TW201203374A - In line type substrate processing apparatus - Google Patents

In line type substrate processing apparatus Download PDF

Info

Publication number
TW201203374A
TW201203374A TW100114278A TW100114278A TW201203374A TW 201203374 A TW201203374 A TW 201203374A TW 100114278 A TW100114278 A TW 100114278A TW 100114278 A TW100114278 A TW 100114278A TW 201203374 A TW201203374 A TW 201203374A
Authority
TW
Taiwan
Prior art keywords
reaction chamber
substrate
unit
plasma
processing apparatus
Prior art date
Application number
TW100114278A
Other languages
English (en)
Chinese (zh)
Inventor
Su-Woong Kim
Kyung-Ho Lee
Soon-Bin Jung
Original Assignee
Tera Semicon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tera Semicon Corp filed Critical Tera Semicon Corp
Publication of TW201203374A publication Critical patent/TW201203374A/zh

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
    • H01L21/67161—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the layout of the process chambers
    • H01L21/67173—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the layout of the process chambers in-line arrangement
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
    • H01L21/67207—Apparatus for manufacturing or treating in a plurality of work-stations comprising a chamber adapted to a particular process
    • H01L21/67213—Apparatus for manufacturing or treating in a plurality of work-stations comprising a chamber adapted to a particular process comprising at least one ion or electron beam chamber

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Plasma Technology (AREA)
  • Physical Vapour Deposition (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
TW100114278A 2010-04-26 2011-04-25 In line type substrate processing apparatus TW201203374A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020100038603A KR101129038B1 (ko) 2010-04-26 2010-04-26 인라인 기판처리 장치

Publications (1)

Publication Number Publication Date
TW201203374A true TW201203374A (en) 2012-01-16

Family

ID=44862026

Family Applications (1)

Application Number Title Priority Date Filing Date
TW100114278A TW201203374A (en) 2010-04-26 2011-04-25 In line type substrate processing apparatus

Country Status (5)

Country Link
JP (1) JP2013530514A (ko)
KR (1) KR101129038B1 (ko)
CN (1) CN102859722A (ko)
TW (1) TW201203374A (ko)
WO (1) WO2011136525A2 (ko)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101371709B1 (ko) * 2012-09-24 2014-03-07 주식회사 선익시스템 기판 전처리 시스템
JP6285446B2 (ja) 2012-10-09 2018-02-28 アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ 割り送り式インライン基板処理ツール
KR101446132B1 (ko) * 2012-12-24 2014-10-06 엘아이지에이디피 주식회사 기판 처리 장치
KR101392491B1 (ko) * 2012-12-24 2014-05-27 엘아이지에이디피 주식회사 기판 처리 장치
KR20150144585A (ko) * 2014-06-17 2015-12-28 엘지전자 주식회사 태양 전지의 후처리 장치
JP6449074B2 (ja) * 2015-03-25 2019-01-09 住友化学株式会社 基板処理装置及び基板処理方法
KR101713196B1 (ko) * 2015-06-30 2017-03-09 주식회사 테라세미콘 인라인 열처리 장치
JP6529914B2 (ja) * 2016-01-05 2019-06-12 住重アテックス株式会社 水素プラズマ処理装置および水素プラズマ処理方法
CN111850518A (zh) * 2020-07-21 2020-10-30 上海理想万里晖薄膜设备有限公司 托盘预热腔及对应的pecvd设备

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3211356B2 (ja) * 1992-04-22 2001-09-25 株式会社島津製作所 インライン式プラズマｃｖｄ装置
KR100691875B1 (ko) * 2005-03-25 2007-03-09 최진문 대기압 플라즈마 유전체 세정장치
KR100979189B1 (ko) * 2007-12-20 2010-08-31 다이나믹솔라디자인 주식회사 연속 기판 처리 시스템

Also Published As

Publication number Publication date
WO2011136525A3 (ko) 2012-01-26
WO2011136525A2 (ko) 2011-11-03
CN102859722A (zh) 2013-01-02
KR20110119098A (ko) 2011-11-02
JP2013530514A (ja) 2013-07-25
KR101129038B1 (ko) 2012-03-27

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