TWI375135B - Reduced-pressure drying device - Google Patents

Description

t 1375135 IX. Description of the invention: [Technical field to which the invention pertains] The coating liquid applied to the substrate to be treated is dried. [Prior Art] This type of reduction drying device is used for, for example, liquid crystal display. A conventional vacuum drying apparatus, for example, as described in the patent document, has a top tray or a shallow bottom container type lower chamber, and can be airtightly fitted or embedded. A cap-shaped upper chamber on the top surface of the lower chamber. Among the lower chambers, there is a table ^' on which the substrate is placed horizontally, and then the chamber is closed (the upper chamber = the chamber is opened, and further, the substrate is loaded/unloaded) , ϊ #适备升. Then, the substrate is carried out or loaded/unloaded, and the selection is performed by the Weishang line in the decompression and dry operation [Patent Document 1] Japanese _ _ _ _ _ _ _ _ _ _ _ _ _ Contents] [Problems to be Solved by the Invention] As described above, each time the substrate is carried out of the human chamber, the upper chamber is raised and lowered (opened and closed).

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ϋ - 边 边 边 边 边 边 边 边 边 边 边 边 边 边 边 边 边 边 边 边 边 边 边 边 边 边 边 边 边 边 边 边 边 边 边 边 四 四 四 四 四 四 四 四 四 四 四 四 四 四It is also becoming more and more sturdy, but it is more difficult to keep a large substrate on the ground. The anti-coating substrate is transported in a curved t cancer. Errors such as positional deviation or collision or breakage occur in the chamber of the vacuum drying apparatus or during loading/unloading. The present invention has been made in view of the above problems in the prior art, and an object of the present invention is to provide a vacuum drying apparatus which can carry out the loading and unloading of a substrate to be processed in a safe and smooth manner and attach the coating film on the substrate to the substrate. The transfer marks of the ministry inhibit the car to a minimum. [When the problem is solved] Most of the lift pins in the discrete arrangement are in the middle of the implementation of the above-mentioned drying, and the front end is raised above the roller passage to support the lifting of the substrate. In order to achieve the above object, the vacuum drying apparatus of the present invention is characterized in that the coating liquid applied to the substrate to be treated is subjected to a drying treatment under reduced pressure, and includes a chamber capable of decompressing, and the substrate is substantially The space in which the horizontal state is accommodated; the gi exhaust mechanism, and the above-described drying process, the vacuum chamber is transported in a sealed state in the chamber, and has a roller transport passage continuous to the outside of the chamber, and a roller The roller on the track is carried out to carry the substrate out of the chamber; and the second mechanism has a wire transport path for supporting the substrate substantially horizontally at the pin end, and (10) Lin said to perform the foregoing, Structure ^ 'Because the system will accept the drying process of the substrate, to "under the material" and the substrate in the chamber after drying under reduced pressure "sub-transport out to the cavity outside Therefore, it is not necessary to use the transport arm of the transporting machine to disengage the ί substrate like the 11-like curved bend #, and the unloading time i is biased ° ° and 'when moving out the substrate, there is no need to open and close the cavity ί ί Ι Ι _ _ or safety problem. In addition, the lifting channel is lifted upwards and the root position is transferred from the roller to the substrate contact portion. It is preferably 〇4 faces ~ 〇6 faces), which can significantly produce 1375135 = low traces. In addition, for the step-by-step reduction of transfer ^ for 'lifting _ with medium, constructed _ body and wire in ^ = grease The tip end of the pin-making part is better, and the end portion of the body is represented by the front end of the invention. The second embodiment of the invention is based on the invention - a preferred hybrid, a lifting mechanism, and a (four) straight vertical support 1 The transport channel is produced. The base is configured to be lifted and lowered by the lift drive source outside the chamber. If the pressure mechanism is applied to the chamber, the sealing mechanism is the minimum necessary: Most of the lift pins are lifted and lowered. The i sub ======The fine haul transport pass ϊ ί ί ί According to the present invention, the first vehicle that can be fixed at a fixed height position at both ends can be in a straight posture: and, ♦ high-touch (four) whole second-axis braiding, that is, the rolling side of the crucible is in the substrate. = Side 1 is provided for: carrying the roller out of the chamber to carry out the 'face to the substrate n'f_. The situation is controlled by:;, =, the degree of transport through the wall, ' However, it is also possible to use one Π for both 搬 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 The second exhaust mechanism that exhausts the indoors in an open state is preferably used in the second exhaust machine, and is preferably provided in a third exhaust mechanism for vacuum suction of the exhaust gas σ provided in the chamber. (Effects of the Invention) According to the present invention, the dehumidification can be used to form a coating film on the substrate in a manner that efficiently and safely and smoothly enters the substrate. The transfer marks attached to the substrate contact portions are minimized. BEST MODE FOR CARRYING OUT THE INVENTION Hereinafter, preferred embodiments of the present invention will be described with reference to the accompanying drawings. ^ Shows that the vacuum drying apparatus of the present invention can be applied; the coating development and development fabric development processing system of the example 1 is installed in a clean room, for example, the glass substrate is used as a substrate, and the solid LCD manufacturing process is as follows: Such as washing, anti-storage coating, pre-baking, developing and post-processing - even $ processing. The exposure treatment is performed by an external exposure device 12 disposed adjacent to the system. nD/c, it coating development processing system 1〇, in the center of the horizontal processing station, the long side direction (X direction) of the (four) miscellaneous E box station (C / S) 14 and boundary 20 ' is the system 1〇 Move out and enter, there are: PCT box pedestal overlap and can receive the shirt to correct the water payment (丫 ί ί ί ϋΐ ; ;; transport mechanism 22, for this pedestal 2G on the box c ^ D J board G moved out. The transport mechanism 22' has a substrate reversal (the second portion 5' from the E-box station (C/S) 14 side to the interface station (I/F) 18 side upstream portion' along the first advection transport path 34, from the upstream The side is sequentially arranged in a row (INPASS) 24, the cleaning processing unit 26, the first heat treatment unit %, the coating processing unit 30, and the second heat treatment unit 32. More specifically, the 'loading unit (INPASS) 24 is 匣The conveyor of the box station (c/s) 14 picks up the unprocessed substrate G and casts it for a predetermined working time; ^. The cleaning portion 26, along the grading flow channel % from the upstream side, sequentially The alignment molecular UV irradiation unit (E-UV) 36 and the scrub cleaning unit (SCR) 38. The first heat treatment unit 28 sequentially sets the adhesion unit =) 4 () and the cooling unit (c〇L) from the upstream side. 42. Coating treatment The part % is sequentially applied from the upstream side, a resist coating unit (COT) 44 and a reduced-pressure drying unit. The second heat treatment is performed. The 卩32' is provided with a pre-baking unit in order from the upstream side. The 2nd 4k 34 end point of the secret transfer 32 is set to pass through the unit (PASS) 52. The substrate G of the wire is transported on the first advection transport path 34 by the advection, and then passes through the single A to the interface station 8 . On the other hand, from the interface station (717) 18 side to the downstream side of the cassette station (c/s) 14 side, the f-line fn second advection transport path 64 is arranged in a row-by-column arrangement from the top: The member f tc (DEV) 54, the post-drying unit (p〇ST_BAKE) 56, the cooling unit (c%, the check sheet τ〇(ΑΡ) 60, and the carry-out unit (OUT_pASS) 62. Here, the post-drying unit (fOST- BAKE) 56 and cooling unit (a) L) 58 constitute a third heat treatment unit 66. Carry out = (OUTPASS) 62 'The processed substrate g I is taken from the second advection transport path M and delivered to the cassette. The transport mechanism 22 of the station (c/s) 14 is a shuttle mechanism 7G, which is capable of horizontally placing the substrate 单 in units of a single piece, between the two smart lines A and B. Drive not shown, Moving in the processing direction (X direction) in both directions. The interface station 18 has a transport device 72 for performing the first and second advection transport channels 34, 64 or the adjacent exposure device I2 and the substrate (4), and the transport device Around the 72, a rotating pedestal 74 and peripheral devices are arranged. The Δ seat (R/S) 74 is a pedestal for rotating the substrate G in the horizontal plane for converting the direction of the rectangular substrate G when being delivered between the exposure device 1375135*'. The peripheral device is connected to the second advancing transport path 64 by, for example, a print exposure device (TITLER) or a peripheral exposure device (EE). ^ In Fig. 2, the processing steps of all the steps of g = one step in the coating development processing system are shown. First, at the cassette station (c/s) 14, the transport mechanism 22 takes out one of the substrates G from any of the cassettes C on the holder 20, and carries the taken-out substrate into the processing line of the processing station (P/S) 16. The carry-in unit (inPASS) 24 on the A side (step S1) e The substrate G is transferred from the carry-in unit (INPASS) 24 or is placed on the second advection transport path 34. • The substrate G that has been introduced into the first advection transport path 34 is initially subjected to ultraviolet cleaning treatment by the excimer ^ irradiation unit and the scrub cleaning unit (SCR) 38 ' in the cleaning processing unit 26 And scrub cleaning treatment (step, .S3). A scrubbing cleaning unit (SCR) 38, for the substrate G horizontally moving on the advection transport path 34, is subjected to brushing or blow cleaning, and is removed from the surface of the substrate, followed by a rinsing process, and finally an air knife or the like to cause the substrate. G is dry. When the series of cleaning processes is completed, the substrate ^ is directly passed down from the first advection transport path 34 to pass through the first heat treatment portion 28. In the first heat treatment unit 28, the substrate G is first applied to the adhesion unit (4), and the surface to be treated is hydrophobized by the adhesion treatment using the vapor form TM1 (step S4). After the end of the adhesion process, the substrate G is cooled by the cooling unit (C〇L) 42 to a predetermined substrate temperature (step S5). Thereafter, the substrate G is lowered from the first advection transport path 34, and is carried into the coating processing unit 30. In the coating processing unit 30, the substrate G is initially applied to the resist coating unit ((:: 〇 is 44-dimensional, using a non-rotation method using a slit nozzle, and a resist is applied on the top surface (processed surface) of the substrate) Immediately thereafter, the liquid is immediately subjected to a drying treatment at room temperature by a downstream side (step S6). The substrate G' leaving the coating processing unit 30 is lowered from the first advection conveying passage 34, and the second is passed. The heat treatment unit 32. In the second heat treatment unit 32, the substrate G is first subjected to heat treatment after application of the anti-surplus agent or pre-exposure 10 1375135 j7) in the pre-baking unit (PRE-B AKE) 48. The resist remaining on the substrate g is removed from the 4c wide core sheet to enhance the adhesion of the resist film to the substrate. Secondly, the second unit (C〇L) 50 is cooled to a predetermined substrate. Temperature (step S8). The passage of the second end point is to be climbed to the surface ,18, and the substrate G is rotated by the pedestal 74, for example, after receiving 90 degrees, and the surrounding area of the peripheral money 76 is moved. _ Here, ί If next to the exposure of the level G, the exposure to the exposure is removed, k to the adjacent exposure device 12 (step S9). Then, the anti-silver agent on the r substrate g is exposed to a predetermined circuit pattern. When the substrate G exposed by the jt beam pattern is returned from the exposure device 12 to the interface station (=) 18 (step S9), first, the printing of the peripheral device is carried out. After the exposure device 徭1, predetermined information is recorded on a predetermined portion on the substrate (step S10). The starting point of the developing unit (dev) 54 of the second thousand &

Next, the HG is applied to the processing line B 4 at the second advection transport path 64, and the substrate g is developed, washed, and dried in a parallel flow process (step su). The substrate G which has been subjected to a series of development processes at t = (DEV) 54 'end passes through the third heat treatment portion % and the inspection (AP) 6 依 in a state of carrying two channels 64. In the third heat treatment unit 66', the substrate G is initially subjected to the development of the anti-side film as the heat treatment of the after-treatment (the OST-BAKE), or the adhesion of the paste liquid to the substrate. Sex. Next, the substrate G is cooled to the temperature of the both sheets (step S13). In the inspection unit (returning, thick surname pattern, performing non-contact line width inspection or film quality, film, out unit (OUTPASS) 62 from the second advection transport channel 64 to receive all the processing of the finished substrate G' delivery The transport mechanism U of the g-cart station (c/s) i4. 11 1375135 On the side of the cassette station (C/S) 14, the transport mechanism 22 receives the processed substrate G' from the carry-out unit (〇UTpASS) 62. The present invention is generally used (step S1). The coating processing system 1 can be applied to the vacuum drying unit (VD) 46 in the coating processing unit 30. Hereinafter, according to Fig. 3 to Fig. 3 π, the configuration and operation of the vacuum drying unit (VD) 46 in the coating treatment unit in the preferred embodiment of the present invention will be described in detail.

In the embodiment shown in Fig. 3, the entire coating processing unit 3 is a plan view. Fig. 4 to Fig. 6 show the configuration of the reduced-pressure drying unit (10) of the embodiment, and Fig. 4 is a plan view thereof, and Figs. 5 and 6 are sectional views thereof. ,::LI:: The anti-slipping coating unit (C〇T) 44 has: a floating pedestal 8 构成 which constitutes the first turbulent flow ! 2 τ part or a section, and ί G The top surface of the substrate g transported on the substrate transport 8G transported in the long-side direction of the pedestal (χ direction) is supplied with anti-money ====84, and the money is touched by the shop - most of the ΐΐΓΛ ΐΐΓΛ = = The predetermined gas (for example, air) is provided with a pair of guide rails 90A and 对于 for the injection of the upper (10) contact gas, and the clamped guide rail 90A, 夹持, and the Γ can be referred to the county mechanism 92, along the guide The obstruction 90A and the resist nozzle 84 are perpendicular to the water above the pedestal 8 ( (Y direction;) transversely extending in the second I direction (X direction), and the base beam is just below the financial base. The mosquito-coated solution is sprayed into a strip. Further, the anti-4^= thief = 1375135 holding member 94 is integrally moved in the x-direction and moved between the cloth position and the nozzle updating portion 86. 'The lifting and lowering can be held by the pillar member 96 at the predetermined position above the 涂 新 新 新 新 新 新 , , , , , , , , , , , , pm pm pm pm pm pm pm 84 84 84 84 84 84 84 84 84 84 84 84 84 84 Anti-liquid; nozzle bath i cloth = pre-preparation and drying against the mouth-spraying spout of the mouth 84, while maintaining the agent-filling gas-resistance agent spray cleaning mechanism to remove the anti-surname and (four) anti-surname The agent is removed. The vicinity of the anti-reagent spouting port of the nozzle 84 is applied from the coating unit (cot) 44. First, the substrate g transported by r is held in a floating state. _6.. Butterfly x square; drying unit: the liquid end to the back end in a velvet-like manner to make the liquid trace of the anti-money d liquid into a surface. #This coating has anti-auxiliary liquid ==; = to the pedestal 80, over the pedestal 80 After the rear end = J, the roller transports the k-channel 104, thereby releasing the substrate G of the roller transporting path K) 4 of the sliding mechanism 92, and then, as will be described later, the roller is transported and moved on the roller, and the moving into the rear section is reduced. Press drying unit ^) 46. The substrate G after the coating process is sent to the side of the dry material element (10) as described above. The sliding mechanism 92 returns to the loading portion of the front end side of the pedestal 8 in order to pick up the next substrate G. Also, 'anti-nozzle 84, if it is over! The coating process (the resist liquid ejection position) is moved to the nozzle refreshing portion 86, and after the refreshing or pre-coating process such as nozzle cleaning or precoating is performed, the coating position is returned. As shown in FIG. 3, a resist coating unit (COT) 44 is disposed on the extended upstream side of the pedestal 8), and is provided with a 13 1375135 roller transport path constituting a part of the first advection transport path 34 (Fig. 104. This roller transport path 104 is continuously disposed outside and outside (before and after) of the chamber 106 of the reduced-pressure drying unit (^) 46. More specifically, the roller transport path 1〇4' around the reduced-pressure drying unit (VD) 46 is constituted by the fact that the carry-in side roller transport path 104a' is disposed on the upstream side of the transport of the chamber 1〇6 That is, the carry-in side; the inner roller transport path 104b is disposed in the chamber 106; the carry-out side roller transport path 104c is disposed on the downstream side of the transport of the chamber i06, that is, the carry-out side. each. The roller transport passages 104a, 104b, and 104c' of the crucibles are each independently or in common by a plurality of rollers i8a, 1b, 8b, and 1b8 disposed at appropriate intervals in the transport direction (X direction). The drive unit is rotated to rotate, and the substrate G is transported in the transport direction (X direction) of the roller transport. Here, the loading side roller transport path 104a functions as a substrate G' that is taken out from the pedestal 80 of the resist coating unit (COT) 44 and transported by the roller to the decompression drying unit. ^) The chamber of 46 is within 1〇6. The inner roller transport path l〇4b' functions as a substrate G that is transported by a roller from the loading side roller transport path 1〇4a. It is transported by rollers of the same speed and sent into the chamber 1〇6. At the same time, the substrate G which has been dried under reduced pressure in the chamber 106 is transported by rollers to the outside of the chamber 106 (rear stage). The side roller transport path 1〇4c is carried out, and the processed substrate G sent from the inner roller transport path i〇4b in the cavity to 106 is transported by the roller of the same speed and sent to the rear stage processing unit. (Second heat treatment unit 32). As shown in FIG. 3 to FIG. 6, the chamber 1〇6 of the reduced-pressure drying unit (^0) 46 is formed into a relatively flat rectangular body, wherein there is a space in which the tomb G can be horizontally accommodated in the chamber. The transport direction of the 106 (X direction), the side walls of the pair of the upstream (the upstream side and the downstream side) facing each other, each of which is provided with a slit-shaped transfer port 110 and a transfer port in which the substrate G can pass through the size of the advancing flow. 112. Further, the shutter mechanisms 114 and 116 for opening and closing the inlets 1 (1) and the outlets 112 are attached to the outer walls of the chambers 1 and 6. The top surface or upper cover 118 of the chamber 1〇6 can be removed for maintenance. Although the illustration of each of the brake mechanisms Π4 and 116 is omitted, the cover body (the valve body slit-shaped carry-out port (110, m) is hermetically sealed; the i-th cylinder tube is used to remove and remove the population _, m The horizontally opposite straight moving position and the lower moving position between the moving positions; the second cylinder, so that the cover is airtight and close to the carrying out (11〇, 112) Horizontal movement between the horizontal forward position and the horizontal return position leaving the separation. In the chamber 106, '1% of the rollers constituting the internal roller transport passages 1〇4b are arranged in a row at a rich interval in the transport direction (χ direction) corresponding to the height position of the ports (110, 112). A part or all of the rollers i〇gb are connected to a rotary drive source 120 such as a motor provided outside the chamber i〇6 via an appropriate transmission mechanism. Each of the rollers 10 8b is formed of a rod body which is in contact with the back surface of the substrate cymbal by a cylindrical portion or a cylindrical portion having the same outer diameter, and both end portions thereof are provided on the left and right side walls of the chamber 106 or in the vicinity thereof. (not shown) is rotatably supported. The rotating shaft 122 of the transmission mechanism runs through the side wall portion of the chamber 106 and is sealed by the sealing member 124. The roller 〇8a constituting the loading side roller transport path 〇4a is also omitted from the drawing, and both end portions thereof are supported by a miscellaneous phase such as a frame by E1, and are transported by the upper & internal roller. The channel 104b is rotated or driven by a common 12G or other rotary drive source. The same applies to the l〇8c constituting the carry-out side roller transport path l〇4c. This reduced-pressure drying unit (VD) 46 has a lifting mechanism 126 for raising and lowering the substrate G in a substantially horizontal manner in the chamber 1〇6. The elevating mechanism includes a plurality of (preferably 50 or more) lift pins 128, which are disposed in the chamber 1〇6 in a configuration of & J (for example, a matrix); a horizontal bar or a horizontal plate is recorded. The pin portion 130' supports the lift pins 128 at a lower position than the inner roller transport passage 104b in each predetermined group or group; the lift drive source such as the cylinder tube 132, the pin base portion 130 moves up and down, and is disposed at Outside the chamber ι〇6 (bottom). ... more specifically 'the gap between the two adjacent rollers l8b, l8b, parallel to the roller 108b (γ direction) 'majority (preferably 7 or more) lifting pin (2) ^ The fixed straight standings are arranged in a row. The lifting pin rows are arranged in the transport direction (X direction) at appropriate intervals, and a plurality of columns (preferably 8 columns or more) are provided at intervals, so that the pin bases 13A support the i group or the £ array ( The illustrated example is a set of two sets of lift pins. Then, the bottom wall of the chamber 1〇6 is hermetically penetrated via the member 134, and the respective pin bases 13 on the inside of the chamber are connected to the corresponding cylinders on the outside of the chamber by the lifting and lowering drive shaft 36 that can be moved up and down. The tube is connected with 15 1375135. f. The elevating mechanism 126 configured to drive all the lifts -12 δ into the pins by the drive m and the pin base 13G by causing the full escaping 132 to advance (rise) or retreat (lower) together in the 5th motion. The pin front end is fixed to the pin base portion 130 at the lower end of the roller transport path excitation at the lower roller transport path 1 及 and the pin ' ί ί : pin body application' lower end portion; 5). The main body 12 of the pin i 128 protrudes straight upward from the upper end (the figure shows that the pin body 1 is torn, for example, stainless steel (the tip end portion of the rigid body formed by ah, preferably PEEK or Cdaz II cylindrical frequency, (4)面 之 之 ] ] ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在Load the ii ▲ plate at the slab and put it down to the pedestal and after processing =. That is, '(4) singularly-like transfer pin for the lift pin 'this embodiment' the tip end of the lift pin 128 is i 〇.8mm or less (if the strength is considered, the best straight is straight and the end is rounded to the established ruthenium (for example, R=〇2~〇3mm).. Bribe) Holds both 5i 5 i4^ Proximate—and moving out of the σ out position and lowering the gas delivery channel, and having a cylindrical shape § and a mouth M44 extending in the γ direction. These nitrogen gas ejecting portions 144 are, for example, sintered by sintering metal powder. The second tube of the Kongbei middle is connected to the nitrogen supply source via the distribution 146 (Fig. 4). After the vacuum drying treatment is completed, the chamber 106 is sealed. When the pressure-reducing state I returns to the atmospheric pressure state, the nitrogen gas ejecting portions 144 discharge nitrogen gas from the entire circumferential surface of the tube. Next, the action of the reduced-pressure drying unit (46) in the embodiment will be described. The adjacent resist coating unit (c〇T) 44 is coated with the anti-liquid substrate G, and is flowed from the floating domain feeding channel on the pedestal 8G to the loading roller transporting passage 1G4a. Thereafter, as shown in FIG. It is shown that the substrate G is transported by rollers on the moving side roller transport path, and finally touches the population m.

In the chamber 106. At this time, the gate mechanism 114 opens the transfer port 丄1U 〇 the internal roller transport path 1_ in advance, and also purchases the roller transport action by the combined side roller transport channel of the woman drive secret 12 (), and implements the transfer operation in time. As shown in FIG. 5, the roller transporting operation of the speed is sent from the loading port 11 to the rear of the chamber 106. At this time, the lifting/lowering mechanism 126, the lifting pin 128 of the pinion, has its pin front end in the (four) part of the roller conveying path, and the lower reversing (lowering) position stands by. Then, if the substrate G reaches the predetermined position of the center of the chamber, the internal roller transport passage lion's roller is stopped, and the front side roller transport passage 104 is stopped, as described above. The substrate G to be subjected to the reduced-pressure drying treatment is carried into the chamber hall from the front-stage anti-smoke coating unit (COT) 44, and at the same time (or g is shown in the chamber to be subjected to vacuum drying treatment) The passage _ and the moving out of the tender transport path _ , , and the transfer of the shell 4 speed are carried out from the carry-out σ 112 to the chamber, and the state is transported advancing to the second stage of the second heat treatment section G of the rear stage or the downstream side. The i-coating unit (C〇T) 44 is coated with a tamper-resistant base a spin-drying transport passage 104a and an internal roller transport passage 104b 17^/5135

BRIEF DESCRIPTION OF THE DRAWINGS The coating treatment unit of the 贝 贝 形态 形态 槿 巫 图 图 图 图 图 图 = = = = = = = = = = = = = = = = = = = = = = = = = = = = Figure 硝 硝 硝 i i i 施 减 减 单元 单元 单元 单元 单元 单元 单元 单元 单元 ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ 第 第 第 第 第 第 第 第 第 第 第 第 第The unit constitutes a plan view. Fig. 8 is a cross-sectional view showing the structure of the reduced-pressure drying unit of the second embodiment. Fig. 9 is a cross-sectional view showing the mechanism of the height of the center bearing in the second embodiment. W is a variable side view. Fig. 10 is a side view showing a modification of the mechanism in which the height position of the center bearing is positive in the second embodiment. Fig. 11 is a perspective view showing the mounting structure of the carrying-out port of the chamber and/or the rolling mechanism of the idle mechanism 3 in the second embodiment. [Main component symbol description] C EE G RL SY TITLER 10 12 13 14 H·Box Peripheral exposure device. Substrate Roller section Axis Printed exposure device Coating development processing system Exposure unit Lifting cylinder tube Box station (C/S) 23 1375135

16 processing station (P/S) 18 interface station (I/F) 20 pedestal 22 transport mechanism 22a transport arm 24 carry-in unit (IN PASS) 26 cleaning processing unit 28 first heat treatment unit 30 coating processing unit 32 second heat treatment unit 34 1st advection transport channel 36 Excimer UV irradiation unit (E-UV) 38 Scrub cleaning unit (SCR) 40 Adhesion unit (AD) 42 Cooling unit (COL) _ 44 Resin coating unit (COT) 46 Decompression Drying unit (VD) 48 Pre-bake unit (PRE-BAKE) 50 Cooling unit (COL) 52 Passing unit (PASS) 54 Developing unit (DEV) 56 Post-drying unit (POSTBAKE) 58 Cooling unit (COL) 60 Inspection unit (AP) 62 Outlet unit (OUT PASS) 64 Second advection transport path 66 Third heat treatment unit 68 Auxiliary transport space 70 Shuttle mechanism 24 1375135

72 Transport device 74 Rotating pedestal (R/S) 76 Peripheral device 80 pedestal 82 Substrate transport mechanism 84 *, . . . 4-. 86 Nozzle update unit 88 Gas injection port 90A, 90B Guide rail 92 Sliding mechanism 94 Nozzle support member 96 Strut member 98 Precoating treatment portion 100 Nozzle bath 102 Nozzle cleaning mechanism 104 Roller transport passage 104a Roller transport passage 104b Roller transport passage 104c Roller transport passage 106 Chambers 108a, 108b, 108c, 108d Roller 110 Carrying inlet 112 Outlet 114, 116 Gate mechanism 118 Upper cover 120 Rotary drive source 122 Rotary shaft 124 Sealing member 126 Lifting mechanism 25 1375135

128 Lifting pin 128a Pin body 128b Pin tip 130 Pin base 132 Cylinder 4 ^ j Sealing member 136 Lifting drive shaft 138 Exhaust port 140 Exhaust pipe 142 Vacuum exhaust 144 Nitrogen venting section 146 Piping 150 Bearing 152 Bearing 154 Base 156 Support member 158 Support member 160 Block 162 Bolt 164 Bolt 166 Venting rectifying plate 168 Foot 172. Drive shaft 174 Motor 176 Drive pulley block 178 Conveyor belt 180 Drive pulley block 182 Horizontal support rod 184 Horizontal joint rod 1375135 186, 188 190, 192 rolling support 194 window 196 exhaust pipe 198 exhaust fan (or exhaust pipe) 200, 202 open and close valve

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Claims (1)

1375135 096140948 (without marking) X. Patent application scope: 1. A vacuum drying device for drying the substrate under the condition of the substrate to be processed, with: a cloth liquid, in the secret cavity of the air a chamber for accommodating the substrate in a substantially horizontal state, the indoor-closed transport mechanism having a continuous roller transporting k on the outside and inside of the chamber, on the roller transport path Roller transporting the substrate into the chamber 々 and the 々 lifting mechanism, and having a plurality of spurs discretely arranged in the chamber to substantially horizontally feed the wire plate to the front end of the pin having a diameter of G.8 mm or less The substrate is supported high, and the == I: the front end of the lift lock pin is lower than the roller transport path, and the transport mechanism is used to carry out the roller transport of the substrate. The invention relates to a vacuum drying device according to the first aspect of the invention, wherein the lifting pin has a diameter of 〇.4 mm to 0.6 mm. 3. If applying for the decompression of the first or second item, the lifting lock has: a pin body composed of a hollow tube, and a resin pin installed at the front end of the pin body. Tip end. ^ The drying device of claim 3, wherein the tip end of the pin is formed into a circular rod. 5. The vacuum drying apparatus according to claim 1 or 2, wherein the lifting mechanism is disposed below the roller conveying passage, and a rod-shaped or plate-shaped pin base is disposed to vertically support the lifting The pin is lifted and lowered by a driving force of a lifting drive source disposed outside the chamber. 6. The vacuum drying apparatus of claim 1 or 2, wherein, in the chamber, the roller constituting the roller conveying passage has a shaft of a fixed diameter and is formed by an interval between the two or A plurality of annular rollers mounted on the shaft, the rollers are in contact with the bottom surface of the substrate at the outer surface of the teardrop, in accordance with the correction of the replacement page 096140948 (without scribe lines). The vacuum drying apparatus of claim 6, wherein the rolling shaft 2, the first bearing fixed at a certain height position at both ends, rotatably supports f' and the center of the towel is height-positioned The second bearing that can be adjusted is in a rotatable manner. Patent No. 1 or 2 of the reduced county, wherein the chamber is provided with a roller. The wire is transported from the outside of the chamber into the chamber. i room ί ί 二 和: to transport the county board by roller transport from the chamber to the mechanism outside the side wall of the chamber 'the ribs of the Chichi population and the exit gate 9 mountain as claimed patent scope Item 8. The vacuum drying apparatus of claim 8, wherein the outlets are disposed opposite to each other and are respectively disposed at sidewall portions of the chamber. Please refer to the eighth item of the patent scope to reduce the Wei-drying device, in which the inlet or the out-loading π, the set-up of the roller to transport the general-purpose, the second-work to the move 11 · such as the patented Gu η item of the vacuum drying device, = ^衮二. In the state of the entrance or the exit, the surface is formed. 12. If the purpose of cleaning the interior of the chamber is as follows, the purpose of cleaning the interior of the chamber is to open the _ the ': towel, based on the 2 exhaust mechanism. 13. The exhaust to the inside of the work 13. For the vacuum drying device of claim 12, the exhaust port shared by the regenerator and the second exhaust mechanism is disposed in the cavity. Schema: 29