CN103617962B - 一种基片电镀夹具 - Google Patents
一种基片电镀夹具 Download PDFInfo
- Publication number
- CN103617962B CN103617962B CN201310603225.1A CN201310603225A CN103617962B CN 103617962 B CN103617962 B CN 103617962B CN 201310603225 A CN201310603225 A CN 201310603225A CN 103617962 B CN103617962 B CN 103617962B
- Authority
- CN
- China
- Prior art keywords
- substrate
- metal clips
- groove
- electroplating clamp
- hole
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 73
- 238000009713 electroplating Methods 0.000 title claims abstract description 37
- 239000002184 metal Substances 0.000 claims abstract description 39
- 229910052751 metal Inorganic materials 0.000 claims abstract description 39
- 239000004677 Nylon Substances 0.000 claims description 7
- 229920001778 nylon Polymers 0.000 claims description 7
- 229910000906 Bronze Inorganic materials 0.000 claims description 6
- 239000010974 bronze Substances 0.000 claims description 6
- 239000000463 material Substances 0.000 claims description 6
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims description 5
- KUNSUQLRTQLHQQ-UHFFFAOYSA-N copper tin Chemical compound [Cu].[Sn] KUNSUQLRTQLHQQ-UHFFFAOYSA-N 0.000 claims description 5
- 229950000845 politef Drugs 0.000 claims description 2
- 239000012634 fragment Substances 0.000 abstract description 4
- 238000007747 plating Methods 0.000 description 6
- 230000005611 electricity Effects 0.000 description 4
- 239000010931 gold Substances 0.000 description 4
- 229910052737 gold Inorganic materials 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- PNEYBMLMFCGWSK-UHFFFAOYSA-N Alumina Chemical compound [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 3
- 230000009286 beneficial effect Effects 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 229910017083 AlN Inorganic materials 0.000 description 1
- PIGFYZPCRLYGLF-UHFFFAOYSA-N Aluminum nitride Chemical compound [Al]#N PIGFYZPCRLYGLF-UHFFFAOYSA-N 0.000 description 1
- 244000025254 Cannabis sativa Species 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- 150000001336 alkenes Chemical class 0.000 description 1
- 229910052790 beryllium Inorganic materials 0.000 description 1
- ATBAMAFKBVZNFJ-UHFFFAOYSA-N beryllium atom Chemical compound [Be] ATBAMAFKBVZNFJ-UHFFFAOYSA-N 0.000 description 1
- 239000003518 caustics Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 239000007792 gaseous phase Substances 0.000 description 1
- 239000003292 glue Substances 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910000510 noble metal Inorganic materials 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 125000006850 spacer group Chemical group 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/6875—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a plurality of individual support members, e.g. support posts or protrusions
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/06—Suspending or supporting devices for articles to be coated
- C25D17/08—Supporting racks, i.e. not for suspending
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating Methods And Accessories (AREA)
Abstract
Description
Claims (5)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201310603225.1A CN103617962B (zh) | 2013-11-13 | 2013-11-13 | 一种基片电镀夹具 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201310603225.1A CN103617962B (zh) | 2013-11-13 | 2013-11-13 | 一种基片电镀夹具 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN103617962A CN103617962A (zh) | 2014-03-05 |
CN103617962B true CN103617962B (zh) | 2016-08-17 |
Family
ID=50168665
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201310603225.1A Expired - Fee Related CN103617962B (zh) | 2013-11-13 | 2013-11-13 | 一种基片电镀夹具 |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN103617962B (zh) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN105350059A (zh) * | 2015-11-28 | 2016-02-24 | 石家庄海科电子科技有限公司 | 一种基片单面电镀的夹具及方法 |
CN105568350A (zh) * | 2015-12-09 | 2016-05-11 | 中国电子科技集团公司第四十一研究所 | 穿心电容器信号传输线的电镀夹具及其使用方法 |
CN110820033A (zh) * | 2019-12-19 | 2020-02-21 | 西北电子装备技术研究所(中国电子科技集团公司第二研究所) | 溅射后的陶瓷基板电镀吊具及其装夹方法 |
CN111850664A (zh) * | 2020-08-24 | 2020-10-30 | 昆山伟睿机电有限公司 | 一种太阳能电池片电镀夹具 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101713094A (zh) * | 2009-11-27 | 2010-05-26 | 深圳市五株电路板有限公司 | 印刷电路板电镀夹具 |
CN102776551A (zh) * | 2012-07-04 | 2012-11-14 | 中国电子科技集团公司第四十一研究所 | 一种硬质微带电路电镀夹具 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0368189A (ja) * | 1989-08-07 | 1991-03-25 | Mitsubishi Electric Corp | 印刷配線基板の電気めっき治具 |
JP3413185B2 (ja) * | 2000-11-15 | 2003-06-03 | 古河電気工業株式会社 | めっき用治具 |
-
2013
- 2013-11-13 CN CN201310603225.1A patent/CN103617962B/zh not_active Expired - Fee Related
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101713094A (zh) * | 2009-11-27 | 2010-05-26 | 深圳市五株电路板有限公司 | 印刷电路板电镀夹具 |
CN102776551A (zh) * | 2012-07-04 | 2012-11-14 | 中国电子科技集团公司第四十一研究所 | 一种硬质微带电路电镀夹具 |
Also Published As
Publication number | Publication date |
---|---|
CN103617962A (zh) | 2014-03-05 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PB01 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
TR01 | Transfer of patent right | ||
TR01 | Transfer of patent right |
Effective date of registration: 20190315 Address after: 266000 No. 98 Xiangjiang Road, Huangdao District, Qingdao City, Shandong Province Patentee after: CHINA ELECTRONICS TECHNOLOGY INSTRUMENTS Co.,Ltd. Address before: 266555 No. 98 Xiangjiang Road, Qingdao economic and Technological Development Zone, Shandong Patentee before: THE 41ST INSTITUTE OF CHINA ELECTRONICS TECHNOLOGY Group Corp. |
|
CP03 | Change of name, title or address | ||
CP03 | Change of name, title or address |
Address after: Huangdao Xiangjiang Road 266555 Shandong city of Qingdao Province, No. 98 Patentee after: CLP kesiyi Technology Co.,Ltd. Address before: 266000 No. 98 Xiangjiang Road, Huangdao District, Shandong, Qingdao Patentee before: CHINA ELECTRONICS TECHNOLOGY INSTRUMENTS Co.,Ltd. |
|
CF01 | Termination of patent right due to non-payment of annual fee | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20160817 |