TW200942648A - Electroplating device and method - Google Patents
Electroplating device and methodInfo
- Publication number
- TW200942648A TW200942648A TW98101303A TW98101303A TW200942648A TW 200942648 A TW200942648 A TW 200942648A TW 98101303 A TW98101303 A TW 98101303A TW 98101303 A TW98101303 A TW 98101303A TW 200942648 A TW200942648 A TW 200942648A
- Authority
- TW
- Taiwan
- Prior art keywords
- plates
- anode
- pair
- electroplating
- electrolyte
- Prior art date
Links
Landscapes
- Electroplating Methods And Accessories (AREA)
- Manufacturing Of Printed Wiring (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008096534A JP2009249659A (ja) | 2008-04-02 | 2008-04-02 | 電気めっき装置及び電気めっき方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200942648A true TW200942648A (en) | 2009-10-16 |
TWI381070B TWI381070B (zh) | 2013-01-01 |
Family
ID=41155063
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW98101303A TWI381070B (zh) | 2008-04-02 | 2009-01-15 | Electroplating device and electroplating method |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP2009249659A (zh) |
CN (1) | CN101550582B (zh) |
HK (1) | HK1132307A1 (zh) |
TW (1) | TWI381070B (zh) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5366787B2 (ja) * | 2009-12-18 | 2013-12-11 | 株式会社中央製作所 | 連続垂直搬送式めっき装置 |
CN102337577B (zh) * | 2010-07-22 | 2014-03-12 | 富葵精密组件(深圳)有限公司 | 电镀装置 |
CN102373497B (zh) * | 2010-08-16 | 2014-05-21 | 富葵精密组件(深圳)有限公司 | 电镀装置及电镀方法 |
CN107431001B (zh) * | 2015-04-06 | 2020-07-17 | 三菱电机株式会社 | 半导体元件及其制造方法 |
CN105297121A (zh) * | 2015-10-21 | 2016-02-03 | 胜宏科技(惠州)股份有限公司 | 一种电镀铜槽钛篮保养方法 |
CN105297096B (zh) * | 2015-11-30 | 2017-12-19 | 中国华能集团公司 | 一种双面电沉积异种镀层的电镀装置及电镀方法 |
CN107513741A (zh) * | 2017-09-07 | 2017-12-26 | 延康汽车零部件如皋有限公司 | 一种提高长工件铜镀层均匀性的电镀方法 |
CN112701072B (zh) * | 2021-03-25 | 2021-10-22 | 西安奕斯伟硅片技术有限公司 | 晶圆处理装置及晶圆缺陷评价方法 |
KR102650454B1 (ko) * | 2021-06-01 | 2024-03-25 | 가부시키가이샤 에바라 세이사꾸쇼 | 도금 장치 및 도금 방법 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4490230A (en) * | 1983-03-10 | 1984-12-25 | At&T Technologies, Inc. | Electroplating apparatus |
JPS63293193A (ja) * | 1987-05-26 | 1988-11-30 | Matsushita Electric Works Ltd | 電気メッキ方法 |
JPH06116799A (ja) * | 1992-10-01 | 1994-04-26 | Hitachi Chem Co Ltd | 電気めっき法 |
JP3062911B2 (ja) * | 1994-03-14 | 2000-07-12 | 富士通株式会社 | メッキ装置 |
JP3352081B2 (ja) * | 2001-02-01 | 2002-12-03 | 株式会社アスカエンジニアリング | プリント基板の銅めっき装置 |
CN2466167Y (zh) * | 2001-02-09 | 2001-12-19 | 吴德兴 | 轮圈用电镀装置 |
DE10342512B3 (de) * | 2003-09-12 | 2004-10-28 | Atotech Deutschland Gmbh | Vorrichtung und Verfahren zum elektrolytischen Behandeln von elektrisch gegeneinander isolierten, elektrisch leitfähigen Strukturen auf Oberflächen von bandförmigem Behandlungsgut |
CN2732766Y (zh) * | 2004-05-12 | 2005-10-12 | 重庆渝安创新科技(集团)有限公司 | 节约电能和设备附件的电镀硬铬设备 |
JP4711805B2 (ja) * | 2005-11-08 | 2011-06-29 | 上村工業株式会社 | めっき槽 |
US8177945B2 (en) * | 2007-01-26 | 2012-05-15 | International Business Machines Corporation | Multi-anode system for uniform plating of alloys |
-
2008
- 2008-04-02 JP JP2008096534A patent/JP2009249659A/ja active Pending
-
2009
- 2009-01-15 TW TW98101303A patent/TWI381070B/zh not_active IP Right Cessation
- 2009-03-09 CN CN2009101272163A patent/CN101550582B/zh not_active Expired - Fee Related
- 2009-11-13 HK HK09110651.0A patent/HK1132307A1/xx not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
CN101550582B (zh) | 2012-07-18 |
JP2009249659A (ja) | 2009-10-29 |
CN101550582A (zh) | 2009-10-07 |
HK1132307A1 (en) | 2010-02-19 |
TWI381070B (zh) | 2013-01-01 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |