TW200619312A - Curable high refractive index resins for optoelectronic applications - Google Patents
Curable high refractive index resins for optoelectronic applicationsInfo
- Publication number
- TW200619312A TW200619312A TW094133712A TW94133712A TW200619312A TW 200619312 A TW200619312 A TW 200619312A TW 094133712 A TW094133712 A TW 094133712A TW 94133712 A TW94133712 A TW 94133712A TW 200619312 A TW200619312 A TW 200619312A
- Authority
- TW
- Taiwan
- Prior art keywords
- refractive index
- high refractive
- compositions
- vinyl ethers
- include aromatic
- Prior art date
Links
- 229920005989 resin Polymers 0.000 title abstract 2
- 239000011347 resin Substances 0.000 title abstract 2
- 230000005693 optoelectronics Effects 0.000 title 1
- 239000000203 mixture Substances 0.000 abstract 4
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical class C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 abstract 2
- 150000001875 compounds Chemical class 0.000 abstract 2
- 239000002904 solvent Substances 0.000 abstract 2
- 239000002253 acid Substances 0.000 abstract 1
- -1 aromatic epoxides Chemical class 0.000 abstract 1
- 125000003118 aryl group Chemical group 0.000 abstract 1
- 230000005540 biological transmission Effects 0.000 abstract 1
- 239000003054 catalyst Substances 0.000 abstract 1
- 238000000576 coating method Methods 0.000 abstract 1
- 238000004132 cross linking Methods 0.000 abstract 1
- 150000002118 epoxides Chemical class 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- AHHWIHXENZJRFG-UHFFFAOYSA-N oxetane Chemical compound C1COC1 AHHWIHXENZJRFG-UHFFFAOYSA-N 0.000 abstract 1
- 150000002921 oxetanes Chemical class 0.000 abstract 1
- 150000002989 phenols Chemical class 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
- 150000003573 thiols Chemical class 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/20—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
- C08G59/22—Di-epoxy compounds
- C08G59/24—Di-epoxy compounds carbocyclic
- C08G59/245—Di-epoxy compounds carbocyclic aromatic
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F283/00—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G
- C08F283/10—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G on to polymers containing more than one epoxy radical per molecule
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/20—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
- C08G59/22—Di-epoxy compounds
- C08G59/226—Mixtures of di-epoxy compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/20—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
- C08G59/32—Epoxy compounds containing three or more epoxy groups
- C08G59/38—Epoxy compounds containing three or more epoxy groups together with di-epoxy compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
- C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
- C08G65/04—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring from cyclic ethers only
- C08G65/06—Cyclic ethers having no atoms other than carbon and hydrogen outside the ring
- C08G65/16—Cyclic ethers having four or more ring atoms
- C08G65/18—Oxetanes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
- C08L63/04—Epoxynovolacs
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
- C08L63/08—Epoxidised polymerised polyenes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
- C08L63/10—Epoxy resins modified by unsaturated compounds
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/80—Constructional details
- H10K59/875—Arrangements for extracting light from the devices
- H10K59/879—Arrangements for extracting light from the devices comprising refractive means, e.g. lenses
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/85—Arrangements for extracting light from the devices
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31511—Of epoxy ether
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Paints Or Removers (AREA)
- Silicon Polymers (AREA)
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
- Epoxy Resins (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Manufacture Of Macromolecular Shaped Articles (AREA)
- Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US61401704P | 2004-09-28 | 2004-09-28 | |
US11/235,619 US20060068207A1 (en) | 2004-09-28 | 2005-09-26 | Curable high refractive index resins for optoelectronic applications |
Publications (1)
Publication Number | Publication Date |
---|---|
TW200619312A true TW200619312A (en) | 2006-06-16 |
Family
ID=37570879
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW094133712A TW200619312A (en) | 2004-09-28 | 2005-09-28 | Curable high refractive index resins for optoelectronic applications |
Country Status (7)
Country | Link |
---|---|
US (2) | US20060068207A1 (zh) |
EP (1) | EP1815273A2 (zh) |
JP (1) | JP2008514764A (zh) |
KR (1) | KR20070072939A (zh) |
CN (1) | CN101142499A (zh) |
TW (1) | TW200619312A (zh) |
WO (1) | WO2006137884A2 (zh) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8809413B2 (en) | 2011-06-29 | 2014-08-19 | Chau Ha | Ultraviolet radiation-curable high refractive index optically clear resins |
CN112233970B (zh) * | 2020-12-15 | 2021-03-23 | 度亘激光技术(苏州)有限公司 | 砷化镓基半导体器件的制造方法 |
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US4710557A (en) * | 1985-02-01 | 1987-12-01 | Eastman Kodak Company | Polymers of thiophenyl thioacrylate and thiomethacrylate monomers |
US5230906A (en) * | 1986-11-24 | 1993-07-27 | Polytex Plastic Sa | Method of and apparatus for manufacturing fiber-reinforced plastics articles |
US5886101A (en) * | 1988-03-02 | 1999-03-23 | E. I. Du Pont De Nemours And Company | Solvent dispersible interpenetrating polymer networks |
US5214116A (en) * | 1989-02-07 | 1993-05-25 | Tokuyama Soda Kabushiki Kaisha | Resin derived from sulfur-containing unsaturated compound and having a high refractive index |
US5132430A (en) * | 1991-06-26 | 1992-07-21 | Polaroid Corporation | High refractive index polymers |
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JPH06273631A (ja) * | 1993-03-18 | 1994-09-30 | Nippon Telegr & Teleph Corp <Ntt> | 光導波路 |
US5789039A (en) * | 1994-09-06 | 1998-08-04 | Herberts Powder Coatings, Inc. | Radiation curing of powder coatings on heat sensitive substrates: chemical compositions and processes for obtaining coated workpieces |
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JP2917884B2 (ja) * | 1995-12-19 | 1999-07-12 | 東洋製罐株式会社 | 水性塗料 |
DE69714106T2 (de) * | 1996-03-13 | 2003-01-23 | Ibiden Co Ltd | Resistzusammenzetzungen zum Metallabscheiden |
US6521714B2 (en) * | 1996-09-26 | 2003-02-18 | Albemarle Corporation | Brominated polystyrenic resins |
JPH11199651A (ja) * | 1998-01-12 | 1999-07-27 | Sumitomo Bakelite Co Ltd | デバイス中空パッケージ封止用紫外線硬化型接着剤樹脂組成物 |
US6204311B1 (en) * | 1998-03-13 | 2001-03-20 | Mitsui Chemicals, Inc. | Polymerizable composition |
US6100007A (en) * | 1998-04-06 | 2000-08-08 | Ciba Specialty Chemicals Corp. | Liquid radiation-curable composition especially for producing cured articles by stereolithography having high heat deflection temperatures |
US6037096A (en) * | 1998-05-26 | 2000-03-14 | International Business Machines Corporation | Film composition and method for a planar surface atop a plated through hole |
US6320020B1 (en) * | 1998-09-08 | 2001-11-20 | Mitsui Chemicals, Inc. | Sulfur-containing (thio)ether (co)polymer and a use thereof |
US6583196B2 (en) * | 1999-04-23 | 2003-06-24 | Rodenstock North America, Inc. | Curable casting compositions having a high refractive index and high impact resistance |
DE19936605A1 (de) * | 1999-08-04 | 2001-02-15 | Osram Opto Semiconductors Gmbh | Transparente Gießharzmasse für SMT-fähige LED-Anwendungen mit hoher Temperatur und hohen Helligkeiten oder Leuchtstärken |
DK1210380T3 (da) * | 1999-09-07 | 2005-05-30 | Alcon Inc | Sammenfoldelige oftalmiske og otorhinolaryngologiske anordningsmaterialer |
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US6288210B1 (en) * | 1999-11-12 | 2001-09-11 | Virginia Tech. Intellectual Properties, Inc. | High refractive index thermoplastic polyphosphonates |
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US6376704B1 (en) * | 2000-06-28 | 2002-04-23 | 3M Innovative Properties Company | Naphthyoxyalkyl(meth)acrylates with high refractive indices and low glass transition temperatures |
WO2002006038A2 (en) * | 2000-07-19 | 2002-01-24 | Koninklijke Philips Electronics N.V. | Method of manufacturing a replica as well as a replica obtained by carrying out a uv light-initiated cationic polymerization |
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JP3963170B2 (ja) * | 2001-08-30 | 2007-08-22 | 三菱瓦斯化学株式会社 | 光学材料用組成物 |
AU2002367417A1 (en) * | 2002-01-11 | 2003-07-24 | Koninklijke Philips Electronics N.V. | Method of manufacturing a replica as well as a replica obtained by carrying out an uv light-initiated cationic polymerization |
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KR100511100B1 (ko) * | 2002-07-12 | 2005-08-31 | 김미화 | 퍼플루오로스티렌 화합물, 이를 이용한 코팅액 및광도파로형 광소자 |
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US6818306B2 (en) * | 2002-09-27 | 2004-11-16 | The Boeing Company | Optically clear structural laminate |
JP4249996B2 (ja) * | 2003-02-10 | 2009-04-08 | 日東電工株式会社 | ポリカルボジイミド共重合体からなるレンズ材料 |
US6939939B2 (en) * | 2003-02-24 | 2005-09-06 | Younger Mfg. | Polyurea/urethane optical material and method for making it |
-
2005
- 2005-09-26 WO PCT/US2005/034270 patent/WO2006137884A2/en active Search and Examination
- 2005-09-26 EP EP20050858173 patent/EP1815273A2/en not_active Withdrawn
- 2005-09-26 JP JP2007533680A patent/JP2008514764A/ja active Pending
- 2005-09-26 CN CNA2005800323223A patent/CN101142499A/zh active Pending
- 2005-09-26 KR KR1020057022451A patent/KR20070072939A/ko not_active Application Discontinuation
- 2005-09-26 US US11/235,619 patent/US20060068207A1/en not_active Abandoned
- 2005-09-28 TW TW094133712A patent/TW200619312A/zh unknown
-
2008
- 2008-08-19 US US12/194,369 patent/US20090087666A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
EP1815273A2 (en) | 2007-08-08 |
US20090087666A1 (en) | 2009-04-02 |
KR20070072939A (ko) | 2007-07-10 |
CN101142499A (zh) | 2008-03-12 |
US20060068207A1 (en) | 2006-03-30 |
WO2006137884A2 (en) | 2006-12-28 |
JP2008514764A (ja) | 2008-05-08 |
WO2006137884A3 (en) | 2007-06-28 |
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