TW200738072A - Ion balance adjusting method and method of removing charges from workpiece by using the same - Google Patents

Ion balance adjusting method and method of removing charges from workpiece by using the same

Info

Publication number
TW200738072A
TW200738072A TW095143578A TW95143578A TW200738072A TW 200738072 A TW200738072 A TW 200738072A TW 095143578 A TW095143578 A TW 095143578A TW 95143578 A TW95143578 A TW 95143578A TW 200738072 A TW200738072 A TW 200738072A
Authority
TW
Taiwan
Prior art keywords
workpiece
positive
charge removing
removing area
negative
Prior art date
Application number
TW095143578A
Other languages
English (en)
Chinese (zh)
Other versions
TWI326191B (enExample
Inventor
Toshio Sato
Satoshi Suzuki
Original Assignee
Smc Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Smc Corp filed Critical Smc Corp
Publication of TW200738072A publication Critical patent/TW200738072A/zh
Application granted granted Critical
Publication of TWI326191B publication Critical patent/TWI326191B/zh

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05F—STATIC ELECTRICITY; NATURALLY-OCCURRING ELECTRICITY
    • H05F3/00—Carrying-off electrostatic charges
    • H05F3/04—Carrying-off electrostatic charges by means of spark gaps or other discharge devices
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01T—SPARK GAPS; OVERVOLTAGE ARRESTERS USING SPARK GAPS; SPARKING PLUGS; CORONA DEVICES; GENERATING IONS TO BE INTRODUCED INTO NON-ENCLOSED GASES
    • H01T19/00—Devices providing for corona discharge
    • H01T19/04—Devices providing for corona discharge having pointed electrodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01T—SPARK GAPS; OVERVOLTAGE ARRESTERS USING SPARK GAPS; SPARKING PLUGS; CORONA DEVICES; GENERATING IONS TO BE INTRODUCED INTO NON-ENCLOSED GASES
    • H01T23/00—Apparatus for generating ions to be introduced into non-enclosed gases, e.g. into the atmosphere

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Elimination Of Static Electricity (AREA)
TW095143578A 2005-11-25 2006-11-24 Ion balance adjusting method and method of removing charges from workpiece by using the same TW200738072A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005340027A JP4910207B2 (ja) 2005-11-25 2005-11-25 イオンバランス調整方法及びそれを用いたワークの除電方法

Publications (2)

Publication Number Publication Date
TW200738072A true TW200738072A (en) 2007-10-01
TWI326191B TWI326191B (enExample) 2010-06-11

Family

ID=38037958

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095143578A TW200738072A (en) 2005-11-25 2006-11-24 Ion balance adjusting method and method of removing charges from workpiece by using the same

Country Status (6)

Country Link
US (1) US7586731B2 (enExample)
JP (1) JP4910207B2 (enExample)
KR (1) KR100853726B1 (enExample)
CN (1) CN1972551B (enExample)
DE (1) DE102006055121B4 (enExample)
TW (1) TW200738072A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI413456B (zh) * 2008-02-28 2013-10-21 Smc Kk 離化器、靜電去除系統、離子平衡調整方法及工件靜電去除方法

Families Citing this family (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100759587B1 (ko) * 2005-04-19 2007-09-17 (주)선재하이테크 막대형 이오나이저
JP5097514B2 (ja) * 2007-11-22 2012-12-12 国立大学法人東京工業大学 ワイヤ電極式イオナイザ
JP5299989B2 (ja) * 2007-12-06 2013-09-25 ヒューグルエレクトロニクス株式会社 イオナイザ
KR100944078B1 (ko) * 2008-01-28 2010-02-24 한국원자력연구원 이온 발생 장치 및 이온 발생 방법
JP5201338B2 (ja) * 2008-07-08 2013-06-05 Ｓｍｃ株式会社 イオナイザ
KR101258760B1 (ko) 2008-08-01 2013-04-29 샤프 가부시키가이샤 이온 발생 유닛 및 조명 장치
JP5336949B2 (ja) * 2009-06-30 2013-11-06 サントリーホールディングス株式会社 樹脂製容器の帯電除去方法、樹脂製容器の殺菌充填方法、樹脂製容器の充填キャッピング方法、樹脂製容器の帯電除去装置および樹脂製容器の殺菌充填システム
JP5435423B2 (ja) 2009-12-09 2014-03-05 Ｓｍｃ株式会社 イオナイザ及び除電方法
CN101969736A (zh) * 2010-11-03 2011-02-09 北京聚星创源科技有限公司 离子发生系统及控制离子平衡度的方法
CN103250312A (zh) 2010-12-07 2013-08-14 3M创新有限公司 用于离子平衡测量和调节的具有隔离的电容器电路的离子化平衡装置
US9404945B2 (en) 2011-12-08 2016-08-02 Desco Industries, Inc. Ionization monitoring device
JP5945928B2 (ja) * 2012-03-30 2016-07-05 Smc株式会社 電荷発生装置
DE102012207219B4 (de) 2012-04-30 2017-11-23 Gema Switzerland Gmbh Antistatikvorrichtung und zugehöriges Betriebsverfahren
WO2014168160A1 (ja) 2013-04-11 2014-10-16 株式会社コガネイ イオン発生器
CN103354693A (zh) * 2013-06-14 2013-10-16 苏州天华超净科技股份有限公司 静电消除系统
WO2015076155A1 (ja) * 2013-11-20 2015-05-28 株式会社コガネイ イオン発生器
US11337783B2 (en) * 2014-10-22 2022-05-24 Ivoclar Vivadent Ag Dental machine tool
US10251251B2 (en) * 2016-02-03 2019-04-02 Yi Jing Technology Co., Ltd Electrostatic dissipation device with static sensing and method thereof
US10548206B2 (en) * 2017-09-05 2020-01-28 International Business Machines Corporation Automated static control
JP7101239B2 (ja) 2018-03-13 2022-07-14 株式会社エー・アンド・デイ 電子天びん、および電子天びんの除電方法
JP6740299B2 (ja) * 2018-08-24 2020-08-12 ファナック株式会社 加工条件調整装置及び機械学習装置
KR102346822B1 (ko) * 2019-09-17 2022-01-04 (주)선재하이테크 이온 밸런스의 감시 및 이온 밸런스의 자동 조정 기능을 구비한 바 타입 이오나이저
KR102295099B1 (ko) 2019-10-04 2021-08-31 한국전자기술연구원 이온밸런스 측정센서 및 그 측정방법, 이온밸런스 측정센서를 이용한 이온밸런스 조절장치 및 그 조절방법
KR102382561B1 (ko) * 2020-02-21 2022-04-04 에스케이하이닉스 주식회사 이온 발생기의 모니터링 장치 및 시스템
JP7433719B2 (ja) * 2020-04-10 2024-02-20 株式会社ディスコ 加工装置
WO2022092376A1 (ko) * 2020-11-02 2022-05-05 한국전자기술연구원 이온밸런스 측정센서 및 그 측정방법, 이온밸런스 측정센서를 이용한 이온밸런스 조절장치 및 그 조절방법
KR20230000757A (ko) * 2021-06-25 2023-01-03 (주)선재하이테크 광 이오나이저
US11785697B2 (en) * 2022-01-07 2023-10-10 Universal City Studios Llc Systems and methods for monitoring electrostatic buildup for an attraction system
TWI858502B (zh) * 2023-01-11 2024-10-11 有銳有限公司 用於靜電消除設備的離子平衡監控系統與其運作方法

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4630167A (en) * 1985-03-11 1986-12-16 Cybergen Systems, Inc. Static charge neutralizing system and method
DE3603947A1 (de) 1986-02-06 1987-08-13 Stiehl Hans Henrich Dr System zur dosierung von luftgetragenen ionen mit hoher genauigkeit und verbessertem wirkungsgrad zur eliminierung elektrostatischer flaechenladungen
US4951172A (en) * 1988-07-20 1990-08-21 Ion Systems, Inc. Method and apparatus for regulating air ionization
JPH0612718B2 (ja) 1990-03-14 1994-02-16 春日電機株式会社 除電器のイオンバランス制御装置
JP2894464B2 (ja) 1992-01-16 1999-05-24 高砂熱学工業株式会社 イオナイザによる帯電物品の除電制御法
US5750011A (en) * 1992-08-14 1998-05-12 Tadahiro Ohmi Apparatus and method for producing gaseous ions by use of x-rays, and various apparatuses and structures using them
JP4020475B2 (ja) 1997-10-24 2007-12-12 株式会社キーエンス 除電装置
US6252756B1 (en) 1998-09-18 2001-06-26 Illinois Tool Works Inc. Low voltage modular room ionization system
US6252233B1 (en) 1998-09-18 2001-06-26 Illinois Tool Works Inc. Instantaneous balance control scheme for ionizer
JP2003068497A (ja) 2001-08-29 2003-03-07 Kasuga Electric Works Ltd 直流除電器の制御方法及び制御装置
JP4058273B2 (ja) * 2002-01-22 2008-03-05 株式会社Ｔｒｉｎｃ 静電位イオンバランス測定器および除電装置
US6873515B2 (en) 2002-04-17 2005-03-29 United Microelectronics Corp. Method for preventing electrostatic discharge in a clean room
JP2004063427A (ja) 2002-07-31 2004-02-26 Sunx Ltd 除電装置
US20050052815A1 (en) 2003-09-09 2005-03-10 Smc Corporation Static eliminating method and apparatus therefor
JP4184213B2 (ja) * 2003-09-25 2008-11-19 修二 高石 イオン発生量制御方法及びイオナイザー

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI413456B (zh) * 2008-02-28 2013-10-21 Smc Kk 離化器、靜電去除系統、離子平衡調整方法及工件靜電去除方法
US8885316B2 (en) 2008-02-28 2014-11-11 Smc Kabushiki Kaisha Ionizer, static charge eliminating system, ion balance adjusting method, and workpiece static charge eliminating method

Also Published As

Publication number Publication date
JP4910207B2 (ja) 2012-04-04
CN1972551B (zh) 2011-05-04
US20070133145A1 (en) 2007-06-14
TWI326191B (enExample) 2010-06-11
KR100853726B1 (ko) 2008-08-22
US7586731B2 (en) 2009-09-08
KR20070055393A (ko) 2007-05-30
CN1972551A (zh) 2007-05-30
DE102006055121B4 (de) 2018-11-29
DE102006055121A1 (de) 2007-05-31
JP2007149419A (ja) 2007-06-14

Similar Documents

Publication Publication Date Title
JP2009163951A5 (enExample)
TW200633013A (en) Plasma ion implantation system with axial electrostatic confinement
TW200514479A (en) Static-charge eliminating method and apparatus therefor
TW200744782A (en) Multi-frequency static neutralization
TW200943366A (en) Method of controlling plasma doping process using a time of flight ion detector and plasma doping apparatus
US20070133145A1 (en) Ion balance adjusting method and method of removing charges from workpiece by using the same
ATE406597T1 (de) Elektrophoretische display-vorrichtung und ansteuerverfahren dafür
PL2157205T3 (pl) Proces impulsowego rozpylania magnetronowego o dużej mocy oraz źródło energii elektrycznej o dużej mocy
EP2515211A3 (en) Touch panel and driving device for the same
EA200200055A1 (ru) Способ управления процессом электрохимической обработки
JP2015507688A5 (enExample)
WO2010036625A3 (en) Pulsed electrospray ion source with reduced analyte electrochemistry
TW200615422A (en) Ion eluting unit, device provided therewith, and washing machine
WO2011050186A3 (en) Spark gap control for electro-discharge machining
WO2006097586A8 (fr) Procede de charge d’un accumulateur lithium-ion a electrode negative
TW200802444A (en) Capacitor
EP1832936A3 (en) Electric charging device, and image forming apparatus
WO2022272187A8 (en) Charging device and method of charging and rejuvenating battery
EA201201376A1 (ru) Ускоритель заряженных частиц и способ ускорения заряженных частиц
ATE401985T1 (de) Verfahren und vorrichtung zum erzeugen von bearbeitungsimpulse für funkenerosionsbearbeitung
DE50310906D1 (de) Doppelschicht-kondensator, dessen verwendung sowie ein verfahren zur erhöhung der maximalen ladungen von doppelschicht-kondensator-elektroden
US20120141816A1 (en) Method for pulsed electrochemical machining
JP2006313163A5 (enExample)
WO2020087074A3 (en) Devices, systems, and kits for electroporation and methods of use thereof
JP2008159272A5 (enExample)