TW201250191A - Use of burners with a jet tube in reactors for conversion of chlorosilanes - Google Patents

Use of burners with a jet tube in reactors for conversion of chlorosilanes Download PDF

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Publication number
TW201250191A
TW201250191A TW101109699A TW101109699A TW201250191A TW 201250191 A TW201250191 A TW 201250191A TW 101109699 A TW101109699 A TW 101109699A TW 101109699 A TW101109699 A TW 101109699A TW 201250191 A TW201250191 A TW 201250191A
Authority
TW
Taiwan
Prior art keywords
chlorosilanes
heat
burner
flame
reaction furnace
Prior art date
Application number
TW101109699A
Other languages
English (en)
Inventor
Bernd Wehner
Christof Zipper
Guido Stochniol
Ingo Pauli
Norbert Schladerbeck
Original Assignee
Evonik Degussa Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Evonik Degussa Gmbh filed Critical Evonik Degussa Gmbh
Publication of TW201250191A publication Critical patent/TW201250191A/zh

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Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F23—COMBUSTION APPARATUS; COMBUSTION PROCESSES
    • F23D—BURNERS
    • F23D14/00—Burners for combustion of a gas, e.g. of a gas stored under pressure as a liquid
    • F23D14/12—Radiant burners
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/08—Compounds containing halogen
    • C01B33/107—Halogenated silanes
    • C01B33/1071—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J12/00—Chemical processes in general for reacting gaseous media with gaseous media; Apparatus specially adapted therefor
    • B01J12/007—Chemical processes in general for reacting gaseous media with gaseous media; Apparatus specially adapted therefor in the presence of catalytically active bodies, e.g. porous plates
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/24—Stationary reactors without moving elements inside
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J4/00—Feed or outlet devices; Feed or outlet control devices
    • B01J4/001—Feed or outlet devices as such, e.g. feeding tubes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J8/00—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
    • B01J8/02—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with stationary particles, e.g. in fixed beds
    • B01J8/06—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with stationary particles, e.g. in fixed beds in tube reactors; the solid particles being arranged in tubes
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/08—Compounds containing halogen
    • C01B33/107—Halogenated silanes
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/08—Compounds containing halogen
    • C01B33/107—Halogenated silanes
    • C01B33/1071—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof
    • C01B33/10742—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by hydrochlorination of silicon or of a silicon-containing material
    • C01B33/10757—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by hydrochlorination of silicon or of a silicon-containing material with the preferential formation of trichlorosilane
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F23—COMBUSTION APPARATUS; COMBUSTION PROCESSES
    • F23C—METHODS OR APPARATUS FOR COMBUSTION USING FLUID FUEL OR SOLID FUEL SUSPENDED IN  A CARRIER GAS OR AIR 
    • F23C3/00—Combustion apparatus characterised by the shape of the combustion chamber
    • F23C3/002—Combustion apparatus characterised by the shape of the combustion chamber the chamber having an elongated tubular form, e.g. for a radiant tube
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B17/00—Furnaces of a kind not covered by any preceding group
    • F27B17/0016—Chamber type furnaces
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
    • F27D99/00—Subject matter not provided for in other groups of this subclass
    • F27D99/0001—Heating elements or systems
    • F27D99/0033—Heating elements or systems using burners
    • F27D99/0035—Heating indirectly through a radiant surface
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00049—Controlling or regulating processes
    • B01J2219/00051—Controlling the temperature
    • B01J2219/0015—Controlling the temperature by thermal insulation means
    • B01J2219/00155—Controlling the temperature by thermal insulation means using insulating materials or refractories
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00049—Controlling or regulating processes
    • B01J2219/00051—Controlling the temperature
    • B01J2219/00157—Controlling the temperature by means of a burner

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Inorganic Chemistry (AREA)
  • Combustion & Propulsion (AREA)
  • Silicon Compounds (AREA)
  • Combustion Of Fluid Fuel (AREA)

Description

201250191 六、發明說明： 【發明所屬之技術領域】 本發明係關於具有噴射管之燃燒器於加熱用於轉化氯 矽烷的反應器之用途。 【先前技術】 先前技術包括受熱的化學反應器，例如管狀反應器， 其經電力或使用液體或氣體燃料的燃燒器加熱。此燃燒器 直接用於反應器空間，該反應器空間中配置因應反應的化 學物質之裝置，例如管設備。因爲加熱，達到所須的高反 應溫度和/或因爲方法的吸熱度而導致的熱耗損得到補償 【發明內容】 物質在此化學反應器中之轉化基本上在金屬或其他材 料製的設備中進行。在高腐蝕性物質的情況中，亦可使用 陶瓷材料。在因應化學物質之金屬或其他材料製的設備失 效的情況中，這些物質與火燄氣體接觸，此會導致所不欲 的反應，其中的一些反應爲放熱反應。 因此必須設計出熱輸入同時分離介質之將反應爐予以 加熱之方法。藉合倂燃燒器、火燄管和噴射管達到此目的 ，其中火燄氣體無論如何都不會與燃燒槽內部接觸。 據此，本發明提供以燃燒器加熱反應器中來轉化氯矽 烷之用途，其中該燃燒器具有噴射管且該噴射管以氣密方 -5- 201250191 式環繞火燄和火燄管，因此燃燒空氣' 氣體和/或液體燃 料、和煙道氣無法進入反應爐空間。 【實施方式】 本發明中，將所述燃燒器設備稱爲“具有噴射管之燃 燒器”。 由於在與氯矽烷之反應的情況中，例如氯矽烷之氫化 反應的情況中，若因應設備的缺陷而導致反應介質進入爐 空間，則必須絕對防止煙道氣與反應氣體在反應爐中接觸 ，所以本發明之具有噴射管之燃燒器之用途之特別的優點 在於有助於氯矽烷之可靠的操作轉化。在煙道氣的濕氣與 氯矽烷接觸時，將會發生不欲的劇烈放熱反應。 具有噴射管之燃燒器的另一優點在於，能夠以經濟的 方式加熱反應爐而以比電力便宜的能量載體將轉化氯矽烷 ，且不會有前述缺點。 本發明之用途的另一優點在於，反應熱引至反應爐中 並因此以實質熱輻射形式進入反應介質中。此藉由防止與 燃燒器火燄的直接接觸而防止反應爐內部的局部過熱。此 加熱亦非常均勻。 根據本發明使用之具有噴射管之燃燒器設備的反應爐 內部爲所欲者，且可含括一或多者，其以反轉方式懸浮或 位於底部，或懸浮或位於燃燒槽側。 本發明之用途在與氯矽烷反應的情況中，特別是在四 氯化矽與氫形成三氯矽烷和氯化氫的氫化反應的情況中， -6- .201250191 特別有利。此反應溫度可維持高至1 1 0 0 °C而壓力高至5 0 巴表壓，且此反應可以無或有觸媒的方式操作。 【圖式簡單說明】 圖1係根據本發明之具有噴射管之燃燒器之較佳實施 例的示圖》 【主要元件符號說明】 1 :用以輸送化學反應物之配置 2 :火燄管 3 =噴射管 4 :反應爐 5 :隔絕物 6 :燃燒器 7 :燃燒空氣 8 :燃料 9 :煙道氣 Q :熱流

Claims (1)

  1. % 201250191 七 其 反應 申請專利範圍： 1. 一種燃燒器於加熱用於轉化氯矽烷的反應器之用途 中 該燃燒器具有噴射管且 該噴射管以氣密方式環繞火燄和火燄管，因此 燃燒空氣、氣體和/或液體燃料、和煙道氣無法進入 爐空間。
TW101109699A 2011-03-25 2012-03-21 Use of burners with a jet tube in reactors for conversion of chlorosilanes TW201250191A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE102011006116A DE102011006116A1 (de) 2011-03-25 2011-03-25 Verwendung von Brennern mit Strahlrohr in Reaktoren zur Umsetzung von Chlorsilanen

Publications (1)

Publication Number Publication Date
TW201250191A true TW201250191A (en) 2012-12-16

Family

ID=45808818

Family Applications (1)

Application Number Title Priority Date Filing Date
TW101109699A TW201250191A (en) 2011-03-25 2012-03-21 Use of burners with a jet tube in reactors for conversion of chlorosilanes

Country Status (8)

Country Link
US (1) US20140086816A1 (zh)
EP (1) EP2689186A1 (zh)
JP (1) JP2014522354A (zh)
KR (1) KR20140066972A (zh)
CN (1) CN103620305A (zh)
DE (1) DE102011006116A1 (zh)
TW (1) TW201250191A (zh)
WO (1) WO2012130543A1 (zh)

Family Cites Families (11)

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JPS5664216A (en) * 1979-10-29 1981-06-01 Kawasaki Steel Corp Combustion control of radiant tube burner
JPH02259322A (ja) * 1988-12-28 1990-10-22 Toshiba Ceramics Co Ltd ラジアントチューブ
US6423279B1 (en) * 2000-10-16 2002-07-23 Harvest Energy Technology, Inc. Compact endothermic catalytic reaction apparatus
US6773256B2 (en) * 2002-02-05 2004-08-10 Air Products And Chemicals, Inc. Ultra low NOx burner for process heating
JP5435188B2 (ja) * 2006-11-14 2014-03-05 三菱マテリアル株式会社 多結晶シリコンの製造方法および多結晶シリコン製造設備
CN101495408A (zh) * 2006-11-14 2009-07-29 三菱麻铁里亚尔株式会社 多晶硅的制备方法及多晶硅的制备设备
JP5316290B2 (ja) * 2008-08-05 2013-10-16 三菱マテリアル株式会社 トリクロロシラン製造装置及び製造方法
DE102008041974A1 (de) * 2008-09-10 2010-03-11 Evonik Degussa Gmbh Vorrichtung, deren Verwendung und ein Verfahren zur energieautarken Hydrierung von Chlorsilanen
JP5412447B2 (ja) * 2009-01-30 2014-02-12 電気化学工業株式会社 炭素含有材料からなる反応容器を備える反応装置、その反応装置の腐食防止方法およびその反応装置を用いたクロロシラン類の生産方法
DE102010007916B4 (de) * 2010-02-12 2013-11-28 Centrotherm Sitec Gmbh Verfahren zur Hydrierung von Chlorsilanen und Verwendung eines Konverters zur Durchführung des Verfahrens
US20110300050A1 (en) * 2010-06-08 2011-12-08 Memc Electronic Materials, Inc. Trichlorosilane Vaporization System

Also Published As

Publication number Publication date
WO2012130543A1 (de) 2012-10-04
CN103620305A (zh) 2014-03-05
DE102011006116A1 (de) 2012-09-27
US20140086816A1 (en) 2014-03-27
KR20140066972A (ko) 2014-06-03
EP2689186A1 (de) 2014-01-29
JP2014522354A (ja) 2014-09-04

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