TWI388031B - Processing system - Google Patents

Description

Processing system

The present invention relates to a processing system for transporting a transport path of a substrate to be processed in a substantially horizontal direction in a series of processing processes in the order of process flow.

Conventionally, a resist coating development processing system manufactured by an FPD (flat panel display) is provided with a translation processing unit for transporting a roller or a roller in a horizontal direction in order to increase the size of the substrate to be processed. The substrate is transported horizontally on the translational transport path, and a predetermined liquid, gas, light, or the like is supplied to the processed surface of the substrate, and the desired processing is performed, and the processes in the order of the process flow are arranged in series along a route in the horizontal direction. The system configuration or layout standardization of a plurality of processing units of the processing unit including such a translation mode (see, for example, Patent Document 1).

As described in Patent Document 1, such a layout is such that a horizontally long process station is disposed in the center of the system, and a cassette station and a mesa station are disposed at both ends in the longitudinal direction. The cassette station carries out the loading and unloading of the substrate of the unprocessed or processed substrate between the platform in the station and the outside of the system, and the substrate is carried in and out between the cassette on the platform and the processing station. The interface station performs the transfer of the substrate between the adjacent exposure device and the processing station.

The process station is a two-row process route with a card-station station as the starting point, an end point, and a gateway station as a turning point. Generally, the process route in the forward path is a unit of the cleaning processing system, a unit of the resist coating processing system, a unit of the thermal processing system, or the like, or is arranged in a row in a unit sandwiching the transport system. The process route of the re-route is a unit of the development processing system, a unit of the thermal processing system, a unit of the inspection system, or the like, or is arranged in a row with the unit of the transport system interposed therebetween.

[Patent Document 1] JP-A-2007-200993

As described above, the tandem type processing system in which a plurality of processing units including the processing unit of the translation mode are arranged in series along the process route of the linear reciprocating path is in accordance with the enlargement of the FPD substrate. The side dimension (full length dimension) will continue to increase, which is a disadvantage in the face of the FPD manufacturing plant.

Further, the processing speed of the exposure apparatus is increased, and in each of the processing units for the resist coating and development processing, the processing time (Tact Time) is shortened. Among them, in the case where the vacuum drying process is interposed between the resist coating process and the prebaking process, since the vacuum drying process takes a relatively long time, it is most difficult to shorten the station time of the vacuum drying unit.

In particular, when a halftone exposure process is used for photolithography, the film thickness of the resistive mask is about 1.5 to 2 times (about 2.0 to 3.Oμm) which is usually (about 1.5 μm), and the portion is resistive. Since the amount of solvent used per substrate in the coating treatment is increased, the time required for evaporation of the solvent in the vacuum drying unit is prolonged, and it is more difficult to shorten the station time.

The present invention has been made in view of the problems of the prior art as described above, and an object of the present invention is to provide a tandem type system in which a plurality of processing units are arranged in the order of a process flow in a process route of a reciprocating path extending along a straight line. A processing system that efficiently shortens the overall length and shortens the station time.

In order to achieve the above object, a processing system according to a first aspect of the present invention is a series processing system in which a plurality of processing units are connected in the order of a process flow, and a series of processing is performed on a substrate to be processed. a process route that includes, in a first direction in the longitudinal direction of the system, a processing unit that is adjacent to the first group, or a row that is arranged in a row via a transport unit, and a first forward translation transport unit that translates the substrate, and Translating the second forward translation transfer unit of the transport substrate to the downstream side of the process flow of the first forward translation transfer unit; the second process route is in a second direction opposite to the first direction in the longitudinal direction of the system a processing unit located in the second group on the downstream side of the process flow of the first process route, or arranged in a row via the transport system unit, and vacating a predetermined size in the system width direction and the first process route The atrium space extends in parallel; the processing unit of the third group is disposed in the atrium space; and the first conveying device is disposed in the atrium space, from the first to the first The substrate transfer unit on the terminal side of the road translation transport unit carries out the respective substrates, and transports them to one of the processing units of the third group, and the substrates that have been processed by one of the processing units of the third group are carried out from the processing unit. The substrate is transferred to the substrate delivery portion on the start side of the second forward translation transfer unit.

Further, the processing system according to the second aspect of the present invention is a series processing system in which a plurality of processing units are connected in the order of a process flow, and a series of processing is performed on the substrate to be processed, and the first processing route is characterized in that: The first processing unit is adjacent to each other in the longitudinal direction of the system, or is arranged in a row via the transport unit, and the second process route is in the longitudinal direction of the system. The second direction opposite to the first direction includes: adjacent to the processing unit of the second group on the downstream side of the process flow of the first process route, or arranged in a row via the transport system unit, and translating the substrate a re-transporting and transporting unit and a second re-transporting and transporting unit that translates and transports the substrate on a downstream side of the process flow of the first re-transporting unit, and a predetermined size of the atrium space in the system width direction and the first process path Parallelly extending; the processing unit of the third group is disposed in the atrium space; and the first conveying device is disposed in the atrium space, and is translating and conveying the first complex road The substrate-side delivery unit on the terminal side carries out the respective substrates, and transports them to one of the processing units of the third group, and the substrates that have been processed in one of the processing units of the third group are carried out from the processing unit, and are carried in the aforementioned The substrate transfer portion on the start side of the second bypass translation transfer unit.

In the processing system of the present invention, the occupied space or the running space of the processing unit of the third group and the first conveying device are all absorbed in the atrium space, and are not included in the two process routes, so the system width size is not increased. It can greatly shorten the overall length of the system.

In a preferred aspect of the present invention, the processing unit of the third group includes first and second processing units having substantially the same content and time of processing on the substrate. Further, the first and second processing units are alternately arranged on the continuously fed substrates via the first forward translation transfer unit. According to this configuration, the first and second processing units can be operated in parallel by shifting the time, and the station time can be greatly shortened.

In this case, the first transport device has a transport robot that can be moved in the transport area provided in the atrium space, and the first and second processing units are preferably disposed in the longitudinal direction of the system with the transport region interposed therebetween. Atrium space.

In a preferred embodiment, the first and second processing units are disposed adjacent to the transport area. Further, the transport robot directly carries the first and second processing units into and out of the substrate.

In a preferred embodiment, in the atrium space, a first atrium translation transfer unit that is continuous outside the first processing unit and that is continuous in the middle of the first processing unit is provided. Further, the transport robot carries the first processing unit into and out of the substrate via the first atrium translation transport unit.

In a preferred embodiment, the first atrium translation transport unit includes a first atrium substrate loading path that is disposed adjacent to the transport area, and a first intra-unit transport path that is coupled to the first processing unit and can be coupled to the first The first abutment substrate transport path is connected to the first abutment substrate transport path, and the first processing unit is connected to the first unit inner transport path on the side opposite to the first atrium substrate transport path, and is passed through the first processing unit. It extends up or down to the end position adjacent to the transport area.

When the substrate is loaded into the first processing unit, the substrate is transported on the first atrium substrate carrying path and the first unit inner conveying path.

When the substrate is carried out from the first processing unit, the substrate is transported on the first unit inner transfer path and the first atrium substrate carry-out path.

In a preferred embodiment, the first atrium translation transport unit includes a first atrium substrate carrying path and a first atrium substrate carrying-out path that are vertically movable up and down in parallel with the transport area, and is provided in the first process. In the unit, the first intra-unit transfer path and the first intra-substrate transfer path of the first atrium substrate and the first abutment substrate transfer path are selectively connected.

When the first processing unit is loaded into the substrate, the height of the first atrium substrate carrying path is aligned with the first unit inner conveying path, and the substrate is transported on the first atrium substrate carrying path and the first unit inner conveying path. The first direction in the direction of the long side of the system.

When the substrate is carried out from the first processing unit, the height of the first atrium substrate transport path is aligned with the first intra-cell transport path, and the substrate transport is performed on the first intra-cell transport path and the first atrium substrate transport path. The second direction in the direction of the long side of the system.

In a preferred embodiment, in the atrium space, a second atrium translation transfer unit that is continuous outside the second processing unit and in the middle of the second processing unit is provided in the atrium space, and the transfer robot is paired. 2 The processing unit carries in and out of the substrate via the second atrium translation transfer unit.

In a preferred embodiment, the second atrium translation transport unit includes a second atrium substrate transport path that is disposed adjacent to the transport area, and the second unit inner transport path is provided in the second processing unit, and is second The second abutment substrate transport path is connected to the second abutment substrate transport path, and the second processing unit is connected to the second intra-cell transport path on the side opposite to the second atrium substrate transport path, and the second processing unit is connected to the second processing unit. It extends up or down to the end position adjacent to the transport area.

Further, when the second processing unit is loaded into the substrate, the substrate is transported on the second atrium substrate carrying path and the second unit inner conveying path.

In addition, when the substrate is carried out from the second processing unit, the substrate is transported on the second unit inner transfer path and the second atrium substrate carry-out path.

In another preferred embodiment, the second atrium translation transport unit has a second atrium substrate carrying path and a second atrium substrate carrying-out path that are vertically movable up and down in two stages, and is provided in the second In the processing unit, the second intra-substrate substrate transport path and the second intra-substrate substrate transport path are selectively connected to any of the second intra-cell transport paths.

When the second processing unit is loaded into the substrate, the height of the second atrium substrate carrying path is aligned with the second intra-cell transfer path, and the substrate is transported on the second atrium substrate transfer path and the second intra-cell transfer path. The second direction in the direction of the long side of the system.

When the substrate is carried out from the second processing unit, the height of the second atrium substrate transport path is aligned with the second intra-cell transport path, and the substrate transport is performed on the second intra-cell transport path and the second atrium substrate transport path. The first direction in the direction of the long side of the system.

According to a preferred embodiment, the third process is disposed between the substrate delivery portion on the terminal side of the first forward translation transfer unit and the substrate delivery portion on the start side of the second forward translation transfer unit in the first process route. unit. Further, the first transport device carries out the substrate in and out of the third processing unit.

In a preferred embodiment, the third processing unit is a resist coating unit that applies a resist liquid on the substrate, and the first and second processing units respectively dry the resist coating film on the substrate under reduced pressure. In the first and second reduced-pressure drying units, the substrate transfer ports of the first and second reduced-pressure drying units are substantially equidistant positions to the substrate transfer port of the resist application unit.

In this configuration, even if the first and second decompression drying units are operated in parallel, all of the substrates are subjected to a vacuum drying treatment after the resist coating treatment with a predetermined delay time, so that the resist can be coated. The film quality (stability and reproducibility) of the film is improved.

According to another preferred embodiment, in the first process route, a resist coating unit for applying a resist liquid on the substrate is provided on the transport path of the first forward transfer unit, first and second. The processing unit is a first and second decompression drying unit that respectively dries the resist coating film on the substrate under reduced pressure, and the first and the third substrate transfer unit on the terminal side of the first forward translation transfer unit 2 The substrate transfer inlet of the vacuum drying unit is at a substantially equidistant position.

In this configuration, even if the first and second decompression drying units are operated in parallel, all of the substrates are subjected to a reduced-pressure drying treatment after the resist coating treatment with a predetermined delay time, so that the resist can be coated. The film quality (stability and reproducibility) of the film is improved.

In a preferred embodiment, the second conveying device is attached to the one end portion of the longitudinal direction of the system, and the unprocessed substrate is taken out from any of the cassettes of the system to be delivered to the first process route, and the second process is performed. All of the completed substrates in the route receiving system are processed and stored in any cassette that should be ejected from the system.

In another preferred embodiment, the third transport device is attached to the other end portion of the system in the longitudinal direction, and the substrate is carried out from the first process route, and the second process route is directly carried in, or the external processing device is passed. Then move into the second process route.

According to the processing system of the present invention, it is possible to efficiently arrange the tandem type system in which a plurality of processing units are arranged in the order of the process flow in the process route of the reciprocating path extending along a straight line by the above-described configuration and action. The shortening of the full-length size and the shortening of the station time are achieved.

Hereinafter, preferred embodiments of the present invention will be described with reference to the accompanying drawings.

(First embodiment)

Fig. 1 is a view showing a layout configuration of a coating development processing system 10 according to a first embodiment of the present invention. The coating development processing system 10 is disposed in a clean room, for example, using a glass substrate as a substrate to be processed, and performing cleaning, resist coating, prebaking, and display in a photolithography lithography process in an LCD manufacturing process. A series of processors like and after baking. The exposure processing is performed by the external exposure device 12 disposed adjacent to the system.

In the coating development processing system 10, a horizontally long process station (P/S) 16 is disposed at a central portion, and a card station (C/S) 14 and an interface station are disposed at both ends in the longitudinal direction (X direction). I/F) 18.

The cassette station (C/S) 14 is a cassette loading and unloading port of the system 10, and includes a cassette platform 20 which is capable of stacking a plurality of sheets of the substrate G and accommodating a plurality of cassettes C in a horizontal direction (Y direction). The arrangement is carried out to four; and the transfer device 22 performs the entry and exit of the substrate G on the cassette C on the stage 20.

The transport device 22 is constituted by a transport robot having a transport arm 22a that can hold the substrate G in a single unit, and can be operated by four axes of X, Y, Z, and θ, and can be adjacent to a processing station (P/S). The intersection of the 16 side and the substrate G.

The process station (P/S) 16 is a pair of process routes A and B which are parallel and reversed in the longitudinal direction (X direction) of the system extending horizontally, and the plurality of processing units are arranged substantially in the order of process flow or engineering. .

More specifically, in the process route A from the side of the card station (C/S) 14 to the interface station (I/F) 18 side, the loading unit (IN-PASS) 24 and the excimer UV irradiation are arranged in a row. Unit (E-UV) 26, Scrubber unit (SCR) 28, adhesion unit (AD) 30, cooling unit (COL) 32, carry-out unit (OUT-PASS) 34, resist coating The unit (CT) 36, the carry-in unit (IN-PASS) 38, the pre-baking unit (PRE-BAKE) 40, the cooling unit (COL) 42, the carry-out unit (OUT-PASS) 44, and the like are used as the units of the first group.

Here, the excimer UV irradiation unit (E-UV) 26, the brush cleaning unit (SCR) 28, the attachment unit (AD) 30, and the cooling unit (COL) 32 are all processing units configured in a translational manner, from the loading unit The (IN-PASS) 24 to the carry-out unit (OUT-PASS) 34 is provided with a first forward translation transport unit 46 including, for example, a roller transport path extending through the processing units 26 to 32.

Further, both the pre-baking unit (PRE-BAKE) 40 and the cooling unit (COL) 42 are processing units configured to be in a translational manner, and are vertically disposed from the loading unit (IN-PASS) 38 to the unloading unit (OUT-PASS) 44. The second forward translation transport unit 48, which is formed by the roller transport path, extends through the processing units 40 and 42.

The resist coating unit (CT) 36 is not a translating processing unit. As shown in FIG. 2 described later, the fixed substrate G is placed on the stage 76, and the resist nozzle 78 is moved or scanned in the horizontal direction above the substrate. A resist coating film is formed on G.

On the other hand, in the process route B of the re-route from the interface station (I/F) 18 side to the cassette station (C/S) 14 side, the carry-in unit (not shown) and the developing unit are arranged in a row ( DEV) 52, post-baking unit (POST-BAKE) 54, cooling unit (COL) 56, inspection unit (AP) 57, and carry-out unit (OUT-PASS) 58 are used as units of the second group. Here, the loading unit (not shown) is provided under the peripheral device (TITLER/EE) 50, that is, in the same layer as the developing unit (DEV) 52.

The developing unit (DEV) 52, the post-baking unit (POST-BAKE) 54, the cooling unit (COL) 56, and the inspection unit (AP) 57 are all processing units configured in a translational manner. A reversing translation transport unit 60 including, for example, a roller transport path extending through the processing units 52 to 58 is disposed from the loading unit (not shown) to the unloading unit (OUT-PASS) 58.

The interface station (I/F) 18 is a transfer device 62 having a process route A, B for performing the above-described forward and backward paths, or an adjacent exposure device 12 and a substrate G, and a peripheral device is disposed beside the transfer device 62 ( TITLER/EE) 50 and rotating platform (R/S) 64. The peripheral device 50 includes a peripheral exposure device (EE) and a coder (TITLER). The rotating platform (R/S) 64 is a platform for rotating the substrate G in a horizontal plane for converting the direction of the rectangular substrate G when it is transferred to the exposure device 12.

In the coating development processing system 10, the process route A and the interface station (I/F) 18 formed by the cassette station (C/S) 14 and the forward path, and the process route B of the re-route are formed to extend straightly to the X. Direction of the atrium space NS. In the atrium space NS, the two decompression drying units 66L and 66R, which are the units of the third group, are disposed at predetermined positions toward each other, and one of the two units 66L and 66R is disposed. Device 68.

Fig. 2 shows a detailed configuration of the decompression drying units 66L, 66R, the conveying device 68, and the processing unit therearound.

The first decompression drying unit 66L is disposed on the upstream side of the process route A than the unloading unit (OUT-PASS) 34 of the first forward translation conveying unit 46, and is disposed beside the cooling unit (COL) 32. The second decompression drying unit 66R is disposed on the downstream side of the process route A than the loading unit (IN-PASS) 38 of the second forward translation conveying unit 48, and is disposed beside the pre-baking unit (PRE-BAKE) 40.

A transfer area TE is provided between the two decompression drying units 66L, 66R. The transport device 68 is constituted by a transport robot having a transport arm 68a that can hold the substrate G in a single unit, and can be operated by four axes of X, Y, Z, and θ, and moved in the transport area TE to carry in the substrate. The port or the outlet faces all the units of the transfer area TE, that is, the two decompression drying units 66L and 66R, the carry-out unit (OUT-PASS) 34 of the first forward transfer unit 46, and the resist coating unit (CT) 36 and The loading unit (IN-PASS) 38 of the second forward translation transport unit 48 enters and exits, and the units can be transferred to the substrate G.

Each of the decompression drying units 66L, 66R can divide the chambers for decompression into two parts, and the upper chamber that can be moved up and down from the upper tray 70 or the bottom container type lower chamber 70 (Fig. 2) Not shown in the figure, the upper side is lifted, and the substrate G can be carried in and out.

As shown in Fig. 2, the lower chamber 70 has a substantially square shape, and a platform 72 for supporting the substrate G to be horizontally placed is disposed at the center portion, and an exhaust port 74 is provided at four corners of the bottom surface. Each of the exhaust ports 74 is connected to a vacuum pump (not shown) via an exhaust pipe (not shown). The sealed processing space in the two chambers can be depressurized to a predetermined vacuum pressure by the vacuum pump in a state where the lower chamber 70 is covered with the upper chamber. Further, each of the decompression drying units 66L, 66R is also provided with a loading/unloading mechanism (not shown) for transferring the transfer arm 68a of the transport device 68 to the substrate G on the stage 72.

As shown in FIG. 2, the resist coating unit (CT) 36 is a stage 76 having a horizontally placed substrate G held thereon, and an upper surface (processed surface) of the substrate G placed on the stage 76. The coating treatment portion 80 that applies the resist liquid by the non-rotation method using the long resist nozzle 78 and the resist liquid discharge function that restores the resist nozzle 78 for the next preparation period without performing the coating process The nozzle update unit 82 and the like.

The resist nozzle 78 is an elongated nozzle having a slit-like nozzle opening that covers the substrate G on the stage 76 from one end to the other in the X direction, and is connected to a resist liquid supply source (not shown). The coating processing unit 80 is a nozzle moving mechanism 84 that causes the resist nozzle 78 to horizontally move in the Y direction on the stage 76 during the coating process. The nozzle moving mechanism 84 has a horizontal support resist nozzle 78 A support body 86 having a shape or a gate shape, and a linear drive unit 88 that linearly moves the support body 86 in the Y direction in both directions. The resist nozzle 78 is horizontally moved (scanned) in the Y direction from the one end of the substrate G to the other end while the resist liquid is discharged in a strip shape, so that the upper surface (processed surface) of the substrate G is like A coating film of a resist liquid is formed in a film thickness as expected by laying a carpet. Further, the longitudinal direction of the resist nozzle 78 may be set to the Y direction, and the coating scanning direction may be set to the X direction.

In the resist coating unit (CT) 36, the substrate G can be carried in and out from the transfer region TE side of the atrium space NS. The platform 76 is also provided with a lift pin 90 for lifting and lowering loading/unloading of the substrate G, and the like.

The two decompression drying units 66L and 66R are symmetrical and equidistant positions from the substrate carrying-out port of the resist coating unit (CT) 36. Thereby, the substrate G for completing the resist coating treatment in the resist coating unit (CT) 36 can be subjected to the vacuum drying treatment of the second process, and transferred to the first decompression drying unit 66L by the transfer device 68. The transport delay time at the time can be made equal to the transport delay time when the transport device 68 transfers to the second decompression drying unit 66R.

In FIG. 2, the first forward transfer conveyance unit 46 is formed by arranging rod-shaped rollers 92 at regular intervals in the conveyance direction (X direction) to form a roller conveyance path, and is driven by a roller constituted by a motor, a transmission mechanism, or the like. The unit (not shown) rotationally drives the rollers 92 to configure the substrate G to be transported on the roller transport path. A cooling mechanism (not shown) is provided in the cooling unit (COL) 32, which is cooled to a predetermined temperature by heat exchange of the substrate G that passes under the roller conveyance or by blowing cold air. The carry-out unit (OUT-PASS) 34 is a configuration in which the substrate G formed by the translational transport of the roller transport path of the first forward translation transport unit 46 is stopped or stopped, and the transport arm 68a of the transport device 68 receives the substrate G. Composition. Further, in the first forward translation and conveyance unit 46, the roller conveyance path can be divided into a plurality of sections, and an independent roller drive section is provided in each section.

In the same manner, the second forward translation transport unit 48 also forms a roller-shaped roller 94 at a predetermined interval in the transport direction (X direction) to form a roller transport path, and has a roller drive unit including a motor and a transmission mechanism (not shown). Each of the rollers 94 is rotationally driven to form a substrate G that can be transported on the roller transport path. A heater mechanism (not shown) is provided in the pre-baking unit (PRE-BAKE) 40, which is heated to a predetermined temperature by heat exchange of the substrate G that passes under the roller conveyance or by blowing hot air. The carry-in unit (IN-PASS) 38 is configured to receive the substrate G by the transfer arm 68a of the transport device 68, and to start the translation transfer (roller transport) immediately after receiving the substrate G. In the second forward translation transport unit 48, the roller transport path can be divided into a plurality of sections, and an independent roller drive unit is provided in each section.

Here, the processing procedure of the entire development of the one substrate G by the coating development processing system will be described.

First, in the cassette station (C/S) 14, the transport device 22 takes out one of the substrates G from any of the cassettes C on the stage 20, and carries the taken-out substrate G into the process station (P/S) 16 The loading unit (IN-PASS) 24 on the side of the process route A. In the carry-in unit (IN-PASS) 24, the substrate G is the first forward translation transfer unit 46 that is put into the process route A.

The substrate G to be loaded into the first forward transfer unit 46 is initially subjected to ultraviolet cleaning by the excimer UV irradiation unit (E-UV) 26 and the brush cleaning unit (SCR) 28 in the cleaning process unit. And brush cleaning treatment. The brush cleaning unit (SCR) 28 removes particulate contamination from the surface of the substrate by performing brush cleaning or air blowing on the substrate G that is horizontally moved on the roller transport path of the first forward translation transport unit 46. Then, the washing treatment is carried out, and finally the substrate G is dried by an air knife or the like. When the washing process of one of the brush cleaning units (SCR) 28 is completed, the substrate G is lowered by the roller transport path of the first forward translation transfer unit 46 and passes through the heat processing unit (30, 32).

In the heat treatment unit (30, 32), the substrate G is first subjected to an adhesion treatment using a vaporous HMDS in the adhesion unit (AD) 30 to hydrophobize the surface to be treated. After the adhesion process is finished, the substrate G is cooled to a predetermined substrate temperature at the cooling unit (COL) 32. Then, the substrate G enters the carry-out unit (OUT-PASS) 34 and stops there.

After that, the transport device 68 enters the carry-out unit (OUT-PASS) 34 from the transport area TE of the atrium space NS, and carries out the substrate G from the first forward transfer unit 46. Next, the transfer device 68 moves into the transfer area TE, and the substrate G is carried into the resist coating unit (CT) 36 on the side.

In the resist coating unit (CT) 36, the substrate G is placed on the stage 76, and the upper surface of the substrate G is processed by a non-rotation method in which the slit nozzle 78 is horizontally moved (scanned). ) Apply a resist solution.

Once the resist coating process is completed in the resist coating unit (CT) 36, the transfer device 68 advances from the transfer area TE of the atrium space NS into the resist coating unit (CT) 36, and the substrate G is carried out from the stage 76. . Next, the conveyance device 68 moves in the conveyance area TE, and carries the substrate G to one of the two decompression drying units (VD) 66L, 66R, for example, the first decompression drying unit (VD) 66L.

In the first decompression drying unit (VD) 66L, after the substrate G is placed horizontally on the stage 72, the chamber is closed (the upper chamber is brought into close contact with the lower chamber 70), and the vacuum pump is activated to start vacuum evacuation. The chamber is decompressed and dried. The vacuum drying treatment is to evaporate an organic solvent (for example, a diluent) from a resist liquid film on the substrate G in a chamber under reduced pressure, and the organic solvent vapor is discharged from the chamber exhaust port 74 together with other gases. The trachea is sent to the side of the vacuum pump. Once the vacuum drying treatment is completed for a certain period of time, the chamber is opened (the upper chamber is moved upward from the lower chamber 70), and the substrate G is unloaded.

The conveyance device 62 advances into the first decompression drying unit (VD) 66L, and carries out the substrate G that has completed the decompression drying process. Next, moving in the transfer area TE, the substrate G is carried into the carry-in unit (IN-PASS) 38. Shortly thereafter, the second forward translation transfer unit 48 starts the roller transport, and the substrate G is translated and transported to the downstream side of the process route A, and passes through the heat processing unit (40, 42).

In the hot processing section (40, 42), the substrate G is initially pre-baked in the pre-baking unit (PRE-BAKE) 40, as a heat treatment after the resist coating or a heat treatment before the exposure. By this prebaking, the solvent remaining in the resist film on the substrate G is evaporated and removed, and the adhesion of the resist film to the substrate is enhanced. Next, the substrate G is cooled to a predetermined temperature in the cooling unit (COL) 42. Then, the substrate G is ejected from the carry-out unit (OUT-PASS) 44 at the end of the second forward translation transport unit 48 to the transport device 62 of the interface station (I/F) 18.

In the interface station (I/F) 18, the substrate G is a peripheral exposure device (EE) that is carried into the peripheral device 50 after the rotary table 64 is subjected to, for example, a 90-degree direction change, and is received therein for removal of adhesion during development. After exposure of the resist on the peripheral portion of the substrate G, it is sent to the adjacent exposure device 12.

The exposure device 12 exposes a predetermined circuit pattern to the resist on the substrate G. Then, the substrate G on which the pattern exposure is completed is returned from the exposure device 12 to the interface station (I/F) 18, first loaded into the peripheral device 50 (TITLER), and predetermined information is recorded on a predetermined portion on the substrate G. . Then, the substrate G is carried into the carry-in unit (not shown) under the peripheral device 50 by the transport device 62.

In this manner, the substrate G is moved to the cassette station (C/S) 14 by the roller transport path of the return path translation transport unit 60 laid on the process route B of the return path.

In the first developing unit (DEV) 52, the substrate G is a series of developing processes for performing development, washing, and drying between translational transports.

The substrate G that has completed a series of development processes in the developing unit (DEV) 52 maintains the roller processing path of the return path translation unit 60 to sequentially pass the heat processing unit (54, 56) and the inspection unit ( AP) 57.

In the hot processing section (54, 56), the substrate G is initially subjected to post-baking in a post-baking unit (POST-BAKE) 54 as a heat treatment after development processing. By this post-baking, the developer liquid or the cleaning liquid remaining on the resist film on the substrate G is evaporated to enhance the adhesion of the resist pattern to the substrate G. Next, the substrate G is cooled to a predetermined temperature at the cooling unit (COL) 56. The inspection unit (AP) 57 performs a non-contact line width inspection, a film quality, a film thickness inspection, and the like on the resist pattern on the substrate G.

The carry-out unit (OUT-PASS) 58 receives the substrate G that has completed the processing of the entire project from the return path translation transport unit 60, and delivers it to the transport mechanism 22 of the cassette station (C/S) 14. On the side of the cassette station (C/S) 14, the transport mechanism 22 accommodates the completed substrate G received from the carry-out unit (OUT-PASS) 58 in one (usually the original) cassette C.

As described above, the coating development processing system 10 is laid in the process route A of the forward path: the first forward translation transfer unit 46 before the resist coating unit (CT) 36, and the pre-baking unit (PRE-BAKE) 40 before the second forward translation transfer unit 48, and the first and second decompression drying units (VD) 66L, 66R in the atrium space NS adjacent to the resist application unit (CT) 36 The conveying device 68 is provided while being opposed to each other at a predetermined position. The conveying device 68 moves in the conveying area TE provided in the atrium space NS, and can enter the two decompression drying units 66L and 66R, the unloading unit (OUT-PASS) 34 of the first forward translating unit 46, and the resist coating. The transport unit (IN-PASS) 38 of the cloth unit (CT) 36 and the second forward translation transport unit 48 can perform the transfer of the units to the substrate G.

According to this configuration, in the coating development processing system 10, the occupied spaces of the first and second decompression drying units (VD) 68L, 68R are absorbed in the atrium space NS, and are not included in the two process routes. In A and B, the system width dimension (Y-direction dimension) is not increased, and the total length of the system (X-direction dimension) can be greatly shortened.

Further, in the coating development processing system 10, the first and second decompression drying units 66L, 66R have the same configuration and function, and the processing contents and processing time for decompressing and drying the substrate G are substantially the same. . Then, after the resist application coating unit (CT) 36 has just received the resist coating treatment on the substrate G sequentially transferred through the first forward transfer unit 46, the first and second decompression drying are alternately repeated. Units 66L, 66R.

For example, each of the odd-numbered substrates G is transferred to the first decompression drying unit 66L after the resist coating unit (CT) 36 receives the resist coating treatment, and is subjected to the vacuum drying treatment, and then sent to the second path. The carry-in unit (IN-PASS) 38 of the transport unit 48 is translated. On the other hand, an even number of the respective substrates G are transferred to the second decompression drying unit 66R after the resist coating unit (CT) 36 receives the resist coating treatment, and after receiving the vacuum drying treatment, they are sent to the first 2 The transfer unit (IN-PASS) 38 of the transfer unit 48 is moved.

Therefore, when the station time of one unit of the first and second decompression drying units 66L and 66R is t, the time difference between the first and second decompression drying units 66L and 66R is two in parallel, and the entire station time can be formed. t/2. In this way, the decompression drying unit having a long processing time of one time halved the station time, thereby causing the main factor of the station time rate of the entire system to disappear. Therefore, even if the processing speed of the exposure device 12 is speeded up, or the photo-etching lithography uses a halftone exposure process, the coating development processing system can sufficiently cope with it.

Further, in the coating development processing system, the first and second decompression drying units 66L and 66R are disposed at equal distances with respect to the substrate transfer port of the resist coating unit (CT) 36. It is also important that the delay time from the completion of the resist coating treatment to the start of the vacuum drying treatment is coincident with an odd number of substrates G and an even number of substrates G. That is, the evaporation of the solvent from the resist coating film is started immediately after the coating, and once the drying is started immediately after the evaporation, there is unevenness, and there is even a drying treatment or prebaking by the subsequent vacuum drying. Bake can not compensate for the situation. When the development processing system is applied, even if the first and second decompression drying units 66L and 66R are operated in parallel, all of the substrates G are subjected to a vacuum drying treatment after the resist coating treatment with equal delay time. Therefore, the film quality (stability ‧ reproducibility) of the resist coating film can be improved.

(Second embodiment)

3 is a layout configuration of a coating development processing system 100 according to a second embodiment of the present invention. In the drawings, the same components as those in the coating development processing system 10 of the first embodiment are denoted by the same reference numerals, and the description thereof will not be repeated. Further, a detailed layout or configuration of the main part of the coating development processing system 100 is shown in FIGS. 4 to 6.

In the system 100 of the second embodiment, the main portion different from the system 10 of the first embodiment is the first and second decompression drying units 102L disposed in the atrium space NS, and the 102R is not fixed to the substrate. The way on the platform is a vacuum drying device that is constructed in a translational manner.

In the atrium space NS, in order to move the first and second decompression drying units 102L and 102R into and out of the substrate G, the first and second atriums are displayed in addition to and in the units 102L and 102R. Transport units 104L, 104R. Then, the conveyance device 68 can convey the substrate G to the first and second decompression drying units 102L and 102R via the first and second atrium translation transfer units 104L and 104R, respectively.

As shown in FIG. 4, the first atrium translation transport unit 104L includes an atrium substrate transport path 106 that is provided in a carry-in unit (IN-PASS) 105 adjacent to the transport area TE, and an intra-unit transport path 108. The first decompression drying unit 102L is provided in the first decompression drying unit 102L, and is connected to the atrium substrate carrying path 106. The atrium substrate carrying-out path 114 is opposite to the in-loading unit (IN-PASS) 105 as viewed by the first decompression drying unit 102L. The elevator room (EV) 110 on the side is connected to the in-unit conveyance path 108, and extends through the upper surface of the first decompression drying unit 102L to a carry-out unit (OUT-PASS) 112 adjacent to the conveyance area TE.

The atrium substrate carrying path 106, the in-unit transfer path 108, and the atrium substrate carrying-out path 114 are rod-shaped or gyro-shaped rollers 116 arranged at regular intervals in the transport direction (X direction) to form a roller transport path, and have a motor and A roller drive unit (not shown) such as a transmission mechanism rotationally drives the rollers 116 to configure the substrate G to be transported on the roller transport path. Here, an independent roller drive unit (not shown) may be provided in each section (106, 108, 114).

Further, the roller transport path of the atrium substrate carrying-out path 114 is divided into a roller transport path 114a in the elevator room (EV) 110 and a roller transport in the intermediate transfer chamber 118 of the upper layer of the first decompression drying unit 102L. In the three sections of the path 114b and the roller transport path 114c in the carry-out unit (OUT-PASS) 112, an independent roller drive unit (not shown) may be provided in each section.

The roller transport path 114a in the elevator room (EV) 110 is attached to the roller support portion 120 that can be moved up and down, and can be moved to the first floor by the lifting drive of the elevation drive unit 122 constituted by, for example, a cylinder. The first height position H ₁ connected to the in-unit conveyance path (roller conveyance path) 108 and the second height position H ₂ connectable to the roller conveyance path 114b in the intermediate transfer chamber 118 of the second layer.

When the substrate G is carried into the first decompression drying unit 102L, first, the conveying device 68 carries the substrate G into the loading unit (IN-PASS) 105 from the conveying area TE of the atrium space NS. Then, the roller transport operation is started in the atrium substrate transport path 106 and the intra-cell transport path 108, and the substrate G is carried into the first decompression drying unit 102L from the carry-in unit (IN-PASS) 105.

When the substrate G is carried out from the first decompression drying unit 102L, first, the roller transport operation is performed on the roller transport paths 108 and 114a, and the substrate G is carried out from the first decompression drying unit 102L to the elevator room (EV). ) The first layer of 110. Next, in the elevator room (EV) 110, the roller transport path 114a rises, and the substrate G is moved to the second layer. Next, the roller transport operation is performed on the roller transport paths 114a, 114b, and 114c, and the substrate G is moved from the elevator chamber (EV) 110 through the intermediate transfer chamber 118 to the carry-out unit (OUT-PASS) 112. Then, the transport device 68 receives the substrate G from the transport area TE of the atrium space NS, and carries it out from the carry-out unit (OUT-PASS) 112.

In Fig. 4, the reduced-pressure drying unit (VD) 102L is a chamber 124 having an integrated form of reduced pressure, which has a flat rectangular parallelepiped shape. In the substrate transfer direction (X direction), a pair of opposite side walls of the chamber 124 are provided with an openable and closable substrate transfer inlet 126 and a substrate transfer opening 128. The intra-unit conveyance path (roller conveyance path) 108 is provided in the chamber 124.

The decompression drying unit (VD) 102L has a lift pin mechanism (not shown) for raising and lowering, which is at a height position (position on the roller 116) for loading or unloading the substrate G in the chamber 124. It rises and falls between the height position (the position where the roller 116 floats upward) for the vacuum drying process.

One or a plurality of exhaust ports 130 are provided in the bottom wall of the chamber 124. These exhaust ports 130 are connected to the inlet side of the vacuum pump 134 via the exhaust pipe 132. An opening and closing valve 136 is provided in the middle of the exhaust pipe 132.

FIG. 5 and FIG. 6 show an example of the configuration of the inside of the loading unit (IN-PASS) 105.

In the loading unit (IN-PASS) 105, as shown in FIG. 5, a pair of horizontal frames 140A, 140B extending in parallel in the conveying direction (X direction) are provided at intervals larger than the substrate G. Between the horizontal frames 140A and 140B, a plurality of rod-shaped supporting members 142 (four in the illustrated example) are arranged in parallel at an appropriate interval. Each of the rod-shaped support members 142 is supported by a plurality of beams 144 extending in a direction (Y direction) orthogonal to the conveyance direction (X direction) (three in the illustrated example). As shown in Fig. 6, both ends of the beam 144 are fixed to the lower surfaces of the horizontal frames 140A, 140B, respectively.

On the upper surface of the rod-shaped support member 142, a plurality of spherical free rollers 146 for mounting the support substrate G are mounted at a constant pitch.

As seen from the entrance side of the loading unit (IN-PASS) 105, a bridge type driving roller 148 is attached to the rear end portion (last portion) of the horizontal frames 140A, 140B. The drive roller 148 integrally fixes a plurality of gyro-shaped rollers or rollers 148b at a constant interval between the rotation shafts 148a spanned between the horizontal frames 140A and 140B, and can be rotationally driven by the rotation driving unit 152 via the pulleys 150. .

In the horizontal frames 140A and 140B, a plurality of single-sided support type drive rollers 154 are attached at regular intervals in the longitudinal direction. The drive rollers 154 can be rotationally driven via the drive belt 156 on the outside of the horizontal frames 140A, 140B. Here, the drive belt 156 is connected to the rotation driving portion 152 via the pulley 150.

The driving rollers 148, 154 and the free roller 146 constitute the atrium substrate carrying path 106.

The configuration in the carry-out unit (OUT-PASS) 112 is the same as the configuration in the carry-in unit (IN-PASS) 105 except that the transport direction or the transport operation is reversed.

Further, the second decompression drying unit 102R and the second atrium translation conveying unit 104R are also different in the left-right symmetric arrangement position by the resist coating unit (CT) 36, and the others have the first decompression drying unit separately. The configuration of the 102L and the first atrium translation transport unit 104L is the same as that of the first embodiment.

In the coating development processing system 100 of the second embodiment, as well as the coating development processing system 10 of the first embodiment, the overall length of the system and the station time can be greatly shortened.

(Comparative example)

Further, in the reference example (comparative example), it is conceivable that, as shown in FIG. 7, in the process route A, in the middle of the second forward translation transfer unit 48, that is, the loading unit (IN-PASS) 38 and the pre-bake The first translation type decompression drying unit 102L is disposed between the baking units (PRE-BAKE) 40, and the layout of the second translating type decompression drying unit 102R is disposed in the atrium space NS.

In this case, in the process route A, between the loading unit (IN-PASS) 38 of the second forward translation conveying unit 48 and the first translation type decompression drying unit 102L, and the first translation type decompression drying unit 102L and First and second lateral conveyors (CR-PASS) 160, 162 are disposed between the pre-baking units (PRE-BAKE) 40, respectively. Further, the second translating and drying unit 102R is interposed, and adjacent to the first and second lateral conveyors (CR-PASS) 160 and 162 are adjacent to each other, and the third and fourth lateral conveyors are disposed in the atrium space NS. (CR-PASS) 164,166.

Here, each of the lateral conveyors (CR-PASS) 160 to 166 is a Y-direction conveyor that selectively switches between the X-direction conveyor movement and the translational movement, and has a translational transport path and a transport drive unit that are orthogonal to each other. .

For example, the first horizontal conveyor (CR-PASS) 160 is the substrate G that is translated and received from the loading unit (IN-PASS) 38, and the odd number of substrates G are directly carried into the first translational pressure reducing drying unit 102L. The even number of substrates G are transferred to the third lateral conveyor (CR-PASS) 164.

The third lateral conveyor (CR-PASS) 164 carries an even number of substrates G received from the first lateral conveyor (CR-PASS) 160 to the second translation type vacuum drying unit 102R.

The fourth lateral conveyor (CR-PASS) 166 is an even-numbered substrate G that has been subjected to the vacuum drying treatment performed by the second translational-type vacuum drying unit 102R, and is transferred to the second lateral conveyor (CR-PASS) 162.

The second lateral conveyor (CR-PASS) 162 is an odd-numbered substrate G that has been discharged from the first translational-type decompression drying unit 102L to complete the reduced-pressure drying process, and is sent to the subsequent pre-baking unit (PRE-BAKE) 40. . Then, an even number of substrates G which have been subjected to the reduced-pressure drying process are received from the fourth lateral conveyor (CR-PASS) 166, and are sent to the pre-baking unit (PRE-BAKE) 40 of the subsequent stage.

The layout of Fig. 7 is such that the first and second translating decompression drying units 102L, 102R are operated in parallel, whereby the station time can be shortened, but since the process route A is inserted into a row and two sets of lateral conveyance Since the machine (CR-PASS) 160, 162 and one unit of the reduced-pressure drying unit 102L, the X-direction dimension L of the three units (160, 102L, 162) is combined to increase the total length of the process route A. Larger, and thus the total length of the system is increased, and the overall length of the system cannot be shortened. Further, when the substrate G that has been subjected to the resist coating treatment by the resist coating unit (CT) 36 is sent to the first translation type decompression drying unit 102L, and when it is sent to the second translation type decompression drying unit 102R, it is also transported. The disadvantage of different delay times.

(Third embodiment)

Fig. 8 is a view showing a layout configuration of a coating development processing system 170 according to a third embodiment of the present invention. In the drawings, the same components as those in the coating development processing system 10 of the first embodiment are denoted by the same reference numerals, and the description thereof will not be repeated. Further, the configuration of the resist coating unit (CT) 172 of the coating development processing system 170 is shown in FIG.

In the system 170 of the third embodiment, the main difference from the system 10 of the first embodiment is that the resist coating unit (CT) 172 is not a method of fixing the substrate to the stage, but is configured to translate. In the resist application device of the aspect, the resist application unit (CT) 172 is disposed upstream of the carry-out unit (OUT-PASS) 34 along the first forward translation transfer unit 46 in the process route A of the forward path. position.

As shown in FIG. 9, the resist coating unit (CT) 172 has a floating upper platform 174 for coating a part or a section of the first forward translation conveying unit 46, and a substrate conveying mechanism 176. The substrate G floating in the air on the coating floating platform 174 is transported in the longitudinal direction of the floating platform (X direction), and the resist nozzle 178 is supplied with a resist liquid on the substrate G conveyed on the floating platform 174; And the nozzle update unit 180 updates the resist nozzle 178 at the idle time of the coating process.

A plurality of gas injection holes 182 for spraying a predetermined gas (for example, air) to the upper side of the floating upper stage 174 are provided, and the substrate G can be lifted from the stage by the gas pressure ejected from the gas injection holes 182. Float to a certain height.

The substrate transfer mechanism 176 includes a pair of guide rails 184A and 184B extending in the X direction via the floating platform 174, and a slider 186 that can reciprocate along the guide rails 184A and 184B, and can be placed on the floating platform. The substrate holding member (not shown) such as a suction pad of the slider 186 is detachably held at both ends of the substrate 174, and the slider 186 is moved by a linear motion mechanism (not shown). In the transport direction (X direction), the floating transport of the substrate G can be performed on the floating upper platform 174.

The resist nozzle 178 is an elongated nozzle that extends above the floating platform 174 in the horizontal direction (Y direction) orthogonal to the transport direction (X direction), and can be formed by a slit-shaped discharge port at a predetermined coating position. The resist liquid is discharged in a strip shape by the upper surface of the substrate G directly below. Further, the resist nozzle 178 is movable in the X direction integrally with the nozzle supporting member 188 that supports the nozzle, and is configured to be movable up and down in the Z direction, and is movable between the coating position and the nozzle updating portion 180.

The nozzle updating unit 180 is held by the pillar member 190 at a predetermined position above the floating platform 174, and includes a filling processing unit 192 that supplies a resist liquid to the resist nozzle 178, and a preparation process for discharging the resist liquid. For the purpose of preventing the resist discharge port of the resist nozzle 178 from drying, the nozzle bathroom 194 held in the environment of the solvent vapor and the nozzle for removing the resist near the discharge port of the resist nozzle 178 are provided. Washing mechanism 196.

Here, the main function of the resist coating unit (CT) 172 will be described. First, the cooling unit (COL) 32 of the preceding stage is loaded into the loading area of the front end side of the floating platform 174 via a sorting mechanism (not shown), and the standby slider 186 holds the substrate G and receives it. On the floating upper platform 174, the substrate G receives the gas (air) pressure injected from the gas injection hole 182 to maintain the floating state in a substantially horizontal posture.

Further, the slider 186 moves in the transport direction (X direction) while holding the substrate G, and when the substrate G passes under the resist nozzle 178, the resist nozzle 178 discharges a liquid resistance in a strip shape toward the upper surface of the substrate G. The coating liquid forms a coating film of the resist liquid on one side of the substrate G from the front end of the substrate to the rear end. The substrate G to which the resist is applied is also transported by the slider 186 on the floating platform 174, and is transported from the carry-out area set at the rear end of the floating platform 174 to the carry-out unit via a sorting mechanism (not shown). (OUT-PASS) 34.

Further, the sorting mechanism (not shown) on the carry-in side has a roller transport path that is laid in the transport direction (X direction) of the first forward translation transport unit 46, and vacuum-adsorbs the substrate on the transport path of the roller. / A plurality of adsorption pads that are separated from the edge of the back surface of the substrate, and a substrate transfer mechanism that can move the adsorption pads in parallel with the transport direction in both directions. When the substrate on the upstream side of the cooling unit (COL) 32 is cooled to a constant temperature on the roller transport path, the adsorption pad rises and is adsorbed on the back edge of the substrate, and the substrate is adsorbed via the adsorption. The pad, substrate transfer mechanism can transfer the substrate to the loading area of the platform 178. Further, after the substrate is carried in the loading area, the adsorption pad is separated from the substrate, and the substrate transfer mechanism and the adsorption pad are returned to the original position.

In addition to the point of the opposite (symmetric) operation, the sorting mechanism (not shown) on the carry-out side has the same function as the sorting mechanism on the carry-in side.

In the coating development processing system 170 of the third embodiment, since the first and second decompression drying units (VD) 66L and 66R are disposed in the atrium space NS, the system width dimension (Y-direction dimension) is not increased. It can achieve a large reduction in the overall length of the system (X-direction dimension) and station time. However, the resist coating unit (CT) 172 in the translational mode on the process route A is longer than the plate-type resist coating unit (CT) 36 in unit size (X-direction dimension), and the system has a full-length system size (X). Direction size) will become longer. On the other hand, the transport device 68 of the atrium space NS is a transport unit (OUT-PASS) 34 and a second forward shift transport unit 48 that are driven by the two decompression drying units 66L, 66R, the first forward translating unit 46, and the like. The carry-in unit (IN-PASS) 38 is sufficient, and it is not necessary to enter the resist coating unit (CT) 172. That is, there is an advantage that the burden on the conveyance path of the conveyance device 68 becomes light.

In addition, the layout of FIG. 8 is arranged such that the carry-out unit (OUT-PASS) 34 of the first forward translation transfer unit 46 and the carry-in unit (IN-PASS) 38 of the second forward translation transfer unit 48 are arranged in the horizontal direction on the process route A. Direction (X direction).

However, as a modification, as shown in FIG. 10, the carry-out unit (OUT-PASS) 34 and the carry-in unit (IN-PASS) 38 may be vertically stacked in two layers. In this case, the carry-out unit (OUT-PASS) 34 of the first forward transfer conveyance unit 46 is arranged in the same layer as the resist application unit (CT) 172, for example, in the first layer, and the carry-in unit of the second forward translation transfer unit 48 ( The IN-PASS 38 is arranged in the same layer as the pre-baking unit (PRE-BAKE) 40, for example, in the second layer.

In the layout of FIG. 10, the carry-in unit (OUT-PASS) 34 of the first forward translation transport unit 46 and the carry-in unit (IN-PASS) 38 of the second forward translation transport unit 48 are two-dimensionally arranged in one place. Therefore, the conveying device 68 and the first and second decompression drying units (VD) 66L, 66R in the atrium space NS can be concentrated or even arranged, and the moving range of the conveying device 68 can be reduced to make the moving direction (moving). Axis) is simplified.

(Fourth embodiment)

FIG. 11 is a main part showing a layout configuration of the coating development processing system 200 according to the fourth embodiment of the present invention. In the drawings, the same components as those in the coating development processing system 100 of the second embodiment are denoted by the same reference numerals, and the description thereof will not be repeated.

In the same manner as the above-described second embodiment, in the atrium space NS, the transport device 68 can move the first and second decompression drying units 102L and 102R via the first and second atrium translation transport units 202L and 202R, respectively. To move out of the substrate G.

Here, the first and second loading/unloading units (IN/OUT-PASS) 204L, 204R are provided between the transfer area TE and the first and second decompression drying units 102L and 102R, respectively. .

As shown in FIG. 12 to FIG. 14 , the first atrium translation transport unit 202L includes lower and upper atrium substrate loading paths 206 and atrium substrates respectively provided in the first loading/unloading unit (IN/OUT-PASS) 204L. The carry-out path 208 and the first decompression drying unit 102L are selectively connected to any of the in-unit transfer path 108 of the atrium substrate carrying path 206 and the atrium substrate carrying-out path 208. The atrium substrate loading path 206, the atrium substrate carrying-out path 208, and the intra-unit conveying path 108 are constituted by, for example, a roller conveying path, and can be driven by independent roller driving units.

The atrium substrate loading path 206 and the atrium substrate carrying-out path 208 are lifted and lowered by the elevating drive unit 210 including a cylinder or the like while being housed in the first loading/unloading unit (IN/OUT-PASS) 204. Drive to move up and down.

When the first decompression drying unit 102L is loaded into the substrate G, as shown in FIG. 14, the height position of the atrium substrate carrying path 206 is aligned with the intra-unit transfer path 108, and the abutment substrate carrying path 206 and the intra-unit transfer path 108 are placed. The substrate G is conveyed in the first direction (from the right side to the left side in the drawing) in the longitudinal direction (X direction) of the system.

When the substrate G is carried out from the first decompression drying unit 102L, as shown in FIG. 13, the height position of the atrium substrate carrying-out path 208 is aligned with the intra-unit transfer path 108, and the intra-unit transfer path 108 and the atrium substrate carry-out path 208 are placed. The substrate G is transported in the second direction (from the left to the right of the drawing) in the longitudinal direction (X direction) of the system.

In the coating development processing system 200, as shown in FIG. 12, while the substrate G _i is receiving the vacuum drying process in the first decompression drying unit 102L, the conveying device 68 can enter the first loading/unloading unit. (IN/OUT-PASS) 204L carries the next substrate G _i+1 to the atrium substrate carrying path 206 by the transfer arm 68a.

Then, 13 may be moved in a path so that the substrate 206 followed atrium G _{i + 1} substrates held standby, dried under reduced pressure to complete the process in the first vacuum drying unit 102L substrate G _i to the transport roller Move out to the atrium substrate removal path 208.

Alternatively, in another order, the substrate G _{i which has} been subjected to the reduced-pressure drying treatment may be carried out from the first decompression drying unit 102L to the atrium substrate carrying-out path 208, and secondarily received by the first decompression drying unit 102L. The substrate G _i+1 subjected to the pressure drying process is carried into the atrium substrate carrying path 206.

In addition, as shown in FIG. 14, the substrate G _i+1 is carried by the roller from the atrium substrate carrying path 206 to the first decompression drying unit 102L, and the transfer device 68 can use the transfer arm 68a by the processed substrate Gi. It is carried out from the atrium substrate removal path 208.

The configuration of the atrium substrate loading path 206 and the atrium substrate carrying-out path 208 of the loading/unloading unit (IN/OUT-PASS) 204L can be the same as those shown in FIGS. 5 and 6 .

The second loading/unloading unit (IN/OUT-PASS) 204R and the second atrium shifting and conveying unit 202R are also provided in the same manner as the first loading/unloading unit (IN/OUT-PASS) 204L and the first atrium shifting and conveying unit 202L. Composition ‧ function

In the fourth embodiment, the substrate transfer port 128 can be used as the substrate transfer port 126 in the first and second decompression drying units 102L and 102R, and the substrate G can be taken in and out from the transfer region TE side. The atrium translation transfer units 202L and 202R are miniaturized.

The preferred embodiments of the present invention have been described above, but the present invention is not limited to the above embodiments, and various modifications can be made without departing from the spirit and scope of the invention.

For example, in the above-described embodiment, in the system in which the process route A of the forward route includes the first and second forward translation transfer units 46 and 48, the translational transport unit 46, 48 is connected to the atrium space NS by a process flow. 3 groups of processing units. However, when the process route B for the re-route includes the first and second reversing translation transport units, the third group (or the fourth group) of the two reversing translation transmission units can be connected in the atrium space NS by the process flow. Processing unit.

In the above embodiment, the processing unit disposed in the atrium space NS is a reduced-pressure drying unit, but other processing units may be disposed in accordance with the arrangement of the processing routes.

The substrate to be processed of the present invention is not limited to a glass substrate for LCD, and may be another substrate for a flat panel display, a semiconductor wafer, a CD substrate, a photomask, a printed substrate, or the like.

10. . . Coating imaging system

14. . . Card Station (C/S)

16. . . Process station (P/S)

18. . . Interface station (I/F)

twenty two. . . Transport device

34. . . Move out unit (OUT-PASS)

36. . . Resistor coating unit (CT)

38. . . Move in unit (IN-PASS)

46. . . The first way to the translation transmission department

48. . . The second way translation transmission department

60. . . Compound path translation

62. . . Transport device

66L. . . First decompression drying unit (VD)

66R. . . First decompression drying unit (VD)

68. . . Transport device

102L. . . First decompression drying unit (VD)

102R. . . First decompression drying unit (VD)

104L. . . 1st atrium translation transfer section

104R. . . The second atrium translation transport section

105. . . Move in unit (IN-PASS)

112. . . Move out unit (OUT-PASS)

172. . . Resistor coating unit (CT)

A. . . Route to the road

B. . . Reroute route

1 is a plan view showing a layout configuration of a coating development processing system according to a first embodiment of the present invention.

2 is a plan view showing a detailed configuration of a decompression drying unit and a conveying device disposed in an atrium space in the coating development processing system of FIG. 1 and a processing unit therearound.

3 is a plan view showing a layout configuration of a coating development processing system according to a second embodiment.

Fig. 4 is a schematic side view showing a configuration of a main part of the coating development processing system of Fig. 2;

Fig. 5 is a plan view showing the inside of the loading unit of Fig. 4;

Fig. 6 is a front elevational view showing the inside of the loading unit of Fig. 4;

Fig. 7 is a plan view showing a layout of a system of a comparative example.

8 is a plan view showing a layout configuration of a coating development processing system according to a third embodiment.

Fig. 9 is a plan view showing the configuration of a resist coating unit of the coating development processing system of Fig. 9;

FIG. 10 is a plan view of a main part showing a layout configuration of a coating development processing system according to a modification of the third embodiment.

FIG. 11 is a plan view showing a layout configuration of a main part of a coating development processing system according to a fourth embodiment.

FIG. 12 is a partial cross-sectional side view showing a configuration and an operation of the loading/unloading unit and the atrium shifting conveying unit of the coating development processing system of FIG. 11 .

FIG. 13 is a partial cross-sectional side view showing a first stage of the configuration and operation of the loading/unloading unit and the atrium shifting conveying unit of the coating development processing system of FIG. 11 .

FIG. 14 is a partial cross-sectional side view showing a configuration and an operation of the loading/unloading unit and the atrium shifting conveying unit of the coating development processing system of FIG. 11 .

10. . . Coating imaging system

12. . . External exposure device

14. . . Card Station (C/S)

16. . . Process station (P/S)

18. . . Interface station (I/F)

20. . . Card platform

twenty two. . . Transport device

22a. . . Transport arm

twenty four. . . Move in unit (IN-PASS)

26. . . Excimer UV irradiation unit (E-UV)

28. . . Brush Scrubber Unit (SCR)

30. . . Adhesion unit (AD)

32. . . Cooling unit (COL)

34. . . Move out unit (OUT-PASS)

36. . . Resistor coating unit (CT)

38. . . Move in unit (IN-PASS)

40. . . Pre-baking unit (PRE-BAKE)

42. . . Cooling unit (COL)

44. . . Move out unit (OUT-PASS)

46. . . The first way to the translation transmission department

48. . . The second way translation transmission department

50. . . Peripheral device (TITLER/EE)

52. . . Imaging unit (DEV)

54. . . Post-baking unit (POST-BAKE)

56. . . Cooling unit (COL)

57. . . Inspection unit (AP)

58. . . Move out unit (OUT-PASS)

60. . . Compound path translation

62. . . Transport device

64. . . Rotating platform (R/S)

66L. . . First decompression drying unit (VD)

66R. . . First decompression drying unit (VD)

68. . . Transport device

110. . . Lift room (EV)

A. . . Route to the road

B. . . Reroute route

C. . . Card

G. . . Substrate

Claims (16)

A processing system is a series processing system that performs a series of processing on a substrate to be processed according to a sequence of process flows, and has a feature of the first process route, which is in the longitudinal direction of the system. The first direction includes: arranging the processing units of the first group adjacent to each other, or arranging them in a row via the transport unit, translating the first forward translation transport unit of the substrate, and processing more than the first forward transfer unit The downstream side of the flow translates the second forward translation transfer unit of the transport substrate; the second process route is in a second direction opposite to the first direction in the longitudinal direction of the system, and is located in a process longer than the first process route. The processing units of the second group on the downstream side of the flow are adjacent to each other or arranged in a row via the transport system unit, and extend in parallel with the atrium space of a predetermined size in the system width direction and the first process route; the processing of the third group a unit disposed in the atrium space; and a first conveying device disposed in the atrium space, and a substrate transfer from a terminal side of the first forward translation transfer unit One of the processing units of the third group is transported out of the respective substrates, and each of the substrates that have been processed in one of the processing units of the third group is carried out from the processing unit, and is carried into the second forward translation and transport unit. The substrate transfer portion on the start side. The processing system of the third aspect of the invention, wherein the processing unit of the third group includes first and second processing units having substantially the same content and time of processing of the substrate, and the first forward translation transmission unit The first and second processing units are alternately arranged alternately for the continuously fed substrates. The processing system of the second aspect of the invention, wherein the first conveying device has a transport robot movable in a transport area provided in the atrium space, wherein the first and second processing units are in a longitudinal direction of the system. The transport area is interposed therebetween so as to face each other in the atrium space. The processing system of claim 3, wherein the first and second processing units are disposed adjacent to the transporting region, and the transport robot directly carries the first and second processing units into and out of the substrate. The processing system of the third aspect of the invention, wherein the first atrium translation transfer unit is provided in addition to the first processing unit and in the middle of the first processing unit in the atrium space. The transport robot carries the first processing unit into and out of the substrate via the first atrium translation transport unit. The processing system of the fifth aspect of the invention, wherein the first atrium translation transfer unit has a first atrium substrate carrying path provided adjacent to the transfer area, and a first unit inner transfer path is provided in the first unit transfer path. The first processing unit may be connected to the first atrium substrate carrying path; and the first atrium substrate carrying out path may be viewed from the first processing unit on a side opposite to the first atrium substrate carrying path. The first unit inner transfer path is connected to the first processing unit, and the first processing unit is extended to the end position adjacent to the transfer area, and the first apron substrate is moved in when the substrate is loaded into the first processing unit. The substrate is transported on the transport path in the first unit, and when the substrate is carried out from the first processing unit, the substrate is transported on the first intra-cell transfer path and the first atrium substrate carry-out path. The processing system of the fifth aspect of the present invention, wherein the first atrium translation transfer unit has a first atrium substrate carrying path and a first atrium substrate carrying out that are vertically movable up and down in parallel with the transfer area. The first unit processing unit is selectively connected to the first intra-substrate substrate carrying path and the first intra-substrate substrate carrying-out path in the first processing unit, and the first processing is performed on the first processing unit. When the unit is carried into the substrate, the height of the first atrium substrate is in alignment with the first intra-unit transfer path, and the substrate is transported to the system in the first abutment substrate transfer path and the first intra-cell transfer path. In the first direction in the lateral direction, when the substrate is carried out from the first processing unit, the height position of the first atrium substrate carrying-out path is aligned with the first unit inner conveying path, and the first unit inner conveying path and the aforementioned The first atrium substrate is carried out on the road, and the substrate is transported in the second direction in the longitudinal direction of the system. The processing system according to any one of the third to fifth aspect, wherein the atrium space is provided outside the second processing unit in order to carry in and out the substrate to the second processing unit. In the second intermediate atrium translation transport unit, the transport robot carries the second processing unit into and out of the substrate via the second atrium translation transport unit. The processing system of the eighth aspect of the invention, wherein the second atrium translation transfer unit has a second atrium substrate loading path provided adjacent to the transfer area, and a second unit inner transfer path provided in the second unit transfer path The second processing unit may be connected to the second atrium substrate carrying path; and the second atrium substrate carrying out path may be viewed from the second processing unit on a side opposite to the second atrium substrate carrying path. The second unit inner transfer path is connected to the second processing unit, and the second processing unit is extended to the end position adjacent to the transfer area, and is moved to the second processing unit to move the substrate into the second atrium substrate. The substrate is transported on the transport path in the second unit, and when the substrate is carried out from the second processing unit, the substrate is transported on the second unit inner transport path and the second atrium substrate transport path. The processing system of the eighth aspect of the present invention, wherein the second atrium translation transport unit has a second atrium substrate carrying path and a second atrium substrate carrying out that are movable up and down in parallel with the transfer area. The second unit processing unit is selectively connected to the second intra-substrate substrate carrying path and the second intra-substrate substrate carrying-out path in the second processing unit, and the second processing is performed on the second processing When the unit is loaded into the substrate, the height of the second atrium substrate carrying path is aligned with the second intra-cell transfer path, and the substrate is transported to the system length on the second atrium substrate transfer path and the second intra-cell transfer path. In the second direction in the lateral direction, when the substrate is carried out from the second processing unit, the height position of the second atrium substrate carrying-out path is aligned with the second intra-cell transfer path, and the second unit inner transfer path and the aforementioned The second atrium substrate is carried out on the road, and the substrate is transported in the first direction in the longitudinal direction of the system. The processing system according to any one of the first to seventh aspect, wherein the substrate transfer portion on the terminal side of the first forward translation transfer unit and the second forward path are shifted in the first process route A third processing unit is disposed between the substrate delivery portions on the start side of the transport unit, and the first transport device carries in and out the substrate to the third processing unit. The processing system of claim 11, wherein the third processing unit is a resist coating unit that applies a resist liquid on the substrate, and the first and second processing units respectively block the substrate The first and second decompression drying units which are dried under reduced pressure, and the substrate transfer ports of the first and second decompression drying units are substantially the substrate transfer ports of the resist application unit. Isometric location. The processing system of claim 11, wherein in the first process route, a resist coating unit that applies a resist liquid on the substrate is provided on a transfer path of the first forward transfer transfer unit The first and second processing units are first and second decompression drying units that dry the resist coating film on the substrate under reduced pressure, and transfer the substrate to the terminal side of the first forward translation transfer unit. In the first embodiment, the substrate loading ports of the first and second decompression drying units are substantially equidistant positions. A processing system is a series processing system that performs a series of processing on a substrate to be processed according to a sequence of process flows, and has a feature of the first process route, which is in the longitudinal direction of the system. In the first direction, the processing units of the first group are adjacent to each other or arranged in a row via the transport unit, and the second process route is the second opposite to the first direction in the longitudinal direction of the system. The direction includes: positioning the processing unit located in the second group on the downstream side of the process flow of the first process route, or arranging them in a row via the transport system unit, and translating the first complex translation transfer unit of the substrate, and The second return-transfer transporting portion of the downstream transfer-transporting substrate is further parallel to the first process route in the system width direction in the system width direction, and the third group of the third-group translational transport unit a processing unit disposed in the atrium space; and a first conveying device disposed in the atrium space, and a substrate from a terminal side of the first reversing translation transfer unit The unit transports each of the substrates and transports them to one of the processing units of the third group, and the substrates that have been processed in one of the processing units of the third group are carried out from the processing unit, and are carried into the second reversing translation unit. The substrate transfer portion on the start side. The processing system according to any one of the first to seventh aspects of the present invention, wherein the second conveying device is attached to one end of the system in the longitudinal direction and is taken out from any of the cassettes of the system. The unprocessed substrate is delivered to the first process route, and the completed substrate in the system is received from the second process route and stored in any cassette that should be ejected from the system. The processing system according to any one of the first to seventh aspect, wherein the third transfer device is attached to the substrate at the end portion in the longitudinal direction of the system, and the substrate is carried out from the first process route. On the other hand, the second process route is directly carried in, or the second process route is carried in via the external processing device.