201139249 x:基板運送方向 五、本案若有化學式時，請揭示最能顯示發明 徵的化學式： 研 六、發明說明： 【發明所屬之技術領域】 本發明是關於浮起運送基板（substrate)的運适I 置’及對浮起運送的基板塗佈塗佈液之塗佈系統。 【先前技術】 為了製造液晶顯示器（liquid crystal display)或電 聚顯示器（plasma display)等的平面面板顯示器（f 、1 ί a t panel display)或太陽電池板（s〇lar cell panel)， 璃基板（glass substrate)上塗佈有塗佈液（例如φ $阻 (resist)液）的塗佈基板被使用。將塗佈液塗佈於這種坡螭 基板的裝置例如記載於專利文獻1的塗佈系統被使用。 該塗佈系統包含：浮起運送玻璃基板之運送裝置；具有 對浮起運送的玻璃基板的頂面吐出塗佈液的開縫喷嘴 (slit nozzle)之塗佈裝置。運送裝置具有：由頂面喷射氣 體並使玻璃基板浮起之浮起平台；吸附所浮起的玻璃基板 的侧部之吸附機構；藉由使該吸附機構移動於基板運送方 向，運送吸附的玻璃基板之運送驅動手&。 依照該塗佈系統，透過藉由浮起平台使玻璃基板浮起 3 201139249 於規定高度’藉由運送驅動手段使吸附該玻璃基板的側部 的吸附機構移動，可在使玻璃基板浮起的狀態下運送，對 " 该玻璃基板塗佈塗佈液。 [專利文獻1 ]日本國特開2 0 0 5 - 2 4 4 1 5 5號公報（參照 圖2) ' 【發明内容】 玻璃基板由於厚度與其面積相比非常薄，故在浮起平 σ上使其浮起於規疋南度時，成為例如玻璃基板的側部（僅 側端部）比該規定高度（約未滿lmm)還上面而翹曲的形 狀。可考慮為此乃因玻璃基板的側部為自由#，該側部透 過由浮起平台的左右緣部的區域噴射的空氣而被抬的更 而且，在塗佈系統中由抑 生的塗佈不均的觀點，塗佈塗 玻璃基板整體上為水平狀較佳 附玻璃基板的側部底面的吸附 高度同一的高度。 制因塗佈液的膜厚不均勻產 佈液時令浮起於規定高度的 。因此，前述吸附機構將吸 面（頂面）設定為與前述規定 因此’若為玻璃基板的側部比前述規定高度還上面而 翹曲的形& ’則成為在該側部的底面與吸附機構的吸附面 之間產生間隙的狀態…及附機構變成空吸引，有無法確實 地吸附保持玻璃基板之虞。 因此，為了吸附機構確實地吸附玻璃基板，以下的手 段(""an8)被考慮。亦即’預先將吸附機構(吸附面）配置於 201139249 稍微偏上的位置，或藉由致動器（actuator)使吸附機構移 k 動至稍微偏上的位置，俾沿著處於翹曲的形狀的玻璃基板 > 的側部被考慮。 但是此情形，成為玻璃基板在翹曲的形狀下被運送， 玻璃基板與塗佈裝置的開縫喷嘴的間隔依照位置而不同， 會產生塗佈不均。 因此’以吸附後降下使吸附面位於稍微偏上的位置的 吸附機構之構成被考慮。但是’即使想在吸附後降下吸附 機構並解除玻璃基板的輕曲，由於其下降量極少（未滿 1 mm)’為了實現這種極少的位置控制，需要非常精密的構 成及控制’如此會與裝置的成本上升（c〇st up)有關。 此外，如此被浮起運送的玻璃基板之中一部分變高的 部位不限於側部，例如有時也會在中央部產生，而且=、 有依照運送裝置的形式而在各式各樣的部位變高之虞。也 因此，本發明的目地為提供—種可確實地保持浮 基板，而且可藉由簡單的構成整體上令所保持的基拓的 之運送裝i ’以及可將塗佈液塗佈於如 垣 的基板之塗佈系統。 于立+起運送 本發明的運送裝置其特徵包含：使基板浮起之 台，吸附藉由前述浮起平台浮 '予起平 挑棋'予起的刖述基板的底面之哎 藉由使前述吸附機構移動於基板運送方& 附 構吸附的前述基板浮起於規定高度的狀態下運使該 «玄基板運送方向之運送 ·、、運送於 藉由接觸前述美板的前比 前述吸附機構具有:具有 这基板的㈣底面，將該基板定位於前述規: 5 201139249 高度的接觸面之定位部；可吸附前述基板的前述底面， 附前若比前述接觸面還突出於上面規定長度而吸附的話 則收縮該規定長度於下面之吸附部。 依照本發明’因吸附機構的吸附部在朝基板的底面 附前’比定位部的接觸面還突出於上面規定長度，故例 即使浮起於規定高度的基板翹曲且該基板的一部分（吸 部吸附的部分）位於比該規定高度還上面，吸附部也能吸 該部分的底面’可確實地保持基板。 而且’吸附部一吸附基板的底面，就透過藉由吸引 吸附部内產生的負壓，使得該吸附部收縮前述規定長度 下面’故使吸附的底面接觸定位部的接觸面，將基板（吸 的部分）定位於前述規定高度。然後’可藉由由前述定位 與前述吸附部構成的簡單的構成，確實地保持基板’並 整體上可使所保持的基板平坦。 而且，在前述定位部配設有吸引接觸前述接觸面的 述基板的前述底面之吸引部較佳。 此情形，因吸引部更進一步吸引藉由吸附部吸附而 觸定位部的接觸面的基板的底面，故可更強地保持基板 特別是當在運送開始及停止時產生的加速度大時，有基 與吸附部一起在基板的面方向稍微振動之虞，而且有時 基板與吸附部之間於運送方向稍微移位’可藉由吸引部 制該移位。 而且，當前述吸附部的主少一部分為在上下方向伸 自如的伸縮囊（be 1 1 ows)構造時’吸附部一吸附於基板的 吸 5 吸 如 附 附 在 於 附 部 且 前 接 0 板 在 抑 縮 底 201139249 面，就透過藉由 ' 容易收縮。然後 - 於比接觸面還上 此外，當部 配設於吸附部的 上端部配設伸縮 故與基板的密著 而且，前述 有複數個，該吸 面上較佳。 此情形，因 基板。此外，為 的單一的長的吸 其縱向全體將該 上。但是，在吸 下’每一吸附機 面調整於同一平 而且，本發 具有在藉由前述 於規定高度的狀 基板的頂面吐出 依照前述運 且可將該基板定 頂面由塗佈裝置 吸 引 在 吸 附 部 内 產 生 吸 附 — 被 解 除 吸 面 的 狀 態 〇 分 地 配 設 伸 縮 囊 構 造 下 部 或 中 央 部 也 可 以 囊 構 造 部 的 情 形 因 該 性 提 y 可 更 提 尚 吸 吸 附 機 構 沿 著 前 述 基 附 機 構 各 白 的 前 述 接 吸 附 機 構 配 設 有 複 數 了 加 強 基 板 的 保 持 力 附 機 構 (接觸面）也 可 吸 附 機構 的 接 觸 面 製 附 機 構 具 有 規 定 間 隔 構 調 整 接 觸 面 的 咼 度 面 上 的 作 業 變 的 容 易 明 的 塗 佈 系 統 其 特: 徵 運 送 骏 置 的 前 述 浮 起 態 下 對 藉 由 前 述 運 塗 佈 液 的 吐 出 σ 之 塗 送 裝 置 » 如 前 述 ， 可 位 於 前 述 規 定 高 度 〇 的 吐 出 σ 吐 出 塗 佈 液 的負壓，使得吸附部 附部就能恢復到突出 時，將伸縮囊構造部 ，惟在與基板接觸的 上端部具有柔軟性， 附性能。 板具有規定間隔配設 觸面被設定於同一平 個，故可更強地保持 ，設置沿著基板連續 以，惟此情形需遍及 造及調整於同一平面 配設有複數個的情形 即可’將所有的接觸 0 包含：前述運送裝置； 平台使前述基板浮起 送驅動手段運送的該 佈裝置。 確實地保持基板，而 因此’因在對基板的 時’能以規定高度浮 7 201139249 起運送4基板’而就該基板之藉由前述吸附機構吸附的 •附部分也被定位於該規定高度，故整體上可使基板平坦 因此可保持定的被浮起運送的基板與塗佈裝置的吐 口的間隔，可抑制塗佈不均的產生。 而且別述浮起平台具有：包含前述塗佈裝置將塗佈 塗佈二前述2板的塗佈作業位置之主單元（mainunit); i主單元的則述基板運送方向配設於上游側與下游側之 的至少一方之次單元（subunit)較佳。 由於為了抑制塗佈不均，應使基板與塗佈裝置的吐 口的間隔一疋，故視包含塗佈作業位置的主單元為基板 竽起円度精度南較佳。此外，浮起高度精度是指基板的 I量的個別差異（lndividual difference)的程度，例如 '予起平台由其頂面噴射氣體並使基板浮起的方式的情 下，由於氣體的喷射量的個別差異所產生的基板的浮起 的個別差異的程度。，亦即’浮起高度精度高是意味著氣 的噴射量的個別差異小，基板的浮起量遍及全體均勻。 而且，配設於主單元的上游側與下游側的至少一方 人單I即使基板的浮起高度精度稍低，也不會給予塗佈 岣影響。因此’次單元可採用精度比主單元低的，可一 承在浮起單元中必要的長度，一邊降低裝置的成本。 【發明的功效】 依照本發明的運送裝置，可藉由吸附機構的定位部 R/I . ' °卩’以簡單的構成確實且整體上平坦地保持浮起的 吸 0 出 液 在 中 出 的 浮 在 形 量 體 的 不 邊 及 基 8 201139249 板，而且，依 • 如此保持的基 - 的塗佈基板。 【實施方式】 以下根據 圖1是顯 該塗佈系統是 佈藥液或光阻 該塗佈系 送裝置40包$ 平台1 ;吸附3 底面（以下也浪 機構3移動於 板W運送於同 稱基板運送方 後方向在水平 方向及左右方 塗佈系統 塗佈液的開縫 5中塗佈液被, 嘴6吐出，將 左右方向長且 向的約略全長 照本發明的塗佈系統，藉由將塗佈液塗佈於 板’可抑制塗佈不均的產生，可得到品質佳 圖面說明本發明的實施的形態。 示本發明的塗佈系統的概略構成之斜視圖。 對浮起運送的薄板狀的基板（玻璃基板）W塗 液等的液狀物的塗佈液。 統具有浮起運送基板W的運送裝置40,該運 、：由頂面2喷射氣體並使基板w浮起之浮起 墙由該洋起平台丨浮起的基板W的側部8的 参為側部底面）之吸附機構3 ;藉由使該吸附 基板運送方向X ’將該吸附機構3吸附的基 方向X之運送驅動手段4。在本實施形態中 向X為前方向，稱其相反為後方向，稱與前 面上正交的方向為左右方向，稱正交於前後 向的雙方的方向為上下方向（高度方向）。 更匕3 ,、有對浮起運送的基板w的頂面吐出 喷嘴（吐出口）6之塗佈裝置5。在該塗佈裝置 共給至開縫喷嘴6，·5Γ #丄& 了糟由塗佈液被由開縫噴 塗佈液塗佈於甚_ b 、土板w。開縫噴嘴6是藉由在 水平的開縫（s 1 i t 也成’對基板W的左右方 (全寬）塗佈塗佈液。 201139249 圖2是由左右方向看將塗佈液塗佈於基板W的塗佈作 業位置P之說明圖。基板W成為藉由浮起平台1由運送裝 置4 0的基準面浮起於規定高度h的狀態，在該狀態下，基 板W的側部底面9藉由前述吸附機構3吸附。此外，前述[基 準面]若為關於高度方向的位置成為基準的水平面的話即 可，在本實施形態中為浮起平台1的頂面2。 而且，該基板W在藉由前述運送驅動手段4 (參照圖1) 運送的途中，塗佈液被由開縫喷嘴6對其頂面塗佈。 在圖1中，本實施形態的浮起平台1被分割於前後方 向，由上游側起具有上游側次單元3 2、主單元31及下游 側次單元3 3。單元3 2、31、3 3各自為用以使基板W浮起 的氣體係喷射壓縮空氣之構成，包含由具有微細的孔的多 孔質構成的平台本體，由該微細的孔將壓縮空氣喷射於上 面。成為浮起平台1的左右方向尺寸比基板W的左右方向 尺寸小，基板W的左右側部8、8由浮起平台1露出的狀態。 而且，單元32、31、33也各自在其頂面具有吸引空氣的吸 引孔，藉由圖外的控制裝置控制喷射的壓縮空氣與吸引的 空氣的平衡，以水平狀的姿勢使基板W浮起。 單元32、31、33各自不同的點為前後方向的長度及基 板W的浮起高度精度。[浮起高度精度]是指例如由於壓縮 空氣的噴射量的個別差異而產生的基板W的浮起量的個別 差異的程度。亦即，浮起高度精度高是意味著壓縮空氣的 喷射量的個別差異小，基板W的浮起量遍及全體均勻，浮 起高度精度低是意味著壓縮空氣的喷射量的個別差異大， 201139249 基板w的專起量遍及全體不均勻。 _ 亥浮起尚度精度在主單元31與次單元32、33 5 a單元31的浮起高度精度比次單元32、33高。 °附機構3吸附被搬進上游側次單元3 2並浮起的 基板W的側部8 & & 的底面，在保持該吸附狀態下，藉由前述 ' 手奴4運送至下游側次單元3 3。圖1是顯示基板 W到達下游側次單元33上的狀態。 及附機構3配設於浮起平台1的左右兩侧的各側，在201139249 x: substrate transport direction 5. If there is a chemical formula in this case, please disclose the chemical formula that best shows the invention: Research and invention: [Technical field of invention] The present invention relates to the transport of a substrate for floating transport A coating system for applying a coating liquid to a substrate for floating transport. [Prior Art] In order to manufacture a flat panel display (f, 1 ί at panel display) or a solar panel (liquid cell panel) such as a liquid crystal display or a plasma display, a glass substrate ( A coated substrate on which a coating liquid (for example, φ $resist liquid) is applied is used. An apparatus for applying a coating liquid to such a slab substrate is used, for example, in a coating system of Patent Document 1. The coating system includes: a transport device that floats and transports the glass substrate; and a coating device that has a slit nozzle that discharges the coating liquid on the top surface of the glass substrate that is floated and transported. The transport device includes: a floating platform that ejects gas from the top surface and floats the glass substrate; an adsorption mechanism that adsorbs the side portion of the floating glass substrate; and transports the adsorbed glass by moving the adsorption mechanism in the substrate transport direction The substrate is driven by the driver & According to the coating system, the glass substrate is floated by the floating platform. 3 201139249 The glass substrate is floated at a predetermined height by moving the suction mechanism that adsorbs the side portion of the glass substrate by the transport driving means. Under the shipping, apply the coating solution to the glass substrate. [Patent Document 1] Japanese Patent Laid-Open Publication No. 2 0 0 5 - 2 4 4 1 5 5 (see Fig. 2) ' [Disclosed] The glass substrate is very thin compared to its area, so it is on the floating level σ When it floats on the south, the side part (only the side edge part) of a glass substrate is shape-formed by the above-mentioned predetermined height (about less than lmm). It is conceivable that the side portion of the glass substrate is free #, the side portion is lifted by the air ejected by the region of the left and right edge portions of the floating platform, and is coated by the suppression in the coating system. In view of the unevenness, the coated glass substrate as a whole is horizontal, and the height of the bottom surface of the side surface of the glass substrate is preferably the same. The film thickness of the coating liquid is unevenly distributed and the liquid is floated at a predetermined height. Therefore, the suction mechanism sets the suction surface (top surface) so as to be the same as the above-mentioned rule, and if the side portion of the glass substrate is warped more than the predetermined height, the shape & ' is the bottom surface of the side portion and is adsorbed. In a state in which a gap is formed between the adsorption faces of the mechanism, and the attachment mechanism becomes an empty suction, there is a possibility that the glass substrate cannot be reliably adsorbed and held. Therefore, in order for the adsorption mechanism to reliably adsorb the glass substrate, the following means (""an8) are considered. That is, 'the adsorption mechanism (adsorption surface) is placed in a slightly upward position at 201139249, or the adsorption mechanism is moved to a slightly upper position by an actuator, and the crucible is in a warped shape. The side of the glass substrate > is considered. However, in this case, the glass substrate is conveyed in a warped shape, and the interval between the glass substrate and the slit nozzle of the coating device differs depending on the position, and coating unevenness occurs. Therefore, the constitution of the adsorption mechanism which lowers the adsorption surface so that the adsorption surface is located slightly above is considered. However, even if you want to lower the adsorption mechanism after adsorption and release the light curve of the glass substrate, the amount of drop is very small (less than 1 mm). In order to achieve such a small position control, very precise construction and control are required. The cost of the device rises (c〇st up). Further, a portion of the glass substrate that is floated and transported is not limited to the side portion, and may be generated in the center portion, for example, and may be changed in various places depending on the form of the transport device. Gao Zhisheng. Therefore, the object of the present invention is to provide a transporting apparatus which can reliably hold a floating substrate, and which can be integrally supported by a simple configuration, and can apply a coating liquid to, for example, a crucible. Coating system for the substrate. The transport device of the present invention is characterized in that: the table on which the substrate is floated is adsorbed, and the bottom surface of the substrate to be lifted by the floating platform is raised by the floating platform. The adsorption mechanism moves to the substrate transporter and the substrate that is attached to the substrate is floated at a predetermined height, and the transport of the transport layer in the transport direction of the substrate is carried out, and the transport mechanism is transported before the front panel is contacted with the adsorption mechanism. Having: (4) a bottom surface of the substrate, the substrate is positioned at the positioning portion of the height of the contact surface; 5 201139249; the bottom surface of the substrate can be adsorbed, and the front surface is protruded from the contact surface to a predetermined length If it is, the predetermined length is contracted to the lower adsorption portion. According to the present invention, the "adsorption portion of the adsorption mechanism is attached to the bottom surface of the substrate" and protrudes from the contact surface of the positioning portion by a predetermined length. Therefore, even if the substrate is floated at a predetermined height, the substrate is warped and a part of the substrate is sucked. The portion to be adsorbed is located above the predetermined height, and the adsorption portion can also suck the bottom surface of the portion to reliably hold the substrate. Further, when the adsorption unit sucks the bottom surface of the substrate, the negative pressure generated in the adsorption portion is sucked, so that the adsorption portion shrinks under the predetermined length, so that the bottom surface of the adsorption contacts the contact surface of the positioning portion, and the substrate is sucked. ) Positioned at the aforementioned specified height. Then, the substrate can be surely held by the simple configuration of the positioning and the adsorption portion described above, and the substrate to be held can be made flat as a whole. Further, it is preferable that the positioning portion is provided with a suction portion that attracts the bottom surface of the substrate that contacts the contact surface. In this case, since the suction portion further attracts the bottom surface of the substrate which is contacted by the adsorption portion and contacts the contact surface of the positioning portion, the substrate can be more strongly held, and particularly when the acceleration generated at the start and stop of transportation is large, there is a basis. The vibration is slightly vibrated in the surface direction of the substrate together with the adsorption portion, and the substrate and the adsorption portion may be slightly displaced in the transport direction. This displacement may be made by the suction portion. Further, when a part of the main portion of the adsorption portion is a bellows structure that is freely movable in the up-and-down direction, the suction portion of the adsorption portion is adsorbed on the substrate, and is attached to the attachment portion and the front plate is attached to the plate. The bottom of the 201139249 surface is suppressed by 'easy to shrink. Then, the contact surface is further provided on the upper surface of the adsorption portion, and the upper portion of the adsorption portion is disposed so as to be densely attached to the substrate. In this case, due to the substrate. In addition, for the single long suction, its longitudinal entirety will be on. However, in the suction, each adsorption surface is adjusted to the same level, and the hair is discharged from the top surface of the substrate having the predetermined height as described above, and the top surface of the substrate can be attracted by the coating device. Adsorption in the adsorption unit - the state in which the suction surface is released, the lower portion of the bellows structure or the central portion of the bellows structure may be disposed in a state in which the capsule structure portion may be provided, and the suction and suction mechanism may be further provided along the base attachment mechanism. The white adsorption mechanism is provided with a plurality of reinforcing force attachment mechanisms (contact surfaces) for reinforcing the substrate, and the contact surface attachment mechanism of the adsorption mechanism has a predetermined interval to adjust the contact surface of the contact surface. The coating system is characterized in that: in the above-described floating state of the transporting device, the coating device for the discharge σ of the coating liquid to be applied is as described above, and the discharge σ at the predetermined height 如 can be located as described above. When the negative pressure of the coating liquid is ejected so that the attachment portion of the adsorption portion can be restored to the protruding portion, the bellows structure portion is provided with flexibility and performance at the upper end portion in contact with the substrate. The plates are arranged at a predetermined interval, and the contact faces are set to be the same flat, so that they can be held more strongly, and are arranged continuously along the substrate, but in this case, it is necessary to arrange and adjust a plurality of cases on the same plane. All the contacts 0 include: the aforementioned transport device; and the platform causes the substrate to float to the cloth device transported by the driving means. The substrate is surely held, and thus the 'substrate can be transported at a predetermined height from the time of the substrate 7 201139249, and the attached portion of the substrate adsorbed by the adsorption mechanism is also positioned at the predetermined height, Therefore, the substrate can be made flat as a whole, so that the interval between the substrate to be floated and the discharge port of the coating device can be maintained, and the occurrence of uneven coating can be suppressed. Further, the floating platform includes a main unit including a coating operation position in which the coating device is applied and coated on the two plates, and a main unit in which the substrate transfer direction is disposed on the upstream side and the downstream side. At least one of the subunits of the side is preferred. In order to suppress coating unevenness, the interval between the substrate and the discharge port of the coating device should be made uniform. Therefore, it is preferable that the main unit including the coating operation position is the substrate. In addition, the floating height accuracy refers to the degree of individual difference of the amount of I of the substrate, for example, in the case where the platform is sprayed by the top surface and the substrate is floated, due to the amount of gas injected. The individual differences in the degree of individual differences in the floating surface of the substrate. That is, the high accuracy of the floating height means that the individual difference in the ejection amount of the gas is small, and the floating amount of the substrate is uniform throughout. Further, at least one of the person's sheets I disposed on the upstream side and the downstream side of the main unit does not affect the coating enthalpy even if the height of the floating height of the substrate is slightly lower. Therefore, the 'secondary unit' can be used with a lower precision than the main unit, and can reduce the cost of the device while supporting the necessary length in the floating unit. [Effects of the Invention] According to the transport device of the present invention, the floating portion of the liquid-absorbent liquid can be kept in a simple and reliable manner by the positioning portion R/I. '°卩' of the suction mechanism. Floating on the shape of the body and the base 8 201139249 plate, and, according to the base - the coated substrate. [Embodiment] Hereinafter, according to Fig. 1, it is shown that the coating system is a cloth liquid or a photoresist. The coating system 40 includes a platform 1 and a bottom surface of the adsorption 3 (hereinafter, the wave mechanism 3 is moved to the plate W and transported to the same name. In the direction in which the substrate is conveyed, the coating liquid is applied to the slit 5 of the coating liquid of the system coating solution in the horizontal direction and the left and right sides, and the nozzle 6 is discharged, and the coating system of the present invention is irradiated in the left-right direction. The application of the coating liquid to the sheet can suppress the occurrence of coating unevenness, and the embodiment of the present invention can be obtained with a good quality. The schematic configuration of the coating system of the present invention is shown in a perspective view. A coating liquid for a liquid material such as a thin plate-shaped substrate (glass substrate), a W coating liquid, or the like, has a transport device 40 that floats the transport substrate W, and ejects gas from the top surface 2 and floats the substrate w. The adsorption mechanism 3 of the side wall 8 of the side wall 8 of the floating wall from which the floating platform is floated, and the base direction of the adsorption mechanism 3 by the adsorption substrate transport direction X ' X transport drive means 4. In the present embodiment, X is the front direction, and the opposite direction is referred to as the rear direction. The direction orthogonal to the front surface is the left-right direction, and the direction orthogonal to the front-rear direction is the vertical direction (the height direction). Further, there is a coating device 5 that discharges a nozzle (discharge port) 6 to the top surface of the substrate w that is floated and transported. The coating apparatus was supplied to the slit nozzles 6, 5 Γ 丄 amp 由 由 由 由 由 由 由 由 由 由 由 由 由 由 由 由 由 由 由 由 由 由 由 由 由 由 由 由 由 由 由 由 由 由 由The slit nozzle 6 is coated with a coating liquid by a horizontal slit (s 1 it is also applied to the right and left sides (full width) of the substrate W. 201139249 FIG. 2 is a coating liquid applied to the left and right direction. Description of the application working position P of the substrate W. The substrate W is in a state where the reference surface of the transport device 40 is floated by a predetermined height h by the floating platform 1, and in this state, the side bottom surface 9 of the substrate W is In addition, the above-mentioned [reference surface] may be a horizontal plane on which the position in the height direction is a reference, and in the present embodiment, the top surface 2 of the floating platform 1 is further provided. In the middle of transport by the transport driving means 4 (see Fig. 1), the coating liquid is applied to the top surface by the slit nozzle 6. In Fig. 1, the floating platform 1 of the present embodiment is divided into front and rear. The direction has an upstream side sub-unit 3 2, a main unit 31 and a downstream side sub-unit 3 3 from the upstream side. The units 3 2, 31, 3 3 are each a composition of a gas system for ejecting compressed air to float the substrate W. , comprising a platform body composed of a porous body having fine pores, by the fine The hole jets the compressed air to the upper surface, and the size of the floating platform 1 in the left-right direction is smaller than the size of the substrate W in the left-right direction, and the left and right side portions 8 and 8 of the substrate W are exposed by the floating platform 1. Further, the units 32 and 31 are provided. And 33 each have a suction hole for attracting air on the top surface thereof, and the balance between the injected compressed air and the sucked air is controlled by a control device outside the figure to float the substrate W in a horizontal posture. Units 32, 31, The respective points different from each other in 33 are the length in the front-rear direction and the height of the floating height of the substrate W. [Floating height accuracy] means, for example, an individual difference in the amount of floating of the substrate W due to an individual difference in the amount of injection of compressed air. That is, the high accuracy of the floating height means that the individual difference of the injection amount of the compressed air is small, the floating amount of the substrate W is uniform throughout, and the low accuracy of the floating height means that the individual difference of the injection amount of the compressed air is large. , 201139249 The specific amount of the substrate w is uneven throughout. _ The height of the floating height is higher in the height of the floating height of the main unit 31 and the sub unit 32, 33 5 a unit 31 than the sub unit 32, 33. The mechanism 3 adsorbs the bottom surface of the side portion 8 && of the substrate W that has been moved into the upstream side sub-unit 3 and floats, and is transported to the downstream side sub-unit 3 by the aforementioned hand slave 4 while maintaining the adsorption state. 3. Fig. 1 shows a state in which the substrate W reaches the downstream side sub-unit 33. The attachment mechanism 3 is disposed on each of the left and right sides of the floating platform 1, at
本貫施形態中π I 1 4 nD σ者基板W的早側的側部8於前後方向具有 規疋間隔配設有二么 . ^ 〇 — 二口 ，在左右方向的兩側合計配設有六 台。单側三台的吸附機構3被搭載於共通的可動構件34， 成 體而移 Φϊ。 ^ 十對吸附機構3的詳細的構成於後面說明。 述運送驅動手段4具有:在基板運送方向X長長地設 置於洋起平Α ·|认+丄 °的左右兩側之導執（rai 1 )35、35 ;沿著導 執3 5使前述可無 Λ 動構件34移動於基板運送方向χ之前後方 motor)構成。運動部36例如由線性馬達（1ι_Γ 右的可動構件3:Γ手段4藉由使搭載吸附機構3的左 牛34、34同步並使其移動於 送該吸附機構3吸附的基板w。 直線地運 疋吸附機構3之斜視圖。該吸附機構 定於前述可動椹姓“， 叫傅d具有：被固 動構件34 (參照圖丨）之固定構件 構件13被導引升卩备於u 苒件㈠，對該固定 夺於上下方向之升降構件14;使嗲井降 構件1 4移動於上了 士二 ，使该升降 '上下方向之上下方向驅動部17。 驅動部17例如具有翁*「. ^ 、 上下方向 、有孔缸UirCylinder)，可藉由供給空氣 201139249 使升降構件1 4上升。 而且’吸附機構3具有：將基板W的側部 方向度方向）之擋塊（stopper)(定位部）1 基板W的側部8的底面之吸附墊（吸附部）2 0 附塾20設置於升降構件1 4。吸附機構3具有 升降構件14的高度，亦即擋塊1 0的高度之 擔塊1 〇為沿著基板W的側部8形成的細 塊（block) ’沿著該擋塊1 〇的縱向配設有 20 °播塊1 〇例如為樹脂製或金屬製，吸附考 等的彈性原料構成的筒狀的構件，會彈性變 在圖2中’擋塊1〇的頂面為面接觸基板 9的接觸面11，接觸面11為水平且平坦地开j 接觸面11之距前述基準面的高度被設定為 度h同一。因此’藉由使基板w的側部底面 11，可將該基板w的側部定位於規定高度h 然後在該定位的狀態下，複數個吸附墊 的側部底面9，基板w被固定於吸附機構3 { 在圖3中，各吸附墊20透過吸引泵24 閥2 9a及配管25連接。各吸附墊2〇為藉由g 空氣的筒狀的喷嘴（nozzle)，可吸附基板w 面。在本實施形態中七個吸附墊2 〇每隔規定 在埋設於擋塊1 0的狀態下被配設。 圖4是將吸附機構3的一部分放大而顯 (a)是即將吸附至基板W之前，（b)是吸附至 8定位於上下 〇;吸附保持該 。播塊1 0及吸 調整（微調整） 調整器15 。 長的長方體的 複數個吸附塾 卜2 0是由橡膠 形。 W的側部底面 ;成。而且，該 與前述規定高 9接觸接觸面 〇 2 〇吸附基板W 與吸附用電磁 曼引泵24吸引 的側部8的底 1間隔被配設， 示之剖面圖， 基板W之後。 201139249 此外如則述’播塊丨〇的接觸面丨1位於距基準面規定高度 h的位置°而且’基板W由於厚度與其面積相比非常薄， 故在前述浮起平台1使其浮起於距基準面規定高度h時， 成為基板w的側部（僅側端部）比該規定高度h(約未滿丨mm) 還上面而翹曲的形狀。 因此如圖4(a)所示’在基板w的側部底面9與接觸面 11之間形成有一點點的間隙。 在擋塊10設有貫通於上下方向的貫通孔16，在該貫 通孔1 6配設有吸附墊2 0。吸附墊2 0在即將吸附至基板W 的側部底面9之前是處於自由狀態，比擋塊1 0的接觸面 11還突出於上面規定長度S。亦即，吸附墊20具有比接觸 面11還上面的規定長度S的突出量。 該規定長度s被設定為形成於基板W的側部底面9與 接觸面11之間的前述間隙的值以上。 依照該吸附墊2 0，在吸附基板w的側部底面9前，即 使浮起於規定高度h的基板w輕曲，基板W的側部位於比 該規定尚度h稍彳政上面’由於吸附塾2〇的上端部20a比擔 塊10的接觸面11還突出於上面，故吸附墊20接觸基板W 的側部底面9，可吸附該側部底面9，玎確實地保持基板W 的側部。 然後，吸附墊2 0 —吸附於基板w的側部底面9，就透 過由前述吸引泵24進行的吸引而產生的負壓’如圖4(b) 所示，在吸附下彈性變形並收縮於下面，使所吸附的基板 W的側部底面9接觸接觸面11。然後，繼續由吸引泵24 201139249 進行的吸引，吸附墊2〇 < 面9的狀態。如此，。及^持°及附接觸接觸面11的側部底 ' S(參照圖4(a))成為收縮^ 2〇就突出量的前述規定長度 吸引泵24進行的吸附，； 的狀I此外，若解除由 彈性恢復力伸張，自動：板W破搬出’則吸附，20透過 面11還突出於上面規定九復到原先的狀態’亦即比接觸 μ m 見疋長度§的狀態。 如此，因吸附墊一 附塾2M尤收縮於下面1附基板W的側部底面9，該吸 塊1 〇的接觸面η，可可使所吸附的側部底面9接觸擋 度h。 冑基板w的側部定位於前述規定高 因此，在對基板W的τ§ β ^ _ 的開縫喷嘴6吐出塗= 佈裝置5(參照圖示）In the present embodiment, the side portion 8 of the early side of the substrate W of π I 1 4 nD σ is provided with a regular interval in the front-rear direction. ^ 〇 - two ports are provided in total on both sides in the left-right direction. Six sets. The three adsorption mechanisms 3 on one side are mounted on the common movable member 34, and are integrally moved by Φ. ^ The detailed configuration of the ten pairs of adsorption mechanisms 3 will be described later. The transport driving means 4 has a guide (rai 1 ) 35 and 35 which are disposed on the left and right sides of the ocean floor in the substrate transport direction X, and are arranged along the guide 3 5 The turbulent member 34 can be moved in the substrate transport direction χ before and after the motor). The moving portion 36 is, for example, a linear motor (the movable member 3 on the right side of the movable member 3 is synchronized with the left cows 34 and 34 on which the adsorption mechanism 3 is mounted and moved to the substrate w that is sucked by the suction mechanism 3. An oblique view of the 疋 adsorption mechanism 3. The adsorption mechanism is set to the movable name "," Fu d has: the fixed member member 13 of the fixed member 34 (see Fig. 被) is guided to the 苒 member (1) The lifting member 14 is fixed in the up-and-down direction; the cruising member 14 is moved to the upper part 2, and the driving unit 17 is driven up and down in the up-and-down direction. The driving unit 17 has, for example, Weng*. , the up-and-down direction, the perforated cylinder UirCylinder), the lifting member 14 can be raised by the supply air 201139249. Further, the 'adsorption mechanism 3 has a stopper (positioning portion) for the direction of the side of the substrate W) 1 Adsorption pad (adsorption portion) 20 of the bottom surface of the side portion 8 of the substrate W is attached to the elevating member 14. The adsorption mechanism 3 has the height of the elevating member 14, that is, the weight 1 of the stopper 10 〇 is a thin block formed along the side portion 8 of the substrate W (bl Ock) 'A 20 ° broadcast block 1 is placed along the longitudinal direction of the stopper 1 〇, for example, made of resin or metal, and a cylindrical member made of an elastic material such as a suction test is elastically changed in Fig. 2' The top surface of the stopper 1 is the contact surface 11 of the surface contact substrate 9, and the contact surface 11 is horizontal and flat. The height of the contact surface 11 from the reference surface is set to be the same as the degree h. Therefore, by using the substrate The side bottom surface 11 of w can position the side of the substrate w at a predetermined height h. Then, in the state of the positioning, the side bottom surface 9 of the plurality of adsorption pads, the substrate w is fixed to the adsorption mechanism 3 { Figure 3 In the present embodiment, each of the adsorption pads 20 is connected to the suction pump 24 through the valve 29a and the pipe 25. Each of the adsorption pads 2 is a cylindrical nozzle of g air, and the substrate w surface can be adsorbed. The adsorption pad 2 is disposed in a state of being embedded in the stopper 10 every predetermined time. Fig. 4 is an enlarged view of a part of the adsorption mechanism 3 (a) is adsorbed to the substrate W, and (b) is adsorbed to 8 Positioned on the upper and lower jaws; adsorption keeps this. Broadcast block 10 and suction adjustment (fine adjustment) adjuster 15. Long The plurality of adsorption ports 20 of the square body are formed of rubber. The bottom surface of the side of the W; and the contact surface 〇2 of the predetermined height 9 and the adsorption substrate W and the electromagnetic attraction pump 24 for adsorption are attracted. The bottom 1 of the side portion 8 is spaced apart, and is shown in a cross-sectional view, after the substrate W. 201139249 In addition, as described above, the contact surface 丨1 of the broadcast block is located at a predetermined height h from the reference surface, and the substrate W is The thickness is extremely thin compared to the area thereof. Therefore, when the floating platform 1 is floated at a predetermined height h from the reference surface, the side portion (only the side end portion) of the substrate w is larger than the predetermined height h (about not full). Mm) The shape that is also warped above. Therefore, as shown in Fig. 4 (a), a slight gap is formed between the side bottom surface 9 of the substrate w and the contact surface 11. The stopper 10 is provided with a through hole 16 penetrating in the vertical direction, and a suction pad 20 is disposed in the through hole 16. The adsorption pad 20 is in a free state immediately before being adsorbed to the side bottom surface 9 of the substrate W, and protrudes from the contact surface 11 of the stopper 10 by a predetermined length S. That is, the adsorption pad 20 has a protruding amount of a predetermined length S above the contact surface 11. The predetermined length s is set to be equal to or greater than the value of the gap formed between the side bottom surface 9 of the substrate W and the contact surface 11. According to the adsorption pad 20, even before the side bottom surface 9 of the substrate w is adsorbed, even if the substrate w floating at a predetermined height h is slightly curved, the side portion of the substrate W is located slightly above the predetermined degree h. The upper end portion 20a of the crucible 2b protrudes above the contact surface 11 of the load block 10, so that the adsorption pad 20 contacts the side bottom surface 9 of the substrate W, and the side bottom surface 9 can be adsorbed, and the side portion of the substrate W is surely held. . Then, the adsorption pad 20 is adsorbed to the side bottom surface 9 of the substrate w, and the negative pressure generated by the suction by the suction pump 24 is elastically deformed and contracted under adsorption as shown in FIG. 4(b). Next, the side bottom surface 9 of the adsorbed substrate W is brought into contact with the contact surface 11. Then, the suction by the suction pump 24 201139249 is continued, and the state of the pad 2 〇 < face 9 is adsorbed. in this way,. And the side bottom 'S (see FIG. 4(a)) with the contact contact surface 11 is the suction of the suction pump 24 by the predetermined length of the contraction amount, and the shape I is further Released by the elastic restoring force, automatic: the board W is broken out and 'adsorbed, 20 the transmissive surface 11 also protrudes from the above-mentioned nine-return to the original state', that is, the state of the contact length μ m see the length §. Thus, since the suction pad 2M is particularly contracted to the side bottom surface 9 of the lower substrate 1 to be attached, the contact surface η of the suction block 1 can contact the suctioned bottom surface 9 with the contact h. The side portion of the crucible substrate w is positioned at the predetermined height. Therefore, the coating device 5 is ejected to the slit nozzle 6 of the substrate W of τ § β ^ _ (see the drawing).
浮起於規定高度h，而 藉由浮起平台1使該基板W 該規定高度h，故整體:針對該基板W的側部也被定位於 ^ 體上可使基板W平坦。A蛀里叮仅 扣u 的基板W與開縫噴嘴6的門臨，泠俅 液的膜厚變成均勻，可抑制塗佈不均的產生的間“佈 而二因在塊狀的擋塊1〇上吸附保持基板W， 動。 次拎止時逍過慣性力抑制基板W振 :且，在本實施形態（圖1)的塗佈系統（運送裝置40 ) 中如前述，浮钯伞二The substrate W is floated at a predetermined height h, and the substrate W is placed at a predetermined height h by the floating platform 1, so that the side portion of the substrate W is also positioned on the body to flatten the substrate W. A 蛀 叮 叮 的 的 的 的 的 的 的 的 的 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板The substrate W is adsorbed and held, and the substrate W is shaken by the inertial force suppressing substrate W: In the coating system (transporting device 40) of the present embodiment (Fig. 1), as described above, the floating palladium umbrella 2
的塗佈作章你 σ 1具有：包$將塗佈液塗佈於基板W ” 置卩之主單元31;配設於該主單元31的上 游侧及下游側之a i π ^ ^ - . 之久早几32、33。為了抑制在主單元31上 的塗佈作辈：_ Α ”、的塗佈不均’應令基板W與開縫喷嘴6的間 201139249 隔為一定，故至少視實質上進行塗佈作業的主單元3 1為浮 起尚度精度1¾。 -相對於此，次單元3 2、3 3除此之外實質上未進行塗佈 作業，不會給予塗佈不均影響，故浮起高度精度稍低也可 以。因此，次單元3 2、3 3採用浮起高度精度比主單元3 1 還低的，謀求裝置的成本降低。 但是，如此當分割浮起平台1時，特別是當在主單元 31與次單元3 2、3 3之間浮起高度精度不同時，例如如圖 5(a)所示，基板W —跨越次單元32與主單元31而被搬進， 就在兩者間，基板W的浮起量會產生差，基板W會產生前 後方向的段差（5 。 此外，因在主單元31上執行塗佈處理，故被設定，俾 該主單元31中的基板W的浮起高度成為前述規定高度h， 而且，所有的吸附機構3的擋塊1 0的接觸面1 1被設定， 俾成為相同的規定高度h。亦即，擋塊1 0的接觸面1 1被 設定為主單元31中的基板W的浮起高度（基板W的底面中 的洋起南度）。 因此如前述，可考慮為當基板W產生前後方向的段差 5時，雖然可在位於主單元3 1的側方的第一吸附機構3 a 吸引所搬進的基板W的側部底面9，惟在位於上游側次單 元3 2的側方的第二吸附機構3 b，在與基板W的側部底面9 之間產生間隙g，在該第二吸附機構3 b中成為空吸引，無 法確實地吸附基板W。 " 為了解決該問題，習知例是考慮前述間隙g，有時預 15 201139249 先將第二吸附機構3b設定為比第一吸附機構3a還高。 但是此情形，如圖5(b)所示由於是相同基板w， Ί取J* -高度因藉由第一吸附機構3a吸附的部分A1與藉由第_ n 附機構3b吸附的部分A2不同’故浮起運送的基板界與門 縫喷嘴6的間隔在部分A1與部分A2不同，產生 土丨堂佈不 均。 但是’依照本實施形態的前述吸附機構3，如圖^ 圍 5 (a) 所示即使基板W藉由次單元3 2而高高地浮起，在吸附至夷 板W前的吸附機構3中，吸附墊20也比擋塊i 〇 土 接觸面 11還突出於上面，故可吸附該基板W的側部底面9。而且 如前述，吸附後因吸附墊2 0收縮並可將基板w保持於前述 規定高度h’故可使藉由所有的（三台的）吸附機構 丹〇谷自 吸附的基板W的各部分的高度成相同的規定高度 LJ此，The coating stamp σ 1 has a package unit: a coating liquid applied to the substrate W ” main unit 31; and ai π ^ ^ − disposed on the upstream side and the downstream side of the main unit 31. A few days ago, a few 32, 33. In order to suppress the coating on the main unit 31: _ Α 、, the coating unevenness should be such that the substrate W and the slit nozzle 6 between 201139249 are fixed, so at least the essence The main unit 3 1 on which the coating operation is performed has a floating accuracy of 13⁄4. On the other hand, the secondary units 3 2, 3 3 are substantially not subjected to the coating operation, and the coating unevenness is not affected, so that the floating height accuracy may be slightly lower. Therefore, the secondary unit 3 2, 3 3 has a lower floating height accuracy than the main unit 3 1 , and the cost of the device is lowered. However, when the floating platform 1 is divided, in particular, when the height accuracy of the floating between the main unit 31 and the sub-units 3 2, 3 3 is different, for example, as shown in FIG. 5( a ), the substrate W is crossed. When the unit 32 and the main unit 31 are carried in, the amount of floating of the substrate W is inferior between the two, and the step W in the front-rear direction is generated in the substrate W. (5) Further, coating processing is performed on the main unit 31. Therefore, the floating height of the substrate W in the main unit 31 is set to the predetermined height h, and the contact faces 1 1 of the stoppers 10 of all the suction mechanisms 3 are set, and the crucibles have the same predetermined height. h. That is, the contact surface 11 of the stopper 10 is set to the floating height of the substrate W in the main unit 31 (the southwardness in the bottom surface of the substrate W). Therefore, as described above, it can be considered as the substrate. When W has a step difference of 5 in the front-rear direction, the first suction mechanism 3a located on the side of the main unit 3 1 can suck the side bottom surface 9 of the loaded substrate W, but is located at the upstream side sub-unit 3 2 The side second adsorption mechanism 3 b generates a gap g between the side bottom surface 9 of the substrate W, and the In the adsorption mechanism 3 b, the suction is not observed, and the substrate W cannot be reliably adsorbed. In order to solve this problem, in the conventional example, the gap g is considered, and the second adsorption mechanism 3b may be set to be the first adsorption first. The mechanism 3a is also high. However, in this case, as shown in FIG. 5(b), since it is the same substrate w, the J*-height is extracted by the portion A1 adsorbed by the first adsorption mechanism 3a and by the _n attachment mechanism 3b. The adsorbed portion A2 is different. Therefore, the interval between the substrate boundary and the door slit nozzle 6 is different between the portion A1 and the portion A2, and the soil is uneven. However, the suction mechanism 3 according to the present embodiment is as shown in the figure. ^ As shown in the circumference 5 (a), even if the substrate W is lifted high by the secondary unit 32, the adsorption pad 20 is also in contact with the stopper i in the adsorption mechanism 3 before being adsorbed to the plate W. Further protruding above, the side bottom surface 9 of the substrate W can be adsorbed. Further, as described above, the adsorption pad 20 shrinks and the substrate w can be held at the predetermined height h', so that all The adsorption mechanism of the tantalum is the height of each part of the substrate W that is adsorbed The same prescribed height LJ this,
開縫喷嘴6與基板W的間隔遍及全面成為一定，可味L Ί防止塗 佈不均的產生。 如以上，依照本實施形態的塗佈系統（運送裝置） ^，即 使基板W與以規定高度h浮起的中央部比較，在左右的側 部變高而翹曲，且基板W產生前後方向的段差，驻山 稽宙吸附 機構3吸附有基板W的對象部位比前述規定高度h高，也The interval between the slit nozzle 6 and the substrate W is constant throughout, and it is possible to prevent the occurrence of uneven coating. As described above, according to the coating system (conveying device) of the present embodiment, even when the substrate W is compared with the central portion that floats at a predetermined height h, the left and right side portions become high and warped, and the substrate W is in the front-rear direction. The step difference is that the target portion of the substrate to which the substrate W is adsorbed is higher than the predetermined height h, and
能確實地保持基板W的側部，並且整體上可使所保持的茂 板W水平。 A 圖6是說明吸附墊2 0的其他形態之說明圖。吸附墊 20至少上端部20a與前述形態（圖4)一樣由可彈性變护 材質構成，而在圖6的吸附$ 2〇中，進而至少上端部… 16 此情形’吸附 201139249 為在上下方向伸縮自如的伸縮囊構造。 一吸附於基板W的側部底面9 ’就透過藉由吸引產生 壓，使得吸附墊20可容易收縮。然後，吸附一被解除 板W被排出’吸附墊20就能恢復到突出於比接觸面 上面的狀態。 如此依照具有伸縮囊構造的部分的吸附塾2 〇，可 地得到收縮量。因此，即使大大地設定距接觸面1 1的 里，亦即前述規定長度S’也能透過由吸引粟24進行 弓丨而產生的負壓就該規定長度S充分地收縮。因此， 僅基板W的側部比前述規定高度h還大地赵曲於上面 附整2 0的上端面2 0 b也能到達該基板W的側部底面！ 附為可能。 而且’即使是在浮起平台1的上游側次單元3 2與 疋31之間’高度方向的組裝誤差大，基板w在前後方 生大的段差的情形’吸附墊2〇的上端面20b也能到達 板W的側部底面9 ’故吸附為可能。亦即，即使浮起斗 的單元的組裝精度低也能吸附基板W。 而且’如圖3所示’在擋塊1 〇配設有吸引接觸接 11的基板W的側部8的底面之吸引部12。在本實施 中，吸引部1 2為開口於接觸面11的吸引孔（吸引溝） 該吸引孔連接與吸附墊2 〇不同的吸引用流道。亦即在 孔’與前述吸引泵（第一吸引泵）24不同的第二吸引j 透過吸引用電磁閥29b及配管27連接。藉由該吸引 由吸引孔（吸引部1 2 )吸引空氣，更進一步吸引藉由前 塾20 的負 ，基 11還 更大 突出 的吸 即使 ，吸 3，吸 主單 向產 該基 :台1 觸面 形態 ，在 吸引 艮26 泵26 述吸 201139249 附墊20吸附的基板w的側部8的底面。 依…。亥吸引部1 2 ’因更進-步吸引藉由吸附墊2 0吸 •附，接觸擋塊10的接觸面η的基板W的側部8的底面， 故可更強地保持基板w。0吸附墊2〇具有柔軟性故當其 、寺力低特別是在基板W的運送開始及停止時所產 生的加速度大昧，士 β , ’ 有该基板W與吸附墊20 —起在基板w 的面方向稍微振動之虞，而且，在基板W與吸附塾之間會 f :板運送方向Χ稍微移位’惟可藉由該吸引部1 2提高基 :保持力’可抑制前述振動或位置偏移等。 該二二吸附機構3的其他形態之說， 位之擔塊(定位、：Γ 一樣具有:將基板⑻的側部定 吸附塾(吸附部;20。而Γ保持該基板W的側部底面9之 面u還上… 吸附墊20在比擋塊10的接觸 上面具有規定長度S的突 伸縮囊構造Μ M \ J犬出量，及附墊20可藉由 攝&的部分22伸縮於上下方向。 在該圖9中，吸附墊20 ,甘 分22。而且， ”下部具有伸縮囊構造的部 & u 附塾20在其上部（伸缩囊槿、皮Μ 的上側）1右你w 1、彳甲猫襄構造的部分2 ? '、有與基板W接觸的樹浐劁 22 觸構件23小处 丨月日製的接觸構件23。嗜桩 “也旎以與擋塊10相 ”亥接 基板W接觸的捿網# # 9Q门的原枓。如此，藉由令盥 J巧接觸構件23為樹制π…， ^ 觸部分劣化Η «η 樹知製，可防止與基板W的拔 力化且吸附力降低。而且，“ 取W的接 配設伸縮囊構造 a纟吸附墊2。的下部 縮性）。 可確保吸附墊20的伸縮性（收 針對, 错由如以上構成的塗佈 佈糸統進仃的處理順序，藉 201139249 由圖7來說明。基板w 一被搬進浮起平台1的上潘 驟s 1)，浮起平台j就使該基板w浮起（步驟s2) -動手段4使吸附機構3水平移動至前述基板w的7 驟S3)，藉由上下方向驅動部17(參照圖3)使吸押 擋塊ίο上升至基板接受高度（步驟S4)。基板接 擋塊1〇的接觸面11成為前述規定高度h的位置 然後’藉由吸引泵24及吸附用電磁閥29a的 過吸附墊2 0進行基板w的吸附，吸附玻璃（步驟 疋，吸附墊2 〇收縮’基板w的側部8的底面接声 的接觸面1 1 (步驟S6)。然後，當配設有前述吸引 照圖3)時，藉由第二吸引泵26及吸引用電磁閥 作進行基板W的吸引，使基板w的側部8的底面 觸面11 (步驟S 7)。然後’藉由運送驅動手段4使 3水平移動於基板運送方向X，使基板w被運送， 由塗佈裝置5的開縫喷嘴6吐出的塗佈液被塗 S8)。 依照以上的塗佈系統，可透過由吸附機構3 擋塊1 0與吸附墊2 0構成的簡單的構成，確實地 W的側部8，並且整體上可使所保持的基板w水4 玎運送在整體上為水平的狀態下使其浮起的基板 該基板W的頂面與開縫喷嘴6的間隔一定而塗佈 因此’可抑制塗佈不均的產生，可得到品質佳的替 而且，吸附機構3沿著基板W的側部8具有 配設有複數個，吸附機構3各自的接觸面1 1被設 ^側部（步 。運送驅 :方後（步 f塾20及 受高度為 〇 動作，透 S5)。於 萄擋塊1 〇 部12(參 2 9 b的動 密著於接 吸附機構 在其途中 :佈（步驟 所具有的 保持基板 ‘ 0 而且， W，可使 塗佈液。 佈基板。 規定間隔 定於同一 201139249 水平面上。如此，因西 口配5又有複數個吸附機構3， 地保持基板W。而且，m 又Γ更強 獨立…… 機冑3沿著基才反W的側部8 口又 曰由前述調整器1 5 (參照圖3 )以每一吸附 機構3調整接觸面^ 及附 囟11的兩度即可，使得將所有的 3的接觸面11調整# , 夂附機構 鳖於共通的同一水平面上的作業變的容 易。 本發月的塗佈系統(運送裝置)不限於圖示的形 ^ ’在本發明的範圍内為其他的形態也可 Π::然是說明浮起平台1具有…心= 的凊形，惟在主單元3 1的上游側與下游側之 Πΐ二Γ配設有次單元者也可以。…雖然是說明 藉由具有被細的孔的多孔質構成浮起平台U各單元)的情 形’惟除此之外’&機械地形成的複數個孔將壓縮空氣^ 射至水平的板狀的構件之構成也可以。 只 而且’吸附機構3的數目為變更自如，在本實施形離 中雖然是以三台，但三台以外也可以。 而且，在前述實施形態中雖然是說明擋塊1 0為沿著基 =W的側部8形成的細長的長方體的塊的情形，惟例如由 製造上的觀點，一個擋塊丨〇為組裝複數個分割塊而構成者 也可以。而且此情形，也可以在前述分割塊設有吸引 引孔）12。 ° 而且’在圖3中雖然是說明吸引部（吸弓丨孔）12形成於 擋塊1 〇的情形，惟去除吸引部（吸引孔）丨2，僅藉由吸附墊 20保持基板W的構成也可以。 20 201139249 而且，在前述實施形態（圖1 )中雖然是以包含運送裝 置4 0與塗佈裝置5的塗佈系統來說明，惟本發明的運送裝 置也能適用於塗佈系統以外。例如如圖8 ( a)所示，也能適 用於具備進行浮起運送的基板W的（表面的）檢查的檢查裝 置5 0之檢查系統。在前述實施形態（圖1 )中，雖然運送裝 置4 0所具有的吸附機構3為吸附基板W的側部底面的構 成，惟圖8 ( a)的運送裝置6 0所具有的吸附機構3為吸附 基板W的中央部底面的構成。 若針對圖8 ( a)的檢查系統說明，則檢查裝置5 0具有 拍攝藉由運送裝置60浮起運送的基板W的頂面之攝影機 (camera)50a。運送裝置60 —邊使基板W浮起運送，一邊 通過攝影機50a之下。運送裝置60具有：在左右方向的除 了中央部以外的兩側部以固定狀態配設之固定浮起平台 4 1 ;與吸附機構3 —體移動之可動浮起平台4 2。 圖8(b)是吸附機構3、可動浮起平台42及取出其周圍 之說明圖。可動浮起平台4 2配設於吸附機構3的前後兩 側，該等吸附機構3與可動浮起平台4 2可藉由與前述實施 形態（圖1 ) 一樣的運送驅動手段4 (導軌3 5與線性馬達）移 動於基板運送方向X。而且，雖然圖8(b)的吸附機構3為 吸附墊2 0在左右方向排列兩個而被配設，惟吸附機構 3 的各部為與前述實施形態（圖1 ) 一樣的構成，具有同樣的 功能。 該圖8的實施形態的情形，由浮起平台41、4 2的頂面 喷出的氣體進入擋塊10的頂面與基板W的底面之間，基板 201139249 使基板w浮 機構3的吸 W之中的吸附機構3欲吸附的部分有時位於比 起的規定高度h還上面的位置，惟依照該吸附 附墊20’可吸附這種其 裡基板W的底面，進而可將 定位於前述規定高度h。 久附的部分 而’依^昭目· /岳« ，、備绝種運送裝置60的檢查系 裝置60與前述實施形態的情形一樣，可確實且因運送 起的基板W平坦而保持，可在該狀態下水平地運體上使浮 使被浮起料的基Μ與攝影機50a的距離故可 檢查為可能。 义’正確的 而且，前述各實施形態（圖1與圖8)的運送裝置 平台）雖然是以由其頂面喷射氣體並使基板w浮起的Y起 來說明’惟浮起平台藉由超音波使基板浮起从式 〜〜仏式的運送 裝置也可以。即使是此情形，基板有時也會因 、卞台而 在高度方向波狀起伏（翹曲）’欲藉由吸附機構吸附基板的 部分有時會位於比規定高度還上面的位置。但即使是此.产 形，吸附機構3也能吸附該部分，且吸附後可將該部分定 位於規定高度，可在該狀態下運送基板W。 【圖式簡單說明】 圖1是顯示本發明的塗佈系統的概略構成之斜視圖。 圖2是由左右方向看將塗佈液塗佈於基板的塗佈作業 位置之說明圖。 圖3是吸附機構之斜視圖。 圖4是將吸附機構的一部分放大而顯示之剖面圖。 22 201139249 圖5(a)是說明本發明可解決的另一課題之圖，（b)是 說明習知例的問題點之說明圖。 圖6是說明吸附墊的其他形態之說明圖。 圖7是說明藉由塗佈系統進行的處理順序之說明圖。 圖8是顯示具備本發明的運送裝置的檢查系統的概略 構成之說明圖。 圖9是說明吸附機構的其他形態之說明圖。 【主要元件符號說明】 1 :浮起平台 2 :頂面 3 :吸附機構 5 :塗佈裝置 6 :開縫喷嘴 8 :側部 9 :側部底面 I 0 :擋塊（定位部） II :接觸面 1 2 :吸引部 1 3 :固定構件 1 4 :升降構件 1 5 :調整器 1 6 :貫通孔 1 7 :上下方向驅動部 23 201139249 2 0 :吸附墊（吸附部） 2 0 a :吸附墊的上端部 20b:吸附墊的上端面 2 2 :伸縮囊構造的部分 2 3 :接觸構件 24:第一吸引泵 26 :第二吸引泵 2 7 :配管 2 9 a :吸附用電磁閥 29b:吸引用電磁閥 31 :主單元 3 2 :上游側次單元 3 3 :下游側次單元 34:可動構件 35:導軌 3 6 :前後方向驅動部 40、60 :運送裝置 41 ·.固定浮起平台 42 :可動浮起平台 5 0 a :攝影機 h :規定高度 P ·.塗佈作業位置 S:規定長度 X:基板運送方向 W :基板 5 :段差 24The side portion of the substrate W can be surely held, and the retained wadding plate W as a whole can be level. A FIG. 6 is an explanatory view for explaining another form of the adsorption pad 20. At least the upper end portion 20a of the adsorption pad 20 is made of an elastically deformable material like the above-described form (Fig. 4), and at least the upper end portion in the adsorption $2〇 of Fig. 6 16 This case 'adsorption 201139249 is for expansion and contraction in the up and down direction Freely flexible bladder construction. A side surface 9' adsorbed on the side surface of the substrate W transmits pressure by suction, so that the adsorption pad 20 can be easily shrunk. Then, the adsorption-released sheet W is discharged to the adsorption pad 20 to return to a state of being protruded above the contact surface. Thus, according to the adsorption 塾 2 部分 of the portion having the bellows structure, the amount of shrinkage can be obtained. Therefore, even if the distance from the contact surface 11 is greatly set, that is, the predetermined length S' can be sufficiently contracted by the negative pressure generated by the suction of the suction mill 24, the predetermined length S is sufficiently contracted. Therefore, only the side portion of the substrate W is larger than the predetermined height h, and the upper end surface 2 0 b of the upper surface of the substrate W can reach the bottom surface of the substrate W! Attached as possible. Further, 'even in the case where the assembly error in the height direction between the upstream side sub-unit 3 2 and the crucible 31 of the floating platform 1 is large, and the substrate w has a large step difference in the front and rear sides, the upper end surface 20b of the adsorption pad 2〇 is also It is possible to reach the side bottom surface 9' of the panel W so that adsorption is possible. That is, the substrate W can be adsorbed even if the assembly accuracy of the unit of the floating bucket is low. Further, as shown in Fig. 3, the suction portion 12 of the bottom surface of the side portion 8 of the substrate W that attracts the contact 11 is disposed in the stopper 1''. In the present embodiment, the suction portion 1 2 is a suction hole (suction groove) that is opened to the contact surface 11 . The suction hole connects a suction flow path different from the adsorption pad 2 . In other words, the second suction j, which is different from the suction pump (first suction pump) 24, is connected to the suction electromagnetic valve 29b and the pipe 27. By sucking the air by the suction hole (suction portion 1 2 ), the suction of the front cymbal 20 is further attracted, and the base 11 is more prominently sucked, even if sucking 3, the absorbing main unit produces the base: the table 1 In the contact surface form, the bottom surface of the side portion 8 of the substrate w adsorbed by the pad 20 is sucked by the suction pump 26 . according to…. The sea suction portion 1 2 ' is sucked by the suction pad 20 by the further step suction, and contacts the bottom surface of the side portion 8 of the substrate W of the contact surface η of the stopper 10, so that the substrate w can be held more strongly. 0 The adsorption pad 2 has flexibility, so that the acceleration of the adsorption pad 2 is low, especially when the substrate W is started and stopped, and the substrate W and the adsorption pad 20 are on the substrate w. The surface direction is slightly vibrated, and between the substrate W and the adsorption enthalpy f: the plate transport direction Χ is slightly displaced 'but the base: holding force can be suppressed by the attraction portion 1 2 to suppress the aforementioned vibration or position Offset, etc. In other aspects of the two-two adsorption mechanism 3, the positioning block (positioning: Γ) has a side portion of the substrate (8) that is adsorbed (adsorption portion; 20) and holds the side bottom surface 9 of the substrate W. The surface u is further... The adsorption pad 20 has a telescopic balloon structure of a predetermined length S on the contact with the stopper 10, and the attachment pad 20 can be extended and contracted by the portion 22 of the camera & In this Fig. 9, the adsorption pad 20, the fat 22. Moreover, "the lower part having the bellows structure & u the attachment 20 is on the upper part (the upper side of the telescopic capsule, the skin) 1 right you w 1 The part 2?' of the armored cat scorpion structure, the tree stalk 22 which is in contact with the substrate W, and the contact member 23 which is a small part of the moon-shaped member 23. The pile is also "closed to the block 10" The original surface of the #网##9Q gate that the substrate W contacts. Thus, by making the 接触J 巧 contact member 23 a tree π..., the touch portion is deteriorated Η «η tree knows, and the pulling force with the substrate W can be prevented. Further, the adsorption force is lowered. Further, "the connection of the W is provided with the bellows structure a. The lower shrinkage of the adsorption pad 2." The elasticity of the adsorption pad 20 can be ensured. The processing sequence of the coating fabric, which is constituted by the above, is illustrated by FIG. 7 by 201139249. The substrate w is moved into the upper stage of the floating platform 1 (1), and the platform j is floated. The substrate w is floated (step s2) - the moving means 4 horizontally moves the adsorption mechanism 3 to the step S3) of the substrate w, and the up-and-down driving portion 17 (see Fig. 3) raises the suction block ίο The height is received to the substrate (step S4). The contact surface 11 of the substrate stopper block 1 is at the predetermined height h, and then the substrate w is adsorbed by the suction pump 24 and the adsorption pad 20 of the adsorption electromagnetic valve 29a, and the glass is adsorbed (step 疋, adsorption pad) 2 〇 Shrinking 'the bottom surface of the side portion 8 of the substrate w is connected to the acoustic contact surface 1 1 (step S6). Then, when the suction image 3) is disposed, the second suction pump 26 and the suction electromagnetic valve are provided. The substrate W is sucked, and the bottom surface of the side portion 8 of the substrate w is brought into contact with the surface 11 (step S7). Then, by the transport driving means 4, the horizontal movement of the substrate 3 in the substrate transport direction X causes the substrate w to be transported, and the coating liquid discharged from the slit nozzle 6 of the coating device 5 is coated with S8). According to the above coating system, the side portion 8 of the W can be surely transmitted through the simple configuration of the stopper 10 and the adsorption pad 20 of the adsorption mechanism 3, and the substrate can be transported by the water. The substrate which is floated up as a whole is horizontal, and the distance between the top surface of the substrate W and the slit nozzle 6 is constant, so that the coating unevenness can be suppressed, and a good quality can be obtained. The adsorption mechanism 3 is provided with a plurality of side portions 8 along the substrate W, and the contact surface 11 of each of the adsorption mechanisms 3 is provided with a side portion (step: transport drive: square rear (step f塾20 and height is 〇) Action, through S5). In the block 1 〇 12 (the movement of the 2 2 9 b is in the way of the adsorption mechanism on the way: cloth (the holding substrate of the step '0 and, W, can make the coating liquid The cloth substrate is set at the same level on the same 201139249. Thus, because the west port is equipped with 5 and a plurality of adsorption mechanisms 3, the substrate W is maintained. Moreover, m is stronger and more independent... The side 8 of the W is further adjusted by the aforementioned adjuster 15 (refer to Fig. 3) for each adsorption machine. The structure 3 adjusts the contact surface ^ and the attachment 11 to two degrees, so that all the contact faces 11 of the 3 are adjusted #, and the operation of the attachment mechanism on the same horizontal surface is easy. The system (transport device) is not limited to the illustrated form. It may be other forms within the scope of the present invention: it is to say that the floating platform 1 has a shape of a heart = only in the main unit 3 1 It is also possible to arrange the secondary unit on the upstream side and the downstream side. (Although it is explained that each unit of the floating platform U is constituted by a porous body having a fine hole), except for the case, '& The mechanically formed plurality of holes may be configured to compress compressed air to a horizontal plate-like member. Only the number of the adsorption mechanisms 3 is changed freely, although three are in the present embodiment, In addition, in the above-described embodiment, the case where the stopper 10 is an elongated rectangular parallelepiped block formed along the side portion 8 of the base = W is described. However, for example, from the viewpoint of manufacturing, one block The block 构成 may be formed by assembling a plurality of divided blocks. In this case, it is also possible to provide a suction guide hole 12 in the divided block. ° and 'In FIG. 3, although the suction portion (suction bow hole) 12 is formed in the stopper 1 ,, the suction portion is removed. (Attraction hole) 丨2, the structure of the substrate W may be held only by the adsorption pad 20. 20 201139249 Further, in the above embodiment (Fig. 1), the coating device 40 and the coating device 5 are coated. Although the system of the present invention can be applied to other than the coating system, for example, as shown in FIG. 8( a ), it can also be applied to an inspection device including (surface) inspection of the substrate W for floating transportation. 50 inspection system. In the above-described embodiment (FIG. 1), the adsorption mechanism 3 of the transport device 40 is configured to adsorb the bottom surface of the side surface of the substrate W, but the adsorption mechanism 3 of the transport device 60 of FIG. 8(a) is The bottom surface of the center portion of the substrate W is adsorbed. Referring to the inspection system of Fig. 8(a), the inspection device 50 has a camera 50a that captures the top surface of the substrate W that is transported by the transport device 60. The transport device 60 passes the camera 50a while floating and transporting the substrate W. The transport device 60 has a fixed floating platform 4 1 that is disposed in a fixed state on both sides except the central portion in the left-right direction, and a movable floating platform 42 that moves integrally with the adsorption mechanism 3 . Fig. 8(b) is an explanatory view of the suction mechanism 3, the movable floating platform 42, and the periphery thereof. The movable floating platform 4 2 is disposed on the front and rear sides of the adsorption mechanism 3, and the adsorption mechanism 3 and the movable floating platform 42 can be transported by the same transporting means 4 as the foregoing embodiment (FIG. 1). Moving with the linear motor) in the substrate transport direction X. Further, although the adsorption mechanism 3 of Fig. 8(b) is disposed such that the adsorption pads 20 are arranged in the left-right direction, the respective portions of the adsorption mechanism 3 have the same configuration as that of the above-described embodiment (Fig. 1), and have the same configuration. Features. In the case of the embodiment of Fig. 8, the gas ejected from the top surface of the floating platforms 41, 42 enters between the top surface of the stopper 10 and the bottom surface of the substrate W, and the substrate 201139249 causes the suction of the substrate w floating mechanism 3. The portion of the adsorption mechanism 3 to be adsorbed is sometimes located above the predetermined height h, but the bottom surface of the substrate W can be adsorbed according to the adsorption pad 20', and the positioning can be positioned. Height h. In the same manner as in the above-described embodiment, the inspection system device 60 of the permanent delivery device 60 can be surely held and held flat by the transported substrate W. In this state, it is possible to check the distance between the base of the floating body and the camera 50a on the horizontal body. In addition, the transporter platform of the foregoing embodiments (Figs. 1 and 8) is illustrated by the fact that Y is ejected by the top surface of the gas and the substrate w is floated. It is also possible to float the substrate from a transport device of the type ~~仏. Even in this case, the substrate may be undulated (warped) in the height direction due to the collapse of the substrate. The portion where the substrate is to be adsorbed by the adsorption mechanism may be located above the predetermined height. However, even in this configuration, the adsorption mechanism 3 can adsorb the portion, and after the adsorption, the portion can be positioned at a predetermined height, and the substrate W can be transported in this state. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a perspective view showing a schematic configuration of a coating system of the present invention. Fig. 2 is an explanatory view of a coating operation position where a coating liquid is applied to a substrate as seen from the left-right direction. Figure 3 is a perspective view of the suction mechanism. Fig. 4 is a cross-sectional view showing a part of the adsorption mechanism in an enlarged manner. 22 201139249 Fig. 5(a) is a view for explaining another problem that can be solved by the present invention, and Fig. 5(b) is an explanatory view for explaining a problem of the conventional example. Fig. 6 is an explanatory view for explaining another form of the adsorption pad. Fig. 7 is an explanatory view for explaining a processing procedure performed by a coating system. Fig. 8 is an explanatory view showing a schematic configuration of an inspection system including the transport device of the present invention. Fig. 9 is an explanatory view for explaining another form of the adsorption mechanism. [Main component symbol description] 1 : Floating platform 2 : Top surface 3 : Adsorption mechanism 5 : Coating device 6 : Slotting nozzle 8 : Side portion 9 : Side bottom surface I 0 : Stop (positioning portion) II : Contact Surface 1 2 : suction portion 1 3 : fixing member 1 4 : lifting member 1 5 : adjuster 1 6 : through hole 1 7 : vertical direction driving portion 23 201139249 2 0 : adsorption pad (adsorption portion) 2 0 a : adsorption pad Upper end portion 20b: upper end surface 2 2 of the adsorption pad: part 2 of the bellows structure: contact member 24: first suction pump 26: second suction pump 2 7 : pipe 2 9 a : adsorption solenoid valve 29b: suction Solenoid valve 31: Main unit 3 2 : Upstream side sub unit 3 3 : Downstream side sub unit 34 : Movable member 35 : Guide rail 3 6 : Front and rear direction drive units 40 , 60 : Transport device 41 · Fixed floating platform 42 : Movable floating platform 5 0 a : camera h : predetermined height P · coating operation position S: predetermined length X: substrate conveying direction W : substrate 5 : step difference 24