TW201603182A - Support chuck and substrate treating apparatus - Google Patents

Support chuck and substrate treating apparatus Download PDF

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Publication number
TW201603182A
TW201603182A TW104121974A TW104121974A TW201603182A TW 201603182 A TW201603182 A TW 201603182A TW 104121974 A TW104121974 A TW 104121974A TW 104121974 A TW104121974 A TW 104121974A TW 201603182 A TW201603182 A TW 201603182A
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disposed
support
substrate
main body
expandable
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TW104121974A
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Chinese (zh)
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TWI662651B (en
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金相午
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Ap系統股份有限公司
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303Apparatus specially adapted to the manufacture of LCDs
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1306Details
    • G02F1/1309Repairing; Testing
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/67303Vertical boat type carrier whereby the substrates are horizontally supported, e.g. comprising rod-shaped elements
    • H01L21/67309Vertical boat type carrier whereby the substrates are horizontally supported, e.g. comprising rod-shaped elements characterized by the substrate support
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2201/00Constructional arrangements not provided for in groups G02F1/00 - G02F7/00
    • G02F2201/54Arrangements for reducing warping-twist

Abstract

Provided is a support chuck and a substrate treating apparatus having the same. The support chuck by which a substrate is supported includes a main body having an inner space, an expandable member configured to divide the inner space in a thickness direction of the main body, the expandable member being disposed in the main body so that the expandable member moves in the thickness direction of the main body by a gas injected into separated sectioned spaces, a moving member passing through one surface of the main body in the thickness direction of the main body and is disposed on the flexible member, and an adhesion member disposed on an end of the moving member outward the main body. While the substrate is separated from the unit that supports the substrate, a phenomenon in which the substrate is twisted may be prevented.

Description

支撐夾具和基板處理設備Support fixture and substrate processing equipment

本發明有關於一種支撐夾具和基板處理設備,並且更確切地說,有關於一種能夠防止在基板從支撐基板的單元上分離時基板發生絞擰的支撐夾具,以及具有所述支撐夾具的基板處理設備。The present invention relates to a support jig and a substrate processing apparatus, and more particularly to a support jig capable of preventing the substrate from being twisted when the substrate is separated from the unit of the support substrate, and substrate processing having the support jig device.

一般來說,例如液晶顯示器(liquid crystal display,LCD)等平板顯示裝置和有機發光裝置(organic light emitting device,OLED)是通過將一對平板基板結合到彼此製造的。舉例來說,多個薄膜電晶體所在的上部基板、有機發光層和電極被安置成結合到充當加蓋層的下部基板以製造OLED。此處,用於結合上述基板的裝置以多種形狀實現。舉例來說,在第10-1340614號韓國專利註冊中公開了一種“基板結合設備”。Generally, a flat panel display device such as a liquid crystal display (LCD) and an organic light emitting device (OLED) are manufactured by bonding a pair of flat substrates to each other. For example, an upper substrate, an organic light emitting layer, and an electrode on which a plurality of thin film transistors are located are disposed to be bonded to a lower substrate serving as a capping layer to fabricate an OLED. Here, the means for bonding the above substrate is realized in various shapes. For example, a "substrate bonding device" is disclosed in Korean Patent Registration No. 10-1340614.

如同在上述專利註冊公報中所公開,通常,根據現有技術用於結合基板的裝置包含:表面板;黏合部件,其耦合到所述表面板以支撐基板;以及起模頂桿,以用於從黏合部件分離基板。As disclosed in the above-mentioned patent registration publication, generally, an apparatus for bonding a substrate according to the prior art includes: a surface plate; an adhesive member coupled to the surface plate to support the substrate; and a die ejector for The bonding member separates the substrate.

同時,在用於根據現有技術結合基板的裝置中,執行用於結合基板的過程,並且隨後起模頂桿朝向基板突出以將基板從黏合部件拆卸和分離。此處,存在如下限制。Meanwhile, in the apparatus for bonding substrates according to the related art, a process for bonding substrates is performed, and then the mold ejector is protruded toward the substrate to detach and separate the substrates from the bonding members. Here, there are the following restrictions.

在基板從黏合部件分離的同時,起模頂桿連續地接觸和按壓基板。因此,在基板從黏合部件分離的同時,局部負載被施加到基板,並且因此基板可以被損壞。並且,雖然起模頂桿施加力給基板以從黏合部件推按基板,但是上部基板和下部基板可以未對齊。The ejector pin continuously contacts and presses the substrate while the substrate is separated from the bonding member. Therefore, while the substrate is separated from the bonding member, a partial load is applied to the substrate, and thus the substrate can be damaged. Also, although the ejector pin applies a force to the substrate to push the substrate from the bonding member, the upper substrate and the lower substrate may be misaligned.

此外,在根據現有技術的裝置中存在以下額外限制。在根據現有技術的裝置中,用於驅動多個起模頂桿的機械元件必須安置在腔室內部或外部,並且所述腔室必須是穿透的以允許上述元件將安置在其內部或外部。並且,用於強化穿透腔室的結構的元件和用於密封可穿透地處理的區域的元件必須安置在腔室的內部或外部。也就是說,根據現有技術的裝置以複雜結構實現從而以機械方式驅動多個起模頂桿,並且因此它可能難以維持腔室內部的密封狀態,並且裝置的維修可能是困難的。 [現有技術文獻] [專利文獻] (專利文獻1)KR10-1340614 B1Furthermore, the following additional limitations exist in devices according to the prior art. In a device according to the prior art, the mechanical element for driving the plurality of ejection rams must be placed inside or outside the chamber, and the chamber must be penetrating to allow the above-mentioned elements to be placed inside or outside . Also, the elements for reinforcing the structure penetrating the chamber and the elements for sealing the penetrable treatment area must be placed inside or outside the chamber. That is to say, the device according to the prior art is realized in a complicated structure to mechanically drive a plurality of ejection rams, and thus it may be difficult to maintain a sealed state inside the chamber, and maintenance of the device may be difficult. [Prior Art Document] [Patent Document] (Patent Document 1) KR10-1340614 B1

本發明提供一種支撐夾具、基板處理設備和基板處理方法,其能夠穩定地從支撐基板的單元中分離基板。The present invention provides a support jig, a substrate processing apparatus, and a substrate processing method capable of stably separating a substrate from a unit supporting a substrate.

本發明還提供一種支撐夾具、基板處理設備和基板處理方法,其能夠在基板從支撐基板的單元分離的同時防止基板發生絞擰。The present invention also provides a support jig, a substrate processing apparatus, and a substrate processing method capable of preventing the substrate from being twisted while the substrate is separated from the unit of the support substrate.

本發明還提供一種支撐夾具、基板處理設備和基板處理方法,其能夠在基板從支撐基板的單元分離的同時防止基板被損壞。The present invention also provides a support jig, a substrate processing apparatus, and a substrate processing method capable of preventing the substrate from being damaged while the substrate is separated from the unit of the support substrate.

本發明還提供一種支撐夾具和基板處理設備,其能夠簡化其結構。The present invention also provides a support jig and a substrate processing apparatus which can simplify the structure thereof.

根據示例性實施例,支撐基板的支撐夾具包含:主體,其具有內部空間;可擴展部件,其經配置以在主體的厚度方向上劃分內部空間,所述可擴展部件安置在主體中使得通過將氣體注入到間隔開的分隔空間中使所述可擴展部件在主體的厚度方向上移動;移動部件,其在主體的厚度方向上穿過主體的一個表面並且安置在撓性部件上;以及黏合部件,其安置在主體向外的移動部件的端部上。According to an exemplary embodiment, a support jig of a support substrate includes: a main body having an inner space; and an expandable member configured to divide an inner space in a thickness direction of the main body, the expandable member being disposed in the main body such that Injecting gas into the spaced apart partition space moves the expandable member in a thickness direction of the body; moving the member through a surface of the body in a thickness direction of the body and disposed on the flexible member; and bonding the member It is placed on the end of the moving part of the body outward.

支撐夾具可進一步包含安置在主體中的噴淋頭使得氣體注入到在主體的厚度方向上的分隔空間中的至少一個中。並且,支撐夾具可進一步包含緩衝部件,所述緩衝部件安置在分隔空間中的至少一個中並且具有連接到可擴展部件的一個端部。通孔和真空孔可以界定在主體的一個表面中,並且黏合部件安置在通孔內。The support jig may further include a shower head disposed in the main body such that gas is injected into at least one of the partition spaces in the thickness direction of the main body. Also, the support jig may further include a cushioning member disposed in at least one of the partition spaces and having one end connected to the expandable member. The through hole and the vacuum hole may be defined in one surface of the body, and the bonding member is disposed in the through hole.

暴露於主體的外部的黏合部件的黏合表面可以通過選擇性地注入到分隔空間中的氣體安置在通孔中或平行於主體的一個表面。The bonding surface of the bonding member exposed to the outside of the body may be disposed in the through hole or parallel to one surface of the body by a gas selectively injected into the partition space.

所述支撐夾具可進一步包含安置在通孔中的密封部件使得黏合部件和移動部件的上端中的至少一個與通孔之間的空間是密封的。The support jig may further include a sealing member disposed in the through hole such that a space between at least one of the upper ends of the adhesive member and the moving member and the through hole is sealed.

可擴展部件可以包含:彈性膜,其安置在主體中以劃分內部空間;以及加強件板,其安置在彈性膜的至少一個表面上使得加強板根據彈性膜的形狀改變在主體的厚度方向上移動。The expandable member may include: an elastic film disposed in the main body to divide the inner space; and a reinforcing member plate disposed on at least one surface of the elastic film such that the reinforcing plate moves in a thickness direction of the main body according to a shape change of the elastic film .

緩衝部件可以包含:引導部件,其朝向可擴展部件地安置在主體中;以及彈性部件,其安置在引導部件的外部並且具有連接到可擴展部件的一端和連接到主體的另一端。The cushioning member may include: a guiding member disposed in the body toward the expandable member; and an elastic member disposed outside the guiding member and having one end connected to the expandable member and the other end connected to the main body.

根據另一示例性實施例,基板處理設備包含:腔室,其具有基板處理空間;上部支撐件,其安置在所述腔室中;下部支撐件,其安置成面向所述上部支撐件;以及支撐夾具,其安置在上部支撐件和下部支撐件中的至少一個上,所述支撐夾具具有其中彼此分離的分隔空間,其中所述支撐夾具包含黏合部件,所述黏合部件可通過選擇性地注入到分隔空間中的氣體在支撐夾具中向外或向內移動。According to another exemplary embodiment, a substrate processing apparatus includes: a chamber having a substrate processing space; an upper support disposed in the chamber; a lower support disposed to face the upper support; a support jig disposed on at least one of an upper support member and a lower support member, the support jig having a partition space separated from each other, wherein the support jig includes an adhesive member, the adhesive member being selectively implantable The gas into the separation space moves outward or inward in the support fixture.

支撐夾具可以提供為多個,並且多個支撐夾具可以安置在界定在上部支撐件的底部表面和下部支撐件的頂部表面中的至少一個上的多個區域中。The support jig may be provided in plurality, and the plurality of support jigs may be disposed in a plurality of regions defined on at least one of a bottom surface of the upper support and a top surface of the lower support.

所述支撐夾具可以包含:主體,其具有內部空間;可擴展部件,其經配置以在主體的厚度方向上劃分所述內部空間,可擴展部件安置在所述主體中使得所述可擴展部件通過注入到間隔開的分隔空間中的氣體在主體的厚度方向上移動;以及移動部件,其安置在所述可擴展部件上並且具有插入到所述主體中的至少一個部分。The support jig may include: a body having an inner space; an expandable member configured to divide the inner space in a thickness direction of the body, the expandable member being disposed in the body such that the expandable member passes The gas injected into the spaced apart partition spaces moves in the thickness direction of the body; and a moving member disposed on the expandable member and having at least one portion inserted into the body.

所述支撐夾具可以包含:緩衝部件,其安置在所述主體中朝向所述可擴展部件以接觸和支撐所述可擴展部件;以及管,其經配置以將氣體注入到所述分隔空間中的每一個中。The support fixture may include a cushioning member disposed in the body toward the expandable member to contact and support the expandable member, and a tube configured to inject a gas into the separation space Every one.

通孔和真空孔可以界定主體的一個表面中,並且黏合部件可以耦合到主體向外的移動部件的端部中,使得黏合部件移動穿過通孔。The through hole and the vacuum hole may define one surface of the body, and the bonding member may be coupled into the end of the moving member outward of the body such that the bonding member moves through the through hole.

所述可擴展部件可以包含:彈性膜,其安置在所述主體上使得內部空間在主體的厚度方向上得到劃分;以及加強板,其安置在彈性膜的至少一個表面上。The expandable member may include: an elastic film disposed on the main body such that an inner space is divided in a thickness direction of the main body; and a reinforcing plate disposed on at least one surface of the elastic film.

所述緩衝部件可以包含:引導部件,其安置在朝向所述可擴展部件的所述分隔空間中的至少一個中並且具有與所述可擴展部件間隔開的朝向所述可擴展部件的一端;以及彈性部件,其安置在所述引導部件的外部,所述彈性部件具有連接且支撐在所述主體上的一端以及連接且支撐在所述可擴展部件上的另一端。The cushioning member may include: a guiding member disposed in at least one of the partition spaces facing the expandable member and having one end facing the expandable member spaced apart from the expandable member; An elastic member disposed outside the guiding member, the elastic member having one end connected and supported on the body and the other end connected and supported on the expandable member.

所述基板處理設備可進一步包含安置在所述通孔的一端上的密封部件因此包含通孔與黏合部件的外圓周表面之間的空間。The substrate processing apparatus may further include a sealing member disposed on one end of the through hole thus including a space between the through hole and an outer circumferential surface of the bonding member.

所述密封部件可以包含:密封膜,其從黏合部件的外圓周表面朝向通孔的一端的內壁延伸;以及環部件,其安置在所述通孔的一端的內壁上使得密封膜密閉地安置在通孔的一端上。The sealing member may include: a sealing film extending from an outer circumferential surface of the bonding member toward an inner wall of one end of the through hole; and a ring member disposed on an inner wall of one end of the through hole such that the sealing film is hermetically sealed Placed on one end of the through hole.

根據又一示例性實施例,一種基板處理方法,其包含:製備上部基板和下部基板;允許下部基板由下部支撐件支撐且上部基板由上部支撐件支撐;通過使用上部支撐件的支撐夾具將上部基板固定到支撐夾具;減小上部支撐件與下部支撐件之間的距離以將上部基板結合到下部基板;從支撐夾具釋放上部基板;以及從上部支撐件和下部支撐件分離結合基板。According to still another exemplary embodiment, a substrate processing method includes: preparing an upper substrate and a lower substrate; allowing the lower substrate to be supported by the lower support and the upper substrate being supported by the upper support; and the upper portion by using the support fixture of the upper support The substrate is fixed to the support jig; the distance between the upper support and the lower support is reduced to bond the upper substrate to the lower substrate; the upper substrate is released from the support jig; and the bonded substrate is separated from the upper support and the lower support.

下部基板可以是真空吸附的以由下部支撐件支撐,並且上部基板可以是真空吸附的以黏合到上部支撐件上。The lower substrate may be vacuum adsorbed to be supported by the lower support, and the upper substrate may be vacuum adsorbed to adhere to the upper support.

將上部基板固定到支撐夾具可以包含:將氣體注入到支撐夾具中的上部分隔空間中;並且允許支撐夾具的黏合部件下降;並且允許黏合部件黏合到上部基板上。Fixing the upper substrate to the support jig may include: injecting gas into the upper partition space in the support jig; and allowing the adhesive member of the support jig to descend; and allowing the adhesive member to be adhered to the upper substrate.

將上部基板從支撐夾具釋放可以包含:將氣體注入到支撐夾具中的下部分隔空間中,允許支撐夾具的黏合部件上升;並且從上部基板分離黏合部件。Release of the upper substrate from the support jig may include: injecting gas into the lower partition space in the support jig, allowing the adhesive member of the support jig to rise; and separating the adhesive member from the upper substrate.

在氣體注入到支撐夾具中的下部分隔空間中的同時,可以排放預先注入到支撐夾具中的上部分隔空間中的氣體。並且,在上部基板從支撐夾具中釋放的同時,上部基板可以被吸附以由支撐夾具支撐。While the gas is injected into the lower partition space in the support jig, the gas previously injected into the upper partition space in the support jig can be discharged. Also, while the upper substrate is released from the support jig, the upper substrate can be adsorbed to be supported by the support jig.

為讓本發明的上述特徵和優點能更明顯易懂,下文特舉實施例,並配合所附圖式作詳細說明如下。The above described features and advantages of the invention will be apparent from the following description.

在下文中,將參考附圖詳細地描述具體實施例。然而,本發明可以用不同形式實施,並且不應被解釋為限於本文所闡述的實施例。而是,提供這些實施例是為了使得本發明將是透徹並且完整的,且這些實施例將把本發明的範圍完整地傳達給所屬領域的技術人員。在圖式中,為了說明的清楚起見放大了層和區域的尺寸。相同參考標號在全文中指代相同元件。Hereinafter, specific embodiments will be described in detail with reference to the accompanying drawings. However, the invention may be embodied in different forms and should not be construed as being limited to the embodiments set forth herein. Rather, the embodiments are provided so that this disclosure will be thorough and complete, and the scope of the invention will be fully conveyed by those skilled in the art. In the drawings, the dimensions of layers and regions are exaggerated for clarity of illustration. The same reference numbers refer to the same elements throughout.

圖1是根據一個實施例的基板處理設備的側視圖,並且圖2是根據一個實施例的支撐夾具的側視圖。並且,圖3(a)及圖3(b)是根據一個經修改實例的支撐夾具的局部視圖,並且圖4到8是說明其中基板處理設備根據一個實施例操作的狀態的視圖。並且,圖9是示出根據一個實施例的基板處理方法的流程圖。1 is a side view of a substrate processing apparatus according to an embodiment, and FIG. 2 is a side view of a support jig according to an embodiment. 3(a) and 3(b) are partial views of a supporting jig according to a modified example, and FIGS. 4 to 8 are views illustrating a state in which the substrate processing apparatus operates according to one embodiment. Also, FIG. 9 is a flow chart showing a substrate processing method according to an embodiment.

根據一個實施例的基板處理設備是用於將上部基板結合到下部基板的裝置。如圖1到8中所說明,基板處理設備包含:腔室100,其具有基板處理空間;上部支撐件200,其安置在腔室100中以支撐上部基板S1;下部支撐件300,其安置成面向上部支撐件200以支撐下部基板S2;以及支撐夾具600,其安置在上部支撐件200和下部支撐件300的至少一個上並且具有分隔空間610:其中彼此分離的分隔空間610a和分隔空間610b。A substrate processing apparatus according to an embodiment is a device for bonding an upper substrate to a lower substrate. As illustrated in FIGS. 1 to 8, the substrate processing apparatus includes a chamber 100 having a substrate processing space, an upper support 200 disposed in the chamber 100 to support the upper substrate S1, and a lower support 300 disposed therein The upper support 200 is faced to support the lower substrate S2; and the support jig 600 is disposed on at least one of the upper support 200 and the lower support 300 and has a partition space 610: a partition space 610a and a partition space 610b separated from each other.

此處,可以在支撐夾具600中安置在支撐夾具600的內部或外部通過選擇性地注入到彼此隔離的分隔空間610a和610b中的氣體可移動的黏合部件650。支撐夾具600可以通過使用黏合部件650穩定地執行基板的黏合固定和分離。也就是說,黏合部件650可以在稍後將描述的通孔622內移動,所述通孔622界定在支撐夾具600的支撐表面中,同時執行基板的固定或分離。黏合部件650可以安置在通孔622中或暴露於支撐夾具600的支撐表面。具體來說,當氣體注入到分隔空間中的一者中時,例如,注入到上部分隔空間610a中,黏合部件650可以在支撐夾具600外部移動以黏合到由支撐夾具600支撐的基板,例如,黏合到上部基板S1。或者,當氣體注入到另一分隔空間中時,例如,注入到下部分隔空間610b中,黏合部件650可以在支撐夾具600內部移動並且與基板分離,例如,與上部基板S1分離。Here, the gas movable adhesive member 650 which is selectively injected into the partition spaces 610a and 610b which are isolated from each other in the inside or the outside of the support jig 600 may be disposed in the support jig 600. The support jig 600 can stably perform the adhesive fixing and separation of the substrate by using the bonding member 650. That is, the adhesive member 650 can be moved within the through hole 622 which will be described later, which is defined in the support surface of the support jig 600 while performing fixation or separation of the substrate. The adhesive member 650 may be disposed in the through hole 622 or exposed to a support surface of the support jig 600. Specifically, when a gas is injected into one of the partition spaces, for example, into the upper partition space 610a, the adhesive member 650 may be moved outside the support jig 600 to be bonded to the substrate supported by the support jig 600, for example, Bonded to the upper substrate S1. Alternatively, when gas is injected into another partition space, for example, into the lower partition space 610b, the adhesive member 650 may move inside the support jig 600 and be separated from the substrate, for example, separated from the upper substrate S1.

雖然根據當前實施例的支撐夾具600安置在上部支撐件200上以黏合支撐上部基板S1,但是支撐夾具600不特定地限於該位置。舉例來說,支撐夾具600可以安置在下部支撐件300上或在上部支撐件200和下部支撐件300中的每一者中。Although the support jig 600 according to the current embodiment is disposed on the upper support 200 to adhesively support the upper substrate S1, the support jig 600 is not particularly limited to this position. For example, the support fixture 600 can be disposed on the lower support 300 or in each of the upper support 200 and the lower support 300.

舉例來說,上部基板S1可以是OLED裝置安置在其上的裝置基板,並且下部基板S2可以是用於加蓋和保護裝置基板的加蓋基板。上部基板和下部基板中的每一個的基底可以由例如玻璃面板等透射材料形成。當然,所述實施例並不限於此,上部基板和下部基板中的每一個可以是構成多種裝置和設備的基板。舉例來說,上部基板和下部基板中的每一個可以是構成液晶顯示裝置的液晶裝置基板。For example, the upper substrate S1 may be a device substrate on which the OLED device is disposed, and the lower substrate S2 may be a capped substrate for capping and protecting the device substrate. The substrate of each of the upper substrate and the lower substrate may be formed of a transmissive material such as a glass panel. Of course, the embodiment is not limited thereto, and each of the upper substrate and the lower substrate may be a substrate constituting a plurality of devices and devices. For example, each of the upper substrate and the lower substrate may be a liquid crystal device substrate constituting a liquid crystal display device.

舉例來說,腔室100包含上部腔室100a和下部腔室100b,所述上部腔室100a具有空間,在所述空間中執行用於將上部基板S1結合到下部基板S2的過程或用於從下部基板S2分離上部基板S1的過程。上部腔室100a可以可拆卸地耦合到下部腔室100b。相應地提升上部腔室100a和下部腔室100b的單獨的抬升部件(未示出)安置在腔室100中。上部腔室100a或下部腔室100b通過使用抬升部件提升以在腔室100中載入上部基板S1和下部基板S2或從腔室100中卸載上部基板S1和下部基板S2。並且,用於調節內壓的單獨的壓力調節單元(未示出)和用於排出雜質的單獨的排出單元(未示出)安置在腔室100中。For example, the chamber 100 includes an upper chamber 100a and a lower chamber 100b having a space in which a process for bonding the upper substrate S1 to the lower substrate S2 is performed or used for The process in which the lower substrate S2 separates the upper substrate S1. The upper chamber 100a can be detachably coupled to the lower chamber 100b. A separate lifting member (not shown) that raises the upper chamber 100a and the lower chamber 100b, respectively, is disposed in the chamber 100. The upper chamber 100a or the lower chamber 100b is lifted by using the lifting member to load the upper substrate S1 and the lower substrate S2 in the chamber 100 or unload the upper substrate S1 and the lower substrate S2 from the chamber 100. Also, a separate pressure regulating unit (not shown) for adjusting the internal pressure and a separate discharge unit (not shown) for discharging the impurities are disposed in the chamber 100.

上部支撐件200安置在腔室100中的上側處以支撐上部基板S1。上部支撐件200的形狀可以製造成對應於上部基板S1的形狀。舉例來說,當上部基板S1是具有矩形板形狀的玻璃面板時,上部支撐件200可以製造成具有矩形板形狀的底部表面。The upper support 200 is disposed at an upper side in the chamber 100 to support the upper substrate S1. The shape of the upper support 200 may be made to correspond to the shape of the upper substrate S1. For example, when the upper substrate S1 is a glass panel having a rectangular plate shape, the upper support 200 may be fabricated as a bottom surface having a rectangular plate shape.

上部支撐件200的底部表面可以劃分成多個區域。根據實施例的支撐夾具600可以提供為多個並且相應地安置在上部支撐件200的底部表面上的多個區域上。當然,所述實施例並不限於此,並且舉例來說,支撐夾具600可以安置在下部支撐件300上。具體來說,支撐夾具600可以相應地安置在界定在稍後將描述的下部支撐件300的頂部表面上的多個區域上。The bottom surface of the upper support 200 may be divided into a plurality of regions. The support jig 600 according to the embodiment may be provided in plurality and correspondingly disposed on a plurality of regions on the bottom surface of the upper support 200. Of course, the embodiment is not limited thereto, and for example, the support jig 600 may be disposed on the lower support 300. Specifically, the support jig 600 may be correspondingly disposed on a plurality of regions defined on the top surface of the lower support 300 which will be described later.

上部驅動零件連接到上部支撐件200以提升上部支撐件200。上部驅動零件包含:上部驅動軸桿410,其連接到上部支撐件200;以及上部電力零件(未示出),其施加電力給上部驅動軸桿410。上部驅動軸桿410穿過上部腔室100a並且因此安裝在上部支撐件200的頂部表面上。單獨的密封部件(未示出)安置在上部驅動軸桿410與上部腔室100a之間。並且,上部驅動零件可進一步包含:單獨的對齊單元(未示出),其在X、Y或θ方向上移動上部支撐件200以對齊上部支撐件200的位置;以及單獨的感測器(未示出),以用於定位上部支撐件200的位置,所述感測器例如是相機。The upper drive component is coupled to the upper support 200 to lift the upper support 200. The upper drive component includes an upper drive shaft 410 coupled to the upper support 200 and an upper power component (not shown) that applies power to the upper drive shaft 410. The upper drive shaft 410 passes through the upper chamber 100a and is thus mounted on the top surface of the upper support 200. A separate sealing member (not shown) is disposed between the upper drive shaft 410 and the upper chamber 100a. Also, the upper drive component may further comprise: a separate alignment unit (not shown) that moves the upper support 200 in the X, Y or θ direction to align the position of the upper support 200; and a separate sensor (not Shown) for positioning the upper support 200, such as a camera.

下部支撐件300可以安置在腔室100的下側中以支撐下部基板S2。下部支撐件300的形狀可以對應於下部基板S1的形狀製造。舉例來說,下部支撐件300可以製造成具有矩形板形狀的底部表面。The lower support 300 may be disposed in a lower side of the chamber 100 to support the lower substrate S2. The shape of the lower support 300 may be manufactured corresponding to the shape of the lower substrate S1. For example, the lower support 300 can be fabricated as a bottom surface having a rectangular plate shape.

下部驅動零件連接到下部支撐件300以提升下部支撐件300。下部驅動零件包含:下部驅動軸桿420,其連接到下部支撐件300;以及下部電力零件(未示出),以用於施加電力給下部驅動軸桿420。下部驅動軸桿420穿過下部腔室100b並且因此安裝在下部支撐件300的底部表面上。單獨的密封部件(未示出)安置在下部驅動軸桿420與下部腔室100b之間。並且,下部驅動零件可進一步包含單獨的對齊單元(未示出)和對應於上部驅動零件的感測器的單獨的感測器(未示出)。The lower drive part is coupled to the lower support 300 to lift the lower support 300. The lower drive component includes a lower drive shaft 420 coupled to the lower support 300 and a lower power component (not shown) for applying power to the lower drive shaft 420. The lower drive shaft 420 passes through the lower chamber 100b and is thus mounted on the bottom surface of the lower support 300. A separate sealing member (not shown) is disposed between the lower drive shaft 420 and the lower chamber 100b. Also, the lower drive component can further include a separate alignment unit (not shown) and a separate sensor (not shown) corresponding to the sensor of the upper drive component.

當根據實施例的支撐件600未安置在下部支撐件300上時,吸附零件(未示出)可以安置在下部支撐件300上以固定下部基板S2。並且,吸附零件可以安置在下部支撐件300的頂部表面上。吸附零件可以具有多種組成和結構,其能夠固定下部基板S2,並且舉例來說,吸附零件可以包含真空夾具、靜電夾具和黏合夾具。When the support 600 according to the embodiment is not disposed on the lower support 300, an adsorption member (not shown) may be disposed on the lower support 300 to fix the lower substrate S2. Also, the absorbing member may be disposed on the top surface of the lower support member 300. The absorbing member may have various compositions and structures capable of fixing the lower substrate S2, and for example, the absorbing member may include a vacuum jig, an electrostatic jig, and an adhesive jig.

抬升部件500相應地安置在上部支撐件200中以輔助於將上部基板S1附接到上部支撐件200的底部表面或將上部基板S1從上部支撐件200的底部表面分離並且安置在下部支撐件300中以輔助於將下部基板S2附接到下部支撐件300的頂部表面或將下部基板S2從下部支撐件300的頂部表面分離。為此,抬升部件500,例如,起模頂桿,可以相應地穿過上部支撐件200朝向上部基板S1並且因此安置在上部腔室100a中並且穿過下部支撐件300朝向下部基板S2並且因此安置在下部腔室100b中。The lifting member 500 is correspondingly disposed in the upper support 200 to assist in attaching the upper substrate S1 to the bottom surface of the upper support 200 or separating the upper substrate S1 from the bottom surface of the upper support 200 and disposed on the lower support 300 The assistance is to attach the lower substrate S2 to the top surface of the lower support 300 or to separate the lower substrate S2 from the top surface of the lower support 300. To this end, the lifting member 500, for example, the ejector pin, can be correspondingly passed through the upper support 200 towards the upper substrate S1 and thus in the upper chamber 100a and through the lower support 300 towards the lower substrate S2 and thus placed In the lower chamber 100b.

此處,當抬升部件500安置在上部支撐件200中時,抬升部件500可以穿過上部支撐件200和安置在上部支撐件200上的支撐夾具並且因此安置在上部腔室100a中。並且,安置在上部支撐件200上的抬升部件500可以選擇為處於使得抬升部件500並不干擾支撐夾具600的組成的位置中。Here, when the lifting member 500 is disposed in the upper support 200, the lifting member 500 may pass through the upper support 200 and the support jig disposed on the upper support 200 and thus be disposed in the upper chamber 100a. Also, the lifting member 500 disposed on the upper support member 200 may be selected to be in a position such that the lifting member 500 does not interfere with the composition of the support jig 600.

並且,單獨的密封部件(未示出)可以安置在抬升部件500與支撐夾具600之間,所述抬升部件500安置在上部支撐件200上。Also, a separate sealing member (not shown) may be disposed between the lifting member 500 and the support jig 600, and the lifting member 500 is disposed on the upper support member 200.

抬升部件500的數目可以對應於上部基板S1和下部基板S2中的每一個的尺寸。抬升部件500可以為多個,並且所述多個抬升部件500可以安置為彼此間隔開。並且,抬升部件500連接到單獨的抬升部件驅動零件(未示出),所述抬升部件驅動零件提升所述抬升部件500以豎直地移動。The number of the lifting members 500 may correspond to the size of each of the upper substrate S1 and the lower substrate S2. There may be a plurality of lifting members 500, and the plurality of lifting members 500 may be disposed to be spaced apart from each other. Also, the lifting member 500 is coupled to a separate lifting member driving part (not shown) that lifts the lifting member 500 to move vertically.

單獨的真空夾具(未示出)可以安置在抬升部件上,所述抬升部件安置在抬升部件500的上部支撐件200(下文中被稱作“上部抬升部件”)上。具體來說,單獨的真空夾具可以安置在面向上部基板S1的上部抬升部件500的端部上使得當上部抬升部件升高時由上部抬升部件接觸支撐的上部基板S1通過真空吸附並且固定到上部抬升部件。A separate vacuum clamp (not shown) may be disposed on the lifting member, which is disposed on the upper support 200 of the lifting member 500 (hereinafter referred to as "upper lifting member"). Specifically, a separate vacuum jig may be disposed on an end portion of the upper lifting member 500 facing the upper substrate S1 such that the upper substrate S1 supported by the upper lifting member contact when the upper lifting member is raised is vacuum-adsorbed and fixed to the upper portion. component.

此處,位於抬升部件500的端部上的單獨的真空夾具可以是波紋管式真空墊,使得當真空夾具接觸基板時真空夾具延伸或收縮以消除由於接觸真空夾具的衝擊並且防止基板被損壞。單獨的支撐墊(未示出)可以安置在抬升部件上,所述抬升部件安置在抬升部件500的下部支撐件300(下文中被稱作“下部抬升部件”)上。具體來說,具有預定面積的單獨的支撐墊可以安置在面向下部基板S2的下部抬升部件的端部上。多個下部抬升部件可以連接到支撐墊。下部抬升部件可以通過支撐墊穩定地接觸支撐下部基板S。Here, the separate vacuum jig located on the end of the lifting member 500 may be a bellows type vacuum pad such that the vacuum jig extends or contracts when the vacuum jig contacts the substrate to eliminate the impact due to contact with the vacuum jig and prevent the substrate from being damaged. A separate support pad (not shown) may be disposed on the lifting member, which is disposed on the lower support 300 of the lifting member 500 (hereinafter referred to as a "lower lifting member"). Specifically, a separate support pad having a predetermined area may be disposed on an end of the lower lift member facing the lower substrate S2. A plurality of lower lifting members can be coupled to the support pads. The lower lifting member can stably contact the supporting lower substrate S through the support pad.

在下文中,將描述根據當前實施例的支撐夾具600。此處,為了描述實施例,除上部基板S1和下部基板S2必須區分的情況以外,當不必要專門區分上部基板S1與下部基板S2時上部基板S1和下部基板S2一起都被稱作“基板”。Hereinafter, the support jig 600 according to the current embodiment will be described. Here, in order to describe the embodiment, the upper substrate S1 and the lower substrate S2 are collectively referred to as "substrate" when it is not necessary to specifically distinguish the upper substrate S1 from the lower substrate S2 except for the case where the upper substrate S1 and the lower substrate S2 must be distinguished. .

根據一個實施例的支撐夾具600是安置在基板處理設備中的元件以支撐和固定基板。支撐夾具600包含:主體620,其具有內部空間和用於支撐基板的一個表面621,例如,支撐表面;可擴展部件630,其將主體620的內部空間劃分成在主體620的厚度方向上堆疊在彼此上的分隔空間610:分隔空間610a和分隔空間610b,所述可擴展部件630安置在主體620中以通過選擇性地注入到間隔開的分隔空間610中的氣體在主體620的厚度方向上移動;移動部件640,其穿過主體620的一個表面621,例如,支撐表面,基板由所述表面支撐並且因此安置在可擴展部件630上;以及黏合部件650,其安置在朝向主體620的外部的每一個移動部件640中的端部上。The support jig 600 according to one embodiment is an element disposed in the substrate processing apparatus to support and fix the substrate. The support jig 600 includes a main body 620 having an inner space and one surface 621 for supporting the substrate, for example, a support surface, and an expandable member 630 that divides the inner space of the main body 620 to be stacked in the thickness direction of the main body 620 Separation spaces 610 on each other: a partition space 610a and a partition space 610b, the expandable member 630 being disposed in the body 620 to move in the thickness direction of the body 620 by gas selectively injected into the spaced partition spaces 610 a moving member 640 that passes through a surface 621 of the body 620, such as a support surface, the substrate is supported by the surface and thus disposed on the expandable member 630; and an adhesive member 650 disposed toward the exterior of the body 620 Each of the moving parts 640 is on the end.

主體620的形狀可以對應於上部支撐件200的形狀製造,例如,以六面體形狀。主體620具有頂部表面,所述頂部表面是面向安置在上部支撐件200的底部表面上的主體620的底部表面的一個表面621的另一表面。基板由主體620的一個表面621支撐。也就是說,主體620的一個表面621可以充當支撐基板的支撐表面。氣體穿過其中傳送的管680可以安置在主體620的頂部表面和側表面中的每一個的一側上以將氣體注入到主體620中或將注入到主體620中的氣體排出到外部。The shape of the body 620 may be made corresponding to the shape of the upper support 200, for example, in a hexahedral shape. The body 620 has a top surface that is the other surface facing one surface 621 of the bottom surface of the body 620 disposed on the bottom surface of the upper support 200. The substrate is supported by one surface 621 of the body 620. That is, one surface 621 of the body 620 can serve as a support surface for the support substrate. A tube 680 through which gas is transported may be disposed on one side of each of the top surface and the side surface of the body 620 to inject a gas into the body 620 or discharge the gas injected into the body 620 to the outside.

通孔622穿過作為支撐基板的主體620的支撐表面的一個表面621。通孔622的數目對應於稍後將描述的移動部件640的數目。通孔622可以提供為多個,並且多個通孔622安置為彼此間隔開。移動部件640具有安置在通孔622中的一端。並且,位於移動部件640的一端上的黏合部件650安置在通孔622中。黏合部件650可以通過通孔622暴露於主體620的外部。The through hole 622 passes through one surface 621 which is a support surface of the body 620 which is a support substrate. The number of through holes 622 corresponds to the number of moving parts 640 which will be described later. The through holes 622 may be provided in plurality, and the plurality of through holes 622 are disposed to be spaced apart from each other. The moving member 640 has one end disposed in the through hole 622. Also, an adhesive member 650 located on one end of the moving member 640 is disposed in the through hole 622. The bonding member 650 may be exposed to the outside of the body 620 through the through hole 622.

並且,多個真空孔623可以界定在主體620的一個表面621中位於與通孔622間隔開的位置處。具體來說,多個真空孔623在主體620的一個表面621中彼此間隔開。舉例來說,單獨的真空調節單元(未示出),例如,真空泵,連接到每一個真空孔623。真空孔623可以在真空中通過真空調節單元調節成真空吸附基板,由此輔助基板固定到支撐夾具600的支撐表面上。如圖2中所說明,通孔622可以界定為與真空孔623間隔開預定距離。Also, a plurality of vacuum holes 623 may be defined at a position spaced apart from the through holes 622 in one surface 621 of the body 620. Specifically, the plurality of vacuum holes 623 are spaced apart from each other in one surface 621 of the body 620. For example, a separate vacuum conditioning unit (not shown), such as a vacuum pump, is coupled to each vacuum aperture 623. The vacuum hole 623 can be adjusted to a vacuum adsorption substrate by a vacuum adjustment unit in a vacuum, whereby the auxiliary substrate is fixed to the support surface of the support jig 600. As illustrated in FIG. 2, the through hole 622 can be defined as being spaced apart from the vacuum hole 623 by a predetermined distance.

主體620可以整體地或單獨地製造。在當前實施例中,例示了單獨類型的主體620。也就是說,主體620包含上部主體620a和下部主體620b。上部主體620a可以可拆卸地耦合到下部主體620b。Body 620 can be manufactured integrally or separately. In the current embodiment, a separate type of body 620 is illustrated. That is, the body 620 includes an upper body 620a and a lower body 620b. The upper body 620a can be detachably coupled to the lower body 620b.

可擴展部件630是安置在主體620中的元件以驅動移動部件640和安置在移動部件640上的黏合部件650。可擴展部件630可以包含安置在主體620中的彈性膜631使得主體620的內部空間分成分隔空間610:分隔空間610a和分隔空間610b,所述分隔空間610在主體620的厚度方向上彼此堆疊。並且,可擴展部件630可以包含安置在彈性膜631的一個表面上的加強板632以根據彈性膜631的形狀改變在主體620的厚度方向上移動。The expandable member 630 is an element disposed in the body 620 to drive the moving member 640 and the bonding member 650 disposed on the moving member 640. The expandable member 630 may include an elastic film 631 disposed in the body 620 such that the internal space of the body 620 is divided into a partition space 610: a partition space 610a and a partition space 610b, which are stacked on each other in the thickness direction of the body 620. Also, the expandable member 630 may include a reinforcing plate 632 disposed on one surface of the elastic film 631 to move in the thickness direction of the body 620 according to the shape change of the elastic film 631.

彈性膜631可以是具有彈性的薄膜,例如,隔膜。彈性膜631可以由天然橡膠、合成橡膠、金屬板和工程塑料形成。舉例來說,彈性膜631可以具有安置在主體620中介於上部主體620a和下部主體620b的耦合表面之間的邊緣。此處,單獨的密封單元(未示出)可以安置在介於彈性膜631與上部主體620a之間並且介於彈性膜631與下部主體620b之間的每一個接觸表面上。The elastic film 631 may be a film having elasticity, for example, a separator. The elastic film 631 may be formed of natural rubber, synthetic rubber, metal sheets, and engineering plastics. For example, the elastic film 631 may have an edge disposed in the body 620 between the coupling surfaces of the upper body 620a and the lower body 620b. Here, a separate sealing unit (not shown) may be disposed between each of the contact surfaces between the elastic film 631 and the upper body 620a and between the elastic film 631 and the lower body 620b.

主體620的內部空間可以由彈性膜631劃分成上部分隔空間610a和下部分隔空間610b。具體來說,彈性膜631可以在水平方向上安置在主體620中以在與支撐表面平行的方向上劃分主體620的內部空間。彈性膜631可以通過噴射到其上的惰性氣體擴展。當噴射的惰性氣體排放到外部時,彈性膜631可以再次收縮以返回到其初始位置。也就是說,間隔開的分隔空間610:分隔空間610a和分隔空間610b是通過彈性膜631彼此隔離的並且因此並不彼此連通。因此,氣體可以不從上部分隔空間610a流動到下部分隔空間610b且反之亦然。也就是說當氣體注入到上部分隔空間610a中時,彈性膜631可以向下擴展,並且當氣體注入到下部分隔空間610b中時,彈性膜631可以向上擴展。The inner space of the body 620 may be divided into an upper partition space 610a and a lower partition space 610b by the elastic film 631. Specifically, the elastic film 631 may be disposed in the main body 620 in the horizontal direction to divide the inner space of the main body 620 in a direction parallel to the support surface. The elastic film 631 can be expanded by an inert gas sprayed thereon. When the injected inert gas is discharged to the outside, the elastic film 631 can be contracted again to return to its original position. That is, the spaced apart partition spaces 610: the partition spaces 610a and the partition spaces 610b are isolated from each other by the elastic film 631 and thus do not communicate with each other. Therefore, the gas may not flow from the upper partition space 610a to the lower partition space 610b and vice versa. That is, when the gas is injected into the upper partition space 610a, the elastic film 631 can be expanded downward, and when the gas is injected into the lower partition space 610b, the elastic film 631 can be expanded upward.

加強板632安置在彈性膜631的至少一個表面上使得移動部件640穩定地安置為由可擴展部件630支撐,並且彈性膜631在主體620的厚度方向上的擴展和收縮中受到控制。也就是說,加強板632可以安置在彈性膜631的底部表面或上部表面上。替代地,加強板632可以安置在彈性膜631的上表面和下表面中的每一個上。The reinforcing plate 632 is disposed on at least one surface of the elastic film 631 such that the moving member 640 is stably disposed to be supported by the expandable member 630, and the elastic film 631 is controlled in expansion and contraction in the thickness direction of the body 620. That is, the reinforcing plate 632 may be disposed on the bottom surface or the upper surface of the elastic film 631. Alternatively, the reinforcing plate 632 may be disposed on each of the upper surface and the lower surface of the elastic film 631.

由於加強板632安置在彈性膜631上,當彈性膜631擴展和收縮時,可擴展部件630的一部分,即,加強板632可以移動同時保持相對於主體620的支撐表面的平行狀態。因此,加強板632可以具有預定強度使得當彈性膜631擴展或收縮時加強板632不會在彈性膜631擴展或收縮的方向上發生彎曲和變形。加強板632的形狀可以製造成對應於主體620的形狀,例如,矩形板形狀。通過加強板632,彈性膜631可以被控制在目標方向上(例如,主體620的厚度方向上)改變其方向。並且,移動部件640可以在主體620中移動同時通過加強板632保持在主體620的厚度方向上的彼此相同的高度。Since the reinforcing plate 632 is disposed on the elastic film 631, when the elastic film 631 expands and contracts, a portion of the expandable member 630, that is, the reinforcing plate 632 can move while maintaining a parallel state with respect to the support surface of the body 620. Therefore, the reinforcing plate 632 may have a predetermined strength such that the reinforcing plate 632 does not bend and deform in a direction in which the elastic film 631 expands or contracts when the elastic film 631 expands or contracts. The shape of the reinforcing plate 632 may be made to correspond to the shape of the body 620, for example, a rectangular plate shape. By the reinforcing plate 632, the elastic film 631 can be controlled to change its direction in the target direction (for example, in the thickness direction of the body 620). Also, the moving members 640 can be moved in the main body 620 while being held by the reinforcing plate 632 at the same height in the thickness direction of the main body 620.

加強板632可以具有面積的下限使得所需數目的移動部件640由加強板632支撐。並且,加強板632可以具有面積的上限使得加強板632的邊緣與主體620間隔開預定距離。因此,彈性膜631可以具有能夠接受其由於氣體的注入和排出的擴展和收縮的預定區域。也就是說,加強板632可以隨著安置在加強板632的邊緣與主體620之間的彈性膜631的區域的擴展或收縮在主體620的厚度方向上移動,所述區域即,加強板632並未安置在其上的區域。The reinforcing plate 632 may have a lower limit of the area such that the required number of moving parts 640 are supported by the reinforcing plate 632. Also, the reinforcing plate 632 may have an upper limit of the area such that the edge of the reinforcing plate 632 is spaced apart from the body 620 by a predetermined distance. Therefore, the elastic film 631 can have a predetermined region capable of accepting its expansion and contraction due to injection and discharge of gas. That is, the reinforcing plate 632 can be moved in the thickness direction of the main body 620 with the expansion or contraction of the region of the elastic film 631 disposed between the edge of the reinforcing plate 632 and the main body 620, that is, the reinforcing plate 632 The area not placed on it.

移動部件640可以穿過下部主體620b的一個表面621,例如,在主體620的厚度方向上的支撐表面並且因此安置在可擴展部件630上。此處,移動部件640可以由加強板632穩定地支撐。移動部件640的至少一部分,具體來說是朝向主體620的外部的移動部件640的一端插入到界定在主體620的一個表面621中的通孔622中。The moving member 640 may pass through one surface 621 of the lower body 620b, for example, a support surface in the thickness direction of the body 620 and thus on the expandable member 630. Here, the moving member 640 may be stably supported by the reinforcing plate 632. At least a portion of the moving member 640, specifically, one end of the moving member 640 toward the outside of the body 620 is inserted into a through hole 622 defined in one surface 621 of the body 620.

移動部件640的數目根據基板的尺寸提供為多個。多個移動部件640安置為彼此間隔開。移動部件640可以劃分成上部移動部件640a和下部移動部件640b,所述上部移動部件640a安置在可擴展部件630的上部部分上,也就是說在上部分隔空間610a中,所述下部移動部件640b安置在可擴展部件630的下部部分中,也就是說在下部分隔空間610b中。下部移動部件640b可以具有一定長度使得面向移動部件640的主體620的一個表面621的一端安置在主體620的通孔622中。上部移動部件640a可以具有一定長度使得移動部件640的另一端與稍後將描述的噴淋頭660間隔開預定距離。此處,移動部件640的另一端與噴淋頭660之間的距離可以接納當可擴展部件630上升和擴展時可擴展部件630的改變。也就是說,移動部件640的另一端與噴淋頭660之間的距離表示黏合部件650的衝程距離,例如,黏合部件650的上限位置與黏合部件650的下限位置之間的距離。當移動部件640上升時上部移動部件640a可以充當擋止件。The number of moving parts 640 is provided in plurality according to the size of the substrate. The plurality of moving parts 640 are disposed to be spaced apart from each other. The moving member 640 may be divided into an upper moving member 640a and a lower moving member 640b, which are disposed on an upper portion of the expandable member 630, that is, in the upper partitioning space 610a, the lower moving member 640b is disposed In the lower portion of the expandable member 630, that is to say in the lower partition space 610b. The lower moving part 640b may have a length such that one end of one surface 621 of the body 620 facing the moving part 640 is disposed in the through hole 622 of the body 620. The upper moving part 640a may have a length such that the other end of the moving part 640 is spaced apart from the shower head 660 which will be described later by a predetermined distance. Here, the distance between the other end of the moving member 640 and the showerhead 660 can accommodate a change in the expandable member 630 as the expandable member 630 ascends and expands. That is, the distance between the other end of the moving member 640 and the shower head 660 indicates the stroke distance of the bonding member 650, for example, the distance between the upper limit position of the bonding member 650 and the lower limit position of the bonding member 650. The upper moving member 640a can serve as a stopper when the moving member 640 ascends.

由於移動部件640安置在可擴展部件630上以根據可擴展部件630的移動而移動,所以移動部件640可以如下耦合到可擴展部件630。突起641安置在下部移動部件640b的上端的外圓周表面上,並且墊圈642安置在上部移動部件640a的上端的外圓周表面上以對應於突起641。突起641和墊圈642中的每一個接觸可擴展部件630。螺栓643穿過突起641和墊圈642以允許將移動部件640固定到可擴展部件630。此處,墊圈642可以將移動部件640固定到可擴展部件630並且密封由移動部件640穿透的可擴展部件630。Since the moving part 640 is disposed on the expandable part 630 to move according to the movement of the expandable part 630, the moving part 640 can be coupled to the expandable part 630 as follows. The protrusion 641 is disposed on the outer circumferential surface of the upper end of the lower moving member 640b, and the washer 642 is disposed on the outer circumferential surface of the upper end of the upper moving member 640a to correspond to the protrusion 641. Each of the protrusion 641 and the washer 642 contacts the expandable member 630. The bolt 643 passes through the protrusion 641 and the washer 642 to allow the moving part 640 to be fixed to the expandable part 630. Here, the washer 642 can secure the moving member 640 to the expandable member 630 and seal the expandable member 630 that is penetrated by the moving member 640.

黏合部件650是用於通過使用黏合力固定基板的部件。黏合部件650可以由具有以下特徵的材料形成,其中一旦黏合部件黏合到基板上並且隨後從基板分離,黏合部件就安置在移動部件640的一端上,實際上不會留下黏合軌跡。舉例來說,黏合部件650可以是由基於矽、基於丙烯酸或基於氟的材料形成的黏合片材。The bonding member 650 is a member for fixing the substrate by using an adhesive force. The adhesive member 650 may be formed of a material having a feature in which once the adhesive member is bonded to the substrate and then separated from the substrate, the adhesive member is placed on one end of the moving member 640 without actually leaving a bonding track. For example, the adhesive component 650 can be an adhesive sheet formed from a ruthenium based, acrylic based or fluorine based material.

黏合部件650安置在移動部件640的一端上使得黏合部件650可以移動穿過通孔622。因此,黏合部件650通過主體620的通孔622暴露於主體620的外部。黏合部件650暴露於主體620的一個表面621,例如,支撐表面可以具有圓形形狀。黏合部件650可以通過螺栓(未示出)耦合到移動部件640的端部或通過黏合劑黏合到移動部件640的端部上。黏合部件650安置在移動部件640的一端上以通過移動部件640的提升在主體620的通孔622內移動。具體來說,黏合部件650具有平行於主體620的通孔622內的支撐表面安置的黏合表面651以黏合到基板上或安置為與通孔622內的支撐表面間隔開並且通過選擇性地注入到分隔空間610中的氣體從基板上拆卸。The adhesive member 650 is disposed on one end of the moving member 640 such that the adhesive member 650 can move through the through hole 622. Therefore, the bonding member 650 is exposed to the outside of the body 620 through the through hole 622 of the body 620. The adhesive member 650 is exposed to one surface 621 of the body 620, for example, the support surface may have a circular shape. The adhesive member 650 may be coupled to the end of the moving member 640 by a bolt (not shown) or to the end of the moving member 640 by an adhesive. The adhesive member 650 is disposed on one end of the moving member 640 to move within the through hole 622 of the body 620 by lifting of the moving member 640. Specifically, the adhesive member 650 has an adhesive surface 651 disposed parallel to the support surface in the through hole 622 of the body 620 to be bonded to the substrate or disposed to be spaced apart from the support surface in the through hole 622 and selectively implanted into the substrate The gas in the separation space 610 is detached from the substrate.

根據實施例的支撐夾具600可進一步包含安置在主體620中的噴淋頭660使得氣體在主體620的厚度方向上注入到分隔空間610:分隔空間610a和分隔空間610b中的至少一個。具體來說,噴淋頭660安置在上部主體620a中使得氣體在主體620的厚度方向上注入到上部分隔空間610a中。噴淋頭660連接到安置在上部主體620a的一側上的上部管681。The support jig 600 according to the embodiment may further include a shower head 660 disposed in the main body 620 such that gas is injected into the partition space 610 in the thickness direction of the main body 620: at least one of the partition space 610a and the partition space 610b. Specifically, the shower head 660 is disposed in the upper body 620a such that gas is injected into the upper partition space 610a in the thickness direction of the body 620. The showerhead 660 is coupled to an upper tube 681 disposed on one side of the upper body 620a.

噴淋頭660可以包含:底板,例如,穿孔板,其具有界定在主體620的厚度方向上的多個噴灑孔661;以及側壁,其圍繞位於底板的上部部分上的底板的邊緣。側壁中的每一個具有密閉地安置在上部主體620a中的上部部分上的上部部分。噴淋頭660的底板可以安置為與上部主體620a中的上部部分間隔開預定距離。底板具有對應于加強板632的尺寸的面積。The shower head 660 may include a bottom plate, for example, a perforated plate having a plurality of spray holes 661 defined in a thickness direction of the body 620, and a side wall surrounding an edge of the bottom plate on the upper portion of the bottom plate. Each of the side walls has an upper portion that is hermetically disposed on an upper portion of the upper body 620a. The bottom plate of the showerhead 660 can be disposed to be spaced apart from the upper portion of the upper body 620a by a predetermined distance. The bottom plate has an area corresponding to the size of the reinforcing plate 632.

通過噴淋頭660,氣體可以均勻地噴灑到上部分隔空間610a和加強板632。因此,均勻的力可以施加到可擴展部件630以允許可擴展部件630上升或下降同時保持水準狀態。當然,噴淋頭660可以安置在下部主體620b中使得氣體注入到下部分隔空間610b中。替代地,噴淋頭660可以安置在主體620上。By the shower head 660, the gas can be uniformly sprayed to the upper partition space 610a and the reinforcing plate 632. Thus, a uniform force can be applied to the expandable member 630 to allow the expandable member 630 to rise or fall while maintaining a level state. Of course, the shower head 660 may be disposed in the lower body 620b such that gas is injected into the lower partition space 610b. Alternatively, the showerhead 660 can be disposed on the body 620.

根據實施例的支撐夾具600可進一步包含緩衝部件670,所述緩衝部件670安置在主體620中的分隔空間610中的至少一個中並且其中的每一個具有連接到可擴展部件630的一端使得可擴展部件630在主體620的厚度方向上在主體620中移動同時保持均勻的高度。The support jig 600 according to an embodiment may further include a cushioning member 670 disposed in at least one of the partition spaces 610 in the main body 620 and each of which has one end connected to the expandable member 630 such that it is expandable The member 630 moves in the body 620 in the thickness direction of the body 620 while maintaining a uniform height.

也就是說,緩衝部件670中的每一個安置在主體620中朝向可擴展部件630。緩衝部件670具有接觸可擴展部件630的元件的一部分以彈性地支撐可擴展部件630。可擴展部件630可以忍受由於主要通過安置在其上的並且以在主體620的厚度方向上的所需速度平穩地升高的緩衝部件670偏斜噴灑的氣體的壓力。因此,可以防止可擴展部件630的出乎意料的驅動和可擴展部件630與移動部件之間的粘附滑動現象,即,振動現象。That is, each of the cushioning members 670 is disposed in the body 620 toward the expandable member 630. The cushioning member 670 has a portion that contacts the expandable member 630 to elastically support the expandable member 630. The expandable member 630 can withstand the pressure of the gas that is deflected by the cushioning member 670 that is mainly placed thereon and that is smoothly raised at a desired speed in the thickness direction of the body 620. Therefore, it is possible to prevent an unexpected driving of the expandable member 630 and an adhesion slip phenomenon between the expandable member 630 and the moving member, that is, a vibration phenomenon.

在當前實施例中,雖然緩衝部件670安置在可擴展部件630下方的下部主體620b上,即,在下部分隔空間610b中,但是所述實施例並不限於此。舉例來說,緩衝部件670可以安置在可擴展部件630上方的上部主體620a上,即,在上部分隔空間610a中。並且,緩衝部件670可以安置在可擴展部件630的上方和下方的上部主體620a和下部主體620b中的每一個上並且因此安置在上部分隔空間610a和下部分隔空間610b中的每一個上。在下文中,雖然緩衝部件670的技術特徵是基於安置在下部主體620b上的緩衝部件670描述的,但是所述實施例可以同等地應用於緩衝部件670安置在上部主體620a上的情況中。In the present embodiment, although the cushioning member 670 is disposed on the lower body 620b below the expandable member 630, that is, in the lower partition space 610b, the embodiment is not limited thereto. For example, the cushioning member 670 can be disposed on the upper body 620a above the expandable member 630, that is, in the upper partition space 610a. Also, a cushioning member 670 may be disposed on each of the upper body 620a and the lower body 620b above and below the expandable member 630 and thus disposed on each of the upper partition space 610a and the lower partition space 610b. Hereinafter, although the technical features of the cushioning member 670 are described based on the cushioning member 670 disposed on the lower body 620b, the embodiment can be equally applied to the case where the cushioning member 670 is disposed on the upper body 620a.

緩衝部件670可以包含:引導部件671,其安置在主體620中朝向可擴展部件630;以及彈性部件672,其安置在引導部件671的外部並且具有由主體620連接和支撐的一端以及由可擴展部件630連接和支撐的另一端。此處,引導部件671可以具有一定長度使得面向可擴展部件630的引導部件671的一端與可擴展部件630間隔開。具體來說,引導部件671具有一定長度使得當可擴展部件630朝向引導部件671移動時,引導部件671的一端接觸可擴展部件630,並且另一方面,引導部件671的一端與可擴展部件630間隔開。The cushioning member 670 may include: a guiding member 671 disposed in the body 620 toward the expandable member 630; and an elastic member 672 disposed outside the guiding member 671 and having one end connected and supported by the body 620 and the expandable member The other end of the 630 connection and support. Here, the guiding member 671 may have a length such that one end of the guiding member 671 facing the expandable member 630 is spaced apart from the expandable member 630. Specifically, the guiding member 671 has a length such that when the expandable member 630 moves toward the guiding member 671, one end of the guiding member 671 contacts the expandable member 630, and on the other hand, one end of the guiding member 671 is spaced from the expandable member 630. open.

彈性部件672,例如,彈性彈簧,其兩端相應地固定到或接觸可擴展部件630和主體620。彈性部件672可以通過使用彈力支撐可擴展部件630和主體620。緩衝部件670可以提供為多個並且因此安置在下部主體620b上的多個位置處。此處,多個緩衝部件670可以安置為在水平方向上以預定距離彼此間隔開。因此,當可擴展部件630在主體620的厚度方向上移動時,緩衝部件670可以彈性地支撐加強板632使得加強板632與下部主體620b的一個表面621平行,例如,支撐表面。The elastic member 672, for example, an elastic spring, has its both ends fixedly fixed to or in contact with the expandable member 630 and the body 620, respectively. The elastic member 672 can support the expandable member 630 and the body 620 by using an elastic force. The cushioning member 670 may be provided in plurality and thus at a plurality of locations on the lower body 620b. Here, the plurality of cushioning members 670 may be disposed to be spaced apart from each other by a predetermined distance in the horizontal direction. Therefore, when the expandable member 630 is moved in the thickness direction of the body 620, the cushioning member 670 can elastically support the reinforcing plate 632 such that the reinforcing plate 632 is parallel to one surface 621 of the lower body 620b, for example, a support surface.

管680包含上部管681和下部管682。上部管681可以安置在上部主體620a的頂部表面和側表面中的其中之一上。下部管682可以安置在下部主體620b的側表面上。管680可以從腔室100外向延伸並且因此連接到安置在腔室100的外部的氣體供應調節單元(未示出)。此處,單獨的密封單元(未示出)可以安置在管680與腔室100之間。此處,密封單元可以是適合於密封的多種密封單元,例如,橡膠封裝、墊圈和密封式密封件。Tube 680 includes an upper tube 681 and a lower tube 682. The upper tube 681 may be disposed on one of a top surface and a side surface of the upper body 620a. The lower tube 682 may be disposed on a side surface of the lower body 620b. The tube 680 can extend outwardly from the chamber 100 and thus be connected to a gas supply conditioning unit (not shown) disposed external to the chamber 100. Here, a separate sealing unit (not shown) may be disposed between the tube 680 and the chamber 100. Here, the sealing unit may be a variety of sealing units suitable for sealing, such as rubber packages, gaskets, and hermetic seals.

氣體供應調節單元可以將氣體注入到主體620的內部空間中並且從主體620中排出氣體。此處,當氣體注入到上部分隔空間610a中時,氣體供應調節單元可以從下部分隔空間610b中排出氣體。並且,當氣體注入到下部分隔空間610b中時,氣體供應調節單元可以從上部分隔空間610a中排出氣體。也就是說,氣體供應調節單元可以選擇性地將氣體注入到上部分隔空間610a和下部分隔空間610b中或者將氣體從上部分隔空間610a和下部分隔空間610b中排出。可以替代地執行氣體的注入和排出。因此,氣體供應調節單元可以提供為多個並且因此相應地連接到上部管681和下部管682。The gas supply adjusting unit may inject a gas into the inner space of the body 620 and exhaust the gas from the body 620. Here, when the gas is injected into the upper partition space 610a, the gas supply adjusting unit may exhaust the gas from the lower partition space 610b. And, when the gas is injected into the lower partition space 610b, the gas supply adjusting unit may discharge the gas from the upper partition space 610a. That is, the gas supply adjusting unit may selectively inject the gas into the upper partition space 610a and the lower partition space 610b or discharge the gas from the upper partition space 610a and the lower partition space 610b. The injection and discharge of gas can be performed instead. Therefore, the gas supply adjusting unit can be provided in plurality and thus connected to the upper tube 681 and the lower tube 682, respectively.

並且,舉例來說,氣體供應調節單元可以包含以預定壓力注射氣體的氣體供應源(未示出)和排出注入的氣體的排出泵(未示出)。用於控制氣體的移動的控制閥門(未示出)可以相應地安置在氣體供應源與排出泵之間以及排出泵與管680之間。Also, for example, the gas supply adjusting unit may include a gas supply source (not shown) that injects a gas at a predetermined pressure and a discharge pump (not shown) that discharges the injected gas. A control valve (not shown) for controlling the movement of the gas may be disposed between the gas supply source and the discharge pump and between the discharge pump and the tube 680, respectively.

如圖3(a)及圖3(b)中所說明,根據一個經修改實例的支撐夾具600可進一步包含安置在通孔622的一端中的密封部件690:密封部件691、密封部件692和密封部件693,使得黏合部件650的外圓周表面或移動部件640的一端的外圓周表面與主體620的通孔622的內壁之間的空間是密封的。As illustrated in FIGS. 3(a) and 3(b), the support jig 600 according to a modified example may further include a sealing member 690 disposed in one end of the through hole 622: a sealing member 691, a sealing member 692, and a seal The member 693 is such that the outer circumferential surface of the adhesive member 650 or the outer circumferential surface of one end of the moving member 640 and the inner wall of the through hole 622 of the main body 620 are sealed.

為此,通孔622的一端可以具有大於通孔622的剩餘區域或中心區域的內徑,並且因此可以界定密封部件690安置到其中的空間。舉例來說,密封部件690可以包含:密封膜691,其從黏合部件650的外圓周表面朝向通孔622的一端的內壁延伸;以及環部件692,其安置在通孔622的一端的內壁上使得密封膜691密閉地安置在通孔622的一端上。To this end, one end of the through hole 622 may have an inner diameter larger than a remaining area or a central area of the through hole 622, and thus may define a space into which the sealing member 690 is disposed. For example, the sealing member 690 may include a sealing film 691 extending from an outer circumferential surface of the bonding member 650 toward an inner wall of one end of the through hole 622, and a ring member 692 disposed at an inner wall of one end of the through hole 622 The sealing film 691 is hermetically disposed on one end of the through hole 622.

舉例來說,密封膜691可以由與彈性膜631相同的材料形成。密封膜691可以是安置在黏合部件650的外圓周表面上的膜或者可以是與黏合部件650分離的膜。當密封膜691單獨地提供時,密封膜691可以通過黏合劑黏合到黏合部件650的外圓周表面上或移動部件640的一端的外圓周表面上並且因此是密封的。For example, the sealing film 691 may be formed of the same material as the elastic film 631. The sealing film 691 may be a film disposed on the outer circumferential surface of the bonding member 650 or may be a film separate from the bonding member 650. When the sealing film 691 is separately provided, the sealing film 691 may be adhered to the outer circumferential surface of the adhesive member 650 or the outer circumferential surface of one end of the moving member 640 by an adhesive and thus sealed.

環部件692是允許密封膜691安置在通孔622的內壁上的組件。當黏合部件650移動時,環部件可以支撐密封膜691以維持密封膜691與通孔622的一端之間的密封狀態。環部件692可以通過螺栓693耦合到通孔622的一端或通過黏合劑黏合到通孔622的一端上。The ring member 692 is an assembly that allows the sealing film 691 to be placed on the inner wall of the through hole 622. When the adhesive member 650 is moved, the ring member may support the sealing film 691 to maintain a sealed state between the sealing film 691 and one end of the through hole 622. The ring member 692 can be coupled to one end of the through hole 622 by a bolt 693 or bonded to one end of the through hole 622 by an adhesive.

並且,密封部件690可以朝向通孔622的主體620的外部安置在一端上並且因此曝露在主體620外部。並且,密封部件690可以安置在界定為具有內徑大於通孔的中心的內徑的通孔622的另一端中並且因此安置在主體620中。Also, the sealing member 690 may be disposed on one end toward the outside of the body 620 of the through hole 622 and thus exposed outside the body 620. Also, the sealing member 690 may be disposed in the other end of the through hole 622 defined as having an inner diameter larger than the inner diameter of the through hole and thus disposed in the body 620.

圖9是示出根據一個實施例的基板處理方法的流程圖。在下文中,將參考圖1到9描述根據一個實施例的基板處理方法。此處,將省略或簡單地描述根據所述實施例的基板處理設備的重複的描述。FIG. 9 is a flow chart showing a substrate processing method according to an embodiment. Hereinafter, a substrate processing method according to an embodiment will be described with reference to FIGS. 1 through 9. Here, a repetitive description of the substrate processing apparatus according to the embodiment will be omitted or simply described.

基板處理方法是通過使用上述基板處理設備執行基板的結合的方法。基板處理方法包含提供上部基板S1和下部基板S2,允許下部基板S2由下部支撐件300支撐並且上部基板S1由上部支撐件200支撐、通過使用上部支撐件200的支撐夾具600將上部基板S1固定到支撐夾具600、減小上部支撐件200與下部支撐件300之間的距離以將上部基板S1緊密地附接到下部基板S2、從支撐夾具600釋放上部基板S1以及從上部支撐件200和下部支撐件300分離結合基板。The substrate processing method is a method of performing bonding of substrates by using the above substrate processing apparatus. The substrate processing method includes providing an upper substrate S1 and a lower substrate S2, allowing the lower substrate S2 to be supported by the lower support 300 and the upper substrate S1 being supported by the upper support 200, and fixing the upper substrate S1 to the upper substrate S1 by using the support jig 600 of the upper support 200 The support jig 600 reduces the distance between the upper support 200 and the lower support 300 to closely attach the upper substrate S1 to the lower substrate S2, release the upper substrate S1 from the support jig 600, and support from the upper support 200 and the lower support The piece 300 separates the bonded substrate.

此處,將上部基板S1固定到支撐夾具600包含將氣體注射到支撐夾具600中的上部分隔空間中,允許支撐夾具600的黏合部件下降,以及允許黏合部件黏合到上部基板上。並且,上部基板S1從支撐夾具的釋放包含將氣體注射到支撐夾具中的下部分隔空間中,允許支撐夾具600的黏合部件上升以及分離黏合部件與上部基板。Here, fixing the upper substrate S1 to the support jig 600 includes injecting gas into the upper partition space in the support jig 600, allowing the adhesive member of the support jig 600 to be lowered, and allowing the adhesive member to be adhered to the upper substrate. Also, the release of the upper substrate S1 from the support jig includes injecting gas into the lower partition space in the support jig, allowing the adhesive member of the support jig 600 to rise and separate the adhesive member from the upper substrate.

首先,在操作S100中,製備基板。舉例來說,上部基板S1安置於上部支撐件200之下,並且通過使用機械臂(未示出)下部基板S2安置在下部支撐件300上。此處,結合部件(未示出),例如,可以沿下部基板的邊緣安置在下部基板的頂部表面上。First, in operation S100, a substrate is prepared. For example, the upper substrate S1 is disposed under the upper support 200, and is disposed on the lower support 300 by using a lower arm S2 of a mechanical arm (not shown). Here, a bonding member (not shown), for example, may be disposed on a top surface of the lower substrate along an edge of the lower substrate.

那麼,如圖4和5中所說明,在操作S210中,下部基板S2安放和支撐在下部支撐件300的頂部表面上。在操作S220中,上部基板S1由上部支撐件200的支撐夾具600以真空吸附方式支撐。在上部基板S1吸附到上部支撐件200的支撐夾具600上並且由上部支撐件200的支撐夾具600支撐的過程中,例如,抬升部件500下降以接觸上部基板S1,並且在上部基板S1由抬升部件500以真空吸附方式支撐的狀態中,抬升部件500上升以允許上部基板S1的頂部表面接觸支撐夾具600的支撐表面。隨後,通過在真空孔623中生成真空上部基板S1吸附到支撐表面上並且由支撐表面支撐。Then, as illustrated in FIGS. 4 and 5, the lower substrate S2 is placed and supported on the top surface of the lower support 300 in operation S210. In operation S220, the upper substrate S1 is supported by the support jig 600 of the upper support 200 in a vacuum suction manner. In the process in which the upper substrate S1 is adsorbed onto the support jig 600 of the upper support 200 and supported by the support jig 600 of the upper support 200, for example, the lifting member 500 is lowered to contact the upper substrate S1, and the upper substrate S1 is lifted by the lifting member In a state in which the 500 is supported by vacuum suction, the lifting member 500 is raised to allow the top surface of the upper substrate S1 to contact the support surface of the support jig 600. Subsequently, the upper substrate S1 is adsorbed onto the support surface by the vacuum generated in the vacuum hole 623 and supported by the support surface.

隨後,在操作S310中,連接到上部分隔空間610a的氣體供應源的控制閥打開以允許惰性氣體,例如,氮氣,從氣體供應源注入到支撐夾具600的上部分隔空間610a中。此處,氣體可以通過噴淋頭660均勻噴灑到上部分隔空間610a中。隨著氣體的注入,彈性膜631擴展。此處,彈性膜631可以在主體620的厚度方向上通過噴淋頭660和加強板632在擴展方向上受到控制。在操作S320中,安置在可擴展部件630上的移動部件640和黏合部件650可以通過可擴展部件630的下降而下降。此處,緩衝部件670在可擴展部件630移動且施加預定彈力給可擴展部件630的方向上收縮。根據彈力,可擴展部件630可以穩定地移動。Subsequently, in operation S310, the control valve of the gas supply source connected to the upper partition space 610a is opened to allow an inert gas, for example, nitrogen gas, to be injected from the gas supply source into the upper partition space 610a of the support jig 600. Here, the gas can be uniformly sprayed into the upper partition space 610a through the shower head 660. The elastic film 631 expands as the gas is injected. Here, the elastic film 631 may be controlled in the extending direction by the shower head 660 and the reinforcing plate 632 in the thickness direction of the main body 620. In operation S320, the moving member 640 and the bonding member 650 disposed on the expandable member 630 may be lowered by the lowering of the expandable member 630. Here, the cushioning member 670 contracts in the direction in which the expandable member 630 moves and applies a predetermined elastic force to the expandable member 630. According to the elastic force, the expandable member 630 can be stably moved.

當可擴展部件630接觸引導部件671時,可擴展部件630的移動停止。也就是說,引導部件671可以充當擋止件。在所述過程中,在操作S330中,黏合部件650的黏合表面651經按壓以朝向基板移動並且因此按壓附接在基板的頂部表面上,並且因此黏合部件650通過黏合表面651固定到基板。When the expandable member 630 contacts the guide member 671, the movement of the expandable member 630 is stopped. That is, the guiding member 671 can function as a stopper. In the process, in operation S330, the bonding surface 651 of the bonding member 650 is pressed to move toward the substrate and thus the pressing is attached to the top surface of the substrate, and thus the bonding member 650 is fixed to the substrate by the bonding surface 651.

此處,在惰性氣體供應到上部分隔空間610a中之前,也就是說,當可擴展部件630安置在其初始位置中時,黏合部件650的黏合表面可以與下部主體620b的支撐表面平行的安置或安置為以預定距離朝向基板突出。黏合部件650的位置可以輕易地選擇為理想位置,方法是調節安置在緩衝部件670中的彈性部件672的長度使得處於初始狀態中的可擴展部件630得到彈性的支撐。Here, before the inert gas is supplied into the upper partition space 610a, that is, when the expandable member 630 is placed in its initial position, the adhesive surface of the adhesive member 650 may be disposed in parallel with the support surface of the lower body 620b or It is placed to protrude toward the substrate at a predetermined distance. The position of the adhesive member 650 can be easily selected as an ideal position by adjusting the length of the elastic member 672 disposed in the cushioning member 670 such that the expandable member 630 in the initial state is elastically supported.

當基板黏合到黏合部件650上時,連接到上部分隔空間610a的控制閥是關閉的以阻斷氣體注入到上部分隔空間610a。此處,注入到上部分隔空間610a中的氣體可以維持或通過上部管681從上部分隔空間610a中排放。當氣體排放時,可擴展部件630通過緩衝部件670返回到其初始位置,並且其中黏合部件650的黏合表面按壓基板的操作停止,並且隨後黏合表面返回到其初始位置。When the substrate is bonded to the bonding member 650, the control valve connected to the upper partitioning space 610a is closed to block the injection of gas into the upper partitioning space 610a. Here, the gas injected into the upper partition space 610a may be maintained or discharged from the upper partition space 610a through the upper tube 681. When the gas is discharged, the expandable member 630 is returned to its original position by the cushioning member 670, and the operation of pressing the bonding surface of the bonding member 650 to the substrate is stopped, and then the bonding surface is returned to its original position.

雖然基板的預定區域在過程中通過黏合部件650的加壓而變形以允許基板黏合,但是當其中黏合部件650的黏合表面按壓基板的操作停止時,基板的變形可以釋放,並且因此基板可以返回到其初始形狀。Although the predetermined region of the substrate is deformed by the pressurization of the bonding member 650 in the process to allow the substrate to be bonded, when the operation of pressing the bonding surface of the bonding member 650 to the substrate is stopped, the deformation of the substrate can be released, and thus the substrate can be returned to Its initial shape.

隨後,當基板完全黏合到黏合部件650上時,腔室100是密封的,並且在基板安置在支撐件上的每一個的過程中(即,在載入基板的過程中)處於常壓大氣壓下的腔室100的內部大氣壓可以變為真空氣壓。此處,在支撐夾具600的真空孔623中生成的真空被破壞以釋放真空孔623與上部基板S1之間的真空吸附,然而,由於上部基板S1黏合到黏合部件650上並且由黏合部件650支撐,所以上部基板S1可以維持在固定狀態下。Subsequently, when the substrate is completely bonded to the bonding member 650, the chamber 100 is sealed, and during the process of placing the substrate on each of the supports (ie, during loading of the substrate) at atmospheric pressure The internal atmospheric pressure of the chamber 100 can be changed to a vacuum pressure. Here, the vacuum generated in the vacuum hole 623 of the support jig 600 is broken to release the vacuum suction between the vacuum hole 623 and the upper substrate S1, however, since the upper substrate S1 is bonded to the bonding member 650 and supported by the bonding member 650 Therefore, the upper substrate S1 can be maintained in a fixed state.

也就是說,當黏合部件650完全固定到上部基板S1時,即使支撐夾具600的真空孔623的真空狀態通過腔室100的內部大氣壓的控制被破壞,那麼上部基板S1可以通過黏合部件650的黏合力由黏合部件650固定地支撐。That is, when the bonding member 650 is completely fixed to the upper substrate S1, even if the vacuum state of the vacuum hole 623 of the supporting jig 600 is broken by the control of the internal atmospheric pressure of the chamber 100, the upper substrate S1 can be bonded by the bonding member 650. The force is fixedly supported by the adhesive member 650.

在操作S400中,上部基板S1和下部基板S2對齊。並且,腔室100的內部維持在真空狀態下。In operation S400, the upper substrate S1 and the lower substrate S2 are aligned. Also, the interior of the chamber 100 is maintained in a vacuum state.

隨後,上部基板與下部基板之間的距離通過使用上部支撐件200和下部支撐件300中的至少一個減小。如圖5中所說明,例如,在操作中S500中,下部支撐件300上升以允許上部基板S1緊密附接到下部基板S2。當然,同時,上部支撐件200可以下降以允許上部基板S1緊密附接到下部基板S2。Subsequently, the distance between the upper substrate and the lower substrate is reduced by using at least one of the upper support 200 and the lower support 300. As illustrated in FIG. 5, for example, in operation S500, the lower support 300 is raised to allow the upper substrate S1 to be closely attached to the lower substrate S2. Of course, at the same time, the upper support 200 may be lowered to allow the upper substrate S1 to be closely attached to the lower substrate S2.

當上部基板S1完全緊密附接到下部基板S2時,如圖7中所說明,在操作S610中,連接到支撐夾具600的下部分隔空間610b的氣體供應源的控制閥打開以從氣體供應源注入惰性氣體,例如,氮氣,到支撐夾具600的下部分隔空間610b中。此處,預先注入到支撐夾具600中的上部分隔空間610a中的氣體通過上部管681排放。在此過程中,注入到下部分隔空間610b和上部分隔空間610a中的每一個的氣體可以所需比率調節注入速率和壓力以允許可擴展部件630平穩地上升。When the upper substrate S1 is completely tightly attached to the lower substrate S2, as illustrated in FIG. 7, in operation S610, the control valve of the gas supply source connected to the lower partition space 610b of the support jig 600 is opened to be injected from the gas supply source. An inert gas, for example, nitrogen, is introduced into the lower partition space 610b of the support jig 600. Here, the gas previously injected into the upper partition space 610a in the support jig 600 is discharged through the upper pipe 681. In this process, the gas injected into each of the lower partition space 610b and the upper partition space 610a can adjust the injection rate and pressure in a desired ratio to allow the expandable member 630 to rise smoothly.

通過氣體的注入向下擴展的彈性膜631可以收縮到初始位置並且隨後在一些情況下再次向上擴展。具體來說,彈性膜631可以朝向噴淋頭660進一步擴展使得加強件632上升直至移動部件640的上端接觸噴淋頭660。當然,此時,彈性膜631的擴展在主體620的厚度方向上通過加強板632得到控制。在操作S620中,隨著可擴展部件630上升,安置在可擴展部件630上的移動部件640和黏合部件650下降。The elastic film 631 which is expanded downward by the injection of the gas can be contracted to the initial position and then expanded upward again in some cases. Specifically, the elastic film 631 may be further expanded toward the shower head 660 such that the reinforcing member 632 rises until the upper end of the moving member 640 contacts the shower head 660. Of course, at this time, the expansion of the elastic film 631 is controlled by the reinforcing plate 632 in the thickness direction of the main body 620. In operation S620, as the expandable member 630 ascends, the moving member 640 and the adhesive member 650 disposed on the expandable member 630 are lowered.

此處,緩衝部件670可以施加預定彈力到可擴展部件630同時在可擴展部件630的移動方向上彈性地復原,並且因此可擴展部件630可以通過彈力穩定地移動。當移動部件640的上端接觸噴淋頭660時,可擴展部件630的移動停止。也就是說,移動部件640的上端,例如,上部移動部件640a可以充當擋止件。Here, the cushioning member 670 can apply a predetermined elastic force to the expandable member 630 while elastically recovering in the moving direction of the expandable member 630, and thus the expandable member 630 can be stably moved by the elastic force. When the upper end of the moving member 640 contacts the shower head 660, the movement of the expandable member 630 is stopped. That is, the upper end of the moving member 640, for example, the upper moving member 640a can function as a stopper.

在上述過程中,在操作S630中,黏合部件650的黏合表面移動遠離基板並且因此從上部基板S1的頂部表面釋放,並且因此黏合部件650從上部基板S1分離。從支撐夾具600分離的上部基板S1安放且支撐在下部基板S2上。當黏合部件650從上部基板S1釋放時,連接到下部分隔空間610b的控制閥是關閉的以終止氣體的注入。並且隨後,供應到下部分隔空間610b中的氣體可以通過下部管682排放。因此,黏合部件650可以返回到其初始位置。In the above process, in operation S630, the bonding surface of the bonding member 650 moves away from the substrate and thus is released from the top surface of the upper substrate S1, and thus the bonding member 650 is separated from the upper substrate S1. The upper substrate S1 separated from the support jig 600 is placed and supported on the lower substrate S2. When the bonding member 650 is released from the upper substrate S1, the control valve connected to the lower partition space 610b is closed to terminate the injection of gas. And then, the gas supplied into the lower partition space 610b can be discharged through the lower pipe 682. Therefore, the adhesive member 650 can be returned to its original position.

如上文所述,在黏合部件650向支撐夾具600內移動且從上部基板S1釋放的同時,維持了支撐夾具600的支撐表面接觸以由上部基板S1支撐的狀態,並且因此在與現有技術相比時基板可以穩定地間隔開,並且可以防止對齊基板中發生絞擰的現象。As described above, while the bonding member 650 is moved into the support jig 600 and released from the upper substrate S1, the support surface contact of the support jig 600 is maintained to be supported by the upper substrate S1, and thus compared with the prior art The substrate can be stably spaced apart and the occurrence of wringing in the alignment substrate can be prevented.

在當前實施例中,密封部件690可以安置在通孔622的一端上或可以不安置在通孔622的一端上。當密封部件690不安置在通孔622的一端上時,至少一部分的注入到下部分隔空間610b中的氣體可以在通孔622與黏合部件650之間噴灑。因此,注入到下部分隔空間610b中的氣體可以充當淨化氣體以用於在上部基板S1從支撐夾具600分離的同時輔助上部基板S1從支撐夾具600分離。In the current embodiment, the sealing member 690 may be disposed on one end of the through hole 622 or may not be disposed on one end of the through hole 622. When the sealing member 690 is not disposed on one end of the through hole 622, at least a portion of the gas injected into the lower partition space 610b may be sprayed between the through hole 622 and the bonding member 650. Therefore, the gas injected into the lower partition space 610b can serve as a purge gas for assisting the separation of the upper substrate S1 from the support jig 600 while the upper substrate S1 is separated from the support jig 600.

隨後,如圖8中所說明,在操作S700中,上部支撐件上升。此處,在上部支撐件200上升的同時,或者在上部支撐件200上升之前或之後,注入到下部分隔空間610b中的氣體可以排放以釋放施加到支撐夾具600的內部元件的壓力,由此將支撐夾具600的內部元件的狀態改變為它們的初始狀態。Subsequently, as illustrated in FIG. 8, in operation S700, the upper support rises. Here, while the upper support 200 is raised, or before or after the upper support 200 is raised, the gas injected into the lower partition space 610b may be discharged to release the pressure applied to the internal components of the support jig 600, thereby The state of the internal components of the support jig 600 is changed to their initial state.

隨後,安置在下部支撐件300上的抬升部件500上升以從下部支撐件300分離基板,並且基板移動到間隔開的固化裝置(未示出)。並且隨後,在操作S800中,光,例如,紫外射線照射到結合部件上,例如,密封劑,方法是使用固化裝置以固化密封劑從而完成基板的結合。Subsequently, the lifting member 500 placed on the lower support 300 is raised to separate the substrate from the lower support 300, and the substrate is moved to a spaced apart curing device (not shown). And then, in operation S800, light, for example, ultraviolet rays are irradiated onto the bonding member, for example, a sealant, by using a curing device to cure the sealant to complete the bonding of the substrates.

根據所述實施例,可以提供被驅動同時通過將氣體選擇性地注入到支撐夾具中的隔離的分隔空間中保持相對於支撐夾具中的基板的平行狀態的可擴展部件。According to the embodiment, it is possible to provide an expandable member that is driven while maintaining a parallel state with respect to the substrate in the support jig by selectively injecting gas into the isolated partition space in the support jig.

此處,可擴展部件可以由彈性地支撐可擴展部件的緩衝部件穩定地驅動。由於黏合部件通過使用可擴展部件在支撐夾具中向內或外向移動,所以黏合部件可以移動同時保持彼此相同的高度,並且支撐夾具可以均勻地將黏合部件黏合到基板或者將黏合部件均勻地從基板分離。Here, the expandable member may be stably driven by the cushioning member that elastically supports the expandable member. Since the adhesive member is moved inward or outward in the support jig by using the expandable member, the adhesive members can be moved while maintaining the same height as each other, and the support jig can uniformly bond the adhesive member to the substrate or uniformly bond the adhesive member from the substrate. Separation.

根據現有技術,接觸基板的單獨的元件用於從支撐夾具推按基板,由此從支撐夾具分離基板。因此,由於從單獨的組件施加到基板的力,基板被損壞或絞擰。According to the prior art, a separate component of the contact substrate is used to push the substrate from the support fixture, thereby separating the substrate from the support fixture. Therefore, the substrate is damaged or twisted due to the force applied to the substrate from the separate components.

另一方面,根據實施例,在黏合部件向內移動支撐夾具以從支撐夾具分離基板的同時,基板可以維持在基板接觸支撐夾具的支撐表面的狀態中,並且因此基板可以分離而不會被損壞,並且還可以防止基板發生絞擰的現象。On the other hand, according to the embodiment, while the bonding member moves the supporting jig inward to separate the substrate from the supporting jig, the substrate can be maintained in a state where the substrate contacts the supporting surface of the supporting jig, and thus the substrate can be separated without being damaged And it can also prevent the substrate from being twisted.

並且,由於支撐夾具允許氣體選擇性地注入到其中的隔離的分隔空間中以驅動黏合部件,也就是說,驅動黏合部件的元件安置在支撐夾具中,支撐夾具和具有支撐夾具的基板處理設備可以在結構上得到簡化。And, since the support jig allows gas to be selectively injected into the isolated partition space therein to drive the adhesive member, that is, the member that drives the adhesive member is disposed in the support jig, the support jig and the substrate processing apparatus having the support jig may It is simplified in structure.

因此,多種基板處理過程,例如,基板結合過程的穩定性可以得到改進,並且所製造的基板還可以在品質上得到改進。Therefore, various substrate processing processes, for example, stability of the substrate bonding process can be improved, and the manufactured substrate can also be improved in quality.

雖然已參考具體實施例描述基板結合過程和設備,但它們不限於此。因此,所屬領域的技術人員將容易理解,在不脫離由所附權利要求書界定的本發明的精神和範圍的情況下,可對其進行各種修改和改變。Although the substrate bonding process and apparatus have been described with reference to the specific embodiments, they are not limited thereto. It will be apparent to those skilled in the art that various modifications and changes can be made without departing from the spirit and scope of the invention as defined by the appended claims.

100‧‧‧腔室
100a‧‧‧上部腔室
100b‧‧‧下部腔室
200‧‧‧上部支撐件
300‧‧‧下部支撐件
410‧‧‧上部驅動軸桿
420‧‧‧下部驅動軸桿
500‧‧‧抬升部件
600‧‧‧支撐夾具
610‧‧‧分隔空間
610a‧‧‧上部分隔空間
610b‧‧‧下部分隔空間
620‧‧‧主體
620a‧‧‧上部主體
620b‧‧‧下部主體
621‧‧‧一個表面
622‧‧‧通孔
623‧‧‧真空孔
630‧‧‧可擴展部件
631‧‧‧彈性膜
632‧‧‧加強板
640‧‧‧移動部件
640a‧‧‧上部移動部件
640b‧‧‧下部移動部件
641‧‧‧突起
642‧‧‧墊圈
643‧‧‧螺栓
650‧‧‧黏合部件
651‧‧‧黏合表面
660‧‧‧噴淋頭
661‧‧‧噴灑孔
670‧‧‧緩衝部件
671‧‧‧引導部件
672‧‧‧彈性部件
680‧‧‧管
681‧‧‧上部管
682‧‧‧下部管
690‧‧‧密封部件
691‧‧‧密封膜
692‧‧‧環部件
693‧‧‧螺栓
S1‧‧‧上部基板
S2‧‧‧下部基板
S100~S800‧‧‧操作
100‧‧‧ chamber
100a‧‧‧ upper chamber
100b‧‧‧lower chamber
200‧‧‧Upper support
300‧‧‧lower support
410‧‧‧Upper drive shaft
420‧‧‧Lower drive shaft
500‧‧‧lifting parts
600‧‧‧Support fixture
610‧‧‧Separation space
610a‧‧‧ upper compartment
610b‧‧‧lower separation space
620‧‧‧ Subject
620a‧‧‧ upper body
620b‧‧‧Lower subject
621‧‧‧ a surface
622‧‧‧through hole
623‧‧‧vacuum hole
630‧‧‧Extensible parts
631‧‧‧elastic film
632‧‧‧ Strengthening board
640‧‧‧moving parts
640a‧‧‧Upper moving parts
640b‧‧‧low moving parts
641‧‧‧ Protrusion
642‧‧‧Washers
643‧‧‧Bolts
650‧‧‧Adhesive parts
651‧‧‧ bonded surface
660‧‧‧Sprinkler
661‧‧‧Spray hole
670‧‧‧buffer parts
671‧‧‧Guide parts
672‧‧‧Flexible parts
680‧‧‧ tube
681‧‧‧ upper tube
682‧‧‧lower tube
690‧‧‧ Sealing parts
691‧‧‧ sealing film
692‧‧‧ ring parts
693‧‧‧ bolts
S1‧‧‧ upper substrate
S2‧‧‧lower substrate
S100~S800‧‧‧ operation

圖1是根據一個實施例的基板處理設備的側視圖。 圖2是根據一個實施例的支撐夾具的側視圖。 圖3(a)及圖3(b)是根據一個經修改實例的支撐夾具的局部視圖。 圖4到8是說明其中基板處理設備根據一個實施例操作的狀態的視圖。 圖9是示出根據一個實施例的基板處理方法的流程圖。1 is a side view of a substrate processing apparatus in accordance with one embodiment. 2 is a side view of a support fixture in accordance with one embodiment. 3(a) and 3(b) are partial views of a support jig according to a modified example. 4 to 8 are views illustrating a state in which a substrate processing apparatus operates according to an embodiment. FIG. 9 is a flow chart showing a substrate processing method according to an embodiment.

100‧‧‧腔室 100‧‧‧ chamber

100a‧‧‧上部腔室 100a‧‧‧ upper chamber

100b‧‧‧下部腔室 100b‧‧‧lower chamber

200‧‧‧上部支撐件 200‧‧‧Upper support

300‧‧‧下部支撐件 300‧‧‧lower support

410‧‧‧上部驅動軸桿 410‧‧‧Upper drive shaft

420‧‧‧下部驅動軸桿 420‧‧‧Lower drive shaft

500‧‧‧抬升部件 500‧‧‧lifting parts

600‧‧‧支撐夾具 600‧‧‧Support fixture

630‧‧‧可擴展部件 630‧‧‧Extensible parts

631‧‧‧彈性膜 631‧‧‧elastic film

632‧‧‧加強板 632‧‧‧ Strengthening board

640‧‧‧移動部件 640‧‧‧moving parts

650‧‧‧黏合部件 650‧‧‧Adhesive parts

670‧‧‧緩衝部件 670‧‧‧buffer parts

680‧‧‧管 680‧‧‧ tube

681‧‧‧上部管 681‧‧‧ upper tube

682‧‧‧下部管 682‧‧‧lower tube

S1‧‧‧上部基板 S1‧‧‧ upper substrate

S2‧‧‧下部基板 S2‧‧‧lower substrate

Claims (16)

一種支撐基板的支撐夾具,所述支撐夾具包括: 主體,其具有內部空間; 可擴展部件,其經配置以在所述主體的厚度方向上劃分所述內部空間,所述可擴展部件安置在所述主體中使得通過注入到間隔開的分隔空間中的氣體使所述可擴展部件在所述主體的所述厚度方向上移動; 移動部件,其在所述主體的所述厚度方向上穿過所述主體的一個表面並且安置在撓性部件上;以及 黏合部件,其安置在所述主體向外的所述移動部件的端部上。A support jig supporting a substrate, the support jig comprising: a main body having an inner space; an expandable member configured to divide the inner space in a thickness direction of the main body, the expandable member being disposed at the The body is configured to move the expandable member in the thickness direction of the body by gas injected into the spaced apart partition spaces; a moving member that passes through the thickness direction of the body One surface of the body and disposed on the flexible member; and an adhesive member disposed on an end of the moving member outward of the body. 如申請專利範圍第1項所述的支撐夾具,更包括安置在所述主體中的噴淋頭使得氣體注入到在所述主體的所述厚度方向上的所述分隔空間中的至少一個中。The support jig according to claim 1, further comprising a shower head disposed in the main body such that gas is injected into at least one of the partition spaces in the thickness direction of the main body. 如申請專利範圍第1項所述的支撐夾具,更包括緩衝部件,所述緩衝部件安置在所述分隔空間中的至少一個中並且具有連接到所述可擴展部件的一個端部。The support jig according to claim 1, further comprising a cushioning member disposed in at least one of the partition spaces and having one end connected to the expandable member. 如申請專利範圍第1項所述的支撐夾具,其中通孔和真空孔界定在所述主體的一個表面中,並且所述黏合部件安置在所述通孔內。The support jig according to claim 1, wherein the through hole and the vacuum hole are defined in one surface of the main body, and the adhesive member is disposed in the through hole. 如申請專利範圍第4項所述的支撐夾具,其中暴露於所述主體的外部的所述黏合部件的黏合表面通過選擇性地注入到所述分隔空間中的氣體安置在所述通孔中或平行於所述主體的所述一個表面。The support jig according to claim 4, wherein an adhesive surface of the adhesive member exposed to the outside of the main body is disposed in the through hole by a gas selectively injected into the separation space or Parallel to the one surface of the body. 如申請專利範圍第4項所述的支撐夾具,更包括安置在所述通孔中的所述密封部件使得黏合部件和所述移動部件的上端中的至少一個與所述通孔之間的空間是密封的。The support jig according to claim 4, further comprising the sealing member disposed in the through hole such that a space between at least one of the upper end of the adhesive member and the moving member and the through hole It is sealed. 如申請專利範圍第1項所述的支撐夾具,其中所述可擴展部件包括: 彈性膜,其安置在所述主體中以劃分所述內部空間;以及 加強板,其安置在所述彈性膜的至少一個表面上使得所述加強件板根據所述彈性膜的形狀改變在所述主體的所述厚度方向上移動。The support jig according to claim 1, wherein the expandable member comprises: an elastic film disposed in the main body to divide the inner space; and a reinforcing plate disposed on the elastic film The at least one surface causes the reinforcement member to move in the thickness direction of the body in accordance with a shape change of the elastic film. 如申請專利範圍第3項所述的支撐夾具,其中所述緩衝部件包括: 引導部件,其安置在所述主體中朝向所述可擴展部件;以及 彈性部件,其安置在所述引導部件的外部並且具有連接到所述可擴展部件的一端和連接到所述主體的另一端。The support jig according to claim 3, wherein the cushioning member comprises: a guiding member disposed in the main body toward the expandable member; and an elastic member disposed outside the guiding member And having one end connected to the expandable member and the other end connected to the main body. 一種基板處理設備,包括: 腔室,其具有基板處理空間; 上部支撐件,其安置在所述腔室中; 下部支撐件,其安置成面向所述上部支撐件;以及 支撐夾具,其安置在所述上部支撐件和所述下部支撐件中的至少一個上,所述支撐夾具具有其中彼此分離的分隔空間, 其中所述支撐夾具包括黏合部件,所述黏合部件可通過選擇性地注入到所述分隔空間中的氣體在所述支撐夾具中向外或向內移動。A substrate processing apparatus comprising: a chamber having a substrate processing space; an upper support disposed in the chamber; a lower support disposed to face the upper support; and a support fixture disposed in the On at least one of the upper support member and the lower support member, the support jig has a partition space separated from each other, wherein the support jig includes an adhesive member, and the adhesive member can be selectively injected into the The gas in the separation space moves outward or inward in the support fixture. 如申請專利範圍第9項所述的基板處理設備,其中所述支撐夾具提供為多個,並且多個所述支撐夾具安置在界定在所述上部支撐件的底部表面和所述下部支撐件的頂部表面中的至少一個上的多個區域中。The substrate processing apparatus of claim 9, wherein the support jig is provided in plurality, and the plurality of support jigs are disposed on a bottom surface defined by the upper support and the lower support In a plurality of regions on at least one of the top surfaces. 如申請專利範圍第9項所述的基板處理設備,其中所述支撐夾具包括: 主體,其具有內部空間; 可擴展部件,其經配置以在所述主體的厚度方向上劃分所述內部空間,所述可擴展部件安置在所述主體中使得通過注入到間隔開的分隔空間中的氣體使所述可擴展部件在所述主體的所述厚度方向上移動;以及 移動部件,其安置在所述可擴展部件上並且具有插入到所述主體中的至少一個部分。The substrate processing apparatus of claim 9, wherein the support jig includes: a main body having an inner space; and an expandable member configured to divide the inner space in a thickness direction of the main body, The expandable member is disposed in the body such that the expandable member moves in the thickness direction of the body by gas injected into the spaced apart partition spaces; and a moving member disposed in the The expandable member has and has at least one portion that is inserted into the body. 如申請專利範圍第11項所述的基板處理設備,其中所述支撐夾具包括: 緩衝部件,其安置在所述主體中朝向所述可擴展部件以接觸和支撐所述可擴展部件;以及 管,其經配置以將氣體注入到所述分隔空間中的每一個中。The substrate processing apparatus of claim 11, wherein the support jig includes: a cushioning member disposed in the main body toward the expandable member to contact and support the expandable member; and a tube, It is configured to inject a gas into each of the separation spaces. 如申請專利範圍第11項所述的基板處理設備,其中通孔和真空孔界定在所述主體的一個表面中,並且 所述黏合部件耦合到所述主體向外的所述移動部件的端部中,使得所述黏合部件移動穿過所述通孔。The substrate processing apparatus of claim 11, wherein the through hole and the vacuum hole are defined in one surface of the body, and the bonding member is coupled to an end of the moving member that is outward of the body The adhesive member is moved through the through hole. 如申請專利範圍第11項所述的基板處理設備,其中所述可擴展部件包括: 彈性膜,其安置在所述主體中使得所述內部空間在所述主體的所述厚度方向上得到劃分;以及 加強板,其安置在所述彈性膜的至少一個表面上。The substrate processing apparatus of claim 11, wherein the expandable member comprises: an elastic film disposed in the main body such that the inner space is divided in the thickness direction of the main body; And a reinforcing plate disposed on at least one surface of the elastic film. 如申請專利範圍第12項所述的基板處理設備,其中所述緩衝部件包括: 引導部件,其安置在朝向所述可擴展部件的所述分隔空間中的至少一個中並且具有與所述可擴展部件間隔開的朝向所述可擴展部件的一端;以及 彈性部件,其安置在所述引導部件的外部,所述彈性部件具有連接且支撐在所述主體上的一端以及連接且支撐在所述可擴展部件上的另一端。The substrate processing apparatus of claim 12, wherein the buffer member comprises: a guiding member disposed in at least one of the separation spaces facing the expandable member and having the expandable a portion of the member that is spaced apart toward the expandable member; and an elastic member that is disposed outside the guide member, the elastic member having one end connected and supported on the body and connected and supported at the The other end of the expansion unit. 如申請專利範圍第13項所述的基板處理設備,其中進一步包括安置在所述通孔的一端上的密封部件因此包括所述通孔與所述黏合部件的外圓周表面之間的空間。The substrate processing apparatus according to claim 13, wherein the sealing member further disposed on one end of the through hole thus includes a space between the through hole and an outer circumferential surface of the bonding member.
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KR102336572B1 (en) * 2015-01-23 2021-12-08 삼성디스플레이 주식회사 Substrate desorption apparatus and method for manufacturing display device using threrof
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Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6080050A (en) * 1997-12-31 2000-06-27 Applied Materials, Inc. Carrier head including a flexible membrane and a compliant backing member for a chemical mechanical polishing apparatus
JP3917651B2 (en) * 2004-10-28 2007-05-23 信越エンジニアリング株式会社 Adhesive chuck device
JP4379435B2 (en) * 2006-05-17 2009-12-09 株式会社日立プラントテクノロジー Board assembly apparatus and board assembly method using the same
KR101255867B1 (en) * 2007-01-31 2013-04-17 신에츠 엔지니어링 가부시키가이샤 Adhesive chuck device
TWI388250B (en) * 2007-09-03 2013-03-01 Advanced Display Provider Engineering Co Ltd Substrate bonding apparatus and method
KR100850238B1 (en) * 2007-09-03 2008-08-04 주식회사 에이디피엔지니어링 Substrate chuck and apparatus for assembling substrates having the same
KR100894739B1 (en) * 2007-11-02 2009-04-24 주식회사 에이디피엔지니어링 Apparatus for attaching substrates
US8245751B2 (en) * 2007-11-07 2012-08-21 Advanced Display Process Engineering Co., Ltd. Substrate bonding apparatus
KR101340614B1 (en) 2011-12-30 2013-12-11 엘아이지에이디피 주식회사 Substrate bonding apparatus
JP2013187393A (en) * 2012-03-08 2013-09-19 Tokyo Electron Ltd Bonding device and bonding method
WO2014102913A1 (en) * 2012-12-25 2014-07-03 信越エンジニアリング株式会社 Actuator and adhesive chuck device
JP5642239B2 (en) * 2013-08-30 2014-12-17 株式会社日立製作所 LCD substrate bonding system

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