TW201245853A - Method for making a photocurable article - Google Patents

Method for making a photocurable article Download PDF

Info

Publication number
TW201245853A
TW201245853A TW101108042A TW101108042A TW201245853A TW 201245853 A TW201245853 A TW 201245853A TW 101108042 A TW101108042 A TW 101108042A TW 101108042 A TW101108042 A TW 101108042A TW 201245853 A TW201245853 A TW 201245853A
Authority
TW
Taiwan
Prior art keywords
mold
photocurable composition
adhesion
imprinting
composition layer
Prior art date
Application number
TW101108042A
Other languages
English (en)
Chinese (zh)
Inventor
Masaru Nakagawa
Yoshitaka Tsukidate
Takeshi Ohsaki
Hiroto Miyake
Original Assignee
Toyo Gosei Co Ltd
Univ Tohoku
Daicel Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toyo Gosei Co Ltd, Univ Tohoku, Daicel Corp filed Critical Toyo Gosei Co Ltd
Publication of TW201245853A publication Critical patent/TW201245853A/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Epoxy Resins (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Polymerisation Methods In General (AREA)
TW101108042A 2011-03-10 2012-03-09 Method for making a photocurable article TW201245853A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011053601A JP2014103135A (ja) 2011-03-10 2011-03-10 光硬化物の製造方法

Publications (1)

Publication Number Publication Date
TW201245853A true TW201245853A (en) 2012-11-16

Family

ID=46798107

Family Applications (1)

Application Number Title Priority Date Filing Date
TW101108042A TW201245853A (en) 2011-03-10 2012-03-09 Method for making a photocurable article

Country Status (3)

Country Link
JP (1) JP2014103135A (fr)
TW (1) TW201245853A (fr)
WO (1) WO2012121143A1 (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105900211A (zh) * 2014-01-29 2016-08-24 株式会社大赛璐 纳米压印用光固化性组合物、以及使用了该组合物的微细图案的形成方法

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP4429861A1 (fr) * 2021-11-14 2024-09-18 Daniel S. Clark Système et procédé de moulage, d'impression et de coulage au-dessous de zéro

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8076386B2 (en) * 2004-02-23 2011-12-13 Molecular Imprints, Inc. Materials for imprint lithography
JP2008246729A (ja) * 2007-03-29 2008-10-16 Sumitomo Heavy Ind Ltd 成形装置及びそれによる成形方法
JP4963254B2 (ja) * 2007-03-30 2012-06-27 東京応化工業株式会社 ナノインプリント用の膜形成組成物、並びに構造体の製造方法及び構造体
JP5015663B2 (ja) * 2007-05-31 2012-08-29 旭化成イーマテリアルズ株式会社 インプリント用感光性樹脂積層体
JP5435879B2 (ja) * 2008-02-14 2014-03-05 株式会社ダイセル ナノインプリント用硬化性樹脂組成物
JP5208646B2 (ja) * 2008-09-26 2013-06-12 旭化成イーマテリアルズ株式会社 成形体、並びに成形体の製造方法、及び成形体を転写した転写体の製造方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105900211A (zh) * 2014-01-29 2016-08-24 株式会社大赛璐 纳米压印用光固化性组合物、以及使用了该组合物的微细图案的形成方法

Also Published As

Publication number Publication date
WO2012121143A1 (fr) 2012-09-13
JP2014103135A (ja) 2014-06-05

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