TW200802359A - Thin film for optical information recording medium and process for producing the same - Google Patents
Thin film for optical information recording medium and process for producing the sameInfo
- Publication number
- TW200802359A TW200802359A TW095147420A TW95147420A TW200802359A TW 200802359 A TW200802359 A TW 200802359A TW 095147420 A TW095147420 A TW 095147420A TW 95147420 A TW95147420 A TW 95147420A TW 200802359 A TW200802359 A TW 200802359A
- Authority
- TW
- Taiwan
- Prior art keywords
- well
- recording medium
- information recording
- optical information
- thin film
- Prior art date
Links
- 230000003287 optical effect Effects 0.000 title abstract 2
- 239000010409 thin film Substances 0.000 title abstract 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 abstract 4
- 239000010408 film Substances 0.000 abstract 3
- 238000004519 manufacturing process Methods 0.000 abstract 2
- 238000004544 sputter deposition Methods 0.000 abstract 2
- 238000005477 sputtering target Methods 0.000 abstract 2
- 239000011787 zinc oxide Substances 0.000 abstract 2
- 150000001875 compounds Chemical class 0.000 abstract 1
- 239000013078 crystal Substances 0.000 abstract 1
- 238000000151 deposition Methods 0.000 abstract 1
- 230000008021 deposition Effects 0.000 abstract 1
- 239000000428 dust Substances 0.000 abstract 1
- 239000002245 particle Substances 0.000 abstract 1
- 230000001681 protective effect Effects 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
- 239000011701 zinc Substances 0.000 abstract 1
- 229910052725 zinc Inorganic materials 0.000 abstract 1
- -1 zinc chalcogenide Chemical class 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
- G11B7/242—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers
- G11B7/243—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising inorganic materials only, e.g. ablative layers
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/082—Oxides of alkaline earth metals
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
- G11B7/252—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers
- G11B7/257—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of layers having properties involved in recording or reproduction, e.g. optical interference layers or sensitising layers or dielectric layers, which are protecting the recording layers
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
- G11B7/252—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers
- G11B7/258—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of reflective layers
- G11B2007/2581—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of reflective layers based on aluminium
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
- G11B7/266—Sputtering or spin-coating layers
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02T—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO TRANSPORTATION
- Y02T50/00—Aeronautics or air transport
- Y02T50/60—Efficient propulsion technologies, e.g. for aircraft
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Physical Vapour Deposition (AREA)
- Manufacturing Optical Record Carriers (AREA)
- Compositions Of Oxide Ceramics (AREA)
- Optical Record Carriers And Manufacture Thereof (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003056911 | 2003-03-04 | ||
JP2003056935 | 2003-03-04 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200802359A true TW200802359A (en) | 2008-01-01 |
TWI336472B TWI336472B (zh) | 2011-01-21 |
Family
ID=32964880
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW095147420A TW200802359A (en) | 2003-03-04 | 2004-02-05 | Thin film for optical information recording medium and process for producing the same |
TW093102621A TW200417618A (en) | 2003-03-04 | 2004-02-05 | Sputtering target and process for producing the same, thin film for optical information recording medium and process for producing the same |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW093102621A TW200417618A (en) | 2003-03-04 | 2004-02-05 | Sputtering target and process for producing the same, thin film for optical information recording medium and process for producing the same |
Country Status (6)
Country | Link |
---|---|
EP (2) | EP1602746B1 (zh) |
JP (2) | JP3768230B2 (zh) |
KR (1) | KR100673263B1 (zh) |
CN (1) | CN100476017C (zh) |
TW (2) | TW200802359A (zh) |
WO (1) | WO2004079037A1 (zh) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4697404B2 (ja) * | 2005-04-18 | 2011-06-08 | 三菱マテリアル株式会社 | 光記録媒体保護膜形成用スパッタリングターゲット |
CN101208451B (zh) * | 2005-06-23 | 2010-06-16 | 日矿金属株式会社 | 溅射靶及光信息记录介质用薄膜 |
JP2007119289A (ja) * | 2005-10-27 | 2007-05-17 | Idemitsu Kosan Co Ltd | 酸化物粒子、焼結体及びそれらの製造方法 |
EP1977420A4 (en) * | 2006-01-23 | 2009-08-26 | Ricoh Kk | OPTICAL RECORDING MEDIUM |
WO2007105662A1 (en) * | 2006-03-10 | 2007-09-20 | Ricoh Company, Ltd. | Optical recording medium |
JP4697441B2 (ja) * | 2006-03-31 | 2011-06-08 | 三菱マテリアル株式会社 | 光記録媒体保護膜形成用スパッタリングターゲットの製造方法 |
KR100631400B1 (ko) * | 2006-06-29 | 2006-10-04 | 주식회사 아이피에스 | 상변화 메모리용 칼코제나이드막 증착 방법 |
CN101495666B (zh) * | 2006-07-27 | 2012-09-26 | Jx日矿日石金属株式会社 | 含锂过渡金属氧化物靶及其制造方法以及锂离子薄膜二次电池 |
CN103748055B (zh) * | 2012-07-09 | 2017-10-13 | 吉坤日矿日石金属株式会社 | 导电性氧化物烧结体及其制造方法 |
TWI582255B (zh) * | 2013-08-14 | 2017-05-11 | 光洋應用材料科技股份有限公司 | 用於光儲存媒體的介電濺鍍靶材及介電層 |
CN108178624A (zh) | 2018-01-03 | 2018-06-19 | 京东方科技集团股份有限公司 | 一种氧化物靶材及其制备方法、薄膜晶体管、显示装置 |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2695605B2 (ja) | 1992-12-15 | 1998-01-14 | 出光興産株式会社 | ターゲットおよびその製造方法 |
JP4092764B2 (ja) * | 1998-03-13 | 2008-05-28 | 住友金属鉱山株式会社 | ZnO系焼結体 |
JP2000026119A (ja) * | 1998-07-09 | 2000-01-25 | Hoya Corp | 透明導電性酸化物薄膜を有する物品及びその製造方法 |
JP4170454B2 (ja) | 1998-07-24 | 2008-10-22 | Hoya株式会社 | 透明導電性酸化物薄膜を有する物品及びその製造方法 |
JP3533333B2 (ja) * | 1998-08-21 | 2004-05-31 | Tdk株式会社 | 光記録媒体の干渉膜用スパッタリングターゲットおよびその製造方法 |
JP2000195101A (ja) * | 1998-12-28 | 2000-07-14 | Japan Energy Corp | 光ディスク保護膜及び同保護膜形成用スパッタリングタ―ゲット |
JP4560149B2 (ja) * | 1999-03-05 | 2010-10-13 | 出光興産株式会社 | 透明導電材料、透明導電ガラス及び透明導電フィルム |
JP3894403B2 (ja) * | 1999-07-01 | 2007-03-22 | 日鉱金属株式会社 | 光ディスク保護膜形成スパッタリングターゲット |
JP3915109B2 (ja) * | 1999-09-28 | 2007-05-16 | 三菱マテリアル株式会社 | 光記録媒体保護層形成用スパッタリングターゲット材 |
JP2001316804A (ja) * | 2000-05-08 | 2001-11-16 | Mitsubishi Materials Corp | 直流スパッタリング可能でかつ異常放電の少ない光記録保護膜形成用スパッタリングターゲット |
JP2002161359A (ja) * | 2000-11-22 | 2002-06-04 | Mitsubishi Materials Corp | 高出力スパッタ条件ですぐれた耐割損性を発揮する光記録媒体保護層形成用スパッタリングターゲット焼結材 |
JP2003099995A (ja) * | 2001-09-26 | 2003-04-04 | Ulvac Japan Ltd | 光ディスク用誘電体ターゲット及び成膜方法 |
JP4198918B2 (ja) * | 2002-02-14 | 2008-12-17 | 日鉱金属株式会社 | 硫化亜鉛を主成分とするスパッタリングターゲット及び該スパッタリングターゲットの製造方法 |
-
2004
- 2004-02-03 CN CNB2004800059781A patent/CN100476017C/zh not_active Expired - Lifetime
- 2004-02-03 WO PCT/JP2004/001050 patent/WO2004079037A1/ja active Application Filing
- 2004-02-03 EP EP04707631A patent/EP1602746B1/en not_active Expired - Lifetime
- 2004-02-03 JP JP2005502989A patent/JP3768230B2/ja not_active Expired - Lifetime
- 2004-02-03 KR KR1020057015760A patent/KR100673263B1/ko active IP Right Grant
- 2004-02-03 EP EP08165628A patent/EP2006412A1/en not_active Withdrawn
- 2004-02-05 TW TW095147420A patent/TW200802359A/zh not_active IP Right Cessation
- 2004-02-05 TW TW093102621A patent/TW200417618A/zh not_active IP Right Cessation
-
2005
- 2005-12-22 JP JP2005370366A patent/JP4260801B2/ja not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
KR100673263B1 (ko) | 2007-01-22 |
EP1602746A1 (en) | 2005-12-07 |
EP1602746B1 (en) | 2008-10-08 |
EP1602746A4 (en) | 2006-07-05 |
TW200417618A (en) | 2004-09-16 |
EP2006412A1 (en) | 2008-12-24 |
JPWO2004079037A1 (ja) | 2006-06-08 |
TWI301157B (zh) | 2008-09-21 |
CN1756858A (zh) | 2006-04-05 |
TWI336472B (zh) | 2011-01-21 |
JP4260801B2 (ja) | 2009-04-30 |
KR20050102146A (ko) | 2005-10-25 |
JP2006152443A (ja) | 2006-06-15 |
WO2004079037A1 (ja) | 2004-09-16 |
CN100476017C (zh) | 2009-04-08 |
JP3768230B2 (ja) | 2006-04-19 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
EP0735158B1 (en) | Sputtering target and its use in the production of an optical recording medium | |
TW200802359A (en) | Thin film for optical information recording medium and process for producing the same | |
CA1231527A (en) | Information recording and reproducing apparatus | |
EP0184412B1 (en) | Alloy having variable spectral reflectance and information recording material making use of the same | |
KR0179259B1 (ko) | 상변화형 광기록매체 및 그의 제조방법 | |
JP2760921B2 (ja) | 非磁性基板材及び磁気ヘッド | |
TW200517509A (en) | Sputtering target and optical information recording medium and manufacturing method thereof | |
JP2005154820A5 (zh) | ||
US5851628A (en) | Magnetic recording medium and method for manufacturing the same | |
EP0136801A2 (en) | Recording Material | |
JPS5972639A (ja) | 磁気ヘツドの製造方法 | |
EP1372148A3 (en) | Optical recording medium, process for manufacturing the same, sputtering target for manufacturing the same, and optical recording process using the same | |
EP2022871A3 (en) | Sputtering target, optical information recording medium and process for producing the same | |
MY142816A (en) | Substrate for information recording medium, information recording medium and process for producing the medium | |
JPS59172703A (ja) | 基板材料 | |
EP1380670A1 (en) | Zns-sio2 sputtering target and optical recording medium having zns-sio2 protective film for phase change type optical disk formed by using said target | |
EP1394284A1 (en) | Sputtering target for forming phase change optical disc protective film and optical recording medium having phase change optical disc protective film formed using that target | |
EP1429326B1 (en) | Sputtering target and production method therefor and optical recording medium formed with phase-change type optical disk protection film | |
EP1371747A1 (en) | Zns-sio 2 sputtering target and optical recording medium having zns-sio 2 phase-change type optical disc protective film formed through use of that target | |
JPH02257410A (ja) | 薄膜磁気ヘッド | |
JPH0775207B2 (ja) | 磁気ヘッド用基板材料 | |
JP2519004B2 (ja) | 浮上型磁気ヘッド用非磁性Mn−Zn単結晶フェライト | |
JPH01108711A (ja) | 薄膜ヘッド用非磁性基板材料 | |
JP3221035B2 (ja) | 磁気ヘッド | |
JPH0719400B2 (ja) | 光磁気記録媒体 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
GD4A | Issue of patent certificate for granted invention patent | ||
MK4A | Expiration of patent term of an invention patent |