CN103620305A - 在反应器内使用具有喷射管的燃烧器用于转换氯硅烷 - Google Patents

在反应器内使用具有喷射管的燃烧器用于转换氯硅烷 Download PDF

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CN103620305A
CN103620305A CN201280015287.4A CN201280015287A CN103620305A CN 103620305 A CN103620305 A CN 103620305A CN 201280015287 A CN201280015287 A CN 201280015287A CN 103620305 A CN103620305 A CN 103620305A
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chlorosilanes
heat
burner
flame
conversion
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B·韦纳
C·齐佩尔
G·施托赫尼奥尔
I·保利
N·施拉德贝克
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Evonik Operations GmbH
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Evonik Degussa GmbH
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    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/08—Compounds containing halogen
    • C01B33/107—Halogenated silanes
    • C01B33/1071—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F23—COMBUSTION APPARATUS; COMBUSTION PROCESSES
    • F23D—BURNERS
    • F23D14/00—Burners for combustion of a gas, e.g. of a gas stored under pressure as a liquid
    • F23D14/12—Radiant burners
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J12/00—Chemical processes in general for reacting gaseous media with gaseous media; Apparatus specially adapted therefor
    • B01J12/007—Chemical processes in general for reacting gaseous media with gaseous media; Apparatus specially adapted therefor in the presence of catalytically active bodies, e.g. porous plates
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/24—Stationary reactors without moving elements inside
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J4/00—Feed or outlet devices; Feed or outlet control devices
    • B01J4/001—Feed or outlet devices as such, e.g. feeding tubes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J8/00—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
    • B01J8/02—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with stationary particles, e.g. in fixed beds
    • B01J8/06—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with stationary particles, e.g. in fixed beds in tube reactors; the solid particles being arranged in tubes
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/08—Compounds containing halogen
    • C01B33/107—Halogenated silanes
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/08—Compounds containing halogen
    • C01B33/107—Halogenated silanes
    • C01B33/1071—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof
    • C01B33/10742—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by hydrochlorination of silicon or of a silicon-containing material
    • C01B33/10757—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by hydrochlorination of silicon or of a silicon-containing material with the preferential formation of trichlorosilane
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F23—COMBUSTION APPARATUS; COMBUSTION PROCESSES
    • F23C—METHODS OR APPARATUS FOR COMBUSTION USING FLUID FUEL OR SOLID FUEL SUSPENDED IN  A CARRIER GAS OR AIR 
    • F23C3/00—Combustion apparatus characterised by the shape of the combustion chamber
    • F23C3/002—Combustion apparatus characterised by the shape of the combustion chamber the chamber having an elongated tubular form, e.g. for a radiant tube
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B17/00—Furnaces of a kind not covered by any preceding group
    • F27B17/0016—Chamber type furnaces
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
    • F27D99/00—Subject matter not provided for in other groups of this subclass
    • F27D99/0001—Heating elements or systems
    • F27D99/0033—Heating elements or systems using burners
    • F27D99/0035—Heating indirectly through a radiant surface
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00049—Controlling or regulating processes
    • B01J2219/00051—Controlling the temperature
    • B01J2219/0015—Controlling the temperature by thermal insulation means
    • B01J2219/00155—Controlling the temperature by thermal insulation means using insulating materials or refractories
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00049—Controlling or regulating processes
    • B01J2219/00051—Controlling the temperature
    • B01J2219/00157—Controlling the temperature by means of a burner

Abstract

本发明的主题是将确定的燃烧器构造类型对反应器进行加热的应用，以用于转换氯硅烷，其中燃烧器具有喷射管，并且喷射管气密性地阻住火焰和火焰管，由此燃烧空气、气态的和/或液态的燃料、以及烟气不能进入反应炉的腔室内。其优点在于，使烟气与反应炉的真正的内室完全分开，即使在容纳氯硅烷的装置发生破损时，这也能使得在烟气潮气与氯硅烷之间不会发生严重的交互作用。这又使得可以使用气态的或液态的燃料来加热所述反应炉。避免了由于火焰直接接触而导致的局部过度热量输入，热量输入是均匀的。

Description

在反应器内使用具有喷射管的燃烧器用于转换氯硅烷
技术领域
本发明涉及一种使用具有喷射管的燃烧器来加热反应器，以用于转换氯硅烷。
背景技术
现有技术已知被加热的化学反应器，例如电加热的或通过燃烧器利用液态或气态燃料来加热的管式反应器。在此，燃烧器直接作用到反应器的腔室中，其中安装了用于容纳化学反应材料的装置、例如管道装置。通过加热达到了必要的高的反应温度和/或补充了由于吸热过程导致的热量损失。
在这种化学反应器中转换的材料通常被导入由金属或其它材料制成的装置中。如果是高腐蚀性的材料，也可以使用陶瓷材料。
如果由金属或其它材料制成的容纳化学材料的装置失效，则所述材料会与火焰气体接触，这可能导致非期望的、部分放热性的反应。
因此，存在一种用于加热反应炉的设计方案的要求，其中在分开介质的同时又能进行热量输入。该任务通过一由燃烧器、火焰管和喷射管形成的组合来角决，其中火焰气体不会与燃烧室内部进行接触。
发明内容
因此，本发明的主题是使用燃烧器来加热反应器用于转换氯硅烷，其中燃烧器具有喷射管，并且喷射管气密性地围住火焰和火焰管，由此燃烧空气、气态的和/或液态的燃料、和烟气不会进入反应炉的腔室内。
在本发明范围内，上述的燃烧器结构被称作“带喷射管的燃烧器”。
按照本发明的使用带喷射管的燃烧器首先具有下述优点，能够运行安全地转换氯硅烷，因为在反应炉内与氯硅烷发生反应时，例如在对氯硅烷进行氢化时，如果由于容纳用的装置损坏而导致反应介质进入燃烧室，必须绝对避免烟气与反应气体接触。当烟气中的湿气与氯硅烷接触时，通常会出现不期望的、剧烈的放热反应。
带喷射管的燃烧器的另一个优点在于，利用比电便宜的能源能够经济地加热反应炉用于转换氯硅烷，并且还无须忍受上述的缺点。
同样根据本发明的优点在于，能够以最大的程度、用热辐射的形式使得反应热量进入反应炉中并且进而进入反应介质内。由此，通过避免与燃烧火焰直接接触，不再发生反应炉的内装件局部过热。此外，加热特别均匀。
在此，按照本发明所使用的带喷射管的燃烧器在反应炉内部的布置可以任意的，并且可以单一地或有多部分组成地、从上面悬挂地、从下通过头部竖立地、从燃烧室的侧面开始地实现。
按照本发明的使用在下述情况下是特别有利的：与氯硅烷反应时、特别是利用氢气将四氯硅烷氢化成三氯硅烷和氯化氢。在此，反应温度最大可达到约1100℃的值和超压最大可达到约50bar，其中在发生反应时既可使用催化剂也可以不用。
附图说明
图1以示意图示出了按本发明所使用的带喷射管的燃烧器的一种优选的实施方案。
附图标记列表
1 用于携带化学反应物的装置
2 火焰管
3 喷射管
4 反应炉
5 绝缘部
6 燃烧器
7 燃烧空气
8 燃料
9 烟气
Q 热量流。

Claims (1)

1.将燃烧器用来对反应器进行加热的应用，以用于转换氯硅烷，其中燃烧器具有一喷射管，并且所述喷射管气密性地围住火焰和火焰管，由此燃烧空气、气态的和/或液态的燃料、以及烟气不能进入反应炉的腔室中。
CN201280015287.4A 2011-03-25 2012-02-27 在反应器内使用具有喷射管的燃烧器用于转换氯硅烷 Pending CN103620305A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102011006116A DE102011006116A1 (de) 2011-03-25 2011-03-25 Verwendung von Brennern mit Strahlrohr in Reaktoren zur Umsetzung von Chlorsilanen
DE102011006116.9 2011-03-25
PCT/EP2012/053251 WO2012130543A1 (de) 2011-03-25 2012-02-27 Verwendung von brennern mit strahlrohr in reaktoren zur umsetzung von chlorsilanen

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CN103620305A true CN103620305A (zh) 2014-03-05

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US (1) US20140086816A1 (zh)
EP (1) EP2689186A1 (zh)
JP (1) JP2014522354A (zh)
KR (1) KR20140066972A (zh)
CN (1) CN103620305A (zh)
DE (1) DE102011006116A1 (zh)
TW (1) TW201250191A (zh)
WO (1) WO2012130543A1 (zh)

Citations (6)

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JPS5664216A (en) * 1979-10-29 1981-06-01 Kawasaki Steel Corp Combustion control of radiant tube burner
JPH02259322A (ja) * 1988-12-28 1990-10-22 Toshiba Ceramics Co Ltd ラジアントチューブ
US20020043022A1 (en) * 2000-10-16 2002-04-18 Warren David W. Compact endothermic catalytic reaction apparatus
CN101495408A (zh) * 2006-11-14 2009-07-29 三菱麻铁里亚尔株式会社 多晶硅的制备方法及多晶硅的制备设备
CN101643213A (zh) * 2008-08-05 2010-02-10 三菱麻铁里亚尔株式会社 三氯硅烷制造装置及三氯硅烷的制造方法
WO2010087001A1 (ja) * 2009-01-30 2010-08-05 電気化学工業株式会社 炭素含有材料からなる反応容器を備える反応装置、その反応装置の腐食防止方法およびその反応装置を用いたクロロシラン類の生産方法

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US6773256B2 (en) * 2002-02-05 2004-08-10 Air Products And Chemicals, Inc. Ultra low NOx burner for process heating
JP5435188B2 (ja) * 2006-11-14 2014-03-05 三菱マテリアル株式会社 多結晶シリコンの製造方法および多結晶シリコン製造設備
DE102008041974A1 (de) * 2008-09-10 2010-03-11 Evonik Degussa Gmbh Vorrichtung, deren Verwendung und ein Verfahren zur energieautarken Hydrierung von Chlorsilanen
DE102010007916B4 (de) * 2010-02-12 2013-11-28 Centrotherm Sitec Gmbh Verfahren zur Hydrierung von Chlorsilanen und Verwendung eines Konverters zur Durchführung des Verfahrens
US20110300050A1 (en) * 2010-06-08 2011-12-08 Memc Electronic Materials, Inc. Trichlorosilane Vaporization System

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5664216A (en) * 1979-10-29 1981-06-01 Kawasaki Steel Corp Combustion control of radiant tube burner
JPH02259322A (ja) * 1988-12-28 1990-10-22 Toshiba Ceramics Co Ltd ラジアントチューブ
US20020043022A1 (en) * 2000-10-16 2002-04-18 Warren David W. Compact endothermic catalytic reaction apparatus
CN101495408A (zh) * 2006-11-14 2009-07-29 三菱麻铁里亚尔株式会社 多晶硅的制备方法及多晶硅的制备设备
CN101643213A (zh) * 2008-08-05 2010-02-10 三菱麻铁里亚尔株式会社 三氯硅烷制造装置及三氯硅烷的制造方法
WO2010087001A1 (ja) * 2009-01-30 2010-08-05 電気化学工業株式会社 炭素含有材料からなる反応容器を備える反応装置、その反応装置の腐食防止方法およびその反応装置を用いたクロロシラン類の生産方法

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KR20140066972A (ko) 2014-06-03
JP2014522354A (ja) 2014-09-04
DE102011006116A1 (de) 2012-09-27
US20140086816A1 (en) 2014-03-27
EP2689186A1 (de) 2014-01-29
TW201250191A (en) 2012-12-16
WO2012130543A1 (de) 2012-10-04

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Application publication date: 20140305