TW200614355A - Apparatus for treating substrates and method of treating substrates - Google Patents
Apparatus for treating substrates and method of treating substratesInfo
- Publication number
- TW200614355A TW200614355A TW094130696A TW94130696A TW200614355A TW 200614355 A TW200614355 A TW 200614355A TW 094130696 A TW094130696 A TW 094130696A TW 94130696 A TW94130696 A TW 94130696A TW 200614355 A TW200614355 A TW 200614355A
- Authority
- TW
- Taiwan
- Prior art keywords
- substrate
- treating substrates
- carried
- treatment solution
- inclined direction
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
- B05C11/10—Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
- B05C11/1002—Means for controlling supply, i.e. flow or pressure, of liquid or other fluent material to the applying apparatus, e.g. valves
- B05C11/1026—Valves
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/02—Cleaning by the force of jets or sprays
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02041—Cleaning
- H01L21/02057—Cleaning during device manufacture
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/6715—Apparatus for applying a liquid, a resin, an ink or the like
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Power Engineering (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Coating Apparatus (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Weting (AREA)
Abstract
There is provided an apparatus for treating a substrate in which a surface of a substrate to be carried is treated with a treatment solution heated to a predetermined temperature, comprising: a carrying means for carrying a substrate in a state inclined at a predetermined angle such that the surface is on the upper side in an inclined direction; a surface nozzle for supplying the treatment solution to the surface of a substrate to be carried by the carrying means, wherein the surface is on the upper side in an inclined direction; and a branch pipe for supplying the treatment solution to a rear surface of a substrate to be carried by the carrying means, wherein the rear surface is on the lower side in an inclined direction.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004267063 | 2004-09-14 | ||
JP2005247901A JP4669760B2 (en) | 2004-09-14 | 2005-08-29 | Substrate processing apparatus and processing method |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200614355A true TW200614355A (en) | 2006-05-01 |
TWI264770B TWI264770B (en) | 2006-10-21 |
Family
ID=36379490
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW094130696A TWI264770B (en) | 2004-09-14 | 2005-09-07 | Apparatus for treating substrates and method of treating substrates |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP4669760B2 (en) |
KR (1) | KR100624653B1 (en) |
CN (1) | CN1748878B (en) |
TW (1) | TWI264770B (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI724850B (en) * | 2012-09-14 | 2021-04-11 | 日商尼康股份有限公司 | Substrate processing device and component manufacturing method |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4820705B2 (en) * | 2006-07-24 | 2011-11-24 | 芝浦メカトロニクス株式会社 | Substrate processing equipment |
JP4829710B2 (en) * | 2006-07-26 | 2011-12-07 | 芝浦メカトロニクス株式会社 | Substrate processing equipment |
JP5125038B2 (en) * | 2006-09-12 | 2013-01-23 | カシオ計算機株式会社 | Resist stripping apparatus and resist stripping method |
US20120006485A1 (en) * | 2009-02-02 | 2012-01-12 | Makoto Tanabe | Substrate treatment device |
CN102315148A (en) * | 2010-06-30 | 2012-01-11 | 上方能源技术(杭州)有限公司 | Substrate conveying device and substrate conveying method for coating purpose |
CN104241541B (en) | 2014-09-15 | 2016-12-14 | 京东方科技集团股份有限公司 | Organic electroluminescence device and display device |
CN104923534B (en) * | 2015-05-22 | 2017-11-14 | 合肥京东方光电科技有限公司 | Panel orientation membrane removal equipment |
CN105140167A (en) * | 2015-07-28 | 2015-12-09 | 合肥鑫晟光电科技有限公司 | Carrying device, wet etching equipment and application method of wet etching equipment |
KR102228353B1 (en) * | 2019-09-05 | 2021-03-16 | 주식회사 태성 | Substrate developing apparatus having function of discharging developing solution |
CN113894001B (en) * | 2021-10-20 | 2022-07-19 | 盐城吉研智能科技有限公司 | Compounding device and production process of foamed aluminum multilayer composite board |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000114221A (en) | 1998-10-02 | 2000-04-21 | Dainippon Screen Mfg Co Ltd | Substrate-processing device |
JP3556110B2 (en) | 1998-12-22 | 2004-08-18 | 大日本スクリーン製造株式会社 | Substrate processing equipment |
JP3626640B2 (en) * | 1999-08-10 | 2005-03-09 | 大日本スクリーン製造株式会社 | Substrate processing equipment |
JP2003088789A (en) * | 2001-09-19 | 2003-03-25 | Sharp Corp | Wet treatment device |
US20030162283A1 (en) * | 2002-02-22 | 2003-08-28 | Hitachi, Ltd. | Circulating type biochemical reaction apparatus |
JP2004079793A (en) | 2002-08-19 | 2004-03-11 | Sumitomo Precision Prod Co Ltd | Method for treating substrate |
JP2004174308A (en) * | 2002-11-25 | 2004-06-24 | Kawaju Plant Kk | Sheet material washing equipment |
JP4280075B2 (en) * | 2003-01-07 | 2009-06-17 | 芝浦メカトロニクス株式会社 | Substrate processing equipment |
-
2005
- 2005-08-29 JP JP2005247901A patent/JP4669760B2/en not_active Expired - Fee Related
- 2005-09-07 TW TW094130696A patent/TWI264770B/en not_active IP Right Cessation
- 2005-09-13 KR KR1020050085157A patent/KR100624653B1/en not_active IP Right Cessation
- 2005-09-14 CN CN2005101028819A patent/CN1748878B/en not_active Expired - Fee Related
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI724850B (en) * | 2012-09-14 | 2021-04-11 | 日商尼康股份有限公司 | Substrate processing device and component manufacturing method |
Also Published As
Publication number | Publication date |
---|---|
CN1748878B (en) | 2011-05-25 |
KR100624653B1 (en) | 2006-09-15 |
JP4669760B2 (en) | 2011-04-13 |
CN1748878A (en) | 2006-03-22 |
KR20060051248A (en) | 2006-05-19 |
JP2006110541A (en) | 2006-04-27 |
TWI264770B (en) | 2006-10-21 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |