TW200642978A - Slurry composition and method for polishing organic polymer-based ophthalmic substrates - Google Patents

Slurry composition and method for polishing organic polymer-based ophthalmic substrates

Info

Publication number
TW200642978A
TW200642978A TW095112122A TW95112122A TW200642978A TW 200642978 A TW200642978 A TW 200642978A TW 095112122 A TW095112122 A TW 095112122A TW 95112122 A TW95112122 A TW 95112122A TW 200642978 A TW200642978 A TW 200642978A
Authority
TW
Taiwan
Prior art keywords
organic polymer
based ophthalmic
ophthalmic substrates
slurry composition
polishing organic
Prior art date
Application number
TW095112122A
Other languages
English (en)
Other versions
TWI391350B (zh
Inventor
Steven A Ferranti
Original Assignee
Ferro Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ferro Corp filed Critical Ferro Corp
Publication of TW200642978A publication Critical patent/TW200642978A/zh
Application granted granted Critical
Publication of TWI391350B publication Critical patent/TWI391350B/zh

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B13/00—Machines or devices designed for grinding or polishing optical surfaces on lenses or surfaces of similar shape on other work; Accessories therefor
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09G—POLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00—Polishing compositions
    • C09G1/02—Polishing compositions containing abrasives or grinding agents
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1454—Abrasive powders, suspensions and pastes for polishing
    • C09K3/1463—Aqueous liquid suspensions

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Eyeglasses (AREA)
  • Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)
TW095112122A 2005-04-08 2006-04-06 適用於研磨有機聚合物系眼科基材之漿料組成物及方法，以及眼科鏡片 TWI391350B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11/102,555 US7294044B2 (en) 2005-04-08 2005-04-08 Slurry composition and method for polishing organic polymer-based ophthalmic substrates

Publications (2)

Publication Number Publication Date
TW200642978A true TW200642978A (en) 2006-12-16
TWI391350B TWI391350B (zh) 2013-04-01

Family

ID=37083726

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095112122A TWI391350B (zh) 2005-04-08 2006-04-06 適用於研磨有機聚合物系眼科基材之漿料組成物及方法，以及眼科鏡片

Country Status (7)

Country Link
US (1) US7294044B2 (zh)
EP (1) EP1868769B1 (zh)
JP (1) JP5193852B2 (zh)
CN (1) CN101541910B (zh)
AT (1) ATE527328T1 (zh)
TW (1) TWI391350B (zh)
WO (1) WO2006110224A2 (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI837249B (zh) * 2018-12-14 2024-04-01 日商福吉米股份有限公司 研磨用組成物及合成樹脂研磨方法

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7467988B2 (en) * 2005-04-08 2008-12-23 Ferro Corporation Slurry composition and method for polishing organic polymer-based ophthalmic substrates
US10144849B2 (en) * 2008-02-01 2018-12-04 Fujimi Incorporated Polishing composition and polishing method using the same
EP2268777A4 (en) * 2008-04-24 2011-11-23 Ppt Res Inc STABLE AQUEOUS EXCAVATIVE SUSPENSIONS
US20100330884A1 (en) * 2009-06-29 2010-12-30 Ferro Corporation Diatomaceous Earth-Containing Slurry Composition And Method For Polishing Organic Polymer-Based Ophthalmic Substrates Using The Same
US8449636B2 (en) * 2010-08-09 2013-05-28 Ferro Corporation Easy rinsing polishing composition for polymer-based surfaces
JP2014522375A (ja) * 2011-03-03 2014-09-04 ウィシス テクノロジー ファウンデーション，インコーポレイティド 金属酸化物、金属カルコゲニド、混合金属酸化物、及びカルコゲニドの熱力学的溶液
US8821215B2 (en) * 2012-09-07 2014-09-02 Cabot Microelectronics Corporation Polypyrrolidone polishing composition and method
US9633831B2 (en) 2013-08-26 2017-04-25 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Chemical mechanical polishing composition for polishing a sapphire surface and methods of using same
JP6654696B2 (ja) * 2015-07-10 2020-02-26 フエロ コーポレーション 有機ポリマー系眼用基材を研磨するためのスラリー組成物及び方法、並びに眼用レンズ
KR102463863B1 (ko) * 2015-07-20 2022-11-04 삼성전자주식회사 연마용 조성물 및 이를 이용한 반도체 장치의 제조 방법
JP6758984B2 (ja) * 2016-07-29 2020-09-23 キヤノン株式会社 インクジェット記録装置及びクリーニング方法
CN109476954B (zh) 2016-08-26 2021-07-23 福禄公司 选择性硅石抛光的浆料组合物和方法
US10037889B1 (en) 2017-03-29 2018-07-31 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Cationic particle containing slurries and methods of using them for CMP of spin-on carbon films
CN107299385A (zh) * 2017-05-18 2017-10-27 当涂县宏宇金属炉料有限责任公司 一种改善不锈钢表面特性的电化学处理方法
CN109015204B (zh) * 2018-08-29 2020-11-27 包头市利晨科技有限公司 一种适用于cr39树脂镜片的抛光方法
CN113755842B (zh) * 2021-10-18 2024-04-02 德米特（苏州）电子环保材料有限公司 一种金属抛光液及其制备方法和应用

Family Cites Families (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4127697A (en) * 1975-05-19 1978-11-28 American Optical Corporation Abrasion-resistant lenses and process of making
US4135792A (en) * 1976-02-20 1979-01-23 American Optical Corporation All plastic spectacles
US4108827A (en) * 1976-12-13 1978-08-22 American Optical Corporation Colorless allyl diglycol carbonate
JPS5489389A (en) * 1977-12-27 1979-07-16 Fujimi Kenmazai Kougiyou Kk Composition for polishing of moldings in synthetic resin
FR2414071A1 (fr) * 1978-01-05 1979-08-03 Essilor Int Materiau de polissage, notamment pour lentille ophtalmique en matiere organique
US4443588A (en) * 1981-02-19 1984-04-17 Toray Industries, Inc. Highly refractive urethane polymers for use in optical lenses and lenses prepared therefrom
US4376751A (en) * 1981-05-29 1983-03-15 The United States Of America As Represented By The Department Of Energy Production of super-smooth articles
US4859719A (en) * 1983-09-08 1989-08-22 Minnesota Mining And Manufacturing Company Polymer blends with high water absorption
JPS61182763A (ja) * 1985-02-06 1986-08-15 Sanyo Chem Ind Ltd 研磨加工液
JPS6243482A (ja) * 1985-08-21 1987-02-25 Sanyo Chem Ind Ltd 研磨加工液
FR2604443A1 (fr) * 1986-09-26 1988-04-01 Rhone Poulenc Chimie Composition de polissage a base de cerium destinee au polissage des verres organiques
JPH0818241B2 (ja) * 1987-03-19 1996-02-28 キヤノン株式会社 研磨工具の製造方法
JPH0899268A (ja) * 1994-10-03 1996-04-16 Olympus Optical Co Ltd 研磨用工具とその製造方法
US5989301A (en) * 1998-02-18 1999-11-23 Saint-Gobain Industrial Ceramics, Inc. Optical polishing formulation
JP2000256654A (ja) * 1999-03-04 2000-09-19 Hitachi Chem Co Ltd Ｃｍｐ研磨剤及び基板の研磨方法
EP1691401B1 (en) * 1999-06-18 2012-06-13 Hitachi Chemical Co., Ltd. Method for polishing a substrate using CMP abrasive
JPWO2002067309A1 (ja) * 2001-02-20 2004-06-24 日立化成工業株式会社 研磨剤及び基板の研磨方法
JP2002305198A (ja) * 2001-04-06 2002-10-18 Toshiba Corp 電子デバイスの製造方法
JP4231632B2 (ja) * 2001-04-27 2009-03-04 花王株式会社 研磨液組成物
US6638326B2 (en) * 2001-09-25 2003-10-28 Ekc Technology, Inc. Compositions for chemical mechanical planarization of tantalum and tantalum nitride
KR100952870B1 (ko) * 2001-10-26 2010-04-13 아사히 가라스 가부시키가이샤 연마제, 그 제조방법 및 연마방법
US6821897B2 (en) * 2001-12-05 2004-11-23 Cabot Microelectronics Corporation Method for copper CMP using polymeric complexing agents
JP4387708B2 (ja) * 2002-07-04 2009-12-24 Ｈｏｙａ株式会社 プラスチック製眼鏡レンズの研磨方法および製造方法
TWI256971B (en) * 2002-08-09 2006-06-21 Hitachi Chemical Co Ltd CMP abrasive and method for polishing substrate
US7300601B2 (en) * 2002-12-10 2007-11-27 Advanced Technology Materials, Inc. Passivative chemical mechanical polishing composition for copper film planarization
US6916742B2 (en) * 2003-02-27 2005-07-12 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Modular barrier removal polishing slurry
JP2004311967A (ja) * 2003-03-27 2004-11-04 Nippon Shokubai Co Ltd Ｃｍｐ研磨剤用ポリマー及び組成物
US6802878B1 (en) * 2003-04-17 2004-10-12 3M Innovative Properties Company Abrasive particles, abrasive articles, and methods of making and using the same
JP2004331852A (ja) * 2003-05-09 2004-11-25 Tama Kagaku Kogyo Kk 分散安定性に優れた研磨剤スラリー及び基板の製造方法
JP4138610B2 (ja) * 2003-08-29 2008-08-27 有限会社コスモテック 研磨治具用曲率設定装置および研磨治具曲率設定方法
US7344988B2 (en) * 2003-10-27 2008-03-18 Dupont Air Products Nanomaterials Llc Alumina abrasive for chemical mechanical polishing
US20060216935A1 (en) * 2005-03-28 2006-09-28 Ferro Corporation Composition for oxide CMP in CMOS device fabrication

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI837249B (zh) * 2018-12-14 2024-04-01 日商福吉米股份有限公司 研磨用組成物及合成樹脂研磨方法

Also Published As

Publication number Publication date
EP1868769A2 (en) 2007-12-26
WO2006110224A3 (en) 2009-04-16
JP2008537704A (ja) 2008-09-25
US7294044B2 (en) 2007-11-13
TWI391350B (zh) 2013-04-01
WO2006110224A2 (en) 2006-10-19
ATE527328T1 (de) 2011-10-15
CN101541910B (zh) 2012-09-05
CN101541910A (zh) 2009-09-23
JP5193852B2 (ja) 2013-05-08
EP1868769A4 (en) 2010-03-10
EP1868769B1 (en) 2011-10-05
US20060228999A1 (en) 2006-10-12

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