CN102337577B - 电镀装置 - Google Patents
电镀装置 Download PDFInfo
- Publication number
- CN102337577B CN102337577B CN201010233174.4A CN201010233174A CN102337577B CN 102337577 B CN102337577 B CN 102337577B CN 201010233174 A CN201010233174 A CN 201010233174A CN 102337577 B CN102337577 B CN 102337577B
- Authority
- CN
- China
- Prior art keywords
- anode
- gripping plate
- negative electrode
- driving chain
- plating tank
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/06—Suspending or supporting devices for articles to be coated
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/005—Contacting devices
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/12—Process control or regulation
- C25D21/14—Controlled addition of electrolyte components
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/38—Electroplating: Baths therefor from solutions of copper
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating Methods And Accessories (AREA)
Abstract
Description
Claims (9)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201010233174.4A CN102337577B (zh) | 2010-07-22 | 2010-07-22 | 电镀装置 |
US13/080,671 US20120018299A1 (en) | 2010-07-22 | 2011-04-06 | Electroplating apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201010233174.4A CN102337577B (zh) | 2010-07-22 | 2010-07-22 | 电镀装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN102337577A CN102337577A (zh) | 2012-02-01 |
CN102337577B true CN102337577B (zh) | 2014-03-12 |
Family
ID=45492681
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201010233174.4A Expired - Fee Related CN102337577B (zh) | 2010-07-22 | 2010-07-22 | 电镀装置 |
Country Status (2)
Country | Link |
---|---|
US (1) | US20120018299A1 (zh) |
CN (1) | CN102337577B (zh) |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1137810A (zh) * | 1993-11-04 | 1996-12-11 | 桑泰克特贸易公司 | 电镀设备 |
JP2007126119A (ja) * | 2005-10-06 | 2007-05-24 | Mitsubishi Heavy Ind Ltd | ファスナ |
CN101240443A (zh) * | 2006-11-15 | 2008-08-13 | 新光电气工业株式会社 | 电镀装置、电镀方法以及电镀夹具 |
CN101473071A (zh) * | 2006-06-20 | 2009-07-01 | 贝卡尔特股份有限公司 | 用于以连续方式电镀衬底的设备和方法 |
CN101550582A (zh) * | 2008-04-02 | 2009-10-07 | 日本梅克特隆株式会社 | 电镀装置和电镀方法 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2816790A (en) * | 1954-11-22 | 1957-12-17 | Claude H Johnson | Magnetic work hanger |
US3540991A (en) * | 1967-12-11 | 1970-11-17 | Eastman Kodak Co | Electrolytic cell arrangement |
JPS6056099A (ja) * | 1983-09-05 | 1985-04-01 | Fuji Photo Film Co Ltd | 電解処理装置 |
US5340457A (en) * | 1993-04-29 | 1994-08-23 | Olin Corporation | Electrolytic cell |
DE10153171B4 (de) * | 2001-10-27 | 2004-09-16 | Atotech Deutschland Gmbh | Verfahren und Vorrichtung zum elektrolytischen Behandeln von Teilen in Durchlaufanlagen |
EP1767671B1 (en) * | 2005-09-26 | 2012-05-02 | CHLORINE ENGINEERS CORP., Ltd. | Three-dimensional electrode for electrolysis, ion exchange membrane electrolytic cell and method of electrolysis using the three-dimensional electrode |
-
2010
- 2010-07-22 CN CN201010233174.4A patent/CN102337577B/zh not_active Expired - Fee Related
-
2011
- 2011-04-06 US US13/080,671 patent/US20120018299A1/en not_active Abandoned
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1137810A (zh) * | 1993-11-04 | 1996-12-11 | 桑泰克特贸易公司 | 电镀设备 |
JP2007126119A (ja) * | 2005-10-06 | 2007-05-24 | Mitsubishi Heavy Ind Ltd | ファスナ |
CN101473071A (zh) * | 2006-06-20 | 2009-07-01 | 贝卡尔特股份有限公司 | 用于以连续方式电镀衬底的设备和方法 |
CN101240443A (zh) * | 2006-11-15 | 2008-08-13 | 新光电气工业株式会社 | 电镀装置、电镀方法以及电镀夹具 |
CN101550582A (zh) * | 2008-04-02 | 2009-10-07 | 日本梅克特隆株式会社 | 电镀装置和电镀方法 |
Also Published As
Publication number | Publication date |
---|---|
CN102337577A (zh) | 2012-02-01 |
US20120018299A1 (en) | 2012-01-26 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C53 | Correction of patent of invention or patent application | ||
CB02 | Change of applicant information |
Address after: 518103 Shenzhen Province, Baoan District Town, Fuyong Tong tail Industrial Zone, factory building, building 5, floor, 1 Applicant after: Fuku Precision Components (Shenzhen) Co., Ltd. Co-applicant after: Zhending Technology Co., Ltd. Address before: 518103 Shenzhen Province, Baoan District Town, Fuyong Tong tail Industrial Zone, factory building, building 5, floor, 1 Applicant before: Fuku Precision Components (Shenzhen) Co., Ltd. Co-applicant before: Honsentech Co., Ltd. |
|
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
GR01 | Patent grant | ||
GR01 | Patent grant | ||
ASS | Succession or assignment of patent right |
Owner name: HONGQISHENG PRECISION ELECTRONICS (QINHUANGDAO) CO Free format text: FORMER OWNER: FUKUI PRECISION ASSEMBLY (SHENZHEN) CO., LTD. Effective date: 20140829 |
|
C41 | Transfer of patent application or patent right or utility model | ||
COR | Change of bibliographic data |
Free format text: CORRECT: ADDRESS; FROM: 518103 SHENZHEN, GUANGDONG PROVINCE TO: 066000 QINHUANGDAO, HEBEI PROVINCE |
|
TR01 | Transfer of patent right |
Effective date of registration: 20140829 Address after: 066000 Qinhuangdao economic and Technological Development Zone, Hebei Tengfei Road, No. 18 Patentee after: Hongqisheng Precision Electronic (Qinhuangdao) Co., Ltd. Patentee after: Zhending Technology Co., Ltd. Address before: 518103 Shenzhen Province, Baoan District Town, Fuyong Tong tail Industrial Zone, factory building, building 5, floor, 1 Patentee before: Fuku Precision Components (Shenzhen) Co., Ltd. Patentee before: Zhending Technology Co., Ltd. |
|
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20140312 Termination date: 20160722 |
|
CF01 | Termination of patent right due to non-payment of annual fee |