KR20160005538A - Support chuck and apparatus for treating substrate - Google Patents

Abstract

The present invention provides a support chuck and a substrate treating device. The support chuck comprises: a body having an internal space; a flexible member which is mounted in the body to separate the internal space in a thickness direction of the body and which moves in the thickness direction of the body by a gas inputted into separated partial spaces; a moving member which penetrates one surface of the body in the thickness direction of the body to be mounted in the flexible member; and a bonding member which is mounted on one end of the moving member, which is toward an external side of the body, thereby preventing a twist of a substrate in a process for separating the substrate from a unit which supports the substrate.

Description

Technical Field [0001] The present invention relates to a support chuck and an apparatus for treating a substrate,

BACKGROUND OF THE INVENTION 1. Field of the Invention [0001] The present invention relates to a support chuck and a substrate processing apparatus, and more particularly, to a support chuck capable of preventing a substrate from being twisted in a process of separating a substrate from a supporting means and a substrate processing apparatus having the same.

BACKGROUND ART A flat panel display device such as a liquid crystal display (LCD) and an organic light emitting device (OLED) is generally manufactured by attaching a pair of flat substrates. For example, an upper substrate on which a plurality of thin film transistors, an organic light emitting layer, an electrode, and the like are formed and a lower substrate serving as a capping layer are attached to each other to manufacture an organic light emitting device OLED. The apparatus for performing the above-described coalescing of substrates is currently implemented in various forms. For example, Korean Patent Registration No. 10-1340614 (registered on December 5, 2013) discloses a substrate sticking apparatus.

As disclosed in the aforementioned patent publication, in general, a conventional apparatus for attaching a substrate includes a base, an adhesive member coupled to the base and supporting the substrate, and a lift pin for releasing the substrate from the adhesive member do.

Meanwhile, in the conventional apparatus for performing cohesion of a substrate, after the process of attaching the substrates is performed, the lift pins are protruded in the direction toward the substrate, thereby separating and separating the substrate from the sticking member. .

The lift pin constantly contacts the substrate while releasing the substrate from the adhesive member. Therefore, during the removal of the substrate, a local load is applied to the substrate, which causes the substrate to be damaged. In addition, there is a problem that the alignment between the upper substrate and the lower substrate is distorted while the lift pin pushes the substrate from the adhesive member by applying a force to the substrate.

In addition to these problems, the conventional apparatus has the following problems. Conventional apparatuses must have mechanical components for driving a plurality of lift pins inside or outside the chamber, and the chamber must be machined to be pushed in order to mount the components inside or outside the chamber. In addition, the components for reinforcing the structure of the chamber to be penetrated and the components for sealing the through-working region must be provided inside or outside the chamber. That is, the conventional apparatus is implemented with a complicated structure for driving a plurality of lift pins in a mechanical manner, which makes it difficult to maintain the airtightness inside the chamber and maintenance of the apparatus.

KR 10-1340614 B1

The present invention provides a support chuck, a substrate processing apparatus, and a substrate processing method capable of stably separating a substrate from a means for supporting the substrate.

The present invention provides a support chuck, a substrate processing apparatus, and a substrate processing method that can prevent the substrate from being twisted in the process of separating the substrate from the means for supporting the substrate.

The present invention provides a support chuck, a substrate processing apparatus, and a substrate processing method that can prevent damage to a substrate in the process of separating the substrate from the means for supporting the substrate.

The present invention provides a support chuck, a substrate processing apparatus, and a substrate processing method that can simplify the structure.

A support chuck according to an embodiment of the present invention is a support chuck on which a substrate is supported, comprising: a body having an inner space; A stretchable member mounted on the body so as to be able to move in the thickness direction of the body by the gas injected into the separated partial spaces while separating the internal space in the thickness direction of the body; A moving member that penetrates one side of the body in a thickness direction of the body and is mounted on the elastic member; And an adhesive member mounted on an end of the moving member facing the outside of the body.

And a shower head mounted in the body to inject gas into at least one of the partial spaces in a thickness direction of the body, wherein the shower head is mounted on at least one of the partial spaces, And a cushioning member connected to the cushioning member. The cushioning member may include a through hole and a vacuum hole on one surface of the body, and the adhesive member may be located in the through hole.

The adhesive surface of the adhesive member exposed to the outside of the body may be positioned in the through-hole by a gas selectively injected into the partial spaces, or may be positioned to be parallel to one surface of the body.

And a sealing member mounted to the through-hole so as to seal between the adhesive member and at least one of the end portions of the moving member and the through-hole.

Wherein the elastic member comprises: an elastic membrane mounted in the body to separate the inner space; And a reinforcing plate mounted on at least one surface of the elastic membrane so as to be movable in a thickness direction of the body by deformation of the elastic membrane.

Wherein the buffer member includes: a guide member mounted in the body in a direction toward the elastic member; And an elastic member provided on the outer side of the guide member and having one end connected to the elastic member and the other end connected to the body.

A substrate processing apparatus according to an embodiment of the present invention includes: a chamber having a substrate processing space; An upper support disposed within the chamber; A lower support disposed to face the upper support; And a support chuck mounted on a support of at least one of the upper support and the lower support, the support chuck having partial spaces separated from each other, wherein the support chuck is supported by gas injected selectively into the sub- And an adhesive member movable in an outer side or an inner side of the support chuck.

The plurality of support chucks may be mounted on a plurality of regions formed on at least one of a lower surface of the upper support and an upper surface of the lower support.

The supporting chuck includes a body having an inner space, a stretching member mounted in the body so as to be movable in the thickness direction of the body by the gas injected into the separated partial spaces by separating the inner space in the thickness direction of the body, And a moving member mounted on the elastic member and at least a part of which is inserted into the outer surface of the body.

The supporting chuck may include a cushioning member mounted in the body in a direction toward the elastic member to contact and support the elastic member, and a pipe for injecting gas into the partial spaces.

A through hole and a vacuum hole may be formed on one side of the body and the adhesive member may be coupled to the end of the moving member facing the outside of the body so as to be movable through the through hole.

The elastic member may include an elastic membrane mounted in the body to separate the inner space in the thickness direction of the body, and a reinforcing plate mounted on at least one surface of the elastic membrane.

Wherein the cushioning member is mounted on at least one of the partial spaces in a direction facing the elastic member and has one end facing the elastic member and spaced apart from the elastic member, And an elastic member connected to the body and having an opposite end connected to the elastic member.

A sealing member may be mounted at one end of the through-hole so as to seal between the through-hole and the outer peripheral surface of the adhesive member.

Wherein the sealing member includes: a sealing film extending from an outer circumferential surface of the adhesive member toward an inner wall of one end of the through-hole; And a ring member mounted on an inner wall of one end of the through-hole so as to airtightly mount the sealing film to one end of the through-hole.

According to an embodiment of the present invention, there is provided a substrate processing method comprising: preparing an upper substrate and a lower substrate; Supporting the lower substrate on a lower support and supporting the upper substrate on the upper support; Fixing the upper substrate to the support chuck by using a support chuck of the upper support; A step of joining the upper substrate and the lower substrate by narrowing the gap between the upper support and the lower support; Disassembling the upper substrate and the support chuck; And separating the bonded substrates from the upper and lower supports.

The lower substrate may be vacuum-sucked and supported on the lower support, and the upper substrate may be vacuum-adsorbed and adhered to the support chuck of the upper support.

Injecting gas into the upper subspace of the support chuck in the process of fixing the upper substrate to the support chuck; Lowering the adhesive member of the support chuck; And adhering the adhesive member to the upper substrate.

A process of injecting gas into the lower subspace of the support chuck in the process of releasing the fixation between the upper substrate and the support chuck; A step of raising an adhesive member of the support chuck; And separating the adhesive member from the upper substrate.

While the gas is injected into the lower partial space of the support chuck, exhausting the gas injected into the upper partial space of the support chuck while the upper substrate is adsorbed on the support chuck while releasing the fixation of the upper substrate and the support chuck Can be supported.

According to the embodiment of the present invention, it is possible to obtain a stretching member which is driven and maintained in parallel with the substrate in the support chuck by the gas selectively injected into the mutually isolated partial spaces inside the support chuck. At this time, the elastic member can be stably driven by the buffer member elastically supporting the elastic member. By moving the adhesive members in the inward and outward directions of the support chuck by using the above-described stretchable member, the adhesive members can be moved to keep the same height with each other, and the support chuck can uniformly adhere and separate the adhesive member and the substrate.

On the other hand, conventionally, the substrate is separated from the supporting chuck by pushing the substrate from the supporting chuck by using a separate member which is in contact with the substrate, and there is a problem that the substrate is damaged or misaligned by the force applied to the substrate from the separate member .

On the other hand, according to the embodiment of the present invention, while moving the adhesive member inwardly of the support chuck to separate the substrate and the support chuck, the substrate can be separated without damaging the substrate by maintaining contact with the support surface of the support chuck, Can be prevented.

In addition, the supporting chuck may include a support chuck and a substrate processing apparatus provided with the supporting chuck so as to drive the adhesive member by selectively injecting gas into the isolated partial spaces inside the supporting chuck, The structure can be simplified.

From this, it is possible to improve the stability of various substrate processing processes such as a substrate bonding process, and to improve the quality of a substrate to be manufactured.

1 is a side view of a substrate processing apparatus according to an embodiment of the present invention;
2 is a side view of a support chuck according to an embodiment of the present invention;
3 is a partial view of a support chuck according to a variant of the invention.
4 to 8 are operational states of a substrate processing apparatus according to an embodiment of the present invention.
9 is a flowchart of a substrate processing method according to an embodiment of the present invention.

Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings. However, the present invention is not limited to the embodiments described below, but may be embodied in various forms. It is to be understood that both the foregoing general description and the following detailed description of the present invention are exemplary and explanatory and are intended to provide further explanation of the invention as claimed. The drawings may be exaggerated in size to illustrate the embodiments, wherein like reference numerals refer to like elements throughout.

FIG. 1 is a side view showing a substrate processing apparatus according to an embodiment of the present invention, FIG. 2 is a side view showing a support chuck according to an embodiment of the present invention, and FIG. 3 is a cross- Fig. FIG. 9 is a flow chart of a method of processing a substrate using a substrate processing apparatus according to an embodiment of the present invention. FIG. to be.

1 to 8, a substrate processing apparatus according to an embodiment of the present invention includes a chamber 100 having a substrate processing space, a chamber 100 disposed in the chamber 100, An upper support 200 for supporting the upper substrate S1, a lower support 300 for supporting the lower substrate S2, a lower support 300 and a lower support 300 disposed opposite to the upper support 200, And a support chuck 600 mounted on one of the supports and having a subspace 610: 610a, 610b which are separated from each other. Here, the support chuck 600 may include an adhesive member 650 movable in an inner or outer direction of the support chuck 600 by a gas injected selectively into the partial spaces 610a and 610b isolated from each other , The adhesive can be stably fixed and separated from the substrate by using the adhesive member (650). That is, the adhesive member 650 moves in the through-hole 622, which will be described later, formed in the support surface of the support chuck 600 while performing the fixing and separation of the substrate, and is located in the through hole 622, As shown in FIG. In detail, the adhesive member 650 moves to the outside of the support chuck 600 when gas is injected into any one of the partial spaces, for example, the upper partial space 610a, The substrate may be adhered to the substrate S1 or moved inside the support chuck 600 and separated from the substrate, for example, the upper substrate S1, when gas is injected into the remaining of the partial spaces, for example, the lower partial space 610b.

Meanwhile, the support chuck 600 according to the embodiment of the present invention is mounted on the upper support 200 to adhere and support the upper substrate S1, but the mounting position of the support chuck 600 is not particularly limited. For example, the support chuck 600 may be mounted on the lower support 200 or mounted on the upper support 200 and the lower support 300, respectively.

The upper substrate S1 may be, for example, an element substrate having an OLED element formed thereon, and the lower substrate S2 may be a capping substrate that protects, for example, an element substrate by capping. The base of the upper substrate and the lower substrate may be made of a transparent material, Lt; / RTI > Of course, the upper substrate and the lower substrate may be a substrate constituting various devices and devices, and may be, for example, a liquid crystal device substrate constituting a liquid crystal display device.

The chamber 100 includes an upper chamber 100a and a lower chamber 100b having a space for performing adhesion and separation processes of the upper substrate S1 and the lower substrate S2, The chamber 100b can be detachably fastened to each other. The chamber 100 is provided with a separate elevating member (not shown) capable of raising and lowering the upper chamber 100a and the lower chamber 100b, respectively, and the upper chamber 100a or the lower chamber 100b The upper substrate S1 and the lower substrate S2 are brought into the chamber 100 or taken out to the outside. In addition, the chamber 100 is provided with a separate pressure regulating means (not shown) for regulating the internal pressure and a separate exhaust means (not shown) for exhausting the impurities.

The upper support 200 is disposed inside the chamber 100 to support the upper substrate S1. The upper support 200 may be manufactured in a shape corresponding to the shape of the upper substrate S1. For example, when the upper substrate S1 is a rectangular glass plate, the upper support 200 may be manufactured to have a lower surface in the shape of a rectangular plate.

A plurality of support chucks 600 according to an embodiment of the present invention may be disposed on the lower surface of the upper support 200. The plurality of support chucks 600 may include a plurality of Respectively. Of course, the support chuck 600 may also be mounted to the lower support 300, without being limited thereto. And may be mounted on a plurality of areas formed on the upper surface of the lower support table 300, which will be described later.

The upper driving part is connected to the upper supporting part 200 to move the upper supporting part 200 up and down. The upper drive unit includes an upper drive shaft 410 connected to the upper support 200 and an upper power unit (not shown) for applying power to the upper drive shaft 410. The upper driving shaft 410 is mounted on the upper surface of the upper support 200 through the upper chamber 100a and a separate sealing member (not shown) is provided between the upper driving shaft 410 and the upper chamber 100a do. The upper driver may further include a separate alignment means (not shown) for aligning the position of the upper support 200 by moving the upper support 200 in X, Y and θ directions, (Not shown) such as a camera.

The lower support 300 is disposed on the inner lower side of the chamber 100 to support the lower substrate S2. The lower support 300 may be manufactured in a shape corresponding to the shape of the lower substrate S1, and may be manufactured to have, for example, a lower surface in the shape of a rectangular plate.

The lower driving part is connected to the lower supporting part 300 to move the lower supporting part 300 up and down. The lower driving unit includes a lower driving shaft 420 connected to the lower supporting table 300 and a lower driving unit (not shown) for applying power to the lower driving shaft 420. The lower driving shaft 420 penetrates the lower chamber 100b and is mounted on the lower surface of the lower support 300. A separate sealing member (not shown) is provided between the lower driving shaft 420 and the lower chamber 100b do. In addition, the lower driver may further include alignment means (not shown) and a separate sensor (not shown) corresponding to alignment means and sensors provided in the upper driver.

An attraction force unit (not shown) may be provided on the lower support 300 to fix the lower substrate S2 when the support chuck 600 according to the embodiment of the present invention is not mounted on the lower support 300 . The attraction force portion may have various components and structures mounted on the upper surface of the lower support 300 and satisfying that the lower substrate S2 can be fixed, and may include, for example, a vacuum chuck, an electrostatic chuck, have.

The lift member 500 is provided on the upper support 200 to assist in attaching or detaching the upper substrate S1 to the lower surface of the upper support 200. The lift member 500 is provided on the lower support 300, To attach or detach the lower substrate S2 to the upper surface of the lower substrate S2. The lift member 500 may be mounted on the upper chamber 100a through the upper support 200 in the direction toward the upper substrate S1 and may be mounted on the lower substrate 100 in the direction toward the lower substrate S2. And can be mounted to the lower chamber 100b through the support table 300. [ In this case, when the lift member 500 is mounted on the upper support 200, the lift member 500 can be mounted on the upper chamber 100a through the upper support 200 and the support chuck 600 mounted thereon have. The mounting position of the lift member 500 mounted on the upper support 200 may be selected so that the components of the support chuck 600 and the lift member 500 do not interfere with each other. Further, a separate sealing member (not shown) may be provided between the lift member 500 mounted on the upper support 200 and the support chuck 600. The number of mounts of the lift member 500 corresponds to the size of the upper substrate S1 and the lower substrate S2, and a plurality of the lift members 500 may be mounted at positions spaced apart from each other. Further, the lift member 500 is connected to a separate lift member driving unit (not shown) for moving them up and down, and is moved up and down.

A separate vacuum chuck (not shown) may be provided on the lift member (hereinafter referred to as the upper lift member) mounted on the upper support 200 among the lift members 500. In detail, the upper portion of the lift member 500, which faces the upper substrate S1, is provided with a separate member (not shown) for sucking and fixing the upper substrate S1, which is held in contact with the upper lift member, A vacuum chuck (not shown) may be provided. Here, a separate vacuum chuck (not shown) provided at the end of the lift member 500 is expanded and contracted upon contact with the substrate to dissipate impact caused by the contact, and a bellows type vacuum pad Lt; / RTI > (Not shown) may be provided on the lift member (hereinafter referred to as the lower lift member) mounted on the lower support 300 among the lift members 500. In detail, a separate support pad (not shown) having a predetermined area may be provided at an end of the lower lift member facing the lower substrate S2, and a plurality of lower lift members may be connected to the support pad. The lower lift member can stably support the lower substrate S through the support pad.

Hereinafter, a support chuck 600 according to an embodiment of the present invention will be described. Hereinafter, the upper substrate S1 and the lower substrate S2 may be separated from each other except for the case where the upper substrate S1 and the lower substrate S2 are separated from each other. Quot; substrate "

The supporting chuck 600 according to the embodiment of the present invention is a component provided in the substrate processing apparatus for supporting and fixing a substrate, and includes a body 620 having a supporting surface 621, The inner space of the body 620 is divided into the partial spaces 610a and 610b stacked in the thickness direction of the body 620 and the gas is selectively injected into the separated partial spaces 610, A stretchable member 630 mounted in the body 620 so as to be movable in the thickness direction of the body 620 and a supporting member 630 for supporting the substrate 620 in the thickness direction of the body 620 A moving member 640 mounted on the elastic member 630 and an adhesive member 650 mounted on the end of the moving member 640 facing the outside of the body 620. [

The body 620 may be formed in a shape corresponding to the shape of the upper supporter 200, such as a hexahedral shape. For example, an upper surface opposed to the lower surface of the body 620 is mounted on the lower surface of the upper support 200 and a substrate is supported on one surface 621 of the body 620. [ That is, one surface 621 of the body 620 serves as a supporting surface for supporting the substrate. A pipe 680 through which gas is passed is installed at one side of each of the upper surface of the body 620 and the side of the body 620 and the gas is injected into the body 620 through the pipe 680, It is possible to discharge the injected gas to the outside. On one side 621 of the body 620 that supports the substrate, for example, a support surface, a through-hole 622 penetrating the support surface is provided. The number of the through holes 622 corresponds to the number of the moving members 640 to be described later, and the through holes 622 are spaced apart from each other. An end of the moving member 640 to be described later and an adhesive member 650 to be mounted thereon are positioned in the through hole 622. The adhesive member 650 is exposed through the through hole 622 to the outside of the body 620 . In addition, a plurality of vacuum holes 623 may be formed on one surface 621 of the body 620 to be spaced apart from the through holes 622. Specifically, a plurality of vacuum holes 623 are formed on one surface 621 of the body 620 so as to be spaced apart from each other. (Not shown) such as a vacuum pump is connected to the vacuum hole 623 and the vacuum in the vacuum hole 623 is adjusted by the vacuum adjusting means and the substrate is vacuum- Thereby assisting in fixing the substrate to the supporting surface of the substrate 600. The through-hole 622 and the vacuum hole 623 may be spaced apart from each other at regular intervals, as shown in FIG.

On the other hand, the body 620 can be manufactured as an integral type or can be manufactured as a separate type. In this embodiment, a separate body 620 is illustrated. That is, the body 620 includes an upper body 620a and a lower body 620b, and the upper body 620a and the lower body 620b can be detachably coupled to each other.

The elastic member 630 is a component provided in the body 620 to drive the moving member 640 and the adhesive member 650 mounted thereon. The elastic members 630 are disposed between the elastic membrane 631 and the elastic membrane 631 mounted in the body 620 so as to separate the inner space of the body 620 into the partial spaces 610 stacked in the thickness direction of the body 620. [ 631 and may be provided with a reinforcing plate 632 that moves in the thickness direction of the body 620 due to the deformation of the elastic membrane 631.

The elastic membrane 631 may be a thin membrane having elasticity, for example, a diaphragm, and the material thereof may include, for example, natural rubber, synthetic rubber, and metal plate engineering plastics. The elastic membrane 631 may be mounted on the body 620, for example, between the upper and lower bodies 620a and 620b. At this time, separate sealing means (not shown) may be provided on the contact surfaces of the elastic membrane 631 and the upper body 620a and the lower body 620b, respectively. The inner space of the body 620 by the elastic membrane 631 can be divided into subspaces, such as an upper subspaces 610a and a lower subspaces 610b. The elastic membrane 631 may be horizontally mounted in the body 620 to divide the internal space of the body 620 in a direction parallel to the support surface. The elastic membrane 631 can be expanded by the inert gas injected toward the elastic membrane 631 and can be restored to the initial position by contracting again when the injected inert gas is discharged to the outside. That is, the separated partial spaces 610 are isolated from each other by the elastic membrane 631 and are not in communication with each other. Thus, no gas flows from the upper partial space 610a to the lower partial space 610b, and vice versa. That is, when the gas is injected into the upper partial space 610a, the elastic membrane 631 may expand downward, and when the gas is injected into the lower partial space 610b, the elastic membrane 631 may expand upward have.

The movable member 640 is stably mounted on and supported by the elastic member 630 so that the expansion and contraction direction of the elastic membrane 631 is controlled in the thickness direction of the elastic membrane 631 And a reinforcing plate 632 is mounted on at least one surface of the elastic membrane 631. That is, the reinforcing plate 632 may be mounted on the lower surface or the upper surface of the elastic membrane 631, or may be mounted on the upper surface and the lower surface of the elastic membrane 631, respectively. A portion of the elastic member 630 or the reinforcing plate 632 is parallel to the supporting surface of the body 620 when the elastic membrane 631 expands and contracts due to the reinforcing plate 632 being mounted on the elastic membrane 631 . The reinforcing plate 632 has a predetermined strength so that the reinforcing plate 632 is not bent or deformed in the direction of expansion or contraction of the elastic membrane 631 when the elastic membrane 631 expands or contracts, For example, a rectangular plate shape corresponding to the shape of the body 620. The elastic membrane 631 can be controlled in the direction of the desired direction such as the thickness direction of the body 620 by the reinforcing plate 632 described above and the moving members 640, And can be moved within the body 620 while maintaining the same height in the thickness direction of the body 620. [ On the other hand, the reinforcing plate 632 may be formed with a lower limit of the area so as to satisfy a desired number of movable members 640 to be mounted and supported. An upper limit of the area of the reinforcing plate 632 is set such that the edge of the reinforcing plate 632 is spaced apart from the body 620 by a predetermined distance. The elastic membrane 631 is fixed to the predetermined portion of the reinforcing plate 632 to accommodate expansion and contraction Area. In other words, the reinforcing plate 632 is formed to have an area of the elastic membrane 631 located between the edge of the reinforcing plate 632 and the body 620, that is, the area of the reinforcing plate 632 The unloaded area can be moved in the thickness direction of the body 620 as it expands or contracts.

The movable member 640 is attached to the elastic member 630 by passing through one side 621 of the lower body 620b in the thickness direction of the body 620. The movable member 640 is stably supported by the reinforcing plate 632 . The moving member 640 is inserted into the through hole 622 formed at one side 621 of the body 620 at one end of the moving member 640 facing at least a part of the body 620 toward the outside. A plurality of moving members 640 are provided corresponding to the size of the substrate, and are disposed apart from each other. The shifting member 640 is disposed on the upper side of the elastic member 630, that is, the upper shifting member 640a positioned in the upper partial space 610a and the lower portion located in the lower partial space 610b of the elastic member 630 And a movable member 640b. The length of the lower moving member 640b may be such that one end of the moving member 640 facing the one surface 621 of the body 620 is positioned within the through hole 622 of the body 620. The length of the upper movable member 640a may be formed such that the other end of the movable member 640 is spaced apart from the showerhead 660 by a predetermined distance. The spacing between the other end of the movable member 640 and the showerhead 660, which will be described later, serves to accommodate the change when the elastic member 630 is lifted and expanded. That is, the distance between the other end of the movable member 640 and a distance between the shower head 660 and a later described step means a distance between an upper limit position and a lower limit position of the adhesive member 650, for example, the stroke distance. The upper movable member 640a serves as a stopper when the movable member 640 rises. On the other hand, the moving member 640 may be attached to the elastic member 630 by being attached to the elastic member 630 and moving in correspondence with the movement of the elastic member 630, for example. A protrusion 641 is formed on the outer peripheral surface of the upper end of the lower movable member 640b and a washer 642 is provided on the outer peripheral surface of the upper end of the upper movable member 640a. The protrusions and washers are respectively brought into contact with the elastic member 630 and through which the bolts 643 are mounted to mount the movable member 640 to the elastic members 630. At this time, the washer may serve to fix the moving member 640 to the elastic member 630 and to seal the elastic member 630 penetrated by the moving member 640.

The adhesive member 650 is a member for adhering the substrate with adhesive force. The adhesive member 650 is made of a material having properties that can be directly attached to one end of the moving member 640 without leaving a mark on the substrate, . For example, the adhesive member 650 may be a silicone-based, acrylic-based, or fluorine-based adhesive sheet. The adhesive member 650 is mounted on one end of the moving member 640 so as to be movable through the through hole 622 and is exposed to the outside of the body 620 through the through hole 622 of the body 620. The shape of the adhesive surface of the adhesive member 650 exposed to the one surface 621 of the body 620, for example, the support surface, may be circular. The adhesive member 650 may be attached to the end of the moving member 640 by, for example, a bolt (not shown) or may be attached thereto by a binder. The adhesive member 650 is mounted on one end of the moving member 640 and moved by moving up and down the moving member 640 in the through hole 622 of the body 620. Specifically, the adhesive surface 651 of the adhesive member 650 is positioned so as to be parallel to the support surface in the through-hole 622 of the body 620 by the gas selectively injected into the partial spaces, Or may be positioned within the through-hole 622 so as to be spaced apart from the support surface, thereby releasing the adhesion with the substrate.

The supporting chuck 600 according to the embodiment of the present invention includes a shower head 660 mounted in the body 620 to inject gas into at least one of the partial spaces 610 in the thickness direction of the body 620, As shown in FIG. The shower head 660 is mounted in the upper body 620a to inject gas into the upper partial space 610a in the thickness direction of the body 620 and is connected to the upper pipe 620a mounted on one side of the upper body 620a, Lt; / RTI > The showerhead 660 may include a bottom plate, for example, a perforated plate having a plurality of jetting ports 661 formed in the thickness direction of the body 620, and side walls surrounding the edges of the bottom plate from the top of the bottom plate, And is airtightly mounted on the inner upper portion of the upper body 620a. The bottom plate of the shower head 660 may be disposed at a predetermined distance from the inner upper portion of the upper body 620a and the area of the lower plate may correspond to the size of the reinforcing plate 632. The gas can be uniformly injected into the upper partial space 610a and the reinforcing plate 632 by the shower head 660 so that the uniform force can be applied to the elastic member 630 and the elastic member 630 It can be raised or lowered while maintaining the horizontal position. Of course, the showerhead 660 may be mounted on the lower body 620b to inject gas into the lower partial space 610b, and may be mounted on each body 620. [

The support chuck 600 according to the embodiment of the present invention is configured such that the elastic member 630 is moved in the body 620 while maintaining the same height in the thickness direction of the body 620, And a buffer member 670 mounted in the body 620 at a position of the elastic member 630 and having one end connected to the elastic member 630. That is, the buffering member 670 is mounted in the body 620 in the direction toward the stretching member 630, and a part of the constituent parts are in contact with the stretching member 630 to elastically support the stretching member 630. The elastic member 630 withstands the pressure of the gas injected in the first deflecting direction to the stretching member 630 by the buffer member 670 and can be lifted and lowered gently in the thickness direction of the body 620 at a desired speed have. The sudden projecting drive of the elastic member 630 and the stick slip phenomenon of the elastic member 630 and the movable member 640, that is, the vibration phenomenon can be prevented.

A cushioning member 670 mounted on the lower body 620b in the lower part space 610b of the elastic member 630 is illustrated as an example of the cushioning member 670. However, And may be mounted on the upper body 620a on the upper side of the elastic member 630, that is, the upper partial space 610a. The cushioning member 670 is attached to the upper body 620a and the lower body 620b at the upper side and the lower side of the elastic member 730, respectively, and is positioned at the upper and lower portions 610a and 610b, can do. Hereinafter, the technical features of the buffer member 670 will be described with reference to the buffer member 670 mounted on the lower body 620b. However, the buffer member 670 is equally applicable even when the buffer member 670 is mounted on the upper body 620a .

The buffer member 670 is provided on the outer side of the guide member 671 and the guide member 671 that are mounted in the body 620 in the direction toward the stretchable member 630 and has one end connected to and supported by the body 620, And an elastic member 672 whose other end is connected to and supported by the elastic member 630. At this time, the guide member 671 is formed such that one end of the guide member 671 facing the elastic member 630 is spaced apart from the elastic member 630. The elastic member 630 contacts the elastic member 630 when one end of the guide member 671 moves in the direction toward the guide member 671 and is separated from the elastic member 630 in other cases So that the length of the guide member 671 is formed. Both ends of the elastic member 672, for example, the elastic spring, are fixedly or contactably connected to the elastic member 630 and the body 620, and support them by elastic force. A plurality of the buffer members 670 may be installed at a plurality of positions of the lower body 620b. At this time, the buffer members 670 may be spaced equidistantly from each other in the horizontal direction, The reinforcing plate 632 can be elastically supported such that the reinforcing plate 632 is parallel to the one surface 621 of the lower body 620b, for example, the supporting surface, when the reinforcing plate 630 moves in the thickness direction of the body 620. [

The piping 680 includes an upper piping 681 and a lower piping 682. The upper piping 681 is mounted on either the upper surface or the side surface of the upper body 620a and the lower piping 682 And can be mounted on the side surface of the lower body 620b. Each pipe 680 extends outwardly of the chamber 100 and is connected to a gas supply regulating means (not shown) provided outside the chamber 100. At this time, separate sealing means (not shown) may be provided between each of the pipes 680 and the chamber 100. Here, the sealing means may be various sealing means suitable for sealing including, for example, rubber seals, gaskets and sealing seals. When the gas is injected into the upper partial space 610a, the gas is supplied from the lower partial space 610b to the inner space of the body 620. At this time, And exhaust gas from the upper partial space 610a when gas is injected into the lower partial space 610b. That is, the gas is selectively injected into the upper partial space 610a and the lower partial space 610b, and the injection and the exhaust of the gas are alternately performed. To this end, a plurality of gas supply adjusting means (not shown) may be provided and connected to the upper pipe 681 and the lower pipe 682, respectively. The gas supply adjusting means may include a gas supply source (not shown) capable of injecting gas at a predetermined pressure and an exhaust pump (not shown) for exhausting the injected gas. The gas storage portion, the exhaust pump, and the pipe 680 A control valve (not shown) for controlling the movement of the gas may be mounted.

3, the supporting chuck 600 according to the modified embodiment of the present invention includes an outer circumferential surface of the adhesive member 650 or an outer circumferential surface of one end of the moving member 640 and a through hole 622 of the body 620 691, 692, 693) mounted on one end of the through-hole 622 so as to seal between the inner wall of the through-hole 622 (see FIG. To this end, one end of the through-hole 622 may be formed to have a larger inner diameter than the remaining area or central area of the through-hole 622, and a space in which the sealing member 690 can be mounted may be provided. The sealing member is hermetically attached to one end of the through hole 622 with a sealing film 691 and a sealing film 691 extending from the outer circumferential surface of the adhesive member 650 toward the inner wall of one end of the through hole 622 And a ring member 692 mounted on the inner wall of one end of the through hole 622. [ The sealing film 691 may be made of the same material as that of the elastic membrane 631, may be a film formed on the outer circumferential surface of the adhesive member 650, or may be a film separately provided from the adhesive member 650. The sealing film may be attached to the outer circumferential surface of the adhesive member 650 or the outer circumferential surface of one end of the moving member 640 by an adhesive, for example, and airtightly mounted. The ring member 692 is a component provided to mount the sealing film 691 on the inner wall of the through hole 622. The ring member 692 supports the sealing film 691 when the adhesive member 650 moves, And serves to maintain the sealed state of one end of the sphere 622. The ring member 692 may be attached to one end of the through hole 622 by a bolt 693 or may be adhered by an adhesive material and the sealing member 690 may be attached to the outside of the body 620 And the other end of the through hole 622 in the direction toward the inside of the body 620 can be exposed to the outside of the body 620. The other end of the through hole 622 in the direction toward the inside of the body 620 can be exposed from the center of the through hole 622 And a sealing member 690 may be mounted on the other end of the through hole 622 to be positioned inside the body 620. [

9 is a flowchart of a substrate processing method according to an embodiment of the present invention. Hereinafter, a substrate processing method according to an embodiment of the present invention will be described with reference to FIGS. 1 to 9. FIG. At this time, the description of the substrate processing apparatus according to the embodiment of the present invention and the duplicate description will be omitted or briefly described.

The substrate processing method is a method of performing cohesion of a substrate using the above-described substrate processing apparatus. The method includes the steps of providing an upper substrate S1 and a lower substrate S2, A process of fixing the upper substrate S1 to the supporting chuck 600 using the supporting chuck 600 of the upper supporting table 200, a process of fixing the upper substrate S1 to the upper supporting table 200, Closing the upper substrate S1 and the lower substrate S2 by narrowing the gap between the upper substrate S1 and the lower substrate 300 by closing the gap between the upper substrate S1 and the lower substrate 300, 200 and the lower support 300. In this case, The process of fixing the upper substrate S1 to the support chuck 600 includes a process of injecting gas into the upper partial space of the support chuck 600, a process of lowering the adhesive member of the support chuck, And sticking the member. The process of releasing the fixing of the upper substrate S2 and the supporting chuck may include a process of injecting gas into the lower partial space of the supporting chuck, a process of raising the adhesive member of the supporting chuck, a process of separating the adhesive member from the upper substrate .

First, a substrate is prepared (S100). The upper substrate S1 is positioned below the upper support table 200 and the lower substrate S2 is positioned above the lower support table 300 by using a robot arm (not shown). At this time, a joining member (not shown) such as a sealant may be provided on the upper surface of the lower substrate along the edge of the lower substrate.

4 and 5, the lower substrate S2 is supported on the upper surface of the lower supporter 300 (S210), and the upper substrate S1 is supported on the supporter 300 of the upper supporter 300 600) by a vacuum adsorption method (S220). The process of sucking and supporting the upper substrate S1 on the support chuck 600 of the upper supporter 200 can be performed by bringing the lift member 500 down and contacting the upper substrate S1, The lift member 500 is raised to bring the upper surface of the upper substrate S1 into contact with the support surface of the support chuck 600 in a state in which the upper substrate S1 is supported by the upper substrate S1. Subsequently, a vacuum is formed in the vacuum hole 623 of the support surface to adsorb and support the upper substrate S1 on the support surface.

Next, a control valve (not shown) of a gas supply source (not shown) connected to the upper partial space 610a of the support chuck 600 is opened to inactivate the upper partial space 610a of the support chuck 600 from the gas supply source A gas such as nitrogen gas is injected (S310). At this time, the showerhead 660 can uniformly inject gas into the upper subspace 610a. The elastic membrane 631 expands due to the injection of the gas and the expansion direction is controlled in the thickness direction of the body 620 by the shower head 660 and the reinforcing plate 632. The movable member 640 and the adhesive member 650 mounted thereon are lowered by the descent of the elastic member 630 (S320). At this time, the cushioning member 670 is contracted in the moving direction of the elastic member 630 to apply a predetermined elastic force to the elastic member 630, and the elastic member 630 can be stably moved by the elastic force. When the elastic member 630 contacts the guide member 671 of the buffer member 670, the movement of the elastic member 630 is stopped. That is, the guide member 671 serves as a stopper. In this manner, the adhesive surface of the adhesive member 650 is pressed and moved toward the substrate and pressed against the upper surface of the substrate, and the adhesive member 650 and the substrate are adhered and fixed via the adhesive surface 651 (S330).

Here, the position of the adhesive surface of the adhesive member 650 at the initial position of the elastic member 630 before the inert gas is supplied to the upper partial space 610a is positioned at a position Or may be positioned protruding at a predetermined distance in the direction from the support surface to the substrate. The position of the adhesive member 650 can be easily selected to a desired position by adjusting the length of the elastic member 672 provided on the buffer member 670 so as to elastically support the elastic member 630 in the initial state.

When the substrate is adhered and fixed, the control valve connected to the upper partial space 610a is locked to block gas injection into the upper partial space 610a. At this time, the gas injected into the upper partial space 610a may be maintained or the gas may be exhausted from the upper partial space 610a through the upper piping 681. [ When the gas is exhausted, the elastic member 630 is returned to the initial position by the cushioning member 670, the operation of pressing the adhesive surface of the adhesive member 650 to the substrate is stopped, and the adhesive surface returns to the initial position. On the other hand, a predetermined area of the substrate can be deformed by the pressing of the adhesive member 650 during the process of fixing the substrate, but the deformation of the substrate is released as the operation of pressing the substrate by the adhesive surface of the adhesive member 650 is stopped And can be returned to its original form.

After the adhesion of the substrate and the adhesive member 650 is completed, the chamber 100 is closed and the substrate is placed on each support, that is, the chamber 100, which was formed at atmospheric pressure in the process of loading the substrate, ) Is formed in a vacuum atmosphere. At this time, the vacuum formed in the vacuum hole 623 of the support chuck 600 is broken and the vacuum suction between the vacuum hole 623 and the upper substrate S1 is released. However, the upper substrate S1 is separated from the adhesive member 650, The fixed state can be maintained. That is, even if the vacuum state of the vacuum hole 623 of the support chuck 600 is destroyed by the internal atmosphere control of the chamber 100 after the adhesion of the adhesive member 650 and the upper substrate S1 is completed, The upper substrate S1 can be fixedly supported by the adhesive force of the upper substrate S1.

Subsequently, the upper substrate S1 and the lower substrate S2 are aligned (S400). Then, the inside of the chamber 100 is maintained in a vacuum state.

Next, at least one of the upper support 200 and the lower support 300 is used to narrow the gap between the upper substrate and the lower substrate. For example, as shown in FIG. 5, the upper and lower substrates are brought into close contact with each other by raising the lower support 300 (S500). Of course, at the same time, the upper support 200 can be lowered and brought into close contact with each other.

7, a control valve (not shown) of a gas supply source (not shown) connected to the lower sub space 610a of the support chuck 600 is opened to remove the gas from the gas supply source to the support chuck 600 For example, nitrogen gas (S610). At this time, the gas injected into the upper partial space 610a in the support chuck 600 is exhausted through the upper pipe 681. [ In this process, the injection speed and pressure of the gas injected into the lower partial space and the injection rate and pressure of the gas injected into the upper partial space are adjusted to a desired ratio, so that the stretching member 630 can be smoothly moved up . The elastic membrane 631 inflated downward by the injection of the gas may be contracted to the initial position, and then expanded toward the upper side as the case may be. The elastic membrane 631 can be further expanded in the direction toward the showerhead 660 so as to raise the gusset plate 632 until the upper end of the movable member 640 contacts the showerhead 660 have. Of course, at this time, the expansion direction of the elastic membrane 631 is controlled by the reinforcing plate 632 in the thickness direction of the body 620. The moving member 640 and the adhesive member 650 mounted thereon are lowered by the rise of the elastic member 630 (S620). At this time, the cushioning member 670 is elastically restored in the moving direction of the elastic member 630 to apply a predetermined elastic force to the elastic member 630, and the elastic member 630 can be stably moved by the elastic force. When the upper end of the movable member 640 contacts the shower head 660, the movement of the elastic member 630 is stopped. That is, the upper end of the movable member 640, e.g., the upper movable member 640a, serves as a stopper. The adhesive surface of the adhesive member 650 is moved away from the substrate and the adhesive is released from the upper surface of the upper substrate S1 so that the adhesive member 650 and the upper substrate S1 are separated from each other (S330). The upper substrate S1 separated from the support chuck 600 is seated and supported on the lower substrate S2. When the adhesion between the adhesive member 650 and the upper substrate S1 is released, the control valve connected to the lower partial space 610a is closed to stop the injection of the gas. Subsequently, the gas supplied thereto through the lower pipe 682 can be exhausted. This allows the adhesive member 650 to return to the initial position.

While the adhesive member 650 is moved inward of the support chuck 600 and the adhesion of the adhesive member 650 and the upper substrate S1 is released as described above, Since the contact state of the substrate S1 is maintained, if the separation of the substrate can be performed more stably than before, it is possible to prevent the alignment of the aligned substrate.

Meanwhile, in the embodiment of the present invention, the sealing member 690 may be provided at one end of the through hole 622 or may not be provided at the other end of the through hole 622. When the sealing member 690 is not provided, At least a portion of the gas to be injected may be injected between the through-hole 622 and the adhesive member 650. The gas injected into the lower partial space 610b serves as a purge gas for assisting the separation of the upper substrate S1 and the supporting chuck 600 while separating the upper substrate S1 and the supporting chuck 600 can do.

Next, as shown in FIG. 8, the upper support is raised (S700). At this time, the gas injected into the lower sub-space 610b of the support chuck 600 is exhausted during the elevation of the upper support 200 or before and after the elevation of the upper support 200, The pressure can be released and the state can be switched to the initial state.

Thereafter, the lift member 500 provided on the lower support table 300 is lifted to separate the substrate from the lower support table 300, and then the substrate is moved to another hardening apparatus (not shown). Then, the bonding member such as a sealant is irradiated with light such as ultraviolet (UV) light by using a curing apparatus, and is cured to complete the cementing of the substrate (S800).

The present invention can be applied to various substrate processing processes other than the process and device for attaching the substrates together. It should be noted, however, that the above-described embodiment of the present invention is for the purpose of explanation and not for the purpose of limitation. It is to be understood that various modifications may be made by those skilled in the art without departing from the scope of the present invention.

100: chamber 200: upper support
500: lift member 600: support chuck
610a: upper part space 610b: lower part space
620: body 630: elastic member
650: Adhesive member 660: Shower head

Claims (16)

1. A support chuck for supporting a substrate,
A body having an inner space;
A stretchable member mounted on the body so as to be able to move in the thickness direction of the body by the gas injected into the separated partial spaces while separating the internal space in the thickness direction of the body;
A moving member that penetrates one side of the body in a thickness direction of the body and is mounted on the elastic member; And
And an adhesive member mounted on an end of the moving member facing the outside of the body.
The method according to claim 1,
And a shower head mounted in the body to inject gas into at least one of the partial spaces in the thickness direction of the body.
The method according to claim 1,
And a buffer member mounted on at least one of the partial spaces and having one end connected to the elastic member.
The method according to claim 1,
A through hole and a vacuum hole are formed on one surface of the body,
And the adhesive member is located in the through-hole.
The method of claim 4,
Wherein the adhesive surface of the adhesive member exposed to the outside of the body is positioned in the through hole by a gas selectively injected into the partial spaces or positioned so as to be parallel to one surface of the body.
The method of claim 4,
And a sealing member mounted on the through-hole so as to seal between the adhesive member and at least one of the end portions of the moving member and the through-hole.
The method according to claim 1,
The elastic member
An elastic membrane mounted in the body to separate the inner space;
And a reinforcement plate mounted on at least one surface of the elastic film so as to be movable in a thickness direction of the body by deformation of the elastic film.
The method of claim 3,
The cushioning member,
A guide member mounted in the body in a direction toward the elastic member;
And an elastic member provided on the outer side of the guide member and having one end connected to the elastic member and the other end connected to the body.
A chamber having a substrate processing space;
An upper support disposed within the chamber;
A lower support disposed to face the upper support; And
And a support chuck mounted on a support of at least one of the upper support and the lower support, the support chuck having partial spaces separated from each other,
Wherein the support chuck includes an adhesive member movable in an outer side or an inner side direction of the support chuck by a gas selectively injected into the partial spaces.
The method of claim 9,
Wherein the plurality of support chucks are mounted on each of a plurality of regions formed on at least one of a lower surface of the upper support and an upper surface of the lower support.
The method of claim 9,
The supporting chuck includes a body having an inner space, a stretching member mounted in the body so as to be movable in the thickness direction of the body by the gas injected into the separated partial spaces by separating the inner space in the thickness direction of the body, And a moving member mounted on the elastic member and at least a part of which is inserted into the outer surface of the body.
The method of claim 11,
Wherein the support chuck includes a buffer member mounted in the body in a direction toward the elastic member to contact and support the elastic member, and a pipe for injecting gas into the partial spaces.
The method of claim 11,
A through hole and a vacuum hole are formed on one surface of the body,
And the adhesive member is coupled to an end of the moving member which is directed to the outside of the body so as to be movable through the through-hole.
The method of claim 11,
Wherein the elastic member includes an elastic membrane mounted in the body to separate the inner space in a thickness direction of the body, and a reinforcing plate mounted on at least one surface of the elastic membrane.
The method of claim 12,
Wherein the cushioning member is mounted on at least one of the partial spaces in a direction facing the elastic member and has one end facing the elastic member and spaced apart from the elastic member, And an elastic member connected to the body and having an opposite end connected to the elastic member.
14. The method of claim 13,
And a sealing member is mounted at one end of the through hole so as to seal between the through hole and the outer peripheral surface of the adhesive member.

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