MX2010003142A - Sistema de suministro de vapor. - Google Patents

Sistema de suministro de vapor.

Info

Publication number
MX2010003142A
MX2010003142A MX2010003142A MX2010003142A MX2010003142A MX 2010003142 A MX2010003142 A MX 2010003142A MX 2010003142 A MX2010003142 A MX 2010003142A MX 2010003142 A MX2010003142 A MX 2010003142A MX 2010003142 A MX2010003142 A MX 2010003142A
Authority
MX
Mexico
Prior art keywords
species
container
processing chamber
delivery system
flow
Prior art date
Application number
MX2010003142A
Other languages
English (en)
Inventor
Fred Hopper
Original Assignee
P2I Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by P2I Ltd filed Critical P2I Ltd
Publication of MX2010003142A publication Critical patent/MX2010003142A/es

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4485—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation without using carrier gas in contact with the source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Nozzles (AREA)
  • Plasma Technology (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

Un sistema de suministro 10 para suministrar especies 12 a una cámara de procesamiento 14, para recubrir la superficie de un artículo grande, por ello imparte propiedades específicas a esto, que comprende: un contenedor de especies 16 para contener especies suministradas de una fuente 18 de especies líquidas; medios de evaporación 20 para evaporar la especie líquida en el contenedor; medios de guía del flujo 22, 24 para guiar el flujo de la especie evaporada a una cámara de procesamiento; y medios de monitoreo 28 para medir una velocidad durante el tiempo de evaporación de la especie del contenedor de manera que puede monitorearse el flujo de la especie evaporada suministrado a la cámara de procesamiento.
MX2010003142A 2007-09-25 2008-09-25 Sistema de suministro de vapor. MX2010003142A (es)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GBGB0718686.9A GB0718686D0 (en) 2007-09-25 2007-09-25 Vapour delivery system
PCT/GB2008/003257 WO2009040536A1 (en) 2007-09-25 2008-09-25 Vapour delivery system

Publications (1)

Publication Number Publication Date
MX2010003142A true MX2010003142A (es) 2010-06-30

Family

ID=38670462

Family Applications (1)

Application Number Title Priority Date Filing Date
MX2010003142A MX2010003142A (es) 2007-09-25 2008-09-25 Sistema de suministro de vapor.

Country Status (13)

Country Link
US (1) US20100255181A1 (es)
EP (1) EP2209930A1 (es)
JP (1) JP2010540765A (es)
KR (1) KR20100087127A (es)
CN (1) CN101809189A (es)
AU (1) AU2008303379B2 (es)
CA (1) CA2699775A1 (es)
GB (2) GB0718686D0 (es)
MX (1) MX2010003142A (es)
NZ (1) NZ584693A (es)
TW (1) TW200928230A (es)
WO (1) WO2009040536A1 (es)
ZA (1) ZA201002836B (es)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8852693B2 (en) 2011-05-19 2014-10-07 Liquipel Ip Llc Coated electronic devices and associated methods

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB0802687D0 (en) * 2008-02-14 2008-03-19 P2I Ltd Vapour delivery system
US10954594B2 (en) * 2015-09-30 2021-03-23 Applied Materials, Inc. High temperature vapor delivery system and method
TWI586823B (zh) * 2016-11-25 2017-06-11 Nat Chung-Shan Inst Of Science And Tech Apparatus and method for quantifying the amount of solid matter deposited
CN113007086A (zh) * 2021-04-30 2021-06-22 浙江慧勤医疗器械有限公司 一种用于蠕动泵的测试标定方法及装置

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US4393013A (en) * 1970-05-20 1983-07-12 J. C. Schumacher Company Vapor mass flow control system
JPS56108286A (en) * 1979-11-01 1981-08-27 Xerox Corp Method of manufacturing photoreceptor
JPS61186471A (ja) * 1985-02-12 1986-08-20 Sumitomo Electric Ind Ltd 真空蒸着装置及び蒸着原料用坩堝
US5575854A (en) * 1993-12-30 1996-11-19 Tokyo Electron Limited Semiconductor treatment apparatus
JPH09143737A (ja) * 1995-11-22 1997-06-03 Tokyo Electron Ltd 成膜装置
JP4096365B2 (ja) * 1995-11-22 2008-06-04 東京エレクトロン株式会社 処理ガスの供給方法及びその装置
JPH10135154A (ja) * 1996-11-05 1998-05-22 Fujitsu Ltd 薄膜気相成長方法
US5972117A (en) * 1997-09-03 1999-10-26 Applied Materials, Inc. Method and apparatus for monitoring generation of liquid chemical vapor
US6135433A (en) * 1998-02-27 2000-10-24 Air Liquide America Corporation Continuous gas saturation system and method
US6123765A (en) * 1998-03-27 2000-09-26 Mitsubishi Silicon America Continuously fed single bubbler for epitaxial deposition of silicon
JP2000281694A (ja) * 1999-03-29 2000-10-10 Tanaka Kikinzoku Kogyo Kk 有機金属気相エピタキシー用の有機金属化合物
JP2000285810A (ja) * 1999-03-30 2000-10-13 Matsushita Electric Ind Co Ltd 粉末原料気化供給装置
JP4393677B2 (ja) * 1999-09-14 2010-01-06 株式会社堀場エステック 液体材料気化方法および装置並びに制御バルブ
JP4369608B2 (ja) * 2000-10-13 2009-11-25 株式会社堀場エステック 大流量気化システム
DE10111515A1 (de) * 2001-02-19 2002-08-14 Fraunhofer Ges Forschung Plasma-Beschichtungsanlage, Plasma-Beschichtungsverfahren und Verwendung des Verfahrens
WO2003008085A2 (en) * 2001-07-16 2003-01-30 Mks Instruments, Inc. Vapor delivery system
JP3828821B2 (ja) * 2002-03-13 2006-10-04 株式会社堀場エステック 液体材料気化供給装置
US6790475B2 (en) * 2002-04-09 2004-09-14 Wafermasters Inc. Source gas delivery
JP4567009B2 (ja) * 2002-07-10 2010-10-20 東京エレクトロン株式会社 成膜装置及びこれに使用する原料供給装置
JP2004228335A (ja) * 2003-01-23 2004-08-12 Sony Corp 水蒸気酸化装置
US6909839B2 (en) * 2003-07-23 2005-06-21 Advanced Technology Materials, Inc. Delivery systems for efficient vaporization of precursor source material
JP4150356B2 (ja) * 2004-05-13 2008-09-17 東京エレクトロン株式会社 成膜装置及び成膜方法
US20070042119A1 (en) * 2005-02-10 2007-02-22 Larry Matthysse Vaporizer for atomic layer deposition system
US7770448B2 (en) * 2005-09-16 2010-08-10 Air Liquide Electronics U.S. LP. Chemical storage device with integrated load cell
US7680399B2 (en) * 2006-02-07 2010-03-16 Brooks Instrument, Llc System and method for producing and delivering vapor

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8852693B2 (en) 2011-05-19 2014-10-07 Liquipel Ip Llc Coated electronic devices and associated methods

Also Published As

Publication number Publication date
AU2008303379B2 (en) 2013-06-27
GB2465931A (en) 2010-06-09
JP2010540765A (ja) 2010-12-24
GB2465931B (en) 2013-03-27
GB0718686D0 (en) 2007-10-31
WO2009040536A1 (en) 2009-04-02
NZ584693A (en) 2011-09-30
CA2699775A1 (en) 2009-04-02
AU2008303379A1 (en) 2009-04-02
EP2209930A1 (en) 2010-07-28
CN101809189A (zh) 2010-08-18
GB201005208D0 (en) 2010-05-12
US20100255181A1 (en) 2010-10-07
KR20100087127A (ko) 2010-08-03
ZA201002836B (en) 2011-06-29
TW200928230A (en) 2009-07-01

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Legal Events

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