TW200641953A - Plasma source, ion source, and ion generation method - Google Patents
Plasma source, ion source, and ion generation methodInfo
- Publication number
- TW200641953A TW200641953A TW095104344A TW95104344A TW200641953A TW 200641953 A TW200641953 A TW 200641953A TW 095104344 A TW095104344 A TW 095104344A TW 95104344 A TW95104344 A TW 95104344A TW 200641953 A TW200641953 A TW 200641953A
- Authority
- TW
- Taiwan
- Prior art keywords
- thermal
- thermal electrode
- ion
- source
- electrode
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J27/00—Ion beam tubes
- H01J27/02—Ion sources; Ion guns
- H01J27/26—Ion sources; Ion guns using surface ionisation, e.g. field effect ion sources, thermionic ion sources
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/08—Ion sources; Ion guns
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
- H01J37/3171—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for ion implantation
Abstract
To provide a method for manufacturing endohedral fullerene of a quantity sufficient for using it as an industrial material, and to provide a plasma source capable of extracting plasma with a high ionic current for synthesizing a large volume of included fullerene. A metal plate having a plurality of openings, such as a metallic mesh is used for a thermal electrode. In addition, since the surface area of thermal electrode in contact with steam is increased markedly, by stacking a plurality of the thermal electrodes, ionization efficiency is improved, and a large ion current can be extracted. By forming the thermal electrode with a thin tungsten wire or the like, heat can be generated, by carrying a current to the thermal electrode itself without heating the thermal electrode by a heater, and the effect of improving the utilization efficiency of thermal energy is obtained.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005032425 | 2005-02-09 | ||
JP2006030536A JP2006253122A (en) | 2005-02-09 | 2006-02-08 | Plasma source, ion source, and ion generation method |
Publications (1)
Publication Number | Publication Date |
---|---|
TW200641953A true TW200641953A (en) | 2006-12-01 |
Family
ID=36793147
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW095104344A TW200641953A (en) | 2005-02-09 | 2006-02-09 | Plasma source, ion source, and ion generation method |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP2006253122A (en) |
TW (1) | TW200641953A (en) |
WO (1) | WO2006085576A1 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI414213B (en) * | 2007-12-19 | 2013-11-01 | Asml Netherlands Bv | Radiation source, lithographic apparatus and device manufacturing method |
TWI570767B (en) * | 2014-05-23 | 2017-02-11 | A plasma processing chamber and its DC electrode and heating device |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN112616233B (en) * | 2020-12-16 | 2023-03-21 | 中国科学院合肥物质科学研究院 | Stable-state high-beam-density long-life lithium ion source suitable for accelerator |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4096373B2 (en) * | 1997-03-25 | 2008-06-04 | 住友電気工業株式会社 | Hard coating and manufacturing method thereof |
-
2006
- 2006-02-08 JP JP2006030536A patent/JP2006253122A/en active Pending
- 2006-02-09 TW TW095104344A patent/TW200641953A/en unknown
- 2006-02-09 WO PCT/JP2006/302243 patent/WO2006085576A1/en not_active Application Discontinuation
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI414213B (en) * | 2007-12-19 | 2013-11-01 | Asml Netherlands Bv | Radiation source, lithographic apparatus and device manufacturing method |
TWI570767B (en) * | 2014-05-23 | 2017-02-11 | A plasma processing chamber and its DC electrode and heating device |
Also Published As
Publication number | Publication date |
---|---|
JP2006253122A (en) | 2006-09-21 |
WO2006085576A1 (en) | 2006-08-17 |
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