TW200613433A - Thermistor element body forming resin composition and thermistor - Google Patents

Thermistor element body forming resin composition and thermistor

Info

Publication number
TW200613433A
TW200613433A TW094121985A TW94121985A TW200613433A TW 200613433 A TW200613433 A TW 200613433A TW 094121985 A TW094121985 A TW 094121985A TW 94121985 A TW94121985 A TW 94121985A TW 200613433 A TW200613433 A TW 200613433A
Authority
TW
Taiwan
Prior art keywords
thermistor
element body
resin composition
thermistor element
body forming
Prior art date
Application number
TW094121985A
Other languages
English (en)
Chinese (zh)
Other versions
TWI295307B (cg-RX-API-DMAC10.html
Inventor
Yukie Mori
Satoshi Shirai
Original Assignee
Tdk Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tdk Corp filed Critical Tdk Corp
Publication of TW200613433A publication Critical patent/TW200613433A/zh
Application granted granted Critical
Publication of TWI295307B publication Critical patent/TWI295307B/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/20—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
    • C08G59/22—Di-epoxy compounds
    • C08G59/24—Di-epoxy compounds carbocyclic
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01C—RESISTORS
    • H01C17/00—Apparatus or processes specially adapted for manufacturing resistors
    • H01C17/06—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base
    • H01C17/065—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base by thick film techniques, e.g. serigraphy
    • H01C17/06506—Precursor compositions therefor, e.g. pastes, inks, glass frits or green body
    • H01C17/06573—Precursor compositions therefor, e.g. pastes, inks, glass frits or green body characterised by the permanent binder
    • H01C17/06586—Precursor compositions therefor, e.g. pastes, inks, glass frits or green body characterised by the permanent binder composed of organic material
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01C—RESISTORS
    • H01C7/00—Non-adjustable resistors formed as one or more layers or coatings; Non-adjustable resistors made from powdered conducting material or powdered semi-conducting material with or without insulating material
    • H01C7/008—Thermistors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01C—RESISTORS
    • H01C7/00—Non-adjustable resistors formed as one or more layers or coatings; Non-adjustable resistors made from powdered conducting material or powdered semi-conducting material with or without insulating material
    • H01C7/02—Non-adjustable resistors formed as one or more layers or coatings; Non-adjustable resistors made from powdered conducting material or powdered semi-conducting material with or without insulating material having positive temperature coefficient
    • H01C7/027—Non-adjustable resistors formed as one or more layers or coatings; Non-adjustable resistors made from powdered conducting material or powdered semi-conducting material with or without insulating material having positive temperature coefficient consisting of conducting or semi-conducting material dispersed in a non-conductive organic material
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L2201/00—Properties

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Dispersion Chemistry (AREA)
  • Ceramic Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Thermistors And Varistors (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Epoxy Resins (AREA)
TW094121985A 2004-06-29 2005-06-29 Thermistor element body forming resin composition and thermistor TW200613433A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004192026A JP2006013378A (ja) 2004-06-29 2004-06-29 サーミスタ素体形成用樹脂組成物及びサーミスタ

Publications (2)

Publication Number Publication Date
TW200613433A true TW200613433A (en) 2006-05-01
TWI295307B TWI295307B (cg-RX-API-DMAC10.html) 2008-04-01

Family

ID=34981564

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094121985A TW200613433A (en) 2004-06-29 2005-06-29 Thermistor element body forming resin composition and thermistor

Country Status (7)

Country Link
US (1) US7270776B2 (cg-RX-API-DMAC10.html)
EP (1) EP1612811B1 (cg-RX-API-DMAC10.html)
JP (1) JP2006013378A (cg-RX-API-DMAC10.html)
KR (1) KR100758144B1 (cg-RX-API-DMAC10.html)
CN (1) CN100410319C (cg-RX-API-DMAC10.html)
DE (1) DE602005004703T2 (cg-RX-API-DMAC10.html)
TW (1) TW200613433A (cg-RX-API-DMAC10.html)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7993808B2 (en) 2005-09-30 2011-08-09 Taiwan Semiconductor Manufacturing Company, Ltd. TARC material for immersion watermark reduction
US8518628B2 (en) 2006-09-22 2013-08-27 Taiwan Semiconductor Manufacturing Company, Ltd. Surface switchable photoresist
US8895234B2 (en) 2005-08-05 2014-11-25 Taiwan Semiconductor Manufacturing Company, Ltd. Immersion lithography watermark reduction

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4796322B2 (ja) * 2005-03-30 2011-10-19 阪本薬品工業株式会社 新規な熱硬化性樹脂組成物
CN101401015B (zh) 2006-03-10 2011-03-23 株式会社日本触媒 偏振片保护薄膜、偏振板、以及图像显示装置
ES2691528T3 (es) * 2006-07-31 2018-11-27 Henkel Ag & Co. Kgaa Composiciones adhesivas basadas en resina epoxi curable
CN101547990B (zh) * 2006-10-06 2012-09-05 汉高股份及两合公司 可泵送的耐洗掉的环氧膏状粘合剂
JP5357629B2 (ja) 2008-07-01 2013-12-04 新日鉄住金化学株式会社 光導波路用樹脂組成物およびそれを用いた光導波路
JP5466643B2 (ja) * 2008-07-31 2014-04-09 株式会社ダイセル 光半導体封止用樹脂組成物とこれを使用した光半導体装置
JP2010077305A (ja) * 2008-09-26 2010-04-08 Yokohama Rubber Co Ltd:The エポキシ樹脂組成物
SE534437C2 (sv) * 2009-09-29 2011-08-23 Conflux Ab Värmeelement med positiv temperaturkoefficient och deras framställning
CN102286190B (zh) * 2011-06-23 2013-04-17 浙江华正新材料股份有限公司 一种无卤树脂组合物及用该组合物制成的覆铜板
KR20150112018A (ko) 2013-01-28 2015-10-06 메사추세츠 인스티튜트 오브 테크놀로지 전기기계 디바이스
US10302506B2 (en) 2014-02-06 2019-05-28 Japan Science And Technology Agency Resin composition for temperature sensor, element for temperature sensor, temperature sensor, and method for producing element for temperature sensor
CN108648889B (zh) * 2018-03-15 2020-04-28 佛山市信鼎电子科技有限公司 一种电子元件的制备方法
CN110793658A (zh) * 2019-11-26 2020-02-14 青岛科技大学 一种自带电路保护功能的聚合物基温敏电阻器

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CA1043911A (en) 1975-04-14 1978-12-05 Robert B. Johnson Electronic device assembly on insulating substrates
GB2152060B (en) * 1983-12-02 1987-05-13 Osaka Soda Co Ltd Electrically conductive adhesive composition
FR2614130B1 (fr) * 1987-04-15 1992-01-17 Lorraine Carbone Materiau ayant une resistivite a coefficient de temperature positif
US5250228A (en) * 1991-11-06 1993-10-05 Raychem Corporation Conductive polymer composition
JP3101048B2 (ja) 1992-01-20 2000-10-23 ティーディーケイ株式会社 有機質正特性サーミスタ
JP3101047B2 (ja) 1992-01-20 2000-10-23 ティーディーケイ株式会社 有機質正特性サーミスタ
DE4232969A1 (de) * 1992-10-01 1994-04-07 Abb Research Ltd Elektrisches Widerstandselement
US6375867B1 (en) * 1993-11-29 2002-04-23 Eaton Corporation Process for making a positive temperature coefficient conductive polymer from a thermosetting epoxy resin and conductive fillers
US5700398A (en) * 1994-12-14 1997-12-23 International Business Machines Corporation Composition containing a polymer and conductive filler and use thereof
US5935372A (en) * 1997-04-29 1999-08-10 Occidental Chemical Corporation Adhesive sealant for bonding metal parts to ceramics
US6191681B1 (en) * 1997-07-21 2001-02-20 General Electric Company Current limiting device with electrically conductive composite and method of manufacturing the electrically conductive composite
US5968419A (en) * 1997-12-08 1999-10-19 Westinghouse Electric Company Llc Conductive polymer compositions, electrical devices and methods of making
US6139777A (en) * 1998-05-08 2000-10-31 Matsushita Electric Industrial Co., Ltd. Conductive paste for filling via-hole, double-sided and multilayer printed circuit boards using the same, and method for producing the same
JP3683113B2 (ja) 1998-11-02 2005-08-17 Ｔｄｋ株式会社 有機質正特性サーミスタ
JP3506629B2 (ja) 1999-01-28 2004-03-15 Ｔｄｋ株式会社 有機質正特性サーミスタ
CN1326155C (zh) 2002-05-31 2007-07-11 大自达电线股份有限公司 导电糊、使用其的多层基板及其制造方法
CN100346229C (zh) 2002-09-30 2007-10-31 日本瑞翁株式会社 放射线敏感性树脂组合物、树脂图案膜及其形成方法以及树脂图案膜的应用
CN100487826C (zh) * 2003-03-25 2009-05-13 Tdk株式会社 有机质正特性热敏电阻
JP4261407B2 (ja) 2004-03-31 2009-04-30 Ｔｄｋ株式会社 有機質正特性サーミスタ

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8895234B2 (en) 2005-08-05 2014-11-25 Taiwan Semiconductor Manufacturing Company, Ltd. Immersion lithography watermark reduction
US7993808B2 (en) 2005-09-30 2011-08-09 Taiwan Semiconductor Manufacturing Company, Ltd. TARC material for immersion watermark reduction
US8202680B2 (en) 2005-09-30 2012-06-19 Taiwan Semiconductor Manufacturing Company, Ltd. TARC material for immersion watermark reduction
US8597870B2 (en) 2005-09-30 2013-12-03 Taiwan Semiconductor Manufacturing Company, Ltd. TARC material for immersion watermark reduction
US8518628B2 (en) 2006-09-22 2013-08-27 Taiwan Semiconductor Manufacturing Company, Ltd. Surface switchable photoresist
US8715919B2 (en) 2006-09-22 2014-05-06 Taiwan Semiconductor Manufacturing Company, Ltd. Surface switchable photoresist

Also Published As

Publication number Publication date
EP1612811B1 (en) 2008-02-13
KR20060048688A (ko) 2006-05-18
TWI295307B (cg-RX-API-DMAC10.html) 2008-04-01
JP2006013378A (ja) 2006-01-12
DE602005004703D1 (de) 2008-03-27
CN1715329A (zh) 2006-01-04
KR100758144B1 (ko) 2007-09-13
EP1612811A1 (en) 2006-01-04
DE602005004703T2 (de) 2009-02-12
CN100410319C (zh) 2008-08-13
US20060022790A1 (en) 2006-02-02
US7270776B2 (en) 2007-09-18

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Legal Events

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MM4A Annulment or lapse of patent due to non-payment of fees