TW200629393A - Substrate treating device - Google Patents
Substrate treating deviceInfo
- Publication number
- TW200629393A TW200629393A TW094134445A TW94134445A TW200629393A TW 200629393 A TW200629393 A TW 200629393A TW 094134445 A TW094134445 A TW 094134445A TW 94134445 A TW94134445 A TW 94134445A TW 200629393 A TW200629393 A TW 200629393A
- Authority
- TW
- Taiwan
- Prior art keywords
- supply nozzle
- treating
- nozzle pipes
- treating bath
- bath
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67057—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing with the semiconductor substrates being dipped in baths or vessels
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004295337A JP2006108512A (ja) | 2004-10-07 | 2004-10-07 | 基板処理装置 |
Publications (1)
Publication Number | Publication Date |
---|---|
TW200629393A true TW200629393A (en) | 2006-08-16 |
Family
ID=36142429
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW094134445A TW200629393A (en) | 2004-10-07 | 2005-10-03 | Substrate treating device |
Country Status (6)
Country | Link |
---|---|
US (1) | US20080105286A1 (zh) |
JP (1) | JP2006108512A (zh) |
KR (1) | KR20070102475A (zh) |
CN (1) | CN101061574A (zh) |
TW (1) | TW200629393A (zh) |
WO (1) | WO2006038341A1 (zh) |
Families Citing this family (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4705517B2 (ja) | 2006-05-19 | 2011-06-22 | 東京エレクトロン株式会社 | 基板洗浄方法、基板洗浄装置、プログラム、および記録媒体 |
JP5259952B2 (ja) * | 2006-12-26 | 2013-08-07 | 東京エレクトロン株式会社 | 基板処理装置 |
US7775219B2 (en) | 2006-12-29 | 2010-08-17 | Applied Materials, Inc. | Process chamber lid and controlled exhaust |
US7694688B2 (en) | 2007-01-05 | 2010-04-13 | Applied Materials, Inc. | Wet clean system design |
JP4859703B2 (ja) * | 2007-02-22 | 2012-01-25 | 大日本スクリーン製造株式会社 | 基板処理装置 |
DE102007040851A1 (de) * | 2007-08-29 | 2009-03-05 | Wacker Chemie Ag | Verfahren zum Reinigen von polykristallinem Silicium |
JP4838904B1 (ja) * | 2011-02-21 | 2011-12-14 | 島田化成株式会社 | ワーク洗浄方法及びそのシステム |
JP5802098B2 (ja) * | 2011-09-29 | 2015-10-28 | 島田化成株式会社 | ワーク洗浄方法及びそのシステム並びにその洗浄装置 |
US10522444B2 (en) | 2013-03-11 | 2019-12-31 | Taiwan Semiconductor Manufacturing Company, Ltd. | Surface treatment method and apparatus for semiconductor packaging |
JP6455319B2 (ja) * | 2015-05-29 | 2019-01-23 | 株式会社Sumco | 半導体ウェーハのエッチング装置及び半導体ウェーハのエッチング方法 |
JP6231249B2 (ja) * | 2015-06-15 | 2017-11-15 | 株式会社ジェイ・イー・ティ | 基板処理装置 |
CN106128983A (zh) * | 2016-08-30 | 2016-11-16 | 上海华力微电子有限公司 | 一种提高清洗效率的湿法清洗水槽及其清洗方法 |
CN109318114A (zh) * | 2017-07-31 | 2019-02-12 | 上海新昇半导体科技有限公司 | 一种半导体晶圆的最终抛光机以及最终抛光及清洗方法 |
JP6985957B2 (ja) | 2018-02-21 | 2021-12-22 | キオクシア株式会社 | 半導体処理装置 |
JP2019220560A (ja) * | 2018-06-19 | 2019-12-26 | キオクシア株式会社 | 半導体製造装置および半導体装置の製造方法 |
CN109273383B (zh) * | 2018-08-28 | 2021-04-13 | 长江存储科技有限责任公司 | 化学液槽装置 |
CN108906351B (zh) * | 2018-08-28 | 2021-05-18 | 长江存储科技有限责任公司 | 喷嘴和化学液槽装置 |
CN110888305A (zh) * | 2018-09-07 | 2020-03-17 | 王彦智 | 高阶负型光阻剥膜槽 |
CN110571137A (zh) * | 2019-09-27 | 2019-12-13 | 西安奕斯伟硅片技术有限公司 | 一种晶圆的处理方法和处理装置 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61162800A (ja) * | 1985-01-11 | 1986-07-23 | 日立造船株式会社 | 汚染物の水中洗浄装置 |
JPH0833876A (ja) * | 1990-03-14 | 1996-02-06 | Seiko Epson Corp | 液中ジェット洗浄方法及び洗浄装置 |
US6767840B1 (en) * | 1997-02-21 | 2004-07-27 | Canon Kabushiki Kaisha | Wafer processing apparatus, wafer processing method, and semiconductor substrate fabrication method |
TW504041U (en) * | 1997-02-21 | 2002-09-21 | Canon Kk | Wafer processing apparatus |
US6098643A (en) * | 1998-11-14 | 2000-08-08 | Miranda; Henry R. | Bath system for semiconductor wafers with obliquely mounted transducers |
JP3748016B2 (ja) * | 1999-08-30 | 2006-02-22 | 大日本スクリーン製造株式会社 | 基板処理装置 |
US6896997B2 (en) * | 1999-11-19 | 2005-05-24 | Oki Electric Industry Co., Ltd. | Method for forming resist pattern |
TW434668B (en) * | 2000-01-27 | 2001-05-16 | Ind Tech Res Inst | Wafer rinse apparatus and rinse method of the same |
JP3851486B2 (ja) * | 2000-03-27 | 2006-11-29 | 大日本スクリーン製造株式会社 | 基板処理装置および基板処理方法 |
-
2004
- 2004-10-07 JP JP2004295337A patent/JP2006108512A/ja active Pending
-
2005
- 2005-05-23 WO PCT/JP2005/009322 patent/WO2006038341A1/ja active Application Filing
- 2005-05-23 US US11/576,854 patent/US20080105286A1/en not_active Abandoned
- 2005-05-23 CN CNA2005800344037A patent/CN101061574A/zh active Pending
- 2005-05-23 KR KR1020077007950A patent/KR20070102475A/ko not_active Application Discontinuation
- 2005-10-03 TW TW094134445A patent/TW200629393A/zh unknown
Also Published As
Publication number | Publication date |
---|---|
JP2006108512A (ja) | 2006-04-20 |
WO2006038341A1 (ja) | 2006-04-13 |
US20080105286A1 (en) | 2008-05-08 |
KR20070102475A (ko) | 2007-10-18 |
CN101061574A (zh) | 2007-10-24 |
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