TW201604156A - Laminate substrate dividing method and dividing device - Google Patents

Laminate substrate dividing method and dividing device Download PDF

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Publication number
TW201604156A
TW201604156A TW104114611A TW104114611A TW201604156A TW 201604156 A TW201604156 A TW 201604156A TW 104114611 A TW104114611 A TW 104114611A TW 104114611 A TW104114611 A TW 104114611A TW 201604156 A TW201604156 A TW 201604156A
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Taiwan
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bonded substrate
substrate
bonding
main surface
predetermined
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TW104114611A
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Chinese (zh)
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TWI666183B (en
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Kenji Murakami
Masakazu Takeda
Taichi Hashimoto
kenta Tamura
Mamoru Hideshima
Hisashi Isokawa
Noriyuki Kuriyama
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Mitsuboshi Diamond Ind Co Ltd
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/77Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
    • H01L21/78Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67092Apparatus for mechanical treatment

Abstract

This invention provides a method of properly dividing a laminate substrate. This invention is a method for dividing a laminate substrate formed by laminating two brittle material substrates at a specifically predetermined dividing location, the method comprising: a scribed line formation step for scribing a line at the predetermined dividing location on a main surface of the laminate substrate; a holding tape adhering step for adhering a holding tape on the main surface of the laminate substrate provided with the scribed line; a carrying step for carrying the laminate substrate adhered with the holding tape, by contacting the entire surface of the main surface, onto a surface-smoothened elastomer; and a dividing step for, given that the laminate substrate is carried onto the elastomer, contacting the front tip of an upper blade to the predetermined dividing location and at the same time moving it downwardly, so as to extend the crack from the scribed line to divide the laminate substrate.

Description

貼合基板之分斷方法及分斷裝置 Method for dividing substrate and dividing device

本發明係關於一種將貼合2個脆性材料基板而成之貼合基板、例如貼合包含不同材料之2個脆性材料基板而成之貼合基板進行分斷之方法及用於該方法之裝置。 The present invention relates to a method of separating a bonded substrate obtained by bonding two brittle material substrates, for example, a bonded substrate obtained by bonding two brittle material substrates containing different materials, and a device for the same .

利用接著劑(樹脂)貼合2個脆性材料基板而成之貼合基板、尤其利用接著劑貼合包含不同材料之2個脆性材料基板而成之貼合基板(異種材料貼合基板)被用作各種元件之基板。例如,有以下之基板等:將於一主面形成特定之元件(例如CMOS(Complementary Metal Oxide Semiconductor,互補金氧半導體)感測器等)用圖案而成之單晶矽基板等半導體基板之另一主面貼合於作為支持基板之玻璃基板,以此而形成。此種元件係藉由在將二維地重複形成電路圖案而成之作為母基板之單晶矽晶圓上與玻璃基板利用接著劑(樹脂)貼合之後,分斷成特定之尺寸之短條狀或格子狀之單片(晶片),從而製作而成(例如參照專利文獻1)。 A bonded substrate in which two brittle material substrates are bonded together with an adhesive (resin), and a bonded substrate (a different material bonding substrate) obtained by bonding two brittle material substrates containing different materials by an adhesive is used. A substrate for various components. For example, there is a substrate or the like which is formed of a semiconductor substrate such as a single crystal germanium substrate in which a specific element (for example, a CMOS (Complementary Metal Oxide Semiconductor) sensor) is patterned on one main surface. One main surface is bonded to a glass substrate as a support substrate, and is formed by this. Such a device is formed by bonding an adhesive (resin) to a glass substrate on a single crystal germanium wafer as a mother substrate in which a circuit pattern is repeatedly formed two-dimensionally, and then breaking into short strips of a specific size. A single piece (wafer) in the form of a grid or a grid is produced (for example, refer to Patent Document 1).

又,對預先於一主面形成有劃線之脆性材料基板藉由利用三點彎曲方式使裂痕自該劃線伸展而進行分斷之裝置(破碎機)亦已公知(例如參照專利文獻2)。 In addition, a device (crusher) that breaks a crack from a scribe line by a three-point bending method in which a slab is formed by a three-point bending method is known (for example, see Patent Document 2). .

[先前技術文獻] [Previous Technical Literature] [專利文獻] [Patent Literature]

[專利文獻1]日本專利特開2010-40621號公報 [Patent Document 1] Japanese Patent Laid-Open Publication No. 2010-40621

[專利文獻2]日本專利特開2014-83821號公報 [Patent Document 2] Japanese Patent Laid-Open Publication No. 2014-83821

作為於一脆性材料基板(矽基板)形成圖案而成之(異種材料)貼合基板之分斷(單片化)方法,本發明者等人嘗試如下方法:於形成有該圖案之面貼附保護膜後,於另一脆性材料基板(玻璃基板)側形成劃線,之後利用如專利文獻2所揭示之破碎機沿該劃線進行折斷。 As a method of breaking (singulation) of a bonded substrate (a dissimilar material) formed by patterning a brittle material substrate (tantalum substrate), the inventors of the present invention have tried the following method: attaching to the surface on which the pattern is formed After the protective film, a scribe line is formed on the side of another brittle material substrate (glass substrate), and then fractured along the scribe line by a crusher as disclosed in Patent Document 2.

然而,於利用該方法進行折斷之情形時,存在如下情況:由於在2個脆性材料基板之間介存接著劑之層等,而產生裂痕自劃線之伸展方向從基板之厚度方向傾斜地偏離之不良狀況。又,由於利用破碎機之上刀片自上方之壓入量(自上刀片抵接於貼合基板或保護膜至折斷完成為止的上刀片之下降距離)較大,因此亦存在容易產生貼合基板之位置偏移之不良狀況。該等不良狀況之產生成為產生晶片之品質劣化等降低晶片之良率之主要原因,因此不佳。 However, in the case of breaking by the method, there is a case where a crack is formed obliquely from the thickness direction of the substrate due to the layer of the adhesive agent interposed between the two brittle material substrates. Bad condition. Moreover, since the amount of press-fitting of the insert from the upper side of the crusher (the lowering distance of the upper blade from the upper blade abutting on the bonded substrate or the protective film to the completion of the break) is large, there is also a possibility that the bonded substrate is easily generated. The positional offset is a bad condition. The occurrence of such defects is a cause of a decrease in the yield of the wafer such as deterioration in quality of the wafer, which is not preferable.

本發明係鑒於上述問題而完成者,目的在於提供一種可較佳地分斷貼合基板、尤其異種材料貼合基板之方法。 The present invention has been made in view of the above problems, and it is an object of the invention to provide a method for preferably separating a bonded substrate, particularly a heterogeneous material bonded to a substrate.

為了解決上述問題,技術方案1及3之發明之特徵在於:其係將貼合2個脆性材料基板而成之貼合基板於特定之分斷預定位置進行分斷之方法,且具備:劃線形成步驟,其係於上述貼合基板之一主面側之上述分斷預定位置設置劃線;基板貼附步驟,其係將設有上述劃線之上述貼合基板之上述一主面貼附於保持帶;保護膜貼附步驟,其係視需要於上述貼合基板之另一主面貼附保護膜;載置步驟,其係將貼附於上述保持帶且視需要貼附有上述保護帶之上述貼合基板以上述一主面側整面接觸之方式,載置於表面經平滑化而成之彈性體上;及分斷步驟,其係於將上述貼合基板載置於上述彈性體之狀態下,藉由使 上刀片之前端一面抵接於上述分斷預定位置一面下降(使裂痕自上述劃線伸展),而將上述貼合基板分斷。 In order to solve the above problems, the inventions of the first and third aspects are characterized in that the bonded substrate obtained by bonding two brittle material substrates is cut at a predetermined predetermined position, and is provided with a scribing line. a forming step of providing a scribe line at a predetermined predetermined position on a main surface side of the bonded substrate; and a substrate attaching step of attaching the one main surface of the bonded substrate provided with the scribe line a protective tape attaching step of attaching a protective film to the other main surface of the bonded substrate as needed; and a placing step of attaching the protective tape to the holding tape and attaching the protective layer as needed The above-mentioned bonded substrate is placed on the surface of the above-mentioned main surface side so as to be placed on the surface of the elastic body which is smoothed; and the breaking step is performed by placing the above-mentioned bonded substrate on the above elastic layer In the state of the body, by making The front end of the upper blade is lowered while abutting against the predetermined predetermined position (the crack is extended from the scribe line), and the bonded substrate is divided.

又,技術方案2及3之發明之特徵在於:其係將貼合2個脆性材料基板而成之貼合基板於複數個分斷預定位置依序進行分斷之方法,且具備:劃線形成步驟,其係於上述貼合基板之一主面側之複數個上述分斷預定位置設置劃線;基板貼附步驟,其係將設有上述劃線之上述貼合基板之上述一主面貼附於保持帶;保護膜貼附步驟,其係視需要於上述貼合基板之另一主面貼附保護膜;載置步驟,其係將貼附於上述保持帶且視需要貼附有上述保護膜之上述貼合基板以上述一主面側整面接觸之方式,載置於表面經平滑化而成之彈性體上;及分斷步驟,其係於將上述貼合基板載置於上述彈性體之狀態下,於上述複數個上述分斷預定位置上重複如下操作,即,藉由使上刀片之前端一面抵接於上述分斷預定位置一面下降(使裂痕自上述劃線伸展),而將上述貼合基板分斷。 Further, the invention according to the second and third aspects is characterized in that the bonded substrate obtained by bonding two brittle material substrates is sequentially cut at a plurality of predetermined predetermined positions, and is provided with a scribe line. a step of providing a scribe line at a plurality of predetermined predetermined positions on a main surface side of the bonded substrate; and a substrate attaching step of affixing the one main surface of the bonded substrate provided with the scribe line Attached to the holding tape; a protective film attaching step, wherein a protective film is attached to the other main surface of the bonded substrate as needed; and a placing step is attached to the holding tape and attached as needed The bonded substrate of the protective film is placed on the surface of the elastic surface of the smoothed surface so as to be in contact with the entire surface of the main surface; and the breaking step is performed by placing the bonded substrate on the surface In the state of the elastic body, the plurality of predetermined breaking positions are repeated at the predetermined position, that is, by lowering the front end of the upper blade against the predetermined breaking position (to cause the crack to extend from the scribe line), And the above-mentioned bonded substrate is cut off

又,技術方案4之發明之特徵在於:其係將貼合2個脆性材料基板而成之貼合基板於特定之分斷預定位置進行分斷之方法,且上述貼合基板於一主面側之上述分斷預定位置形成有劃線且上述一主面朝向下方,於利用表面經平滑化而成之彈性體自下方支持上述貼合基板之狀態下,藉由使上刀片之前端一面抵接於上述分斷預定位置一面下降,而將上述貼合基板分斷。 Further, the invention of claim 4 is characterized in that the bonded substrate obtained by bonding two brittle material substrates is cut at a predetermined predetermined position, and the bonded substrate is on one main surface side. The predetermined predetermined position is formed with a scribe line and the one main surface faces downward. When the elastic body formed by smoothing the surface supports the bonded substrate from below, the front end of the upper blade is abutted. The bonded substrate is divided while being lowered at the predetermined predetermined position.

又,技術方案5之發明之特徵在於:其係將貼合2個脆性材料基板而成之貼合基板於特定之分斷預定位置進行分斷之裝置,且具備:劃線形成機構,其於上述貼合基板之一主面側之上述分斷預定位置設置劃線;基板貼附機構,其將設有上述劃線之上述貼合基板之上述一主面貼附於保持帶;載置機構,其將貼附有上述保持帶之上述貼合基板以上述一主面側整面接觸之方式,載置於表面經平滑化而成之彈性 體上;及分斷機構,其於將上述貼合基板載置於上述彈性體之狀態下,藉由使上刀片之前端一面抵接於上述分斷預定位置一面下降,而將上述貼合基板分斷。 Further, the invention of claim 5 is characterized in that the bonded substrate obtained by bonding two brittle material substrates is cut at a predetermined predetermined position, and includes a scribing forming mechanism. a scribe line is provided at the predetermined predetermined position on the main surface side of the bonded substrate; and the substrate attaching mechanism attaches the one main surface of the bonded substrate on which the scribe line is provided to the holding tape; and the mounting mechanism And the laminated substrate to which the holding tape is attached is placed on the surface of the one main surface side so as to be placed on the surface to be smoothed And the breaking mechanism, wherein the bonding substrate is placed on the elastic body, and the bonding substrate is lowered by abutting the front end of the upper blade against the predetermined breaking position Break.

又,技術方案6之發明之特徵在於:其係將貼合2個脆性材料基板而成之貼合基板於特定之分斷預定位置進行分斷之裝置,且具備:表面經平滑化而成之彈性體,其自下方支持上述貼合基板,上述貼合基板於一主面側之上述分斷預定位置形成有劃線且上述一主面朝向下方;及分斷機構,其藉由使設於上述彈性體上方之上刀片之前端一面抵接於上述分斷預定位置一面下降,而將上述貼合基板分斷。 Further, the invention according to claim 6 is characterized in that the bonded substrate obtained by bonding two brittle material substrates is cut at a predetermined predetermined position, and the surface is smoothed. The elastic body supports the bonded substrate from below, the bonded substrate is formed with a scribe line at a predetermined predetermined position on one main surface side, and the one main surface faces downward; and a breaking mechanism is provided by The upper end of the upper surface of the upper surface of the upper surface of the elastic body is lowered while abutting against the predetermined predetermined position, and the bonded substrate is divided.

根據本發明,以較先前之三點彎曲方式少之上刀片之壓入量便能將包含異相界面之貼合基板較佳地分斷。而且,可實現利用分斷獲得之單片不產生位置偏移之良好分斷。又,可較佳地抑制利用分斷獲得之單片自保持帶脫離。尤其於將貼合基板在複數個分斷預定位置依序進行分斷之情形時有效。 According to the present invention, the bonded substrate including the out-of-phase interface can be preferably separated by less pressing of the upper blade than the previous three-point bending method. Moreover, it is possible to achieve a good break without a positional shift in a single piece obtained by the division. Further, it is possible to preferably suppress the separation of the single-piece self-retaining tape obtained by the division. In particular, it is effective when the bonded substrate is sequentially cut at a plurality of predetermined predetermined positions.

1‧‧‧玻璃基板 1‧‧‧ glass substrate

2‧‧‧半導體基板 2‧‧‧Semiconductor substrate

3‧‧‧接著層 3‧‧‧Next layer

4‧‧‧保護膜 4‧‧‧Protective film

5‧‧‧保持帶 5‧‧‧Retaining belt

10‧‧‧貼合基板 10‧‧‧Fixed substrate

10a‧‧‧(分斷貼合基板獲得之)單片 10a‧‧‧ (a piece obtained by breaking the bonded substrate)

10b‧‧‧(分斷貼合基板獲得之)單片 10b‧‧‧ (a piece obtained by breaking the bonded substrate)

10c‧‧‧(分斷貼合基板獲得之)單片 10c‧‧‧ (a piece obtained by breaking the bonded substrate)

101A、101B‧‧‧下刀片 101A, 101B‧‧‧ lower blade

101a、101b‧‧‧端部 101a, 101b‧‧‧ end

102‧‧‧上刀片 102‧‧‧Upper blade

201‧‧‧彈性體 201‧‧‧ Elastomers

201a、201b‧‧‧彈性力集中部位 201a, 201b‧‧‧ elastic concentration parts

201s‧‧‧接觸面 201s‧‧‧Contact surface

202‧‧‧支持體 202‧‧‧Support

A‧‧‧分斷預定位置 A‧‧‧Dropped location

AR1、AR2‧‧‧箭頭 AR1, AR2‧‧‧ arrows

AR11~AR14‧‧‧箭頭 AR11~AR14‧‧‧ arrow

C‧‧‧虛線部 C‧‧‧dotted line

CR‧‧‧裂痕 CR‧‧‧ crack

F1‧‧‧力 F1‧‧‧ force

F2‧‧‧力 F2‧‧‧ force

F2a、F2b‧‧‧彈性力 F2a, F2b‧‧‧ Elasticity

F3a、F3b‧‧‧力 F3a, F3b‧‧‧ force

F11a、F11b‧‧‧力 F11a, F11b‧‧‧ force

F12a、F12b‧‧‧力 F12a, F12b‧‧‧ force

F13a、F13b‧‧‧力 F13a, F13b‧‧‧ force

F14a、F14b‧‧‧摩擦力 F14a, F14b‧‧‧ friction

G‧‧‧間隙 G‧‧‧ gap

S‧‧‧劃線 S‧‧‧

α‧‧‧間隙角度 Α‧‧‧ clearance angle

β‧‧‧間隙角度 Β‧‧‧ clearance angle

圖1係表示成為本發明之實施形態之分斷方法之對象的貼合基板10之構成的模式剖視圖。 Fig. 1 is a schematic cross-sectional view showing a configuration of a bonded substrate 10 which is a target of the breaking method according to the embodiment of the present invention.

圖2係表示形成有劃線S之貼合基板10之模式剖視圖。 2 is a schematic cross-sectional view showing the bonded substrate 10 on which the scribe lines S are formed.

圖3(a)~(c)係表示形成有劃線S之貼合基板10之利用三點彎曲方式之折斷步驟之模式剖視圖。 3(a) to 3(c) are schematic cross-sectional views showing a step of breaking by a three-point bending method of the bonded substrate 10 on which the scribe lines S are formed.

圖4(a)~(c)係表示本實施形態中之貼合基板10之分斷情況之圖。 4(a) to 4(c) are views showing the breaking of the bonded substrate 10 in the present embodiment.

圖5(a)、(b)係表示藉由分斷獲得之單片自保持帶5脫離時之情況之圖。 Fig. 5 (a) and (b) are views showing a state in which the single piece self-retaining tape 5 obtained by the breaking is detached.

圖6係例示被實施有用以防止產生單片自保持帶脫離之不良狀況之措施的彈性體201之圖。 Fig. 6 is a view exemplifying an elastic body 201 which is implemented to prevent a problem that a single piece of self-retaining tape is detached.

圖7(a)、(b)係表示對彈性體201之接觸面201s實施平滑化處理時之分斷情況之圖。 FIGS. 7(a) and 7(b) are diagrams showing the breaking state when the contact surface 201s of the elastic body 201 is subjected to the smoothing treatment.

圖1係表示成為本發明之實施形態之分斷方法之對象的異種材料之貼合基板(以下簡稱為貼合基板)10之構成的模式剖視圖。圖2係表示形成有劃線S之貼合基板10之模式剖視圖。本實施形態中,將利用包含接著劑之接著層3接著均為脆性材料基板之一種的玻璃基板1與半導體基板(例如矽基板)2而成之貼合基板10作為分斷對象。 1 is a schematic cross-sectional view showing a configuration of a bonded substrate (hereinafter simply referred to as a bonded substrate) 10 of a dissimilar material which is a target of the breaking method according to the embodiment of the present invention. 2 is a schematic cross-sectional view showing the bonded substrate 10 on which the scribe lines S are formed. In the present embodiment, the bonded substrate 10 obtained by using the glass substrate 1 including the adhesive layer 3 and the glass substrate 1 which is one of the brittle material substrates and the semiconductor substrate (for example, the germanium substrate) 2 is used as the breaking target.

玻璃基板1及半導體基板2之厚度、進而貼合基板10之平面尺寸並無特別限制,可鑒於分斷及前後步驟之操作容易性或處理效率等,選擇適當大小。 The thickness of the glass substrate 1 and the semiconductor substrate 2 and the planar size of the bonded substrate 10 are not particularly limited, and an appropriate size can be selected in view of the ease of handling of the breaking and the preceding and succeeding steps, the processing efficiency, and the like.

又,關於接著劑之材質,只要確保玻璃基板1與半導體基板2之間之接著強度,另一方面可適切地進行分斷,則無特別限制,例如可適切地使用紫外線(UV)硬化樹脂等。又,就可較佳地實現本實施形態之分斷方法之觀點而言,接著層3之厚度較佳為5μm~200μm左右,通常為5μm~50μm左右。 In addition, the material of the adhesive agent is not particularly limited as long as the bonding strength between the glass substrate 1 and the semiconductor substrate 2 is ensured, and the ultraviolet (UV) curing resin or the like can be suitably used. . Further, from the viewpoint of preferably achieving the breaking method of the present embodiment, the thickness of the adhesive layer 3 is preferably about 5 μm to 200 μm, and usually about 5 μm to 50 μm.

於半導體基板2之非接著面側,亦可形成特定之元件(例如CMOS感測器等)用圖案。 A pattern for a specific element (for example, a CMOS sensor or the like) may be formed on the non-contiguous surface side of the semiconductor substrate 2.

於分斷具有如上所述之構成之貼合基板10時,首先,如圖2所示,沿預先規定之分斷預定位置A,於玻璃基板1之非接著面形成劃線S。於圖2中,表示分斷預定位置A及劃線S沿與圖面垂直之方向延伸之情形。劃線S係沿玻璃基板1之厚度方向伸展之裂痕(微小裂痕)於玻璃基板1之非接著面上呈線狀連續而成。 When the bonded substrate 10 having the above configuration is divided, first, as shown in FIG. 2, a predetermined position A is divided in advance to form a scribe line S on the non-adjoining surface of the glass substrate 1. In Fig. 2, the case where the predetermined position A and the scribe line S extend in a direction perpendicular to the plane of the drawing are shown. The scribe line S is formed by continuously forming cracks (micro cracks) extending in the thickness direction of the glass substrate 1 on the non-adjoining surface of the glass substrate 1.

再者,於圖2中,為了進行簡單圖示,僅示出一分斷預定位置A及劃線S,於例如將貼合基板10呈短條狀或格子狀分斷等在複數個部位進行分斷而獲得多個單片之情形時,針對所有之分斷預定位置A形 成劃線S。以下,若無特別說明,則於該情形時,亦針對所有之分斷預定位置A實施後段之處理。 In addition, in FIG. 2, for the simple illustration, only the predetermined predetermined position A and the scribe line S are shown, and the bonded substrate 10 is divided into a short strip or a grid, for example, at a plurality of locations. When a plurality of single pieces are obtained by breaking, a predetermined position A is broken for all Draw a line S. Hereinafter, unless otherwise specified, in this case, the processing of the subsequent stage is also performed for all of the predetermined positions A.

形成劃線S可應用公知技術。例如,可為如下態樣:藉由使刀輪(刻劃輪)沿分斷預定位置A進行壓接轉動而形成劃線S,上述刀輪(刻劃輪)包含超硬合金、燒結金剛石、單晶金剛石等,呈圓板狀且於外周部分具備作為刀片發揮功能之稜線;可為如下態樣:藉由利用金剛石尖沿分斷預定位置A畫線,而形成劃線S;可為如下態樣:藉由利用雷射(例如紫外線(UV)雷射)照射產生之燒蝕或變質層之形成,而形成劃線S;亦可為如下態樣:藉由因雷射(例如紅外線(IR)雷射)引起之加熱與冷卻產生之熱應力而形成劃線S。 A well-known technique can be applied to form the scribe line S. For example, it is possible to form a scribe line S by causing a cutter wheel (scriber wheel) to be crimped and rotated along a predetermined breaking position A, the cutter wheel (scratch wheel) comprising superhard alloy, sintered diamond, The single crystal diamond or the like has a disk shape and has a ridge line functioning as a blade in the outer peripheral portion; it may be such that a scribe line S is formed by dividing the predetermined position A with a diamond edge to form a scribe line S; Aspect: The scribing S is formed by the formation of an ablation or metamorphic layer by laser (for example, ultraviolet (UV) laser irradiation); it may also be as follows: by laser (for example, infrared ( IR) laser causes thermal stress caused by heating and cooling to form a scribe line S.

於本實施形態中,將如此般設置劃線S而成之貼合基板10作為對象,進行在分斷預定位置A之分斷。概略而言,藉由使裂痕CR(參照圖4)自劃線S於厚度方向上(更詳細而言,於與貼合基板10之主面垂直之方向上)伸展,而將貼合基板10分斷。 In the present embodiment, the bonded substrate 10 in which the scribe line S is provided is set as the object, and the breaking at the predetermined position A is performed. Roughly, the bonded substrate 10 is stretched by stretching the crack CR (see FIG. 4) from the scribe line S in the thickness direction (more specifically, in the direction perpendicular to the main surface of the bonded substrate 10). Break.

圖3係表示為了進行比較而例示之利用先前之三點彎曲方式之貼合基板10之分斷情況之圖。於先前之分斷方法中,首先,如圖3(a)所示,於貼合基板10之玻璃基板1側貼附具有黏著性之保持帶5。再者,保持帶5用於以藉由分斷獲得之晶片(單片)不會飛散等之方式保持該晶片。作為保持帶5,例如可較佳地使用利用切片機切割時以相同目的使用之所謂切割帶。如圖3所示,亦可視需要於半導體基板2之表面貼附保護膜4。藉由於半導體基板4之表面貼附保護膜4,可防止因基板與折斷用刀片接觸所致之基板之破壞。 Fig. 3 is a view showing a state of separation of the bonded substrate 10 using the previous three-point bending method exemplified for comparison. In the previous breaking method, first, as shown in FIG. 3(a), the adhesive tape 5 is attached to the glass substrate 1 side of the bonded substrate 10. Further, the holding tape 5 is used to hold the wafer in such a manner that the wafer (single piece) obtained by the breaking does not fly or the like. As the holding tape 5, for example, a so-called dicing tape which is used for the same purpose when cutting with a microtome can be preferably used. As shown in FIG. 3, the protective film 4 may be attached to the surface of the semiconductor substrate 2 as needed. By attaching the protective film 4 to the surface of the semiconductor substrate 4, it is possible to prevent damage of the substrate due to contact between the substrate and the blade for breaking.

然後,於使劃線S之形成部位位於在水平方向上隔開之2個下刀片101A、101B之間之態樣中,換言之,於相互平行配置之2個下刀片101A、101B之間使劃線S分別平行地配置之態樣中,利用2個下刀片101A、101B自下方支持使玻璃基板1側朝向下方之貼合基板10。然 後,於該支持狀態下,使上刀片102自上方向劃線S之形成位置(亦即分斷預定位置A)下降而抵接於貼合基板10或隔著保護膜4抵接,進而使上刀片102以壓入之方式下降。再者,下刀片101A、101B係以與貼合基板10相比充分具有剛性之構件設置。 Then, in a state in which the formation portion of the scribe line S is located between the two lower blades 101A and 101B which are spaced apart in the horizontal direction, in other words, between the two lower blades 101A and 101B which are arranged in parallel with each other, In the aspect in which the lines S are arranged in parallel, the two lower blades 101A and 101B support the bonded substrate 10 with the glass substrate 1 side facing downward from below. Of course Then, in the support state, the upper blade 102 is lowered from the position where the upper scribe line S is formed (that is, the predetermined breaking position A), and abuts against the bonded substrate 10 or abuts against the protective film 4, thereby making The upper blade 102 is lowered in a push-in manner. Further, the lower blades 101A and 101B are provided in a member having sufficient rigidity as compared with the bonded substrate 10.

該態樣中,於壓入上刀片102之情形時,如圖3(a)所示,對保護膜4之上刀片102所抵接之部位施加朝向下方之力F1,並且作為對於該力F1之反作用力(對抗因力F1及貼合基板10之自重引起之壓縮之力),自2個下刀片101A及101B各自之端部101a及101b朝向貼合基板10產生向上之力F2a、F2b。隨著裂痕CR之伸展,如圖3(b)所示,貼合基板10被逐漸分斷之左右2個部分以端部101a及101b為支點傾斜。伴隨於此,剖視時呈楔形狀之間隙G自曾經形成有劃線S之部位逐漸擴展。裂痕CR之伸展在存在於貼合基板10內部之異相界面(玻璃基板1與接著層3之界面、接著層3與半導體基板2之界面)亦得以維持,因此最終如圖3(c)所示,貼合基板10被垂直於主面地分斷。再者,將分斷完成時由分斷產生之2個分斷面所成之角度(間隙角度)設為α。 In this aspect, when the upper blade 102 is press-fitted, as shown in FIG. 3(a), a downward force F1 is applied to a portion where the blade 102 abuts on the protective film 4, and as the force F1 is applied thereto. The reaction force (the force against the force F1 and the self-weight of the bonded substrate 10) generates upward forces F2a and F2b from the end portions 101a and 101b of the two lower blades 101A and 101B toward the bonded substrate 10. As the crack CR is stretched, as shown in FIG. 3(b), the left and right portions of the bonded substrate 10 are gradually divided by the end portions 101a and 101b as fulcrums. Along with this, the gap G having a wedge shape in cross section gradually spreads from the portion where the scribe line S was formed. The extension of the crack CR is maintained at the opposite phase interface (the interface between the glass substrate 1 and the bonding layer 3, and the interface between the bonding layer 3 and the semiconductor substrate 2) existing in the bonded substrate 10, and finally, as shown in FIG. 3(c). The bonded substrate 10 is divided perpendicular to the main surface. Furthermore, the angle (gap angle) formed by the two cross-sections generated by the breaking at the completion of the division is set to α.

如上所述之態樣之先前之分斷方法可以說大致為如下方法:藉由使力F1及力F2a、F2b發揮作用,產生以2個下刀片101A及101B各自之端部101a及101b為支點之相反方向之力矩,使藉此被逐漸分斷之左右2個部分產生相反方向之旋動,藉此進行分斷。於該方法中,相當於藉由壓入上刀片102而對貼合基板10賦予之能量之部分消耗於旋動上。 The previous breaking method of the above-described aspect can be said to be roughly a method in which the end portions 101a and 101b of the two lower blades 101A and 101B are fulcrum by the action of the force F1 and the forces F2a and F2b. The moment in the opposite direction causes the two portions, which are gradually separated by the gradual division, to generate the rotation in the opposite direction, thereby performing the division. In this method, a portion corresponding to the energy applied to the bonded substrate 10 by press-fitting the upper blade 102 is consumed in the rotation.

圖4係表示本實施形態中之貼合基板10之分斷情況之圖。本實施形態中分斷貼合基板10之情形亦與先前之方法相同,首先,於貼合基板10之玻璃基板1側貼附具有黏著性之保持帶5。 Fig. 4 is a view showing the breaking of the bonded substrate 10 in the present embodiment. In the present embodiment, the bonding substrate 10 is also cut in the same manner as in the prior art. First, the adhesive tape 5 is attached to the glass substrate 1 side of the bonded substrate 10.

其次,如圖4(a)所示,以貼附有保持帶5之側之主面側朝下之姿勢,將該貼合基板10以該主面整面接觸之方式載置於彈性體201上。 於本實施形態中,彈性體201係指硬度為65°~95°、較佳為70°~90°、例如為80°之材質者。作為該彈性體201,例如可較佳地使用聚矽氧橡膠等。再者,如圖4(a)所示,彈性體201亦可由平台等支持體202支持。於自彈性體201及支持體202側觀察(識別)劃線之情形時,彈性體201及支持體202較佳為透明。 Next, as shown in FIG. 4(a), the bonded substrate 10 is placed on the elastic body 201 so that the main surface is in contact with the entire surface with the main surface side on the side where the holding tape 5 is attached facing downward. on. In the present embodiment, the elastic body 201 refers to a material having a hardness of 65 to 95, preferably 70 to 90, and for example 80. As the elastic body 201, for example, polyoxyethylene rubber or the like can be preferably used. Further, as shown in FIG. 4(a), the elastic body 201 may be supported by a support 202 such as a platform. When the scribing is observed (identified) from the side of the elastic body 201 and the support 202, the elastic body 201 and the support body 202 are preferably transparent.

於本實施形態中,於該載置狀態下進行分斷。具體而言,為了使裂痕CR自劃線S於厚度方向上伸展,藉由使上刀片102自上方朝向劃線S之形成位置(亦即分斷預定位置A)下降,而抵接於貼合基板10,進而使上刀片102以壓入之方式下降。 In the present embodiment, the cutting is performed in the placed state. Specifically, in order to extend the crack CR from the scribe line S in the thickness direction, the upper blade 102 is lowered from the upper side toward the formation position of the scribe line S (that is, the predetermined breaking position A), thereby abutting on the affixing. The substrate 10, in turn, lowers the upper blade 102 by press-fitting.

於該態樣中,當壓入上刀片102時,如圖4(a)所示,對保護膜4之上刀片102所抵接之部位施加朝向下方之力F1。於是,作為對於該力F1之反作用力(對抗因力F1及貼合基板10之自重引起之壓縮之力),自彈性體201朝向貼合基板10,以上刀片102之抵接位置之正下方之位置為中心產生向上之彈性力F2,其後,貼合基板10被逐漸分斷之左右2個部分立即開始傾斜,裂痕CR自劃線S伸展,如圖4(b)所示,剖視時呈楔形狀之間隙G逐漸擴展。於本實施形態之分斷方法之情形時也是,裂痕CR之伸展在存在於貼合基板10內部之異相界面(玻璃基板1與接著層3之界面、接著層3與半導體基板2之界面)亦獲維持。因此,最終如圖4(c)所示,貼合基板10被垂直於主面地分斷。 In this aspect, when the upper blade 102 is press-fitted, as shown in FIG. 4(a), a downward force F1 is applied to a portion where the blade 102 on the protective film 4 abuts. Then, as a reaction force against the force F1 (the force against the force F1 and the self-weight of the bonded substrate 10), the self-elastic body 201 faces the bonded substrate 10, and the abutting position of the upper blade 102 is directly below. The position is centered to generate an upward elastic force F2. Thereafter, the left and right portions of the bonded substrate 10 are gradually divided, and the slit CR is immediately extended from the scribe line S as shown in FIG. 4(b). The gap G in the shape of a wedge gradually expands. Also in the case of the breaking method of the present embodiment, the stretching of the crack CR is also present at the heterophase interface (the interface between the glass substrate 1 and the bonding layer 3, the interface between the bonding layer 3 and the semiconductor substrate 2) existing inside the bonded substrate 10. It is maintained. Therefore, finally, as shown in FIG. 4(c), the bonded substrate 10 is divided perpendicularly to the main surface.

更詳細而言,當裂痕CR開始伸展而開始形成間隙G時,彈性力F2a、F2b作用於貼合基板10將被分斷之左右2個部分各自與彈性體201之抵接面。而且,與先前之方法相同,隨著裂痕CR之伸展,如圖4(b)所示,剖視時呈楔形狀之間隙G自曾經形成有劃線S之部位逐漸擴展。 More specifically, when the crack CR starts to expand and the gap G is formed, the elastic forces F2a and F2b act on the abutting surfaces of the two portions of the left and right portions of the bonded substrate 10 to be separated from the elastic body 201. Further, as in the previous method, as the crack CR is stretched, as shown in Fig. 4(b), the gap G which is wedge-shaped in cross section gradually spreads from the portion where the scribe line S was formed.

再者,此時,實質上如圖4(b)所示,形成間隙G之左右2個分斷面之附近分別成為彈性力F2a、F2b集中地發揮作用之彈性力集中部位 201a、201b,因此可以說本實施形態之分斷方法亦係依據三點彎曲方式。 In this case, as shown in FIG. 4(b), the vicinity of the two cross-sections forming the gap G is an elastic force-concentrating portion in which the elastic forces F2a and F2b collectively act. 201a and 201b, it can be said that the breaking method of the present embodiment is also based on the three-point bending method.

然而,於該本實施形態之分斷方法之情形時,與上述先前之分斷方法不同,隨著間隙G逐漸擴展,彈性力集中部位201a、201b如箭頭AR1、AR2所示般移位,但貼合基板10整體上支持於彈性體201,因此於貼合基板10不易產生以彈性力集中部位201a、201b為支點之力矩。此意味著,本實施形態之分斷方法中,藉由壓入上刀片102而對貼合基板10賦予之能量更有效率地有助於分斷。具體而言,於貼合基板10之分斷預定位置(裂痕CR之伸展對象位置)產生之相互反方向之力F3a、F3b與先前方法相比變大。該力F3a、F3b對裂痕CR之伸展、尤其對接著層3之分斷(撕裂)有效地發揮作用。 However, in the case of the breaking method of the present embodiment, unlike the above-described previous breaking method, as the gap G gradually expands, the elastic force concentrated portions 201a, 201b are displaced as indicated by the arrows AR1, AR2, but Since the bonded substrate 10 is entirely supported by the elastic body 201, the bonding substrate 10 is less likely to generate a moment with the elastic force concentrated portions 201a and 201b as fulcrums. This means that in the breaking method of the present embodiment, the energy applied to the bonded substrate 10 by press-fitting the upper blade 102 contributes more effectively to the breaking. Specifically, the forces F3a and F3b which are opposite to each other at the predetermined breaking position of the bonded substrate 10 (the extended target position of the crack CR) are larger than those of the prior art. The forces F3a, F3b effectively contribute to the stretching of the crack CR, in particular to the breaking (tearing) of the adhesive layer 3.

結果,於該本實施形態之分斷方法之情形時,即便使上刀片102之壓入量不如先前那般大,亦可較佳地分斷貼合基板10。又,於將本實施形態之分斷方法中之間隙角度之大小設為β時,β<α成立。因此,由於先前之分斷方法之情形時產生之間隙角度α變大而於貼合基板10產生位置偏移之不良狀況,於本實施形態之分斷方法中被較佳地抑制。 As a result, in the case of the breaking method of the present embodiment, even if the amount of pressing of the upper blade 102 is not as large as before, the bonded substrate 10 can be preferably separated. Further, when the magnitude of the gap angle in the breaking method of the present embodiment is β, β < α is established. Therefore, the problem that the gap angle α generated in the case of the previous breaking method is increased and the positional displacement occurs in the bonded substrate 10 is preferably suppressed in the breaking method of the present embodiment.

<防止分斷後脫離> <Prevent breakaway after breaking>

如上所述,貼合基板10藉由以彈性體201進行支持,而可利用三點彎曲方式進行分斷。然而,將一貼合基板10於複數個部位進行分斷而獲得多個單片之情形時,根據彈性體201與貼附貼合基板10之保持帶5之組合,有時由分斷獲得之單片會自保持帶5脫離。圖5係表示產生該脫離時之情況之圖。再者,於圖5中簡化貼合基板10之圖示,並且省略上刀片102及支持體202之圖示。 As described above, the bonded substrate 10 can be divided by the three-point bending method by being supported by the elastic body 201. However, when a bonded substrate 10 is divided into a plurality of portions to obtain a plurality of individual sheets, the combination of the elastic body 201 and the holding tape 5 to which the bonded substrate 10 is attached may be obtained by breaking. The single piece will be detached from the retaining band 5. Fig. 5 is a view showing a state in which the detachment occurs. Furthermore, the illustration of the bonded substrate 10 is simplified in FIG. 5, and the illustration of the upper blade 102 and the support 202 is omitted.

於圖5(a)中表示利用之前之分斷獲得單片10a後,繼而欲獲得單片10b時作用於保持帶5之力。 Fig. 5(a) shows the force acting on the holding tape 5 when the single piece 10a is obtained by the previous division, and then the single piece 10b is obtained.

首先,如上所述,當為了獲得單片10b而自上刀片102對貼合基板10施加力F1時,間隙G之形成進展,此時,自相互間逐漸剝離之單片10b及貼合基板之剩餘部分(以下,為方便起見亦將其稱為單片)10c對與該等單片接著之保持帶5,作用有欲將該保持帶5沿著彈性體201之表面向外側拉伸之力F11a、F11b。再者,該等力F11a、F11b亦包含作用於單片10b及部分10c與保持帶5之間之接著力在該方向上之成分。該力F11a、F11b相當於使保持帶5追隨分斷時產生之單片向外側之移動之力。 First, as described above, when the force F1 is applied from the upper blade 102 to the bonded substrate 10 in order to obtain the single piece 10b, the formation of the gap G progresses, and at this time, the single piece 10b and the bonded substrate which are gradually peeled off from each other are formed. The remaining portion (hereinafter, referred to as a single piece for convenience) 10c is attached to the single piece of the holding tape 5, and the holding tape 5 is intended to be stretched outward along the surface of the elastic body 201. Forces F11a, F11b. Further, the forces F11a, F11b also include components acting in the direction of the bonding force between the single piece 10b and the portion 10c and the holding tape 5. These forces F11a and F11b correspond to the force which causes the holding belt 5 to follow the movement of the single piece generated when the cutting is performed.

但,對於該力F11a、F11b所作用之保持帶5,在其與彈性體201之間,摩擦力F12a、F12b在與該等力F11a、F11b相反之方向上沿著彈性體201之表面發揮作用。此處,摩擦力F12a、F12b係將最大靜止摩擦力作為最大值之力,靜止摩擦係數越大,則該摩擦力F12a、F12b取得越大之值。該靜止摩擦係數越大,則保持帶5由相對於彈性體201越不易滑動之材質形成。 However, for the retaining belt 5 to which the forces F11a, F11b act, between the elastic body 201 and the elastic body 201, the frictional forces F12a, F12b act along the surface of the elastic body 201 in the opposite direction to the forces F11a, F11b. . Here, the frictional forces F12a and F12b are the forces that maximize the maximum static frictional force, and the larger the static frictional coefficient, the larger the frictional forces F12a and F12b are. The larger the static friction coefficient is, the more the retaining tape 5 is formed of a material that is less likely to slide relative to the elastic body 201.

進而,於保持帶5,伴隨著壓入上刀片102而彈性體201壓縮,欲沿以該保持帶為中心之方向拉伸之F13a、F13b亦發揮作用。再者,利用上刀片102進行壓縮時,彈性體201亦於與保持帶5相同之方向受力而移位,因此藉由力F13a、13b發揮作用,不會在兩者之間產生摩擦力。 Further, in the holding belt 5, the elastic body 201 is compressed as the upper blade 102 is pressed, and F13a and F13b which are to be stretched in the direction around the holding belt also function. Further, when the upper blade 102 is compressed, the elastic body 201 is also displaced by the force in the same direction as the holding tape 5, so that the force F13a, 13b acts, and no frictional force is generated between the two.

結果,於進行分斷之期間,對於保持帶5,力F11a、F11b向外側發揮作用,力F12a、F12b及力F13a、13b向中心發揮作用。 As a result, during the break, the forces F11a and F11b act on the outer side of the holding belt 5, and the forces F12a and F12b and the forces F13a and 13b act toward the center.

因此,為了良好地進行分斷,要求力F11a、F11b分別超過F12a、F13a為最大值時之合力F12a+F13a及合力F12b+F13b。假設保持帶5由相對於彈性體201不易滑動之材質形成,因此力F11a、F11b分別不超過該等合力F12a+F13a及合力F12b+F13b之情形時,相較於單片10b欲拉伸保持帶5之朝向外側之力,朝向內側之力更大,因此如圖 5(b)中以虛線部C所示,單片10b與保持帶5不再維持接著狀態,而可能引起分斷中途之單片10b自保持帶5脫離。即,可能引起藉由分斷貼合基板10而獲得之單片10b自保持帶5脫離。再者,雖自重大於單片10b之單片10c不易產生此種脫離,但原理上可能引起相同狀況。 Therefore, in order to perform the breaking well, the required forces F11a and F11b exceed the resultant force F12a+F13a and the resultant force F12b+F13b when F12a and F13a are maximum values, respectively. It is assumed that the holding belt 5 is formed of a material that is not easily slidable with respect to the elastic body 201. Therefore, when the forces F11a and F11b do not exceed the combined force F12a+F13a and the resultant force F12b+F13b, respectively, the holding belt is stretched compared to the single piece 10b. The force toward the outside of 5, the force toward the inside is greater, so as shown in the figure In the case of the dotted line C in 5(b), the single piece 10b and the holding tape 5 are no longer maintained in the continuation state, and the single piece 10b which may cause the middle of the breaking is detached from the holding tape 5. That is, the single piece 10b obtained by breaking the bonded substrate 10 may be detached from the holding tape 5. Further, although the single piece 10c which is larger than the single piece 10b is less likely to cause such detachment, the same situation may be caused in principle.

圖6係例示被實施有用以防止產生此種不良狀況之措施之彈性體201之圖。 Figure 6 is a diagram illustrating an elastomer 201 that is implemented to prevent such undesirable conditions.

具體而言,為了降低保持帶5與彈性體201之間之靜止摩擦係數,亦即為了使保持帶5相對於彈性體201容易滑動,對彈性體201與保持帶5之接觸面201s實施平滑化處理。此處,所謂平滑化處理,例如例示膜貼附或塗佈等。 Specifically, in order to reduce the static friction coefficient between the holding belt 5 and the elastic body 201, that is, to smooth the holding belt 5 with respect to the elastic body 201, the contact surface 201s of the elastic body 201 and the holding belt 5 is smoothed. deal with. Here, the smoothing treatment is, for example, a film attachment or coating.

圖7係表示對彈性體201之接觸面201s實施平滑化處理時之分斷情況之圖。再者,於圖7中,亦與圖5同樣地,簡化貼合基板10之圖示,並且省略上刀片102及支持體202之圖示。 Fig. 7 is a view showing a state of separation when the contact surface 201s of the elastic body 201 is subjected to a smoothing treatment. In addition, in FIG. 7, as in FIG. 5, the illustration of the bonding substrate 10 is simplified, and illustration of the upper blade 102 and the support body 202 is abbreviate|omitted.

首先,於圖7(a)中,與圖5(a)同樣地,表示利用之前之分斷獲得單片10a後,繼而欲獲得單片10b時作用於保持帶5之力。該情形時作用於保持帶5之力之種類與圖5(a)所示之情況相同,但此時,由於對接觸面201s實施平滑化處理而降低靜止摩擦係數,因此保持帶5自彈性體201受到之摩擦力F14a、F14b之最大值小於圖5(a)所示之摩擦力F12a、F12b之最大值。結果,於力F11a、F11b分別大於摩擦力F14a、F14b為最大靜止摩擦力時之合力F14a+F13a及合力F14b+F13b之值之情形時,如圖7(b)所示,被上刀片102壓住中心部分之保持帶5於單片10b及10c欲向外側移動時追隨該移動。此時,保持帶5產生如箭頭AR11~AR14所示之伸展,單片10b未脫離而被分斷。 First, in Fig. 7(a), similarly to Fig. 5(a), the force acting on the holding belt 5 when the single piece 10a is obtained by the previous division is obtained, and then the single piece 10b is obtained. In this case, the type of force acting on the holding belt 5 is the same as that shown in Fig. 5(a), but at this time, since the contact surface 201s is smoothed to lower the static friction coefficient, the holding belt 5 is self-elastic. The maximum value of the frictional forces F14a and F14b received by 201 is smaller than the maximum value of the frictional forces F12a and F12b shown in Fig. 5(a). As a result, when the forces F11a and F11b are respectively greater than the combined forces F14a+F13a and the combined forces F14b+F13b when the frictional forces F14a and F14b are the maximum static frictional force, as shown in FIG. 7(b), the upper blade 102 is pressed. The holding belt 5 of the center portion follows the movement when the single sheets 10b and 10c are to be moved outward. At this time, the holding belt 5 is stretched as indicated by the arrows AR11 to AR14, and the single piece 10b is broken without being separated.

再者,更詳細而言,保持帶5追隨單片10b及10c之移動時作用於保持帶5與彈性體201之間之摩擦力F14a、F14b為動摩擦力,該動摩擦力係依存於動摩擦係數之值,但於對彈性體201之接觸面201s實施有 平滑化處理之情形時,不僅靜止摩擦係數降低,該動摩擦係數亦會降低,因此若實施平滑化處理,則可較佳地抑制單片10b之脫離。 Further, in more detail, the frictional forces F14a and F14b acting between the holding belt 5 and the elastic body 201 when the holding belt 5 follows the movement of the single sheets 10b and 10c are dynamic frictional forces which depend on the dynamic friction coefficient. Value, but implemented on the contact surface 201s of the elastomer 201 In the case of the smoothing treatment, not only the static friction coefficient is lowered but also the dynamic friction coefficient is lowered. Therefore, when the smoothing treatment is performed, the separation of the single piece 10b can be preferably suppressed.

如以上所說明般,根據本實施形態,於將利用接著劑貼合2個脆性材料基板、尤其包含異種材料之2個脆性材料基板而成之貼合基板於特定之分斷預定位置進行分斷時,首先,於貼合基板之一主面側之分斷預定位置設置劃線。然後,將形成該劃線之側之主面貼附於保持帶,視需要於另一主面貼附保護膜後,以該保持帶之側為下方而將貼合基板載置於彈性體上。於該載置狀態下,使上刀片自上方相對於貼合基板之分斷預定位置下降。藉此,以較先前之三點彎曲方式少之上刀片之壓入量便可將包含異相界面之貼合基板較佳地分斷。而且,可實現利用分斷獲得之單片不產生位置偏移之良好分斷。 As described above, according to the present embodiment, the bonded substrate obtained by bonding two brittle material substrates, in particular, two brittle material substrates containing different materials, by means of an adhesive is cut at a predetermined predetermined position. In the first place, a scribe line is provided at a predetermined predetermined position on the main surface side of one of the bonded substrates. Then, the main surface on the side where the scribe line is formed is attached to the holding tape, and if a protective film is attached to the other main surface as needed, the bonded substrate is placed on the elastic body with the side of the holding tape as the lower side. . In the placed state, the upper blade is lowered from the upper predetermined position with respect to the bonded substrate. Thereby, the bonded substrate including the out-of-phase interface can be preferably separated by less than the previous three-point bending method. Moreover, it is possible to achieve a good break without a positional shift in a single piece obtained by the division.

又,藉由對彈性體之表面預先實施平滑化處理,可較佳地抑制由分斷獲得之單片自保持帶脫離。 Further, by performing the smoothing treatment on the surface of the elastic body in advance, it is possible to preferably suppress the separation of the single-piece self-retaining tape obtained by the breaking.

<變化例> <variation>

作為上述實施形態之脆性材料基板,除玻璃基板、矽基板以外,亦可例示各種半導體基板、藍寶石基板、氧化鋁基板等陶瓷基板、玻璃陶瓷基板(所謂LTCC(Low Temperature Co-fired Ceramic,低溫共燒陶瓷)基板)等。 In addition to the glass substrate and the tantalum substrate, ceramic substrates such as various semiconductor substrates, sapphire substrates, and alumina substrates, and glass ceramic substrates (so-called LTCC (Low Temperature Co-fired Ceramic) can be exemplified as the brittle material substrate of the above-described embodiment. Burn ceramics) substrates, etc.

於異種材料貼合基板之情形時,較佳為於具有易分斷之性狀(高脆性、小厚度)之脆性材料基板側視需要形成保護膜,且於具有不易分斷之性狀(低脆性、大厚度)之脆性材料基板側形成劃線。 When the substrate is bonded to a different material, it is preferable to form a protective film on the side of the brittle material having a property of being easily broken (high brittleness, small thickness), and having a property of being difficult to break (low brittleness, A large thickness) of the brittle material substrate side is formed with a scribe line.

1‧‧‧玻璃基板 1‧‧‧ glass substrate

2‧‧‧半導體基板 2‧‧‧Semiconductor substrate

3‧‧‧接著層 3‧‧‧Next layer

4‧‧‧保護膜 4‧‧‧Protective film

5‧‧‧保持帶 5‧‧‧Retaining belt

10‧‧‧貼合基板 10‧‧‧Fixed substrate

102‧‧‧上刀片 102‧‧‧Upper blade

201‧‧‧彈性體 201‧‧‧ Elastomers

201s‧‧‧接觸面 201s‧‧‧Contact surface

202‧‧‧支持體 202‧‧‧Support

S‧‧‧劃線 S‧‧‧

Claims (7)

一種貼合基板之分斷方法,其特徵在於:其係將貼合2個脆性材料基板而成之貼合基板於特定之分斷預定位置進行分斷之方法,且具備:劃線形成步驟,其係於上述貼合基板之一主面側之上述分斷預定位置設置劃線;基板貼附步驟,其係將設有上述劃線之上述貼合基板之上述一主面貼附於保持帶;載置步驟,其係將貼附有上述保持帶之上述貼合基板以上述一主面側整面接觸之方式,載置於表面經平滑化而成之彈性體上;及分斷步驟,其係於將上述貼合基板載置於上述彈性體之狀態下,藉由使上刀片之前端一面抵接於上述分斷預定位置一面下降,而將上述貼合基板分斷。 A method for separating a bonded substrate, which is characterized in that a bonded substrate obtained by bonding two brittle material substrates is cut at a predetermined predetermined position, and a scribing forming step is provided. Providing a scribe line at a predetermined predetermined position on a main surface side of the bonded substrate; and a substrate attaching step of attaching the one main surface of the bonded substrate provided with the scribe line to the holding tape a mounting step of placing the bonded substrate to which the holding tape is attached on the surface of the surface of the main surface to be smoothed, and the step of breaking, In the state where the bonded substrate is placed on the elastic body, the bonded substrate is cut by lowering the front end of the upper blade while abutting against the predetermined predetermined position. 如請求項1之貼合基板之分斷方法,其中至少於上述劃線形成步驟之後且上述分斷步驟之前具備保護膜貼附步驟,該保護膜貼附步驟係於上述貼合基板之另一主面貼附保護膜。 The method for separating a bonded substrate according to claim 1, wherein at least after the scribe forming step and before the dividing step, a protective film attaching step is provided, the protective film attaching step being attached to the bonded substrate A protective film is attached to the main surface. 一種貼合基板之分斷方法,其特徵在於:其係將貼合2個脆性材料基板而成之貼合基板於複數個分斷預定位置依序進行分斷之方法,且具備:劃線形成步驟,其係於上述貼合基板之一主面側之複數個上述分斷預定位置設置劃線;保持帶貼附步驟,其係將設有上述劃線之上述貼合基板之上 述一主面貼附於保持帶;載置步驟,其係將貼附有上述保持帶之上述貼合基板以上述一主面側整面接觸之方式,載置於表面經平滑化而成之彈性體上;及分斷步驟,其係於將上述貼合基板載置於上述彈性體之狀態下,於上述複數個上述分斷預定位置上重複如下操作,即,藉由使上刀片之前端一面抵接於上述分斷預定位置一面下降,而將上述貼合基板分斷。 A method for separating a bonded substrate, characterized in that the bonded substrate obtained by bonding two brittle material substrates is sequentially divided at a plurality of predetermined predetermined positions, and is provided with a scribe line. a step of providing a scribe line at a plurality of predetermined predetermined positions on one of the main surface sides of the bonded substrate; and a holding tape attaching step of the above-mentioned affixed substrate The main surface is attached to the holding tape, and the mounting step is performed by smoothing the surface of the bonding substrate to which the holding tape is attached so as to be in contact with the entire surface of the main surface. And the breaking step of repeating the operation of placing the bonded substrate on the elastic body at the plurality of predetermined predetermined positions, that is, by making the front end of the upper blade The bonded substrate is cut while being lowered while abutting against the predetermined predetermined position. 如請求項3之貼合基板之分斷方法,其中至少於上述劃線形成步驟之後且上述分斷步驟之前具備保護膜貼附步驟,該保護膜貼附步驟係於上述貼合基板之另一主面貼附保護膜。 The method for separating a bonded substrate according to claim 3, wherein at least after the scribe forming step and before the dividing step, a protective film attaching step is provided, the protective film attaching step being attached to the bonded substrate A protective film is attached to the main surface. 一種貼合基板之分斷方法,其特徵在於:其係將貼合2個脆性材料基板而成之貼合基板於特定之分斷預定位置進行分斷之方法,且上述貼合基板於一主面側之上述分斷預定位置形成有劃線且上述一主面朝向下方,於利用表面經平滑化而成之彈性體自下方支持上述貼合基板之狀態下,藉由使上刀片之前端一面抵接於上述分斷預定位置一面下降,而將上述貼合基板分斷。 A method for separating a bonded substrate, characterized in that the bonded substrate obtained by bonding two brittle material substrates is cut at a predetermined predetermined position, and the bonded substrate is in a main The surface of the upper blade is formed with a scribe line and the one main surface faces downward, and the elastic body formed by smoothing the surface supports the bonded substrate from below. The bonded substrate is divided while being lowered against the predetermined predetermined position. 一種貼合基板之分斷裝置,其特徵在於:其係將貼合2個脆性材料基板而成之貼合基板於特定之分斷預定位置進行分斷之裝置,且具備:劃線形成機構,其於上述貼合基板之一主面側之上述分斷預 定位置設置劃線;基板貼附機構,其將設有上述劃線之上述貼合基板之上述一主面貼附於保持帶;載置機構,其將貼附有上述保持帶之上述貼合基板以上述一主面側整面接觸之方式,載置於表面經平滑化而成之彈性體上;及分斷機構,其於將上述貼合基板載置於上述彈性體之狀態下,藉由使上刀片之前端一面抵接於上述分斷預定位置一面下降,而將上述貼合基板分斷。 A breaking device for bonding a substrate, which is characterized in that a bonding substrate obtained by bonding two brittle material substrates is cut at a predetermined predetermined position, and a scribing forming mechanism is provided. The above-mentioned breaking pre-preparation on one main surface side of the above-mentioned bonding substrate a substrate affixing mechanism for attaching the one main surface of the bonded substrate provided with the scribe line to the holding tape, and a mounting mechanism for attaching the bonding tape to the holding tape The substrate is placed on the surface of the above-mentioned main surface side so as to be placed on the surface of the surface of the elastic body; and the breaking mechanism is used to mount the bonding substrate on the elastic body. The bonded substrate is divided by lowering the front end of the upper blade while abutting against the predetermined predetermined position. 一種貼合基板之分斷裝置,其特徵在於:其係將貼合2個脆性材料基板而成之貼合基板於特定之分斷預定位置進行分斷之裝置,且具備:表面經平滑化而成之彈性體,其自下方支持上述貼合基板,上述貼合基板於一主面側之上述分斷預定位置形成有劃線且上述一主面朝向下方;及分斷機構,其藉由使設於上述彈性體上方之上刀片之前端一面抵接於上述分斷預定位置一面下降,而將上述貼合基板分斷。 A breaking device for bonding a substrate, characterized in that the bonding substrate obtained by bonding two brittle material substrates is cut at a predetermined predetermined position, and the surface is smoothed An elastic body that supports the bonded substrate from below, wherein the bonded substrate is formed with a scribe line at a predetermined predetermined position on one main surface side, and the one main surface faces downward; and a breaking mechanism is provided The front surface of the upper surface of the upper surface of the upper surface of the upper surface of the upper surface of the upper surface of the upper surface of the upper surface of the upper surface of the upper surface of the upper surface of the upper surface of the upper surface of the upper surface of the upper surface of the upper surface of the upper surface of the upper surface of the upper surface of the upper surface of the upper surface of the upper surface of
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TW202039193A (en) * 2016-02-26 2020-11-01 日商三星鑽石工業股份有限公司 Method of dividing brittle substrate
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CN108170308B (en) * 2017-12-25 2020-12-01 业成科技(成都)有限公司 Special-shaped material attaching and aligning method

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000124537A (en) * 1998-10-21 2000-04-28 Sharp Corp Manufacture of semiconductor laser chip and manufacturing device used therefor
KR100670600B1 (en) * 2006-02-02 2007-01-17 주식회사 에스에프에이 Scribing apparatus
JP2010040621A (en) 2008-08-01 2010-02-18 Toshiba Corp Solid-state imaging device, and method of manufacturing the same
JP2011121817A (en) * 2009-12-10 2011-06-23 Seiko Instruments Inc Method for cutting joined glass, method for manufacturing package, package, piezoelectric vibrator, oscillator, electronic equipment and radio-controlled clock
JP2012206869A (en) * 2011-03-29 2012-10-25 Seiko Instruments Inc Method for cutting glass body, method for producing package, package, piezoelectric vibrator, oscillator, electronic equipment, and radio-controlled watch
JP2013247147A (en) * 2012-05-23 2013-12-09 Hamamatsu Photonics Kk Processing object cutting method, processing object, and semiconductor element
TWI583522B (en) * 2012-10-25 2017-05-21 三星鑽石工業股份有限公司 Disassembly method of laminated ceramic substrate
JP6039363B2 (en) 2012-10-26 2016-12-07 三星ダイヤモンド工業株式会社 Method and apparatus for dividing brittle material substrate

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