TW200518115A - Superconductive wire and production thereof - Google Patents
Superconductive wire and production thereofInfo
- Publication number
- TW200518115A TW200518115A TW093123083A TW93123083A TW200518115A TW 200518115 A TW200518115 A TW 200518115A TW 093123083 A TW093123083 A TW 093123083A TW 93123083 A TW93123083 A TW 93123083A TW 200518115 A TW200518115 A TW 200518115A
- Authority
- TW
- Taiwan
- Prior art keywords
- metal plate
- production
- superconductive wire
- superconductive
- oriental
- Prior art date
Links
- 239000002184 metal Substances 0.000 abstract 4
- 239000002344 surface layer Substances 0.000 abstract 2
- 239000013078 crystal Substances 0.000 abstract 1
- 239000010410 layer Substances 0.000 abstract 1
- 230000003746 surface roughness Effects 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B12/00—Superconductive or hyperconductive conductors, cables, or transmission lines
- H01B12/02—Superconductive or hyperconductive conductors, cables, or transmission lines characterised by their form
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B12/00—Superconductive or hyperconductive conductors, cables, or transmission lines
- H01B12/02—Superconductive or hyperconductive conductors, cables, or transmission lines characterised by their form
- H01B12/06—Films or wires on bases or cores
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N60/00—Superconducting devices
- H10N60/01—Manufacture or treatment
- H10N60/0268—Manufacture or treatment of devices comprising copper oxide
- H10N60/0296—Processes for depositing or forming copper oxide superconductor layers
- H10N60/0576—Processes for depositing or forming copper oxide superconductor layers characterised by the substrate
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Superconductors And Manufacturing Methods Therefor (AREA)
- Physical Vapour Deposition (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003287971A JP2005056754A (ja) | 2003-08-06 | 2003-08-06 | 超電導線材およびその製造方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
TW200518115A true TW200518115A (en) | 2005-06-01 |
Family
ID=34131494
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW093123083A TW200518115A (en) | 2003-08-06 | 2004-08-02 | Superconductive wire and production thereof |
Country Status (11)
Country | Link |
---|---|
US (1) | US20060219322A1 (zh) |
EP (1) | EP1653484B2 (zh) |
JP (1) | JP2005056754A (zh) |
KR (1) | KR101016868B1 (zh) |
CN (1) | CN100477020C (zh) |
AU (1) | AU2004264090A1 (zh) |
CA (1) | CA2522078A1 (zh) |
HK (1) | HK1091942A1 (zh) |
RU (1) | RU2332737C2 (zh) |
TW (1) | TW200518115A (zh) |
WO (1) | WO2005015575A1 (zh) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI596622B (zh) * | 2015-01-07 | 2017-08-21 | 三菱綜合材料股份有限公司 | 超導線及超導線圈 |
US11149329B2 (en) | 2016-04-06 | 2021-10-19 | Mitsubishi Materials Corporation | Stabilizer material for superconductor |
Families Citing this family (24)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4411265B2 (ja) * | 2005-10-21 | 2010-02-10 | 財団法人国際超電導産業技術研究センター | 希土類系テープ状酸化物超電導体及びその製造方法 |
JP2007200870A (ja) * | 2006-01-26 | 2007-08-09 | Ls Cable Ltd | 超伝導ケーブル用基板の製造方法 |
JP5049530B2 (ja) * | 2006-08-01 | 2012-10-17 | 日本ミクロコーティング株式会社 | 酸化物超伝導体用テープ基材の研磨方法並びに酸化物超伝導体及び酸化物超伝導体用基材 |
JP5252792B2 (ja) * | 2006-08-25 | 2013-07-31 | 日本ミクロコーティング株式会社 | 酸化物超伝導体用テープ基材の研磨方法並びに酸化物超伝導体及び酸化物超伝導体用基材 |
CN101221898B (zh) * | 2007-01-08 | 2011-05-11 | 晶能光电(江西)有限公司 | 用于制造具有高质量表面的金属衬底的方法 |
JP5049611B2 (ja) * | 2007-02-16 | 2012-10-17 | 日本ミクロコーティング株式会社 | 超電導体用テープ基材の製造方法及びテープ基材 |
US8316158B1 (en) | 2007-03-12 | 2012-11-20 | Cypress Semiconductor Corporation | Configuration of programmable device using a DMA controller |
JP2008311222A (ja) * | 2007-05-11 | 2008-12-25 | Furukawa Electric Co Ltd:The | 超電導線およびその製造方法 |
DE102007024166B4 (de) * | 2007-05-24 | 2011-01-05 | Zenergy Power Gmbh | Verfahren zum Bearbeiten eines Metallsubstrats und Verwendung dessen für einen Hochtemperatur-Supraleiter |
JP5113430B2 (ja) * | 2007-06-05 | 2013-01-09 | 九州電力株式会社 | 金属めっき複合基材 |
JP5173318B2 (ja) * | 2007-08-24 | 2013-04-03 | 日本ミクロコーティング株式会社 | テープ状基材の研磨方法及び酸化物超伝導体用ベース基材 |
JP5448425B2 (ja) * | 2008-11-21 | 2014-03-19 | 公益財団法人国際超電導産業技術研究センター | 超電導膜成膜用基板、超電導線材及びそれらの製造方法 |
DE102008058768B4 (de) * | 2008-11-24 | 2011-12-15 | Zenergy Power Gmbh | Verfahren zur Herstellung von Metallsubstraten für HTS-Schichtanordnungen |
JP2010163679A (ja) * | 2008-12-18 | 2010-07-29 | Sumitomo Electric Ind Ltd | 酸化物薄膜の成膜装置および成膜方法 |
JP5435448B2 (ja) * | 2008-12-24 | 2014-03-05 | 古河電気工業株式会社 | 超電導線材用テープ状基材、その製造方法、及び超電導線材 |
AT12768U1 (de) * | 2010-03-29 | 2012-11-15 | Ctr Carinthian Tech Res Ag | Hochtemperaturbeständige, elektrisch leitfähige dünnschichten |
EP2381499B1 (en) * | 2010-04-26 | 2014-12-17 | Bruker HTS GmbH | Method for designing AC losses in a tape-type superconductor with anisotropy of critical currents |
JP2012049086A (ja) * | 2010-08-30 | 2012-03-08 | Sumitomo Electric Ind Ltd | 酸化物超電導薄膜線材、酸化物超電導薄膜線材用金属基板およびその製造方法 |
JP5767896B2 (ja) * | 2011-08-09 | 2015-08-26 | 株式会社フジクラ | 基材接続部を有する酸化物超電導導体とその製造方法 |
JP5950900B2 (ja) * | 2011-11-15 | 2016-07-13 | 古河電気工業株式会社 | 超電導線材用基板、超電導線材用基板の製造方法及び超電導線材 |
KR20140102125A (ko) * | 2012-06-27 | 2014-08-21 | 후루카와 덴키 고교 가부시키가이샤 | 초전도선 |
WO2017105029A1 (ko) * | 2015-12-14 | 2017-06-22 | 한국전기연구원 | 금속기판 결함에 의해 자기 정렬된 초전도 스트립을 구비하는 초전도 선재의 제조 방법 |
EP3904292A4 (en) * | 2018-12-28 | 2022-09-21 | Fujikura Ltd. | OXIDE SUPERCONDUCTING WIRE AND METHOD OF PRODUCTION THEREOF |
KR20210138858A (ko) | 2020-05-13 | 2021-11-22 | 한국전기연구원 | 유리기판을 이용한 고온초전도선재 및 이의 제조방법 |
Family Cites Families (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2803123B2 (ja) * | 1989-02-04 | 1998-09-24 | 住友電気工業株式会社 | 超電導線 |
CA2008310C (en) * | 1989-02-04 | 1997-03-04 | Satoshi Takano | Superconducting wire |
JPH02248304A (ja) * | 1989-03-20 | 1990-10-04 | Mitsubishi Metal Corp | 超伝導体薄膜の製造方法 |
JP2877367B2 (ja) * | 1989-09-05 | 1999-03-31 | 株式会社東芝 | 超電導線材 |
DE4006094A1 (de) * | 1990-02-27 | 1991-08-29 | Kabelmetal Electro Gmbh | Hochtemperatursupraleiter aus einem gewellten metallrohr |
EP0480814B1 (en) * | 1990-10-08 | 1996-04-24 | Sumitomo Electric Industries, Ltd. | Superconducting device having an extremely thin superconducting channel formed of oxide superconductor material and method for manufacturing the same |
JP3278461B2 (ja) * | 1992-08-19 | 2002-04-30 | 住友電気工業株式会社 | 超電導線の製造方法 |
US5389194A (en) * | 1993-02-05 | 1995-02-14 | Lsi Logic Corporation | Methods of cleaning semiconductor substrates after polishing |
JP2994183B2 (ja) * | 1993-09-21 | 1999-12-27 | 財団法人国際超電導産業技術研究センター | 超電導素子およびその作製方法 |
JP2813287B2 (ja) * | 1993-10-08 | 1998-10-22 | 株式会社東芝 | 超電導線材 |
US6451450B1 (en) * | 1995-04-10 | 2002-09-17 | Ut-Battelle, Llc | Method of depositing a protective layer over a biaxially textured alloy substrate and composition therefrom |
JP4033945B2 (ja) * | 1997-08-01 | 2008-01-16 | 株式会社フジクラ | 酸化物超電導導体およびその製造方法 |
US6458223B1 (en) * | 1997-10-01 | 2002-10-01 | American Superconductor Corporation | Alloy materials |
GB2336849B (en) † | 1998-04-27 | 2003-02-26 | Telcon Ltd | Substrate materials |
US6296701B1 (en) * | 1998-09-30 | 2001-10-02 | Ut-Battelle, Llc | Method of depositing an electrically conductive oxide film on a textured metallic substrate and articles formed therefrom |
US6827634B2 (en) | 2000-05-22 | 2004-12-07 | Agency Of Industrial Science And Technology | Ultra fine particle film forming method and apparatus |
JP4316070B2 (ja) * | 1999-10-07 | 2009-08-19 | 古河電気工業株式会社 | 高強度配向多結晶金属基板および酸化物超電導線材 |
US6455166B1 (en) * | 2000-05-11 | 2002-09-24 | The University Of Chicago | Metallic substrates for high temperature superconductors |
US6617283B2 (en) * | 2001-06-22 | 2003-09-09 | Ut-Battelle, Llc | Method of depositing an electrically conductive oxide buffer layer on a textured substrate and articles formed therefrom |
US6569745B2 (en) * | 2001-06-28 | 2003-05-27 | Sharp Laboratories Of America, Inc. | Shared bit line cross point memory array |
JP2003055095A (ja) * | 2001-08-07 | 2003-02-26 | Sumitomo Electric Ind Ltd | 薄膜形成方法 |
US7129196B2 (en) * | 2003-07-21 | 2006-10-31 | Los Alamos National Security, Llc | Buffer layer for thin film structures |
-
2003
- 2003-08-06 JP JP2003287971A patent/JP2005056754A/ja active Pending
-
2004
- 2004-07-13 AU AU2004264090A patent/AU2004264090A1/en not_active Abandoned
- 2004-07-13 WO PCT/JP2004/009951 patent/WO2005015575A1/ja active Application Filing
- 2004-07-13 KR KR1020067002410A patent/KR101016868B1/ko not_active IP Right Cessation
- 2004-07-13 CN CNB2004800225796A patent/CN100477020C/zh not_active Expired - Fee Related
- 2004-07-13 RU RU2006106705/09A patent/RU2332737C2/ru not_active IP Right Cessation
- 2004-07-13 US US10/552,728 patent/US20060219322A1/en not_active Abandoned
- 2004-07-13 EP EP04747417.6A patent/EP1653484B2/en not_active Expired - Fee Related
- 2004-07-13 CA CA002522078A patent/CA2522078A1/en not_active Abandoned
- 2004-08-02 TW TW093123083A patent/TW200518115A/zh unknown
-
2006
- 2006-11-13 HK HK06112483.3A patent/HK1091942A1/xx not_active IP Right Cessation
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI596622B (zh) * | 2015-01-07 | 2017-08-21 | 三菱綜合材料股份有限公司 | 超導線及超導線圈 |
US10964454B2 (en) | 2015-01-07 | 2021-03-30 | Mitsubishi Materials Corporation | Superconducting wire and superconducting coil |
US11149329B2 (en) | 2016-04-06 | 2021-10-19 | Mitsubishi Materials Corporation | Stabilizer material for superconductor |
Also Published As
Publication number | Publication date |
---|---|
CN1833295A (zh) | 2006-09-13 |
EP1653484B1 (en) | 2012-08-08 |
EP1653484B2 (en) | 2015-12-02 |
KR101016868B1 (ko) | 2011-02-22 |
EP1653484A1 (en) | 2006-05-03 |
EP1653484A4 (en) | 2009-12-02 |
HK1091942A1 (en) | 2007-01-26 |
KR20060055535A (ko) | 2006-05-23 |
WO2005015575A1 (ja) | 2005-02-17 |
CA2522078A1 (en) | 2005-02-17 |
AU2004264090A1 (en) | 2005-02-17 |
JP2005056754A (ja) | 2005-03-03 |
RU2332737C2 (ru) | 2008-08-27 |
CN100477020C (zh) | 2009-04-08 |
US20060219322A1 (en) | 2006-10-05 |
RU2006106705A (ru) | 2006-07-27 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
TW200518115A (en) | Superconductive wire and production thereof | |
WO2004084240A3 (en) | Superconductor material on a tape substrate | |
MY141147A (en) | Method of fabricating a magnetic discrete track recording disk | |
WO2005055275A3 (en) | Novel superconducting articles, and methods for forming and using same | |
FR2851181B1 (fr) | Procede de revetement d'une surface | |
WO2006007107A3 (en) | Abrasive article | |
WO2003021635A3 (en) | Passivated nanoparticles, method of fabrication thereof, and devices incorporating nanoparticles | |
WO2004041998A3 (en) | Nanomechanichal energy, force, and mass sensors | |
AU2003273873A1 (en) | Protective layer, method and arrangement for the production of protective layers | |
EP2360298A3 (en) | Method for depositing a semiconductor nanowire | |
CA2525371A1 (en) | Continuous on-bottom directional drilling method and system | |
ITRM20010320A0 (it) | Procedimento per la produzione di un composito a base di lega di titanio rinforzato con carburo di titanio, e composito rinforzato cosi' ott | |
JP2002249864A5 (zh) | ||
SG166794A1 (en) | Layer arrangement for the formation of a coating on a surface of a substrate,coating method,and substrate with a layer arrangement | |
TW200637043A (en) | Superconducting thin film material, superconducting wire rod and the method for manufacturing the same | |
AU2003274477A1 (en) | Formation of a relaxed useful layer from a wafer with no buffer layer | |
AU2003221222A1 (en) | The control method of arranging carbon nanotubes selectively orientationally on the surface of a substrate | |
USD487938S1 (en) | Ceiling tile | |
USD487319S1 (en) | Ceiling tile | |
WO2004018348A3 (de) | Schichtsystem mit einer siliziumschicht und einer passivierschicht, verfahren zur erzeugung einer passivierschicht auf einer siliziumschicht und deren verwendung | |
USD501872S1 (en) | Type font | |
AU2003301728A1 (en) | Dispersed growth of nanotubes on a substrate | |
USD487318S1 (en) | Ceiling tile | |
USD516614S1 (en) | Type font | |
TW200710920A (en) | Microstructure and manufacturing method thereof |