JP2010083610A - Treatment system - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To shorten a substrate interval or a cycle time on a flatly flowing carrying passage in an inline type of juxtaposing a large number of treatment units in the order of a treatment flow. <P>SOLUTION: In this resist application development treatment system 10, a dry/thermal treatment part 32 is provided by arranging a two-piece type carrying-in divided conveyor (F<SB>a</SB>/F<SB>b</SB>)46 constituted as a carrying unit or a treatment unit of a flatly flowing system in both, a two-stage multilayer type parallel pressure reduction drying unit (VD<SB>1</SB>/VD<SB>2</SB>)48, a two-piece type carrying-out divided conveyor (R<SB>a</SB>/R<SB>b</SB>)50, a pre-bake (PRE-BAKE)52 and a cooling unit (COL)54 in a row in the order from the upstream side along the flatly flowing carrying passage 24. <P>COPYRIGHT: (C)2010,JPO&INPIT

Description

  The present invention relates to an inline processing system in which a large number of processing units are arranged in the order of process flow.

  Conventionally, in a resist coating and developing processing system in FPD (flat panel display) manufacturing, in order to cope with an increase in the size of a substrate to be processed, a carrier such as a roller or a roller is laid in a horizontal flow path. Equipped with a flat-flow type processing unit that applies a predetermined liquid, gas, light, etc. to the processing surface of the substrate while horizontally transporting the substrate, and includes such a flat-flow type processing unit A system configuration or layout in which a large number of processing units are serially arranged in a process flow order along a substantially horizontal line has been standardized (for example, see Patent Document 1).

  As described in Patent Document 1, this type of layout has a horizontally long process station at the center of the system and a cassette station and an interface station at both ends in the longitudinal direction. In the cassette station, a cassette for storing a plurality of unprocessed or processed substrates is loaded between the stage in the station and the outside of the system, and the substrate is loaded between the cassette on the stage and the processing station. Out is done. In the interface station, the substrate is transferred between the adjacent exposure apparatus and the processing station.

The process station has two lines of process lines, a forward path and a return path, each having a cassette station as a start point and an end point, and an interface station as a turning point. In general, in a forward process line, a cleaning processing unit, a resist coating processing unit, a thermal processing unit, and the like are arranged next to each other or in a row with a conveyance unit interposed therebetween. In the process line on the return path, a development processing unit, a thermal processing system unit, an inspection system unit, and the like are arranged next to each other or in a row with the transport system unit interposed therebetween.
JP 2007-200993 A

  As described above, an in-line processing system in which a large number of processing units including a flat-flow processing unit are serially arranged in the order of the process flow along a linear round-trip process line is used to increase the size of the FPD substrate. Along with this, the system longitudinal direction size or the total system length size is steadily increasing, which is disadvantageous in terms of footprint in FPD manufacturing factories.

  One of the causes is that in a flat-flow type processing system, the longer the tact time, the longer the separation distance between adjacent substrates on the process line, and thus all processing units that adopt the flat-flow type or There is a characteristic that the size of the transport unit in the flat flow direction increases, and the overall system size increases.

  Therefore, in order to shorten the overall system size, all the processing units are required to shorten the tact time. In that respect, in the resist coating and developing processing system as described above, the vacuum drying process inserted between the resist coating process and the pre-baking process requires a relatively long time, so the takt time of the vacuum drying unit is shortened. It is considered to be the most difficult.

  Therefore, a system that reduces the tact time of the vacuum drying process to less than half by arranging a plurality of vacuum drying units in parallel on the process line and operating these vacuum drying units in parallel or simultaneously. Configuration is conceivable. In that case, a transport mechanism is arranged next to the upstream side of the vacuum drying unit to distribute and carry the substrate flowing from the resist coating processing section after finishing the resist coating process to a plurality of vacuum drying units. A configuration is adopted in which another transport mechanism for unloading the substrate that has been subjected to the vacuum drying process in the drying unit from the unit and delivering it to the thermal processing unit such as a pre-bake unit is located adjacent to the downstream side of the vacuum drying unit. .

  However, when a plurality of reduced-pressure drying units are arranged in parallel as described above, the tact time of the transport mechanism becomes a problem. For example, the upstream transport mechanism carries the substrate into each vacuum drying unit and a receiving position for receiving the substrate from the resist coating processing unit in a direction (parallel arrangement direction) perpendicular to the flat flow direction on the process line. Therefore, it will reciprocate with the loading position for. However, when the tact time of the entire system is shortened, the distance between adjacent substrates on the flat-carrying conveyance path becomes narrower, and the next substrate arrives at the receiving position while the substrate is being carried into the vacuum drying unit. Comes out. If the transport mechanism is completely restrained at the loading position until the loading of the substrate into the vacuum drying unit is completed, the next substrate must be stopped at the receiving position and waited. A similar problem is encountered in the downstream transport mechanism.

  Eventually, it becomes difficult to shorten the substrate interval (separation distance) on the flat flow path, and it becomes difficult to shorten the tact time of the entire system. That is, even if the takt time of the vacuum drying unit is shortened by arranging a plurality of units in parallel, the takt time of the transport mechanism becomes a bottleneck, and the takt time of the entire system is limited. As a result, if the substrate interval (separation distance) is increased in accordance with the tact time of the transport mechanism, the total length of the cystum is rather increased.

  The present invention has been made in view of the above-described problems of the prior art, and in the inline type in which a large number of processing units are arranged in the order of the process flow, the substrate interval or tact time on the flat flow path is shortened. It is an object of the present invention to provide a processing system that realizes a reduction in overall system size.

  In order to achieve the above object, a processing system according to a first aspect of the present invention includes a flat flow path for transferring a substrate to be processed in a flat flow along a process flow, and the flat flow transfer in the process flow. A plurality of parallel processing units arranged in an offset direction substantially orthogonal to the flat flow conveying path on the downstream side of the path or arranged side by side; an end of the flat flow conveying path and an inlet of the parallel processing unit A plurality of division conveyors arranged in a divided manner in the direction of flat flow between them, and the plurality of division conveyors receive the substrates from the flat flow conveyance path in a flat flow, and receive the received substrates in the parallel processing unit It has a division conveyor moving part which moves each independently in the offset direction so as to be distributed to any one and carried in with a flat flow.

  In the system configuration according to the first aspect, since the plurality of division conveyors can move independently in the offset direction, the upstream division conveyor is preceded when the next substrate is received in the flat flow from the flat flow conveyance path. Picking up the substrate, the downstream conveyor can move to the receiving position later in time to receive the substrate, and until then, engages in the (plain flow) loading of the previous substrate to the parallel processing unit. be able to. In this way, the entire divided conveyor is not restrained until the loading of the substrate into the parallel processing unit is completed, and the upstream divided conveyor can move to the receiving position to pick up the next substrate in advance, Repetitive operations of receiving the substrate from the flat flow path and carrying the substrate into the parallel processing unit can be performed in a short tact time.

  According to a preferred aspect of the present invention, each of the divided conveyors has a receiving position for receiving the substrate from the flat flow transport path in a flat flow, and each of the parallel conveyors arranged offset in the offset direction from the flat flow transport path. The substrate is movably provided between an offset loading position for loading the substrate into the processing unit in a flat flow.

  In another preferred embodiment, one of the parallel processing units is arranged in a straight line with the flat transporting path, and when the substrate is carried into the parallel processing unit, the plurality of divided conveyors are all in a straight line. Under the state of being aligned and united, the flat flow conveyance for receiving the substrate from the flat flow conveyance path and the flat flow conveyance for loading the substrate into the parallel processing unit are continuously performed.

  Further, as another preferred embodiment, the division conveyor has a single conveyor length shorter than that of the substrate in the flat flow conveying direction, and the combined conveyor length when aligned and combined in one row is substantially the same as or longer than that of the substrate. Also has a long size. In this case, the space for installing the dividing conveyor is sufficient for approximately one substrate.

  In another preferred embodiment, when the substrate is loaded and transferred from the receiving position to the offset carry-in position, the dividing conveyor moves in a flat flow and simultaneously moves in an aligned and united state in the carrying direction. When returning from the offset carry-in position to the receiving position in the state, the substrates are moved individually in the order in which the substrates are fed from the upstream side in the flat conveyance direction to the downstream side.

  According to another preferred aspect, each parallel processing unit is configured to flow unprocessed substrates from the dividing conveyor into the unit in a flat flow, and to flow the processed substrates in the unit into the unit downstream of the process flow. An internal conveyor for carrying out to the side is provided. Further, at least one flat-flow processing unit is provided along the flat-flow conveying path.

  A processing system according to a second aspect of the present invention includes a first flat flow transfer path for transferring a substrate to be processed in a flat flow along a process flow, and the downstream side of the flat flow transfer path in the process flow. Second and third flat flow paths arranged in an offset direction substantially orthogonal to the first flat flow path, or arranged side by side, the end of the first flat flow path, and the second And a plurality of divided conveyors arranged in the flat flow direction and the divided conveyors, and the substrate from the first flat flow path. And a split conveyor moving unit that independently moves the substrate in the offset direction so as to distribute the received substrate in a sink and distribute the received substrate to either the second or third flat transport path and deliver it in a flat flow.

  In the system configuration according to the second aspect, since the plurality of division conveyors can move independently in the offset direction, when the next substrate is received in a flat flow from the first flat flow conveyance path, the upstream division conveyor is Picking up the substrate in advance, the downstream conveyor can move to the receiving position later in time to receive the substrate, until then, the previous conveyor to the second or third flat flow path Engage in the delivery of substrates. In this way, all of the divided conveyors are not restrained until the delivery of the substrate to the second or third flat flow path is completed, and the upstream divided conveyor greets the next substrate in advance. Therefore, the repetitive operation of receiving the substrate from the first flat flow path and transferring the substrate to the second or third flat flow path arranged in parallel is performed in a short tact time. be able to.

  A processing system according to a third aspect of the present invention includes a flat flow transfer path for transferring a substrate to be processed in a flat flow along a process flow, and the flat flow transfer upstream of the flat flow transfer path in the process flow. A plurality of parallel processing units arranged in an offset direction substantially orthogonal to the path or arranged side by side, and divided between the outlet of the parallel processing unit and the start end of the flat flow path in the flat flow direction. The plurality of divided conveyors and the plurality of divided conveyors are unloaded in a flat flow from any one of the parallel processing units, and the unloaded substrates are flown into the flat flow and conveying path. And a split conveyor moving unit that moves independently in the offset direction so as to be delivered.

  In the system configuration according to the third aspect, since the plurality of divided conveyors can move independently in the offset direction, the substrate that has been processed from any of the parallel processing units arranged offset from the flat flow path When the substrate is carried out in a flat flow, the upstream dividing conveyor will first pick up the substrate, and the downstream dividing conveyor may move to the offset unloading position later in time to carry out the processed substrate. Well, until then, it is possible to engage in the delivery of the previous substrate to the flat flow and transfer path. In this way, all of the division conveyors are not restrained until the delivery of the substrate to the flat flow path is completed, and the upstream division conveyor can move to the offset carry-out position for carrying out the previously processed substrate. Therefore, it is possible to perform the repeated operations of carrying out the substrate from the parallel processing unit and delivering the substrate to the flat flow transport path with a short tact time.

  As a preferred aspect of the present invention, each of the divided conveyors includes an offset carry-out position for carrying out the substrate in a flat flow from each parallel processing unit arranged offset in the offset direction from the flat flow path, It is provided so as to be movable between a delivery position for delivering the substrate to the sink conveyance path in a flat stream.

  In another preferred embodiment, one of the parallel processing units is arranged in a straight line with the flat transporting path, and when the substrate is unloaded from the parallel processing unit, the plurality of divided conveyors are all in a straight line. Under the state of being aligned and united together, the flat flow transport for unloading the substrate from the parallel processing unit and the flat flow transfer for delivering the substrate to the flat flow transport path are continuously performed.

  Further, as another preferred embodiment, the division conveyor has a single conveyor length shorter than that of the substrate in the flat flow conveying direction, and the combined conveyor length when aligned and combined in one row is substantially the same as or longer than that of the substrate. Also has a long size. In this case, the space for installing the dividing conveyor is sufficient for approximately one substrate.

  In another preferred embodiment, when the substrate is transported from the offset carry-out position to the delivery position with the substrate placed thereon, the divided conveyor is moved in parallel while maintaining the state of being aligned and united in a single line in the carrying direction. When returning from the delivery position to the offset carry-out position in the state, the substrates are moved individually in the order in which the substrates are fed from the upstream side in the carrying direction to the downstream side.

  According to another preferred embodiment, each parallel processing unit carries an unprocessed substrate into the unit in a flat flow from the upstream side of the process flow, and divides the processed substrate in the unit by a flat flow. An internal conveyor for carrying out to the conveyor is provided. Further, at least one flat-flow processing unit is provided along the flat-flow conveying path.

  A processing system according to a fourth aspect of the present invention includes a first flat flow transfer path for transferring a substrate to be processed in a flat flow along a process flow, and an upstream of the first flat flow transfer path in the process flow. Second and third flat flow conveying paths that are laid on the side in an offset direction substantially orthogonal to the first flat flow conveying path or arranged side by side, and the second and third flat flow conveying paths A plurality of divided conveyors arranged in a divided manner in the flat flow direction, and the plurality of divided conveyors, the second or third flat flow. A split conveyor moving unit that independently receives the substrate from any one of the transport paths and moves the received substrate independently in the offset direction so as to be handed over to the first flat transport path; Have

  In the system configuration according to the fourth aspect, since the plurality of divided conveyors can move independently in the offset direction, the second or third flat flow transport arranged offset from the first flat flow path. When receiving the next substrate from the road in a flat flow, the upstream dividing conveyor may pick up the substrate in advance, and the downstream dividing conveyor may move to the receiving position later in time to receive the substrate. Until then, it is possible to engage in the transfer of the previous substrate to the first flat transport path. In this way, the entire divided conveyor is not restrained until the delivery of the substrate to the first flat flow path is completed, and the upstream or the divided conveyor leads the next substrate ahead of the second or third. Since the substrate can be moved to the offset receiving position of the flat flow transport path, it is possible to repeat the operations of receiving the substrate from the first flat flow transport path and delivering the substrate to the second or third flat flow transport path arranged in parallel. It can be accomplished with a short tact time.

  A processing system according to a fifth aspect of the present invention includes first and second flat flow transfer paths that are separated from each other through an empty space for transferring a target substrate in a flat flow along a process flow, A plurality of divided conveyors arranged in the empty space and divided in the conveyance direction, and the plurality of divided conveyors are received from the first flat flow conveyance path in a flat flow, and the received substrates are received in the second And a divided conveyor moving section that independently moves in the flat flow direction so as to be delivered to the flat flow direction.

  In the system configuration according to the fifth aspect, since the plurality of divided conveyors flow in the empty space and can move independently in the transport direction, when receiving the next substrate from the first flat flow path in a flat flow, The upstream dividing conveyor may pick up the board in advance, and the downstream dividing conveyor may move to the receiving position later so as to be in time for receiving the board. Until then, it goes to the second flat transport path. You can engage in the delivery of the previous board. In this way, all of the division conveyors are not restrained until the delivery of the substrate to the second flat flow conveyance path is completed, and the first flat flow conveyance is performed with the upstream division conveyor leading the next substrate. Since it can move to the receiving position for the road, the repeated operation of receiving the substrate from the first flat flow transport path and delivering the substrate to the second flat flow transport path can be performed in a short tact time.

  According to the processing system of the present invention, by the configuration and operation as described above, in the in-line type in which a large number of processing units are arranged in the order of the process flow, it is possible to reduce the substrate interval on the transport path or the tact time, It is also possible to reduce the overall system size.

Hereinafter, preferred embodiments of the present invention will be described with reference to the accompanying drawings.
[First Embodiment]

  FIG. 1 shows a resist coating and developing processing system as one configuration example to which the processing system of the present invention can be applied. The resist coating / developing system 10 is installed in a clean room. For example, a glass substrate is used as a processing substrate G, and a series of processes such as cleaning, resist coating, pre-baking, developing, and post-baking in a photolithography process in an LCD manufacturing process. The processing is performed. The exposure process is performed by an external exposure apparatus 12 installed adjacent to this system.

  In the resist coating and developing system 10, a horizontally long process station (P / S) 16 is disposed at the center, and cassette stations (C / S) 14 and interface stations (I / I) are arranged at both ends in the longitudinal direction (X direction). F) 18 is arranged.

  The cassette station (C / S) 14 is a cassette loading / unloading port of the system 10, and arranges up to four cassettes C that can accommodate a plurality of substrates C in a horizontal direction (Y direction) by stacking substrates G in multiple stages. A cassette stage 20 that can be placed, and a transport mechanism 22 that takes in and out the substrate G to and from the cassette C on the stage 20 are provided. The transport mechanism 22 has a transport arm 22a that can hold the substrate G in units of one sheet, and can operate on four axes of X, Y, Z, and θ, and the adjacent process station (P / S) 16 side and the substrate. G can be delivered.

  In the process station (P / S) 16, the processing units are arranged in the order of the process flow or the process on a pair of parallel and opposite lines A and B extending in the horizontal system longitudinal direction (X direction).

  In more detail, in the process line A on the forward path from the cassette station (C / S) 14 side to the interface station (I / F) 18 side, a carry-in unit ( IN-PASS) 26, cleaning process unit 28, coating process unit 30, drying / thermal processing unit 32, and carry-in / out unit (OUT-PASS) 34 are arranged in a row.

  The carry-in unit (IN-PASS) 26 is configured to receive an unprocessed substrate G from the transport mechanism 22 of the cassette station (C / S) 14, and to flow into the transport path 24 at a predetermined tact.

  The cleaning process unit 28 includes an excimer UV irradiation unit (E-UV) 36 and a scrubber cleaning unit (SCR) 38 that are configured as a flat-flow processing unit in order from the upstream side along the flat-flow conveyance path 24. Is provided.

  The coating process unit 30 includes an adhesion unit (AD) 40, a cooling unit (COL) 42, and a resist coating, which are configured as a flat-flow type processing unit in order from the upstream side along the flat-flow conveyance path 24. Units (CT) 44 are arranged in a line.

The drying / thermal processing unit 32 is divided into a two-part dividing conveyor for loading (F _a /) which is configured as a flat-flow type transfer unit or a processing unit in order from the upstream side along the flat-flow transfer path 24. F _b ) 46, a two-stage stacked parallel decompression drying unit (VD ₁ / VD ₂ ) 48, a _two-part delivery conveyor (R _a / R _b ) 50, a pre-bake unit (PRE-BAKE) 52 and cooling Units (COL) 54 are arranged in a line.

  As will be described later, the substrate G that has flowed from the carry-in unit (IN-PASS) 26 and flowed onto the transfer path 24 is flown flatly on the transfer path 24 and moved downstream to be processed by each processing unit on the way. A predetermined process is received one after another, and finally it arrives at the unloading unit (OUT-PASS) 34 at the end point and is delivered to the interface station (I / F) 18 from there.

  For example, the forward flattening conveyance path 24 is constituted by a floating conveyance path on the stage in the resist coating unit (CT) 44, and is constituted by a roller conveyance path in other sections.

  On the other hand, in the process line B on the return path from the interface station (I / F) 18 side to the cassette station (C / S) 14 side, all flow in the same order from the upstream side along the flat flow transfer path 56 in this order. Carrying-in unit (not shown), developing unit (DEV) 58, post-bake unit (POST-BAKE) 60, cooling unit (COL) 62, and through unit (TR) 64 configured as a processing apparatus or a transport unit of the type The inspection unit (IP) 66 and the carry-out unit (OUT-PASS) 68 are arranged in a line.

  The return-flow flat transport path 56 starts from the carry-in unit (not shown) provided below the peripheral device (TITLER / EE) 70, that is, on the same floor as the development unit (DEV) 58. A processing unit or transfer units 58 to 66 on the process line B are vertically cut and terminated at an unloading unit (OUT-PASS) 68. For example, the return plain flow transport path 56 is configured as a roller transport path over the entire section.

  The interface station (I / F) 18 includes a transport device 72 for exchanging the substrate G with the forward flat transport route 24 and the return flat transport route 56 and the adjacent exposure device 12. A rotary stage (R / S) 74 and a peripheral device 70 are arranged around. The rotary stage (R / S) 74 is a stage that rotates the substrate G in a horizontal plane, and is used to change the orientation of the rectangular substrate G when it is transferred to the exposure apparatus 12. The peripheral device 70 includes, for example, a titler (TITLER) and a peripheral exposure device (EE).

  Here, the processing procedure of all the steps for one substrate G in the coating and developing processing system will be described. First, in the cassette station (C / S) 14, the transport mechanism 22 takes out one substrate G from any one of the cassettes C on the stage 20, and removes the taken substrate G in the process station (P / S) 16. Carry in the carry-in unit (IN-PASS) 26 on the outbound process line A side. The substrate G flows from the carry-in unit (IN-PASS) 26 to the forward path, and is transferred or loaded into the transport path 24.

  The substrate G that has been put into the forward flow transport path 24 is first subjected to an ultraviolet cleaning process and a scrubbing cleaning process in the cleaning process section 28 by an excimer UV irradiation unit (E-UV) 36 and a scrubber cleaning unit (SCR) 38 in sequence. Is done. The scrubber cleaning unit (SCR) 38 removes particulate dirt from the substrate surface by performing brushing cleaning and blow cleaning on the substrate G that moves in a flat flow on the flat flow transport path 24 and then moves horizontally. The substrate G is rinsed, and finally the substrate G is dried using an air knife or the like. When a series of cleaning processes in the scrubber cleaning unit (SCR) 38 is completed, the substrate G flows as it is and flows down the transport path 24 and enters the coating process unit 30.

  In the coating process unit 30, the substrate G is first subjected to an adhesion process using vapor HMDS by an adhesion unit (AD) 40 as a pre-process for resist coating, and the surface to be processed is hydrophobized. After the completion of this adhesion process, the substrate G is cooled to a predetermined substrate temperature by a cooling unit (COL) 42. Thereafter, the substrate G is flown down and is transported down the transport path 24 to the resist coating unit (CT) 44.

  The resist coating unit (CT) 44 uses a flat-flow spinless method in which a resist solution is supplied onto a substrate from a long slit nozzle (not shown) while the substrate G is floated and conveyed on a floating stage (not shown). A resist solution is applied to the substrate surface at a constant film pressure. Upon exiting the levitation stage, the substrate G passes through the flat transport path 24 and is greeted by the carry-in conveyor (Fa / Fb) 46 of the drying / thermal processing section 32.

  The resist coating unit (CT) 44 includes sorter units (not shown) before and after the levitation stage, that is, on the carry-in side and the carry-out side. The sorter unit on the carry-in side includes a roller transport path that constitutes one section of the flat flow transport path 24, and a plurality of suction pads that can be suctioned / removed from the vacuum on the edge of the back surface of the substrate with respect to the substrate on the roller transport path. And a substrate feed mechanism for moving these suction pads in both directions parallel to the transport direction. When the substrate that has been cooled by the upstream cooling unit (COL) 42 is flattened and received on the roller conveyance path, the suction pad rises and is attracted to the rear edge of the substrate, and the substrate is sucked and held. A substrate feeding mechanism moves the substrate to the floating stage of the resist coating unit (CT) 44 through the pad. Then, after the substrate is carried into the levitation stage, the suction pad is separated from the substrate, and then the substrate feed mechanism and the suction pad are returned to the original positions. The sorter unit on the carry-out side has the same configuration as the sorter unit on the carry-in side, except that the order and direction of operation are reversed.

In the drying / thermal processing section 32, the flat flow path 24 is functionally divided into two parts via _a carry-in dividing conveyor (F _a / F _b ) 46 to form a two-stage stacked type vacuum drying unit (VD). ₁ / VD ₂ ) 48, and again merges at the carry-out division conveyor (R _a / R _b ) 50 to return to one conveyance path.

The carry-in conveyor (F _a / F _b ) 46 receives the substrate G after the resist coating processing from the resist coating unit (CT) 44 in a flat flow, and the received substrate G is dried under reduced pressure on the lower floor (first floor). Sorted into either unit VD ₁ or vacuum drying unit VD _{2 on} the upper floor (second floor). For example, even-numbered substrates G _2n (where n = 0, 1, 2,...) Are carried into the second floor vacuum drying unit VD ₂ , and odd-numbered substrates G _{2n + 1} are transported to the first floor vacuum drying unit VD. Bring it to ₁ . Thus, the even-numbered substrates G _2n in the second floor of the vacuum drying unit VD _2, odd-numbered substrates G _{2n + 1} receives the first floor of vacuum drying unit VD ₁ by the vacuum drying process respectively. In this reduced pressure drying process, the organic solvent (for example, thinner) evaporates from the resist liquid film on the substrate G in the chamber under reduced pressure, and the organic solvent vapor is exhausted out of the chamber together with other gases.

The substrate G that has been subjected to the vacuum drying process in each of the vacuum drying units VD ₁ and VD ₂ is carried out of the vacuum drying unit by the carry-out divided conveyor (R _a / R _b ) 50, and downstream on the flat flow transport path 24 And sequentially passes through the pre-bake unit (PRE-BAKE) 52 and the cooling unit (COL) 54.

  When the substrate G passes through the pre-bake unit (PRE-BAKE) 52 in a flat flow, for example, the substrate G is heated by heat radiated from a heating element installed above the flat flow conveyance path 24, and heat treatment after resist coating or Pre-baking is performed as a heat treatment before exposure. By this pre-baking, the solvent remaining in the resist film on the substrate G is evaporated and removed, and the adhesion of the resist film to the substrate is enhanced. Next, when the substrate G passes through the cooling unit (COL) 54 in a flat flow, the substrate G is cooled to a predetermined substrate temperature by blowing cold air from a cold air nozzle installed above the flat flow conveyance path 24, for example. The Thereafter, the substrate G is picked up by the transfer device 72 of the interface station (I / F) 18 from the carry-out unit (OUT-PASS) 34 at the end point of the forward flow and transfer path 24.

  In the interface station (I / F) 18, the substrate G is subjected to, for example, a 90-degree direction change by the rotary stage 74 and then carried into the peripheral exposure device (EE) of the peripheral device 70, where it adheres to the peripheral portion of the substrate G. After receiving the exposure for removing the resist to be developed, the resist is sent to the adjacent exposure apparatus 12.

  In the exposure device 12, a predetermined circuit pattern is exposed to the resist on the substrate G. When the substrate G that has undergone pattern exposure is returned from the exposure apparatus 12 to the interface station (I / F) 18, it is first carried into a titler (TITLER) of the peripheral device 70, where predetermined information is transferred to a predetermined portion on the substrate. Is marked. After that, the substrate G is carried into the carry-in unit (not shown) below the peripheral device 70 from the transfer device 72.

  In this way, the substrate G is transported toward the downstream side of the process line B on the return-flowing and transporting path 56 this time. In the first development unit (DEV) 58, the substrate G is subjected to a series of development processes of development, rinsing and drying while being transported in a flat flow.

  The substrate G that has undergone a series of development processing in the development unit (DEV) 58 is flattened as it is, moved to the downstream side on the transport path 56, a post bake unit (POST-BAKE) 60, a cooling unit (COL) 62, The through unit 64 and the inspection unit (IP) 66 are sequentially passed.

  The substrate G is subjected to post-baking as a heat treatment after the development processing when passing through the post-baking unit (POST-BAKE) 60 in a flat flow. By this post-baking, the developing solution and the cleaning solution remaining in the resist film on the substrate G are removed by evaporation, and the adhesion of the resist pattern to the substrate is enhanced. Next, the substrate G is cooled to a predetermined substrate temperature when passing through the cooling unit (COL) 62 in a flat flow. In the inspection unit (IP) 66, the resist pattern on the substrate G is subjected to non-contact line width inspection, film quality / film thickness inspection, and the like. The through unit (TR) 64 is a transport unit for adjusting the process line length size for adjusting the total length of the return path process line B to the total length of the forward path process line A, and may be configured to include only a roller transport path, for example. .

  The carry-out unit (OUT-PASS) 68 receives the substrate G that has been subjected to the processing of all the processes from the flat-flow conveyance path 56 on the return path, and transfers it to the conveyance mechanism 22 of the cassette station (C / S) 14. On the cassette station (C / S) 14 side, the transport mechanism 22 accommodates the processed substrate G received from the carry-out unit (OUT-PASS) 68 in any one (usually the original) cassette C.

  In the resist coating and developing system 10, the present invention can be applied to the drying / thermal processing unit 32 disposed on the outward process line A.

  Hereinafter, the configuration and operation of the drying / thermal processing unit 32 according to an embodiment of the present invention will be described in detail with reference to FIGS.

In FIG. 2, the structure of the principal part of the drying / thermal processing part 32 in this embodiment is shown. As shown in the figure, the carry-in division conveyor (F _a / F _b ) 46 is composed of two division conveyors F _a and F _b divided in the flat-flow conveyance direction (X direction). Each of these divided conveyors F _a and F _b has a single conveyor length of about ½ of the substrate G, and the combined conveyor length when the two are combined and aligned in a row is substantially the same as or longer than the substrate G. Also has a long size. Each of the divided conveyors F _a and F _b has a plurality of rollers 82 attached to the conveyor body 80 at regular intervals to form an independently driven roller conveyance path, and is further vertically driven by individual conveyor lifting parts 84a and 84b. It can be moved up and down independently.

Similarly, the carry-out divided conveyor (R _a / R _b ) 50 is also composed of two divided conveyors R _a and R _b divided in the flat flow direction (X direction). Each of these divided conveyors R _a and R _b has a single conveyor length of about ½ of the substrate G, and the combined conveyor length when the two are combined and aligned in a row is substantially the same as or longer than the substrate G. Also has a long size. Each of the divided conveyors R _a and R _b has a plurality of rollers 82 attached to the conveyor body 80 at regular intervals to form an independently driven roller conveyance path, and is further vertically driven by individual conveyor lifting parts 86a and 86b. It can be moved up and down independently in the direction.

The carry-in division conveyor (F _a / F _b ) 46 and the carry-out division conveyor (R _a / R _b ) 50 each constitute one section of the forward flow and the carry path 24 (FIG. 1).

In the two-stage stacked type vacuum drying unit (VD ₁ / VD ₂ ) 48, the first floor vacuum drying unit VD ₁ has a decompressed chamber 90 (1) having a flat rectangular parallelepiped shape. A pair of opposite side walls of the chamber 90 (1) in the flat flow conveying direction (X direction) are provided with an openable / closable substrate carry-in port 92 (1) and a substrate carry-out port 94 (1) with a shutter or door valve, respectively. It has been. In the chamber 90 (1), there is provided a stationary internal roller conveyance path 96 (1) that constitutes a section of the flat flow conveyance path 24 (FIG. 1). Further, a height position (position on the roller transport path 96 (1)) for loading or unloading the substrate G in the chamber 90 (1) and a height position (roller transport path 96 ( A lift pin mechanism (not shown) is provided for raising and lowering from 1) to a position floating upward.

  One or more exhaust ports 98 (1) are provided on the bottom wall of the chamber 90 (1). These exhaust ports 98 (1) are connected to the inlet side of the vacuum pump 102 (1) through the exhaust pipe 100 (1). An on-off valve 104 (1) is provided in the middle of the exhaust pipe 100 (1). A purge gas supply unit (not shown) for supplying a purge gas such as air or nitrogen into the chamber when returning the chamber 90 (1) from the reduced pressure state to the atmospheric pressure state is also provided via the gas supply pipe. )It is connected to the.

2 floor vacuum drying unit VD ₂ also has a vacuum of 1 floor described above drying unit VD ₁ and the same or similar structure 90 (2) 104 (2).

  In the pre-bake unit (PRE-BAKE) 52, a heating element for pre-baking, for example, a sheathed heater 108, is spaced along a roller conveyance path 106 that constitutes a section of the forward flat flow conveyance path 24 (FIG. 1). Many are placed.

FIG. 3 shows a configuration example of a single divided conveyor F _a (F _b , R _a , R _b ) and a conveyor elevating unit 84a (84b, 86a, 86b). As shown in the figure, the conveyor main body 80 horizontally spans a plurality of rollers 82 between a pair of left and right roller support / driving units 110 and 112 connected to each other via a beam member 109, and supports each roller 82 with a roller support / It is connected to a roller drive unit (not shown) provided in the box of the drive units 110 and 112. The roller 82 has a plurality of top rollers mounted on a rotary shaft of a round bar at regular intervals.

  Guide portions 114 are integrally formed or coupled to both end portions of each roller support / drive portion 110, 112, and a guide rod 116 extending in a vertical direction is slidably inserted into a through hole formed in each guide portion 114. Has been. Thereby, the conveyor body 80 is guided by the guide rod 116 and can be moved up and down in the vertical direction.

  Further, both roller supporting / driving units 110 and 112 are balls which are screwed with a driving source of the conveyor lifting / lowering unit 84a (84b, 86a, 86b), for example, a feed screw 120 extending in the vertical direction coupled to the rotating shaft of the motor 118. A screw 122 is also attached. By the raising / lowering drive of the ball screw mechanism, the conveyor main body 80 can be moved up and down both in the upward direction and in the downward direction, and can be stopped at an arbitrary height position.

  Next, the operation of the drying / thermal processing unit 32 in this embodiment will be described with reference to FIGS. 4A and 4B. In addition, in order to make illustration easy, the roller conveyance path of each area which comprises the flat flow conveyance path 24 (FIG. 1) is abbreviate | omitted.

  Each unit of the drying / thermal processing unit 32 repeats the same operation with a certain tact (cycle). In this example, the operation for one cycle starting from one stage [1] in FIG. 4A will be described in order by dividing it into several stages [2] to [8].

In the first stage [0], the 0th substrate G ₀ unloaded from the vacuum drying unit VD ₂ on the _second floor and lowered to the first floor is the unloading conveyor (R _a / R _b ) 50. Is fed into the pre-bake unit (PRE-BAKE) 52 in a flat flow. In this case, unloading split conveyor (R _a / R _b) 50, the splitting of the split conveyor R _a and the second half portion of the front half portion conveyor R _b is 1 floor vacuum drying unit VD ₁ of the roller conveying path 96 (1) ( In FIG. 2), the heights are aligned and flattened and aligned and aligned in a line in the transport direction (X direction). On the other hand, the first substrate G ₁ is subjected to a vacuum drying process in the first floor vacuum drying unit VD ₁ , and the second substrate G ₂ is subjected to a vacuum drying process in the second floor vacuum drying unit VD ₂ . Yes. Further, the third substrate G ₃ is being received by the carry-in division conveyor (F _a / F _b ) 46 in a flat flow. The carry-in division conveyor (F _a / F _b ) 46 also has a roller conveyance path 96 (1) of the first-stage division conveyor F _a and the latter-half division conveyor F _b of the vacuum drying unit VD ₁ on the first floor (see FIG. The flow is flattened with the same height in 2) and aligned (combined) in a line in the transport direction (X direction).

Thereafter, in the next step [2], in the first floor of the vacuum drying unit VD _1, 1 th substrate G ₁ is unloading split conveyor (R _a / R _b) having undergone the treatment carried out with flat flowed 50 over At the same time, the third substrate G ₃ before processing is carried in by a flat flow from the carry-in division conveyor (F _a / F _b ) 46. At this time, the second floor of the vacuum within the drying unit VD _2, vacuum drying process for the second substrate G ₂ is still performed. Although not shown, the 0th substrate G ₀ is subjected to thermal treatment while moving in a flat flow in the pre-bake unit (PRE-BAKE) 52 or the cooling unit (COL) 54.

In the next stage [3], loading of the _third substrate G ₃ to the first floor vacuum drying unit VD ₁ is completed, while the first substrate G ₁ is transported to the dividing conveyor (R _a / R _b ). 50 is fed into the pre-bake unit (PRE-BAKE) 52 in a flat flow. In this case, the fourth substrate G ₄ is coming in front of the carrying-split conveyor _{(F a / F b) 46} . The second floor of the vacuum drying unit VD _2, 2-th substrate G ₂ is still staying.

It should be noted that the speed of the substrate G sent from the resist coating unit (CT) 44 to the carry-in division conveyor (F _a / F _b ) 46 (upstream plain flow speed) and the carry-out division conveyor (R _a / R _b ) The speed of the substrate G sent from 50 to the pre-bake unit (PRE-BAKE) 52 side (downstream plain flow speed) is set independently. In this embodiment, in order to shorten the length size of the pre-bake unit (PRE-BAKE) 52 and the cooling unit (COL) 54, the downstream side flushing speed may be set low.

In a next step [4], the unloading split conveyor _{(R a / R b) 50} , split conveyor R _a of the first half portion, the first substrate G ₁ is becomes empty past, yet the latter half Despite the movement of the substrate G ₁ on the division conveyor R _b, the substrate G ₁ moves up one step ahead in preparation for the second substrate G ₂ being unloaded from the second floor vacuum drying unit VD ₂ . . On the other hand, when the fourth substrate G ₄ completely enters the carry-in division conveyor (F _a / F _b ) 46, the flat flow of the substrate G ₄ is once stopped there.

In the next stage [5], the carry-in conveyor (F _a / F _b ) 46 moves up with the first half of the conveyor F _a and the second half of the conveyor F _b aligned and merged, and the fourth substrate. G ₄ and to the second floor of the vacuum drying unit VD ₂ of substrate loading preoral lifted in a horizontal position. On the other hand, the second floor of the vacuum unloading of the drying unit VD ₂ from after completion of processing the second substrate G ₂ is started, split conveyor R _a of the first half of the unloading split conveyor (R _a / R _b) 50 is a substrate receive the substrate G ₂ in front of the outlet port. At this time, it rises moves from the first floor of the flat flow position immediately after the split conveyor R _b of the rear half also has completed the delivery of the substrate G ₁ on the second floor of a flat flow position. In the first floor vacuum drying unit VD ₁ , the vacuum drying processing for the third substrate G ₃ is started.

Thereafter, in the next stage [6], the unloading of the processed second substrate G ₂ is completed in the vacuum drying unit VD ₂ on the second floor. As shown in the drawing, the carry-out dividing conveyor (R _a / R _b ) 50 receives the substrate G ₂ by aligning and combining the latter half of the dividing conveyor R _b with the first half of the dividing conveyor R _a . On the other hand, the loading of the fourth substrate G _{4 from} the carry-in division conveyor (F _a / F _b ) 46 to the vacuum drying unit VD ₂ on the second floor proceeds, and the division conveyor F _a in the first half sends out the substrate G ₄ . Then, in order to receive the _fifth substrate G ₅ flowing from the resist coating unit (CT) 44 in a flat flow, the second half of the divided conveyor F _b is left at the second floor height position. Move down to the first floor. Vacuum drying process is performed with respect to the first floor of the vacuum drying unit VD ₁ In the third substrate G _3.

In the next stage [7], the unloading conveyor (R _a / R _b ) 50 is loaded from the second floor with the substrate G ₂ placed with the first and second half conveyors R _a and R _b aligned and joined. Move down to the floor. On the other hand, at the carry-in division conveyor (F _{a /} F _b ) 46, the fifth substrate G ₅ enters or is about to enter, and the first half of the division conveyor F _a receives it. Split conveyor F _b of the second half portion, come down to the first floor from the second floor immediately after completed the loading of the substrate G ₄ of the second floor to the vacuum drying unit VD _2.

In the next stage, that is, the last stage [8] of one cycle, in the divided conveyor for loading (F _a / F _b ) 46, the second half divided conveyor F _{b is} adjacent to the first half divided conveyor F _{a on} the first floor. Arrives and aligns and receives the _fifth substrate G ₅ in a flat flow. The unloading division conveyor (R _{a /} R _b ) 50 feeds the second substrate G ₂ unloaded from the second floor decompression drying unit VD ₂ to the pre-bake unit (PRE-BAKE) 52 side in a flat flow. The third substrate G ₃ is still in the first floor reduced pressure drying unit VD ₁ , and the second substrate G ₄ is started in the second floor reduced pressure drying unit VD ₂ .

As described above, in this embodiment, the drying / thermal processing unit 32 is provided with two parallel vacuum drying units (VD ₁ / VD ₂ ) 48 in a two-layered or two-story structure, and the first floor vacuum drying unit VD. ₁ and by operating the second floor of the vacuum drying unit VD ₂ simultaneously or in parallel, when the one tact time and T _c, is possible to shorten the tact time in two parallel up to about T _c / 2 it can.

Further, in this embodiment, the carry-in division conveyor (F _a / F _b ) 46 and the carry-out division conveyor (R _a / R) are arranged next to the upstream side and the downstream side of the parallel vacuum drying unit (VD ₁ / VD ₂ ) 48. _b ) 50 are arranged respectively.

The carry-in division conveyor (F _a / F _b ) 46 is composed of front and rear division conveyors F _a and F _{b that} can be moved up and down independently between the first floor and the second floor. When raising up to the second floor, the state that the divided conveyors F _a and F _b in the first half and the latter half are aligned and combined is maintained throughout, but when the substrate G is received from the upstream resist coating unit (CT) 44 in a flat flow, When the substrate G is carried into either the first floor reduced pressure drying unit VD ₁ or the second floor reduced pressure drying unit VD _{2 in} a flat flow, the first half and second half divided conveyors F _a and F _b are not necessarily aligned in a line. It doesn't keep it all the way, but separates it as needed.

In other words, the first half of the divided conveyor F _a , when the substrate G is carried into the second floor decompression drying unit VD ₂ , the substrate G is sent out and becomes empty as soon as the divided conveyor F _b becomes 2 While leaving the floor alone, it moves down from the second floor to the first floor alone, and receives the next substrate G flowing from the resist coating unit (CT) 44 on the upstream side. Split conveyor F _b of the second half portion, since the loading of the substrate G second floor to the vacuum drying unit VD ₂ is completed, to come down to the first floor from the second floor in time to receipt of the next substrate G It has become. Thus, it is not necessary to temporarily stop the next flow of the substrate G for time adjustment, and even if the cycle or tact time for feeding the substrate G from the coating process unit 30 to the drying / thermal processing unit 32 is considerably shortened. For example, even if it is shortened to near T _c / 2, for example, the carry-in division conveyor (F _a / F _b ) 46 can operate at the tact time.

On the other hand, the carry-out dividing conveyor (R _a / R _b ) 50 is composed of front and rear divided conveyors R _a and R _{b that} can be moved up and down independently between the first and second floors. When lowering from the first floor to the first floor, the state where the divided conveyors R _a and R _{b in the} first half and the second half are aligned and joined is maintained throughout, but either the vacuum drying unit VD ₁ on the first floor or the vacuum drying unit VD ₂ on the second floor When the substrate G that has been subjected to the vacuum drying treatment is carried out in a flat flow, or when the carried-out substrate G is fed into the downstream pre-bake unit (PRE-BAKE) 52 in a flat flow, the first half and the second half are divided. The conveyors F _a and F _b are not necessarily kept aligned in a single row, but are separated as necessary.

That is, when the substrate conveyor G carried out from the first floor reduced pressure drying unit VD ₁ is sent to the pre-bake unit (PRE-BAKE) 52, the first half division conveyor _Ra is sent out and becomes empty. No, while leaving the second half of the divided conveyor _Rb on the first floor alone, the substrate G that is moved up from the first floor to the second floor alone and is carried out in a flat flow from the vacuum drying unit VD ₂ on the second floor. Welcome. Split conveyor R _b of the second half portion, after completing the feed of the substrate G to the pre-baking unit (PRE-BAKE) 52 at the first floor, second floor in time for receipt of the substrate G to be carried out of the vacuum drying unit VD ₂ From the first floor to the second floor. Thus, it is not necessary to extend the second floor vacuum drying unit VD ₂ in residence time of completed but the substrate G of processing, parallel vacuum drying unit, as described above (VD ₁ / VD ₂₎ 48 tact with two parallel Even if the time is shortened to about T _c / 2, the carry-out divided conveyor (R _a / R _b ) 50 can operate at the tact time.

As described above, in this embodiment, the reduced pressure drying unit (VD ₁ / VD ₂ ) 48 provided in the drying / thermal processing section 32, the carry-in division conveyor (F _a / F _b ) 46, and the carry-out division conveyor ( (R _a / R _b ) 50 can be operated with a short tact time, so that the factor that has so far limited the tact time of the flat-flow resist coating and developing system can be relieved or eliminated, thereby improving the throughput. Can be planned. In addition, it is possible to shorten the separation distance between the adjacent substrates on the forward flow and transport path 24, thereby reducing the length size of each processing unit or transport unit in the flow and transport direction (X direction). This shortens the overall system size.
[Second Embodiment]

In the first embodiment described above, the carry-in division conveyor (F _a / F _b ) 46 of the drying / thermal processing unit 32 receives the substrate G sent from the resist coating unit (CT) 44 adjacent to the upstream side. I always received it on the first floor. However, it is possible to always receive it on the second floor instead of the first floor, or alternatively, it can be received alternately on the first and second floors. For example, when two resist coating units (CT) 44 are installed in parallel on two floors, odd-numbered substrates G _{2n + 1} are received from the resist coating unit CT ₁ on the first floor in a flat flow, and even-numbered substrates form of the G _2n receiving the second floor of the resist coating unit CT ₂ from a flat flow can be considered.

  FIG. 5A and FIG. 5B show the operation for one cycle in this case divided into eight stages [1] to [8]. The difference from the above-described first embodiment (FIGS. 4A and 4B) is mainly operations of steps [2] to [4].

That is, in the stage [1], the dividing conveyor for loading (F _a / F _b ) 46 is configured such that the first half and the latter half divided conveyors F _a and F _b are aligned and combined on the first floor, and the first floor resist coating unit. (The third substrate G ₃ sent from ₁ is received in a flat flow. This operation is the same as in the first embodiment.

But then, in the context of carrying the third substrate G ₃ on the first floor of the vacuum drying unit VD _1, i.e. at the stage [2], split conveyor F _a of the first half portion feeds the substrate G ₃ as soon as after while has left the loading of the substrate G ₃ split conveyor F _b of the second half portion, increases moving to the second floor from the first floor to jump ahead.

In the next step [3], split conveyor F _a of the first half portion, welcome second floor of the resist coating unit CT ₂ from coming fourth substrate G _4. Split conveyor F _b of the second half section is also increased moves on the first floor of the vacuum drying unit upstairs from the third soon 1 floor when completing the loading of the substrate G ₃ to VD _1.

Thus, in the next step [4], with split conveyor F _b of the second half portion next after the split conveyor F _a of the first half portion at the second floor is aligned coalesce receive fourth substrate G _4.
[Third Embodiment]

  Although the first and second embodiments described above relate to the drying / thermal processing unit 32 on the outward process line A, the present invention is applied to other flat flow on the outward process line A or the backward process line B. The present invention can also be applied to a processing unit or a conveyance unit.

  For example, the resist coating and developing system (FIG. 1) is provided with an inspection unit (IP) 66 at the final stage on the return path process line B, and the resist pattern on the substrate G is subjected to non-contact line width inspection and film quality / film thickness inspection. However, depending on the type and specification of the substrate G, such an inspection may not be required.

Therefore, as shown in FIG. 6, in the return process line B, the through unit (TR) 130 is arranged in parallel with the inspection unit (IP) 66 in the lateral direction (Y direction), and the cooling unit (COL) 62 is flushed. Among the substrates G that have passed through the step G, the substrate G _j that needs to be inspected is sent to the inspection unit (IP) 66 in a continuous flat flow as it is, and the substrate G _k that does not need to be inspected is laterally branched to the through unit (TR ) 130 may be passed.

In this case, it may be provided between the cooling unit (COL) 62 and the inspection unit (IP) 66 and the through unit (TR) 130, for example, split conveyor sorting the two-piece type M _a, a M _b. These sorting for split conveyor M _a, M _b is independently movable in the vertical direction in the horizontal direction rather than (Y-direction), when allocating the substrate G _k into the through unit (TR) 130, the stage of FIG. 6 [2] moves to the offset direction (Y-direction) while maintaining the state in which the split conveyor M _b of split conveyor M _a and the latter half portion of the front half portion are aligned coalesce as.

When the split conveyor M _a of the first half at the offset position send out the substrate G _k, the original little earlier split conveyor M _b of the second half portion as in the stage of FIG. 6 [3] alone, leaving the offset position It moves to a position and receives the next substrate G _j (G _k ) in a flat flow from the cooling unit (COL) 62. The division conveyor M _{b in the} latter half receives the next substrate G _j (G _k ) as shown in step [4] in FIG. 6 after completing the delivery of the substrate G to the through unit (TR) 130 at the offset position. Return from the offset position to the original position in time.
[Other Embodiments]

  The preferred embodiments of the present invention have been described above. However, the present invention is not limited to the above-described embodiments, and other embodiments or various modifications can be made within the scope of the technical idea.

  For example, in the above-described embodiment, each of the division conveyors (Fa / Fb) 46, (Ra / Rb) 50, and (Ma / Mb) 132 is configured in a two-divided type, but a configuration of three or more divisions is also possible. .

  Further, in any of the divided conveyors (Fa / Fb) 46, (Ra / Rb) 50, and (Ma / Mb) 132, each divided unit is arranged in parallel with the parallel flow processing unit or the conveyance unit. Although it was made to move independently in the offset direction (Z direction or Y direction), a configuration in which each divided unit is independently moved in the flat flow direction (X direction) is also possible.

For example, the flat flow system shown in FIG. 7 includes a first (upstream side) and a second (downstream side) separated from each other through an empty space 140 for carrying the substrate G in a flat flow along the process flow. A plurality of, for example, two divided conveyors N _a and N _b are provided which are provided with flat flow conveying paths 142 and 144 and are divided and arranged in the empty space 140 in the flat flow and conveyance direction (X direction). A flat-flow processing unit or a transport unit (not shown) may be provided along each of the flat-flow transport paths 142 and 144.

The vacant space 140 is longer than the substrate G in the flat flow conveying direction (X direction), and the divided conveyors N _a and N _b are about half the length of the substrate G, and the combined conveyor length when aligned and merged is the substrate. It has substantially the same length as G, and is allowed to move independently in the transport direction (X direction) in the empty space 140. Although not illustrated, the divided conveyor N _a, separate conveyor moving part to N _b (not shown) are coupled.

As shown in FIG. 7, in stage [1], the divided conveyors N _a and N _b are aligned and merged adjacent to the end of the upstream flat flow path 142 to receive the substrate G ₀ in a flat flow. Next, in step [2], the divided conveyors N _a and N _b are flushed in the empty space 140 and moved in the transport direction (X direction) while maintaining the aligned and merged state. In next step [3], split conveyor N _a, N _b arrives at the starting end next to the conveying path 144 to flow downstream flat passes the substrate G ₀ flat flow. Then, when the divided conveyor N _a in the first half sends out the substrate G ₀ and becomes empty, the delivery of the substrate G ₀ is entrusted to the divided conveyor N _b in the latter half as shown in Step [4], and the paired conveyor N a alone stands alone. Then, the flow moves to the upstream flat conveying path 142 to pick up the next substrate G1. When the second half of the divided conveyor _Nb also completes the delivery of the substrate G ₀ , it moves to the upstream flat-feed conveyance path 142 following the rear as in step [5], and the next substrate G1 Make it in time for receipt.

  Further, in the above-described embodiment, all the processing units arranged on the forward process line A and the return process line B are unified in a flat flow system, so that there is an advantage that the processing efficiency and the conveyance efficiency can be improved. However, a configuration including a non-flat flow processing unit is also possible. For example, as a resist coating unit (CT) 44 disposed on the outward process line A, instead of a floating type in which a resist nozzle is fixed and the substrate is floated and conveyed to perform resist coating processing, the substrate is fixed on a stage. It is also possible to use a method (stage fixed type) in which the resist nozzle is moved by scanning.

In the third embodiment described above (FIG. 6), for distribution of the two-division model split conveyor M _a, flat flow processing unit on the upstream side of the _{M b (COL) 60, (} POST-BAKE) 62 is arranged in a row The downstream flow processing unit (IP) 66 and the horizontal flow transport unit (TR) 130 are arranged in two rows on the downstream side. However, on the contrary, split conveyor M _a, M _b upstream flat flow scheme processing unit or transport unit in the second column is provided for, the layout of the row of flat flow scheme processing unit or the transport unit on the downstream side is provided Is possible.

Further, in the drying / thermal processing section 32, not only the reduced pressure drying unit (VD1 / VD2) 48 but also the pre-bake unit (PRE-BAKE) 52 and the cooling unit (COL) 54 can be arranged in a two-story parallel arrangement. In this case, only the carry-in division conveyor (F _a / F _b ) can be used, and the carry-out division conveyor (R _a / R _b ) can be omitted.

  The substrate to be processed in the present invention is not limited to a glass substrate for LCD, and other flat panel display substrates, semiconductor wafers, CD substrates, photomasks, printed substrates and the like are also possible.

It is a top view which shows the layout structure of the resist application | coating development system in one Embodiment of this invention. FIG. 2 is a longitudinal sectional view schematically showing a configuration of a main part of the resist coating and developing processing system of FIG. 1, particularly a main part of a drying / thermal processing unit incorporated in an outward process line. It is a perspective view which shows the example of 1 structure of the division conveyor in embodiment. It is a figure which shows typically each step | level of operation | movement of the drying / thermal processing part in 1st Embodiment. It is a figure which shows typically each step | level of operation | movement of the drying / thermal processing part in 1st Embodiment. It is a figure which shows typically each step | level of operation | movement of the drying / thermal processing part in 2nd Embodiment. It is a figure which shows typically each step | level of operation | movement of the drying / thermal processing part in 2nd Embodiment. It is a figure which shows typically each step | level of the board | substrate distribution operation | movement using the division | segmentation conveyor in 3rd Embodiment. It is a figure which shows typically each step | level of the board | substrate transfer operation | movement between the flat flow conveyance paths using the division conveyor in another embodiment.

Explanation of symbols

10 resist coating and developing system 14 cassette station (C / S)
16 Process station (P / S)
18 Interface station (I / F)
24 Outgoing flat flow 28 Cleaning process section 30 Coating process section 44 Resist coating unit (CT)
46 Two-part dividing conveyor for loading (F _a / F _b )
48 Two-stage stacked parallel vacuum drying unit (VD ₁ / VD ₂ )
50 Two-part dividing conveyor for loading (R _a / R _b )
56 Return-flow flat flow 80 Conveyor body 82 Rollers 84a, 84b, 86a, 86b Conveyor lifting part

Claims (17)

A flat flow path for conveying the substrate to be processed in a flat flow along the process flow;
A plurality of parallel processing units arranged in an offset direction substantially orthogonal to the flat flow conveyance path on the downstream side of the flat flow conveyance path in the process flow; and
A plurality of division conveyors arranged and divided in the direction of the flat flow between the end of the flat flow and the inlet of the parallel processing unit;
The plurality of division conveyors receive the substrates from the flat flow conveyance path in a flat flow, and the received substrates are distributed to the parallel processing units and loaded in the flat flow so as to be independent in the offset direction. A processing system having a division conveyor moving unit to be moved.   Each of the division conveyors receives a substrate from each of the parallel flow conveyance paths, and receives the substrate from each of the parallel flow conveyance paths, and each parallel processing unit arranged offset from the flat flow conveyance path in the offset direction. The processing system of Claim 1 provided so that a movement between the offset carrying-in positions for carrying in by a flat flow is possible. One of the parallel processing units is arranged in line with the flat flow path,
When carrying the substrate into the parallel processing unit, under the condition that the plurality of divided conveyors are all aligned on the straight line and aligned and joined, the flat flow conveyance for receiving the substrate from the flat flow conveyance path, The flat flow for carrying the substrate into the parallel processing unit is continuously performed.
The processing system according to claim 1 or 2.   The divided conveyors have a single conveyor length that is shorter than the substrate in the flattening conveyance direction, and the combined conveyor length when aligned and combined in one row is substantially the same as or longer than the substrate. 4. The processing system according to any one of 3.   When the substrate is loaded and transferred from the receiving position to the offset carry-in position, the dividing conveyor is moved flat at the same time in a single line in the carrying direction and kept in a single row, and is moved from the offset carry-in position to the receiving position in an empty state. The processing system according to any one of claims 1 to 4, wherein when returning, the substrate is moved individually in the order in which the substrates are sent from the upstream side in the flat transport direction to the downstream side.   Each of the parallel processing units is configured to flow an unprocessed substrate from the divided conveyor into the unit in a flat flow, and flow the processed substrate in the unit to the downstream side of the process flow in a flat flow. The processing system as described in any one of Claims 1-5 provided with these.   The processing system according to any one of claims 1 to 6, wherein at least one flat-flow processing unit is provided along the flat-flow conveying path. A first flat flow path for conveying the substrate to be processed in a flat flow along the process flow;
In the process flow, the second and third flat flow conveying paths arranged on the downstream side of the flat flow conveying path in an offset direction substantially orthogonal to the first flat flow conveying path, or arranged side by side;
A plurality of division conveyors arranged in a flat flow and conveying direction between the end of the first flat flow and the start ends of the second and third flat flow; and
The plurality of division conveyors receive the substrate from the first flat flow conveyance path in a flat flow, distribute the received substrate to either the second or third flat flow conveyance path, and deliver it by the flat flow. And a dividing conveyor moving section that moves each independently in the offset direction. A flat flow path for conveying the substrate to be processed in a flat flow along the process flow;
A plurality of parallel processing units arranged in an offset direction substantially orthogonal to the flat flow conveyance path on the upstream side of the flat flow conveyance path in the process flow; and
A plurality of divided conveyors arranged in a flat flow and conveying direction between an outlet of the parallel processing unit and a start end of the flat flow conveyance path;
The plurality of divided conveyors are each independent in the offset direction so that the substrate is unloaded in a flat flow from any one of the parallel processing units, and the unloaded substrate is transferred to the flat flow and the flow path in a flat flow. A processing system having a division conveyor moving unit to be moved.   Each of the divided conveyors has an offset carry-out position for carrying out the substrate in a flat flow from each of the parallel processing units arranged offset in the offset direction from the flat flow conveyance path, and the flat flow conveyance path. The processing system according to claim 9, wherein the processing system is provided so as to be movable between a transfer position for transferring the substrate in a flat flow. One of the parallel processing units is arranged in line with the flat flow path,
When unloading the substrate from the parallel processing unit, under the condition that the plurality of divided conveyors are all aligned and aligned on the straight line, the flat flow transport for unloading the substrate from the parallel processing unit, The flat flow conveyance for handing over the substrate to the flat flow conveyance path is continuously performed.
The processing system according to claim 9 or 10.   Each of the divided conveyors has a single conveyor length that is shorter than the substrate in the flat flow direction, and the combined conveyor length when aligned and combined in one row is substantially the same as or longer than the substrate. The processing system according to any one of 11.   When the substrate is loaded and transferred from the offset carry-out position to the delivery position, the divided conveyors are moved in parallel while maintaining a state where they are aligned and united in a single line in the carrying direction and from the delivery position to the offset carry-out position in an empty state. When returning, the processing system according to any one of claims 9 to 12, wherein the substrate is individually moved in the order in which the substrates are sent from the upstream side in the flat transport direction to the downstream side.   Each of the parallel processing units carries an unprocessed substrate from the upstream side of the process flow into the unit in a flat flow, and transfers the processed substrate in the unit to the division conveyor in a flat flow. The processing system according to claim 9, comprising:   The processing system according to claim 9, wherein at least one flat-flow processing unit is provided along the flat-flow conveyance path. A first flat flow path for conveying the substrate to be processed in a flat flow along the process flow;
In the process flow, the second and third flat flow conveying paths are laid on the upstream side of the first flat flow conveying path in an offset direction substantially orthogonal to the first flat flow conveying path or arranged side by side. When,
A plurality of divided conveyors arranged in a flat flow and conveying direction between the end of the second and third flat flow and the first end of the first flat flow; and
The plurality of division conveyors receive the substrate from one of the second or third flat flow transport paths in a flat flow and deliver the received substrate to the first flat flow transport path. And a dividing conveyor moving section that moves each independently in the offset direction. First and second flat flow conveying paths separated from each other through an empty space for conveying the substrate to be processed in a flat flow along the process flow;
A plurality of divided conveyors arranged in the empty space and divided in the conveying direction;
The plurality of divided conveyors are independently moved in the flat flow conveying direction so as to receive the substrate from the first flat flow conveyance path in a flat flow and deliver the received substrate to the second flat flow conveyance path. A processing system having a division conveyor moving unit.

Images