WO2011136525A3 - 인라인 기판 처리 장치 - Google Patents
인라인 기판 처리 장치 Download PDFInfo
- Publication number
- WO2011136525A3 WO2011136525A3 PCT/KR2011/003002 KR2011003002W WO2011136525A3 WO 2011136525 A3 WO2011136525 A3 WO 2011136525A3 KR 2011003002 W KR2011003002 W KR 2011003002W WO 2011136525 A3 WO2011136525 A3 WO 2011136525A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- chamber
- treating apparatus
- substrate
- inline substrate
- inline
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
- H01L21/67161—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the layout of the process chambers
- H01L21/67173—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the layout of the process chambers in-line arrangement
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
- H01L21/67207—Apparatus for manufacturing or treating in a plurality of work-stations comprising a chamber adapted to a particular process
- H01L21/67213—Apparatus for manufacturing or treating in a plurality of work-stations comprising a chamber adapted to a particular process comprising at least one ion or electron beam chamber
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Plasma Technology (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013507876A JP2013530514A (ja) | 2010-04-26 | 2011-04-25 | インライン基板処理装置 |
CN201180021270.5A CN102859722A (zh) | 2010-04-26 | 2011-04-25 | 直列式基板处理装置 |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020100038603A KR101129038B1 (ko) | 2010-04-26 | 2010-04-26 | 인라인 기판처리 장치 |
KR10-2010-0038603 | 2010-04-26 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2011136525A2 WO2011136525A2 (ko) | 2011-11-03 |
WO2011136525A3 true WO2011136525A3 (ko) | 2012-01-26 |
Family
ID=44862026
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/KR2011/003002 WO2011136525A2 (ko) | 2010-04-26 | 2011-04-25 | 인라인 기판 처리 장치 |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP2013530514A (ko) |
KR (1) | KR101129038B1 (ko) |
CN (1) | CN102859722A (ko) |
TW (1) | TW201203374A (ko) |
WO (1) | WO2011136525A2 (ko) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101371709B1 (ko) * | 2012-09-24 | 2014-03-07 | 주식회사 선익시스템 | 기판 전처리 시스템 |
US9406538B2 (en) | 2012-10-09 | 2016-08-02 | Applied Materials, Inc. | Indexed inline substrate processing tool |
KR101392491B1 (ko) * | 2012-12-24 | 2014-05-27 | 엘아이지에이디피 주식회사 | 기판 처리 장치 |
KR101446132B1 (ko) * | 2012-12-24 | 2014-10-06 | 엘아이지에이디피 주식회사 | 기판 처리 장치 |
KR20150144585A (ko) * | 2014-06-17 | 2015-12-28 | 엘지전자 주식회사 | 태양 전지의 후처리 장치 |
JP6449074B2 (ja) * | 2015-03-25 | 2019-01-09 | 住友化学株式会社 | 基板処理装置及び基板処理方法 |
KR101713196B1 (ko) * | 2015-06-30 | 2017-03-09 | 주식회사 테라세미콘 | 인라인 열처리 장치 |
JP6529914B2 (ja) * | 2016-01-05 | 2019-06-12 | 住重アテックス株式会社 | 水素プラズマ処理装置および水素プラズマ処理方法 |
CN111850518B (zh) * | 2020-07-21 | 2024-07-19 | 理想万里晖半导体设备(上海)股份有限公司 | 托盘预热腔及对应的pecvd设备 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05295551A (ja) * | 1992-04-22 | 1993-11-09 | Shimadzu Corp | インライン式プラズマcvd装置 |
KR20060102781A (ko) * | 2005-03-25 | 2006-09-28 | 최진문 | 대기압 플라즈마 유전체 세정장치 |
KR20090066996A (ko) * | 2007-12-20 | 2009-06-24 | 다이나믹솔라디자인 주식회사 | 연속 기판 처리 시스템 |
-
2010
- 2010-04-26 KR KR1020100038603A patent/KR101129038B1/ko active IP Right Grant
-
2011
- 2011-04-25 JP JP2013507876A patent/JP2013530514A/ja not_active Withdrawn
- 2011-04-25 CN CN201180021270.5A patent/CN102859722A/zh active Pending
- 2011-04-25 WO PCT/KR2011/003002 patent/WO2011136525A2/ko active Application Filing
- 2011-04-25 TW TW100114278A patent/TW201203374A/zh unknown
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05295551A (ja) * | 1992-04-22 | 1993-11-09 | Shimadzu Corp | インライン式プラズマcvd装置 |
KR20060102781A (ko) * | 2005-03-25 | 2006-09-28 | 최진문 | 대기압 플라즈마 유전체 세정장치 |
KR20090066996A (ko) * | 2007-12-20 | 2009-06-24 | 다이나믹솔라디자인 주식회사 | 연속 기판 처리 시스템 |
Also Published As
Publication number | Publication date |
---|---|
KR101129038B1 (ko) | 2012-03-27 |
JP2013530514A (ja) | 2013-07-25 |
WO2011136525A2 (ko) | 2011-11-03 |
TW201203374A (en) | 2012-01-16 |
KR20110119098A (ko) | 2011-11-02 |
CN102859722A (zh) | 2013-01-02 |
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