TW544475B - Device and method for continuous electroplating treatment - Google Patents

Device and method for continuous electroplating treatment Download PDF

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Publication number
TW544475B
TW544475B TW90132420A TW90132420A TW544475B TW 544475 B TW544475 B TW 544475B TW 90132420 A TW90132420 A TW 90132420A TW 90132420 A TW90132420 A TW 90132420A TW 544475 B TW544475 B TW 544475B
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Taiwan
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electroplating
area
electrode
electrolysis
plating
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TW90132420A
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Chinese (zh)
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Jr-Shiung Chen
Lian-Guei Jiang
Lung-Shi Li
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China Steel Corp
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Abstract

The present invention discloses a device and a method for a continuous electroplating treatment. The invented device includes: an electroplating tank having an electrolysis region and an electroplating region; a plurality of rollers for guiding a conductive plate sequentially through the electrolysis region and the electroplating region; a plurality of electrode plates located in pairs in the electrolysis region and the electroplating region, in which the electrodes in the electrolysis region and the electroplating region are switched at a specified time interval, thereby maintaining the distances between the electrode in the electrolysis region having a thickness increased along with process time, the electrode in the electroplating region having a thickness reduced along with process time, and the conductive plate.

Description

544475544475

本發明係有關於一種於連續電鍍處理之裝置及 4± j?,f ^ 人乃 /2:, .百關於一種在既定時間交換電解區及電鍍區之電極 1鍍處理之裝置及方法,藉此用以維持在電鍍過程中 ^ 時間而厚度增加的電解區電極以及隨著時間 少的Φ力ώ: r- & 4 /予度減 尾錄區電極和被電鍍物之間的距離。 傳統的金屬板片電鍍,尤其是鋼片的連續表面 例如鋼片表面鍍鋅(用於電鍍鋅鋼片)、鍍錫( ^ 鐵皮)、鉻(用於Tin Free Steel)及鍍鎳等。習, σ 4第1圖所示,浸泡於電鍍液中連續移動的鋼片3 〇 ί藉輥U、18、2〇、22接通到整流器1〇的負極輸出 、—^ 1流器1 〇的正極輸出端則連接至電極板1 2、1 4以 Ϊ Ϊ ΐ屬離子還原反應的電鑛。然1^該導電幸昆的表面必須 口,二鋼片接觸,因而經常造成鋼片表面的缺陷,影響產 :口扣質,例如摩擦印痕以及如CAROSEL·製程所特有的導曰電 輥痕(band mark)的問題。 針對上述問題,目前有提出兩種改善的方法, 輥轉速和鋼片行進的速度一致,以避免相 轉;維持導電輥表面乾淨,以避免污染物 供%从力片表苐二種方法則是使用酸或鹼液,將經電 鍍後的鋼片表面的鍍層做微蝕拋光處、 層外_的妯π ^ ^ , α玄除取表面鑛 曰卜觀的缺。然而由於無法完全不 或少影響產品的品質。 电靴仍或多 有釔於此,本發明提供一種新 性板片的裝置及方&,益須使用導雷/::鍍處理導電 ,,,、項便用導電輥,而藉由雙電偶電The invention relates to a device for continuous electroplating treatment and 4 ± j?, F ^ Renai / 2 :,... The invention relates to a device and method for electroplating treatment of electrodes 1 in the electrolysis area and electroplating area at a predetermined time. This is used to maintain the thickness of the electrode in the electrolytic zone that increases during the plating process, and to decrease the distance between the electrode in the tail region and the object to be plated. Traditional metal plate electroplating, especially the continuous surface of steel plate, such as galvanized steel plate (for galvanized steel plate), tin plated (^), chromium (for Tin Free Steel), and nickel plated. Xi, σ 4 As shown in the first figure, the steel sheet 3 continuously immersed in the electroplating bath is turned on by the rollers U, 18, 20, and 22 to the negative output of the rectifier 10, and the current converter 1 〇 The positive output terminal is connected to the electrode plate 1 2 and 1 4 for the ore reduction reaction of Ϊ Ϊ ΐ metal ion. However, the surface of the conductive Xingkun must have a mouth, and the two steel plates contact, so it often causes defects on the surface of the steel plate, which affects the production: the quality of the button, such as friction marks, and the electric roller marks that are unique to the CAROSEL · process ( band mark). In view of the above problems, there are currently two improved methods. The speed of the roller is consistent with the speed of the steel sheet to avoid phase rotation. The surface of the conductive roller is kept clean to avoid the supply of pollutants. The two methods are Using an acid or an alkaline solution, the plating layer on the surface of the steel sheet after electroplating is used as a micro-etched polishing place, and the outer layer is 妯 π ^ ^ ^. However, it cannot completely affect the quality of the product. The electric shoe still has more yttrium here. The present invention provides a novel plate device and a square plate. It is necessary to use a light guide / :: plating treatment to conduct electricity. Galvanic

544475 五、發明說明(2) 路(dipolar circui t)的設計佶仿仏Φ 、六说丄 誘發導電進行電解電鑛,可完吏全位避於 Λ 解Λ /電極板 品表面品質的問題。而且藉由將親而造成的產 電解區及後段電鍍區,可修補屌太邋φ μ價刀馬月』杈 β, „ ^ ^ ^^補原本導電性板片上的表面缺 户曰。並精由在既疋時間交換電解區及電鍍區之電極,用以 維持=過程中隨著時間而厚度增加的上述電解區電極 以及Ik者㈣而厚度減少的上述電鑛區電極 板片之間的距離。 1g 理偶電路的原s,提供-種連續電鍍處 理裝置’適用於導電性;I j 〒电「王槪月無接點式的電鍍處理,包括: ::鍍槽’具有電解區及電鍍區;複數個輥筒,用以引導 被處理之導電性板片先後通過上述電解區及上述電鍍區; 既定時間交換電解區及電鑛上”鍍區,並在 包方又ΙΗ£ <电極扳,藉此用姓 而厚度增力,上述電解區電極以及隨 者牯間而厗度減少的上述電鍍區電極和上 間的距離。其中,上述各成雙雷 t等尾&板片之 部,由Μ # 雙電極板之一者位於電鍍槽底 由稷數條狀所構成。此夕卜,本發明提 處理方法,該方法包括:提供一電鍍槽1有電J = 鑛區,提供上述電解區及上述電鑛區各至少—成 板,引導被處理之導電性板片先後 α 電鍍區的成雙電極板之中間·在既 =電解區及上述 區之電極和上述電鑛區之電極板,藉此以: = 程中隨著時間而厚度增加的 、、持在電鍍過 ;电解^電極以及隨著時間544475 V. Description of the invention (2) The design of the dipolar circui t (i.e., 仏, 丄, 丄, 丄) induces electricity to conduct electrolysis, which can completely avoid the problem of Λ solution / surface quality of the electrode plate. In addition, through the production of the electrolytic area and the electroplating area at the back, the repair can be repaired μ μ 邋 valent price 马 杈 β, „^ ^ ^ ^ repair the original surface of the conductive plate. The electrodes in the electrolysis zone and the electroplating zone are exchanged at the same time to maintain the distance between the electrode in the electrolytic zone that increases in thickness over time and the electrode plate in the electric mining zone that decreases in thickness over time. .1g of the original circuit of the coupler circuit, providing a continuous plating treatment device 'suitable for conductivity; I j 〒Dian "Wang Yueyue's non-contact type plating treatment, including: :: plating tank' with an electrolysis zone and a plating zone; A plurality of rollers are used to guide the processed conductive sheet through the above electrolysis zone and the above electroplating zone; exchange the electrolysis zone and the "plating zone on the power mine" at a predetermined time, and the electrode switch By this, the thickness is increased by the last name, and the distance between the electrode in the electrolytic zone and the electrode in the plated zone, which decreases with each other, decreases. Among them, each of the above-mentioned double-thickness tail plates is composed of one of the M # double electrode plates at the bottom of the plating tank and is composed of a plurality of strips. In addition, the present invention provides a processing method. The method includes: providing an electroplating tank 1 with electricity J = mining area, providing at least one each of the above electrolysis area and the above electricity mining area to form a board, and guiding the processed conductive plates successively. α In the middle of the double electrode plate in the electroplating area, in the electrode area of the electrolysis area and the above area and the electrode plate of the electric power area, so that: = the thickness increases with time in the process, and is held in the electroplating; electrolysis ^ Electrode and over time

544475 五、發明說明(3) :厚度減少的上述電鍍區電 離。其中,上述各成雙電極如上述導電性板片之間的距 :复數條狀所構成。再者 位於電鍍槽底部’由 形加工。 、電極之際可對電極進形整 為了讓本發明之上述目 ;文特舉出較佳實施例,並配合點y顯易懂, » 彳乍样細說明如 簡單圖式說明: :;圖係顯示習知電鍍之方法; 圖係顯不本發明解灰— 跡的示意圖;以月解“知技術中導電輥造成之痕 顯示雙電偶電路的原理圖; 圖; 不本發明之實施例連續電鍍裝置的剖面 示本發明之實施例的帶電圖; 第7圖係”、員不本發明之實施例的迴路圖,·以及 回“黑員示本發明之實施例之梦晋的μ、 交換電解區及電鍍區的電極之方法,置的上現圖’顯示 符號說明: 乃乞 1〜金屬導體; Γ二12、14、112、114、124、⑵〜電極. 4〜電鍍液; 电位, 5、1 Q、1 1 0〜整流器; 16 ' 18 ' 20、22〜導電輥;544475 V. Description of the invention (3): Ionization of the above plated area with reduced thickness. Wherein, the distance between each of the two double electrodes is formed by a plurality of strips, such as the distance between the conductive plates. Furthermore, it is located at the bottom of the plating tank and is machined. When the electrode is used, the electrode can be shaped in order to make the above purpose of the present invention; Wen specifically cited the preferred embodiment, and the point y is easy to understand. »彳 At first, a detailed description such as a simple diagram::; It shows the method of conventional electroplating; the figure shows the schematic diagram of the graying-out trace of the present invention; the principle diagram of the double galvanic circuit is shown with the mark of the conductive roller in the known solution; the figure; the embodiment of the present invention The cross-section of the continuous electroplating device shows the charged diagram of the embodiment of the present invention; FIG. 7 is a circuit diagram of the embodiment of the present invention; The method of exchanging the electrodes in the electrolysis area and the electroplating area. The above figure shows the description of the symbols: Nai 1 ~ metal conductor; Γ 二 12, 14, 112, 114, 124, ⑵ ~ electrode. 4 ~ electroplating solution; potential , 5, 1 Q, 1 1 0 ~ rectifier; 16 '18' 20, 22 ~ conductive roller;

0109-7449twf;reggie.ptd 第6頁 5444750109-7449twf; reggie.ptd p. 6 544475

五、發明說明(4) 30、1 30〜鋼片; 1〇〇〜金屬片; 101〜電鍍層; 1 0 2〜新的電鍍層 1 0 3〜缺陷; 1 2 2、1 2 0、1 1 6、11 8 〜輥筒; 1 4 0〜隔離板; 1 5 0〜電解液; 1 60〜電鍍槽; 901、902、903〜長條狀電極。 實施例V. Description of the invention (4) 30, 1 30 ~ steel sheet; 100 ~ metal sheet; 101 ~ electroplated layer; 102 ~ new plating layer 1 0 3 ~ defect; 1 2 2, 1 2 0, 1 16、11 8 ~ rollers; 140 ~ isolation plate; 150 ~ electrolyte; 960 ~ plating tank; 901, 902, 903 ~ long electrode. Examples

首先說明上述雙電偶電路的原理,參見第3圖,將-金屬導體1置放於電鍍液4中的電極2和3之間,使電極接 整流器5的正負極輸出端後,金屬導體丨靠近負極端3的^ 位被誘發&成帶正電,此處金屬將逐漸被電解溶出。而該 屬導體1靠近正極端2的部位被誘發成帶負電, = :金屬離子被電析出。電流係由整流器5正極輸出端二 電鍍槽的正極2,經由電鍍液4的傳導至金 =二 負極端,於此處進行電鍍作業。 找 、的誘^First, explain the principle of the above-mentioned double galvanic circuit. Referring to FIG. 3, the -metal conductor 1 is placed between the electrodes 2 and 3 in the plating solution 4, and the electrode is connected to the positive and negative output terminals of the rectifier 5, and the metal conductor 丨The ^ position near the negative terminal 3 is induced & positively charged, where the metal will be gradually dissolved out by electrolysis. The part of the metal conductor 1 near the positive terminal 2 is induced to be negatively charged, and =: metal ions are electrically precipitated. The current is transmitted from the positive terminal 2 of the rectifier 5 to the positive terminal 2 of the electroplating tank, and is conducted to the negative terminal of gold = 2 through the plating solution 4, and the electroplating operation is performed here. Looking for temptation ^

負極端流至正極端,經由電鍍液的;:金屬導體1 έ 到整流器5的負極輸出端完成一迴路。等至負極3,最後ί 本實施例係以表面具有導電輥 Mark)缺陷的電鍍鋅鋼片作為試片,风。之痕跡(Band 2〇g/cm2,以本發明之連續電鍍 ,=面鍍鋅量為 之衣置及方法去除部The negative terminal flows to the positive terminal and passes through the plating solution; the metal conductor 1 is pressed to the negative output terminal of the rectifier 5 to complete a loop. Wait until the negative electrode 3, and finally, in this embodiment, an electro-galvanized steel sheet having a conductive roller Mark defect on the surface is used as a test piece. Traces (Band 20 g / cm2, continuous plating according to the present invention, = surface galvanizing amount is the clothes placement and method removal section

544475 五、發明說明(5) 片表面缺陷。上述連锖雷拍;♦ 電鍍處理之裝置如第4圖所示,在 液150,而欲處理之鋼片乂6:’ #中儲存著電解 处心納月130疋經由輥筒122、120、116、 11 8而進出該連續電鍍處理槽。 m,在Λ電Λ槽160之中間以絕緣材料設置複數個隔離板 :’又槽16〇區隔成電解區Α以及電鍍區Β。該等隔 2二大2度並無特別限制。在AB兩區分別設置-套電 = 124、126以及112、u4,將欲處理之鋼片失在中間, :電極板126連接至整流器11〇的負極端,而電極“ =至^器110的正極端。同樣地,電極板124與ιι2亦 連接至未圖式的另一整流器而各帶負電極正電。 啟動U | ’上述裝置的帶電圖係如第5圖所示, H解區Α的電極板126帶有貞電,使接近該電極板的鋼片 130 ▼正電’而放出電子(Zn —zp + k );相反地,以 隔離板140相隔的另一區電鍍區㈣電極板114則帶正電, 使靠近開電極板的鋼片13〇呈負t,而 + 2e- — Zn )。544475 V. Description of the invention (5) Surface defects. The above-mentioned 锖 锖 thunder shot; ♦ As shown in Figure 4, the electroplating device is in the liquid 150, and the steel sheet to be processed 乂 6: '# stores the electrolysis core absorption 130 疋 through the rollers 122, 120, 116, 118, and into and out of the continuous plating treatment tank. m, a plurality of isolation plates are provided with an insulating material in the middle of the Λ electric Λ slot 160: 'and the slot 16 is divided into an electrolytic area A and a plating area B. There are no special restrictions on these intervals. Set in two areas of AB respectively-set of electricity = 124, 126 and 112, u4, the steel sheet to be processed is lost in the middle: the electrode plate 126 is connected to the negative terminal of the rectifier 110, and the electrode "= to the device 110" Positive end. Similarly, the electrode plates 124 and ι2 are also connected to another rectifier (not shown) and each has a negative electrode and is positively charged. Start U | 'The charging diagram of the above device is shown in Fig. 5, H zone A The electrode plate 126 is charged with electricity, so that the steel plate 130 close to the electrode plate is positively charged and emits electrons (Zn — zp + k); on the other hand, the other area is separated by the isolation plate 140. The electrode plate is an electrode plate. 114 is positively charged, so that the steel sheet 130 near the open electrode plate becomes negative t, and + 2e-Zn).

5又置隔離板14 〇的目的是:由於整個電極板以及鋼片 均位於電解液中,整個裝置的迴路圖如第6圖所示,AB* 另j代表電極板126及與其相對應的鋼片,而⑶則分別表示 =極板U4及與其相對應之鋼片;由於電子的流動可能在 、解液中進灯,也就是從A到D,此電子流動將減少在鋼片 上的電解電鍍反應,因此必須設置隔離板丨4〇,增加從A到 D的電阻,使反應集中在鋼片,也就是队之間。上述隔離5 The purpose of placing an isolation plate 14 is: because the entire electrode plate and the steel sheet are located in the electrolyte, the circuit diagram of the entire device is shown in Figure 6, and AB * and j represent the electrode plate 126 and the corresponding steel. And ⑶ respectively means = plate U4 and the corresponding steel plate; because the flow of electrons may enter the lamp in the solution, that is, from A to D, this electron flow will reduce the electrolytic plating on the steel plate Reaction, so it is necessary to set an isolation board, increase the resistance from A to D, so that the reaction is concentrated on the steel sheet, that is, between the teams. The above isolation

544475 五、發明說明(7) 根據上述本發明的連續電鍍處理裝置及方法,如第2 圖所不之金屬片100,其上形成有一電鍍層101,在該電鍍 層101上的缺陷103,可再被電解電鍍而重新形成一薄的電 顧[層1 0 2 ’原來的表面缺陷即可被移除而形成具有良好表 面品質的金屬片。 本么明之連續電錢處理裝置及方法並不限於處理鋼 =凡對具導電性的板片進行無接點式的電鍍處皆可利用 限定本發^發Γ已以較佳實施例揭露如上,然其並非用以 當;::::::=,在不脫離本發明之精神 範圍當視後附之申利J2潤飾,因此本發明之保護 甲。月專利耗圍所界定者為準。544475 V. Description of the invention (7) According to the above-mentioned continuous electroplating treatment device and method of the present invention, the metal sheet 100 shown in FIG. 2 has a plating layer 101 formed thereon, and the defects 103 on the plating layer 101 may be Then it is electrolytically electroplated to form a new thin layer [layer 1 0 2 '. The original surface defects can be removed to form a metal sheet with good surface quality. Ben Moming's continuous power money processing device and method are not limited to processing steel = any contactless electroplating place for conductive plates can be used to limit this hair ^ hair Γ has been disclosed as above with a preferred embodiment, However, it is not intended to be used as :::::: =, without departing from the spirit of the present invention, as the attached Shenli J2 retouch, so the protection of the present invention. The monthly patent consumption is defined.

0109-7449twf;reggie.ptd 第10頁0109-7449twf; reggie.ptd p. 10

Claims (1)

曰 人 -1 號 901324¾) α、申請專利範圍 銳 式的電:處ί 處理裝置,·用於“―『被接點 ::鍍槽,具有電解區及電鍍區; 後數個幸昆筒,用以引導 上逑電解區及上述電鍍區;以^,之導電性板片先後通過 並在:雷^位於上述電解區及上述電鑛區, 兄疋時間父換電解區及電鍍區之 .如申請專利範圍第i項所 ° 狀:ί:各成雙電極板之-者位於電鎪^ 其中之連續電鍍處理裝置, 式的電鍍處理J:處理方法’•用於導電性板片無接點 及上罢具有電解區及電鍍區,在上述電解區 上述電鍍區各設置至少一成雙電極板; 引導被處理之導雷性杯Uα 電錢區的成雙電極板 先後通過上述電解區及上述 慯 電極ΐ既定的時間交換上述電解區之電極和上述電鍍區之 5 專利範圍第4項所述之連續電鍍處理方法, 狀所構Ϊ 電極板之—者位於'電鍍槽底部,由複數條 6产:申請專利範圍第4項所述之連續電鍍處理方法, ^在父換電極之際可對電極進形整形加工。Said person-1 No. 901324¾) α, patent application sharp-type electric: processing unit, used for "―" contact point :: plating tank, with electrolysis area and electroplating area; the last few Xingkun tubes, It is used to guide the upper electrolysis area and the above electroplating area; the conductive plates with ^, pass through successively and are located in: Lei ^ is located in the above electrolysis area and the above-mentioned electric mining area, and the brother changes the electrolysis area and electroplating area. The scope of the application for the scope of the item i: State: ί: one of the two electrode plates is located in the electric plate ^ one of the continuous electroplating treatment devices, the type of electroplating treatment J: treatment method '• for conductive plates without contact The above has an electrolysis area and a plating area, and at least one bi-electrode plate is provided in each of the electro-plating areas and the electro-plating areas; the bi-electrode plates for guiding the processed lightning-conducting cup Uα electric money area pass through the electrolysis area and the above慯 Electrode: The electrode of the electrolysis zone is exchanged with the continuous electroplating method described in item 4 of the 5th patent scope of the above-mentioned electroplating zone for a predetermined time. The electrode plate is located at the bottom of the plating bath and is composed of a plurality of 6 Production: Patent Application The continuous plating method described in the fourth item of the scope, ^ can shape and shape the electrode when the parent changes the electrode. 〇l〇9-7449TWFl;ALEXLIN.pt 第11頁〇l〇9-7449TWFl; ALEXLIN.pt page 11
TW90132420A 2001-12-26 2001-12-26 Device and method for continuous electroplating treatment TW544475B (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114717623A (en) * 2022-02-07 2022-07-08 昆山鑫美源电子科技有限公司 Conductive film production equipment and production method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114717623A (en) * 2022-02-07 2022-07-08 昆山鑫美源电子科技有限公司 Conductive film production equipment and production method

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