TW200630505A - Apparatus for producing carbon film and production method therefor - Google Patents
Apparatus for producing carbon film and production method thereforInfo
- Publication number
- TW200630505A TW200630505A TW094138909A TW94138909A TW200630505A TW 200630505 A TW200630505 A TW 200630505A TW 094138909 A TW094138909 A TW 094138909A TW 94138909 A TW94138909 A TW 94138909A TW 200630505 A TW200630505 A TW 200630505A
- Authority
- TW
- Taiwan
- Prior art keywords
- carbon film
- production method
- coil
- method therefor
- producing carbon
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/503—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using dc or ac discharges
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/26—Deposition of carbon only
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J63/00—Cathode-ray or electron-stream lamps
- H01J63/02—Details, e.g. electrode, gas filling, shape of vessel
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J63/00—Cathode-ray or electron-stream lamps
- H01J63/06—Lamps with luminescent screen excited by the ray or stream
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
- H01J9/02—Manufacture of electrodes or electrode systems
- H01J9/022—Manufacture of electrodes or electrode systems of cold cathodes
- H01J9/025—Manufacture of electrodes or electrode systems of cold cathodes of field emission cathodes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y25/00—Nanomagnetism, e.g. magnetoimpedance, anisotropic magnetoresistance, giant magnetoresistance or tunneling magnetoresistance
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2201/00—Electrodes common to discharge tubes
- H01J2201/30—Cold cathodes
- H01J2201/304—Field emission cathodes
- H01J2201/30446—Field emission cathodes characterised by the emitter material
- H01J2201/30453—Carbon types
- H01J2201/30469—Carbon nanotubes (CNTs)
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005000800A JP2006188382A (ja) | 2005-01-05 | 2005-01-05 | カーボンナノチューブの製造方法 |
JP2005000803A JP4676764B2 (ja) | 2005-01-05 | 2005-01-05 | フィールドエミッション型面状光源 |
JP2005088813A JP2005307352A (ja) | 2004-03-25 | 2005-03-25 | 炭素膜の製造装置およびその製造方法 |
JP2005115560A JP4925600B2 (ja) | 2005-04-13 | 2005-04-13 | プラズマ発生装置およびこれを用いた成膜方法 |
JP2005115558A JP4917758B2 (ja) | 2005-04-13 | 2005-04-13 | カーボン金属ナノツリーおよびその製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200630505A true TW200630505A (en) | 2006-09-01 |
TWI429781B TWI429781B (zh) | 2014-03-11 |
Family
ID=36647505
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW094138909A TW200630505A (en) | 2005-01-05 | 2005-11-04 | Apparatus for producing carbon film and production method therefor |
TW094138909K TWI403611B (zh) | 2005-01-05 | 2005-11-04 | An apparatus for manufacturing a carbon film using plasma CVD, a method for manufacturing the same, and a carbon film |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW094138909K TWI403611B (zh) | 2005-01-05 | 2005-11-04 | An apparatus for manufacturing a carbon film using plasma CVD, a method for manufacturing the same, and a carbon film |
Country Status (4)
Country | Link |
---|---|
EP (1) | EP1834925A1 (zh) |
KR (2) | KR101313919B1 (zh) |
TW (2) | TW200630505A (zh) |
WO (1) | WO2006073017A1 (zh) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4578350B2 (ja) * | 2005-08-10 | 2010-11-10 | 株式会社ピュアロンジャパン | 炭素膜、電子放出源およびフィールドエミッション型の照明ランプ |
KR101543486B1 (ko) | 2007-12-12 | 2015-08-10 | 신닛테츠 수미킨 가가쿠 가부시키가이샤 | 금속 내포 수상 탄소 나노 구조물, 탄소 나노 구조체, 금속 내포 수상 탄소 나노 구조물의 제작방법, 탄소 나노 구조체의 제작방법, 및 캐패시터 |
JP2010177186A (ja) * | 2009-02-02 | 2010-08-12 | Kochi Fel Kk | 電界放出型光源 |
JP2010282956A (ja) * | 2009-05-01 | 2010-12-16 | Kochi Fel Kk | 電界放出型光源 |
JP5121791B2 (ja) * | 2009-07-27 | 2013-01-16 | 株式会社ライフ技術研究所 | 炭素膜構造 |
CN102074429B (zh) * | 2010-12-27 | 2013-11-06 | 清华大学 | 场发射阴极结构及其制备方法 |
TW201233253A (en) * | 2011-01-26 | 2012-08-01 | Bing-Li Lai | Plasma reaction method and apparatus |
KR101400163B1 (ko) * | 2012-02-27 | 2014-05-28 | 한밭대학교 산학협력단 | 탄소나노트리 및 그의 제조방법 |
KR101415175B1 (ko) * | 2012-12-28 | 2014-07-04 | 인하대학교 산학협력단 | 열플라즈마를 이용한 그래핀의 제조 방법 |
CN103523768B (zh) * | 2013-09-27 | 2018-02-09 | 武汉博力信纳米科技有限公司 | 箱体密封化学气相反应制备连续碳纳米管纤维的装置和方法 |
KR102023415B1 (ko) * | 2018-08-27 | 2019-09-23 | (주)네프 | 탄소 나노 코팅 전극을 갖는 하이브리드 스위치 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0769790A (ja) * | 1993-08-30 | 1995-03-14 | Ulvac Japan Ltd | 薄膜作製装置 |
JPH0978242A (ja) * | 1995-09-14 | 1997-03-25 | Sony Corp | プラズマcvd装置 |
JP3236493B2 (ja) * | 1996-01-29 | 2001-12-10 | 矢崎総業株式会社 | 複合被覆電線の製造方法 |
JP2002518280A (ja) * | 1998-06-19 | 2002-06-25 | ザ・リサーチ・ファウンデーション・オブ・ステイト・ユニバーシティ・オブ・ニューヨーク | 整列した自立炭素ナノチューブおよびその合成 |
EP1146013A4 (en) * | 1998-12-28 | 2010-12-22 | Osaka Gas Co Ltd | AMORPHOUS CARBON STEAM TUBES IN THE NANOMETER SCALE AND THEIR MANUFACTURING METHOD |
JP4553510B2 (ja) * | 2001-03-29 | 2010-09-29 | 大阪瓦斯株式会社 | 樹枝状鉄−アルミニウム−炭素系複合体、カーボンナノツリー及びそれらの製造方法 |
JP4156879B2 (ja) * | 2002-07-31 | 2008-09-24 | 双葉電子工業株式会社 | カーボン繊維の製造方法。 |
JP2004303521A (ja) * | 2003-03-31 | 2004-10-28 | Hitachi Ltd | 平面ディスプレイ装置 |
-
2005
- 2005-10-13 KR KR1020057023130A patent/KR101313919B1/ko active IP Right Grant
- 2005-10-13 EP EP05793094A patent/EP1834925A1/en not_active Withdrawn
- 2005-10-13 WO PCT/JP2005/018894 patent/WO2006073017A1/ja active Application Filing
- 2005-10-13 KR KR1020127023664A patent/KR101342356B1/ko active IP Right Grant
- 2005-11-04 TW TW094138909A patent/TW200630505A/zh unknown
- 2005-11-04 TW TW094138909K patent/TWI403611B/zh active
Also Published As
Publication number | Publication date |
---|---|
KR101342356B1 (ko) | 2013-12-16 |
TWI429781B (zh) | 2014-03-11 |
KR101313919B1 (ko) | 2013-10-01 |
EP1834925A1 (en) | 2007-09-19 |
KR20070114327A (ko) | 2007-12-03 |
KR20120117930A (ko) | 2012-10-24 |
TWI403611B (zh) | 2013-08-01 |
WO2006073017A1 (ja) | 2006-07-13 |
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