201120340 六、發明說明： 【發明所屬之技術領域】 本發明係關於閘閥及使用彼之基板處理系統。 【先前技術】 以太陽電池或液晶顯示器（LCD )爲代表的平面面板 顯示器（FPD )等的製造過程，對大型玻璃基板施以蝕刻 ’或者是成膜等特定的處理。作爲施以這樣的處理之基板 處理系統，已知有具備複數處理室的多真空室型式之基板 處理系統（例如，可參照專利文獻1 )。 這樣的多真空室型式之基板處理系統，具有被設置了 搬送基板（被處理體）之搬送裝置的共通搬送室，於此共 通搬送室的周圍，具有處理室、在共通搬送室與大氣壓氛 圍之間交換未處理的基板與已處理的基板之加載互鎖室等 。這些共通搬送室、處理室、及加載互鎖室係真空裝置， 這些真空裝置使用排氣機構進行排氣而使內部在特定的減 壓狀態下。 真空裝置具備被構成爲氣密的容器本體，於此容器本 體，設有供使被處理體出入之用的開口部。開口部使用閘 閥來開閉。藉由閘閥關閉開口部時，容器本體內部被密封 爲氣密，可以使容器本體的內部的壓力，減壓至特定的製 程壓力爲止，或是在大氣狀態與減壓狀態之相互間變換。 閘閥的構造例，被記載於前述專利文獻1 ^ 在被記載於前述專利文獻1的閘閥，設有藉由油壓缸 -5- 201120340 而昇降的板狀之閘座，以連桿（link )旋轉自如地連結閘 座與閥體之兩側面，而進行閥體的支撐及按壓。使用這樣 的連桿機構的閘閥，在連桿對於閥體爲斜向的狀態時，閥 體離開開口部周圍，連桿對閥體爲水平狀態時，壓出閥體 而使閥體密接於開口部周圍。 [先前技術文獻] [專利文獻] [專利文獻1]日本專利特開平5- 1 96 1 50號公報 【發明內容】 [發明所欲解決之課題] 近年來，被處理體大型化或是同時處理複數枚被處理 體之批次處理之技術陸續發展，被設於容器本體的移出移 入被處理體之用的開口部的尺寸也越來越大。隨著開口部 尺寸的增大，閥體的尺寸也變大，伴此閥體的重量也有增 加的傾向。 於根據記載於專利文獻1之類的連桿機構的閘閥’在 閥體的重量增加時藉由連桿保持閥體會變得困難。此外’ 閥體係由兩側面來按壓，所以隨著開口部尺寸的增大’會 有對閥體的上部及下部之按壓不足的疑慮。進而’在對按 壓方向而言相反側的壓力很高的狀態（逆壓狀態）’連桿 機構由水平狀態起即使稍有偏移，也會在閥體與開口部周 圍產生洩漏，而有閘閥的氣密性容易低下的情形。 這些情形，在開口部越大時，亦即閥體越大時越爲顯201120340 VI. Description of the Invention: [Technical Field of the Invention] The present invention relates to a gate valve and a substrate processing system using the same. [Prior Art] A large-sized glass substrate is subjected to a specific process such as etching or film formation in a manufacturing process such as a flat panel display (FPD) typified by a solar cell or a liquid crystal display (LCD). As a substrate processing system to which such a treatment is applied, a multi-vacuum chamber type substrate processing system including a plurality of processing chambers is known (for example, see Patent Document 1). The multi-vacuum chamber type substrate processing system includes a common transfer chamber in which a transfer device for transporting a substrate (subject to be processed) is provided, and a processing chamber, a common transfer chamber, and an atmospheric pressure atmosphere are provided around the common transfer chamber. The unprocessed substrate and the loaded interlocking chamber of the processed substrate are exchanged. These common transfer chambers, processing chambers, and load lock chamber vacuum devices are exhausted using an exhaust mechanism to cause the interior to be in a specific depressurized state. The vacuum apparatus includes a container body that is configured to be airtight, and the container body is provided with an opening for allowing the object to be processed to enter and exit. The opening is opened and closed using a gate valve. When the opening is closed by the gate valve, the inside of the container body is sealed to be airtight, and the pressure inside the container body can be reduced to a specific process pressure or between the atmospheric state and the reduced pressure state. The example of the structure of the gate valve is described in the above-mentioned Patent Document 1 . The gate valve described in Patent Document 1 is provided with a plate-shaped gate that is raised and lowered by a hydraulic cylinder -5 - 201120340, and a link is used. The two sides of the brake seat and the valve body are rotatably connected to support and press the valve body. When the gate valve of the link mechanism is in a state in which the connecting rod is inclined to the valve body, the valve body is separated from the periphery of the opening, and when the connecting rod is horizontal to the valve body, the valve body is pressed out to make the valve body close to the opening. Around the ministry. [PRIOR ART DOCUMENT] [Patent Document 1] Japanese Patent Laid-Open Publication No. Hei No. Hei. No. Hei. No. Hei. Hei. The technique of batch processing of a plurality of objects to be processed has been progressing, and the size of the opening portion for removing and moving the container body into the object to be processed is also increasing. As the size of the opening increases, the size of the valve body also increases, and the weight of the valve body also tends to increase. In the gate valve ' according to the link mechanism described in Patent Document 1, it becomes difficult to hold the valve body by the link when the weight of the valve body is increased. Further, the valve system is pressed by both side surfaces, so that as the size of the opening increases, there is a concern that the upper and lower portions of the valve body are insufficiently pressed. Further, 'the state in which the pressure on the opposite side to the pressing direction is high (reverse pressure state)', the link mechanism is slightly offset from the horizontal state, and a leak occurs around the valve body and the opening portion, and there is a gate valve. The airtightness is easy to be low. In these cases, the larger the opening is, the larger the valve body is.
S -6- 201120340 著。這是因爲閥體越大，於逆壓狀態受到的壓力也 要把閥體壓回的力量很強，此外閥體的撓曲量也越 故。 本發明，目的在於提供即使閥體的尺寸變大氣 不易降低之閘閥，及使用此閘閥之基板處理系統。 [供解決課題之手段] 相關於本發明之第1態樣的閘閥，具備：被按 被處理體出入的開口部的周圍之閥體、於前述閥體 述開口部設爲環狀的按壓部、對前述開口部的開口 於平行的方向之主滑塊、被設於前述主滑塊，按壓 壓部的按壓機構；前述按壓機構，係由包含把前述 壓於前述開口部的周圍的突起部，及由前述突起部 下降之傾斜部之凸輪所構成，前述按壓機構’在使 體正對於前述開口部的狀態，對前述開口部的開口 於垂直的方向，使前述閥體按壓於前述開口部的周 相關於本發明之第2態樣的基板處理系統’其 具備：具有使被處理體出入之開口部’可使前述被 置於真空狀態下之，對前述被處理體施以處理之處 具有使前述被處理體出入的開口部，可使前述被處 於大氣狀態下及真空狀態下雙方之，交換處理前及 的被處理體之加載互鎖室、具有使前述被處理體出 口部，可使前述被處理體置於真空狀態下的’在前 互鎖室與前述處理室之間搬送前述被處理體之搬送 越大’ 大的緣 密性也 壓於使 沿著前 面滑動 前述按 閥體按 斜坡狀 前述閥 面按壓 圍。 特徵爲 處理體 理室、 理體置 已處理 入的開 述加載 室的基 201120340 板處理系統；前述處理室、前述加載互鎖室、及前述搬送 室之至少任一，於使前述被處理體出入之開口部進行開閉 的閘閥，使用相關於前述第1態樣的閘閥。 [發明之效果] 根據本發明的話，可以提供即使閥體的尺寸變大氣密 性也不易降低之閘閥，及使用此閘閥之基板處理系統。 【實施方式】 以下，參照圖面說明本發明之實施型態。跨參照的所 有圖式，針對同一部分賦予同一參照符號。 於本發明作爲被處理體之一例舉出使用於太陽電極或 平面面板顯示器的製造之大型玻璃基板，例示對此玻璃基 板施以特定的處理，例如蝕刻，或者施以成膜等的基板處 理系統同時進行說明。 圖1係槪略顯示使用相關於本發明之一實施型態之閘 閥的基板處理系統之平面圖。 如圖1所示，相關於一實施型態的基板處理系統1，具 備對基板G施以處理的處理室，於本例爲複數之處理室10a 、1 〇b、交換處理前及已處理之基板G的加載互鎖室20、在 加載互鎖室20與處理室10a或10b、以及處理室10a與處理 室l〇b之間搬送基板G的共通搬送室30、以及被設於共通搬 送室3 0之搬送基板G的搬送裝置40。 於本例，處理室l〇a、10b、加載互鎖室20、及共通搬 -8- 201120340 送室30係真空裝置，分別具備可以把基板G置於特定的減 壓狀態下之被構成爲氣密的容器本體50a、50b、50c或50d 。於容器本體50a、50b、50c或50d，被設有供使基板G出 入的開口部 51a、51b、51c 或 51d。 被設於處理室10a、10b的容器本體50a、50b的開口部 51a、51b，透過閘閥室60被連接於設在共通搬送室30的容 器本體50c的開口部51c。同樣地，被設於加載互鎖室20的 容器本體50d的開口部51d，透過閘閥室60被連接於設在共 通搬送室30的容器本體50c的開口部51c。 本例之閘閥室60，連通於開口部51a、51b、51c或51d ，具有使基板G通過的開口部61a、61b、61c或61d，於閘 閥室60的內部被收容著閘閥的閥體62。開口部61a、61b及 61d藉由閥體62開閉。在本例，閥體62密接於被設於閘閥 室60的處理室側或加載互鎖室側的開口部61a、61b及61d 的周圍，以使容器本體50a、50b、50c及50d氣密地密封的 方式被構成的。但是，不限於此，藉由閥體62密接於被設 在共通搬送室30側的開口部61c的周圍，而使容器本體50a 、50b、50c及50d氣密地密封亦可。 此外，加載互鎖室20，具有被開放於大氣側，亦即基 板處理系統1的外部的開口部5 1 e。被開放於外部的開口部 51e，被使用於處理前的基板G之裝載、已處理的基板G之 卸載，藉由被開放於大氣狀態下的閥體62來開閉。 接著，就相關於本發明之一實施型態的閘閥，將各個 要素摘要說明。 -9 - 201120340 圖2及圖3係摘要而槪略顯示相關於本發明的一實施型 態之閘閥的閥體按壓機構之一例之側面圖。此側面，係由 圖1中的箭頭11所示的方向所見的，以設於處理室l〇a與共 通搬送室3 0之間的閘閥爲例詳細說明。此外，圖2顯示使 閥體正對於開口面的狀態（閥體從按壓被開放的狀態）， 圖3係閘閥被關閉的狀態（閥體被按壓的狀態）。 如圖2及圖3所示，相關於一實施型態之閘閥6A，具備 被按壓於使基板G出入之處理室10a側的開口部61a的周圍 之閥體62，及使閥體62對開口部61a的周圍按壓的按壓機 構63。 按壓機構63，在使閥體62正對於開口部61a的狀態（ 參照圖2)，對開口部61a的開口面64壓出於垂直的方向A (參照圖3)，將閥體6 2按壓於開口部61 a的周圍。 閘閥6A，對開口面64滑動於平行的方向B，在本例具 備上下移動的主滑塊66，於此主滑塊66被設有按壓機構63 。按壓機構63，係以包含將閥體62按壓於開口部61a的周 圍的突起部67，及由突起部67斜坡狀下降之傾斜部68的凸 輪所構成的。 於閥體62，設有藉由按壓機構63按壓的按壓部69。按 壓部69，具有接觸於按壓機構63的輥70。輥70，因應於按 壓機構63的滑動，在本例係因應於上下滑動，而使突起部 67與傾斜部68之間，沿著突起部67的表面及傾斜部68的表 面轉動。 輥70接於傾斜部68時，如圖2所示，閥體62在離開開S -6- 201120340. This is because the larger the valve body is, the more the pressure received in the reverse pressure state is to press the valve body back, and the deflection of the valve body is also higher. SUMMARY OF THE INVENTION An object of the present invention is to provide a gate valve which does not easily reduce the size of a valve body, and a substrate processing system using the gate valve. [Means for Solving the Problem] The gate valve according to the first aspect of the present invention includes a valve body that is surrounded by an opening into which the object to be processed is placed, and a pressing portion that is annular in the opening of the valve body. a main slider that opens in the parallel direction of the opening, a pressing mechanism that is provided on the main slider, and that presses the pressing portion; and the pressing mechanism includes a protrusion that presses the periphery of the opening And the cam of the inclined portion that is lowered by the protruding portion, wherein the pressing mechanism is configured to press the valve body against the opening in a direction perpendicular to an opening of the opening in a state in which the body is facing the opening A substrate processing system according to a second aspect of the present invention includes: an opening portion for allowing the object to be processed to be placed in a vacuum state, and the object to be processed is treated The opening portion for allowing the object to be processed to enter and exit, and the load-locking chamber of the object to be processed before and after the exchange process in both the air state and the vacuum state can be provided The object outlet portion of the object to be processed can be placed in a vacuum state, and the larger the conveyance of the object to be processed is transferred between the front interlocking chamber and the processing chamber. The front sliding body is pressed against the valve body in a ramp-like manner. a substrate processing system characterized in that the processing body chamber and the processing body are processed into a loading chamber; the processing chamber, the loading interlock chamber, and the transfer chamber are at least one of the processing object A gate valve that opens and closes the opening and closing portion is used, and a gate valve according to the first aspect described above is used. [Effects of the Invention] According to the present invention, it is possible to provide a gate valve which is less likely to be lowered even if the size of the valve body becomes atmospheric, and a substrate processing system using the gate valve. [Embodiment] Hereinafter, embodiments of the present invention will be described with reference to the drawings. All the patterns across the reference are given the same reference symbol for the same part. In the present invention, a large-sized glass substrate used for the manufacture of a solar electrode or a flat panel display is exemplified as a substrate to be processed, and a substrate processing system in which a specific process such as etching or film formation is applied to the glass substrate is exemplified. Also explain at the same time. BRIEF DESCRIPTION OF THE DRAWINGS Figure 1 is a plan view schematically showing a substrate processing system using a gate valve relating to an embodiment of the present invention. As shown in FIG. 1, a substrate processing system 1 according to an embodiment includes a processing chamber for processing a substrate G. In this example, a plurality of processing chambers 10a, 1b, exchanging, and processing are performed. The load lock chamber 20 of the substrate G, the common transfer chamber 30 that transports the substrate G between the load lock chamber 20 and the processing chamber 10a or 10b, and between the processing chamber 10a and the processing chamber 10b, and the common transfer chamber are provided. The transport device 40 that transports the substrate G of 30. In this example, the processing chambers 10a, 10b, the load lock chamber 20, and the common transfer-8-201120340 transfer chamber 30 vacuum apparatus are respectively configured to be able to place the substrate G in a specific decompressed state. Airtight container body 50a, 50b, 50c or 50d. The container body 50a, 50b, 50c or 50d is provided with an opening portion 51a, 51b, 51c or 51d for allowing the substrate G to enter. The openings 51a and 51b of the container bodies 50a and 50b provided in the processing chambers 10a and 10b are connected to the opening 51c of the container body 50c provided in the common transfer chamber 30 through the gate valve chamber 60. Similarly, the opening 51d of the container body 50d provided in the load lock chamber 20 is connected to the opening 51c of the container body 50c provided in the common transfer chamber 30 through the gate valve chamber 60. The gate valve chamber 60 of the present example communicates with the openings 51a, 51b, 51c, or 51d, and has an opening 61a, 61b, 61c, or 61d through which the substrate G passes, and a valve body 62 in which the gate valve is housed inside the shutter chamber 60. The opening portions 61a, 61b, and 61d are opened and closed by the valve body 62. In this example, the valve body 62 is in close contact with the opening portions 61a, 61b, and 61d provided on the processing chamber side of the gate valve chamber 60 or the load lock chamber side, so that the container bodies 50a, 50b, 50c, and 50d are hermetically sealed. The way of sealing is constructed. However, the valve body 62 is in close contact with the opening 61c provided on the common transfer chamber 30 side, and the container bodies 50a, 50b, 50c, and 50d may be hermetically sealed. Further, the load lock chamber 20 has an opening portion 5 1 e which is opened to the outside of the atmosphere, that is, the outside of the substrate processing system 1. The opening portion 51e that is opened to the outside is used for loading the substrate G before the processing and unloading the processed substrate G, and is opened and closed by the valve body 62 that is opened to the atmosphere. Next, each element will be briefly described with respect to a gate valve according to an embodiment of the present invention. -9 - 201120340 Fig. 2 and Fig. 3 are side views showing an example of a valve body pressing mechanism of a gate valve according to an embodiment of the present invention. This side surface is seen in the direction indicated by the arrow 11 in Fig. 1, and the gate valve provided between the processing chamber 10a and the common transfer chamber 30 is explained in detail as an example. Further, Fig. 2 shows a state in which the valve body faces the opening surface (a state in which the valve body is opened from the pressing), and Fig. 3 shows a state in which the gate valve is closed (a state in which the valve body is pressed). As shown in FIG. 2 and FIG. 3, the gate valve 6A according to an embodiment includes a valve body 62 that is pressed around the opening 61a on the processing chamber 10a side where the substrate G enters and exits, and the valve body 62 is opened to the right. A pressing mechanism 63 that is pressed around the portion 61a. The pressing mechanism 63 presses the valve body 62 against the opening 61 of the opening 61a in a vertical direction A (see FIG. 3) while the valve body 62 is facing the opening 61a (see FIG. 2). The periphery of the opening 61 a. The gate valve 6A slides the opening surface 64 in the parallel direction B. In this example, the main slider 66 is moved up and down, and the main slider 66 is provided with a pressing mechanism 63. The pressing mechanism 63 is constituted by a projection including a projection 67 that presses the valve body 62 around the opening 61a and a projection 68 that is inclined downward by the projection 67. The valve body 62 is provided with a pressing portion 69 that is pressed by the pressing mechanism 63. The pressing portion 69 has a roller 70 that is in contact with the pressing mechanism 63. In response to the sliding of the pressing mechanism 63, the roller 70 rotates between the projection 67 and the inclined portion 68 in accordance with the surface of the projection 67 and the surface of the inclined portion 68 in this example. When the roller 70 is attached to the inclined portion 68, as shown in FIG. 2, the valve body 62 is separated from the opening.
S -10- 201120340 口部61 a的周圍的狀態，輥70接於突起部67時，如圖3所示 ，突起部67使輥70沿著垂直的方向A按壓，使閥體62成爲 按壓於開口部61a的周圍的狀態。又，於開口部61a的周圍 ，被設有未圖示的密封構件，例如〇形環，提高氣密性。 按壓部69，如圖9A所示，係沿著開口部61a的周圍環 狀地被配置。藉此，使閥體62不僅於其側部，連上部及下 部也可以進行按壓。 其次，說明關於閥體62的脫離機構（閥體返回機構） 及垂直抵壓機構（保持引導機構）。 使用連桿機構的閘閥，作爲閥體的脫離機構，亦即， 使閥體由被封閉的狀態（被按壓的狀態）回到打開的狀態 (由按壓開放的狀態）的機構使用拉伸彈簧。總之，閘閥 被關閉的狀態時，使拉伸彈簧伸長而施加拉力，爲把閥體 拉回基台的狀態。閘閥打開時，拉伸彈簧藉由退縮而把閥 體拉回基台。 如此般，於閥體的脫離機構使用拉伸彈簧，於關閉閘 閥的狀態，總是於拉伸彈簧使拉伸力作用。因此，拉伸彈 簧有劣化而斷掉的可能性。 在此，於相關於一實施型態之閘閥，如以下所說明的 下了 一番功夫。 圖4及圖5，係摘要而槪略顯示相關於一實施型態之閘 閥的閥體返回機構之一例之側面圖。此側面，與圖2及圖3 同樣，係由圖1中的箭頭1 1所示的方向所見之側面。此外 ，圖4顯示閘閥被關閉的狀態，圖5係使閥體正對於開口面 -11 - 201120340 的狀態（閥體由按壓至被開放的狀態）。 如圖4及圖5所示，閘閥6B，與圖2及圖3所示之閘閥6A 相比，進而具備使閥體62由開口部61a的周圍脫離的脫離 機構80。脫離機構80，具有在閥體62關閉的狀態成爲退縮 狀態的可伸縮的伸縮体81，具體之一例係具有壓縮彈簧。 伸縮體81，在閥體62被按壓於開口部61 a的周圍時如 圖4所示地退縮，在使閥體62由開口部61a的周圍脫離時如 圖5所示地伸長而使閥體62由開口部61 a的周圍脫離。 作爲具體之一例，閘閥6B，具備被配置於閥體62與主 滑塊66之間的，對開口部61 a的開口面64滑動於平行的方 向B之副滑塊82，於此副滑塊82被設有脫離機構80。 進而，於副滑塊82，被設有保持閥體62，同時使閥體 62的按壓方向及閥體62的脫離方向規定於對開口面64之垂 直的方向A的保持引導機構83。作爲保持引導機構83之一 例，可以包含被設置副滑塊82，沿著垂直的方向A被開口 之引導開口 84，及貫通此引導開口 84，被安裝於閥體62的 軸桿85而構成。軸桿85沿著引導開口 84前後移動，所以可 以把閥體62移動的方向規定爲垂直的方向A。 進而，於軸桿85的閥體62與相反側的先端，被設有凸 緣部86。在本例，伸縮體8 1，被配置於副滑塊82之相對於 主滑塊66的相對面87，及被設於此相對面87上的凸緣部86 之間。 凸緣部86，在閥體62被按壓於開口部61a的周圍時， 如圖4所示，壓縮伸縮體81，使閥體62由開口部61a的周圍 201120340 脫離時，如圖5所示，由被壓縮的伸縮體8 1承受伸長力’ 地退縮，在使閥體6 2由開口部6 1 a的周圍脫離時，如圖5所 示’由被壓縮的伸縮體8 1承受伸長力，使閥體62由開口部 6 1 &的周圍脫離。 又’脫離機構8 0，在伸縮體8 1成爲伸長狀態時，凸緣 部86以不接觸於主滑塊66爲佳。於本實施型態，在主滑塊 66設未圖示的開口部，脫離機構80之伸縮體81成爲伸長狀 態時，使凸緣部86不接觸於主滑塊66。 此外’於本實施型態，例示在保持引·導機構8 3安裝脫 離機構80之例’但分開設置保持引導機構83、脫離機構8〇 亦可。 其次’詳述包含閥體62的退避機構之全體的構成及動 作。 閥體62 ’由開口部61 a的周圍脫離之後，閥體62，以 可以進行基板G的移出移入的方式，避開開口部6ia的正面 。例如’閥體6 2 ’對開口部6 1 a，往上、下、左或右退避 。於本實施型態’閥體62對開口部61a往上退避》 圖6至圖8 ’係槪略顯示相關於本發明之一實施型態之 閘閥之一例之側面圖。此側面，與圖2及圖3同樣，例如， 係由圖1中的箭頭1〗所示的方向所見之側面。此外，圖6係 閘閥關閉的狀態，圖7係使閥體正對於開口面的狀態（閥 體從按壓被開放的狀態）’圖8係閘閥關閉的狀態（閥體 退避的狀態）。此外’圖1 〇係槪略顯示相關於本發明之— 實施型態之閘閥之一例之平面圖，圖丨丨係由圖丨〇中的箭頭 -13- 201120340 1 1所示方向（由共通搬送室30側朝向處理室l〇a的方向） 所見之正面圖。但是，於圖10，被配置於閥體62的上部（ 及下部）的中央部的按壓部69及對應於彼之按壓機構63的 圖不被省略。 如圖6至圖8所示，相關於一實施型態的閘閥6C，具備 使對開口部61a的開口面64往平行的方向B之副滑塊82的滑 動停止的擋止器90。擋止器90，例如，被設於閘閥室60的 底壁91。 此外，在圖6至圖8所示的閘閥6C，具有主滑塊66懸掛 著副滑塊82的懸掛部92。懸掛部92，例如爲突起部，此突 起部，位於被設在副滑塊82的開口 93的內部。 此外，如圖10及圖11所示，主滑塊66，具備在相對於 副滑塊82的相對面107側，使主滑塊66對副滑塊82滑動， 在本例爲可上下移動之垂直引導機構101，透過此垂直引 導機構101，連結副滑塊82與主滑塊66。又，垂直引導機 構101，於圖6至圖8省略圖示。作爲垂直引導機構101之一 例，可以構成爲包含被設於副滑塊82的相對面87，被設於 對開口面64平行的方向B之引導軌102，及被安裝於主滑塊 66的相對於副滑塊82的相對面107之連結構件103。藉由引 導軌1〇2與連結構件103，主滑塊66可以維持與副滑塊之連 結，同時對副滑塊82滑動。 進而，閘閥6C，如圖10及圖11所示，具備使主滑塊66 滑動，在本例爲上下滑動的垂直引導機構110。又，垂直 引導機構110，於圖6至圖8省略圖示。垂直引導機構110,S -10- 201120340 In the state around the mouth portion 61 a, when the roller 70 is attached to the protrusion portion 67, as shown in FIG. 3, the protrusion portion 67 presses the roller 70 in the vertical direction A, and the valve body 62 is pressed against The state around the opening 61a. Further, a sealing member (not shown) such as a 〇-shaped ring is provided around the opening 61a to improve airtightness. As shown in Fig. 9A, the pressing portion 69 is annularly arranged along the circumference of the opening 61a. Thereby, the valve body 62 can be pressed not only at the side portions but also at the upper portion and the lower portion. Next, a disengagement mechanism (valve return mechanism) and a vertical pressing mechanism (holding guide mechanism) of the valve body 62 will be described. The tension valve is used as the mechanism for disengaging the valve body from the closed state (the pressed state) to the open state (the state of being pressed open) by using the gate valve of the link mechanism. In short, when the gate valve is closed, the tension spring is extended to apply a pulling force to pull the valve body back to the base. When the gate valve is opened, the tension spring pulls the valve back to the abutment by retracting. In this manner, the tension spring is used in the disengagement mechanism of the valve body, and the tension spring is always applied to the tension spring in the state in which the gate valve is closed. Therefore, the tension spring has a possibility of being deteriorated and broken. Here, in the gate valve relating to an embodiment, a bit of effort has been made as explained below. 4 and 5 are side views showing an example of a valve body returning mechanism relating to a gate valve of an embodiment. This side is the side seen in the direction indicated by the arrow 11 in Fig. 1 as in Figs. 2 and 3. Further, Fig. 4 shows a state in which the gate valve is closed, and Fig. 5 shows a state in which the valve body is facing the opening surface -11 - 201120340 (the valve body is pressed to the opened state). As shown in Figs. 4 and 5, the gate valve 6B further includes a detaching mechanism 80 for detaching the valve body 62 from the periphery of the opening 61a, as compared with the gate valve 6A shown in Figs. 2 and 3 . The detachment mechanism 80 has a retractable expandable body 81 that is in a retracted state in a state in which the valve body 62 is closed. Specifically, a detachment mechanism has a compression spring. When the valve body 62 is pressed around the opening 61 a, the expansion body 81 is retracted as shown in FIG. 4, and when the valve body 62 is separated from the periphery of the opening 61a, the valve body 62 is extended as shown in FIG. 62 is separated from the periphery of the opening portion 61a. As a specific example, the gate valve 6B includes a sub-slider 82 disposed between the valve body 62 and the main slider 66 and sliding the opening surface 64 of the opening 61 a in the parallel direction B. 82 is provided with a disengagement mechanism 80. Further, the sub-slider 82 is provided with a holding guide mechanism 83 that holds the valve body 62 and defines the pressing direction of the valve body 62 and the direction in which the valve body 62 is disengaged in the direction A perpendicular to the opening surface 64. As an example of the holding guide mechanism 83, a sub-slider 82 is provided, a guide opening 84 that is opened in the vertical direction A, and a guide rod 84 that passes through the guide opening 84 and is attached to the shaft 85 of the valve body 62. Since the shaft 85 moves back and forth along the guide opening 84, the direction in which the valve body 62 moves can be defined as the vertical direction A. Further, a flange portion 86 is provided on the valve body 62 of the shaft 85 and the tip end on the opposite side. In this example, the expandable body 181 is disposed between the opposing surface 87 of the sub-slider 82 with respect to the main slider 66 and the flange portion 86 provided on the opposing surface 87. When the valve body 62 is pressed around the opening 61a, the flange portion 86 compresses the expandable body 81 as shown in FIG. 4, and when the valve body 62 is separated from the periphery 201120340 of the opening 61a, as shown in FIG. When the compressed expandable body 8 1 is subjected to the elongation force, it is retracted, and when the valve body 62 is detached from the periphery of the opening portion 61a, as shown in Fig. 5, 'the stretched body 8 1 is subjected to the elongation force, The valve body 62 is detached from the periphery of the opening portion 6 1 & Further, when the disengagement mechanism 80 is in the extended state, the flange portion 86 is preferably not in contact with the main slider 66. In the present embodiment, when the main slider 66 is provided with an opening (not shown) and the expandable body 81 of the detaching mechanism 80 is in an extended state, the flange portion 86 is not in contact with the main slider 66. Further, in the present embodiment, the example in which the separation mechanism 80 is attached to the guide mechanism 8 3 is exemplified, but the holding guide mechanism 83 and the detachment mechanism 8 may be separately provided. Next, the configuration and operation of the entire retracting mechanism including the valve body 62 will be described in detail. After the valve body 62' is separated from the periphery of the opening 61a, the valve body 62 avoids the front surface of the opening portion 6ia so that the substrate G can be removed and moved. For example, the valve body 6 2 ' is retracted upward, downward, left or right with respect to the opening portion 6 1 a. In the present embodiment, the valve body 62 is retracted from the opening 61a. Fig. 6 to Fig. 8' are schematic side views showing an example of a gate valve according to an embodiment of the present invention. This side surface is similar to that of FIG. 2 and FIG. 3, for example, the side surface seen by the direction shown by the arrow 1 of FIG. 6 is a state in which the gate valve is closed, and FIG. 7 is a state in which the valve body is facing the opening surface (a state in which the valve body is opened from the pressing). FIG. 8 is a state in which the gate valve is closed (a state in which the valve body is retracted). In addition, the figure of Fig. 1 shows a plan view of an example of a gate valve of the present invention, which is shown by the arrow 13-201120340 1 1 in the figure (by the common transfer room) The front side of the 30 side facing the processing chamber 10a) is seen. However, in Fig. 10, the pressing portion 69 disposed at the center portion of the upper portion (and the lower portion) of the valve body 62 and the drawing corresponding to the pressing mechanism 63 are not omitted. As shown in Fig. 6 to Fig. 8, the gate valve 6C according to an embodiment includes a stopper 90 for stopping the sliding of the sub-slider 82 in the direction B in which the opening surface 64 of the opening 61a is parallel. The stopper 90 is provided, for example, on the bottom wall 91 of the gate valve chamber 60. Further, in the gate valve 6C shown in Figs. 6 to 8, the suspension portion 92 in which the sub-slider 82 is suspended by the main slider 66 is provided. The hanging portion 92 is, for example, a projection which is provided inside the opening 93 of the sub-slider 82. Further, as shown in FIGS. 10 and 11, the main slider 66 is provided with the main slider 66 sliding to the sub-slider 82 on the side of the opposing surface 107 with respect to the sub-slider 82, and is movable up and down in this example. The vertical guide mechanism 101 connects the sub-slider 82 and the main slider 66 through the vertical guide mechanism 101. Further, the vertical guiding mechanism 101 is not shown in Figs. 6 to 8 . As an example of the vertical guide mechanism 101, the guide rail 102 provided in the opposite surface 87 of the sub-slider 82, the direction B parallel to the opening surface 64, and the relative to the main slider 66 may be included. The connecting member 103 on the opposite surface 107 of the sub-slider 82. By the guide rail 1〇2 and the joint member 103, the main slider 66 can maintain the connection with the sub-slider while sliding the sub-slider 82. Further, as shown in FIGS. 10 and 11, the gate valve 6C includes a vertical guide mechanism 110 that slides the main slider 66 and slides up and down in this example. Further, the vertical guiding mechanism 110 is not shown in Figs. 6 to 8 . Vertical guiding mechanism 110,
S -14- 201120340 使主滑塊66沿著對開口部61a的開口面64平行的方向B上下 滑動。垂直引導機構110，可以是與垂直引導機構101同樣 的構成。亦即，如圖10及圖11所示，可以構成爲包含被設 於閘閥室60的內壁，對開口面64平行的方向B之引導軌104 ，及被安裝於主滑塊66的連結構件105。 進而，閘閥6C，如圖10及圖1 1所示，具備驅動主滑塊 66，在本例爲上下驅動的驅動機構120。作爲驅動機構120 ，例如能夠以汽缸或者油壓缸等來構成。驅動機構1 20， 透過接續接頭121而被連接於主滑塊66。主滑塊66藉由垂 直引導機構1 10沿著對開口面64平行的方向B被導引，同時 藉由驅動機構120上下移動。又，驅動機構120及接續接頭 121，於圖6至圖8省略圖示。 其次，用圖6至圖8詳細說明相關於本發明之閘閥的動 作。 如圖8所示，於閘閥6 C打開的狀態（閥體6 2由開口部 6 la的正面退開的狀態），藉由設於主滑塊的懸掛部92支 撐著副滑塊82。又，閥體62如前所述，藉由被設於副滑塊 82的保持引導機構83支撐著。驅動機構120及被設於主滑 塊66的垂直引導機構110，主滑塊66維持支撐副滑塊82的 狀態，同時沿著對開口面64平行的方向B下降。 如圖7所示，當主滑塊下降至閥體62與開口部61 a正對 的位置時，副滑塊82的下降，藉由擋止器90阻止，閥體也 停止。副滑塊82的下降被停止後，藉由垂直引導機構ιοί ，僅主滑塊66沿著垂直引導機構110進而下降。藉此，按 -15- 201120340 壓機構63的突起部67替代傾斜部68，透過按壓部69使閥體 62按壓於開口部61a的周圍》此時，閥體62藉由保持引導 機構83，沿著對開口面64垂直的方向A被按壓，閥體62成 爲對開口面64不偏移地關閉閘閥的狀態（參照圖6 )。 接著，要由此狀態變成閘閥打開的狀態（參照圖8 ) 時，首先，藉由驅動機構120使主滑塊66上升。主滑塊66 上升時，如圖7所示，輥70由突起部67轉動至傾斜部68， 伸縮體81使閥體62沿著對開口面64垂直的方向A拉伸，使 閥體62被往副滑塊82拉，而由開口部61 a的周圍脫離。 主滑塊66進而再上升時，如圖7所示，懸掛部92抵接 於副滑塊82的開口 93之緣。進而，使主滑塊66上升時，懸 掛部92，懸掛於藉由擋止器90停止的副滑塊82的開口 93， 使副滑塊82及閥體62上升。藉此，閥體62，如圖8所示， 由開口部61a的正面退開，亦即，可以退避至開口部61a的 上方，使透過開口部61之基板G的出入成爲可能。 由前述說明可知，根據本發明之閘閥，被設於主滑塊 66的按壓機構63，在使閥體62正對於開口部61a的狀態， 對開口面64壓出於垂直的方向A，可以使閥體62均一地按 壓於開口部61a的周圍。此外，主滑塊66，透過引導機構 101連結於閘閥室60之內壁，主滑塊66於對開口面64垂直 的方向A，被支撐於閘閥室60的內壁。因此，例如於處理 室l〇a以比共通搬送室30的壓力更高的壓力進行處理的場 合，或在維修時拆除處理室l〇a的場合等，於閥體62被加 以逆壓的場合，按壓機構63也繼續朝垂直的方向A按壓閥 -16- 201120340 體62的按壓部69。而且，按壓機構63僅進行滑動，在本例 爲上下滑動，不斜向移動。總之，按壓機構63，即使受到 逆壓也不會斜向移動，而僅僅均勻地持續把按壓部69按壓 於垂直的方向A。因此，閥體62受到逆壓時，特別是閥體 62的尺寸變大，受到大的逆壓時，也可以使閥體62難以離 開開口部6 1 a的周圍，可以得到即使閥體之尺寸變大也很 難降低氣密性的閘閥，及使用此閛閥的基板處理系統。 此外，於專利文獻1所示的閘閥，維持閘閥於關閉的 狀態必須要使油壓缸持續動作。然而，本發明之閘閥之按 壓機構63，係藉由凸輪按壓閥體62的構成，所以要使閘閥 維持在關閉的狀態不需要另外的驅動力。因而，即使由於 維修等，停止了驅動用的壓縮空氣或電力的狀態，也可以 維持閘閥關閉的狀態。 進而，於根據連桿機構的閘閥，係藉由設在閥體的兩 側面之連桿支撐閥體。當閥體的重量增加時，會有耐不住 閥體的重量而使連桿變形的疑慮。根據相關於本發明的一 實施型態之閘閥，閥體62係藉由設在副滑塊82的保持引導 機構83來支撐，保持引導機構83可以在副滑塊82上到處設 置。例如，在副滑塊82的中央部亦可以設置，可以設置很 多保持引導機構83。此外，保持副滑塊82的被設於主滑塊 6 6的懸掛部9 2也同樣，只要是對應於副滑塊8 2的開口 9 3的 處所’可以設在主滑塊6 6之任何處所。因而，即使閥體6 2 的尺寸變大重量增加，也可以支撐閥體62，可以對應於閥 體62的尺寸的大型化。 -17- 201120340 進而，藉由在副滑塊82設置保持引導機構83，可以正 確地使閥體62對開口面64垂直地抵壓。而且，副滑塊82， 透過垂直引導機構1〇1與主滑塊66連結’所以副滑塊82不 會對開口面Μ斜向偏離。由這些情形，可以得到使氣密性 更難降低的閘閥，及使用此閘閥之基板處理系統。 進而，根據相關於本發明之一實施型態的閘閥的話， 於脫離機構80使用伸長狀態變安定的伸縮體81，可以在閘 閥關閉的狀態，對伸縮體81施以壓縮力。藉此，與在關閉 閘閥的狀態總是對伸縮體作用著拉伸力的場合相比，可以 解消伸縮體斷掉的情形。因而，例如，可以得到解消了在 基板處理中伸縮體斷掉，使閥體62無法由開口部61a的周 圍脫離之類的不良情形之閘閥，及使用彼之基板處理系統 〇 圖12A及圖12 B係相關於本發明之一實施型態之一變型 例之閘閥之剖面圖。圖1 2 A所示之剖面係沿著圖1 2B中的 12A-12A線之縱剖面，圖12B所示之剖面，係沿著圖12A中 的12B-12B線之橫剖面。此外，於圖12A及圖12B所示之一 變形例，係省略副滑塊82之例示，於具備副滑塊82的場合 當然也可以適用。 如圖12A及圖12B所示，藉由按壓機構63按壓於開口面 64的閥體62的周圍一般被安裝著密封構件130。藉由密封 構件130被按壓於開口面64而使開口 61 a被密封。密封構件 130之例爲Ο形環。在處理中，會由開口 61a對閥體62施加 逆壓。這樣的逆壓，藉由以閥體62自身的剛性與根據來自 -18- 201120340 主滑塊66的按壓機構63的按壓力而反壓，使密封構件130 密接於開口面64而可以保持氣密性。 此外，於相關於一實施型態的閘閥，於主滑塊66之後 側，例如，被配置引導軌1 04，於此引導軌1 04被安裝於主 滑塊66的連結構件1 05，以可滑動的狀態被連結。這樣的 引導軌1 04，係沿著開口 6 la的側部配置的。因此，在由閥 體62對主滑塊66施加逆壓時，作爲承受來自主滑塊66的逆 壓的部分而發揮功能，發揮限制沿著開口 6 1 a的側部之主 滑塊66的彈性變形之作用。 然而，如前所述相關於一實施型態的閘閥具備對於大 型化有利的構成。相關於一實施型態的閘閥具有，例如， 係開口 61a的一邊爲公尺等級，例如，數公尺X數公尺的大 小也可以對應的構成。開口 6 1 a的一邊爲公尺等級的場合 ，閥體62的一邊的大小也變成公尺等級。 如此般，成爲大的閥體62時，受到的逆壓也變很大。 受到大的逆壓的閥體62，對主滑塊66，沿著開口 61a的上 部、下部，施加使其變形之力。結果，主滑塊6 6發生彈性 變形_。 受到逆壓的閥體62的變形，例如即使僅有一點點，在 閥體62的一邊例如具有公尺等級的大小的場合，開口 6la 上部的中央部分’及開口 61a下部的中央部分之變形會變 得非常大。 但是，相關於一實施型態之閘閥，在沿著開口 6 1 a的 上部、下部的部分，沒有引導軌104那樣的，承受來自主 -19- 201120340 滑塊66的逆壓的部分。 若閥體62的開口 61a上部的中央部分，及開口 61a下部 的中央部分，超過密封構件130的擠壓限而變形的話’密 封構件130會離開開口面64，使氣密性降低。 在此，於一變形例，在與主滑塊66之與閥體62相反之 側，對應於開口 61a上部的中央部分的位置’以及對應於 開口 61 a下部的中央部分的位置，設置限制主滑塊66的彈 性變形量之衝立部131。在本例’將衝立部131設於共通搬 送室3 0側的開口 5 1 c、6 1 c分別的上部中央部分、下部中央 部分。衝立部131，在本例爲固定安裝於共通搬送室30的 壁面，雖可拆除，但是設計成在安裝時不能容易動到。例 如，以螺栓鎖緊。 如此般，藉由在對應於開口 61a上部的中央部分的位 置，以及對應於開口 61a下部的中央部分的位置設衝立部 131，即使對主滑塊施加來自閥體62的逆壓，主滑塊66的 彈性變形也被衝立部1 3 1限制住。藉由限制主滑塊66的彈 性變形，可以止住閥體62的開口 61a上部的中央部分、及 開口 61a下部的中央部分的變形。例如，把主滑塊66與衝 立部1 3 1的先端部分1 3 2的間隔距離設爲小於密封構件1 3 0 之擠壓限的話，可以抑制閥體62的開口 61 a上部的中央部 分、及開口 61a下部的中央部分，超過密封構件130的擠壓 限而變形。作爲具體的數値之例’會隨著閥體6 2的大小， 或設想的逆壓大小而改變’但在此試舉一例如下。 (閥體62塞住處理室l〇a、10b的容器本體50a、5 Ob的S - 14 - 201120340 causes the main slider 66 to slide up and down in the direction B parallel to the opening surface 64 of the opening 61a. The vertical guiding mechanism 110 may have the same configuration as the vertical guiding mechanism 101. That is, as shown in FIGS. 10 and 11, the guide rail 104 provided in the inner wall of the gate valve chamber 60, the direction B parallel to the opening surface 64, and the joint member attached to the main slider 66 may be included. 105. Further, as shown in Figs. 10 and 11 , the gate valve 6C includes a drive main slider 66, and in this example, a drive mechanism 120 that drives up and down. The drive mechanism 120 can be configured, for example, by a cylinder or a hydraulic cylinder. The drive mechanism 1 20 is connected to the main slider 66 through the joint joint 121. The main slider 66 is guided by the vertical guiding mechanism 10 in a direction B parallel to the opening surface 64 while being moved up and down by the driving mechanism 120. Further, the drive mechanism 120 and the joint joint 121 are not shown in Figs. 6 to 8 . Next, the operation of the gate valve relating to the present invention will be described in detail with reference to Figs. 6 through 8. As shown in Fig. 8, in the state in which the gate valve 6 C is opened (the valve body 6 2 is retracted from the front surface of the opening portion 6 la ), the sub-slider 82 is supported by the hanging portion 92 provided on the main slider. Further, the valve body 62 is supported by the holding guide mechanism 83 provided on the sub-slider 82 as described above. The drive mechanism 120 and the vertical guide mechanism 110 provided in the main slider 66 maintain the state in which the sub-slider 82 is supported while descending in the direction B parallel to the opening surface 64. As shown in Fig. 7, when the main slider is lowered to a position where the valve body 62 is opposed to the opening portion 61a, the lowering of the sub-slider 82 is prevented by the stopper 90, and the valve body is also stopped. After the lowering of the sub-slider 82 is stopped, only the main slider 66 is further lowered along the vertical guiding mechanism 110 by the vertical guiding mechanism ιοί. Thereby, the protruding portion 67 of the pressing mechanism 63 is replaced by the inclined portion 68 by the -15-201120340, and the valve body 62 is pressed against the opening portion 61a through the pressing portion 69. At this time, the valve body 62 is held by the guiding mechanism 83. The direction A perpendicular to the opening surface 64 is pressed, and the valve body 62 is in a state in which the gate valve is closed without shifting the opening surface 64 (see FIG. 6). Next, when the state is changed to the state in which the gate valve is opened (see FIG. 8), first, the main slider 66 is raised by the drive mechanism 120. When the main slider 66 is raised, as shown in Fig. 7, the roller 70 is rotated by the projection 67 to the inclined portion 68, and the expandable body 81 stretches the valve body 62 in the direction A perpendicular to the opening surface 64, so that the valve body 62 is The sub-slider 82 is pulled and is separated from the periphery of the opening 61a. When the main slider 66 is further raised, as shown in Fig. 7, the hanging portion 92 abuts against the edge of the opening 93 of the sub-slider 82. Further, when the main slider 66 is raised, the suspension portion 92 is suspended from the opening 93 of the sub-slider 82 stopped by the stopper 90, and the sub-slider 82 and the valve body 62 are raised. As a result, the valve body 62 is retracted from the front surface of the opening 61a as shown in Fig. 8, that is, it can be retracted above the opening 61a, and the entry and exit of the substrate G through the opening 61 can be made possible. As apparent from the above description, the gate valve provided in the main slider 66 can be pressed in the vertical direction A with respect to the opening surface 64 in the state in which the valve body 62 faces the opening 61a. The valve body 62 is uniformly pressed around the opening portion 61a. Further, the main slider 66 is coupled to the inner wall of the gate valve chamber 60 through the guiding mechanism 101, and the main slider 66 is supported by the inner wall of the gate valve chamber 60 in the direction A perpendicular to the opening surface 64. Therefore, for example, when the processing chamber 10a is processed at a higher pressure than the pressure of the common transfer chamber 30, or when the processing chamber 10a is removed during maintenance, the valve body 62 is reversely pressed. The pressing mechanism 63 also continues to press the pressing portion 69 of the valve-16-201120340 body 62 in the vertical direction A. Further, the pressing mechanism 63 slides only, and in this example, it slides up and down and does not move obliquely. In short, the pressing mechanism 63 does not move obliquely even if subjected to back pressure, but merely continuously presses the pressing portion 69 in the vertical direction A. Therefore, when the valve body 62 is subjected to the back pressure, in particular, the size of the valve body 62 is increased, and when a large back pressure is applied, the valve body 62 can be hardly separated from the periphery of the opening portion 61a, and the size of the valve body can be obtained. It is also difficult to reduce the airtight gate valve and the substrate processing system using the helium valve. Further, in the gate valve disclosed in Patent Document 1, it is necessary to keep the hydraulic cylinder continuously operated while maintaining the closed state of the gate valve. However, the pressing mechanism 63 of the gate valve of the present invention is configured by the cam pressing the valve body 62, so that no additional driving force is required to maintain the gate valve in the closed state. Therefore, even if the state of the compressed air or electric power for driving is stopped due to maintenance or the like, the state in which the gate valve is closed can be maintained. Further, in the gate valve according to the link mechanism, the valve body is supported by the links provided on both side faces of the valve body. When the weight of the valve body is increased, there is a fear that the weight of the valve body cannot withstand the deformation of the connecting rod. According to the gate valve according to an embodiment of the present invention, the valve body 62 is supported by the holding guide mechanism 83 provided on the sub-slider 82, and the holding guide mechanism 83 can be disposed everywhere on the sub-slider 82. For example, it is also possible to provide a central portion of the sub-slider 82, and a large number of holding guides 83 can be provided. Further, the suspension portion 92 which is provided on the main slider 66 of the sub-slider 82 is also similar, and any space corresponding to the opening 9 3 of the sub-slider 8 2 may be provided in any of the main sliders 6 6 Premises. Therefore, even if the size of the valve body 6 2 is increased and the weight is increased, the valve body 62 can be supported, and the size of the valve body 62 can be increased. -17- 201120340 Further, by providing the holding guide mechanism 83 in the sub-slider 82, the valve body 62 can be accurately pressed against the opening surface 64. Further, the sub-slider 82 is coupled to the main slider 66 through the vertical guide mechanism 1〇1, so that the sub-slider 82 does not obliquely deflect the opening surface. In these cases, a gate valve which makes the airtightness more difficult to reduce, and a substrate processing system using the gate valve can be obtained. Further, according to the gate valve according to the embodiment of the present invention, the expansion mechanism 81 is stabilized in the extended state by the release mechanism 80, and the expansion force can be applied to the expansion/contractor 81 in a state where the gate valve is closed. Thereby, compared with the case where the tensile force is always applied to the expandable body when the gate valve is closed, the case where the expandable body is broken can be eliminated. Therefore, for example, it is possible to obtain a gate valve in which the expansion/contraction body is broken during the substrate processing, the valve body 62 cannot be separated from the periphery of the opening portion 61a, and the substrate processing system using the same can be obtained. FIGS. 12A and 12 B is a cross-sectional view of a gate valve relating to a variation of one embodiment of the present invention. The section shown in Fig. 1 2A is a longitudinal section along the line 12A-12A in Fig. 12B, and the section shown in Fig. 12B is a section along the line 12B-12B in Fig. 12A. Further, in the modification shown in Figs. 12A and 12B, the example in which the sub-slider 82 is omitted is also applicable to the case where the sub-slider 82 is provided. As shown in Figs. 12A and 12B, the sealing member 130 is generally attached around the valve body 62 pressed against the opening surface 64 by the pressing mechanism 63. The opening 61a is sealed by the sealing member 130 being pressed against the opening face 64. An example of the sealing member 130 is a Ο-shaped ring. In the process, a back pressure is applied to the valve body 62 by the opening 61a. Such back pressure can be kept airtight by sealing the sealing member 130 to the opening surface 64 by back pressure with the rigidity of the valve body 62 itself and the pressing force of the pressing mechanism 63 from the main slider 66 of -18-201120340. Sex. Further, in the gate valve relating to an embodiment, on the rear side of the main slider 66, for example, the guide rail 104 is disposed, and the guide rail 104 is attached to the joint member 105 of the main slider 66, so that The state of the slide is linked. Such a guide rail 104 is disposed along the side of the opening 6 la. Therefore, when the back pressure is applied to the main slider 66 by the valve body 62, it functions as a portion that receives the back pressure from the main slider 66, and functions as a main slider 66 that restricts the side portion along the opening 61a. The role of elastic deformation. However, the gate valve relating to an embodiment as described above has a configuration advantageous for the enlargement. The gate valve according to an embodiment has, for example, one side of the opening 61a being of a metric scale, for example, a size of several meters X meters or the like. When one side of the opening 6 1 a is a metric level, the size of one side of the valve body 62 also becomes a metric level. As a result, when the valve body 62 is large, the back pressure is also greatly increased. The valve body 62 subjected to a large back pressure applies a force for deforming the main slider 66 along the upper and lower portions of the opening 61a. As a result, the main slider 66 is elastically deformed_. The deformation of the valve body 62 subjected to the back pressure, for example, even if there is only a little bit, when one side of the valve body 62 has a size of, for example, a metric grade, the central portion of the upper portion of the opening 61a and the central portion of the lower portion of the opening 61a are deformed. It has become very big. However, the gate valve according to an embodiment has a portion which is subjected to the back pressure from the main -19-201120340 slider 66 in the upper portion and the lower portion along the opening 61a without the guide rail 104. When the central portion of the upper portion of the opening 61a of the valve body 62 and the central portion of the lower portion of the opening 61a are deformed beyond the pressing limit of the sealing member 130, the sealing member 130 is separated from the opening surface 64 to lower the airtightness. Here, in a modification, on the side opposite to the valve body 62 of the main slider 66, the position ' corresponding to the central portion of the upper portion of the opening 61a and the position corresponding to the central portion of the lower portion of the opening 61a are provided to limit the main The erecting portion 131 of the elastic deformation amount of the slider 66. In this example, the erecting portion 131 is provided at an upper central portion and a lower central portion of the openings 5 1 c and 6 1 c on the side of the common transfer chamber 30. The erecting portion 131 is detachably attached to the wall surface of the common conveying chamber 30 in this example, but is designed so as not to be easily moved during mounting. For example, tighten with a bolt. In this manner, by providing the erecting portion 131 at a position corresponding to the central portion of the upper portion of the opening 61a and a position corresponding to the central portion of the lower portion of the opening 61a, even if a back pressure from the valve body 62 is applied to the main slider, the main slider The elastic deformation of 66 is also limited by the erecting portion 1 31. By restricting the elastic deformation of the main slider 66, it is possible to stop the deformation of the central portion of the upper portion of the opening 61a of the valve body 62 and the central portion of the lower portion of the opening 61a. For example, when the distance between the main slider 66 and the tip end portion 13 2 of the erect portion 133 is set to be smaller than the squeezing limit of the sealing member 130, the central portion of the upper portion of the opening 61a of the valve body 62 can be suppressed. And the central portion of the lower portion of the opening 61a is deformed beyond the pressing limit of the sealing member 130. As an example of a specific number, it will vary depending on the size of the valve body 62 or the magnitude of the reverse pressure assumed. However, an example is given below. (The valve body 62 plugs the container bodies 50a, 5 Ob of the process chambers 10a, 10b
S -20- 201120340 場合） •下段的衝立部〗3 1 L的先端部分1 3 2與主滑塊6 6之間 隔距離爲Dl爲〇,3mrn以上〇.35mm以下 •上段的衝立部131U的先端部分I32與主滑塊66之間 Pll距離爲Dti爲〇.5mm以上0.55mm以下 (閥體62塞住加載互鎖室20的容器本體50d的場合） •下段的衝立部131L的先端部分132與主滑塊66之間 隔距離爲Dl爲0.4mm以上0.45 mm以下 •上段的衝立部131U的先端部分132與主滑塊66之間 隔距離爲Du爲0.6mm以上0.65mm以下 這些數値範圍，係由閥的構成構件之移動時的接觸等 之風險來決定下限値，由逆壓時保持氣密性之容許界限來 決定上限値。 這樣之一變形例，例如，在閥體62 —邊的尺寸爲公尺 等級的場合，或者設想的逆壓很大的場合，特別有效。 前述說明僅係本發明之一實施型態，本發明並不以前 述一實施型態爲限，可以實施種種變形。此外，本發明之 實施型態，並不以前述實施型態爲唯一之型態。 例如，藉由閥體62的按壓機構63而被按壓的按壓部69 ，在前述實施型態，可以設在閥體62之任何處所。例如， 使用連桿機構的場合，藉由設在閥體的兩側面之連桿來進 行按壓。對此，按壓部69於閥體62的上部及下部都可以配 置。因此，如圖9A所示，不僅閥體的側部，閥體的上部及 下部也可以進行按壓。 -21 - 201120340 此外，按壓部69可以配置於閥體62的面內。因此，例 如，如圖9 B所示，可以沿著閥體6 2最受到壓力的開口部 6 la的內側環狀地配置。 進而，亦可如圖9C所示，對應於開口部61a的中央部 分，進而再配置。 如此般藉由將按壓部69配置於開口部61 a的內側，對 閥體62受到的逆壓，能夠以阻止閥體62的變形的方式來按 壓閥體62。藉此，可得即使閥體的尺寸變大也很難進而使 氣密性降低之閘閥。 又，特別在沿著開口部6 1 a的內側環狀地配置，進而 對應於開口部61 a的中央部分配置，而能更佳地實現此優 點。 於圖9A至圖9C，顯示於在閥體62的各邊分別設3個， 沿著開口部61a環狀地設合計8個或者在中央加上1個共設 置9個按壓部6 9之例，但不以此爲限。例如，使按壓部6 9 在閥體62的各邊分別設4個合計12個，或者於中央加上1個 共13個的構成亦可，超過這些數量亦可。但是，不管如何 ，設於閥體62的各邊的按壓部69，最好是以距離均等的方 式配置，以可以均勻地按壓閥體62的方式構成者爲佳。 此外，於前述一實施型態，顯示使閥體、副滑塊及主 滑塊上下移動之例，但採左右移動的形式亦可。 進而，在前述一實施型態，以包含突起部6 7與傾斜部 68的凸輪構成按壓機構63，以接觸於凸輪之輥7〇來構成按 壓部69，但以輥構成按壓機構，以包含突起部與傾斜部的S -20- 201120340 Case) • The erecting part of the lower section 3-1 The distance between the tip end part 1 3 2 of L1 and the main slider 6 6 is D1 〇, 3mrn or more 〇.35mm or less • The apex of the upper section of the erecting part 131U The P11 distance between the portion I32 and the main slider 66 is Dti of 〇.5 mm or more and 0.55 mm or less (when the valve body 62 is plugged to the container body 50d of the load lock chamber 20). • The tip end portion 132 of the lower portion of the erecting portion 131L is The distance between the main sliders 66 is D1 of 0.4 mm or more and 0.45 mm or less. • The distance between the tip end portion 132 of the upper portion of the erecting portion 131U and the main slider 66 is a range of Du of 0.6 mm or more and 0.65 mm or less. The lower limit 决定 is determined by the risk of contact during movement of the constituent members of the valve, and the upper limit 决定 is determined by the allowable limit of maintaining airtightness during back pressure. Such a modified example is particularly effective when the size of the side of the valve body 62 is a metric grade or when the back pressure is assumed to be large. The foregoing description is only one embodiment of the present invention, and the present invention is not limited to the embodiments described above, and various modifications can be made. Further, the embodiment of the present invention is not the only one of the foregoing embodiments. For example, the pressing portion 69 that is pressed by the pressing mechanism 63 of the valve body 62 can be provided in any position of the valve body 62 in the above-described embodiment. For example, when a link mechanism is used, pressing is performed by a link provided on both side faces of the valve body. In this regard, the pressing portion 69 can be disposed at both the upper portion and the lower portion of the valve body 62. Therefore, as shown in Fig. 9A, not only the side portion of the valve body but also the upper portion and the lower portion of the valve body can be pressed. -21 - 201120340 Further, the pressing portion 69 may be disposed in the surface of the valve body 62. Therefore, for example, as shown in Fig. 9B, it is possible to arrange annularly along the inner side of the opening portion 6 la where the valve body 6 2 is most subjected to pressure. Further, as shown in Fig. 9C, the central portion of the opening 61a may be further disposed. By arranging the pressing portion 69 inside the opening portion 61a, the valve body 62 can be pressed against the deformation of the valve body 62 by the back pressure applied to the valve body 62. Thereby, it is possible to obtain a gate valve which is difficult to further reduce the airtightness even if the size of the valve body is increased. Further, in particular, it is disposed in an annular shape along the inner side of the opening portion 61a, and further corresponding to the central portion of the opening portion 61a, and this advantage can be further achieved. In FIGS. 9A to 9C, three are provided on each side of the valve body 62, and eight of them are annularly arranged along the opening 61a or nine are provided in the center. , but not limited to this. For example, it is also possible to provide the pressing portion 6 9 in a total of twelve on each side of the valve body 62, or to add a total of 13 to the center. However, in any case, it is preferable that the pressing portions 69 provided on the respective sides of the valve body 62 are disposed in such a manner as to have a uniform distance, and it is preferable that the valve body 62 can be uniformly pressed. Further, in the above-described embodiment, an example in which the valve body, the sub-slider, and the main slider are moved up and down is shown, but the form of moving left and right may be employed. Further, in the above-described embodiment, the pressing mechanism 63 is constituted by a cam including the protruding portion 6 7 and the inclined portion 68, and the pressing portion 69 is configured to be in contact with the roller 7 of the cam, but the pressing mechanism is constituted by the roller to include the protrusion. Part and slope
A -22- 201120340 凸輪構成按壓部亦可。 進而，在前述一實施型態，作爲被處理體顯示使用於 太陽電池或平面面板顯示器的製造之玻璃基板’但被處理 體不限於玻璃基板，亦可爲半導體晶圓等其他基板。 【圖式簡單說明】 圖1係槪略顯示使用相關於一實施型態之閘閥之基板 處理系統之一例之平面圖。 圖2係槪略顯示相關於一實施型態之閘閥的按壓機構 之一例之側面圖。 圖3係槪略顯示相關於一實施型態之閘閥的按壓機構 之一例之側面圖。 圖4係槪略顯示相關於一實施型態之閘閥的脫離機構 之一例之側面圖。 圖5係槪略顯示相關於一實施型態之閘閥的脫離機構 之一例之側面圖。 圖6係槪略顯示相關於一實施型態之閘閥的一例之側 面圖。 圖7係槪略顯示相關於一實施型態之閘閥的一例之側 面圖。 圖8係槪略顯示相關於一實施型態之閘閥的一例之側 面圖。 圖9係顯示按壓部的配置例之圖。 圖1 〇係槪略顯示相關於—實施型態之閘閥之一例之平 -23- 201120340 面圖。 圖11係由圖10中的箭頭11之方向所見之正面圖。 圖1 2係相關於本發明之一實施型態之一變型例之閘閥 之剖面圖。 【主要元件符號說明】 6A、6B、6C :閘閥 1 0a、1 Ob :處理室 20 :加載互鎖（load-lock)室 3 0 :搬送室 60 :聞閥室 61a、 61b、 61c、 61d:開口部 62 :閥體 63 :按壓機構 6 4 :開口面 6 6 :主滑塊 67 :突起部 6 8 :傾斜部 69 :按壓部 70 :輥 80 :脫離機構 8 1 :伸縮體 8 2 :副滑塊 83 :保持引導機構 -24- 201120340 84 :引導開口 8 5 :轉軸 8 6 :凸緣部 8 7 :相對面 90 :擋止器 91 :底壁 92 :懸掛部 93 :開口A -22- 201120340 The cam may constitute a pressing portion. Further, in the above-described embodiment, the glass substrate used for the production of a solar cell or a flat panel display is displayed as the object to be processed. However, the object to be processed is not limited to the glass substrate, and may be another substrate such as a semiconductor wafer. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a plan view showing an example of a substrate processing system using a gate valve relating to an embodiment. Fig. 2 is a side elevational view showing an example of a pressing mechanism relating to a gate valve of an embodiment. Fig. 3 is a side elevational view showing an example of a pressing mechanism relating to a gate valve of an embodiment. Fig. 4 is a side elevational view showing an example of a disengagement mechanism relating to a gate valve of an embodiment. Fig. 5 is a side elevational view showing an example of a disengagement mechanism relating to a gate valve of an embodiment. Fig. 6 is a side elevational view showing an example of a gate valve relating to an embodiment. Fig. 7 is a side elevational view showing an example of a gate valve relating to an embodiment. Fig. 8 is a side elevational view showing an example of a gate valve relating to an embodiment. Fig. 9 is a view showing an arrangement example of a pressing portion. Fig. 1 shows a plan view of an example of a gate valve related to the implementation type. Figure 11 is a front elevational view taken in the direction of arrow 11 in Figure 10. Fig. 1 is a cross-sectional view showing a gate valve relating to a modification of an embodiment of the present invention. [Explanation of main component symbols] 6A, 6B, 6C: Gate valve 1 0a, 1 Ob : Process chamber 20: Load-lock chamber 3 0: Transfer chamber 60: Smell valve chambers 61a, 61b, 61c, 61d: Opening portion 62: valve body 63: pressing mechanism 6 4 : opening surface 6 6 : main slider 67 : projection portion 6 8 : inclined portion 69 : pressing portion 70 : roller 80 : detaching mechanism 8 1 : expansion body 8 2 : vice Slider 83: holding guide mechanism - 24, 201120340 84: guide opening 8 5 : shaft 8 6 : flange portion 8 7 : opposite surface 90 : stopper 91 : bottom wall 92 : hanging portion 93 : opening