TW200928230A - Vapour delivery system - Google Patents
Vapour delivery system Download PDFInfo
- Publication number
- TW200928230A TW200928230A TW097136933A TW97136933A TW200928230A TW 200928230 A TW200928230 A TW 200928230A TW 097136933 A TW097136933 A TW 097136933A TW 97136933 A TW97136933 A TW 97136933A TW 200928230 A TW200928230 A TW 200928230A
- Authority
- TW
- Taiwan
- Prior art keywords
- substance
- container
- rate
- evaporation
- processing chamber
- Prior art date
Links
- 238000012545 processing Methods 0.000 claims abstract description 76
- 238000001704 evaporation Methods 0.000 claims abstract description 71
- 230000008020 evaporation Effects 0.000 claims abstract description 54
- 239000007788 liquid Substances 0.000 claims abstract description 35
- 238000012544 monitoring process Methods 0.000 claims abstract description 16
- 239000000126 substance Substances 0.000 claims description 65
- 239000000463 material Substances 0.000 claims description 37
- 239000011344 liquid material Substances 0.000 claims description 24
- 230000008859 change Effects 0.000 claims description 16
- 238000000034 method Methods 0.000 claims description 15
- 239000011364 vaporized material Substances 0.000 claims description 8
- 238000010438 heat treatment Methods 0.000 claims description 7
- 239000000178 monomer Substances 0.000 claims description 7
- 239000012530 fluid Substances 0.000 claims description 5
- 238000009833 condensation Methods 0.000 claims description 3
- 230000005494 condensation Effects 0.000 claims description 3
- 238000005303 weighing Methods 0.000 claims description 3
- 230000004913 activation Effects 0.000 claims description 2
- 230000005684 electric field Effects 0.000 claims description 2
- 238000011160 research Methods 0.000 claims description 2
- 238000009832 plasma treatment Methods 0.000 claims 4
- 241001674044 Blattodea Species 0.000 claims 1
- 238000001816 cooling Methods 0.000 claims 1
- 238000009413 insulation Methods 0.000 claims 1
- 239000011248 coating agent Substances 0.000 description 10
- 238000000576 coating method Methods 0.000 description 10
- 239000012159 carrier gas Substances 0.000 description 4
- 238000012986 modification Methods 0.000 description 4
- 230000004048 modification Effects 0.000 description 4
- 239000004744 fabric Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000005086 pumping Methods 0.000 description 3
- 230000004888 barrier function Effects 0.000 description 2
- 210000000988 bone and bone Anatomy 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000009970 fire resistant effect Effects 0.000 description 2
- 230000006870 function Effects 0.000 description 2
- 239000010985 leather Substances 0.000 description 2
- 239000012712 low-vapor-pressure precursor Substances 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000011148 porous material Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 1
- 208000010392 Bone Fractures Diseases 0.000 description 1
- 241001122767 Theaceae Species 0.000 description 1
- 239000011149 active material Substances 0.000 description 1
- 230000002421 anti-septic effect Effects 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 230000008468 bone growth Effects 0.000 description 1
- NQZFAUXPNWSLBI-UHFFFAOYSA-N carbon monoxide;ruthenium Chemical group [Ru].[Ru].[Ru].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-] NQZFAUXPNWSLBI-UHFFFAOYSA-N 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000005323 electroforming Methods 0.000 description 1
- 230000002708 enhancing effect Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 230000002209 hydrophobic effect Effects 0.000 description 1
- 239000007943 implant Substances 0.000 description 1
- 230000000977 initiatory effect Effects 0.000 description 1
- 230000009878 intermolecular interaction Effects 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000001465 metallisation Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000013047 polymeric layer Substances 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 102000004169 proteins and genes Human genes 0.000 description 1
- 108090000623 proteins and genes Proteins 0.000 description 1
- 230000008439 repair process Effects 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
- C23C16/4485—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation without using carrier gas in contact with the source material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
- Nozzles (AREA)
- Plasma Technology (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GBGB0718686.9A GB0718686D0 (en) | 2007-09-25 | 2007-09-25 | Vapour delivery system |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW200928230A true TW200928230A (en) | 2009-07-01 |
Family
ID=38670462
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW097136933A TW200928230A (en) | 2007-09-25 | 2008-09-25 | Vapour delivery system |
Country Status (13)
| Country | Link |
|---|---|
| US (1) | US20100255181A1 (es) |
| EP (1) | EP2209930A1 (es) |
| JP (1) | JP2010540765A (es) |
| KR (1) | KR20100087127A (es) |
| CN (1) | CN101809189A (es) |
| AU (1) | AU2008303379B2 (es) |
| CA (1) | CA2699775A1 (es) |
| GB (2) | GB0718686D0 (es) |
| MX (1) | MX2010003142A (es) |
| NZ (1) | NZ584693A (es) |
| TW (1) | TW200928230A (es) |
| WO (1) | WO2009040536A1 (es) |
| ZA (1) | ZA201002836B (es) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8852693B2 (en) | 2011-05-19 | 2014-10-07 | Liquipel Ip Llc | Coated electronic devices and associated methods |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB0802687D0 (en) * | 2008-02-14 | 2008-03-19 | P2I Ltd | Vapour delivery system |
| US10954594B2 (en) * | 2015-09-30 | 2021-03-23 | Applied Materials, Inc. | High temperature vapor delivery system and method |
| TWI586823B (zh) * | 2016-11-25 | 2017-06-11 | Nat Chung-Shan Inst Of Science And Tech | Apparatus and method for quantifying the amount of solid matter deposited |
| CN113007086A (zh) * | 2021-04-30 | 2021-06-22 | 浙江慧勤医疗器械有限公司 | 一种用于蠕动泵的测试标定方法及装置 |
Family Cites Families (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4393013A (en) * | 1970-05-20 | 1983-07-12 | J. C. Schumacher Company | Vapor mass flow control system |
| JPS56108286A (en) * | 1979-11-01 | 1981-08-27 | Xerox Corp | Method of manufacturing photoreceptor |
| JPS61186471A (ja) * | 1985-02-12 | 1986-08-20 | Sumitomo Electric Ind Ltd | 真空蒸着装置及び蒸着原料用坩堝 |
| US5575854A (en) * | 1993-12-30 | 1996-11-19 | Tokyo Electron Limited | Semiconductor treatment apparatus |
| JPH09143737A (ja) * | 1995-11-22 | 1997-06-03 | Tokyo Electron Ltd | 成膜装置 |
| JP4096365B2 (ja) * | 1995-11-22 | 2008-06-04 | 東京エレクトロン株式会社 | 処理ガスの供給方法及びその装置 |
| JPH10135154A (ja) * | 1996-11-05 | 1998-05-22 | Fujitsu Ltd | 薄膜気相成長方法 |
| US5972117A (en) * | 1997-09-03 | 1999-10-26 | Applied Materials, Inc. | Method and apparatus for monitoring generation of liquid chemical vapor |
| US6135433A (en) * | 1998-02-27 | 2000-10-24 | Air Liquide America Corporation | Continuous gas saturation system and method |
| US6123765A (en) * | 1998-03-27 | 2000-09-26 | Mitsubishi Silicon America | Continuously fed single bubbler for epitaxial deposition of silicon |
| JP2000281694A (ja) * | 1999-03-29 | 2000-10-10 | Tanaka Kikinzoku Kogyo Kk | 有機金属気相エピタキシー用の有機金属化合物 |
| JP2000285810A (ja) * | 1999-03-30 | 2000-10-13 | Matsushita Electric Ind Co Ltd | 粉末原料気化供給装置 |
| JP4393677B2 (ja) * | 1999-09-14 | 2010-01-06 | 株式会社堀場エステック | 液体材料気化方法および装置並びに制御バルブ |
| JP4369608B2 (ja) * | 2000-10-13 | 2009-11-25 | 株式会社堀場エステック | 大流量気化システム |
| DE10111515A1 (de) * | 2001-02-19 | 2002-08-14 | Fraunhofer Ges Forschung | Plasma-Beschichtungsanlage, Plasma-Beschichtungsverfahren und Verwendung des Verfahrens |
| DE10297050T5 (de) * | 2001-07-16 | 2004-07-08 | Mks Instruments Inc., Andover | Dampfversorgungssystem |
| JP3828821B2 (ja) * | 2002-03-13 | 2006-10-04 | 株式会社堀場エステック | 液体材料気化供給装置 |
| US6790475B2 (en) * | 2002-04-09 | 2004-09-14 | Wafermasters Inc. | Source gas delivery |
| JP4567009B2 (ja) * | 2002-07-10 | 2010-10-20 | 東京エレクトロン株式会社 | 成膜装置及びこれに使用する原料供給装置 |
| JP2004228335A (ja) * | 2003-01-23 | 2004-08-12 | Sony Corp | 水蒸気酸化装置 |
| US6909839B2 (en) * | 2003-07-23 | 2005-06-21 | Advanced Technology Materials, Inc. | Delivery systems for efficient vaporization of precursor source material |
| JP4150356B2 (ja) * | 2004-05-13 | 2008-09-17 | 東京エレクトロン株式会社 | 成膜装置及び成膜方法 |
| US20070042119A1 (en) * | 2005-02-10 | 2007-02-22 | Larry Matthysse | Vaporizer for atomic layer deposition system |
| US7770448B2 (en) * | 2005-09-16 | 2010-08-10 | Air Liquide Electronics U.S. LP. | Chemical storage device with integrated load cell |
| US7680399B2 (en) * | 2006-02-07 | 2010-03-16 | Brooks Instrument, Llc | System and method for producing and delivering vapor |
-
2007
- 2007-09-25 GB GBGB0718686.9A patent/GB0718686D0/en not_active Ceased
-
2008
- 2008-09-25 WO PCT/GB2008/003257 patent/WO2009040536A1/en active Application Filing
- 2008-09-25 KR KR1020107008955A patent/KR20100087127A/ko not_active Application Discontinuation
- 2008-09-25 TW TW097136933A patent/TW200928230A/zh unknown
- 2008-09-25 NZ NZ584693A patent/NZ584693A/en not_active IP Right Cessation
- 2008-09-25 EP EP08806411A patent/EP2209930A1/en not_active Withdrawn
- 2008-09-25 AU AU2008303379A patent/AU2008303379B2/en not_active Expired - Fee Related
- 2008-09-25 JP JP2010525445A patent/JP2010540765A/ja active Pending
- 2008-09-25 CA CA2699775A patent/CA2699775A1/en not_active Abandoned
- 2008-09-25 GB GB1005208.2A patent/GB2465931B/en not_active Expired - Fee Related
- 2008-09-25 MX MX2010003142A patent/MX2010003142A/es not_active Application Discontinuation
- 2008-09-25 CN CN200880108668A patent/CN101809189A/zh active Pending
- 2008-09-25 US US12/733,792 patent/US20100255181A1/en not_active Abandoned
-
2010
- 2010-04-22 ZA ZA2010/02836A patent/ZA201002836B/en unknown
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8852693B2 (en) | 2011-05-19 | 2014-10-07 | Liquipel Ip Llc | Coated electronic devices and associated methods |
Also Published As
| Publication number | Publication date |
|---|---|
| GB2465931A (en) | 2010-06-09 |
| MX2010003142A (es) | 2010-06-30 |
| GB201005208D0 (en) | 2010-05-12 |
| JP2010540765A (ja) | 2010-12-24 |
| KR20100087127A (ko) | 2010-08-03 |
| EP2209930A1 (en) | 2010-07-28 |
| ZA201002836B (en) | 2011-06-29 |
| GB0718686D0 (en) | 2007-10-31 |
| US20100255181A1 (en) | 2010-10-07 |
| CA2699775A1 (en) | 2009-04-02 |
| AU2008303379B2 (en) | 2013-06-27 |
| GB2465931B (en) | 2013-03-27 |
| NZ584693A (en) | 2011-09-30 |
| AU2008303379A1 (en) | 2009-04-02 |
| WO2009040536A1 (en) | 2009-04-02 |
| CN101809189A (zh) | 2010-08-18 |
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