TW201614349A - Apparatus and method for irradiating polarized light for light alignment - Google Patents

Apparatus and method for irradiating polarized light for light alignment

Info

Publication number
TW201614349A
TW201614349A TW105101223A TW105101223A TW201614349A TW 201614349 A TW201614349 A TW 201614349A TW 105101223 A TW105101223 A TW 105101223A TW 105101223 A TW105101223 A TW 105101223A TW 201614349 A TW201614349 A TW 201614349A
Authority
TW
Taiwan
Prior art keywords
irradiation area
platform
substrate
light
polarized light
Prior art date
Application number
TW105101223A
Other languages
English (en)
Other versions
TWI602005B (zh
Inventor
Shingo Sato
Original Assignee
Ushio Electric Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=49764841&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=TW201614349(A) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Ushio Electric Inc filed Critical Ushio Electric Inc
Publication of TW201614349A publication Critical patent/TW201614349A/zh
Application granted granted Critical
Publication of TWI602005B publication Critical patent/TWI602005B/zh

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1337Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303Apparatus specially adapted to the manufacture of LCDs
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1337Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/13378Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation
    • G02F1/133788Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation by light irradiation, e.g. linearly polarised light photo-polymerisation

Landscapes

  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Optics & Photonics (AREA)
  • Mathematical Physics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Liquid Crystal (AREA)
  • Geometry (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
TW105101223A 2013-03-08 2013-12-02 Polarization polarized light irradiation device TWI602005B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2013047350A JP5344105B1 (ja) 2013-03-08 2013-03-08 光配向用偏光光照射装置及び光配向用偏光光照射方法

Publications (2)

Publication Number Publication Date
TW201614349A true TW201614349A (en) 2016-04-16
TWI602005B TWI602005B (zh) 2017-10-11

Family

ID=49764841

Family Applications (5)

Application Number Title Priority Date Filing Date
TW105101222A TWI602004B (zh) 2013-03-08 2013-12-02 Polarization polarized light irradiation device
TW105101224A TWI602006B (zh) 2013-03-08 2013-12-02 Polarization polarized light irradiation device
TW105101225A TWI602007B (zh) 2013-03-08 2013-12-02 Polarization polarized light irradiation device
TW105101223A TWI602005B (zh) 2013-03-08 2013-12-02 Polarization polarized light irradiation device
TW102144053A TW201435456A (zh) 2013-03-08 2013-12-02 光定向用偏光光照射裝置及光定向用偏光光照射方法

Family Applications Before (3)

Application Number Title Priority Date Filing Date
TW105101222A TWI602004B (zh) 2013-03-08 2013-12-02 Polarization polarized light irradiation device
TW105101224A TWI602006B (zh) 2013-03-08 2013-12-02 Polarization polarized light irradiation device
TW105101225A TWI602007B (zh) 2013-03-08 2013-12-02 Polarization polarized light irradiation device

Family Applications After (1)

Application Number Title Priority Date Filing Date
TW102144053A TW201435456A (zh) 2013-03-08 2013-12-02 光定向用偏光光照射裝置及光定向用偏光光照射方法

Country Status (5)

Country Link
US (4) US9354472B2 (zh)
JP (1) JP5344105B1 (zh)
KR (1) KR101352243B1 (zh)
CN (6) CN105807499A (zh)
TW (5) TWI602004B (zh)

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5344105B1 (ja) * 2013-03-08 2013-11-20 ウシオ電機株式会社 光配向用偏光光照射装置及び光配向用偏光光照射方法
WO2015108075A1 (ja) * 2014-01-15 2015-07-23 大日本印刷株式会社 偏光子、偏光子の製造方法、光配向装置および偏光子の装着方法
JP5958491B2 (ja) * 2014-03-31 2016-08-02 ウシオ電機株式会社 偏光光照射装置
JP6021854B2 (ja) * 2014-05-08 2016-11-09 岩崎電気株式会社 光配向装置
JP5734494B1 (ja) * 2014-05-29 2015-06-17 株式会社飯沼ゲージ製作所 光配向処理装置
JP5892210B2 (ja) * 2014-08-04 2016-03-23 岩崎電気株式会社 光配向装置
JP5773053B1 (ja) * 2014-12-06 2015-09-02 ウシオ電機株式会社 光配向装置及び光配向方法
JP6484851B2 (ja) * 2014-12-22 2019-03-20 株式会社ブイ・テクノロジー 偏光光照射装置
JP6398766B2 (ja) * 2015-02-06 2018-10-03 東芝ライテック株式会社 光配向用偏光光照射装置
JP6459580B2 (ja) * 2015-02-06 2019-01-30 東芝ライテック株式会社 光配向用偏光光照射装置
CN205427399U (zh) * 2015-02-06 2016-08-03 东芝照明技术株式会社 光取向用偏振光照射装置
JP5773095B1 (ja) 2015-02-10 2015-09-02 ウシオ電機株式会社 光照射装置および光照射方法
US10469692B2 (en) 2015-02-18 2019-11-05 V Technology Co., Ltd. Scanning exposure device
CN104656313B (zh) * 2015-03-10 2018-04-10 京东方科技集团股份有限公司 光配向装置及方法
JP5928629B1 (ja) * 2015-03-23 2016-06-01 ウシオ電機株式会社 光配向装置及び光配向方法
JP5983810B1 (ja) * 2015-04-02 2016-09-06 ウシオ電機株式会社 光照射装置
JP6240654B2 (ja) * 2015-05-06 2017-11-29 ウィア・コーポレーション 光配向装置
JP6015810B2 (ja) * 2015-05-14 2016-10-26 ウシオ電機株式会社 光照射装置および光照射方法
JP6609998B2 (ja) * 2015-05-26 2019-11-27 ウシオ電機株式会社 光照射装置および光照射方法
CN105093691B (zh) * 2015-08-06 2018-07-10 京东方科技集团股份有限公司 光取向设备及其承载装置
JP2017032957A (ja) 2015-08-06 2017-02-09 ウシオ電機株式会社 光照射装置および光照射方法
JP6455396B2 (ja) * 2015-10-30 2019-01-23 東芝ライテック株式会社 光配向用偏光光照射装置
CN106773332A (zh) * 2016-12-26 2017-05-31 深圳市华星光电技术有限公司 照射灯、液晶配向的方法及装置
JP6852498B2 (ja) * 2017-03-24 2021-03-31 東芝ライテック株式会社 光配向用偏光光照射装置及び液晶パネルの製造方法
CN110888267B (zh) * 2019-11-26 2020-12-08 Tcl华星光电技术有限公司 液晶配向装置及其操作方法
CN117518621A (zh) * 2023-11-07 2024-02-06 成都瑞波科材料科技有限公司 光配向装置
CN117519216B (zh) * 2024-01-08 2024-03-08 中建八局检测科技有限公司 一种基于传感器联合导航检测避障的运料小车

Family Cites Families (35)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63118A (ja) * 1986-01-31 1988-01-05 Canon Inc 位置合わせ方法
JPH09192567A (ja) * 1996-01-18 1997-07-29 Toray Ind Inc 塗布装置および塗布方法並びにカラーフィルタの製造装置およびその製造方法
ATE404906T1 (de) 1996-11-28 2008-08-15 Nikon Corp Ausrichtvorrichtung und belichtungsverfahren
US6262796B1 (en) * 1997-03-10 2001-07-17 Asm Lithography B.V. Positioning device having two object holders
JP2001332490A (ja) 2000-03-14 2001-11-30 Nikon Corp 位置合わせ方法、露光方法、露光装置、及びデバイス製造方法
KR101069333B1 (ko) * 2003-02-05 2011-10-05 가부시키가이샤 한도오따이 에네루기 켄큐쇼 표시장치의 제조방법
US7589822B2 (en) * 2004-02-02 2009-09-15 Nikon Corporation Stage drive method and stage unit, exposure apparatus, and device manufacturing method
US20070030467A1 (en) * 2004-02-19 2007-02-08 Nikon Corporation Exposure apparatus, exposure method, and device fabricating method
CN100576418C (zh) 2004-08-02 2009-12-30 优志旺电机株式会社 高压放电灯照明装置
JP4622409B2 (ja) 2004-09-16 2011-02-02 ウシオ電機株式会社 光配向方法
US7256867B2 (en) * 2004-12-22 2007-08-14 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP4367347B2 (ja) * 2005-01-21 2009-11-18 セイコーエプソン株式会社 膜形成方法及び電気光学装置の製造方法並びに電子機器
JP4815995B2 (ja) * 2005-10-24 2011-11-16 ウシオ電機株式会社 光配向用偏光光照射装置
CN100561352C (zh) * 2005-11-04 2009-11-18 株式会社Orc制作所 激光束、紫外线照射周边曝光装置及其方法
JP4925790B2 (ja) * 2006-11-02 2012-05-09 友達光電股▲ふん▼有限公司 液晶パネル製造装置及び液晶パネルの製造方法
US20080187871A1 (en) * 2007-02-02 2008-08-07 Fujifilm Corporation Pattern forming apparatus and method
JP4845757B2 (ja) 2007-02-02 2011-12-28 富士フイルム株式会社 描画装置及び方法
US20090047418A1 (en) * 2007-08-17 2009-02-19 Seiko Epson Corporation Film-forming method, and film forming device
US8917378B2 (en) * 2007-12-20 2014-12-23 Nikon Corporation Exposure method, exposure apparatus, and method for producing device with plurality of projection optical systems and pattern having first partial pattern area and second partial area having overlaid area with first partial pattern area
US7924033B2 (en) * 2008-03-21 2011-04-12 Electro Scientific Industries, Inc. Compensation tool for calibrating an electronic component testing machine to a standardized value
JP4968165B2 (ja) * 2008-04-24 2012-07-04 ウシオ電機株式会社 光配向用偏光光照射装置
JP2009295950A (ja) 2008-05-09 2009-12-17 Nsk Ltd スキャン露光装置およびスキャン露光方法
JP5254073B2 (ja) 2008-08-21 2013-08-07 Nskテクノロジー株式会社 スキャン露光装置およびスキャン露光装置の基板搬送方法
JP5164069B2 (ja) 2008-08-28 2013-03-13 Nskテクノロジー株式会社 スキャン露光装置およびスキャン露光方法
RU2481607C2 (ru) * 2008-11-21 2013-05-10 Шарп Кабусики Кайся Способ инжектирования капель выравнивающего материала и устройство для его осуществления
JP5316317B2 (ja) 2009-09-01 2013-10-16 ウシオ電機株式会社 液晶パネルの製造方法
JP2011203291A (ja) * 2010-03-24 2011-10-13 Ushio Inc 紫外光照射装置
JP2012113095A (ja) * 2010-11-24 2012-06-14 Hitachi High-Technologies Corp 露光装置及び露光方法
JP2012185953A (ja) 2011-03-04 2012-09-27 Nissin Ion Equipment Co Ltd イオンビーム照射方法とその装置
WO2013157114A1 (ja) * 2012-04-19 2013-10-24 信越エンジニアリング株式会社 光配向照射装置
WO2013157113A1 (ja) 2012-04-19 2013-10-24 信越エンジニアリング株式会社 光配向照射装置
CN109656061A (zh) * 2012-12-07 2019-04-19 群康科技(深圳)有限公司 光配向光源系统及光配向工艺
TWI516878B (zh) * 2012-12-07 2016-01-11 群康科技(深圳)有限公司 光配向光源系統及光配向製程
JP5344105B1 (ja) * 2013-03-08 2013-11-20 ウシオ電機株式会社 光配向用偏光光照射装置及び光配向用偏光光照射方法
KR102106414B1 (ko) * 2013-04-26 2020-05-06 삼성디스플레이 주식회사 증착 챔버, 이를 포함하는 증착 시스템 및 유기 발광 표시장치 제조방법

Also Published As

Publication number Publication date
CN105807499A (zh) 2016-07-27
US9766503B2 (en) 2017-09-19
US9581863B2 (en) 2017-02-28
US20150277191A1 (en) 2015-10-01
TW201614348A (en) 2016-04-16
KR101352243B1 (ko) 2014-01-17
US9354472B2 (en) 2016-05-31
TW201614350A (en) 2016-04-16
TW201435456A (zh) 2014-09-16
CN203705775U (zh) 2014-07-09
TWI602006B (zh) 2017-10-11
TWI602005B (zh) 2017-10-11
US20160334676A1 (en) 2016-11-17
US9869903B2 (en) 2018-01-16
JP5344105B1 (ja) 2013-11-20
CN105785660A (zh) 2016-07-20
CN103728784B (zh) 2016-08-24
US20140332698A1 (en) 2014-11-13
TWI602004B (zh) 2017-10-11
CN105785613A (zh) 2016-07-20
US20160334675A1 (en) 2016-11-17
TW201614351A (en) 2016-04-16
TWI561903B (zh) 2016-12-11
JP2014174352A (ja) 2014-09-22
TWI602007B (zh) 2017-10-11
CN103728784A (zh) 2014-04-16
CN105785661A (zh) 2016-07-20

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