BR112015002657A2 (pt) | aparelho e método para o revestimento por plasma de um substrato, em particular de uma placa de prensa. | |
MX356023B (es) | Metodo y aparato para corregir desviaciones de intensidad en un espectrometro. | |
BR112015020769B8 (pt) | aparelho e método de posicionamento de um sistema automatizado | |
IL245886B (en) | A radiation source, a metrological system, a lithographic system and a method for producing a device |