TW200719089A - A salt suitable for an acid generator and a chemically amplified resist composition containing the same - Google Patents

A salt suitable for an acid generator and a chemically amplified resist composition containing the same

Info

Publication number
TW200719089A
TW200719089A TW095131302A TW95131302A TW200719089A TW 200719089 A TW200719089 A TW 200719089A TW 095131302 A TW095131302 A TW 095131302A TW 95131302 A TW95131302 A TW 95131302A TW 200719089 A TW200719089 A TW 200719089A
Authority
TW
Taiwan
Prior art keywords
carbon atoms
group
resist composition
chemically amplified
amplified resist
Prior art date
Application number
TW095131302A
Other languages
English (en)
Other versions
TWI395064B (zh
Inventor
Yukako Harada
Isao Yoshida
Yoshiyuki Takata
Original Assignee
Sumitomo Chemical Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Chemical Co filed Critical Sumitomo Chemical Co
Publication of TW200719089A publication Critical patent/TW200719089A/zh
Application granted granted Critical
Publication of TWI395064B publication Critical patent/TWI395064B/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C309/00—Sulfonic acids; Halides, esters, or anhydrides thereof
    • C07C309/01—Sulfonic acids
    • C07C309/02—Sulfonic acids having sulfo groups bound to acyclic carbon atoms
    • C07C309/03—Sulfonic acids having sulfo groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton
    • C07C309/17—Sulfonic acids having sulfo groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton containing carboxyl groups bound to the carbon skeleton
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C381/00—Compounds containing carbon and sulfur and having functional groups not covered by groups C07C301/00 - C07C337/00
    • C07C381/12—Sulfonium compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • G03F7/0397—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition the macromolecular compound having an alicyclic moiety in a side chain
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C2601/00—Systems containing only non-condensed rings
    • C07C2601/12—Systems containing only non-condensed rings with a six-membered ring
    • C07C2601/14—The ring being saturated
TW095131302A 2005-10-28 2006-08-25 適用於酸產生劑之鹽及含有該鹽之化學放大光阻組成物 TWI395064B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005314037 2005-10-28

Publications (2)

Publication Number Publication Date
TW200719089A true TW200719089A (en) 2007-05-16
TWI395064B TWI395064B (zh) 2013-05-01

Family

ID=37997356

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095131302A TWI395064B (zh) 2005-10-28 2006-08-25 適用於酸產生劑之鹽及含有該鹽之化學放大光阻組成物

Country Status (4)

Country Link
US (1) US7262321B2 (zh)
KR (1) KR101278086B1 (zh)
CN (1) CN1955844B (zh)
TW (1) TWI395064B (zh)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI381246B (zh) * 2005-12-27 2013-01-01 Sumitomo Chemical Co 適用於酸產生劑的鹽及含有該鹽之化學增幅型阻劑組成物
TWI460151B (zh) * 2009-05-28 2014-11-11 Sumitomo Chemical Co 鹽及含有該鹽之光阻組成物

Families Citing this family (38)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI394004B (zh) * 2005-03-30 2013-04-21 Sumitomo Chemical Co 適合作為酸產生劑之鹽及含有該鹽之化學放大型光阻組成物
TWI378325B (en) * 2005-03-30 2012-12-01 Sumitomo Chemical Co Salt suitable for an acid generator and a chemically amplified resist composition containing the same
TWI411881B (zh) * 2005-10-28 2013-10-11 Sumitomo Chemical Co 適用為酸產生劑之鹽以及包含該鹽之化學增幅型阻劑組成物
CN1971421B (zh) * 2005-11-21 2012-05-30 住友化学株式会社 适合于酸生成剂的盐和含有该盐的化学放大型抗蚀剂组合物
US7862980B2 (en) * 2006-08-02 2011-01-04 Sumitomo Chemical Company, Limited Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same
TWI412888B (zh) * 2006-08-18 2013-10-21 Sumitomo Chemical Co 適合作為酸產生劑之鹽及含有該鹽之化學放大型正光阻組成物
TWI402249B (zh) * 2006-08-22 2013-07-21 Sumitomo Chemical Co 適合作為酸產生劑之鹽及含有該鹽之化學放大型正型光阻組成物
KR100829615B1 (ko) * 2006-10-11 2008-05-14 삼성전자주식회사 광산 발생제, 이를 포함하는 포토레지스트 조성물 및 패턴형성 방법
US7741007B2 (en) * 2006-12-06 2010-06-22 Sumitomo Chemical Company, Limited Chemicallly amplified resist composition
TWI437364B (zh) * 2006-12-14 2014-05-11 Sumitomo Chemical Co 化學放大型阻劑組成物
CN101211113B (zh) * 2006-12-27 2012-01-11 住友化学株式会社 化学放大型抗蚀剂组合物
US7527913B2 (en) * 2007-01-25 2009-05-05 Samsung Electronics Co., Ltd. Photoacid generators, photoresist composition including the same and method of forming pattern using the same
CN101236357B (zh) * 2007-01-30 2012-07-04 住友化学株式会社 化学放大型抗蚀剂组合物
JP4844436B2 (ja) * 2007-03-07 2011-12-28 住友化学株式会社 化学増幅型レジスト組成物
JP5012122B2 (ja) * 2007-03-22 2012-08-29 住友化学株式会社 化学増幅型レジスト組成物
TWI438182B (zh) * 2007-07-25 2014-05-21 Sumitomo Chemical Co 適用於酸產生劑之鹽以及含有該鹽之化學放大正型抗蝕劑組成物
US9034556B2 (en) * 2007-12-21 2015-05-19 Tokyo Ohka Kogyo Co., Ltd. Compound and method of producing the same, acid generator, resist composition and method of forming resist pattern
JP5186249B2 (ja) * 2007-12-21 2013-04-17 東京応化工業株式会社 新規な化合物およびその製造方法、酸発生剤、レジスト組成物およびレジストパターン形成方法
TWI462938B (zh) * 2008-05-21 2014-12-01 Sumitomo Chemical Co 聚合物及含有該聚合物之化學放大型阻劑組成物
JP5746818B2 (ja) * 2008-07-09 2015-07-08 富士フイルム株式会社 感活性光線性または感放射線性樹脂組成物及びそれを用いたパターン形成方法
JP5368270B2 (ja) * 2009-02-19 2013-12-18 信越化学工業株式会社 新規スルホン酸塩及びその誘導体、光酸発生剤並びにこれを用いたレジスト材料及びパターン形成方法
KR101744715B1 (ko) * 2009-07-16 2017-06-08 스미또모 가가꾸 가부시키가이샤 염 및 이를 함유하는 포토레지스트 조성물
TWI530478B (zh) * 2010-02-18 2016-04-21 住友化學股份有限公司 鹽及包含該鹽之光阻組成物
JP5903833B2 (ja) 2010-11-09 2016-04-13 住友化学株式会社 樹脂、レジスト組成物及びレジストパターン製造方法
KR101830595B1 (ko) 2010-11-09 2018-02-21 스미또모 가가꾸 가부시키가이샤 수지 및 포토레지스트 조성물
JP6034026B2 (ja) 2011-02-25 2016-11-30 住友化学株式会社 レジスト組成物及びレジストパターンの製造方法
JP6022788B2 (ja) 2011-04-07 2016-11-09 住友化学株式会社 レジスト組成物及びレジストパターンの製造方法
JP5934536B2 (ja) 2011-04-07 2016-06-15 住友化学株式会社 レジスト組成物及びレジストパターンの製造方法
JP5852490B2 (ja) 2011-04-07 2016-02-03 住友化学株式会社 レジスト組成物及びレジストパターンの製造方法
JP6005964B2 (ja) 2011-04-07 2016-10-12 住友化学株式会社 レジスト組成物及びレジストパターンの製造方法
TWI525066B (zh) * 2011-04-13 2016-03-11 住友化學股份有限公司 鹽、光阻組成物及製備光阻圖案之方法
JP6214134B2 (ja) * 2011-04-13 2017-10-18 住友化学株式会社 塩、レジスト組成物及びレジストパターンの製造方法
JP5866100B2 (ja) 2011-04-13 2016-02-17 住友化学株式会社 レジスト組成物及びレジストパターンの製造方法
EP2527918A2 (en) 2011-05-27 2012-11-28 Rohm and Haas Electronic Materials LLC Photoresist composition
JP6189020B2 (ja) 2011-07-19 2017-08-30 住友化学株式会社 レジスト組成物及びレジストパターンの製造方法
JP5865199B2 (ja) * 2012-07-09 2016-02-17 富士フイルム株式会社 感活性光線性又は感放射線性樹脂組成物、感活性光線性又は感放射線性膜、感活性光線性又は感放射線性膜を備えたマスクブランクス、パターン形成方法、及び、フォトマスクの製造方法
JP2017019997A (ja) * 2015-06-01 2017-01-26 ローム アンド ハース エレクトロニック マテリアルズ エルエルシーＲｏｈｍ ａｎｄ Ｈａａｓ Ｅｌｅｃｔｒｏｎｉｃ Ｍａｔｅｒｉａｌｓ ＬＬＣ 酸発生剤化合物及びそれを含むフォトレジスト
JP6991792B2 (ja) 2016-09-02 2022-02-03 住友化学株式会社 塩、酸発生剤、レジスト組成物及びレジストパターンの製造方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE295421C (zh) *
US5004669A (en) * 1988-10-31 1991-04-02 Konica Corporation Light-sensitive silver halide photographic material
JP4150509B2 (ja) 2000-11-20 2008-09-17 富士フイルム株式会社 ポジ型感光性組成物
JP2002361802A (ja) * 2001-06-11 2002-12-18 Oji Paper Co Ltd 電子線硬化型工程用剥離シート
US6818379B2 (en) * 2001-12-03 2004-11-16 Sumitomo Chemical Company, Limited Sulfonium salt and use thereof
US6893792B2 (en) * 2002-02-19 2005-05-17 Sumitomo Chemical Company, Limited Positive resist composition
JP2004004561A (ja) 2002-02-19 2004-01-08 Sumitomo Chem Co Ltd ポジ型レジスト組成物
JP4103523B2 (ja) 2002-09-27 2008-06-18 Ｊｓｒ株式会社 レジスト組成物
KR101086169B1 (ko) * 2003-01-22 2011-11-25 제이에스알 가부시끼가이샤 술포늄염 화합물, 감방사선성 산 발생제 및 포지티브형감방사선성 수지 조성물
US7001706B2 (en) * 2003-07-18 2006-02-21 Sumitomo Chemical Company, Limited Sulfonate and a resist composition
US7304175B2 (en) 2005-02-16 2007-12-04 Sumitomo Chemical Company, Limited Salt suitable for an acid generator and a chemically amplified resist composition containing the same

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI381246B (zh) * 2005-12-27 2013-01-01 Sumitomo Chemical Co 適用於酸產生劑的鹽及含有該鹽之化學增幅型阻劑組成物
TWI460151B (zh) * 2009-05-28 2014-11-11 Sumitomo Chemical Co 鹽及含有該鹽之光阻組成物

Also Published As

Publication number Publication date
US20070100096A1 (en) 2007-05-03
CN1955844B (zh) 2011-01-26
US7262321B2 (en) 2007-08-28
TWI395064B (zh) 2013-05-01
KR20070045903A (ko) 2007-05-02
CN1955844A (zh) 2007-05-02
KR101278086B1 (ko) 2013-06-24

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