TW201244569A - Method of forming copper wiring, method of manufacturing wiring board, and wiring board - Google Patents

Method of forming copper wiring, method of manufacturing wiring board, and wiring board Download PDF

Info

Publication number
TW201244569A
TW201244569A TW101109784A TW101109784A TW201244569A TW 201244569 A TW201244569 A TW 201244569A TW 101109784 A TW101109784 A TW 101109784A TW 101109784 A TW101109784 A TW 101109784A TW 201244569 A TW201244569 A TW 201244569A
Authority
TW
Taiwan
Prior art keywords
suspension
copper
wiring
copper particles
wiring pattern
Prior art date
Application number
TW101109784A
Other languages
English (en)
Chinese (zh)
Inventor
Hiroshi Mataki
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Publication of TW201244569A publication Critical patent/TW201244569A/zh

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/22—Secondary treatment of printed circuits
    • H05K3/227—Drying of printed circuits
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/12—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns
    • H05K3/1283—After-treatment of the printed patterns, e.g. sintering or curing methods
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00—Printed circuits
    • H05K1/02—Details
    • H05K1/09—Use of materials for the conductive, e.g. metallic pattern
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/22—Secondary treatment of printed circuits
    • H05K3/24—Reinforcing of the conductive pattern
    • H05K3/245—Reinforcing conductive patterns made by printing techniques or by other techniques for applying conductive pastes, inks or powders; Reinforcing other conductive patterns by such techniques
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W70/00—Package substrates; Interposers; Redistribution layers [RDL]
    • H10W70/01—Manufacture or treatment
    • H10W70/05—Manufacture or treatment of insulating or insulated package substrates, or of interposers, or of redistribution layers
    • H10W70/098—Applying pastes or inks, e.g. screen printing
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00—Printed circuits
    • H05K1/02—Details
    • H05K1/09—Use of materials for the conductive, e.g. metallic pattern
    • H05K1/092—Dispersed materials, e.g. conductive pastes or inks
    • H05K1/097—Inks comprising nanoparticles and specially adapted for being sintered at low temperature
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/02—Fillers; Particles; Fibers; Reinforcement materials
    • H05K2201/0203—Fillers and particles
    • H05K2201/0263—Details about a collection of particles
    • H05K2201/0266—Size distribution
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/02—Details related to mechanical or acoustic processing, e.g. drilling, punching, cutting, using ultrasound
    • H05K2203/0278—Flat pressure, e.g. for connecting terminals with anisotropic conductive adhesive
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/14—Related to the order of processing steps
    • H05K2203/1476—Same or similar kind of process performed in phases, e.g. coarse patterning followed by fine patterning
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/12—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns
    • H05K3/1241—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns by ink-jet printing or drawing by dispensing
    • H05K3/125—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns by ink-jet printing or drawing by dispensing by ink-jet printing
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W20/00—Interconnections in chips, wafers or substrates
    • H10W20/40—Interconnections external to wafers or substrates, e.g. back-end-of-line [BEOL] metallisations or vias connecting to gate electrodes
    • H10W20/41—Interconnections external to wafers or substrates, e.g. back-end-of-line [BEOL] metallisations or vias connecting to gate electrodes characterised by their conductive parts
    • H10W20/44—Conductive materials thereof
    • H10W20/4473—Conductive organic materials, e.g. conductive adhesives or conductive inks

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Manufacturing Of Electric Cables (AREA)
  • Electrodes Of Semiconductors (AREA)
TW101109784A 2011-03-24 2012-03-22 Method of forming copper wiring, method of manufacturing wiring board, and wiring board TW201244569A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011065885A JP5544324B2 (ja) 2011-03-24 2011-03-24 銅配線の形成方法および配線基板の製造方法

Publications (1)

Publication Number Publication Date
TW201244569A true TW201244569A (en) 2012-11-01

Family

ID=46879292

Family Applications (1)

Application Number Title Priority Date Filing Date
TW101109784A TW201244569A (en) 2011-03-24 2012-03-22 Method of forming copper wiring, method of manufacturing wiring board, and wiring board

Country Status (6)

Country Link
US (1) US20140020938A1 (https=)
EP (1) EP2690938A4 (https=)
JP (1) JP5544324B2 (https=)
CN (1) CN103460817A (https=)
TW (1) TW201244569A (https=)
WO (1) WO2012128140A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6133149B2 (ja) * 2013-06-28 2017-05-24 古河電気工業株式会社 導電性ペースト、及びその製造方法
JP2016009731A (ja) * 2014-06-24 2016-01-18 コニカミノルタ株式会社 導電パターン形成方法および導電パターン形成装置

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0513412A (ja) 1991-07-02 1993-01-22 Nippon Steel Corp 半導体集積回路の配線
JPH06215617A (ja) * 1993-01-14 1994-08-05 Asahi Chem Ind Co Ltd 焼成用導電性ペースト
JPH10178247A (ja) * 1996-12-18 1998-06-30 Kyocera Corp 配線基板およびその製造方法
JP3599950B2 (ja) * 1997-04-16 2004-12-08 株式会社アルバック 金属ペーストの焼成方法
JP3690552B2 (ja) 1997-05-02 2005-08-31 株式会社アルバック 金属ペーストの焼成方法
JPH11312859A (ja) * 1998-04-28 1999-11-09 Murata Mfg Co Ltd 回路パターン形成方法及びそれにより形成された多層配線基板
JP2003311196A (ja) 2002-04-19 2003-11-05 Seiko Epson Corp 膜パターンの形成方法、膜パターン形成装置、導電膜配線、電気光学装置、電子機器、非接触型カード媒体、圧電体素子、並びにインクジェット式記録ヘッド
CN100488339C (zh) * 2003-05-16 2009-05-13 播磨化成株式会社 形成微细铜颗粒烧结产物类的微细形状导电体的方法
EP1626614B1 (en) * 2003-05-16 2013-08-28 Harima Chemicals, Inc. Method for forming fine copper particle sintered product type of electric conductor having fine shape, method for forming fine copper wiring and thin copper film
KR100819876B1 (ko) * 2006-09-19 2008-04-07 삼성전기주식회사 합금배선기판 및 그 제조방법
JP4858057B2 (ja) * 2006-09-29 2012-01-18 大日本印刷株式会社 導電性基板の製造方法
EP2204824A4 (en) * 2007-10-22 2011-03-30 Hitachi Chemical Co Ltd Method of forming copper wiring pattern and copper oxide particle dispersion for use in the same
JP5467855B2 (ja) * 2009-03-09 2014-04-09 富士フイルム株式会社 ラインパターン形成方法

Also Published As

Publication number Publication date
CN103460817A (zh) 2013-12-18
JP2012204467A (ja) 2012-10-22
WO2012128140A1 (ja) 2012-09-27
US20140020938A1 (en) 2014-01-23
EP2690938A4 (en) 2014-08-13
JP5544324B2 (ja) 2014-07-09
EP2690938A1 (en) 2014-01-29

Similar Documents

Publication Publication Date Title
JP3774638B2 (ja) インクジェット印刷法を利用する回路パターンの形成方法
Park et al. Direct writing of copper conductive patterns by ink-jet printing
US20150069649A1 (en) Powder Particle Layerwise Three-Dimensional Printing Process
TWI652319B (zh) 導電墨水及其製造方法與導電膜
JP6519274B2 (ja) 立体造形用粉末材料、立体造形材料セット、立体造形物製造装置、及び立体造形物の製造方法
Wu et al. Laser densification of alumina powder beds generated using aerosol assisted spray deposition
CN102144053B (zh) 用于形成基于碳化硅的不粘涂层的方法
KR20230021156A (ko) 인쇄된 물품 제조 시스템 및 방법
CN101128550A (zh) 金属纳米颗粒的水基分散液
US11260556B2 (en) Additive manufacturing in an atmosphere including oxygen
JP2014133414A (ja) 構造体の製造方法および製造装置
JP2018080359A (ja) 立体造形用粉末材料、立体造形材料セット、立体造形物製造装置、及び立体造形物の製造方法
JP6569269B2 (ja) 立体造形用粉末材料、立体造形材料セット、立体造形物製造装置、及び立体造形物の製造方法
CN102241844A (zh) 复合电介质材料及其制备方法
WO2023100676A1 (ja) 中空シリカ粒子及びその製造方法
WO2023218948A1 (ja) シリカ粒子分散液
KR20150141203A (ko) 나노 입자 및 바인더를 함유한 잉크 조성물 및 이를 이용한 3차원 물품의 제조방법
TW201244569A (en) Method of forming copper wiring, method of manufacturing wiring board, and wiring board
TW201809158A (zh) 導電性糊及導電性圖案的形成方法
JP2018066049A (ja) 立体造形用粉末材料、立体造形材料セット、立体造形物製造装置、及び立体造形物の製造方法
JP5495044B2 (ja) 緻密な金属銅膜の製造方法及びそれに用いる液状組成物、それから得られる緻密な金属銅膜、導体配線、熱伝導路、接合体
CN100438989C (zh) 化学吸附膜的形成方法以及化学吸附膜
Jiang et al. Controlled convective self-assembly of silver nanoparticles in volatile organic solvent and its application in electronics
US20140083753A1 (en) Method of forming copper wiring, method of manufacturing wiring board, and wiring board
CN106274110B (zh) 一种低温喷墨印刷纳米金属图案的方法