TW200641953A - Plasma source, ion source, and ion generation method - Google Patents

Plasma source, ion source, and ion generation method

Info

Publication number
TW200641953A
TW200641953A TW095104344A TW95104344A TW200641953A TW 200641953 A TW200641953 A TW 200641953A TW 095104344 A TW095104344 A TW 095104344A TW 95104344 A TW95104344 A TW 95104344A TW 200641953 A TW200641953 A TW 200641953A
Authority
TW
Taiwan
Prior art keywords
thermal
thermal electrode
ion
source
electrode
Prior art date
Application number
TW095104344A
Other languages
English (en)
Chinese (zh)
Inventor
Yasuhiko Kasama
Kenji Omote
Kuniyoshi Yokoh
Kenichiro Komatsu
Original Assignee
Ideal Star Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ideal Star Inc filed Critical Ideal Star Inc
Publication of TW200641953A publication Critical patent/TW200641953A/zh

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/26—Ion sources; Ion guns using surface ionisation, e.g. field effect ion sources, thermionic ion sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/08—Ion sources; Ion guns
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3171—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for ion implantation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Carbon And Carbon Compounds (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Plasma Technology (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
TW095104344A 2005-02-09 2006-02-09 Plasma source, ion source, and ion generation method TW200641953A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2005032425 2005-02-09
JP2006030536A JP2006253122A (ja) 2005-02-09 2006-02-08 プラズマ源、イオン源、及び、イオン生成方法

Publications (1)

Publication Number Publication Date
TW200641953A true TW200641953A (en) 2006-12-01

Family

ID=36793147

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095104344A TW200641953A (en) 2005-02-09 2006-02-09 Plasma source, ion source, and ion generation method

Country Status (3)

Country Link
JP (1) JP2006253122A (ja)
TW (1) TW200641953A (ja)
WO (1) WO2006085576A1 (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI414213B (zh) * 2007-12-19 2013-11-01 Asml Netherlands Bv 輻射源，微影裝置及器件製造方法
TWI570767B (zh) * 2014-05-23 2017-02-11 A plasma processing chamber and its DC electrode and heating device

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112616233B (zh) * 2020-12-16 2023-03-21 中国科学院合肥物质科学研究院 一种适用于加速器的稳态高束流密度长寿命锂离子源

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4096373B2 (ja) * 1997-03-25 2008-06-04 住友電気工業株式会社 硬質被膜とその製造方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI414213B (zh) * 2007-12-19 2013-11-01 Asml Netherlands Bv 輻射源，微影裝置及器件製造方法
TWI570767B (zh) * 2014-05-23 2017-02-11 A plasma processing chamber and its DC electrode and heating device

Also Published As

Publication number Publication date
JP2006253122A (ja) 2006-09-21
WO2006085576A1 (ja) 2006-08-17

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