TW201017804A - Processing system - Google Patents

Abstract

The subject matter of the present invention is to efficiently realize shortening of the whole size and shortening of the tact time in an in-line system wherein a plurality of processing units are arranged along a process line of a linearly extended reciprocating path according to a sequence of a process flow. The coating and developing processing system 10 has a cassette station (C/S) 14, an outward process line A, an interface station (I/F) 18, a homeward process line B, and a space NS. The space NS is enclosed by the cassette station (C/S) 14, the process line A, the interface station (I/F) 18 and the process lines B. It is formed straight in the direction of X in the enclosed area. Two reduced-pressure drying units 66L, 66R as the third groups unit are set up mutually face to face respectively at the predetermined position in the space NS. One transfer device 68 is set up between both units 66L, 66R.

Description

[Technical Field] The present invention relates to a processing system for transporting a transport path of a substrate to be processed in a horizontal direction in a series of processing processes in a series of processes. [Prior Art] Conventionally, a resist coating development processing system manufactured by an FPD (Flat Panel Display) is equipped with a translation type processing unit for laying a roller in a horizontal direction in order to increase the size of a substrate to be processed. When the carrier such as a roller is transported horizontally on the translational conveyance path, a predetermined liquid, gas, light, or the like is supplied to the surface to be processed of the substrate, and the desired processing is performed to make the order of the process flow along the horizontal level. The route of the direction is to serially arrange the system configuration or layout standardization of a plurality of processing units including the processing unit of such a translation mode (for example, refer to Patent Document 1). 9 As described in Patent Document 1, such a layout is such that a horizontally long process station is disposed in the center of the system, and a cassette station and a interface station are disposed at both ends in the longitudinal direction. The cassette station carries in and out of the cassette of the unprocessed or processed substrate between the platform in the station and the outside of the system, and the substrate is carried in and out between the cassette on the platform and the processing station. The interface station performs the transfer of the substrate between the adjacent exposure device and the processing station. The process station is a two-row process route with a card station as the starting point and the end point, and the interface station as the turning point and the return path. In general, the process route in the forward route is a unit of the cleaning treatment system, a unit of the resist coating processing system, a unit of -5 - 201017804 thermal processing system, or the like, or a unit arranged in a transport system. . The process route of the re-route is a unit of the development processing system, a unit of the thermal processing system, a unit of the inspection system, and the like, or arranged in a row with the unit of the transport system interposed therebetween. [Patent Document 1] JP-A-2007-200993 SUMMARY OF THE INVENTION (Problems to be Solved by the Invention) _ As described above, the processing method including the translation mode is arranged in series in the order of the process flow along the processing route of the linear reciprocating path The tandem type processing system of the plurality of processing units of the processing unit is such that the length of the system (the full length dimension) of the system becomes larger as the FPD substrate is enlarged, which is a footprint for the FPD manufacturing plant. The face is a disadvantage. Further, the processing speed of the exposure apparatus is increased, and in each of the processing units of the resist coating and developing processing system, the required station time (TactTime) is shortened. Among them, in the case where the process of reducing the pressure between the resist coating process and the prebaking process is carried out, since the vacuum drying process takes a relatively long time, it is most difficult to shorten the station time of the vacuum drying unit. In particular, when a halftone exposure process is used for photolithography, the film thickness of the resistive mask is about 1.5 to 2 times (about 2.0 to 3.0 μm) which is usually (about 1.5 μm), and the portion is in the resist. Since the amount of solvent used per substrate in the coating process is increased, the time required for evaporation of the solvent in the reduced-pressure drying unit is prolonged, and it is more difficult to shorten the station time. The present invention has been made in view of the above-described problems of the prior art, and the purpose of the present invention is to provide a processing unit in which a plurality of processing units are arranged in the order of a process flow in a process route of a reciprocating path extending along a straight line. In the tandem system, the processing system for shortening the full-length size and shortening the station time is efficiently realized. (Means for Solving the Problem) In order to achieve the above object, in the processing system according to the first aspect of the present invention, Φ is a series type in which a plurality of processing units are connected in the order of the process flow, and a series of processes are performed on the substrate to be processed. The processing system is characterized in that: the first process route is included in the first direction of the system in the first direction: the processing units of the first group are adjacent to each other, or are arranged in a row via the transport unit, and the substrate is transferred by translation. The first forward translation transfer unit and the second forward translation transfer unit that translates the substrate on the downstream side of the process flow of the first forward translation transfer unit; ❹ the second process route is in the longitudinal direction of the system The second direction opposite to the first direction is adjacent to the processing unit of the second group on the downstream side of the process flow of the first process route or is arranged in a row via the transport system unit, and is oriented in the system width direction. The first process route vacates a predetermined size of the atrium space to extend in parallel; the third group of processing units are disposed in the atrium space; and the first transport device It is disposed in the atrium space, and one of the processing units that are transported to the third group from the substrate delivery unit on the terminal side of the first forward translation transfer unit and transferred to the third group is disposed at the third group 201017804 Each of the substrates that have been processed by the unit is carried out from the processing unit and moved into the substrate delivery portion on the start side of the second forward translation transfer unit. Further, the processing system according to the second aspect of the present invention is a series processing system in which a plurality of processing units are connected in the order of a process flow, and a series of processing is performed on the substrate to be processed, and the first processing route is characterized in that: It is in the first direction in the longitudinal direction of the system, and the processing units of the first group are adjacent to each other or are arranged in a single pass through the transport system unit! J is a _ second process route, and the second direction opposite to the first direction in the longitudinal direction of the system includes: processing of the second group located on the downstream side of the process flow of the first process route The units are adjacent to each other, or arranged in a row via the transport unit, the first complex translation transport unit that translates the transport substrate, and the second complex translation transfer that translates the substrate on the downstream side of the process flow of the first bypass translation transport unit a portion that extends in parallel with the atrium space of a predetermined size in the system width direction and the first process route; the processing unit of the third group is disposed in the atrium space; and the first conveying device is disposed in the aforesaid The atrium space is carried out from the substrate delivery unit on the terminal side of the first bypass translation transfer unit, and is transported to one of the processing units of the third group, and each of the processing units of the third group is processed. The substrate is carried out from the processing unit, and is carried into the substrate delivery portion on the start side of the second bypass translation transfer unit. In the processing system of the present invention, the occupied space or the running space of the processing unit of the third group and the first conveying device are all absorbed in the atrium space, and are not included in the two process routes, so the system width is not increased. , -8- 201017804 can greatly shorten the overall length of the system. In a preferred aspect of the present invention, the processing unit of the third group includes first and second processing units having substantially the same content and time of processing on the substrate. Further, the first and second processing units are alternately arranged on the continuously fed substrates via the first forward translation transfer unit. According to this configuration, the first and second processing units can be operated in parallel by shifting the time, and the station time can be greatly shortened. In this case, the first transport device has a transport robot that can be moved in the transport area provided in the atrium space, and the first and second processing units are preferably arranged in the longitudinal direction of the system with the transport region interposed therebetween. In the atrium space. In a preferred embodiment, the first and second processing units are disposed adjacent to the transport area. Further, the transport robot directly carries the first and second processing units into and out of the substrate. In a preferred embodiment, in the atrium space, a first atrium translation transfer unit that is continuous outside the first processing unit and is continuous in order to carry the substrate into and out of the first processing unit is provided. Further, the transport robot carries the first processing unit into and out of the substrate via the first atrium translation transport unit. In a preferred embodiment, the first atrium translation transport unit includes: a first atrium substrate loading path that is disposed adjacent to the transport area; and a first unit inner transport path that is provided in the first processing unit and can be first The atrium substrate loading path connection and the first atrium substrate carrying-out path are connected to the first unit inner conveying path on the side opposite to the first atrium substrate carrying path by the first processing unit -9 - 201017804, 1 The processing unit extends above or below the end position adjacent to the transport area. When the substrate is loaded into the first processing unit, the substrate is transported on the first atrium substrate carrying path and the first unit inner conveying path. When the substrate is carried out from the first processing unit, the substrate is transported on the first unit transfer path and the first atrium substrate carry-out path. In a preferred embodiment, the first atrium translation transfer unit has a first atrium substrate transfer path and a first atrium substrate carry-out path that are vertically movable up and down in parallel with the transfer area, and are provided in the first In the processing unit, the first intra-cell transfer path and the first intra-substrate transfer path are selectively connected to any of the first intra-cell transfer paths. When the first processing unit is loaded into the substrate, the height of the first atrium substrate carrying path is aligned with the first unit inner conveying path, and the substrate is transported on the first atrium substrate carrying path and the first unit inner conveying path. The first direction in the direction of the long side of the system. When the substrate is carried out from the first processing unit, the height of the first atrium@substrate transport path is aligned with the first intra-unit transport path, and the first unit inner transport path and the first atrium substrate carry-out path are used. It is transported in the second direction in the direction of the long side of the system. In a preferred embodiment, in the atrium space, a second atrium translation transfer unit that is continuous outside the second processing unit and in the middle of the second processing unit is provided in the atrium space, and the transfer robot is paired. 2 The processing unit carries in and out of the substrate via the second atrium translation transfer unit. In a preferred embodiment, the second atrium translation transport unit has a -10-201017804 second atrium substrate carrying path that is disposed adjacent to the transport area, and the second unit inner transport path is provided in the second processing unit. The second atrium substrate carrying path can be connected to the second atrium substrate carrying-out path, and the second processing unit can be connected to the second cell transfer path on the side opposite to the second atrium substrate carrying path by the second processing unit. 2 The processing unit extends above or below the end position adjacent to the transport area. φ Further, when the second processing unit is loaded into the substrate, the substrate is transported on the second atrium substrate carrying path and the second unit inner conveying path. When the substrate is carried out from the second processing unit, the substrate is transported on the second unit transfer path and the second atrium substrate carry-out path. In another preferred embodiment, the second atrium translation transport unit has a second atrium substrate carrying path and a second atrium substrate carrying-out path that are vertically movable up and down in two stages, and is provided in the second In the processing unit, the second abutment substrate transfer path and the second intra-substrate substrate φ carry-out path are selectively connected to any of the second intra-cell transfer paths. When the second processing unit is loaded into the substrate, the height of the second atrium substrate carrying path is aligned with the second intra-cell transfer path, and the substrate is transported on the second atrium substrate transfer path and the second intra-cell transfer path. The second direction in the direction of the long side of the system. When the substrate is carried out from the second processing unit, the height of the second atrium substrate transport path is aligned with the second intra-cell transport path, and the substrate transport is performed on the second intra-cell transport path and the second atrium substrate transport path. The first direction in the direction of the long side of the system. -11 - 201017804 According to a preferred embodiment, the first substrate route is disposed between the substrate delivery portion on the terminal side of the first forward translation transfer portion and the substrate delivery portion on the start side of the second forward translation transfer portion. There is a third processing unit. Further, the first transfer device carries out the substrate in and out of the third processing unit. In a preferred embodiment, the third processing unit is a resist coating unit that applies a resist liquid on the substrate, and the first and second processing units respectively dry the resist coating film on the substrate under reduced pressure. In the first and second reduced-pressure drying units, the substrate transfer ports of the first and second reduced-pressure drying units are substantially equidistant positions to the substrate transfer port of the resist application unit. In this configuration, even if the first and second decompression drying units are operated in parallel, all of the substrates are subjected to a vacuum drying treatment after the resist coating treatment with a predetermined delay time, so that the resist can be coated. The film quality (stability and reproducibility) of the film is improved. According to another preferred embodiment, in the first process route, a resist coating unit for applying a resist liquid on the substrate is provided on the transport path of the first forward transfer unit, first and second. The processing unit is a first and a second decompression drying unit that respectively dries the resist coating film on the substrate under reduced pressure, and the first and the second substrate transfer unit on the terminal side of the first forward translation transfer unit 2 The substrate transfer inlet of the vacuum drying unit is at a substantially equidistant position. In this configuration, even if the first and second decompression drying units are operated in parallel, all of the substrates are subjected to a reduced-pressure drying treatment after the resist coating treatment with a predetermined delay time. The film quality (stability and reproducibility) of the film is improved. In a preferred embodiment, the second conveying device is attached to one end of the system-12-201017804 in the longitudinal direction, and the unprocessed substrate is taken out from any of the cassettes of the system, and is delivered to the first process route. In the second process route receiving system, all the substrates to be processed are processed, and are stored in the system to be ejected. In any other preferred embodiment, the third transport device is provided in the longitudinal direction of the system. At the other end, the substrate is carried out from the first process route, and directly moved into the second process route, or moved into the φ second process route via the external processing device. [Effects of the Invention] According to the processing system of the present invention, by the above-described configuration and action, it is possible to arrange a series of processing units in the order of the process flow in the process route of the reciprocating path extending along a straight line. In the system, the shortening of the full-length size and the shortening of the station time are efficiently achieved. [Embodiment] Hereinafter, preferred embodiments of the present invention will be described with reference to the accompanying drawings. (First Embodiment) Fig. 1 shows a layout configuration of a coating development processing system 10 according to a first embodiment of the present invention. The coating development processing system 10 is disposed in a clean room, for example, using a glass substrate as a substrate to be processed, performing cleaning, resist coating, prebaking, and display in a photolithography lithography process in an LCD manufacturing process. A series of processors like and after baking. The exposure processing is performed on the external exposure device 12 disposed adjacent to the system -13-201017804. In the coating development processing system 10, a horizontally long process station (P/S) 16 is disposed at the center portion, and a card station (C/S) 14 and an interface station are disposed at both ends in the longitudinal direction (X direction). I/F) 1 8. The cassette station (C./S) 14 is a cassette loading and unloading port of the system 10, and includes: a cassette platform 20 which is capable of stacking a plurality of sheets of the substrate G and accommodating a plurality of cassettes C in a horizontal direction (Y) The direction is arranged to be placed in four: and the transfer device 22 is configured to perform the entry and exit of the substrate G on the cassette C on the stage 20. The transporting device 22 is constituted by a transport robot having a transport arm 22a that can hold the substrate G in a single unit, and can be operated by four axes of Χ, Υ, Ζ, Θ, and can be adjacent to a processing station (P/S). The intersection of the 16 side and the substrate G. The process station (P/S) 16 is a pair of process routes A that are parallel and opposite each other along the longitudinal direction (X direction) of the horizontal system, and the plurality of processing units are arranged substantially in the order of the process flow or the engineering process. . More specifically, in the process route from the card side station (C/S) 14 side to the interface station (I/F) 18 side, the loading unit (ΙΝ-PASS) 24 is arranged in sequence, and the excimer UV irradiation is performed. Unit (E-UV) 26, Scrubber unit (SCR) 28, adhesion unit (AD) 30, cooling unit (COL) 32, carry-out unit (OUT-PASS) 34, resist coating Unit (CT) 36, carry-in unit (IN-PASS) 38, pre-baking unit (PRE-BAKE) 40, cooling unit (COL) 42 and moving 201017804 out unit (OUT-PASS) 44, etc., as the first group unit. Here, the excimer UV irradiation unit (E-UV) 26, the brush cleaning unit (SCR) 28, the attachment unit (AD) 30, and the cooling unit (COL) 32 are all processing units configured to be in a translational manner, from the loading unit The (IN-PASS) 24 to the carry-out unit (OUT-PASS) 34 is provided with an i-th path translation transport unit 46 including, for example, a roller transport path extending through the processing units 26 to 32.

0, the pre-baking unit (PRE-BAKE) 40 and the cooling unit (COL) 42 are all processing units configured to be in a translational manner, and are arranged from the loading unit (IN_PASS) 38 to the unloading unit (OUT-PASS) 44. The second forward translation transport unit 48, which is formed by the roller transport path, extends through the processing units 40 and 42. The resist coating unit (CT) 36 is not a translating processing unit. As shown in FIG. 2 described later, the fixed substrate G is placed on the stage 76, and the resist nozzle 78 is moved or scanned in the horizontal direction above the substrate. A resist coating film is formed on G φ . On the other hand, in the process route B of the re-route from the interface station (I/F) 18 side to the cassette station (C/S) 14 side, the carry-in unit (not shown) and the developing unit are arranged in a row ( DEV) 52, a post-baking unit (??3-BAKE) 54, a cooling unit (COL) 56, an inspection unit (AP) 57, and an unloading unit (OUT-PASS) 58 are used as units of the second group. Here, the carry-in unit (not shown) is provided under the peripheral device (TITLER/EE) 50, that is, in the same layer as the developing unit (DEV) 52. The developing unit (DEV) 52, the post-baking unit (POST-BAKE) 54 -15-201017804, the cooling unit (COL) 56 and the inspection unit (AP) 57 are all processing units configured to be in a translational manner. A reversing translation transport unit 60 including, for example, a roller transport path extending through the processing units 52 to 58 is disposed from the loading unit (not shown) to the unloading unit (OUT-PASS) 58. The interface station (I/F) 18 is a transport device 62 having a process route A, B for performing the above-described approach and re-routing, or a transaction between the adjacent exposure device 12 and the substrate G, and a peripheral device is disposed beside the transfer device 62 ( TITLER/EE) 50 and rotating platform (R/S) 64. Peripheral device 50 includes a peripheral exposure device (EE) and a coder (TITLER). The rotary table (R/S) 64 is a platform for rotating the substrate G in the horizontal plane for converting the direction of the rectangular substrate G when it is transferred to the exposure device 12. In the coating development processing system 10, the process route A and the interface station (I/F) 18 formed by the cassette station (C/S) 14 and the forward path, and the process route B of the re-route are formed to extend straight through the X. Direction of the atrium space NS. In the atrium space NS, the two decompression drying units 66L and 66R, which are the units of the third group, are disposed at predetermined positions toward each other, and one of the two units 66L and 66R is disposed. Device 68. Fig. 2 is a view showing the detailed configuration of the processing units at and around the reduced-pressure drying units 66L, 66R and the conveying device 68. The first decompression drying unit 66L is disposed on the upstream side of the process route A than the unloading unit (OUT-PASS) 34 of the first forward translation conveying unit 46, and is disposed beside the cooling unit (COL) 32. The second decompression drying unit 6 6R is disposed on the downstream side of the process route a than the loading unit (IN-PASS) 38 of the second forward translation conveying unit 48, and is disposed beside the pre-baking unit (PRE_201017804 BAKE) 40. A transfer area TE is provided between the two decompression drying units 66L, 66R. The transporting device 68 is constituted by a transport robot having a transport arm 68a that can hold the substrate G in a single unit, and can be operated by four axes of X, Υ, Ζ, Θ, and moved in the transport area TE to carry in the substrate. The port or the transfer port faces all the units of the transfer area TE, that is, the two decompression drying units 66L, 66R, the carry-out unit (OUT-φ PASS) 34 of the first forward transfer unit 46, and the resist coating unit (CT) 36 The loading unit (IN-P AS S ) 38 of the second forward translation transport unit 48 is moved in and out, and the units can be transferred to the substrate G. Each of the decompression drying units 66L, 66R can divide the chambers under pressure decompression into two upper and lower chambers, and move the upper chamber that can be moved up and down from the upper tray 70 or the bottom container type lower chamber 70 (Fig. 2). Not shown in the figure, the upper side is lifted, and the substrate G can be carried in and out. As shown in Fig. 2, the lower chamber 70 has a substantially quadrangular shape, and a platform 72 for supporting the substrate G to be horizontally placed is disposed at the center portion φ, and an exhaust port 74 is provided at four corners of the bottom surface. Each of the exhaust ports 74 is connected to a vacuum pump (not shown) via an exhaust pipe (not shown). The closed processing space in the two chambers can be depressurized to a predetermined vacuum pressure by the vacuum pump in a state where the lower chamber 70 is covered with the upper chamber. Further, each of the decompression drying units 66L, 66R is provided with a loading/unloading mechanism (not shown) for transferring the transfer arm 68a of the conveying device 68 to the substrate G on the stage 72. As shown in FIG. 2, the resist coating unit (CT) 36 is a platform 76 having a horizontal -17-201017804 mounting substrate G and being held on the substrate G placed on the platform 76 ( The surface to be treated is a coating treatment unit 80 that applies a resist liquid by a non-rotation method using a long resist nozzle 78, and restores the resistance of the resist nozzle 78 for the next preparation period without performing a coating process. The nozzle refreshing unit 82 and the like of the agent liquid discharge function. The resist nozzle 78 is an elongated nozzle having a slit-like nozzle opening which covers the substrate G on the stage 76 from one end to the other end in the X direction, and is connected to a resist liquid supply source (not shown). The coating processing unit 80 has a nozzle moving mechanism 84 that horizontally moves the resist nozzle 78 in the Y direction on the stage 76 during the coating process. The nozzle moving mechanism 84 is a support body 86 having an inverted shape or a gate shape that horizontally supports the resist nozzle 78, and a linear drive unit 88 that linearly moves the support body 86 in the Y direction in both directions. The resist nozzle 78 is horizontally moved (scanned) in the Y direction from the one end of the substrate G to the other end while the resist liquid is discharged in a strip shape, so that the upper surface (processed surface) of the substrate G is like A coating film of a resist liquid is formed in a film thickness as expected by laying a carpet. Further, the longitudinal direction of the resist nozzle 78 may be set to the Y direction, and the coating scanning direction may be set to the X direction. The resist coating unit (CT) 36 may be used to transfer the TE from the atrium space NS. The substrate G is carried in and out. The platform 76 is also provided with a lift pin 90 for lifting and unloading the substrate G, and the like. The two decompression drying units 66L, 66R are symmetrical and equidistant positions from the substrate carrying-out port of the resist coating unit (CT) 36. Thereby, the substrate G which has been subjected to the resist coating treatment in the resist coating unit (CT) 36 can be subjected to the vacuum drying treatment of the next step, and transferred to the first vacuum drying by the conveying device 68. The transport delay time in the case of the unit 6 6L can be made equal to the transport delay time when the transport device 68 transfers to the second decompression drying unit 66R. In FIG. 2, the first forward translation transfer unit 46 is formed by arranging rod-shaped rollers 92 at regular intervals in the transport direction (X direction) to form a roller transport path φ, and a roller composed of a motor and a transmission mechanism. The drive unit (not shown) rotatably drives the rollers 92 to configure the substrate G to be transported on the roller transport path. A cooling mechanism (not shown) is provided in the cooling unit (COL) 32, which cools to a predetermined temperature by heat exchange of the substrate G which is passed under the roller conveyance or by blowing cold air. The carry-out unit (OUT-PASS) 34 is a configuration in which the roller transport path formed in the first forward translation transport unit 46 stops or stops the substrate G that has been transferred by translation, and the transport arm 68a of the transport device 68 receives the substrate G. Composition. Further, in the first forward translation transport unit 46, the φ roller transport path can be divided into a plurality of sections, and independent roller drive sections are provided in each section. In the same manner, the second forward translation transport unit 48 also forms a roller-shaped roller 94 at a predetermined interval in the transport direction (X direction) to form a roller transport path, and has a roller drive unit including a motor and a transmission mechanism (not shown). Each of the rollers 94 is rotationally driven to form a substrate G that can be transported on the roller transport path. A heater mechanism (not shown) is provided in the pre-baking unit (PRE-BAKE) 40, which is heated to a predetermined temperature by heat exchange of the substrate G which is passed under the roller conveyance or by blowing hot air. The loading unit (IN-PASS) 38 is a configuration in which the substrate G is received by the transfer arm 68a of the transport device 68 in the formation of -19-201017804, and the translation transfer (roller transport) is started immediately after the substrate G is received. In the second forward translation transport unit 48, the roller transport path can be divided into a plurality of sections, and independent roller drive sections are provided in each section. Here, the processing procedure of the entire development of the one substrate G by the coating development processing system will be described. First, in the cassette station (C/S) 14, the transport device 22 takes out one of the substrates G from any of the cassettes C on the stage 20, and carries the taken-out substrate G into the process station (P/S) 16 The loading unit (IN-PASS) 24 on the side of the process route A. In the carry-in unit (IN-PASS) 24, the substrate G is the first forward translation transfer unit 46 that is put into the process route A. The substrate G to be fed into the first forward transfer unit 46 is initially subjected to ultraviolet cleaning by the excimer UV irradiation unit (E-UV) 26 and the brush cleaning unit (SCR) 28 in the cleaning process unit. And brush cleaning treatment. In the brush cleaning unit (SCR) 28, the substrate G that has been horizontally moved on the roller transport path of the first forward translation transport unit 46 is subjected to brush washing or air blowing, thereby removing particulate contamination from the surface of the substrate. Then, the washing treatment is carried out, and finally the substrate G is dried by an air knife or the like. When a series of cleaning processes of the brush cleaning unit (SCR) 28 are completed, the substrate G is lowered by the first path translation «the roller conveying path of the feeding portion 46 and passed through the heat processing unit (3, 32). In the heat treatment unit (30, 32), the substrate G is first subjected to an adhesion treatment using a vaporous HMDS to the attachment unit (AD) 30 to hydrophobize the surface to be treated. After the end of the adhesion process, the substrate G is cooled to a predetermined substrate temperature in the cooling sheet -20-201017804 (COL) 32. Then, the substrate G enters the carry-out unit (OUT-PASS) 34 and stops there. After that, the transport device 68 advances into the carry-out unit (OUT-PASS) 34 from the transport area TE of the atrium space NS, and carries out the substrate G from the first forward transfer unit 46. Next, the transfer device 68 moves in the transfer region TE, and the substrate G is carried into the resist coating unit (CT) 36° in the resist coating unit (CT) 36, and the substrate G is placed and fixed on the substrate G. On the stage 76, a resist liquid is applied to the upper surface (processed surface) of the substrate G by a non-rotation method in which the slit nozzle 78 is horizontally moved (scanned). Once the resist coating process is completed in the resist coating unit (CT) 36, the transfer device 68 advances from the transfer area TE of the atrium space NS into the resist coating unit (CT) 36, and the substrate G is carried out from the stage 76. . Next, the conveying device 68 moves into the conveying area TE, and the substrate G is carried into one of the two decompression drying units (VD) 66L, 66R, for example, the first decompression drying unit (VD) 66L. In the first decompression drying unit (VD) 66L, after the substrate G is placed horizontally on the stage 72, the chamber is closed (the upper chamber is brought into close contact with the lower chamber 70), and the vacuum pump is activated to start vacuum evacuation. The chamber is decompressed and dried. The vacuum drying treatment is to evaporate an organic solvent (for example, a diluent) from a resist liquid film on the substrate G in a chamber under reduced pressure, and the organic solvent vapor is discharged from the chamber exhaust port 74 together with other gases. The trachea is sent to the side of the vacuum pump. Once the vacuum drying treatment has been completed for a certain period of time, the chamber is opened (the upper chamber is moved upward from the lower chamber 70), and the base -21 - 201017804 plate G is unloaded. The conveying device 62 carries out the first decompression drying unit (VD) 66L' and carries out the substrate G which has been subjected to the reduced-pressure drying treatment. Then, the substrate G is moved into the transport unit TE, and the substrate G is carried into the carry-in unit (IN-PASS) 38. After that, the second forward translation transfer unit 48 starts the roller transport, and the substrate G is translated and transported to the downstream side of the process route A, and passes through the heat processing unit (40, 42) ° in the heat processing unit (40, 42). The substrate G is initially subjected to prebaking in a pre-baking unit (PRE-BAKE) 40 as a heat treatment after resist coating or a heat treatment before exposure. By this prebaking, the solvent remaining in the resist film on the substrate G is evaporated and removed, and the adhesion of the resist film to the substrate is enhanced. Second, the substrate G is cooled to a predetermined temperature in the cooling unit (COL) 42. Then, the substrate G is ejected from the carry-out unit (OUT-PASS) 44 at the end of the second forward translation transport unit 48 to the transport device 62 of the interface station (I/F) 18. In the interface station (I/F) 18, the substrate G is a peripheral exposure device (EE) that is carried into the peripheral device 50 after the rotary table 64 is subjected to, for example, a 90-degree direction change, and is received therein for removing the adhesion during development. After exposure of the resist on the peripheral portion of the substrate G, it is sent to the adjacent exposure device 12. The exposure device 12 is a predetermined circuit pattern for exposing the resist on the substrate G. Then, the substrate G on which the pattern exposure is completed is returned from the exposure device 12 to the interface station (I/F) 18, first loaded into the peripheral device 50 (TITLER), and predetermined information is recorded on a predetermined portion on the substrate G. . Then, the substrate G is carried into the -22-201017804 carrying unit (not shown) under the peripheral device 50 by the transport device 62. In this manner, the substrate G is moved to the cassette station (C/S) 14 by the roller transport path of the return path translation transport unit 60 laid on the process route B of the return path. In the first developing unit (DEV) 52, the substrate G is a series of developing processes for performing development, washing, and drying between translational transports. The substrate φ G that has completed a series of development processes in the developing unit (DEV) 52 is a processing unit (54, 56) and an inspection unit that sequentially pass the heat by the roller transport path of the bypass translation/transport unit 60. (AP) 57. In the heat treatment portion (54, 56), the substrate G is initially subjected to post-baking after the post-baking unit (POST-BAKE) 54 as a heat treatment after development processing. The developing liquid or the cleaning liquid remaining on the resist film on the substrate G is evaporated by this post-baking to enhance the adhesion of the resist pattern to the substrate G. Next, the substrate G is cooled to a predetermined temperature at the cooling unit (COL) 56. The inspection unit (AP) 57 performs a non-contact line width inspection, a film quality, a film thickness inspection, and the like on the resist pattern φ on the substrate G. The carry-out unit (OUT-PASS) 58 receives the substrate G that has completed the processing of the entire project from the return path translation transport unit 60, and delivers it to the transport mechanism 22 of the cassette station (C/S) 14. On the side of the cassette station (C/s) 14, the transport mechanism 22 accommodates the completed substrate G received from the carry-out unit (OUT-PASS) 58 in one (usually the original) cassette C.

As described above, the coating development processing system 10 is laid in the process route A of the forward path: the first forward translation transfer unit 46 before the resist coating unit (CT) 36, and the pre-baking unit (PRE-BAKE -23-201017804) The second forward translation transfer unit 48 before 40, and the first and second decompression drying units (VD) in the atrium space NS adjacent to the resist application unit (CT) 36 The 66L and 66R are disposed opposite to each other at a predetermined position, and the transport device 68 is provided. The conveying device 68 moves in the conveying area TE provided in the atrium space NS, and can enter the two decompression drying units 66L and 66R, the unloading unit (OUT-PASS) 34 of the first forward translating unit 46, and the resist coating. The transport unit (IN-PASS) 38 of the cloth unit (CT) 36 and the second forward translation transport unit 48 can perform the transfer of the units to the substrate G. According to this configuration, in the coating development processing system 10, the occupied spaces of the first and second decompression drying units (VD) 68L, 68R are absorbed in the atrium space NS, and are not included in the two process routes. In A and B, the system width dimension (Y-direction dimension) is not increased, and the total length of the system (X-direction dimension) can be greatly shortened. Further, in the coating development processing system 10, the first and second decompression drying units 66L and 66R have the same configuration and function, and the processing contents and processing time for decompressing and drying the substrate G are substantially the same. . Then, after the resist application coating unit (CT) 36 has just received the resist coating treatment on the substrate G sequentially transferred through the first forward translation transfer unit 46, the first and second decompressions are alternately repeated. Drying units 66L, 66R. For example, each of the odd-numbered substrates G is transferred to the first decompression drying unit 66L after the resist coating unit (CT) 36 receives the resist coating treatment, and is subjected to the vacuum drying treatment, and then sent to the second path. The loading unit (IN-PASS) 38 of the transfer unit 48 is translated. On the other hand, an even number of substrates 201017804 G are transferred to the second decompression drying unit 66R after the resist coating unit (CT) 36 receives the resist coating treatment, and after being subjected to the vacuum drying treatment, it is sent to The carry-in unit (IN-PASS) of the second forward transfer transport unit 48. Therefore, when the station time of one of the first and second decompression drying units 66L and 66R is t, the interval is t/2. The time difference is parallel to the operation of 2 units, which can form the total station time to form t/2. In this way, the decompression drying unit with a length of φ at one time of processing will halve the station time, thereby causing the main factor of the station time rate of the entire system to disappear. Therefore, even if the processing speed of the exposure device 12 is speeded up, or the photo-etching lithography uses a halftone exposure process, the coating development processing system can sufficiently cope with it. Further, in the coating development processing system, the first and second decompression drying units 66L and 66R are disposed at equal distances with respect to the substrate transfer port of the resist coating unit (CT) 36. It is also important that the delay time from the completion of the resist coating treatment to the start of the vacuum drying treatment is coincident with an odd number of substrates φ G and an even number of substrates G. That is, the evaporation of the solvent from the resist coating film is started immediately after the coating, and once the drying is started immediately after the evaporation, there is unevenness, and there is even a drying treatment or prebaking by the subsequent vacuum drying. Bake can not compensate for the situation. When the development processing system is applied, even if the first and second decompression drying units 66L and 66R are operated in parallel, all of the substrates G are subjected to a vacuum drying treatment after the resist coating treatment with equal delay time. Therefore, the film quality (stability/reproducibility) of the resist coating film can be improved. -25-201017804 (Second Embodiment) Fig. 3 is a view showing a layout configuration of a coating development processing system 100 according to a second embodiment of the present invention. In the drawings, the same components as those in the coating development processing system 10 of the first embodiment are denoted by the same reference numerals, and the description thereof will be omitted. Further, the detailed layout or configuration of the main part of the coating development processing system 100 is shown in Figs. 4 to 6 . In the system 100 of the second embodiment, the main portion different from the system 1 of the first embodiment is the first and second decompression drying units 102 L disposed in the atrium space NS, and the 102R is not a substrate. A method of fixing to a platform, but a vacuum drying device configured as a translational mode. In the atrium space NS, in order to move the first and second decompression drying units 102L and 102R into and out of the substrate G, the first and second atriums are displayed in addition to and in the units 102L and 102R. Transport units 104L, 104R. Then, the transport device 68 can transport the substrate G to the first and second decompressing and drying units 102L and 102R via the first and second atrium shifting and transporting units 104L and 104R, respectively. As shown in FIG. 4, the first atrium translation transport unit 104L includes an atrium substrate loading path 106 which is provided in a loading unit (IN-PASS) 105 adjacent to the transport area TE, and an intra-unit transport path 108. It is provided in the first decompression drying unit 1〇2L, and is connected to the atrium substrate carrying path 106. The atrium substrate carrying out path 114 is formed by the first decompression drying unit 1〇2L and can be located in the loading and unloading unit (IN- PASS) 105, the opposite side of the lift 26 - 201017804 The machine room (EV) 110 is connected to the in-unit transfer path 108, and extends through the upper surface of the first decompression drying unit 102L to the carry-out unit (OUT-PASS) adjacent to the transfer area TE. 112. The atrium substrate carrying path 106, the in-unit transfer path 108, and the atrium substrate carrying-out path 114 are rod-shaped or gyro-shaped rollers 116 arranged at regular intervals in the transport direction (X direction) to form a roller transport path, and have a motor and A roller drive unit (not shown) such as a transmission mechanism rotationally drives the rollers 116 to configure the substrate G to be transported on the roller transport path. Here, an independent roller drive unit (not shown) may be provided in each section (106, 108, 114). Further, the roller transport path of the atrium substrate carry-out path 114 is divided into the elevator room (EV) 110. The roller transport path 114a and the three sections of the roller transport path 114b in the intermediate transfer chamber 118 of the upper layer of the first decompression drying unit 102L and the roller transport path 114c in the carry-out unit (OUT-PASS) 112, An independent roller drive unit (not shown) can be provided in each section. The roller transport path 114a in the elevator room (EV) 110 is attached to the roller support portion 120 that can be moved up and down, and can be moved to the first floor by the lifting drive of the elevation drive unit 122 constituted by, for example, a cylinder. The in-unit conveyance path (roller conveyance path) 1〇8 is connected between the first height position 'and the second height position H2 that can be connected to the roller conveyance path 114b in the intermediate transfer chamber U8 of the second layer. When the substrate G is carried into the first decompression drying unit 102L, first, the conveying device 68 carries the substrate G into the loading unit -27-201017804 (IN-PASS) 105 from the conveying area TE of the atrium space NS. Then, the roller transport operation is started in the atrium substrate transport path 106 and the intra-unit transport path 108, and the substrate G is carried from the carry-in unit (IN-PASS) 105 to the first decompression drying unit 102L. When the substrate G is carried out from the first decompression drying unit 102L, first, the roller transport operation is performed on the roller transport paths 108 and 114a, and the substrate G is carried out from the first decompression drying unit 102L to the elevator room (EV). ) The first layer of 110. Next, in the elevator room (EV) 110, the roller transporting path 114a rises, and the substrate G is moved to the second layer. Then, the roller transporting operation is performed on the roller transporting paths 114a, 114b, and 114c, and the substrate G is moved from the elevator compartment (EV) 110 to the carry-out unit (OUT-PASS) 112 through the intermediate transfer chamber 118. Then, the transport device 68 receives the substrate G from the transport area TE of the atrium space NS, and carries it out from the carry-out unit (OUT-PASS) 1 12 . In Fig. 4, the reduced-pressure drying unit (VD) 102L is a chamber 124 having an integral form of reduced pressure, which has a flat rectangular parallelepiped shape. @ In the substrate transfer direction (X direction), a pair of side walls of the chamber 124 facing each other are provided with an openable and closable substrate transfer inlet 126 and a substrate transfer port 128. The intra-unit conveyance path (roller conveyance path) 108 is provided in the chamber 124. The decompression drying unit (VD) 102L has a lift pin mechanism (not shown) for raising and lowering, which is at a height position (position on the roller 116) for loading or unloading the substrate G in the chamber 124. It rises and falls between the height position -28-201017804 (the position from the roller 116 floating upward) for the vacuum drying treatment. One or a plurality of exhaust ports 130 are provided in the bottom wall of the chamber 124. These exhaust ports 130 are connected to the inlet side of the vacuum pump 134 via the exhaust pipe 132. An opening and closing valve 136 is provided in the middle of the exhaust pipe 133. Fig. 5 and Fig. 6 show an example of the configuration of the inside of the loading unit (IN-PASS) 105. In the loading unit (IN-PASS) 105, as shown in Fig. 5, a pair of horizontal frames 14 0A, 140B extending in parallel in the conveying direction (X direction) are provided at intervals larger than the substrate G. Between these horizontal frames 140A and 14B, a plurality of rod-shaped supporting members 142 (four in the illustrated example) are arranged in parallel at an appropriate interval. Each of the rod-shaped supporting members 142 is supported by a plurality of beams 144 extending in a direction (Y direction) orthogonal to the conveying direction (X direction) (three in the illustrated example). As shown in Fig. 6, both ends of the beam 144 are fixed to the lower surfaces of the horizontal frames 1 40A, 1 40B, respectively. φ On the upper surface of the rod-shaped support member 142, a plurality of spherical free rollers 146 for mounting the support substrate G are mounted at a constant pitch. As seen from the entrance side of the loading unit (IN-PASS) 105, a bridge type driving roller 148 is attached to the rear end portion (last portion) of the horizontal frames 140A, 140B. The drive roller 148 is integrally fixed to a plurality of gyro-shaped rollers or rollers 148b at a predetermined interval between the rotation shafts 148a spanned between the horizontal frames 140A and 140B. The rotation drive unit 152 can be rotated by the pulleys 150. drive. In the horizontal frames 140 A, 140B, a plurality of single-sided support type drive rollers 154 are mounted at intervals of a certain -29-201017804 in the longitudinal direction thereof. The drive rollers 154 can be rotationally driven via the drive belt 156 on the outside of the horizontal frames 140A, 140B. Here, the drive belt 156 is coupled to the rotation driving portion 152 via the pulley 150. The drive rollers 148, 154 and the free roller 146 constitute the atrium substrate carrying path 106. The configuration in the carry-out unit (OUT-PASS) 112 is the same as the configuration in the carry-in unit (IN-PASS) 105 except that the transport direction or the transport operation is opposite, and the second decompression drying unit 102R and The second atrium translation transport unit 104R is also different in the left-right symmetric arrangement position by the resist application unit (CT) 36, and the others are the same as the first decompression drying unit 102L and the first atrium translation transport unit 104L, respectively. The composition plays the same role. In the coating development processing system 100 of the second embodiment, similarly to the coating development processing system 10 of the first embodiment, the overall length of the system and the station time can be greatly shortened. (Comparative Example) In addition, as for the reference example (comparative example), it is conceivable that in the process route A, in the middle of the second forward translation transfer unit 48, that is, the carry-in unit (IN-PASS) The first translation type decompression drying unit 102L is disposed between the 38 and the pre-baking unit (PRE-BAKE) 4, and the layout of the second translation type decompression drying unit 10R2R is disposed in the atrium space NS. 201017804 In this case, in the process route A, between the loading unit (IN-P AS S) 38 of the second forward translation conveying unit 48 and the first translation type decompression drying unit 102L, and the first translation type decompression drying The first and second lateral conveyors (CR-PASS) 160, 162» are disposed between the unit l〇2L and the pre-baking unit (PRE-B AKE ) 40, respectively, and the second translation type vacuum drying unit is interposed therebetween. 102R is adjacent to the first and second lateral conveyors (CR-PASS) 160, 162, and the third and fourth _ transverse conveyors (CR-PASS) 164, 166 are disposed in the atrium space NS. Here, each of the cross conveyors (CR-PASS) 160 to 166 is a Y-direction conveyor that has an orthogonal translational conveyance path and a conveyance drive unit, and can selectively switch between the X-direction conveyor movement and the translation. . For example, the first lateral conveyor (CR-PASS) 160 is the substrate G that is translated and received from the loading unit (IN-PASS) 38, and the odd number of substrates G are directly carried into the first translational reduced-pressure drying unit 102L. The even number of substrates G are transferred to the third lateral conveyor (CR-PASS) 164. φ The third lateral conveyor (CR-PASS) 164 carries an even number of substrates G received from the first lateral conveyor (CR-PASS) 160 to the second translation type vacuum drying unit 102R. The fourth lateral conveyor (CR-PASS) 166 is an even-numbered substrate G that is carried out by the second translation-type vacuum drying unit 102R to perform the reduced-pressure drying process, and is transferred to the second lateral conveyor (CR-PASS) 162. The second horizontal conveyor (CR-PASS) 162 is an odd-numbered substrate G that has been discharged from the first translational-type decompression drying unit 102L to complete the reduced-pressure drying process, and is sent to the subsequent pre-baking unit (PRE-BAKE) 40 . Further, -31 - 201017804 receives an even number of substrates G which have been subjected to reduced-pressure drying processing from the fourth lateral conveyor (CR-PASS) 166, and sends them to the pre-baking unit (foot-to-bake) 40 of the subsequent stage. The layout of Fig. 7 is such that the first and second translating decompression drying units 102L, 102R are operated in parallel, whereby the station time can be shortened, but since the process route A is inserted into a row and two sets of lateral conveyance The machine (CR-PASS) 160, 162 and one decompression drying unit 102L, so that the X-direction dimension L of the three units (160, 102L, 162) will increase the overall length of the process route A. Larger, and thus the total length of the system is increased, and the overall length of the system cannot be shortened. Further, when the substrate G on which the resist coating unit (CT) 36 completes the resist coating treatment is sent to the first translation-type vacuum drying unit 102L, and when it is sent to the second translation-type vacuum drying unit 102R, The disadvantage of different delivery delay times. (Third Embodiment) Fig. 8 is a view showing a layout configuration of a coating development processing system 170 according to a third embodiment of the present invention. In the drawings, the same components as those in the coating development processing system 1 of the above-described first embodiment are denoted by the same reference numerals, and the description thereof will not be repeated. Further, the configuration of the resist coating unit (CT) 172 of the coating development processing system 170 is shown in Fig. 9 . In the system 170 of the third embodiment, the main difference from the system 1 of the first embodiment is that the resist coating unit (CT) 1 72 is not a method of fixing the substrate to the stage, but is constituted. In the transmissive-32-201017804 resist coating device, the resist coating unit (CT) 172 is disposed along the first forward translation transport unit 46 in the process route A of the forward path, and is disposed in the specific carry-out unit (OUT- PASS) 34 is the upper position. As shown in FIG. 9, the resist coating unit (CT) 172 has a floating upper platform 174 for coating, which constitutes a part or a section of the first forward translation conveying unit 46, and a substrate conveying mechanism 176. The substrate G floating on the airborne floating platform 174 φ is transported to the floating platform in the longitudinal direction (X direction). The resist nozzle 178 supplies the resist liquid to the substrate G that is transported on the floating platform 174. And a nozzle update unit 180 that updates the resist nozzle 178 during the idle time of the coating process. A plurality of gas injection holes 182 for spraying a predetermined gas (e.g., air) onto the upper surface of the floating upper stage 174 are provided, and the substrate G can be driven from the platform by the gas pressure ejected from the helium gas injection holes 182. The top floats at a certain height. The substrate transfer mechanism 176 includes a pair of guide rails 184A and 184B extending in the X direction via the floating upper platform 174, and a slider 186 that can reciprocate along the guide rails 1 84A and 18 4B, and can be The floating platform 174 is provided on a substrate holding member (not shown) such as a suction pad of the slider 186 so as to detachably hold both end portions of the substrate G, and the slider is moved by a linear motion mechanism (not shown). 186 is moved in the transport direction (X direction), thereby constituting the floating transport of the substrate G on the floating upper platform 174 - 33 - 201017804 The resist nozzle 178 is in the horizontal direction (Y direction) orthogonal to the transport direction (X direction) The elongate nozzle extending across the upper surface of the floating platform 174 can discharge the resist liquid in a strip shape from the upper surface of the substrate G directly under the slit at the predetermined application position by the slit-shaped discharge port. Further, the resist nozzle 178 is movable in the X direction with the nozzle supporting member 188 that supports the nozzle, and is configured to be movable up and down in the Z direction, and is movable between the coating position and the nozzle updating portion 180. The nozzle update unit 180 is held by the pillar member 190 at a predetermined position above the floating platform 174, and includes an armor processing unit 192 that supplies the resist liquid to the resist nozzle 178 as a preparation for the coating process, and For the purpose of preventing the resist discharge port of the resist nozzle 178 from drying, the nozzle bathroom 194 held in the environment of the solvent vapor and the resist for removing the vicinity of the resist discharge port attached to the resist nozzle 1 78 are provided. Nozzle cleaning mechanism 196 - Here, the main function of the resist coating unit (CT) 1 72 will be explained. First, the cooling unit (COL) 32 from the front stage is carried into the loading area of the front end side of the floating platform 174 via a sorting mechanism (not shown), and the standby slider 186 holds the substrate G and receives it. On the floating upper stage 174, the substrate G receives the gas (air) pressure injected from the gas injection hole 182 to maintain the floating state in a substantially horizontal posture. Further, the slider 186 moves in the transport direction (X direction) while holding the substrate G, and when the substrate G passes under the resist nozzle 178, the resist nozzle 1 78 is discharged in a strip shape toward the upper surface of the substrate G. The resist liquid, -34- 201017804, thereby forming a coating film of the resist liquid on one side of the substrate G from the front end of the substrate to the rear end. The substrate G to which the resist is applied is also transported by the slider 186 on the floating platform 174, and is transported from the carry-out area set at the rear end of the floating platform 174 to the carry-out unit via a sorting mechanism (not shown). (OUT-PASS) 34. Further, the sorting mechanism (not shown) on the carry-in side has a roller φ transport path that is laid in the transport direction (X direction) of the first forward translation transport unit 46, and a vacuum that can be applied to the substrate on the transport path of the roller. A plurality of adsorption pads that adsorb/detach from the edge of the back surface of the substrate, and a substrate transfer mechanism that can move the adsorption pads in parallel with the transport direction in both directions. When the substrate on which the cooling unit (COL) 32 on the upstream side is cooled to a certain temperature is received on the roller transport path under the translation, the adsorption pad is lifted and adsorbed on the back edge portion of the substrate, and the substrate is adsorbed via the adsorption. The pad, substrate transfer mechanism can transfer the substrate to the loading area of the platform 178. Further, after the substrate is carried in the loading area, the adsorption pad is separated from the substrate, and the substrate transfer mechanism and the adsorption pad are returned to the original position. In addition to the action, the sorting mechanism (not shown) on the carry-out side is also in the opposite direction (the side of the 様 様 isomorphism machine constituting the symmetry machine and the application of the third embodiment) In the image processing system 170, the first and second decompression drying units (VD) 66L, 6 6R are also disposed in the atrium space NS', so that the system width dimension (γ-direction dimension) is not increased, and the system full-length size (X direction) can be realized. Dimensional) and station time have been greatly shortened. However, the resisting coating of the processing method on the process route A is -35- 201017804 (CT) 172 than the platform-based resist coating unit (CT) 36 The unit size (X-direction dimension) is long, and the total length of the system (X-direction dimension) becomes longer. However, on the other hand, the transport device 68 of the atrium space NS is only required to enter and exit the two decompression drying units 66L, 66R. The carry-out unit (OUT-PASS) 34 of the first forward translation transfer unit 46 and the carry-in unit (IN-PASS) 38 of the second forward transfer transport unit 48 are not required to enter the resist coating unit (CT) 1*. 72. That is, having the transport device 68 The load on the stroke is lighter. The layout of FIG. 8 is the loading unit of the carry-out unit (OUT-PASS) 34 and the second forward translation transport unit 48 of the first forward translation transport unit 46 on the process route A. (IN-PASS) 38 is arranged in the horizontal direction (X direction). However, it may be a modification, as shown in FIG. 1A, the carry-out unit (OUT-PASS) 34 and the carry-in unit (IN-PASS). 38 is arranged in a two-layer manner in a vertically stacked manner. In this case, the carry-out unit (OUT-PASS) 34 of the first forward translation transfer unit 46 is arranged in the same layer as the resist application unit (CT) 172, for example, on the first layer. The loading unit (IN-PASS) 38 of the second forward translating unit 48 is arranged in the same layer as the pre-bake unit (PRE-BAKE) 40, for example, in the second layer. In the layout of Fig. 10, the first path is shifted. The carry-out unit (OUT-PASS) 34 of the transport unit 46 and the carry-in unit (IN-PASS) 38 of the second forward shift transport unit 48 are two-dimensionally arranged in one place, so that the transport device 68 in the atrium space NS and The first and second decompression drying units (VD) 66L, 66R can be concentrated or even arranged in close proximity, and can be transported. 68. The movement range of the 201017804 is reduced, and the movement direction (motion axis) is simplified. (Fourth Embodiment) Fig. 11 is a main part showing the layout of the coating development processing system 200 according to the fourth embodiment of the present invention. In the drawings, the same components as those in the coating development processing system 100 of the second embodiment are denoted by the same reference numerals, and the description thereof will not be repeated. φ This embodiment is also similar to the above-described second embodiment. In the atrium space NS, the transport device 68 can transfer the first and second decompression drying units 102L and 102R via the first and second atrium translation transmission units, respectively. 202L '202R to carry out the substrate G. Here, between the transfer area TE and the first and second decompression drying units 102L and 102R, first and second loading/unloading units (IN/OUT-PASS) 204L, 204R are provided in a movable form. . As shown in FIG. 12 to FIG. 14, the first atrium translation transport unit 202L is φ having the lower stage and the upper stage abutment substrate carrying path 206 provided in the first loading/unloading unit (IN/OUT-PASS) 204L. The atrium substrate carrying-out path 208 and the first decompression drying unit 102L are selectively connected to any of the in-unit transfer path 108 of the atrium substrate carrying path 206 and the atrium substrate carrying-out path 208. The atrium substrate carrying path 206, the atrium substrate carrying-out path 208, and the intra-unit transfer path 108 are constituted by, for example, a roller transport path, and can be driven by independent roller drive units. The atrium substrate loading path 206 and the atrium substrate carrying-out path 208 are in the state of being accommodated in the first loading/unloading unit (IN/OUT-PASS) 204 -37-201017804, and can be driven by a lifting machine such as a cylinder. The lifting and lowering of the portion 210 is performed to move up and down. When the first decompression drying unit 102L is carried into the substrate G, as shown in FIG. 14, the height position of the atrium substrate carrying path 206 is aligned with the in-unit transfer path 108, and is applied to the atrium substrate carrying path 206 and the intra-unit transfer path 108. The substrate G is transported in the first direction (from the right side to the left side in the drawing) in the longitudinal direction (X direction) of the system. When the substrate G is carried out from the first decompression drying unit 102L, as shown in FIG. 13, the height position of the atrium substrate carrying-out path 208 is aligned with the intra-unit transfer path 108, and the intra-unit transfer path 108 and the atrium substrate carry-out path 20 8 are placed. The substrate G is transported in the second direction (from the left to the right of the drawing) in the longitudinal direction (X direction) of the system. In the coating development processing system 200, as shown in FIG. 12, while the substrate Gi is receiving the vacuum drying process in the first decompression drying unit 102L, the conveying device 68 can enter the first loading/unloading unit ( IN/OUT-PASS ) 204L carries the next substrate Gi + 1 to the atrium substrate carrying path 206 by the transfer arm 68a. Then, as shown in FIG. 13, the substrate Gi+1 that has been subjected to the reduced-pressure drying process in the first decompression drying unit 102L can be carried by the roller while the abutment substrate carrying path 060 is held by the next substrate Gi+1. Move out to the atrium substrate removal path 208. Alternatively, the substrate Gi which has been subjected to the reduced-pressure drying treatment may be carried out from the first decompression drying unit 102L to the atrium substrate carrying-out path 208, and the second decompression drying unit 102L may be subjected to decompression. Dry 201017804 Dry-processed substrate 〇; +1 into the atrium substrate loading path 2 06. 4, as shown in FIG. 14 , the substrate Gi + 1 is carried by the roller from the atrium substrate carrying path 206 to the first decompression drying unit i 2 L, and the transfer device 68 can transport the processed substrate Gi. The arm 68a is carried out from the atrium substrate carrying-out path 208. The configuration of the atrium substrate transport path 206 and the atrium substrate transport path 208 of the carry-in/out unit (IN/OUT-PASS) 204L can be the same as that shown in Figs. 5 and 6 . The second loading/unloading unit (IN/OUT-PASS) 204R and the second atrium translation conveying unit 202R also have the same functions as the first loading/unloading unit (IN/OUT-PASS) 204L and the first atrium shifting conveying unit 202L. Composition and function. In the fourth embodiment, the substrate transfer port 128 can be used as the substrate transfer port 126 in the first and second decompression drying units 102L and 102R, and the substrate G can be taken in and out from the transfer region TE side. The intermediate translation transfer units 202L and 202R are miniaturized. The preferred embodiments of the present invention have been described above, but the present invention is not limited to the above embodiments, and various modifications can be made without departing from the spirit and scope of the invention. For example, in the above-described embodiment, in the system in which the process route A of the forward route includes the first and second forward translation transfer units 46 and 48, the translational transport unit 46, 48 is connected to the atrium space NS by a process flow. 3 group of processing units. However, when the process route B of the re-routing includes the first and second reversing translation transport sections, the third group of the two reversing translation transport sections can be connected in the atrium space NS by the process flow -39-201017804 (or Processing unit of group 4). In the above embodiment, the processing unit disposed in the atrium space NS is a reduced-pressure drying unit, but other processing units may be disposed in accordance with the arrangement of the process routes. The substrate to be processed of the present invention is not limited to a glass substrate for LCD, and may be another substrate for a flat panel display, a semiconductor wafer, a CD substrate, a photomask, a printed substrate, or the like. [Brief Description of the Drawings] Fig. 1 is a plan view showing a layout configuration of a coating development processing system according to a first embodiment of the present invention. Fig. 2 is a plan view showing a detailed configuration of a decompression drying unit and a conveying device disposed in a room space in the coating development processing system of Fig. 1 and a processing unit therearound. Fig. 3 is a plan view showing the layout of the coating development processing system of the second embodiment. Fig. 4 is a schematic side view showing the configuration of a main part of the coating development processing system of Fig. 2; Fig. 5 is a plan view showing the inside of the loading unit of Fig. 4; Fig. 6 is a front elevational view showing the inside of the loading unit of Fig. 4; Fig. 7 is a plan view showing a layout of a system of a comparative example. Fig. 8 is a plan view showing a layout of a coating development processing system according to a third embodiment. -40- 201017804 Fig. 9 is a plan view showing the configuration of a resist coating unit of the coating development processing system of Fig. 9. Fig. 10 is a plan view of a main part showing a layout configuration of a coating development processing system according to a modification of the third embodiment. Fig. 11 is a plan view showing a layout configuration of a main part of a coating development processing system according to a fourth embodiment. Fig. 12 is a partial cross-sectional side view showing a first stage of the configuration and operation of the loading/unloading φ unit and the atrium shifting conveying unit of the coating development processing system of Fig. 11; Fig. 13 is a cross-sectional side view showing a part of the configuration and operation of the loading/unloading unit and the atrium shifting and conveying unit of the coating development processing system of Fig. 11; Fig. 14 is a partial cross-sectional side view showing a first stage of the configuration and operation of the loading/unloading unit and the atrium shifting and conveying unit of the coating development processing system of Fig. 11; ❿ [Description of main component symbols] 10: Coating development processing system 14 ··Calcography station (c / s) 1 6 : Process station (ρ/s) 1 8 : Interface station (I/F) 22 : Transfer device 34: unloading unit (ouT-PASS) 36: resist coating unit (CT) -41 - 201017804 38 : carrying unit (IN-PASS) 46: first forward shifting transport unit 48: second forward shifting transport unit 60: Reversing translation transfer unit 62: conveying device 66L: first decompression drying unit (VD) 66R: first decompression drying unit (VD) 6 8 : conveying device 0 102L: first decompression drying unit (VD) 102R: 1 decompression drying unit (VD) 104L: first atrium translation transport unit 104R: second atrium translation transport unit 105: carry-in unit (IN-PASS) 1 12: carry-out unit (OUT-PASS) 172: resist coating unit (CT) A: Road route @ B: Reroute route -42-

Claims (1)

201017804 VII. Patent application scope: 1. A processing system that connects a plurality of processing units in the order of process flow, and implements a series of insulting serial processing systems on the processed substrate, the characteristics of which are: The process route includes, in the first direction of the system, the first group of processing units adjacent to each other, or the transport unit is arranged in a row, and the first transfer path of the substrate is translated and transferred, and Translating the second forward translation transport unit of the transport substrate to the downstream side of the process flow further than the _ first forward translation transport unit; the second processing route is the second opposite to the first direction in the longitudinal direction of the system The direction is adjacent to the processing unit of the second group on the downstream side of the process flow of the first process route, or arranged in a row via the transport system unit, and the predetermined size is vacated in the system width direction and the first process route. The atrium space extends in parallel; the processing unit of the third group is disposed in the atrium space; and the first conveying device is disposed in the atrium space The substrate is transported from the substrate transfer unit on the terminal side of the first forward transfer and transport unit, and is transported to one of the processing units of the third group, and each of the substrates processed by one of the processing units of the third group is processed. The processing unit is carried out and carried into the substrate delivery portion on the start side of the second forward translation transfer unit. 2. The processing system according to claim 1, wherein the processing unit of the third group includes first and second processing units having substantially the same content and time for processing the substrate, and translating through the first forward path. The transport unit alternately arranges the first and second -43-201017804 processing units alternately for the continuously fed substrates. 3. The processing system of claim 2, wherein the first conveying device has a transfer robot movable in a transfer area provided in the atrium space, wherein the first and second processing units are attached to a long side of the system The directions are disposed between the atrium spaces facing each other with the transport regions interposed therebetween. 4. The processing system of claim 3, wherein the first and second processing units are disposed adjacent to the transporting region, and the transport robot directly carries the first and second processing units into and out of the substrate. 5. The processing system of claim 3, wherein in the atrium space, a first atrium shift is performed in addition to the first processing unit and in the middle of the first processing unit. In the transport unit, the transport robot carries the first processing unit into and out of the substrate via the first atrium translation transport unit. 6. The processing system of claim 5, wherein the first atrium translation transfer unit includes: a first atrium substrate carrying path, and a first unit inner transfer path is provided adjacent to the transfer area; The first processing unit is connected to the first atrium substrate carrying path, and the first atrium substrate carrying out path is opposite to the first atrium substrate carrying path by the first processing unit. The side is connected to the transfer path in the first unit -44 - 201017804, and the first processing unit extends above or below the end position adjacent to the transfer area, and when the substrate is loaded into the first processing unit, the side is 7. The first atrium substrate loading path and the first unit inner conveying path convey the substrate, and when the substrate is carried out from the first processing unit, the substrate is conveyed on the first unit inner conveying path and the first atrium substrate carrying-out path. The processing system of claim 5, wherein the Φ 1 atrium translation transport unit has a position that is adjacent to the transport area and is set to be up and down The first atrium substrate carrying path and the first atrium substrate carrying-out path and the first processing unit are selectively connected to the first atrium substrate carrying path and the first atrium substrate carrying-out path. In the first unit inner transfer path, when the substrate is loaded into the first processing unit, the height of the first atrium substrate carrying path is aligned with the first intra-unit transfer path, and the first atrium substrate is moved into the path. In the first unit inner conveying path, the 0 substrate is conveyed in the first direction in the longitudinal direction of the system, and when the substrate is carried out from the first processing unit, the height position of the first atrium substrate carrying out path is aligned with the first In the unit inner conveying path, the substrate is conveyed in the first unit inner conveying path and the first atrium substrate carrying-out path in the second direction in the longitudinal direction of the system. The processing system according to any one of the third aspect, wherein the second processing unit is provided in the atrium space for loading and unloading the substrate into the second processing unit. In addition to the second intermediate atrium translation transfer unit, the transfer robot is carried out by the transfer robot to the second processing unit via the second atrium translation transfer unit. 9. The processing system according to the eighth aspect of the invention, wherein the second atrium translation transport unit includes: a second atrium substrate carrying path, wherein the second unit inner transfer path is provided adjacent to the transport area, and the system is provided The second processing unit may be connected to the second atrium substrate carrying path; and the second atrium substrate carrying out path may be opposite to the second atrium substrate carrying path by the second processing unit. The side is connected to the second unit inner transfer path, and extends to the end position adjacent to the transfer area by the second processing unit, and is attached to the second atrium substrate when the substrate is loaded into the second processing unit. When the substrate is transported from the second processing unit, the substrate is conveyed on the second unit transfer path and the second abutment substrate carry-out path. The processing system of the eighth aspect of the invention, wherein the second atrium translation transport unit has a second atrium substrate carrying path that is movable up and down in a two-stage manner adjacent to the transport area, and a second The abutment substrate carrying-out and the second processing unit are selectively connected to the second intra-substrate substrate carrying path and the second intra-substrate substrate carrying-out path. When the second processing unit is loaded into the substrate, the height position of the second atrium substrate carrying path is aligned with the second intra-cell transfer path, and the second atrium substrate carrying path and the second unit transfer path are -46-201017804. The substrate is transported in the second direction in the longitudinal direction of the system, and when the substrate is carried out from the second processing unit, the height position of the second atrium substrate transport path is aligned with the second intra-cell transport path. The in-unit transfer path and the second atrium substrate carry-out path transport the substrate in the first direction in the longitudinal direction of the system. The processing φ system according to any one of the first aspect of the invention, wherein the substrate transfer portion on the terminal side of the first forward translation transfer unit and the first A third processing unit is disposed between the substrate transfer portions on the start side of the forward transfer transfer unit, and the first transfer device carries the substrate into and out of the third processing unit. 12. The processing system of claim 11, wherein the third processing unit is a resist coating unit that applies a resist liquid to the substrate; φ the first and second processing units are respectively The first and second decompression drying units that dry the resist coating film on the substrate under reduced pressure, and the substrate of the first and second decompression drying units to the substrate transfer port of the resist application unit The entrance is roughly equidistant. 13. The processing system according to claim 11, wherein in the first process route, a resist coating agent for applying a resist liquid on the substrate is provided on a transport path of the first forward translation transfer unit. In the cloth unit, the first and second processing units are first and second decompression drying units that respectively dry the resist coating film on the substrate, and -47-201017804, the first forward translation transfer unit In the substrate transfer portion on the terminal side, the substrate transfer ports of the first and second decompression drying units are substantially equidistant positions. 14. A processing system in which a plurality of processing units are connected in the order of a process flow, and a series of processing systems for performing a series of processing on a substrate to be processed has the following features: a first process route, which is system length In the first direction, the processing units of the first group are adjacent to each other or arranged in a row via the transport unit, and the second process route is opposite to the first direction in the longitudinal direction of the system. The second direction includes: a processing unit that is located in the second group on the downstream side of the process flow of the first process route, or a row that is arranged in a row via the transport system unit, and a first complex translation transfer unit that translates and transports the substrate, And a second reversing translation transporting portion that translates the transport substrate on the downstream side of the process flow of the first re-transporting and transporting unit, and extends in parallel with the atrium space of a predetermined size in the system width direction and the first processing route; The processing unit of the group is disposed in the atrium space; and the first conveying device is disposed in the atrium space, and is translating and conveying the first complex road The substrate delivery unit on the terminal side carries out the respective substrates, and transports them to one of the processing units of the third group, and the substrates that have been processed in one of the processing units of the third group are carried out from the processing unit, and are carried into the above-mentioned 2 The substrate delivery portion on the start side of the translational transfer portion. The processing system according to any one of the first to seventh aspects of the present invention, wherein the second conveying device is provided at one end of the system long side 201017804, and is placed in the system. The card is taken out of the unprocessed substrate to be handed over to the first process route, and the completed substrate in the system is received from the second process route, and is accommodated in any of the calipers that should be ejected from the system. The processing system according to any one of the first to seventh aspects, wherein the third transfer device is attached to the end portion of the longitudinal direction of the system, and the substrate is carried out from the first process route. Then, the second process route is directly carried in, or the second process route is carried in via the external processing device. -49-