TW200825211A - Electroplating apparatus, electroplating method and plating jig - Google Patents

Electroplating apparatus, electroplating method and plating jig Download PDF

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Publication number
TW200825211A
TW200825211A TW096140697A TW96140697A TW200825211A TW 200825211 A TW200825211 A TW 200825211A TW 096140697 A TW096140697 A TW 096140697A TW 96140697 A TW96140697 A TW 96140697A TW 200825211 A TW200825211 A TW 200825211A
Authority
TW
Taiwan
Prior art keywords
anode plate
cathode
anode
plating
electronic component
Prior art date
Application number
TW096140697A
Other languages
English (en)
Chinese (zh)
Inventor
Yoko Nakabayashi
Original Assignee
Shinko Electric Ind Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shinko Electric Ind Co filed Critical Shinko Electric Ind Co
Publication of TW200825211A publication Critical patent/TW200825211A/zh

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Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/06Suspending or supporting devices for articles to be coated
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/007Current directing devices
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/16Apparatus for electrolytic coating of small objects in bulk
    • C25D17/22Apparatus for electrolytic coating of small objects in bulk having open containers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating Methods And Accessories (AREA)
TW096140697A 2006-11-15 2007-10-30 Electroplating apparatus, electroplating method and plating jig TW200825211A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006309608A JP4820736B2 (ja) 2006-11-15 2006-11-15 電解めっき装置及び電解めっき方法並びにめっき治具

Publications (1)

Publication Number Publication Date
TW200825211A true TW200825211A (en) 2008-06-16

Family

ID=39506168

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096140697A TW200825211A (en) 2006-11-15 2007-10-30 Electroplating apparatus, electroplating method and plating jig

Country Status (4)

Country Link
JP (1) JP4820736B2 (enExample)
KR (1) KR20080044162A (enExample)
CN (1) CN101240443B (enExample)
TW (1) TW200825211A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI385605B (zh) * 2009-12-30 2013-02-11 Univ Ishou Applicable to the fuzzy control teaching of the card plating device
TWI730206B (zh) * 2016-12-14 2021-06-11 日商荏原製作所股份有限公司 電解鍍覆裝置

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4164435B2 (ja) * 2003-11-05 2008-10-15 新光電気工業株式会社 電子部品用めっき治具及び電解めっき装置
CN102337577B (zh) * 2010-07-22 2014-03-12 富葵精密组件(深圳)有限公司 电镀装置
CN102080253B (zh) * 2010-12-23 2012-07-25 北大方正集团有限公司 电镀夹具及印制线路板电镀系统
CN102776551B (zh) * 2012-07-04 2015-11-25 中国电子科技集团公司第四十一研究所 一种硬质微带电路电镀夹具
JP6193005B2 (ja) * 2013-06-14 2017-09-06 Kyb株式会社 保持装置及びそれを備えた高速めっき装置
CN103436946A (zh) * 2013-08-01 2013-12-11 黄海 一种自动化电镀系统
CN104711656B (zh) * 2015-03-23 2017-06-06 河南理工大学 一种用于电镀平面薄片件的挂具
TW201720969A (zh) * 2015-12-14 2017-06-16 台灣先進系統股份有限公司 可調控式不溶性陽極板及其應用於銅柱電鍍之方法
CN107904632B (zh) * 2017-04-24 2020-05-12 张碧海 一种电镀设备
CN107287626A (zh) * 2017-08-11 2017-10-24 杭州帝洛森科技有限公司 一种防短路的阳极板及应用其的电解装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6890413B2 (en) * 2002-12-11 2005-05-10 International Business Machines Corporation Method and apparatus for controlling local current to achieve uniform plating thickness
JP4164435B2 (ja) * 2003-11-05 2008-10-15 新光電気工業株式会社 電子部品用めっき治具及び電解めっき装置
JP4164443B2 (ja) * 2003-11-26 2008-10-15 新光電気工業株式会社 電子部品用めっき治具及び電解めっき装置
JP2006193806A (ja) * 2005-01-17 2006-07-27 Matsushita Electric Ind Co Ltd めっき電極、めっき治具およびそれを用いた電子部品のめっき方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI385605B (zh) * 2009-12-30 2013-02-11 Univ Ishou Applicable to the fuzzy control teaching of the card plating device
TWI730206B (zh) * 2016-12-14 2021-06-11 日商荏原製作所股份有限公司 電解鍍覆裝置

Also Published As

Publication number Publication date
KR20080044162A (ko) 2008-05-20
JP2008121097A (ja) 2008-05-29
JP4820736B2 (ja) 2011-11-24
CN101240443B (zh) 2011-02-09
CN101240443A (zh) 2008-08-13

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