TW200829725A - Efficient gallium thin film electroplating methods and chemistries - Google Patents

Efficient gallium thin film electroplating methods and chemistries Download PDF

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Publication number
TW200829725A
TW200829725A TW096135964A TW96135964A TW200829725A TW 200829725 A TW200829725 A TW 200829725A TW 096135964 A TW096135964 A TW 096135964A TW 96135964 A TW96135964 A TW 96135964A TW 200829725 A TW200829725 A TW 200829725A
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TW
Taiwan
Prior art keywords
solution
gallium
citrate
group
obtaining step
Prior art date
Application number
TW096135964A
Other languages
English (en)
Chinese (zh)
Inventor
Aksu Serdar
Jia-Xiong Wang
Bulent M Basol
Original Assignee
Solopower Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Solopower Inc filed Critical Solopower Inc
Publication of TW200829725A publication Critical patent/TW200829725A/zh

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    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/54Electroplating: Baths therefor from solutions of metals not provided for in groups C25D3/04 - C25D3/50
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F10/00Individual photovoltaic cells, e.g. solar cells
    • H10F10/10Individual photovoltaic cells, e.g. solar cells having potential barriers
    • H10F10/16Photovoltaic cells having only PN heterojunction potential barriers
    • H10F10/167Photovoltaic cells having only PN heterojunction potential barriers comprising Group I-III-VI materials, e.g. CdS/CuInSe2 [CIS] heterojunction photovoltaic cells
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00Constructional details of devices covered by this subclass
    • H10F77/10Semiconductor bodies
    • H10F77/12Active materials
    • H10F77/126Active materials comprising only Group I-III-VI chalcopyrite materials, e.g. CuInSe2, CuGaSe2 or CuInGaSe2 [CIGS]
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/56Electroplating: Baths therefor from solutions of alloys
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • Y02E10/541CuInSe2 material PV cells

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Photovoltaic Devices (AREA)
TW096135964A 2006-09-27 2007-09-27 Efficient gallium thin film electroplating methods and chemistries TW200829725A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11/535,927 US7507321B2 (en) 2006-01-06 2006-09-27 Efficient gallium thin film electroplating methods and chemistries

Publications (1)

Publication Number Publication Date
TW200829725A true TW200829725A (en) 2008-07-16

Family

ID=39230522

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096135964A TW200829725A (en) 2006-09-27 2007-09-27 Efficient gallium thin film electroplating methods and chemistries

Country Status (7)

Country Link
US (2) US7507321B2 (enExample)
EP (1) EP2094882A4 (enExample)
JP (1) JP2010505045A (enExample)
KR (1) KR20090085583A (enExample)
CN (1) CN101528987A (enExample)
TW (1) TW200829725A (enExample)
WO (1) WO2008039736A1 (enExample)

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US20080175993A1 (en) * 2006-10-13 2008-07-24 Jalal Ashjaee Reel-to-reel reaction of a precursor film to form solar cell absorber
US20090183675A1 (en) * 2006-10-13 2009-07-23 Mustafa Pinarbasi Reactor to form solar cell absorbers
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US8225664B1 (en) * 2007-10-17 2012-07-24 Lsp Technologies Lamb waves for laser bond inspection
US8409418B2 (en) * 2009-02-06 2013-04-02 Solopower, Inc. Enhanced plating chemistries and methods for preparation of group IBIIIAVIA thin film solar cell absorbers
US8425753B2 (en) * 2008-05-19 2013-04-23 Solopower, Inc. Electroplating methods and chemistries for deposition of copper-indium-gallium containing thin films
US20090188808A1 (en) * 2008-01-29 2009-07-30 Jiaxiong Wang Indium electroplating baths for thin layer deposition
EP2128903B1 (en) * 2008-05-30 2017-02-22 ATOTECH Deutschland GmbH Electroplating additive for the deposition of a metal, a binary, ternary, quaternary or pentanary alloy of elements of group 11 (IB)-group 13 (IIIA)-group 16 (VIA)
US7951280B2 (en) * 2008-11-07 2011-05-31 Solopower, Inc. Gallium electroplating methods and electrolytes employing mixed solvents
WO2010065955A1 (en) * 2008-12-05 2010-06-10 Solopower, Inc. Method and apparatus for forming contact layers for continuous workpieces
US20100200417A1 (en) * 2009-02-04 2010-08-12 Impulse Devices, Inc. Method and Apparatus for Electrodeposition in Metal Acoustic Resonators
US20100213073A1 (en) * 2009-02-23 2010-08-26 International Business Machines Corporation Bath for electroplating a i-iii-vi compound, use thereof and structures containing same
WO2010126699A2 (en) 2009-04-29 2010-11-04 Hunter Douglas Industries B.V. Architectural panels with organic photovoltaic interlayers and methods of forming the same
US20110108115A1 (en) * 2009-11-11 2011-05-12 International Business Machines Corporation Forming a Photovoltaic Device
CN101805915A (zh) * 2010-04-20 2010-08-18 南开大学 一种电镀金属Ga和Ga合金的溶液体系及其制备方法
US8304272B2 (en) 2010-07-02 2012-11-06 International Business Machines Corporation Germanium photodetector
US20120055612A1 (en) 2010-09-02 2012-03-08 International Business Machines Corporation Electrodeposition methods of gallium and gallium alloy films and related photovoltaic structures
US8545689B2 (en) 2010-09-02 2013-10-01 International Business Machines Corporation Gallium electrodeposition processes and chemistries
US20120143046A1 (en) * 2010-12-03 2012-06-07 Stadler Bethanie J H Electro-chemical-deposition of galfenol and the uses therof
JP5552042B2 (ja) 2010-12-27 2014-07-16 インターナショナル・ビジネス・マシーンズ・コーポレーション プログラム解析の方法、システムおよびプログラム
ES2546065T3 (es) 2011-07-20 2015-09-18 Enthone Inc. Aparato para la deposición electroquímica de un metal
US9410259B2 (en) 2011-09-02 2016-08-09 Alliance For Sustainable Energy, Llc Electrodeposition of gallium for photovoltaics
CN102703928B (zh) * 2012-05-23 2015-04-01 中国科学院过程工程研究所 一种超声辅助强化电解提取金属镓的方法
CN103114316B (zh) * 2013-03-01 2015-10-28 沈阳师范大学 一种环境友好的镀镓用电镀液
CN103741185B (zh) * 2013-12-12 2017-01-04 深圳首创新能源股份有限公司 制备cigs吸收层的电镀生产线
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CN112779013B (zh) * 2020-12-31 2022-04-22 中国科学院苏州纳米技术与纳米仿生研究所 用于光电化学刻蚀氮化镓的刻蚀液
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Also Published As

Publication number Publication date
US7507321B2 (en) 2009-03-24
US20070272558A1 (en) 2007-11-29
WO2008039736A1 (en) 2008-04-03
JP2010505045A (ja) 2010-02-18
EP2094882A4 (en) 2010-02-24
KR20090085583A (ko) 2009-08-07
CN101528987A (zh) 2009-09-09
EP2094882A1 (en) 2009-09-02
US20090173634A1 (en) 2009-07-09

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