TWI666183B - Cutting method and device for laminating substrate - Google Patents

Cutting method and device for laminating substrate Download PDF

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Publication number
TWI666183B
TWI666183B TW104114611A TW104114611A TWI666183B TW I666183 B TWI666183 B TW I666183B TW 104114611 A TW104114611 A TW 104114611A TW 104114611 A TW104114611 A TW 104114611A TW I666183 B TWI666183 B TW I666183B
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substrate
brittle material
cutting
breaking
elastic body
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TW104114611A
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Chinese (zh)
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TW201604156A (en
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村上健二
武田真和
橋本多市
田村健太
秀島護
五十川久司
栗山規由
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日商三星鑽石工業股份有限公司
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/77Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
    • H01L21/78Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67092Apparatus for mechanical treatment

Abstract

本發明提供一種可適切地分斷貼合基板之方法。 The invention provides a method for appropriately cutting and bonding substrates.

本發明係將貼合2個脆性材料基板而成之貼合基板於特定之分斷預定位置進行分斷之方法,該方法具備:劃線形成步驟,其係於上述貼合基板之一主面側之上述分斷預定位置設置劃線;保持帶貼附步驟,其係於設有上述劃線之上述貼合基板之上述一主面貼附保持帶;載置步驟,其係將貼附有上述保持帶之上述貼合基板以上述一主面整面接觸之方式,載置於表面經平滑化而成之彈性體上;及分斷步驟,其係於將上述貼合基板載置於上述彈性體之狀態下,使上刀片之前端一面抵接於上述分斷預定位置一面下降,藉此使裂痕自上述劃線伸展而將上述貼合基板分斷。 The invention is a method for breaking a bonded substrate formed by bonding two brittle material substrates at a predetermined predetermined breaking position. The method includes a scribing step, which is formed on one of the main surfaces of the bonded substrate. A scribe line is set at the above-mentioned predetermined breaking position on the side; a holding tape attaching step is to attach a holding tape to the above-mentioned main surface of the above-mentioned bonding substrate provided with the scribe line; and a placing step is to attach the The bonding substrate of the holding tape is placed on an elastic body with a smoothed surface in a manner that the main surface is in full contact with the surface; and a breaking step is performed by placing the bonding substrate on the surface. In the state of the elastic body, the front end of the upper blade is lowered while abutting against the predetermined cutting position, thereby extending the crack from the scribe line to cut the bonded substrate.

Description

貼合基板之分斷方法及分斷裝置 Cutting method and device for laminating substrate

本發明係關於一種將貼合2個脆性材料基板而成之貼合基板、例如貼合包含不同材料之2個脆性材料基板而成之貼合基板進行分斷之方法及用於該方法之裝置。 The invention relates to a method for breaking a bonded substrate formed by bonding two brittle material substrates, such as a bonded substrate formed by bonding two brittle material substrates containing different materials, and a device used for the method. .

利用接著劑(樹脂)貼合2個脆性材料基板而成之貼合基板、尤其利用接著劑貼合包含不同材料之2個脆性材料基板而成之貼合基板(異種材料貼合基板)被用作各種元件之基板。例如,有以下之基板等:將於一主面形成特定之元件(例如CMOS(Complementary Metal Oxide Semiconductor,互補金氧半導體)感測器等)用圖案而成之單晶矽基板等半導體基板之另一主面貼合於作為支持基板之玻璃基板,以此而形成。此種元件係藉由在將二維地重複形成電路圖案而成之作為母基板之單晶矽晶圓上與玻璃基板利用接著劑(樹脂)貼合之後,分斷成特定之尺寸之短條狀或格子狀之單片(晶片),從而製作而成(例如參照專利文獻1)。 A bonding substrate formed by bonding two substrates of a brittle material using an adhesive (resin), and a bonding substrate (bonding substrate of a different material) formed by bonding two substrates of a brittle material containing different materials using an adhesive As a substrate for various components. For example, there are the following substrates, and other semiconductor substrates such as single-crystal silicon substrates that are patterned with specific elements (such as CMOS (Complementary Metal Oxide Semiconductor) sensors, etc.) formed on one main surface. One main surface is formed by bonding a glass substrate as a support substrate. This type of element is formed by bonding a single crystal silicon wafer, which is a mother substrate formed by repeating the formation of a circuit pattern two-dimensionally, with a glass substrate using an adhesive (resin), and then breaking it into short strips of a specific size. A single piece (wafer) in a shape of a grid or a grid (for example, refer to Patent Document 1).

又,對預先於一主面形成有劃線之脆性材料基板藉由利用三點彎曲方式使裂痕自該劃線伸展而進行分斷之裝置(破碎機)亦已公知(例如參照專利文獻2)。 In addition, a device (crusher) that breaks a brittle material substrate in which a scribe line has been formed on one main surface in advance by using a three-point bending method to break the scribe line is also known (for example, refer to Patent Document 2). .

[先前技術文獻] [Prior technical literature] [專利文獻] [Patent Literature]

[專利文獻1]日本專利特開2010-40621號公報 [Patent Document 1] Japanese Patent Laid-Open No. 2010-40621

[專利文獻2]日本專利特開2014-83821號公報 [Patent Document 2] Japanese Patent Laid-Open No. 2014-83821

作為於一脆性材料基板(矽基板)形成圖案而成之(異種材料)貼合基板之分斷(單片化)方法,本發明者等人嘗試如下方法:於形成有該圖案之面貼附保護膜後,於另一脆性材料基板(玻璃基板)側形成劃線,之後利用如專利文獻2所揭示之破碎機沿該劃線進行折斷。 As a method for breaking (singulating) a bonded substrate (different material) formed by forming a pattern on a brittle material substrate (silicon substrate), the present inventors and others have tried the following method: attaching the patterned surface After the protective film, a scribe line is formed on the other brittle material substrate (glass substrate) side, and then the scribe line is broken along the scribe line using a crusher as disclosed in Patent Document 2.

然而,於利用該方法進行折斷之情形時,存在如下情況:由於在2個脆性材料基板之間介存接著劑之層等,而產生裂痕自劃線之伸展方向從基板之厚度方向傾斜地偏離之不良狀況。又,由於利用破碎機之上刀片自上方之壓入量(自上刀片抵接於貼合基板或保護膜至折斷完成為止的上刀片之下降距離)較大,因此亦存在容易產生貼合基板之位置偏移之不良狀況。該等不良狀況之產生成為產生晶片之品質劣化等降低晶片之良率之主要原因,因此不佳。 However, in the case of breaking by this method, there are cases where a crack or the like extends from the scribing direction of the scribing line to the thickness direction of the substrate due to the presence of a layer of an adhesive between the two brittle material substrates. Bad condition. In addition, since the pressing amount of the upper blade of the crusher from above (the falling distance of the upper blade from the contact of the upper blade to the bonded substrate or the protective film until the breaking is completed) is large, there is also a tendency for the bonded substrate to be easily generated. The misalignment of the position. The occurrence of these undesirable conditions is the main reason for lowering the yield of the wafer, such as the deterioration of the quality of the wafer, and is therefore not good.

本發明係鑒於上述問題而完成者,目的在於提供一種可較佳地分斷貼合基板、尤其異種材料貼合基板之方法。 The present invention has been made in view of the above-mentioned problems, and an object thereof is to provide a method capable of better separating the bonded substrates, particularly the bonded substrates of different materials.

為了解決上述問題,技術方案1及3之發明之特徵在於:其係將貼合2個脆性材料基板而成之貼合基板於特定之分斷預定位置進行分斷之方法,且具備:劃線形成步驟,其係於上述貼合基板之一主面側之上述分斷預定位置設置劃線;基板貼附步驟,其係將設有上述劃線之上述貼合基板之上述一主面貼附於保持帶;保護膜貼附步驟,其係視需要於上述貼合基板之另一主面貼附保護膜;載置步驟,其係將貼附於上述保持帶且視需要貼附有上述保護帶之上述貼合基板以上述一主面側整面接觸之方式,載置於表面經平滑化而成之彈性體上;及分斷步驟,其係於將上述貼合基板載置於上述彈性體之狀態下,藉由使 上刀片之前端一面抵接於上述分斷預定位置一面下降(使裂痕自上述劃線伸展),而將上述貼合基板分斷。 In order to solve the above problems, the inventions of the technical solutions 1 and 3 are characterized in that they are a method of breaking a bonded substrate formed by bonding two brittle material substrates at a specific predetermined cutting position, and have: The forming step is to set a scribing line at the above-mentioned predetermined breaking position on one main surface side of the above-mentioned bonded substrate; the substrate attaching step is to attach the one main surface of the above-mentioned bonded substrate provided with the above-mentioned scribing substrate. The protective film attaching step is to attach a protective film to the other main surface of the above-mentioned bonding substrate as needed; and the placing step is to attach the protective tape to the above-mentioned holding tape and attach the above-mentioned protection if necessary. The above-mentioned bonded substrate is placed on the elastic body whose surface is smoothed in such a way that the one main surface side is in full-face contact; and the breaking step is based on placing the above-mentioned bonded substrate on the elasticity. In a state of body The front end of the upper blade is lowered while abutting against the predetermined cutting position (so that the crack extends from the scribe line), and the bonded substrate is cut.

又,技術方案2及3之發明之特徵在於:其係將貼合2個脆性材料基板而成之貼合基板於複數個分斷預定位置依序進行分斷之方法,且具備:劃線形成步驟,其係於上述貼合基板之一主面側之複數個上述分斷預定位置設置劃線;基板貼附步驟,其係將設有上述劃線之上述貼合基板之上述一主面貼附於保持帶;保護膜貼附步驟,其係視需要於上述貼合基板之另一主面貼附保護膜;載置步驟,其係將貼附於上述保持帶且視需要貼附有上述保護膜之上述貼合基板以上述一主面側整面接觸之方式,載置於表面經平滑化而成之彈性體上;及分斷步驟,其係於將上述貼合基板載置於上述彈性體之狀態下,於上述複數個上述分斷預定位置上重複如下操作,即,藉由使上刀片之前端一面抵接於上述分斷預定位置一面下降(使裂痕自上述劃線伸展),而將上述貼合基板分斷。 In addition, the inventions of the technical solutions 2 and 3 are characterized in that they are a method for sequentially breaking a bonded substrate formed by bonding two brittle material substrates at a plurality of predetermined cutting positions, and are provided with: scribe formation A step of setting a scribing line at a plurality of the predetermined breaking positions on one main surface side of the bonding substrate; a substrate attaching step of bonding the one main surface of the bonding substrate provided with the scribing line Attach to the holding tape; the protective film attaching step is to attach a protective film to the other main surface of the above-mentioned bonding substrate as needed; the placing step is to attach to the above-mentioned holding tape and attach the above as necessary The above-mentioned bonded substrate of the protective film is placed on the elastic body formed by smoothing the surface in such a manner that the entire main surface side is in contact with the above-mentioned surface; In the state of the elastic body, repeat the following operations at the plurality of predetermined breaking positions, that is, by lowering the front end of the upper blade to abut the predetermined breaking position (so that the crack extends from the scribe line), And cut off the bonded substrate

又,技術方案4之發明之特徵在於:其係將貼合2個脆性材料基板而成之貼合基板於特定之分斷預定位置進行分斷之方法,且上述貼合基板於一主面側之上述分斷預定位置形成有劃線且上述一主面朝向下方,於利用表面經平滑化而成之彈性體自下方支持上述貼合基板之狀態下,藉由使上刀片之前端一面抵接於上述分斷預定位置一面下降,而將上述貼合基板分斷。 In addition, the invention of claim 4 is characterized in that it is a method of breaking a bonded substrate formed by bonding two brittle material substrates at a specific predetermined cutting position, and the bonded substrate is on a main surface side. A scribe line is formed at the predetermined breaking position, and the one main surface is facing downward. In a state where the above-mentioned bonded substrate is supported from below by an elastic body smoothed from the surface, the front end of the upper blade is abutted. It descends at the predetermined cutting position, and cuts the bonded substrate.

又,技術方案5之發明之特徵在於:其係將貼合2個脆性材料基板而成之貼合基板於特定之分斷預定位置進行分斷之裝置,且具備:劃線形成機構,其於上述貼合基板之一主面側之上述分斷預定位置設置劃線;基板貼附機構,其將設有上述劃線之上述貼合基板之上述一主面貼附於保持帶;載置機構,其將貼附有上述保持帶之上述貼合基板以上述一主面側整面接觸之方式,載置於表面經平滑化而成之彈性 體上;及分斷機構,其於將上述貼合基板載置於上述彈性體之狀態下,藉由使上刀片之前端一面抵接於上述分斷預定位置一面下降,而將上述貼合基板分斷。 The invention of claim 5 is characterized in that it is a device for breaking a bonded substrate formed by bonding two brittle material substrates at a predetermined predetermined breaking position, and is provided with a scribing forming mechanism, which A scribe line is provided at the predetermined cutting position on the main surface side of one of the above-mentioned bonded substrates; a substrate attaching mechanism attaches the one main surface of the above-mentioned bonded substrate provided with the scribe line to a holding tape; a placing mechanism , The elasticity of the above-mentioned laminating substrate to which the above-mentioned holding tape is attached is smoothed on the surface in such a manner that the main surface side is in contact with the entire surface. On the body; and a breaking mechanism that, when the bonding substrate is placed on the elastic body, lowers the front end of the upper blade while abutting against the predetermined breaking position, and then the bonding substrate Break.

又,技術方案6之發明之特徵在於:其係將貼合2個脆性材料基板而成之貼合基板於特定之分斷預定位置進行分斷之裝置,且具備:表面經平滑化而成之彈性體,其自下方支持上述貼合基板,上述貼合基板於一主面側之上述分斷預定位置形成有劃線且上述一主面朝向下方;及分斷機構,其藉由使設於上述彈性體上方之上刀片之前端一面抵接於上述分斷預定位置一面下降,而將上述貼合基板分斷。 In addition, the invention of claim 6 is characterized in that it is a device for breaking a bonded substrate formed by bonding two brittle material substrates at a specific predetermined cutting position, and is provided with a smooth surface An elastic body that supports the above-mentioned bonding substrate from below, the bonding substrate is formed with a scribe line at the predetermined cutting position on a main surface side and the one main surface is directed downward; and a cutting mechanism that is provided by The front end of the upper blade above the elastic body is lowered while abutting against the predetermined cutting position, and the bonded substrate is cut.

根據本發明,以較先前之三點彎曲方式少之上刀片之壓入量便能將包含異相界面之貼合基板較佳地分斷。而且,可實現利用分斷獲得之單片不產生位置偏移之良好分斷。又,可較佳地抑制利用分斷獲得之單片自保持帶脫離。尤其於將貼合基板在複數個分斷預定位置依序進行分斷之情形時有效。 According to the present invention, the bonded substrate including the out-of-phase interface can be better cut off with a smaller amount of pressing of the blade above the previous three-point bending method. In addition, a good break can be achieved in which a single piece obtained by the break does not cause a position shift. In addition, it is possible to better suppress the detachment of the single-piece self-retaining tape obtained by the severing. This is particularly effective when the bonded substrate is sequentially cut at a plurality of predetermined cutting positions.

1‧‧‧玻璃基板 1‧‧‧ glass substrate

2‧‧‧半導體基板 2‧‧‧ semiconductor substrate

3‧‧‧接著層 3‧‧‧ Adjacent layer

4‧‧‧保護膜 4‧‧‧ protective film

5‧‧‧保持帶 5‧‧‧ holding belt

10‧‧‧貼合基板 10‧‧‧ Laminated substrate

10a‧‧‧(分斷貼合基板獲得之)單片 10a‧‧‧ (obtained by cutting and bonding substrates)

10b‧‧‧(分斷貼合基板獲得之)單片 10b‧‧‧ (obtained by cutting the bonded substrate)

10c‧‧‧(分斷貼合基板獲得之)單片 10c‧‧‧ (obtained by cutting and bonding substrates)

101A、101B‧‧‧下刀片 101A, 101B‧‧‧Blades

101a、101b‧‧‧端部 101a, 101b‧‧‧End

102‧‧‧上刀片 102‧‧‧ Upper Blade

201‧‧‧彈性體 201‧‧‧ Elastomer

201a、201b‧‧‧彈性力集中部位 201a, 201b‧‧‧‧Concentrated elastic force

201s‧‧‧接觸面 201s‧‧‧contact surface

202‧‧‧支持體 202‧‧‧ support

A‧‧‧分斷預定位置 A‧‧‧ Breaking scheduled position

AR1、AR2‧‧‧箭頭 AR1, AR2‧‧‧Arrows

AR11~AR14‧‧‧箭頭 AR11 ~ AR14‧‧‧Arrow

C‧‧‧虛線部 C‧‧‧ dotted line

CR‧‧‧裂痕 CR‧‧‧ Crack

F1‧‧‧力 F1‧‧‧force

F2‧‧‧力 F2‧‧‧force

F2a、F2b‧‧‧彈性力 F2a, F2b‧‧‧ Elasticity

F3a、F3b‧‧‧力 F3a, F3b‧‧‧force

F11a、F11b‧‧‧力 F11a, F11b‧‧‧force

F12a、F12b‧‧‧力 F12a, F12b‧‧‧force

F13a、F13b‧‧‧力 F13a, F13b‧‧‧force

F14a、F14b‧‧‧摩擦力 F14a, F14b‧‧‧Friction

G‧‧‧間隙 G‧‧‧ Clearance

S‧‧‧劃線 S‧‧‧ crossed

α‧‧‧間隙角度 α‧‧‧ Clearance angle

β‧‧‧間隙角度 β‧‧‧ Clearance angle

圖1係表示成為本發明之實施形態之分斷方法之對象的貼合基板10之構成的模式剖視圖。 FIG. 1 is a schematic cross-sectional view showing a configuration of a bonded substrate 10 that is a target of a cutting method according to an embodiment of the present invention.

圖2係表示形成有劃線S之貼合基板10之模式剖視圖。 FIG. 2 is a schematic cross-sectional view showing the bonded substrate 10 on which the scribe line S is formed.

圖3(a)~(c)係表示形成有劃線S之貼合基板10之利用三點彎曲方式之折斷步驟之模式剖視圖。 3 (a)-(c) are schematic cross-sectional views showing a breaking step using a three-point bending method of the bonded substrate 10 on which the scribe line S is formed.

圖4(a)~(c)係表示本實施形態中之貼合基板10之分斷情況之圖。 4 (a) to 4 (c) are diagrams showing the breaking conditions of the bonded substrate 10 in this embodiment.

圖5(a)、(b)係表示藉由分斷獲得之單片自保持帶5脫離時之情況之圖。 5 (a) and 5 (b) are diagrams showing the situation when the single piece obtained by the detachment is separated from the holding tape 5.

圖6係例示被實施有用以防止產生單片自保持帶脫離之不良狀況之措施的彈性體201之圖。 FIG. 6 is a diagram illustrating an elastic body 201 that is implemented with a measure to prevent the occurrence of an unfavorable situation in which a single piece of self-retaining belt comes off.

圖7(a)、(b)係表示對彈性體201之接觸面201s實施平滑化處理時之分斷情況之圖。 FIGS. 7 (a) and 7 (b) are diagrams showing the breaking conditions when the contact surface 201s of the elastic body 201 is smoothed.

圖1係表示成為本發明之實施形態之分斷方法之對象的異種材料之貼合基板(以下簡稱為貼合基板)10之構成的模式剖視圖。圖2係表示形成有劃線S之貼合基板10之模式剖視圖。本實施形態中,將利用包含接著劑之接著層3接著均為脆性材料基板之一種的玻璃基板1與半導體基板(例如矽基板)2而成之貼合基板10作為分斷對象。 FIG. 1 is a schematic cross-sectional view showing the structure of a bonded substrate (hereinafter referred to simply as a bonded substrate) 10 of a different material that is a target of the cutting method according to an embodiment of the present invention. FIG. 2 is a schematic cross-sectional view showing the bonded substrate 10 on which the scribe line S is formed. In this embodiment, a bonding substrate 10 using a bonding layer 3 including a bonding agent and a glass substrate 1 and a semiconductor substrate (for example, a silicon substrate) 2 each of which is a brittle material substrate is used as a breaking target.

玻璃基板1及半導體基板2之厚度、進而貼合基板10之平面尺寸並無特別限制,可鑒於分斷及前後步驟之操作容易性或處理效率等,選擇適當大小。 The thickness of the glass substrate 1 and the semiconductor substrate 2 and the planar size of the bonding substrate 10 are not particularly limited, and an appropriate size may be selected in view of the easiness of the cutting, the operation of the previous and subsequent steps, or the processing efficiency.

又,關於接著劑之材質,只要確保玻璃基板1與半導體基板2之間之接著強度,另一方面可適切地進行分斷,則無特別限制,例如可適切地使用紫外線(UV)硬化樹脂等。又,就可較佳地實現本實施形態之分斷方法之觀點而言,接著層3之厚度較佳為5μm~200μm左右,通常為5μm~50μm左右。 In addition, the material of the adhesive is not particularly limited as long as the bonding strength between the glass substrate 1 and the semiconductor substrate 2 is ensured, and cutting can be appropriately performed on the other hand, for example, ultraviolet (UV) curing resin can be appropriately used. . In addition, from the viewpoint that the breaking method of the present embodiment can be better realized, the thickness of the bonding layer 3 is preferably about 5 μm to 200 μm, and usually about 5 μm to 50 μm.

於半導體基板2之非接著面側,亦可形成特定之元件(例如CMOS感測器等)用圖案。 A pattern for a specific element (for example, a CMOS sensor or the like) may be formed on the non-adhesive surface side of the semiconductor substrate 2.

於分斷具有如上所述之構成之貼合基板10時,首先,如圖2所示,沿預先規定之分斷預定位置A,於玻璃基板1之非接著面形成劃線S。於圖2中,表示分斷預定位置A及劃線S沿與圖面垂直之方向延伸之情形。劃線S係沿玻璃基板1之厚度方向伸展之裂痕(微小裂痕)於玻璃基板1之非接著面上呈線狀連續而成。 When cutting the bonded substrate 10 having the structure described above, first, as shown in FIG. 2, a scribe line S is formed on a non-adhesive surface of the glass substrate 1 along a predetermined predetermined cutting position A. FIG. 2 shows a situation where the predetermined breaking position A and the scribe line S extend in a direction perpendicular to the drawing surface. The scribe line S is formed by a continuous line of cracks (micro-cracks) extending in the thickness direction of the glass substrate 1 on the non-adhesive surface of the glass substrate 1.

再者,於圖2中,為了進行簡單圖示,僅示出一分斷預定位置A及劃線S,於例如將貼合基板10呈短條狀或格子狀分斷等在複數個部位進行分斷而獲得多個單片之情形時,針對所有之分斷預定位置A形 成劃線S。以下,若無特別說明,則於該情形時,亦針對所有之分斷預定位置A實施後段之處理。 In addition, in FIG. 2, for the sake of simple illustration, only one predetermined cutting position A and the scribe line S are shown. For example, the bonding substrate 10 is cut in a short strip or a grid shape at a plurality of locations. In the case where multiple single pieces are obtained by breaking, the A-shape is predetermined for all breaking positions Into a line S. In the following, if there is no special explanation, in this case, the processing of the latter stage is also performed for all the predetermined breaking positions A.

形成劃線S可應用公知技術。例如,可為如下態樣:藉由使刀輪(刻劃輪)沿分斷預定位置A進行壓接轉動而形成劃線S,上述刀輪(刻劃輪)包含超硬合金、燒結金剛石、單晶金剛石等,呈圓板狀且於外周部分具備作為刀片發揮功能之稜線;可為如下態樣:藉由利用金剛石尖沿分斷預定位置A畫線,而形成劃線S;可為如下態樣:藉由利用雷射(例如紫外線(UV)雷射)照射產生之燒蝕或變質層之形成,而形成劃線S;亦可為如下態樣:藉由因雷射(例如紅外線(IR)雷射)引起之加熱與冷卻產生之熱應力而形成劃線S。 The scribe line S can be formed by applying a known technique. For example, it is possible to form a scribing line S by turning a cutter wheel (scribe wheel) along a predetermined breaking position A by crimping. The cutter wheel (scribe wheel) includes a cemented carbide, sintered diamond, Single crystal diamond, etc., is disc-shaped and has a ridgeline functioning as a blade on the outer periphery; it can be in the following form: a line S is formed by cutting a line along a predetermined position A with a diamond tip; it can be as follows Aspect: The scribe line S is formed by the formation of an ablation or metamorphic layer generated by laser (such as ultraviolet (UV) laser) irradiation; it may also be in the following aspect: by laser (such as infrared ( IR) The thermal stress caused by heating and cooling caused by laser) forms the scribe line S.

於本實施形態中,將如此般設置劃線S而成之貼合基板10作為對象,進行在分斷預定位置A之分斷。概略而言,藉由使裂痕CR(參照圖4)自劃線S於厚度方向上(更詳細而言,於與貼合基板10之主面垂直之方向上)伸展,而將貼合基板10分斷。 In the present embodiment, the bonding substrate 10 having the scribe line S provided in this manner is used as an object, and the cutting is performed at a predetermined cutting position A. In general, the crack CR (see FIG. 4) is extended from the scribe line S in the thickness direction (more specifically, in a direction perpendicular to the main surface of the bonded substrate 10) to thereby bond the bonded substrate 10. Break.

圖3係表示為了進行比較而例示之利用先前之三點彎曲方式之貼合基板10之分斷情況之圖。於先前之分斷方法中,首先,如圖3(a)所示,於貼合基板10之玻璃基板1側貼附具有黏著性之保持帶5。再者,保持帶5用於以藉由分斷獲得之晶片(單片)不會飛散等之方式保持該晶片。作為保持帶5,例如可較佳地使用利用切片機切割時以相同目的使用之所謂切割帶。如圖3所示,亦可視需要於半導體基板2之表面貼附保護膜4。藉由於半導體基板4之表面貼附保護膜4,可防止因基板與折斷用刀片接觸所致之基板之破壞。 FIG. 3 is a diagram illustrating the breaking of the bonded substrate 10 using the previous three-point bending method for comparison. In the previous cutting method, first, as shown in FIG. 3 (a), a holding tape 5 having an adhesive property is attached to the glass substrate 1 side of the bonding substrate 10. In addition, the holding tape 5 is used to hold the wafer (single wafer) obtained by the breaking so that the wafer does not scatter or the like. As the holding tape 5, for example, a so-called cutting tape used for the same purpose when cutting with a microtome is preferably used. As shown in FIG. 3, a protective film 4 may also be attached to the surface of the semiconductor substrate 2 as needed. By attaching the protective film 4 to the surface of the semiconductor substrate 4, damage to the substrate caused by the contact between the substrate and the breaking blade can be prevented.

然後,於使劃線S之形成部位位於在水平方向上隔開之2個下刀片101A、101B之間之態樣中,換言之,於相互平行配置之2個下刀片101A、101B之間使劃線S分別平行地配置之態樣中,利用2個下刀片101A、101B自下方支持使玻璃基板1側朝向下方之貼合基板10。然 後,於該支持狀態下,使上刀片102自上方向劃線S之形成位置(亦即分斷預定位置A)下降而抵接於貼合基板10或隔著保護膜4抵接,進而使上刀片102以壓入之方式下降。再者,下刀片101A、101B係以與貼合基板10相比充分具有剛性之構件設置。 Then, in a state where the formation portion of the scribe line S is located between the two lower blades 101A and 101B spaced apart in the horizontal direction, in other words, a scribe is made between the two lower blades 101A and 101B arranged in parallel with each other. In the aspect where the lines S are arranged in parallel, the bonding substrate 10 with the glass substrate 1 side facing downward is supported from below by two lower blades 101A and 101B. Of course Then, in this supporting state, the upper blade 102 is lowered from the formation position of the scribe line S in the upper direction (that is, the predetermined breaking position A), and abuts against the bonding substrate 10 or through the protective film 4, thereby further causing The upper blade 102 is lowered in a press-in manner. In addition, the lower blades 101A and 101B are provided with a member that is sufficiently more rigid than the bonded substrate 10.

該態樣中,於壓入上刀片102之情形時,如圖3(a)所示,對保護膜4之上刀片102所抵接之部位施加朝向下方之力F1,並且作為對於該力F1之反作用力(對抗因力F1及貼合基板10之自重引起之壓縮之力),自2個下刀片101A及101B各自之端部101a及101b朝向貼合基板10產生向上之力F2a、F2b。隨著裂痕CR之伸展,如圖3(b)所示,貼合基板10被逐漸分斷之左右2個部分以端部101a及101b為支點傾斜。伴隨於此,剖視時呈楔形狀之間隙G自曾經形成有劃線S之部位逐漸擴展。裂痕CR之伸展在存在於貼合基板10內部之異相界面(玻璃基板1與接著層3之界面、接著層3與半導體基板2之界面)亦得以維持,因此最終如圖3(c)所示,貼合基板10被垂直於主面地分斷。再者,將分斷完成時由分斷產生之2個分斷面所成之角度(間隙角度)設為α。 In this aspect, when the upper blade 102 is pushed in, as shown in FIG. 3 (a), a downward force F1 is applied to a portion of the protective film 4 abutting the blade 102, and the force F1 is applied to the force. The opposing forces (forces against compression caused by the force F1 and the self-weight of the bonded substrate 10) generate upward forces F2a, F2b from the ends 101a and 101b of the two lower blades 101A and 101B toward the bonded substrate 10, respectively. As the crack CR extends, as shown in FIG. 3 (b), the left and right portions of the bonded substrate 10 are gradually broken with the ends 101 a and 101 b as fulcrum points. Along with this, the gap G, which has a wedge shape in cross-section, gradually expands from the portion where the scribe line S was formed. The extension of the crack CR is also maintained at the heterogeneous interface (the interface between the glass substrate 1 and the bonding layer 3 and the interface between the bonding layer 3 and the semiconductor substrate 2) existing inside the bonded substrate 10, so as shown in FIG. 3 (c) The bonded substrate 10 is divided perpendicular to the main surface. In addition, the angle (gap angle) formed by the two cutting surfaces generated by the cutting when the cutting is completed is set to α.

如上所述之態樣之先前之分斷方法可以說大致為如下方法:藉由使力F1及力F2a、F2b發揮作用,產生以2個下刀片101A及101B各自之端部101a及101b為支點之相反方向之力矩,使藉此被逐漸分斷之左右2個部分產生相反方向之旋動,藉此進行分斷。於該方法中,相當於藉由壓入上刀片102而對貼合基板10賦予之能量之部分消耗於旋動上。 The previous breaking method of the state as described above can be said to be roughly the following method: By applying the forces F1 and F2a and F2b, the ends 101a and 101b of the two lower blades 101A and 101B are generated as the fulcrum The torque in the opposite direction causes the left and right two parts that are gradually broken by this to generate the rotation in the opposite direction, thereby breaking. In this method, a portion equivalent to the energy given to the bonded substrate 10 by pressing on the upper blade 102 is consumed by the rotation.

圖4係表示本實施形態中之貼合基板10之分斷情況之圖。本實施形態中分斷貼合基板10之情形亦與先前之方法相同,首先,於貼合基板10之玻璃基板1側貼附具有黏著性之保持帶5。 FIG. 4 is a diagram showing the breaking state of the bonded substrate 10 in this embodiment. In this embodiment, the situation of cutting the bonded substrate 10 is also the same as the previous method. First, an adhesive holding tape 5 is attached to the glass substrate 1 side of the bonded substrate 10.

其次,如圖4(a)所示,以貼附有保持帶5之側之主面側朝下之姿勢,將該貼合基板10以該主面整面接觸之方式載置於彈性體201上。 於本實施形態中,彈性體201係指硬度為65°~95°、較佳為70°~90°、例如為80°之材質者。作為該彈性體201,例如可較佳地使用聚矽氧橡膠等。再者,如圖4(a)所示,彈性體201亦可由平台等支持體202支持。於自彈性體201及支持體202側觀察(識別)劃線之情形時,彈性體201及支持體202較佳為透明。 Next, as shown in FIG. 4 (a), the bonding substrate 10 is placed on the elastic body 201 in such a manner that the main surface side of the side to which the holding tape 5 is attached faces downward. on. In this embodiment, the elastomer 201 refers to a material having a hardness of 65 ° to 95 °, preferably 70 ° to 90 °, and for example, 80 °. As this elastic body 201, for example, a silicone rubber or the like can be preferably used. Furthermore, as shown in FIG. 4 (a), the elastic body 201 may also be supported by a support body 202 such as a platform. When the scribe line is viewed (identified) from the side of the elastic body 201 and the support body 202, the elastic body 201 and the support body 202 are preferably transparent.

於本實施形態中,於該載置狀態下進行分斷。具體而言,為了使裂痕CR自劃線S於厚度方向上伸展,藉由使上刀片102自上方朝向劃線S之形成位置(亦即分斷預定位置A)下降,而抵接於貼合基板10,進而使上刀片102以壓入之方式下降。 In this embodiment, the cutting is performed in this mounted state. Specifically, in order to extend the crack CR from the scribe line S in the thickness direction, the upper blade 102 is lowered from above toward the formation position of the scribe line S (that is, the predetermined breaking position A), and abuts against the bonding. The substrate 10 further lowers the upper blade 102 by press-fitting.

於該態樣中,當壓入上刀片102時,如圖4(a)所示,對保護膜4之上刀片102所抵接之部位施加朝向下方之力F1。於是,作為對於該力F1之反作用力(對抗因力F1及貼合基板10之自重引起之壓縮之力),自彈性體201朝向貼合基板10,以上刀片102之抵接位置之正下方之位置為中心產生向上之彈性力F2,其後,貼合基板10被逐漸分斷之左右2個部分立即開始傾斜,裂痕CR自劃線S伸展,如圖4(b)所示,剖視時呈楔形狀之間隙G逐漸擴展。於本實施形態之分斷方法之情形時也是,裂痕CR之伸展在存在於貼合基板10內部之異相界面(玻璃基板1與接著層3之界面、接著層3與半導體基板2之界面)亦獲維持。因此,最終如圖4(c)所示,貼合基板10被垂直於主面地分斷。 In this aspect, when the upper blade 102 is pressed in, as shown in FIG. 4 (a), a downward force F1 is applied to a portion of the protective film 4 which is in contact with the blade 102. Therefore, as a reaction force to the force F1 (a force against compression caused by the force F1 and the self-weight of the bonded substrate 10), the elastic body 201 faces the bonded substrate 10, directly below the contact position of the above blade 102. An upward elastic force F2 is generated at the position. After that, the left and right parts of the bonded substrate 10 gradually begin to tilt, and the crack CR extends from the scribe line S, as shown in FIG. 4 (b). The gap G having a wedge shape gradually expands. In the case of the breaking method of this embodiment, the crack CR extends at the heterogeneous interface (the interface between the glass substrate 1 and the bonding layer 3 and the interface between the bonding layer 3 and the semiconductor substrate 2) existing inside the bonded substrate 10. Maintained. Therefore, as shown in FIG. 4 (c), the bonding substrate 10 is finally divided perpendicular to the main surface.

更詳細而言,當裂痕CR開始伸展而開始形成間隙G時,彈性力F2a、F2b作用於貼合基板10將被分斷之左右2個部分各自與彈性體201之抵接面。而且,與先前之方法相同,隨著裂痕CR之伸展,如圖4(b)所示,剖視時呈楔形狀之間隙G自曾經形成有劃線S之部位逐漸擴展。 In more detail, when the crack CR starts to stretch and the gap G starts to be formed, the elastic forces F2a and F2b act on the abutting surfaces of the bonded substrate 10 and the left and right portions, respectively, with the elastic body 201. Moreover, as in the previous method, as the crack CR is extended, as shown in FIG. 4 (b), the gap G having a wedge shape in cross-section gradually expands from the place where the scribe line S was formed.

再者,此時,實質上如圖4(b)所示,形成間隙G之左右2個分斷面之附近分別成為彈性力F2a、F2b集中地發揮作用之彈性力集中部位 201a、201b,因此可以說本實施形態之分斷方法亦係依據三點彎曲方式。 In addition, at this time, as shown in FIG. 4 (b), the vicinity of the left and right two cross sections forming the gap G becomes the elastic force concentration portions where the elastic forces F2a and F2b function collectively, respectively. 201a, 201b, so it can be said that the breaking method of this embodiment is also based on the three-point bending method.

然而,於該本實施形態之分斷方法之情形時,與上述先前之分斷方法不同,隨著間隙G逐漸擴展,彈性力集中部位201a、201b如箭頭AR1、AR2所示般移位,但貼合基板10整體上支持於彈性體201,因此於貼合基板10不易產生以彈性力集中部位201a、201b為支點之力矩。此意味著,本實施形態之分斷方法中,藉由壓入上刀片102而對貼合基板10賦予之能量更有效率地有助於分斷。具體而言,於貼合基板10之分斷預定位置(裂痕CR之伸展對象位置)產生之相互反方向之力F3a、F3b與先前方法相比變大。該力F3a、F3b對裂痕CR之伸展、尤其對接著層3之分斷(撕裂)有效地發揮作用。 However, in the case of the breaking method of this embodiment, unlike the previous breaking method described above, as the gap G gradually expands, the elastic force concentration portions 201a and 201b shift as shown by arrows AR1 and AR2, but Since the bonding substrate 10 is supported by the elastic body 201 as a whole, it is difficult for the bonding substrate 10 to generate a moment with the elastic force concentration portions 201 a and 201 b as the fulcrum. This means that in the cutting method of the present embodiment, the energy imparted to the bonded substrate 10 by pushing in the upper blade 102 contributes to the cutting more efficiently. Specifically, the forces F3a and F3b in opposite directions generated at the predetermined breaking position of the bonded substrate 10 (the position where the crack CR extends) are larger than those in the previous method. The forces F3a and F3b effectively exert an effect on the extension of the crack CR, especially on the breaking (tearing) of the adhesive layer 3.

結果,於該本實施形態之分斷方法之情形時,即便使上刀片102之壓入量不如先前那般大,亦可較佳地分斷貼合基板10。又,於將本實施形態之分斷方法中之間隙角度之大小設為β時,β<α成立。因此,由於先前之分斷方法之情形時產生之間隙角度α變大而於貼合基板10產生位置偏移之不良狀況,於本實施形態之分斷方法中被較佳地抑制。 As a result, in the case of the cutting method according to this embodiment, even if the pressing amount of the upper blade 102 is not as large as before, the bonded substrate 10 can be cut preferably. When the magnitude of the gap angle in the cutting method of this embodiment is β, β <α holds. Therefore, since the gap angle α generated in the case of the previous cutting method becomes large, and the problem that the position shift occurs on the bonded substrate 10 is caused, the cutting method of the present embodiment is better suppressed.

<防止分斷後脫離> <Preventing detachment after breaking>

如上所述,貼合基板10藉由以彈性體201進行支持,而可利用三點彎曲方式進行分斷。然而,將一貼合基板10於複數個部位進行分斷而獲得多個單片之情形時,根據彈性體201與貼附貼合基板10之保持帶5之組合,有時由分斷獲得之單片會自保持帶5脫離。圖5係表示產生該脫離時之情況之圖。再者,於圖5中簡化貼合基板10之圖示,並且省略上刀片102及支持體202之圖示。 As described above, the bonded substrate 10 can be divided by the three-point bending method by being supported by the elastic body 201. However, when a single bonded substrate 10 is cut at a plurality of locations to obtain a plurality of single pieces, depending on the combination of the elastic body 201 and the holding tape 5 to which the bonded substrate 10 is attached, it may be obtained by cutting. The single piece is released from the holding belt 5. FIG. 5 is a diagram showing a situation when the separation occurs. In addition, the illustration of the bonded substrate 10 is simplified in FIG. 5, and the illustration of the upper blade 102 and the support 202 is omitted.

於圖5(a)中表示利用之前之分斷獲得單片10a後,繼而欲獲得單片10b時作用於保持帶5之力。 Fig. 5 (a) shows the force acting on the holding belt 5 when the single piece 10a is obtained by the previous division, and then when the single piece 10b is to be obtained.

首先,如上所述,當為了獲得單片10b而自上刀片102對貼合基板10施加力F1時,間隙G之形成進展,此時,自相互間逐漸剝離之單片10b及貼合基板之剩餘部分(以下,為方便起見亦將其稱為單片)10c對與該等單片接著之保持帶5,作用有欲將該保持帶5沿著彈性體201之表面向外側拉伸之力F11a、F11b。再者,該等力F11a、F11b亦包含作用於單片10b及部分10c與保持帶5之間之接著力在該方向上之成分。該力F11a、F11b相當於使保持帶5追隨分斷時產生之單片向外側之移動之力。 First, as described above, when a force F1 is applied to the bonded substrate 10 from the upper blade 102 in order to obtain a single piece 10b, the formation of the gap G progresses. At this time, the single piece 10b and the bonded substrate are gradually peeled from each other. The remaining part (hereinafter, also referred to as a single sheet for convenience) 10c acts on the holding bands 5 following the single sheets, and serves to stretch the holding band 5 outward along the surface of the elastic body 201. Force F11a, F11b. Moreover, the forces F11a and F11b also include components in this direction of the adhesive force acting between the single piece 10b and the portion 10c and the holding band 5. The forces F11a and F11b are equivalent to the forces that cause the holding belt 5 to follow the movement of the single piece to the outside when following the breaking.

但,對於該力F11a、F11b所作用之保持帶5,在其與彈性體201之間,摩擦力F12a、F12b在與該等力F11a、F11b相反之方向上沿著彈性體201之表面發揮作用。此處,摩擦力F12a、F12b係將最大靜止摩擦力作為最大值之力,靜止摩擦係數越大,則該摩擦力F12a、F12b取得越大之值。該靜止摩擦係數越大,則保持帶5由相對於彈性體201越不易滑動之材質形成。 However, with respect to the holding band 5 to which the forces F11a and F11b act, the frictional forces F12a and F12b act along the surface of the elastomer 201 in a direction opposite to the forces F11a and F11b. . Here, the frictional forces F12a and F12b are forces having the maximum static frictional force as the maximum value. The larger the static frictional coefficient, the larger the frictional forces F12a and F12b. The larger the static friction coefficient, the more the holding belt 5 is made of a material that is less likely to slide relative to the elastic body 201.

進而,於保持帶5,伴隨著壓入上刀片102而彈性體201壓縮,欲沿以該保持帶為中心之方向拉伸之F13a、F13b亦發揮作用。再者,利用上刀片102進行壓縮時,彈性體201亦於與保持帶5相同之方向受力而移位,因此藉由力F13a、13b發揮作用,不會在兩者之間產生摩擦力。 Further, in the holding belt 5, the elastic body 201 compresses as the upper blade 102 is pushed in, and F13a and F13b that are intended to be stretched in the direction centering on the holding belt also function. In addition, when the upper blade 102 is used for compression, the elastic body 201 is also displaced by receiving a force in the same direction as that of the holding belt 5. Therefore, the forces F13a and 13b act to prevent friction between the two.

結果,於進行分斷之期間,對於保持帶5,力F11a、F11b向外側發揮作用,力F12a、F12b及力F13a、13b向中心發揮作用。 As a result, during the breaking operation, the forces F11a and F11b are applied to the holding belt 5 to the outside, and the forces F12a and F12b and the forces F13a and 13b are applied to the center.

因此,為了良好地進行分斷,要求力F11a、F11b分別超過F12a、F13a為最大值時之合力F12a+F13a及合力F12b+F13b。假設保持帶5由相對於彈性體201不易滑動之材質形成,因此力F11a、F11b分別不超過該等合力F12a+F13a及合力F12b+F13b之情形時,相較於單片10b欲拉伸保持帶5之朝向外側之力,朝向內側之力更大,因此如圖 5(b)中以虛線部C所示,單片10b與保持帶5不再維持接著狀態,而可能引起分斷中途之單片10b自保持帶5脫離。即,可能引起藉由分斷貼合基板10而獲得之單片10b自保持帶5脫離。再者,雖自重大於單片10b之單片10c不易產生此種脫離,但原理上可能引起相同狀況。 Therefore, in order to perform the breaking well, the required forces F11a and F11b exceed the combined forces F12a + F13a and combined forces F12b + F13b when F12a and F13a are at their maximum values, respectively. It is assumed that the holding belt 5 is formed of a material that is not easy to slide relative to the elastic body 201. Therefore, when the forces F11a and F11b do not exceed the total forces F12a + F13a and F12b + F13b, respectively, the holding belt 5 is intended to be stretched compared to the single piece 10b. The force of 5 toward the outside, the force toward the inside is greater, so as shown in the figure As shown by the dotted line C in 5 (b), the single piece 10b and the holding tape 5 are no longer maintained in a bonding state, and the single piece 10b may be detached from the holding tape 5 in the middle of the break. That is, the single piece 10 b obtained by breaking the bonded substrate 10 may be detached from the holding tape 5. Moreover, although such a detachment is unlikely to occur in a monolithic piece 10c that is heavier than the monolithic piece 10b, the same situation may be caused in principle.

圖6係例示被實施有用以防止產生此種不良狀況之措施之彈性體201之圖。 FIG. 6 is a diagram illustrating an elastic body 201 to which a measure for preventing such an undesirable situation is implemented.

具體而言,為了降低保持帶5與彈性體201之間之靜止摩擦係數,亦即為了使保持帶5相對於彈性體201容易滑動,對彈性體201與保持帶5之接觸面201s實施平滑化處理。此處,所謂平滑化處理,例如例示膜貼附或塗佈等。 Specifically, in order to reduce the static friction coefficient between the holding belt 5 and the elastic body 201, that is, to make the holding belt 5 easily slide relative to the elastic body 201, the contact surface 201s of the elastic body 201 and the holding belt 5 is smoothed. deal with. Here, the smoothing process is exemplified by film attachment or coating.

圖7係表示對彈性體201之接觸面201s實施平滑化處理時之分斷情況之圖。再者,於圖7中,亦與圖5同樣地,簡化貼合基板10之圖示,並且省略上刀片102及支持體202之圖示。 FIG. 7 is a diagram showing the breaking condition when the contact surface 201s of the elastic body 201 is smoothed. In FIG. 7, similar to FIG. 5, the illustration of the bonded substrate 10 is simplified, and the illustration of the upper blade 102 and the support 202 is omitted.

首先,於圖7(a)中,與圖5(a)同樣地,表示利用之前之分斷獲得單片10a後,繼而欲獲得單片10b時作用於保持帶5之力。該情形時作用於保持帶5之力之種類與圖5(a)所示之情況相同,但此時,由於對接觸面201s實施平滑化處理而降低靜止摩擦係數,因此保持帶5自彈性體201受到之摩擦力F14a、F14b之最大值小於圖5(a)所示之摩擦力F12a、F12b之最大值。結果,於力F11a、F11b分別大於摩擦力F14a、F14b為最大靜止摩擦力時之合力F14a+F13a及合力F14b+F13b之值之情形時,如圖7(b)所示,被上刀片102壓住中心部分之保持帶5於單片10b及10c欲向外側移動時追隨該移動。此時,保持帶5產生如箭頭AR11~AR14所示之伸展,單片10b未脫離而被分斷。 First, in FIG. 7 (a), the same force as in FIG. 5 (a) shows the force acting on the holding belt 5 when the single piece 10 a is obtained by the previous division, and then the single piece 10 b is obtained. In this case, the kind of force acting on the holding belt 5 is the same as that shown in FIG. 5 (a), but at this time, since the contact surface 201s is smoothed to reduce the static friction coefficient, the holding belt 5 is self-elastic. The maximum value of the frictional forces F14a, F14b received by 201 is smaller than the maximum value of the frictional forces F12a, F12b shown in FIG. 5 (a). As a result, when the forces F11a and F11b are larger than the values of the combined forces F14a + F13a and F14b + F13b when the friction forces F14a and F14b are the maximum static friction forces, as shown in FIG. 7 (b), they are pressed by the upper blade 102. The holding belt 5 which lives in the center part follows this movement when the individual pieces 10b and 10c want to move outward. At this time, the holding band 5 is stretched as shown by arrows AR11 to AR14, and the single piece 10b is cut without being detached.

再者,更詳細而言,保持帶5追隨單片10b及10c之移動時作用於保持帶5與彈性體201之間之摩擦力F14a、F14b為動摩擦力,該動摩擦力係依存於動摩擦係數之值,但於對彈性體201之接觸面201s實施有 平滑化處理之情形時,不僅靜止摩擦係數降低,該動摩擦係數亦會降低,因此若實施平滑化處理,則可較佳地抑制單片10b之脫離。 Furthermore, in more detail, the frictional forces F14a and F14b acting between the holding belt 5 and the elastic body 201 when the holding belt 5 follows the movement of the single pieces 10b and 10c are dynamic friction forces, and the dynamic friction force depends on the dynamic friction coefficient. Value, but for the contact surface 201s of the elastic body 201 In the case of the smoothing process, not only the static friction coefficient decreases, but the dynamic friction coefficient also decreases. Therefore, if the smoothing process is performed, the detachment of the single piece 10b can be better suppressed.

如以上所說明般,根據本實施形態,於將利用接著劑貼合2個脆性材料基板、尤其包含異種材料之2個脆性材料基板而成之貼合基板於特定之分斷預定位置進行分斷時,首先,於貼合基板之一主面側之分斷預定位置設置劃線。然後,將形成該劃線之側之主面貼附於保持帶,視需要於另一主面貼附保護膜後,以該保持帶之側為下方而將貼合基板載置於彈性體上。於該載置狀態下,使上刀片自上方相對於貼合基板之分斷預定位置下降。藉此,以較先前之三點彎曲方式少之上刀片之壓入量便可將包含異相界面之貼合基板較佳地分斷。而且,可實現利用分斷獲得之單片不產生位置偏移之良好分斷。 As described above, according to this embodiment, a bonding substrate formed by bonding two brittle material substrates, especially two brittle material substrates containing different materials, with an adhesive is cut at a predetermined predetermined cutting position. At this time, first, a scribing line is provided at a predetermined cutting position on a main surface side of the bonded substrate. Then, the main surface on which the scribe line is formed is attached to a holding tape, and if necessary, a protective film is attached to the other main surface, and then the laminating substrate is placed on the elastomer with the side of the holding tape as a lower side. . In this loading state, the upper blade is lowered from a predetermined position of the upper substrate with respect to the bonding substrate. Thereby, the laminated substrate including the out-of-phase interface can be better cut off with a smaller pressing amount of the upper blade than the previous three-point bending method. In addition, a good break can be achieved in which a single piece obtained by the break does not cause a position shift.

又,藉由對彈性體之表面預先實施平滑化處理,可較佳地抑制由分斷獲得之單片自保持帶脫離。 In addition, by smoothing the surface of the elastomer in advance, it is possible to better suppress the detachment of the single-piece self-retaining tape obtained by the severing.

<變化例> <Modifications>

作為上述實施形態之脆性材料基板,除玻璃基板、矽基板以外,亦可例示各種半導體基板、藍寶石基板、氧化鋁基板等陶瓷基板、玻璃陶瓷基板(所謂LTCC(Low Temperature Co-fired Ceramic,低溫共燒陶瓷)基板)等。 As the brittle material substrate of the above embodiment, in addition to glass substrates and silicon substrates, various semiconductor substrates, ceramic substrates such as sapphire substrates, alumina substrates, and glass ceramic substrates (so-called LTCC (Low Temperature Co-fired Ceramic, Ceramics) substrates) and so on.

於異種材料貼合基板之情形時,較佳為於具有易分斷之性狀(高脆性、小厚度)之脆性材料基板側視需要形成保護膜,且於具有不易分斷之性狀(低脆性、大厚度)之脆性材料基板側形成劃線。 In the case of bonding substrates of different materials, it is preferred to form a protective film on the side of a brittle material substrate with easy breakability (high brittleness, small thickness) as needed, and to have a property of low breakability (low brittleness, A large thickness) is formed on the substrate side of the brittle material.

Claims (12)

一種脆性材料基板之分斷方法,其特徵在於:其係將脆性材料基板於特定之分斷預定位置進行分斷之方法,且具備:劃線形成步驟,其係於上述基板之一主面側之上述分斷預定位置設置劃線;基板貼附步驟,其係將設有上述劃線之上述基板之上述一主面貼附於保持帶;載置步驟,其係將貼附有上述保持帶之上述基板以上述一主面側整面接觸之方式,載置於表面藉由膜貼附或塗佈進行了平滑化之彈性體上;及分斷步驟,其係於將上述基板載置於上述彈性體之狀態下,藉由使上刀片之前端一面抵接於上述分斷預定位置一面下降,而將上述基板分斷;經上述平滑化之彈性體於上述基板分斷時與上述保持帶之間不會產生間隙。A method for breaking a brittle material substrate, which is characterized in that it is a method for breaking a brittle material substrate at a specific predetermined breaking position, and includes: a scribing forming step, which is located on a main surface side of one of the above substrates A scribe line is set at the above-mentioned predetermined breaking position; a substrate attaching step is to attach the main surface of the substrate provided with the scribe line to a holding tape; and a placing step is to attach the above holding tape The above-mentioned substrate is placed on the elastic body whose surface is smoothed by film attachment or coating in such a manner that the entire main surface side is in full contact with the above-mentioned one; and a breaking step, which is based on placing the above-mentioned substrate on In the state of the elastic body, the substrate is broken by lowering the front end of the upper blade while abutting the predetermined cutting position; the smoothed elastic body is connected with the holding belt when the substrate is broken. There is no gap between them. 如請求項1之脆性材料基板之分斷方法,其中至少於上述劃線形成步驟之後且上述分斷步驟之前具備保護膜貼附步驟,該保護膜貼附步驟係於上述基板之另一主面貼附保護膜。For example, the method for cutting a brittle material substrate according to claim 1, wherein a protective film attaching step is provided at least after the scribing step and before the cutting step, and the protective film attaching step is on the other main surface of the substrate. Attach a protective film. 如請求項1或2之脆性材料基板之分斷方法,其中上述脆性材料基板係貼合兩個基板而成之貼合基板。For example, the method for cutting a brittle material substrate according to claim 1 or 2, wherein the brittle material substrate is a bonded substrate formed by bonding two substrates. 一種脆性材料基板之分斷方法,其特徵在於:其係將脆性材料基板於複數個分斷預定位置依序進行分斷之方法,且具備:劃線形成步驟,其係於上述基板之一主面側之複數個上述分斷預定位置設置劃線;保持帶貼附步驟,其係將設有上述劃線之上述基板之上述一主面貼附於保持帶;載置步驟,其係將貼附有上述保持帶之上述基板以上述一主面側整面接觸之方式,載置於表面藉由膜貼附或塗佈進行了平滑化之彈性體上;及分斷步驟,其係於將上述基板載置於上述彈性體之狀態下,於上述複數個上述分斷預定位置上重複如下操作,即,藉由使上刀片之前端一面抵接於上述分斷預定位置一面下降,而將上述基板分斷;經上述平滑化之彈性體於上述基板分斷時與上述保持帶之間不會產生間隙。A cutting method for a brittle material substrate is characterized in that it is a method for sequentially cutting a brittle material substrate at a plurality of predetermined cutting positions, and includes: a scribing step, which is based on one of the above substrates. A plurality of the above-mentioned cut-off predetermined positions are provided with a scribe line on the side; the holding tape attaching step is to attach the above-mentioned main surface of the substrate provided with the scribe line to the holding tape; and the placing step is to apply the affixed tape. The substrate with the above-mentioned holding tape is placed on the elastic body whose surface is smoothed by film attachment or coating in such a manner that the one main surface side is in full contact with the above; and a breaking step, which involves In the state where the substrate is placed on the elastic body, the following operations are repeated at the plurality of predetermined breaking positions, that is, by lowering the front end of the upper blade while abutting on the predetermined breaking position, the above The substrate is broken; the smoothed elastic body does not generate a gap between the substrate and the holding belt when the substrate is broken. 如請求項4之脆性材料基板之分斷方法,其中至少於上述劃線形成步驟之後且上述分斷步驟之前具備保護膜貼附步驟,該保護膜貼附步驟係於上述基板之另一主面貼附保護膜。For example, the method for cutting a brittle material substrate according to claim 4, wherein a protective film attaching step is provided at least after the scribing step and before the cutting step, and the protective film attaching step is on the other main surface of the substrate. Attach a protective film. 如請求項4或5之脆性材料基板之分斷方法,其中上述脆性材料基板係貼合兩個基板而成之貼合基板。For example, the method for cutting a brittle material substrate according to claim 4 or 5, wherein the brittle material substrate is a bonded substrate formed by bonding two substrates. 一種脆性材料基板之分斷方法,其特徵在於:其係將脆性材料基板於特定之分斷預定位置進行分斷之方法,且上述基板於一主面側之上述分斷預定位置形成有劃線並貼附有上述保持帶,且上述一主面朝向下方,於利用表面藉由膜貼附或塗佈進行了平滑化之彈性體自下方支持上述基板之狀態下,藉由使上刀片之前端一面抵接於上述分斷預定位置一面下降,而將上述基板分斷;經上述平滑化之彈性體於上述基板分斷時與上述保持帶之間不會產生間隙。A cutting method for a brittle material substrate is characterized in that it is a method for breaking a brittle material substrate at a specific predetermined cutting position, and the substrate is formed with a scribe line at the predetermined cutting position on a main surface side. The above-mentioned holding tape is attached, and the above-mentioned one main surface faces downward. In a state where the substrate is supported from below by an elastic body whose surface is smoothed by film attachment or coating, the front end of the upper blade is made. The aforesaid substrate is broken while abutting on the predetermined breaking position, and the smoothed elastic body does not generate a gap between the substrate and the holding belt when the substrate is broken. 如請求項7之脆性材料基板之分斷方法,其中上述脆性材料基板係貼合兩個基板而成之貼合基板。The cutting method of the brittle material substrate according to claim 7, wherein the brittle material substrate is a bonded substrate formed by bonding two substrates. 一種脆性材料基板之分斷裝置,其特徵在於:其係將脆性材料基板於特定之分斷預定位置進行分斷之裝置,且具備:劃線形成機構,其於上述基板之一主面側之上述分斷預定位置設置劃線;基板貼附機構,其將設有上述劃線之上述基板之上述一主面貼附於保持帶;載置機構,其將貼附有上述保持帶之上述基板以上述一主面側整面接觸之方式,載置於表面藉由膜貼附或塗佈進行了平滑化之彈性體上;及分斷機構,其於將上述基板載置於上述彈性體之狀態下,藉由使上刀片之前端一面抵接於上述分斷預定位置一面下降,而將上述基板分斷;經上述平滑化之彈性體於上述基板分斷時與上述保持帶之間不會產生間隙。A breaking device for a brittle material substrate is characterized in that it is a device that breaks a brittle material substrate at a specific predetermined breaking position, and is provided with a scribing forming mechanism that is located on a main surface side of one of the substrates. A scribe line is provided at the above-mentioned predetermined breaking position; a substrate attaching mechanism attaches the main surface of the substrate provided with the scribe line to a holding tape; and a placing mechanism attaching the substrate to which the holding tape is attached On the main surface side of the whole surface contact, placed on the surface of the elastic body smoothed by film attachment or coating; and a breaking mechanism for placing the substrate on the elastic body In the state, the substrate is broken by lowering the front end of the upper blade while abutting the predetermined cutting position; the smoothed elastic body does not fall between the substrate and the holding band when the substrate is broken. Create a gap. 如請求項9之脆性材料基板之分斷方法,其中上述脆性材料基板係貼合兩個基板而成之貼合基板。For example, the method for cutting a brittle material substrate according to claim 9, wherein the brittle material substrate is a bonded substrate formed by bonding two substrates. 一種脆性材料基板之分斷裝置,其特徵在於:其係將脆性材料基板於特定之分斷預定位置進行分斷之裝置,且具備:表面藉由膜貼附或塗佈進行了平滑化之彈性體,其自下方支持上述基板,上述基板於一主面側之上述分斷預定位置形成有劃線並貼附有上述保持帶,且上述一主面朝向下方;及分斷機構,其藉由使設於上述彈性體上方之上刀片之前端一面抵接於上述分斷預定位置一面下降,而將上述基板分斷;經上述平滑化之彈性體於上述基板分斷時與上述保持帶之間不會產生間隙。A breaking device for a brittle material substrate is characterized in that it is a device for breaking a brittle material substrate at a specific predetermined breaking position, and has the elasticity of smoothing the surface by film attachment or coating A body that supports the substrate from below, the substrate is formed with a scribe line and attached with the holding tape at the predetermined cutting position on a main surface side, and the one main surface faces downward; and a cutting mechanism, The front end of the blade provided above the elastic body is lowered while abutting against the predetermined cutting position to cut the substrate; the smoothed elastic body is between the substrate and the holding belt when the substrate is cut. No gap is created. 如請求項11之脆性材料基板之分斷方法,其中上述脆性材料基板係貼合兩個基板而成之貼合基板。For example, the method for cutting a brittle material substrate according to claim 11, wherein the brittle material substrate is a bonded substrate formed by bonding two substrates.
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