200930501 六、發明說明： 【發明所屬之技術領域】 ▲本發明是關於-種玻璃板的端面研削裝置及其方法， 詳細地說’是_-種藉由使旋轉_石與玻璃板的端面 接觸’並_觸部供給研贿，且使磨石和玻璃板沿著 玻璃板的端面的長邊方向相對雜，從續玻璃板的端面 進行研削之技術。 【先前技術】 -眾，周知，在液晶顯示器、電絲示器、電致發光顯 不器和場發射顯示器等各種圖像顯示機器的製作時，現在 是採用所謂的多面成形的方法’對大制玻璃基板形成多 個顯示元件後，按照各顯示區域的每一區畫來進行分割。 因此，形成推進了玻璃工廠等所製造的玻璃基板的大型化 之現狀。 這些玻璃基板是藉由將成形後的原料玻璃切斷為矩 形狀及規定的大小後，對其切斷端面進行研削之處理等， 而得到玻璃基板製品。 這種玻璃基板的端面研削通常是在使旋轉狀態的磨 石接觸玻璃基板的端面之狀態下，使該磨石對玻璃基板在 '石者其端面的方向上進行相對移動而實施。此時，為了磨 石和玻璃基板的端面之接觸部（研削部）的冷卻或減輕 擦等’多數情況下要對研削部供給研削液。但是，對研 部所供給的研削液因為研削液的供給方向或磨石的 ^ 等’會飛散到玻璃基板的表面上，且該飛散的研削液中所 4 200930501 包含的切粉等會附著在玻璃基板的表面上，從而招致玻璃 基板的表面性狀惡化’或之後的清洗過程煩雜之事態。因 此，在這種端面研削裝置中要採取以下所示的對策了 W如，在下述的專利文獻1中揭示有—種這樣的研削 •方法，在大致保持垂直的玻璃基板的表面背面中的形成有 ' 電漿顯示面板的構成要素的面上’配置用於將位於玻璃基 板的垂直下方的磨石和前述構成要素之間進行遮蔽的遮蔽 〇 板，並在該狀態下，使磨石與應研削的割斷面相接觸，且 對磨石供給液體，並使所保持的玻璃基板沿著割斷面的長 邊方向移動，且使磨石旋轉而對割斷面進行研削。 專利文獻1 ··日本專利早期公開之特開2〇05_317235 號公報 然而，最近液晶顯示器或電漿顯示器等各種圖像顯示 器趨向高，細化’隨之對以PDP為代表的各種顯示器用玻 璃基板的高精細化要求也正在提高。為了對應這種要求， 〇 需要使玻璃基板的表面性狀更加良好，因此，不使供給到 研肖彳部的研肖彳液飛散到玻璃基板的表面上就成為至關重要 的問題。t 這裡，上述專利文獻1所揭示的遮蔽板形成平面形 狀，對成為研削對象的玻璃板的端面平行地配置在只隔開 規定距離的上方。對磨石和玻璃板的端面之接觸部所供給 - 的=削液，隨者磨石的旋轉和玻璃板的相對移動而從該接 • 觸。卩·向斜上方飛散並達到遮蔽板a繼而，到達遮蔽板的研 削液的大部分沿著遮蔽板而在與玻璃板的端面丰行的方向 200930501 上流動，在流速低下的位置因自重而流下，並由玻璃板的 下方落下。因此，在飛散的研削液到達遮蔽板並沿著遮蔽 板而在與玻璃板的端面平行的方向上流動之區域，研削液 容易通過遮蔽板和玻璃板之間的間隙而侵入至玻璃板的平 面中央側，即使設置同文獻的圖3所示的那種氣體供給喷 -嘴23，也難以有效地抑制研削液向玻璃板的平面中央側的 钕入。特別是在使玻璃板成為水平姿勢而進行加工的情況 > 下，上述的傾向顯著。而且，同文獻對供給到接觸部（研 削部）的研削液的回收並未特別考慮。 【發明内容】 鑒於以上問題，本發明的技術課題是在玻璃板的端面 研削過程中，有效地抑制研削液向玻璃板平面的飛散，而 且’謀求研削液的有效的回收。 刚述課題的解決是藉由本發明的玻璃板的研削裝置 而達成。亦即，該玻璃板的研削裝置為一種玻璃板的端面 研削裝置，包括：磨石，其藉由旋轉並與玻璃板的端面相 ’ 接觸，而對端面進行研削；研削液供給部，其對磨石和玻 璃板的端面之接觸部供給研削液；以及遮蔽板，其遮蔽玻 璃板的平面以免接觸到被供給到接觸部的研削液；該研削 裝置的特徵在於：遮蔽板具有從玻璃板的平面中央侧包圍 ^觸部之包圍部；包圍部的一端在較接觸部更靠近磨石的 _ 旋轉方向前方侧，與玻璃板的端面相交差並延伸。 如利用這種構成，則供給到接觸部的研削液在接觸部 的加工中發揮作用後，到達包圍接觸部的包圍部，並沿著 6 200930501 包圍部，被引導至在較接觸部更靠近磨石的旋轉方向前方 侧超過與玻璃板的端面相交差之位置的位置處。亦即，在 較接觸部更靠近磨石的旋轉方向前方侧，研削液沿著包圍 邛而從玻璃板的平面中央侧離開的方向上流動，並被引導 至超過玻璃板的端面之位置處。藉此，可有效地防止在接 觸部飛散的研削液流向玻璃板的平面中央侧並附著在平面 中央側上之問題。而且，研削液由包圍部而賦予流動的方 向性’也可將研削液有效地回收。 在這種情況下，包圍部在對玻璃板平面的平面視圖 下，具有沿著磨石的外周面之彎曲形狀較佳。 由於使包圍部為上述的形狀，所以可將到達包圍部的 研削液沿者磨石的旋轉方向而順利地進行引導，提高上述 的效果。 而且，包圍部除了採用位於玻璃板的一面侧之構成以 外’也可採用位於其兩面側之構成。 藉由使包圍部位於玻璃板的兩面侧而設置遮蔽板，可 在玻璃板的兩面上得到由包圍部所形成的上述作用。因 此，可將由該研削裝置所得到的玻璃板，作為高精細液晶 顯示器或電漿顯示器等的各種圖像顯示機器用的玻璃基板 而廣泛提供。 而且，在採用包圍部位於玻璃板的兩面侧之構成的情 況下，包圍部具有用於插通玻璃板的含有端面的一部分之 縫隙(slit)較佳。 藉由採用這種形狀，可由1個遮蔽板而構成位於玻璃 7 200930501 板的兩面侧之包圍部，以謀求構造的簡潔化。 而且’除了上述構成以外’也可制在挾持包圍部且 錢石相反儀位置上，設置翁淨化流_淨化嗔嘴之 構成。在這種情況下，淨化流體是供給到前述包圍部和玻 璃板之間的間隙中。 藉纟採用這種構成，要通過包圍部和玻璃板之間的間 隙而侵入到玻璃板的平面中央侧之研削液，藉由從淨化喷 ❾ 嘴喷出的淨化流體而被壓回到磨石侧。因此，可更加有效 地防止研削液向玻璃板的平面中央侧的附著。另外，這裏 所說的”淨化流體”包括水等液體、空氣等氣體，但從為了 將要通過包圍部和玻璃板之間的間隙而侵入到玻璃板的平 面中央侧之研削液壓回到磨石側，而賦予足夠的壓力之觀 點來看，以水等液體更佳。而且，該壓力可依據研削液的 供給量而適當地進行設定。 在這種情況下’對淨化喷嘴的設置角度進行設定，以 使淨化流體通過包圍部和玻璃板之間的間隙而到達玻璃板 ❹ 較佳。 藉由如上述那樣來設定淨化喷嘴的設置角度，則可利 用淨化流體’在較遮蔽板和玻璃板的間隙更靠近磨石的位 置將研削液壓回，能夠更加有效地防止研削液通過該間隙 而侵入到玻璃板的平面中央侧之問題。 而且，淨化喷嘴與遮蔽板的包圍部同樣，除了配置在 玻璃板的一面侧以外，也可配置在其兩面侧。 藉由採用這種構成，可在玻璃板的兩面側上得到由上 200930501 述淨化噴嘴所形成的作用相同之作用。 .•二=種情況下，也可使具有包固部的遮蔽板和 如像這樣被單元化，則即使在為了更換 #面研削裝置分解的情況下’也可在維 •::互的位置關係之狀態下，拆除該單元== 更換後的再組裝時，只需調整磨石和上述單 〇 即可，能夠縮短磨石的更換作業所需的時間。 、 板和淨化嘴嘴以外’也可使研削液供 也可使遮蔽板和研削液供給部及淨 採用上述構成的玻璃板的端面研削裝置，還具有至 2磨石和研舰供給部的罩雖Gusing)，該罩殼在規定 、端面上具有開口部，用於插通玻璃板的一部分， 璃板的端面可與磨石相接觸較佳。 〆 藉，用這種構成，可除了作為玻璃板的插通侧之開 二使磨石由罩殼所覆蓋。因此’可與上述遮蔽板 或淨化嘴嘴卿成的上述作用相互結合，更加確實地防止 研削液向玻璃板平面中央側的飛散。而且，由於磨石和研 削液供給部由罩殼來覆蓋，所以可利用包圍部，將沿著從 玻璃板遠離的方向而被引導的研難对漏猶行回收。 而且，上述構成的玻璃板的端面研削裝置特別適用於 使玻璃板成為水平姿勢以進行加工的情況。 、 另方面，前述課題的解決也是由本發明的玻璃板的 9 200930501 Ο ❹ 端面研削方法而達成。亦即，該玻璃板的研削方法是一種 藉由使磨石旋轉並與玻璃板的端面相接觸而進行端面的研 削之方法，疋在對磨石和玻璃板的端面之接觸部供給研削 液’且在設置用於遮蔽玻璃板的平面以與供給到接觸部的 研肖i液隔開的遮蔽板之狀態下，進行端面的研肖彳；該研削 方法的特徵在於，遮蔽板具有從玻璃板的平面中央侧包圍 接觸部的包圍部，而且，包圍部的—端在較接觸部更靠近 磨石的旋轉方向前方侧，與端面交差並延伸。 如利用這種方法，則適用與前面所說明的關於本發明 的玻璃板的研魏置之事項補的事項，所以可得到與該 裝置的作用效果相同的作用效果。 而且，在這種情況下，在挾持包圍部並與磨石相反侧 的位置上，配置喷射該淨化流體的淨化喷嘴，並對遮蔽板 和玻璃板之間的間隙供給淨化流體，這樣之構成較佳。 這樣，在上述的端面研削方法中，藉由設置上述供給 形，的淨化喷嘴，而適用與前面所說明的端面研銷裝^ 的淨化喷嘴之事項侧的事項，所以可制與該裝置 用效果相同的作用效果。 效的回收 如上所述，如利用本發明的玻璃板的研削裝置及其方 法’則在玻璃板的端面研削過程中，可盡可能地抑制研削 水向玻璃板的平面的錄。因此，可使玻璃板的表面性狀 良好’並謀求液晶顯示器或電漿顯示器等各種圖像顯示機 器用的顯示元件的高精細化。而且，賴謀求研削液的有 200930501 【實施方式】 以下參照附圖來對本發明的實施形態進行說明。 首先，根據圖1所示的平面圖，對關於本發明的一實 施形態之玻璃板的研削裝置的全體構成進行說明。另外， 纟本實施形態巾，是將對減顯示㈣的玻璃基板的端面 進行研削之情況作為例子進行說明。 如圖1所示，玻璃基板的端面研削裝置1是用於對從 0 成形後的原板玻璃所切出的玻璃基板2的端面2a(切斷面） 施行研削加工的裝置，配置在以水平姿勢沿著規定的方向 而搬運之玻璃基板2的一侧（或兩侧）。在這裏，該端面 研削裝置1包括：磨石3，其伴隨著旋轉而對沿著玻璃基 板2的搬運方向的一邊之端面2a進行研削；研削液供給噴 嘴5，其以磨石3和玻璃基板2的接觸部（研削部）4作為 基準而設置在磨石3的旋轉方向後方侧（在圖丨中可說成 是較接觸部更靠近右側的區域），並朝著接觸部4的周邊 而供給研削液（在這襄為純水）；後述的遮蔽板6;以及 ❾ 淨化噴嘴7。而且，在本實施形態中是採用這樣的構成’ 即：上述構成要素（磨石3、研削液供給噴嘴5、遮蔽板6 和淨化噴嘴7)收納在大致矩形形狀的罩殼8内，且可利 用該罩殼8的一端面上所設置的開口部8a，使玻璃基板2 的一部分插可遠到罩殼8内部’而且’可使與所插通的玻 璃基板2的一部分相關之端面2a與磨石3的外周面相接 觸。 磨石3採用一種在與玻璃基板2的平面相直交的轴平 11 200930501 行之轴系中旋轉的構成，其旋轉 =接觸部4)中，與玻壤基板===; 中的逆時針旋轉方向）。另外，成為研削面的： 石3的外周面3a採用例如圖4 磨 斷面輪廊形狀，並使朗基=端面成二:: 部可同時成R倒角配置。 07啕逢 研削液供給喷嘴5採用以破璃美杯 部4作為基準，從磨石3的^板2,磨石3的接觸 供給研削液之構成。_方向後方側，對接觸部4 遮蔽板6如圖2所示，具有沿著長邊方 =圓弧狀(包括圓弧狀)的部分，且該圓弧狀4 周圍之包圍部9。詳細地說，包圍部9在對玻璃 2 視的狀態下，如圖1所示，成為:著磨石3 ^周面^之大致狀m著其長邊方向具有寬 ❹ 板一二H隙10。而且在該缝隙10中插通玻璃基 板2的ϋ，並使插通部分的端面2a與磨石3相接觸之 狀態下’如圖4所示’包圍部9配置在較接觸部4更靠近 玻璃基板2的平面中央侧的位置處。而且，包圍部9的— 端以接觸部4為基準’在磨石3的旋轉方向前方侧（在圖 1中為接觸部4更左侧的區域）與玻璃基板2的端面2&交 差而延伸’而使遮蔽板6固定在罩殼8上。上述構成的包 圍部9是配置在玻璃基板2的表面背面兩方的平面侧。另 外’關於縫隙10的寬度尺寸，至少需要如上述那樣可插通 12 200930501 玻璃基板2之程度的大小，如果可以，考慮研削時的玻璃 基板2的差異（朝向板厚方向的振幅）而設定該寬度尺寸 較佳。 淨化喷嘴7在本實施形態中如圖3所示，採用使多個 • 噴制口部U集約而形成之噴嘴單元的構成，並挾持遮蔽 板6而設置在與磨石3相反側的位置上。在這裏，淨化喷 嘴7與遮蔽板6同樣具有用於插通玻璃基板2的缝隙，且 ❹ 在將該缝隙夹於其間而對向的-對斜面12、12上，沿著各 斜面=、12的長邊方向，多個喷嘴開口部^分別成一列 而配置。而且’這些喷嘴開口部11 一律指向相同方向而配 在淨化噴嘴7的斜面12、12間(縫隙)插通 2 分’並使該端面2a與磨石3相接觸之狀 夕個噴嘴開m所喷射的淨化水（例如純 ^形成窗簏=多個喷嘴開口部11和玻璃基板2的平面 缝痒、水壁。另外，關於在淨化喷嘴7上所設 〇據所插蔽板6的縫㈣同樣地，依 時的玻璃基板2的差異程度定較佳是也考慮研削 上的=淨詳？地嘴進 開口部u谁〜二地進仃說明。如圖5所示，對各喷嘴 水13被供給f從該噴嘴開口部11所喷射的淨化 板6的_巾：^處於接觸狀態之玻璃基板2和遮蔽 的淨化水^較佳是以使從喷嘴開口部U所喷射 子玻璃基板2的平面所形成之入射角0 ι大於 13 200930501 等於10度且小於等於45度，更佳是以使入射角θ i大於 於25度且小於等於35度之形態，而設定淨化喷嘴7 裝角度或喷嘴開口部的形成角度。其依據的理 、= 化水13在玻璃基板2平面上的著地點越接近磨石3 削液的>!_蘭高’另方面’為了避免與朗 2 的干涉使兩者間（玻璃基板2和淨化喷嘴7)的垂 向間隙盡可能大較佳。反之，因為上述的理由，淨化二 7的喷嘴開口部η以使淨化水13通過包圍部9和 板2間的間隙而到達玻璃基板2的平面之形態， 置角度進行設定較佳。 丹汉 ❹ 而且，在對玻璃基板2的平面進行平面視的狀態 細地說明淨化水13的向形態，如圖6所示，各嘴嘴口 部11是以使從該喷嘴開π部丨！所噴射的淨化水！二 地橫穿與磨石3處於接耻態的玻璃基板2的端面 未研削部分_向磨石3之形絲進行定向。換言之，b 以從喷嘴開π部11所喷射的淨化水13的噴出方向與磨2 3的接觸部4的切線方向v(旋轉方向前方侧。參照圖約 所形成之角度大於90度且小於18〇度的形態 喷嘴開口部11的定向角度。 认疋 ϊυ利用上述構成的裝置之玻璃基板的研削方 法18進行說明。另外，圖7是著眼於遮蔽 峨爾輸圖，圖8 固 、的作用而用於對該作用進行說明的要 部平面團。 200930501 首先’對遮蔽板6的作用進行說明。如圖7所示，在 研削時，朝向接觸部4的附近供給的研削液（圖7中以粗 箭頭符號表示）在到達接觸部4後，朝著其周圍飛散。此 時，接觸部4是由遮蔽板6上所設置的包圍部9包圍著， 所以向接觸部4的周圍飛散的研削液沿著包圍部9，被引 導至在較接觸部4更靠近磨石3的旋轉方向前方側，超出 與玻璃基板2的端面2a的交差位置之位置處。亦即，在從 ❹接觸4更靠近磨石3的旋轉方向前方侧，研削液沿著包 圍部9’在從玻璃基板2的平面中央側離開的方向上流動， 並被引導至超過玻璃基板2的端面2a之位置。藉此，可有 效地防止在接觸部4飛散的研削液流向玻璃基板2的平面 中央側並附著在平面中央侧上之問題。而且，研削液藉由 包圍部9而被賦予了流動的方向性，所以可有效地回收研 削液。 而且，如像本實施形態那樣’使包圍部9沿著磨石3 的外周面3a而大致形成圓弧狀，則可沿著磨石3的旋轉方 向而順利地對到達包圍部9的研削液進行引導，提高上述 ，效果而且’由於形成該形狀，從而在對玻璃基板2的 平面視的狀態下，在包圍部9和磨石3之間形成半徑方向 的對向間隔大致-定之流路，藉此也使研削液的送出可順 利地進行。 “接著，對淨化噴嘴7的作用進行說明，如圖8所示， 從淨化喷嘴7 (的噴嘴開口部）所喷射的淨化水13，由接 觸部4看是從斜前方側被供給到遮蔽板6和玻璃基板2的 15 200930501 間隙中。因此’要通過包圍部9和玻璃基板2之間的間隙 而侵入到玻璃基板2的平面上之研削液，藉由淨化水13 而被壓回到磨石3的一側。而且，從接觸部4向磨石3的 旋轉方向前方側飛散的研削液，減弱了向該飛散方向的勢 能，且改變其飛散方向（流動方向）而被引導至從玻璃基 板2遠離的方向。除此以外，對利用包圍部9而沿著從玻 璃基板2遠離的方向被引導之研削液，沿著促進包圍部9 所形成的引導之方向而進行壓入作用。藉此，可防止研削 液通過遮蔽板6和玻璃基板2的間隙而向玻璃基板2的平 面中央侧侵入之問題，且防止研削液通過該遮蔽板6和玻 璃基板2的間隙而向罩殼8的外部漏出之問題。 而且，藉由像本實施形態那樣設置用於收納磨石3或 研削液供給喷嘴5的罩殼8，從而除了形成玻璃基板2的 插通側之開口部8a以外，使磨石3由罩殼8覆蓋。因此， 與上述遮蔽板6所形成的遮蔽作用或上述淨化喷嘴7所形 成的淨化作用（排出作用）相乘地彼此作用，不只是防^ 研削液向玻璃基板2的平面中央侧的漏出，還可盡可能地 防止研削液向罩殼8外的漏出。而且，利用包圍部9，可 不洩漏地回收沿著從玻璃基板2遠離的方向而漏出的研削 液。藉此，可使在例如研削過程後的檢查過程中偵測困難 的微小玻璃微粒或砥粒殘渣殘存附著於玻璃板的平面上之 ^能性盡可祕接近於零，謀求上物示用面板的高精細 化。 以上，對本發明的一實施形態進行了說明，但關於本 ❹ ❹ 200930501 =的麵㈣端面研職置或其方法，當然可 的範園内任意地進行變更。 赞月 例如’在上述實施職中是使_部9的形狀為 分略呈圓弧狀而彎曲的形狀，但並不特別限定於此。 ^有作為包_ 9的機能，其形狀可為任意形狀。例如， 包圍部9可具有除了 狀以外的形狀，而且， j分地包含平坦的面’但省略圖示。或者，也可不只是^ ，上述長邊方向的雜，也可形絲著與長邊方向直交^ 方向（玻璃基板2的厚度方向）進行彎曲之形狀。 而且’關於在淨化喷嘴7上所形成的噴嘴開口部u =列形態’沒有必要使全部的喷嘴開σ部丨丨都配置在 璃基板2上，也可使並列的多個喷嘴開口部u的一部分以 玻璃基板2的端面2a為邊界而配置在磨石3的一侧 Ϊ署Ϊϋ實施形態中’在玻璃基板2的兩面侧成1列而 =多個喷嘴開口部U，但也可採用大於等於2列的多個 另外關於喷嘴開口部u的形狀，並不限定於圓孔 形狀，也可為例如縫隙狀。 並配述實施形態中，也可採用使分別單獨形成 =置的絲板6和淨化料7 —航的構^在這種情 =1’列舉琴樣的構成作為上述一體化（單元化）的一個 ★行板6上所設置的縫隙1G的磨石3侧的角 =仃倒棱化處理，並在沿著該_長邊方向的倒棱部上 並列配置例如圖3所示的多個喷嘴開口部π，但省略 丁如利用該構成’則可將對罩殼g上的安装構件集中為 17 200930501 1構件上，以提高對罩殼8的安錢度。當然，也可使遮 蔽板6或淨化喷嘴7分別與罩殼8 —體化。 ❹ ❹ 這裏，圖9所不為上述單元化的另外的構成例，具體 地說，所示為將遮蔽板、研削液供給喷嘴及淨化喷單元 化之防止研削液飛散單元2〇的立體圖。而且，圖1〇所示 為組入了上述防止研驗飛散單元2G之端面研削裝置的 要部平面圖。該防止研贿錄單元2()大致形成—體地具 有圖2所示的遮蔽板6之箱形形狀，且其側面上所設置的 包圍部9’形成利用縫隙1〇,而上下分割的形態。而且，在 與上述實施形_樣地，在該_ 1G’中插通朗基板2 的-部分，錢減部分_面2&錢她觸之狀態 :谁如圖1〇所示，為了使包圍部9,的一端以接觸部4為 基準而在磨石3的旋轉方向前方側（圖1() _為接觸部4 的更左侧區域）與玻璃基板2的端面2a交差並延伸，而在 例^圖i所示之形狀的罩殼8上固定著防止研削液飛散單 =〇。而且，在挾持包圍部9,並與磨石3相反的一側，配 噴嘴開π部：Π，(參㈣1G)，並以研削時可朝著玻 璃基板2的平面以喷射淨化水13之形態而 =單元2。内。另外，在該圖示例中，是二= 飛散早το 20的上部一體地設置研削液供給噴嘴5，，但也 ^代之以在下部設置研削液供給嘴嘴5,，或者在上部和下 部兩者分別都設置。 藉由採用這樣的構成，在磨石3的更換時，只裝卸該 防止研削液飛散單元20，即可進行磨石3的㈣。除此以 18 200930501 外’沒有必要重新調整修正研削液供給喷嘴5,或包圍部9, 及淨化喻嘴的喷嘴開口部11，相互間的位置關係，所以使 磨石3的更換所需的時間縮短。 而且’上述實施形態所示為在玻璃基板2的上下兩面 7配置遮蔽板6或淨化喷嘴7 (喷嘴開口部11)的情況， 仁沒有必要一疋要在兩面側配置，也可只在例如玻璃基板 2的上面側配置遮蔽板6和淨化喷嘴7中的一個或兩者。 ❹ 而且’此時為了只在玻璃基板2的一面侧配置遮蔽板6(包 圍部9)和淨化噴嘴7，也可採用使兩構成要素9、7單元 化的構成。 而且’以上所說明的玻璃基板的端面研削裝置1是配 置在玻璃基板2的兩側，但在對從原板玻璃所切出的玻璃 基板2的4邊的全部端面進行研削之情況下，也可採用這 樣的構成，# :在例如玻璃基板2的搬運線的相對上流側 的位置及下流侧的位置，沿著與該搬運方向直交的方向， 分別對向配置2台端面研削裝置卜而且，為了可利用同 4面研削裝置1而對應於玻璃基板2的尺寸變更等，也 可採用使端面養裝置1可沿著與搬運方向直交的方向進 行移動之構成。或者，也可採用只使磨石3等特定的構成 要素，在罩殼8内沿著搬運直交方向可相對地進行移動之 構成。 —另外’搬運裝置也可由傳送帶等的搬運裝置構成，但 =晨省略圖不H此時’也可採用—種利用真空吸附 等’將玻璃基板2 m定在構成搬運裝置的要素（例如皮帶） 19 200930501 的規定位置上之構成。當然，只要可在玻璃基板2和磨石 3之間進行相對移動，其構成是任意的，例如，也可採用 將玻璃基板2予以固定，並使含有磨石3的玻璃板的端面 研削裝置1可沿著玻璃基板2的排列方向進行移動之構成。 以上’以將本發明應用在液晶用顯示器用的玻璃基板 之研削過程中的情況作為例子進行了說明，但關於本發明 的玻璃板的研削裝置及其方法，除了應用於液晶顯示器用 〇 的玻璃基板以外，在對電漿顯示器、電致發光顯示器和場 發射顯示器等各種圖像顯示機器用的玻璃基板，或作為用 於形成各種電子顯示機能元件或薄膜的基材而使用的玻璃 基板那樣，要求高的面精度的玻璃板的端面進行研削時， 也可較佳地利用。 【圖式簡單說明】 圖1為關於本發明的一實施形態之玻璃基板的研削裝 置的平面圖。 圖2為構成玻璃基板的研削裝置之遮蔽板的立體圖。 圖3為構成玻璃基板的研削裝置之淨化噴嘴的要立 體圖。 圖4為圖1所示之玻璃基板的研削裝置的要部A_A 剖面圖。 圖5為用於說明淨化喷嘴在垂直方向上的定向形態之 研削裝置的要部擴大剖面圖。 〜 圖6所示為用於說明對玻璃基板進行平面視的狀態下 的淨化喷嘴的定向形態之研削裝置的要部擴大平面圖。 20 200930501 圖7所示為對遮蔽板的作用進行說明之研削裝置的要 部平面圖。 圖8為用於對淨化喷嘴的作用進行說明之研削裝置的 要部平面圖。 圖9為一體地具有遮蔽板和研削液供給噴嘴及淨化嘴 嘴之防止研削液飛散單元的立體圖。 要J二為具有防止研削液飛散單元之端面研削裴置的 【主要元件符號說明】 1 :端面研削裝置 2:玻璃基板 2a :端面 3 :磨石 3a :外周面 4 :接觸部 5、5’：研削液供給喷嘴 6 :遮蔽板 7:淨化喷嘴 8 :罩殼 8a :開口部 9、 9’ ：包圍部 10、 10’ ：缝隙 11、 11’ ：喷嘴開口部 12 :斜面 21 200930501 13 :淨化水 20 :防止研削液飛散單元 23 :氣體供給噴嘴 β 1 ·入射角 θ2:淨化水的喷射方向和端面的切線方向所形成的角200930501 VI. Description of the Invention: [Technical Field to Be Invented by the Invention] ▲ The present invention relates to an end face grinding device for a glass plate and a method thereof, and in detail, 'is a type by contacting a rotating_stone with an end face of a glass plate 'And the contact portion is supplied with a bribe, and the grindstone and the glass plate are relatively mixed along the longitudinal direction of the end face of the glass plate, and the technique of grinding from the end face of the continuous glass plate is performed. [Prior Art] - It is well known that in the production of various image display devices such as liquid crystal displays, electric wire displays, electroluminescence displays, and field emission displays, the so-called multi-face forming method is now used. After the glass substrate is formed into a plurality of display elements, the division is performed in accordance with each area of each display area. Therefore, the current situation of increasing the size of glass substrates manufactured by glass factories and the like has been achieved. These glass substrates are obtained by cutting the formed raw material glass into a rectangular shape and a predetermined size, and then grinding the cut end faces thereof to obtain a glass substrate product. The end surface grinding of such a glass substrate is usually carried out by bringing the grinding stone into contact with the end surface of the glass substrate in the state in which the glass substrate is relatively moved in the direction of the end face of the stone. At this time, the grinding portion and the contact portion (grinding portion) of the end surface of the glass substrate are cooled or lightened. In many cases, the grinding liquid is supplied to the grinding portion. However, the grinding fluid supplied to the grinding section is scattered on the surface of the glass substrate because the supply direction of the grinding fluid or the grindstone is scattered, and the cut powder contained in the scattered grinding fluid 4 200930501 adheres to On the surface of the glass substrate, the surface properties of the glass substrate are deteriorated' or the subsequent cleaning process is troublesome. Therefore, in the above-described end face grinding device, the following measures are taken. For example, in the following Patent Document 1, there is disclosed such a grinding method in which the formation of the surface of the glass substrate is maintained substantially perpendicularly. The 'surface on the constituent elements of the plasma display panel' is provided with a shielding slab for shielding the grindstone located vertically below the glass substrate from the above-mentioned constituent elements, and in this state, the grindstone and the grindstone should be ground. The cut sections are in contact with each other, and a liquid is supplied to the grindstone, and the held glass substrate is moved along the longitudinal direction of the cut section, and the grindstone is rotated to grind the cut section. However, recently, various image displays such as liquid crystal displays and plasma displays tend to be high, and refinement is followed by various glass substrates for displays represented by PDPs. The demand for high definition is also increasing. In order to cope with such a demand, it is necessary to further improve the surface properties of the glass substrate. Therefore, it is a critical issue that the shovel liquid supplied to the ridge portion is scattered on the surface of the glass substrate. In the above-mentioned Patent Document 1, the shielding plate is formed in a planar shape, and the end faces of the glass sheets to be ground are arranged in parallel above a predetermined distance. The = cutting liquid supplied to the contact portion of the end face of the grindstone and the glass plate is contacted by the rotation of the grindstone and the relative movement of the glass plate.卩·Floating upward and reaching the shielding plate a. Then, most of the grinding fluid reaching the shielding plate flows along the shielding plate in the direction 200930501 which is abundance with the end surface of the glass plate, and flows down due to its own weight at a position where the flow velocity is low. And dropped by the bottom of the glass plate. Therefore, in a region where the scattered grinding fluid reaches the shielding plate and flows along the shielding plate in a direction parallel to the end surface of the glass plate, the grinding fluid easily enters the plane of the glass plate through the gap between the shielding plate and the glass plate. On the center side, even if the gas supply nozzle-head 23 shown in Fig. 3 of the same document is provided, it is difficult to effectively suppress the penetration of the grinding liquid into the plane center side of the glass sheet. In particular, in the case where the glass sheet is processed in a horizontal posture, the above tendency is remarkable. Further, the recovery of the grinding fluid supplied to the contact portion (grinding portion) is not particularly considered in the same literature. SUMMARY OF THE INVENTION In view of the above problems, the technical problem of the present invention is to effectively suppress the scattering of the grinding fluid onto the plane of the glass sheet during the end surface grinding of the glass sheet, and to achieve efficient recovery of the grinding fluid. The solution to the problem just described is achieved by the grinding device for the glass plate of the present invention. That is, the grinding device of the glass plate is a glass plate end face grinding device, comprising: a grindstone which is ground by being rotated and in contact with an end surface of the glass plate; the grinding liquid supply portion is opposed a contact portion of the end face of the grindstone and the glass plate is supplied with the grinding fluid; and a shielding plate that shields the plane of the glass plate from contact with the grinding fluid supplied to the contact portion; the grinding device is characterized in that the shielding plate has a plane from the glass plate The center side surrounds the surrounding portion of the contact portion; one end of the surrounding portion is closer to the front side of the grinding stone in the _rotation direction than the contact portion, and intersects with the end surface of the glass plate and extends. According to this configuration, the grinding fluid supplied to the contact portion functions in the processing of the contact portion, reaches the surrounding portion surrounding the contact portion, and is guided to the surrounding portion at 6 200930501 to be closer to the grinding portion in the contact portion. The front side of the direction of rotation of the stone exceeds the position at which the end face of the glass plate intersects. That is, the grinding fluid flows in a direction away from the center side of the plane of the glass sheet, and is guided to a position beyond the end surface of the glass sheet, on the front side of the contact portion closer to the direction of rotation of the grindstone. Thereby, it is possible to effectively prevent the problem that the grinding fluid scattered at the contact portion flows toward the center side of the plane of the glass sheet and adheres to the center side of the plane. Further, the grinding fluid is imparted to the flow direction by the surrounding portion, and the grinding fluid can be efficiently recovered. In this case, the surrounding portion has a curved shape along the outer peripheral surface of the grindstone in a plan view of the plane of the glass plate. Since the surrounding portion has the above-described shape, the grinding liquid reaching the surrounding portion can be smoothly guided along the rotation direction of the grindstone, and the above-described effects can be enhanced. Further, the surrounding portion may be formed on both sides of the glass plate except for the configuration on the one side of the glass plate. By providing the shielding plate on the both sides of the glass plate, the above-described action by the surrounding portion can be obtained on both sides of the glass plate. Therefore, the glass plate obtained by the grinding device can be widely provided as a glass substrate for various image display devices such as a high-definition liquid crystal display or a plasma display. Further, in the case where the configuration in which the surrounding portion is located on both sides of the glass sheet is employed, it is preferable that the surrounding portion has a slit for inserting a part of the end surface of the glass sheet. By adopting such a shape, the surrounding portion on both sides of the glass 7 200930501 can be formed by one shielding plate, and the structure can be simplified. Further, 'in addition to the above-described configuration', it is also possible to provide a structure in which the enveloping portion and the position of the money stone counter-measurement are provided. In this case, the purifying fluid is supplied into the gap between the aforementioned surrounding portion and the glass plate. By adopting such a configuration, the grinding fluid that has entered the plane center side of the glass sheet by the gap between the surrounding portion and the glass plate is pressed back to the grindstone by the purifying fluid ejected from the purifying squirt nozzle. side. Therefore, the adhesion of the grinding liquid to the center side of the flat surface of the glass sheet can be more effectively prevented. In addition, the "purification fluid" as used herein includes a liquid such as water or a gas such as air, but returns to the grinding stone side from the grinding hydraulic pressure which is to enter the center side of the plane of the glass sheet through the gap between the surrounding portion and the glass sheet. From the standpoint of giving sufficient pressure, it is better to use a liquid such as water. Further, the pressure can be appropriately set depending on the supply amount of the grinding fluid. In this case, it is preferable to set the installation angle of the purge nozzle so that the purge fluid passes through the gap between the envelope portion and the glass sheet to reach the glass sheet. By setting the installation angle of the purge nozzle as described above, it is possible to use the purge fluid to hydraulically grind the grout at a position closer to the grindstone than the gap between the shield plate and the glass plate, and it is possible to more effectively prevent the grinding fluid from passing through the gap. The problem of intrusion into the center side of the plane of the glass sheet. Further, similarly to the surrounding portion of the shielding plate, the cleaning nozzle may be disposed on both sides of the glass plate. By adopting such a configuration, the same effect as that formed by the purification nozzle of the above 200930501 can be obtained on both sides of the glass sheet. • In the case of two, it is also possible to make the shielding plate with the covering portion and the unitized as in this case, even in the case of replacing the #face grinding device, it can be in the position of the dimension::: In the state of the relationship, the unit is removed. == When reassembling after replacement, it is only necessary to adjust the grindstone and the above-mentioned single crucible, and the time required for the replacement of the grindstone can be shortened. In addition to the plate and the purge nozzle, the grinding fluid can be supplied to the shield plate and the grinding fluid supply unit, and the end face grinding device of the glass plate having the above-described configuration can be used. Gusing), the casing has an opening portion on the predetermined end surface for inserting a part of the glass plate, and the end surface of the glass plate is preferably in contact with the grindstone.借 Borrowing, with this configuration, the grinding stone can be covered by the casing except for the opening side of the glass plate. Therefore, the above-described effects of the above-mentioned shielding plate or the cleaning nozzle can be combined with each other to more reliably prevent the grinding liquid from scattering toward the center side of the plane of the glass sheet. Further, since the grindstone and the grinding fluid supply portion are covered by the casing, it is possible to recover the leaking force guided along the direction away from the glass sheet by the surrounding portion. Further, the end face grinding device for the glass plate having the above configuration is particularly suitable for the case where the glass plate is placed in a horizontal posture for processing. On the other hand, the solution to the above problem is also achieved by the 9 200930501 端面 端面 end face grinding method of the glass plate of the present invention. That is, the grinding method of the glass plate is a method of grinding the end surface by rotating the grindstone and contacting the end surface of the glass plate, and supplying the grinding fluid to the contact portion of the end face of the grindstone and the glass plate. The end surface is slid in a state in which a plane for shielding the glass sheet is provided to be separated from the immersion liquid supplied to the contact portion; the grinding method is characterized in that the shielding plate has a glass plate The central side of the plane surrounds the surrounding portion of the contact portion, and the end of the surrounding portion is closer to the front side in the rotational direction of the grindstone than the contact portion, and intersects with the end surface and extends. According to this method, the matters relating to the addition of the glass plate of the present invention described above are applied, so that the same operational effects as those of the device can be obtained. Further, in this case, the purging nozzle that ejects the purifying fluid is disposed at a position on the side opposite to the grindstone and the purifying fluid is supplied to the gap between the shielding plate and the glass plate, so that the composition is good. As described above, in the above-described end face grinding method, by providing the purification nozzle of the supply shape, the matter on the side of the cleaning nozzle of the end face grinding device described above is applied, so that the effect of the device can be achieved. The same effect. Effective recovery As described above, the grinding apparatus and the method thereof using the glass sheet of the present invention can suppress the recording of the grinding water to the plane of the glass sheet as much as possible during the end surface grinding of the glass sheet. Therefore, the surface properties of the glass plate can be made good, and the display elements for various image display devices such as liquid crystal displays and plasma displays can be made high-definition. In addition, the embodiment of the present invention will be described below with reference to the drawings. First, the overall configuration of a polishing apparatus for a glass sheet according to an embodiment of the present invention will be described with reference to a plan view shown in Fig. 1. Further, in the present embodiment, the case where the end surface of the glass substrate of the display (4) is reduced is described as an example. As shown in Fig. 1, the end surface grinding device 1 for a glass substrate is a device for performing a grinding process on the end surface 2a (cut surface) of the glass substrate 2 cut from the original sheet glass formed by 0, and is disposed in a horizontal posture. One side (or both sides) of the glass substrate 2 carried along a predetermined direction. Here, the end face grinding device 1 includes a grindstone 3 that grinds an end surface 2a along one side in the conveyance direction of the glass substrate 2 with rotation, and a grinding liquid supply nozzle 5 which is a grindstone 3 and a glass substrate. The contact portion (grinding portion) 4 of the second portion is provided on the rear side in the rotation direction of the grindstone 3 (in the figure, the region closer to the right side than the contact portion), and is directed toward the periphery of the contact portion 4 The grinding liquid (here, pure water) is supplied; a shielding plate 6 to be described later; and a 净化 purification nozzle 7. In the present embodiment, the above-described components (the grindstone 3, the grinding fluid supply nozzle 5, the shielding plate 6, and the cleaning nozzle 7) are housed in a substantially rectangular casing 8 and can be accommodated. By using the opening portion 8a provided on one end surface of the casing 8, a part of the glass substrate 2 can be inserted far enough into the inside of the casing 8 and the end surface 2a associated with a part of the inserted glass substrate 2 can be The outer peripheral surface of the grindstone 3 is in contact. The grindstone 3 is configured to rotate in a shaft system that is orthogonal to the plane of the glass substrate 2, and rotates in the contact portion 4) and counterclockwise in the glass substrate ===; direction). Further, as the grinding surface: the outer peripheral surface 3a of the stone 3 is formed by, for example, the shape of the grinding wheel of the Fig. 4, and the Langji = end surface is formed into two: the portion can be arranged at the same time as the R chamfer. In the grinding liquid supply nozzle 5, the grinding liquid supply portion 5 is used as a reference, and the grinding liquid 3 is supplied from the contact plate 2 of the grindstone 3 and the grindstone 3. As shown in FIG. 2, the shielding portion 4 of the contact portion 4 has a portion along the long side = an arc shape (including an arc shape), and an enclosing portion 9 around the arc shape 4. More specifically, in the state in which the surrounding portion 9 is viewed from the glass 2, as shown in Fig. 1, the grinding stone 3 has a general shape of the circumferential surface, and has a wide ❹ plate-two H-gap 10 in the longitudinal direction thereof. . Further, in the slit 10, the cymbal of the glass substrate 2 is inserted, and the end surface 2a of the insertion portion is brought into contact with the grindstone 3, and the surrounding portion 9 is disposed closer to the glass than the contact portion 4 as shown in FIG. The position of the central side of the plane of the substrate 2 is. Further, the end of the surrounding portion 9 is extended on the front side in the rotational direction of the grindstone 3 (the region on the left side of the contact portion 4 in Fig. 1) with the end face 2& of the glass substrate 2 'The shielding plate 6 is fixed to the casing 8. The surrounding portion 9 having the above configuration is disposed on both sides of the front surface and the back surface of the glass substrate 2. In addition, the width dimension of the slit 10 needs to be at least the size of the glass substrate 2 of the 200930501 as described above, and if possible, the difference of the glass substrate 2 during the grinding (the amplitude in the thickness direction) is set. The width is preferred. In the present embodiment, as shown in FIG. 3, the cleaning nozzle 7 has a configuration in which a plurality of nozzle portions U are formed in a concentrated manner, and the shielding plate 6 is held and placed on the opposite side of the grinding stone 3. . Here, the cleaning nozzle 7 has a slit for inserting through the glass substrate 2 as well as the shielding plate 6, and the opposite slopes 12, 12 which are opposed to each other with the slit therebetween, along each slope = 12 In the longitudinal direction, a plurality of nozzle openings are arranged in a row. Further, 'the nozzle openings 11 are uniformly pointed in the same direction, and are disposed between the inclined faces 12 and 12 of the cleaning nozzle 7 (the slits are inserted 2 minutes), and the end faces 2a are in contact with the grindstone 3, and the nozzles are opened. The sprayed purified water (for example, the window 簏 = the plane of the plurality of nozzle openings 11 and the glass substrate 2 is itch, the water wall. In addition, regarding the slit of the masking plate 6 provided on the purification nozzle 7 (four) Similarly, the degree of difference in the glass substrate 2 in accordance with the time is preferably also considered in the grinding = the net details of the opening into the opening portion u and the second in the description. As shown in Fig. 5, the water for each nozzle 13 The glass substrate 2 and the shielded purified water which are supplied in the cleaning plate 6 to be ejected from the nozzle opening portion 11 are preferably such that the sub-glass substrate 2 is ejected from the nozzle opening portion U. The incident angle 0 ι formed by the plane is greater than 13 200930501 equal to 10 degrees and less than or equal to 45 degrees, more preferably in such a manner that the incident angle θ i is greater than 25 degrees and less than or equal to 35 degrees, and the cleaning nozzle 7 is set at an angle or a nozzle. The angle at which the opening is formed. According to the rationale, = water 13 is on the glass substrate 2 The closer the location on the plane is to the grindstone 3 >!_兰高'other aspect', in order to avoid interference with Lang 2, the vertical gap between the two (glass substrate 2 and purification nozzle 7) is as large as possible On the other hand, for the reason described above, the nozzle opening portion η of the cleaning unit 7 is configured such that the purified water 13 passes through the gap between the surrounding portion 9 and the plate 2 to reach the plane of the glass substrate 2, and the angle is preferably set. In the state in which the plane of the glass substrate 2 is viewed in a plan view, the shape of the purified water 13 is described in detail. As shown in Fig. 6, each mouth portion 11 is opened by the nozzle π! The sprayed purified water! The two sides traverse the end surface of the glass substrate 2 in which the grindstone 3 is in a sinister state, the unground portion _ is oriented toward the wire of the grindstone 3. In other words, b is ejected from the nozzle opening π portion 11. The discharge direction of the purified water 13 and the tangential direction v of the contact portion 4 of the mill 2 3 (the front side in the rotation direction). The angle formed by the nozzle opening portion 11 is greater than 90 degrees and less than 18 degrees. It is considered that the glass substrate of the apparatus constructed as described above is ground. The method of the shielding plate 6 will be described with reference to Fig. 7 for the purpose of shielding the Muir diagram and the function of Fig. 8 for the action. As shown in Fig. 7, at the time of grinding, the grinding liquid (indicated by a thick arrow symbol in Fig. 7) supplied to the vicinity of the contact portion 4 is scattered toward the periphery after reaching the contact portion 4. At this time, the contact portion 4 is The surrounding portion 9 is surrounded by the surrounding portion 9 provided on the shielding plate 6, so that the grinding fluid scattered around the contact portion 4 is guided along the surrounding portion 9 to the front side in the rotational direction of the grinding stone 3 closer to the contact portion 4. It is beyond the position of the intersection with the end surface 2a of the glass substrate 2. That is, the grinding liquid flows in the direction away from the center side of the plane of the glass substrate 2 along the surrounding portion 9' from the front side in the rotation direction closer to the grindstone 3 from the crucible contact 4, and is guided beyond the glass substrate 2 The position of the end face 2a. Thereby, the problem that the grinding fluid scattered in the contact portion 4 flows toward the center side of the plane of the glass substrate 2 and adheres to the center side of the plane can be effectively prevented. Further, since the grinding fluid is imparted with the flow direction by the surrounding portion 9, the grinding fluid can be efficiently recovered. Further, when the surrounding portion 9 is formed substantially in an arc shape along the outer peripheral surface 3a of the grindstone 3 as in the present embodiment, the grinding fluid that reaches the surrounding portion 9 can be smoothly formed along the rotational direction of the grindstone 3 By guiding, the above-described effect is improved, and the shape of the glass substrate 2 is formed in a state in which the glass substrate 2 is viewed in a plan view, and a flow path in the radial direction is formed between the surrounding portion 9 and the grindstone 3, and the flow path is substantially constant. Thereby, the delivery of the grinding fluid can be smoothly performed. Next, the action of the purge nozzle 7 will be described. As shown in FIG. 8, the purified water 13 sprayed from the nozzle opening of the purge nozzle 7 is supplied from the oblique front side to the shield plate as seen by the contact portion 4. 6 and 15 of the glass substrate 2 in the gap of 200930501. Therefore, the grinding liquid which invades the plane of the glass substrate 2 by the gap between the surrounding portion 9 and the glass substrate 2 is pressed back to the grinding by the purified water 13 In addition, the grinding fluid scattered from the contact portion 4 toward the front side in the rotation direction of the grindstone 3 weakens the potential energy in the scattering direction, and changes its scattering direction (flow direction) to be guided to the glass. In addition, the grinding liquid guided in the direction away from the glass substrate 2 by the surrounding portion 9 is pressed in the direction in which the guiding portion 9 is guided by the surrounding portion 9. Therefore, the problem that the grinding fluid penetrates into the plane center side of the glass substrate 2 through the gap between the shielding plate 6 and the glass substrate 2 can be prevented, and the grinding fluid is prevented from passing through the gap between the shielding plate 6 and the glass substrate 2 to the casing 8. External leakage Further, by providing the cover 8 for accommodating the grindstone 3 or the grinding fluid supply nozzle 5 as in the present embodiment, the grindstone 3 is made of the grindingstone 3 except for the opening portion 8a on the insertion side of the glass substrate 2. The cover 8 is covered. Therefore, the shielding effect formed by the shielding plate 6 or the cleaning action (discharging action) formed by the cleaning nozzle 7 acts on each other, not only the center of the plane of the glass substrate 2 The leakage of the side can prevent the leakage of the grinding fluid to the outside of the casing 8 as much as possible. Further, the surrounding portion 9 can recover the grinding fluid leaking along the direction away from the glass substrate 2 without leaking. The ability to adhere the fine glass particles or the ruthenium residue which is difficult to detect during the inspection process after the grinding process to the plane of the glass plate is close to zero, and the high-definition panel of the upper object is sought. Although an embodiment of the present invention has been described above, it is a matter of course that the surface (four) end face of the present invention or the method thereof can be arbitrarily changed within the scope of the model. In the above-mentioned embodiment, the shape of the _ portion 9 is curved in a circular arc shape, but is not particularly limited thereto. ^The function of the package _ 9 may be any shape. For example, for example. The surrounding portion 9 may have a shape other than the shape, and j may include a flat surface, but the illustration is omitted. Alternatively, the long side direction may be different from the long side direction. The direction of the orthogonal direction (the thickness direction of the glass substrate 2) is curved. Further, it is not necessary to arrange all the nozzle opening σ portions in the nozzle opening portion u = column form formed on the cleaning nozzle 7 In the substrate 2, a part of the plurality of nozzle openings u that are arranged in parallel may be disposed on the side of the grindstone 3 with the end surface 2a of the glass substrate 2 as a boundary, and in the embodiment, the two sides of the glass substrate 2 are formed. Although the number of the plurality of nozzle openings U is one row or more, the shape of the nozzle opening portion u may be two or more, and the shape of the nozzle opening portion u may not be limited to a circular hole shape, and may be, for example, a slit shape. In the above-described embodiment, it is also possible to adopt a configuration in which the silk plate 6 and the purifying material 7 are separately formed and arranged in the same manner as the above-mentioned integrated (unitized). An angle of the grindstone 3 side of the slit 1G provided on the row board 6 = a chamfering process, and a plurality of nozzles as shown in FIG. 3 are arranged side by side on the chamfered portion along the longitudinal direction The opening portion π, but omitting the configuration of the case, can be used to concentrate the mounting members on the casing g on the members of the 2009 20090501 1 to improve the cost of the casing 8. Of course, the shielding plate 6 or the cleaning nozzle 7 can also be formed separately from the casing 8. ❹ ❹ Here, FIG. 9 is not a separate configuration example of the above-described unitization, and specifically, a perspective view of the grinding-preventing liquid scattering unit 2〇 which is provided by the shielding plate, the grinding fluid supply nozzle, and the purification spray unit. Further, Fig. 1A is a plan view of the main part of the end face grinding device incorporating the above-described test preventing scattering unit 2G. The brood prevention preventing unit 2 () substantially has a box shape having the shielding plate 6 shown in FIG. 2, and the surrounding portion 9' provided on the side surface thereof is formed by the slit 1 〇 and the upper and lower division forms. . Moreover, in the form of the above-described embodiment, the - part of the slab 2 is inserted in the _1G', and the money minus part _ face 2 & money is touched by the state: who is shown in Fig. 1 ,, in order to surround One end of the portion 9 is extended on the front side in the rotation direction of the grindstone 3 ( FIG. 1 ( ) is the left side region of the contact portion 4 ) and extends on the end surface 2 a of the glass substrate 2 with reference to the contact portion 4 . The casing 8 of the shape shown in Fig. i is fixed to prevent the grinding fluid from flying alone. Further, on the side opposite to the grindstone 3, the nozzle is opened to the π portion: Π, (see (4) 1G), and the spray water 13 can be sprayed toward the plane of the glass substrate 2 during grinding. And = unit 2. Inside. Further, in the example of the figure, the grinding liquid supply nozzle 5 is integrally provided with the upper portion of the second = scattering early το 20, but the grinding liquid supply nozzle 5 is provided in the lower portion, or in the upper and lower portions. Both are set separately. According to this configuration, when the grinding stone 3 is replaced, only the grinding prevention liquid scattering unit 20 can be attached or detached, and (4) of the grindstone 3 can be performed. In addition to this, it is not necessary to re-adjust the correction grinding fluid supply nozzle 5, or the surrounding portion 9, and the nozzle opening portion 11 of the cleaning nozzle, so that the time required for the replacement of the grindstone 3 is not necessary. shorten. Further, in the above embodiment, the shielding plate 6 or the cleaning nozzle 7 (nozzle opening portion 11) is disposed on the upper and lower surfaces 7 of the glass substrate 2. The core is not necessarily disposed on both sides, and may be, for example, only a glass substrate. One or both of the shielding plate 6 and the purification nozzle 7 are disposed on the upper side of 2. In other words, in order to arrange the shielding plate 6 (the surrounding portion 9) and the cleaning nozzle 7 only on one surface side of the glass substrate 2, it is also possible to adopt a configuration in which the two constituent elements 9 and 7 are unitized. Further, the end surface grinding device 1 of the glass substrate described above is disposed on both sides of the glass substrate 2, but in the case of grinding all the end faces of the four sides of the glass substrate 2 cut out from the original plate glass, With this configuration, for example, in the position on the upstream side and the downstream side of the conveyance line of the glass substrate 2, two end face grinding devices are disposed opposite each other in a direction orthogonal to the conveyance direction, and The same type of face grinding device 1 can be used to change the size of the glass substrate 2, and the end face raising device 1 can be moved in a direction orthogonal to the conveyance direction. Alternatively, it is also possible to adopt a configuration in which only specific constituent elements such as the grindstone 3 are relatively movable in the casing 8 in the direction in which the conveyance is orthogonal. - In addition, the "transport device" may be constituted by a transport device such as a conveyor belt. However, if the map is omitted, the glass substrate 2 m may be used as an element (for example, a belt) constituting the transport device by vacuum adsorption or the like. 19 The composition of the specified position of 200930501. Of course, as long as the relative movement between the glass substrate 2 and the grindstone 3 is possible, the configuration is arbitrary. For example, an end face grinding device 1 for fixing the glass substrate 2 and making the glass plate containing the grindstone 3 may be employed. The structure can be moved along the arrangement direction of the glass substrate 2. The above description has been made by taking the case where the present invention is applied to a grinding process of a glass substrate for a liquid crystal display. However, the glass plate grinding apparatus and method of the present invention are applied to glass for liquid crystal display. In addition to the substrate, the glass substrate for various image display devices such as a plasma display, an electroluminescence display, and a field emission display, or a glass substrate used as a substrate for forming various electronic display functional elements or thin films, When the end surface of the glass plate requiring high surface precision is subjected to grinding, it can also be preferably used. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a plan view showing a polishing apparatus for a glass substrate according to an embodiment of the present invention. 2 is a perspective view of a shielding plate of a grinding device constituting a glass substrate. Fig. 3 is a perspective view of a purification nozzle of a grinding device constituting a glass substrate. Fig. 4 is a cross-sectional view showing a main part A_A of the polishing apparatus for the glass substrate shown in Fig. 1; Fig. 5 is an enlarged cross-sectional view of an essential part of a grinding device for explaining an orientation form of a purification nozzle in a vertical direction. [ Fig. 6] Fig. 6 is an enlarged plan view of a main part of a grinding device for explaining an orientation form of a purification nozzle in a state in which a glass substrate is viewed in a plan view. 20 200930501 Fig. 7 is a plan view showing the main part of the grinding device for explaining the action of the shielding plate. Fig. 8 is a plan view of a principal part of a grinding device for explaining the action of the purification nozzle. Fig. 9 is a perspective view of a grinding-preventing liquid scattering unit integrally provided with a shielding plate, a grinding fluid supply nozzle, and a cleaning nozzle. J is the main component symbol description of the end face grinding device for preventing the grinding fluid scattering unit. 1 : The end face grinding device 2: the glass substrate 2a: the end face 3: the grindstone 3a: the outer peripheral surface 4: the contact portion 5, 5' Grinding liquid supply nozzle 6 : shielding plate 7 : cleaning nozzle 8 : casing 8 a : opening portion 9 , 9 ′ : surrounding portion 10 , 10 ′ : slit 11 , 11 ′ : nozzle opening portion 12 : inclined surface 21 200930501 13 : purification Water 20: Grinding fluid scattering preventing unit 23: Gas supply nozzle β 1 · Incident angle θ2: Angle formed by the jetting direction of the purified water and the tangential direction of the end surface
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